A patterned side electrode deposition jig applied to a diaphragm type quartz pressure core

Abstract

The application relates to the field of pressure sensors, in particular to a patterned side electrode deposition jig applied to a diaphragm type quartz pressure core body, which comprises a jig body composed of two shape-same metal shells, four positioning pins and a metal cover plate, and a jig inclined base used for supporting and limiting the jig body; the two shape-same metal shells are limited by the four positioning pins in butt joint mode, and a group of sputtering holes are symmetrically arranged on the two shape-same metal shells; the metal cover plate is used for covering the area of the pressure crystal which does not need sputtering deposition. The jig can accurately control the sputtering deposition range, realizes the uniformization of the side electrode film pattern in the sputtering deposition link of the quartz crystal production, and can realize the difference of the side electrode sputtering deposition pattern through flexible design of the jig pattern.

Description

Technical Field

[0001] The present invention relates to the field of pressure sensors, and in particular to a patterned side electrode deposition jig applied to a diaphragm-type quartz pressure core. Background Art

[0002] A quartz crystal resonant sensor uses a quartz resonant pressure core as its sensitive element. It offers advantages such as a wide range, high resolution, high precision, low power consumption, and strong anti-interference capabilities. The quartz resonant pressure core consists of two quartz end caps, a quartz resonant plate, a quartz bonding medium, and side electrodes. The end caps are bonded to the resonant plate via quartz bonding to form an integrated resonant cavity and resonant plate structure. During processing, magnetron sputtering is used to spray side electrodes onto the quartz side, directing the electrodes on the resonant plate to the bulk quartz surface to excite the quartz. Magnetron sputtering can effectively ensure high material purity, film uniformity, thickness, composition, and structure, but it is difficult to precisely control the extent of the sputtered deposits on the quartz core surface, making it impossible to achieve image-based manufacturing of quartz crystals. Summary of the Invention

[0003] To solve the above problems, the present invention provides a patterned side electrode deposition jig applied to a diaphragm quartz pressure core, which can accurately control the sputtering deposition range to achieve the uniformity of the side electrode film pattern in the sputtering deposition link of quartz crystal production, and can flexibly design the jig pattern to achieve different side electrode sputtering deposition patterns.

[0004] To achieve the above object, the technical solution adopted by the present invention is:

[0005] A patterned side electrode deposition jig for a diaphragm quartz pressure core comprises: a jig body consisting of two identically shaped metal shells, four locating pins, and a metal cover plate, and a jig tilting base for supporting and limiting the jig body; the jig body is made of brass, the two identically shaped metal shells are butted together by four locating pins to limit the pressure crystal, and a group of sputtering holes are symmetrically provided on the two identically shaped metal shells; the metal cover plate is used to cover the area of ​​the pressure crystal where sputtering deposition is not required.

[0006] Furthermore, the two metal shells of the same shape are butted together by four positioning pins to form a circular clamping cavity, and the metal cover is placed in the clamping cavity.

[0007] Furthermore, the fixture tilting base is tilted at 60°.

[0008] Furthermore, the fixture tilting base includes a bottom plate, a U-shaped clamping seat, and two support plates for supporting the U-shaped clamping seat. The two support plates are tilted so that the bottom surface of the U-shaped clamping seat is tilted at 60° to the bottom plate.

[0009] Furthermore, a semicircular groove is provided on the front side plate of the U-shaped clamping seat to facilitate side electrode spraying.

[0010] Furthermore, the shape of the sputtering hole is designed according to different side electrode sputtering deposition patterns to achieve different patterns.

[0011] Furthermore, the metal cover is in a flat cylindrical shape that matches the size of the quartz crystal.

[0012] This invention provides a jig that precisely controls the sputtering deposition range. By magnetron sputtering bulk quartz, side electrodes are sprayed onto the material, allowing the electrodes on the resonant plate to be brought to the surface of the bulk quartz to facilitate excitation. This jig enables image-based production.

[0013] The fixture of the present invention adopts a fixture base with a certain tilt angle, which is conducive to top-down sputtering deposition to fully cover the parts of the core that need to be deposited, and can be flexibly designed to achieve different graphics. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Other features, objects and advantages of the present invention will become more apparent upon reading the detailed description of non-limiting embodiments with reference to the following drawings:

[0015] Figure 1 This is a three-dimensional diagram of a patterned side electrode deposition fixture applied to a diaphragm quartz pressure core according to an embodiment of the present invention.

[0016] Figure 2 2 is a cross-sectional view of the fixture body in an embodiment of the present invention.

[0017] Figure 3 2 is a top view of the fixture body in an embodiment of the present invention.

[0018] Figure 4 A side view of a patterned side electrode deposition fixture for a diaphragm quartz pressure core according to an embodiment of the present invention.

[0019] Figure 5 A side view of a patterned side electrode deposition fixture for a diaphragm quartz pressure core according to an embodiment of the present invention.

[0020] In the figure: 1-metal housing; 2-jig tilting base; 3-locating pin; 4-sputtering hole; 5-base plate; 6-U-shaped clamping seat; 7-support plate; 8-metal cover plate; 9-quartz crystal. DETAILED DESCRIPTION

[0021] The present invention will be described in detail below with reference to specific embodiments. The following embodiments will help those skilled in the art to further understand the present invention, but are not intended to limit the present invention in any form. It should be noted that, for those skilled in the art, several variations and improvements can be made without departing from the scope of the present invention. These all fall within the scope of protection of the present invention.

[0022] In order to realize the visualization of quartz crystal production, such as Figure 1-Figure 5 As shown, a patterned side electrode deposition jig for a diaphragm quartz pressure core of the present invention is designed with two metal shells 1 of the same shape and four positioning pins. A group of sputtering holes 4 are symmetrically opened on the two metal shells 1 of the same shape. The two metal shells 1 of the same shape are connected by four positioning pins 3 to form a circular clamping cavity for limiting the quartz crystal 9. The shape and size of the metal shell 1 should match the size of the quartz crystal 9. In this embodiment, the quartz crystal 9 adopts a quartz resonant pressure crystal, which is cylindrical, 16 mm high and 14.6 mm in diameter; the shape of the sputtering hole 4 is designed according to different side electrode sputtering deposition patterns to achieve different graphics. In order to cover the area of ​​the pressure crystal that does not require sputtering deposition, a metal cover plate 8 is also designed. The metal cover plate 8 is a flat cylindrical shape that matches the size of the quartz crystal. It is arranged in the clamping cavity formed by the two metal shells 1. When designing the size, it is necessary to satisfy the requirements of not only covering the side of the quartz crystal that does not require deposition, but also ensuring that the fixture as a whole has no protrusions; in order to enable sputtering deposition from top to bottom to completely cover the parts of the core that need to be deposited, a fixture inclined base 2 with a 60° tilt is also designed. The fixture inclined base 2 fits perfectly with the fixture body, including a bottom plate 5, a U-shaped clamping seat 6, and two support plates 7 for supporting the U-shaped clamping seat 6. The two support plates 7 are tilted so that the bottom surface of the U-shaped clamping seat 6 is tilted at 60° to the bottom plate.

[0023] In order to facilitate the sputtering operation, a semicircular groove is opened on the front side plate of the U-shaped clamping seat.

[0024] In order to achieve the reinforcement of the connection structure of two metal shells of the same shape, iron clips of appropriate length are also designed and clamped at the fixing pins on both sides for further physical reinforcement.

[0025] In this specific implementation, four positioning pins are used to secure the two housings, providing a certain degree of stability. The pressure crystal is placed between the two housings and adjusted in position. The side electrodes are exposed to air. Once securely installed, the side not undergoing sputtering deposition is covered with a cover plate to prevent accidental deposition. Iron clamps of appropriate length are then used at the fixing pins on both sides for further physical reinforcement.

[0026] After all preparations are completed, the quartz crystal, fixed with a jig, is placed on a 3D-printed plastic platform. The platform fits perfectly with the instrument and is tilted 60°. The tilt angle is designed to ensure that gold atoms can perfectly cover the required exposed areas from top to bottom during sputtering deposition.

[0027] The above describes the specific embodiments of the present invention. It should be understood that the present invention is not limited to the above specific embodiments, and those skilled in the art may make various variations or modifications within the scope of the claims, which do not affect the essence of the present invention.

Claims

1. A patterned side electrode deposition fixture for a diaphragm quartz pressure core, characterized by: include: The fixture body consists of two identical metal shells, four locating pins, and a metal cover plate, as well as a fixture tilting base for supporting and limiting the fixture body. The two identical metal shells are connected by the four locating pins to limit the position of the pressure crystal, and the two identical metal shells are symmetrically provided with a set of sputtering holes. The metal cover plate is used to cover the area of ​​the pressure crystal that does not require sputtering deposition. The two metal shells of the same shape are butted together by four positioning pins to form a quasi-circular clamping cavity, and the metal cover is placed in the clamping cavity.

2. The patterned side electrode deposition jig for a diaphragm quartz pressure core according to claim 1, characterized in that: The fixture tilt base is tilted at 60°.

3. The patterned side electrode deposition jig for a diaphragm quartz pressure core according to claim 1, characterized in that: The fixture tilting base includes a bottom plate, a U-shaped clamping seat, and two support plates for supporting the U-shaped clamping seat. The two support plates are tilted so that the bottom surface of the U-shaped clamping seat is tilted at 60 degrees to the bottom plate.

4. The patterned side electrode deposition jig for a diaphragm quartz pressure core according to claim 3, characterized in that: A semicircular groove is provided on the front side plate of the U-shaped clamping seat to facilitate side electrode spraying.

5. The patterned side electrode deposition jig for a diaphragm quartz pressure core according to claim 1, characterized in that: The fixture body is made of brass.

6. The patterned side electrode deposition jig for a diaphragm quartz pressure core according to claim 1, characterized in that: The shape of the sputtering hole is designed according to different side electrode sputtering deposition patterns to achieve different patterns.

7. The patterned side electrode deposition jig for a diaphragm quartz pressure core according to claim 1, characterized in that: The metal cover is in the shape of a flat cylinder that matches the size of the quartz crystal.

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