Electrostatic discharge protection system for micro-devices
By introducing pixel driver circuits and ESD protection units into the micro-LED panel, the problem of electrostatic discharge damage to the micro-LED panel is solved, improving the stability and reliability of the display and meeting the requirements of high-performance display.
Patent Information
- Application Number
- CN202280091712.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-02-17
- Publication Date
- 2025-12-02
- Estimated Expiration
- 2042-02-17
AI Technical Summary
The lack of effective electrostatic discharge protection for micro LED panels leads to damage and limits their implementation and reliability. Existing technologies are unable to meet increasingly stringent ESD protection requirements.
An ESD protection system for micro-devices was designed, including a pixel driver circuit and multiple ESD protection units. By connecting micro-LED pixels to different voltage levels and using MOS transistors and ESD clamping circuits to protect the input/output circuits, the system is formed on a semiconductor substrate to achieve electrostatic protection under high impedance conditions.
It effectively reduces ESD damage, improves the light emission efficiency and overall performance of the display, and is suitable for augmented reality, virtual reality, head-up displays, mobile device displays, wearable device displays and high-definition projectors.
Smart Images

Figure CN118715615B_ABST
Abstract
Description
Technical Field
[0001] This invention generally relates to display devices and technologies, and more specifically, to electrostatic discharge protection systems for microdevices. Background Technology
[0002] Display technology is becoming increasingly important in today's commercial electronic devices. These display panels are widely used in fixed large screens, such as LCD TVs and OLED TVs, as well as portable electronic devices, such as laptops, smartphones, tablets, and wearable devices.
[0003] Electrostatic discharge (ESD) is one of the most common threats to the reliability of electronic components. An ESD-related event occurs when a limited amount of charge is transferred from one object to another, such as from the human body to a microdevice. This process results in a very high current flowing through the microdevice for a very short period. In fact, over 35% of chip damage can be attributed to ESD-related events. Common failures caused by ESD include contact damage, current leakage, short circuits, gate oxide cracking, and burnout. ESD failures are unpredictable or difficult to diagnose after they occur.
[0004] Furthermore, designing on-chip ESD structures to protect integrated circuits from ESD stress is a high-priority task in the semiconductor industry. Continued advancements in metal-oxide-semiconductor (MOS) and other processing technologies have made ESD-induced failures even more prominent. In fact, many semiconductor companies worldwide are struggling to meet the increasingly stringent ESD protection requirements of various electronic applications, and it can be confidently predicted that the availability of effective and robust ESD protection solutions will be a key and necessary factor for the well-being and commercialization of the electronics industry.
[0005] Furthermore, miniature light-emitting diode (LED) panels are widely studied worldwide. However, miniature LEDs lack ESD protection, which can lead to damage to the panels and limit their implementation and reliability. Summary of the Invention
[0006] There is a need for improved display designs that address and mitigate the shortcomings of conventional display systems, such as those mentioned above. In particular, display panels with improved stability and reliability, as well as better image quality, are required.
[0007] In some embodiments, integrated circuit (IC) chips require ESD protection at all pins of the packaged device. ESD clamping circuitry ideally operates in a high-impedance state with a tolerable capacitive load and triggers only upon detection of an ESD pulse, thereby protecting the input / output (I / O) circuitry. As an ESD pulse appears on the IC pads, the protection device clamps the majority of the ESD current energy to the ground bus. The clamping device needs to be fully compatible with the I / O functionality.
[0008] Various embodiments include display panels with integrated micro-LED arrays. Display panels typically include an array of pixel light sources (e.g., LEDs, OLEDs) electrically coupled to corresponding pixel driver circuitry (e.g., FETs). The micro-LED panel includes an IC backplane and a micro-LED array electrically formed on the IC backplane.
[0009] In some embodiments, this disclosure provides an ESD protection system for micro-devices, particularly for micro-LED panels, to address the problem that micro-LED panels are always damaged by external electrostatic discharge.
[0010] To achieve the above objectives, some exemplary embodiments of this disclosure provide an electrostatic discharge (ESD) protection system for a microdevice, comprising: a pixel driver circuit electrically connected to at least one microLED pixel for controlling the microLED pixel to turn on or off, wherein the microLED pixel is electrically connected to a second voltage level (Vcom); and a first ESD protection unit electrically connected to a first voltage level (Vdd) and a second voltage level (Vcom).
[0011] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the cathode of the micro LED pixel is connected to a second level voltage (Vcom).
[0012] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the first ESD protection unit is connected to a fourth level voltage (Vss) and a second level voltage (Vcom).
[0013] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the fourth level voltage (Vss) is greater than the second level voltage (Vcom), and the first level voltage (Vdd) is greater than the fourth level voltage (Vss).
[0014] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the first level voltage (Vdd) is a positive voltage, the fourth level voltage (Vss) is zero, and the second level voltage (Vcom) is a negative voltage.
[0015] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the first ESD protection unit includes a power supply ESD clamping circuit.
[0016] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for a microdevice, the first ESD protection unit includes a MOS transistor; the gate of the first ESD protection unit is connected to the source of the first ESD protection unit and a second level voltage (Vcom); the drain of the first ESD protection unit is connected to a first level voltage (Vdd); and the first ESD protection unit has parasitics on the MOS transistor.
[0017] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the MOS transistor is an NMOS.
[0018] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the first ESD protection unit includes:
[0019] Type 1 semiconductor substrate;
[0020] A first-type well region is formed in a first-type semiconductor substrate;
[0021] A second type of well forms around the first type of well region;
[0022] A second-type deep well is formed at the bottom of the second-type well and at the bottom of the first-type well region;
[0023] A second-type source pole is formed in a first-type well region;
[0024] A second-type drain is formed in the first-type well region;
[0025] The first injection region is formed next to the second type drain;
[0026] A gate, formed on a portion of a first-type well region between a second-type source and a second-type drain, and connected to the second-type source and the first implantation region; and
[0027] A second injection region is formed next to the second type of trap.
[0028] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the first type is P-type, the second type is N-type, the first injection region is the first P+ injection region, and the second injection region is the second P+ injection region.
[0029] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system of the microdevice, the second type well and the second type drain are connected to a first level voltage (Vdd), the second implantation region is connected to a fourth level voltage (Vss), and the first implantation region, the second type source, and the gate are connected to a second level voltage (Vcom).
[0030] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, at least one microLED pixel is a microLED pixel array, and a pixel driver circuit controls the turning on or off of each microLED pixel in the microLED pixel array.
[0031] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, a first ESD protection unit is connected to each micro LED pixel.
[0032] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the micropixel driver circuit is connected to a first level voltage (Vdd) and the microLED pixel.
[0033] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the system further includes a second ESD protection unit connected to a first level voltage (Vdd) and a fourth level voltage (Vss).
[0034] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, a first ESD protection unit and a second ESD protection unit are formed in a semiconductor substrate.
[0035] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the second ESD protection unit includes a plurality of second ESD sub-clamping circuits; wherein a first terminal of each second ESD sub-clamping circuit is connected to a first level voltage (Vdd) and a pixel driver circuit, a second terminal of each second ESD sub-clamping circuit is connected to a fourth level voltage (Vss); and the second ESD sub-clamping circuits are connected in parallel with each other.
[0036] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the second ESD protection unit includes a power rail ESD clamping circuit.
[0037] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the microdevices are selected from micro inorganic LED devices or micro organic LED devices; and the micro LED pixels are selected from inorganic micro LEDs or organic micro LEDs.
[0038] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the system further includes a third ESD protection unit; and a first terminal of the third ESD protection unit is connected to a first voltage level (Vdd), and a second terminal of the third ESD protection unit is connected to a fourth voltage level (Vss).
[0039] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, a third ESD protection unit is connected to the input / output circuit.
[0040] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the third ESD protection unit includes at least two third ESD sub-clamping circuits; and the third ESD sub-clamping circuits are connected in series with each other.
[0041] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, a first terminal of the micro pixel driver circuit is connected to a third level voltage (Vdd), and a second terminal of the micro pixel driver circuit is connected to a micro LED pixel.
[0042] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the system further includes a fourth ESD protection unit; and a first terminal of the fourth ESD protection unit is connected to a third level voltage (Vdd), while a second terminal of the fourth ESD protection unit is connected to a fourth level voltage (Vss).
[0043] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the fourth level voltage (Vss) is less than the third level voltage (Vdd).
[0044] In some exemplary embodiments or any combination of exemplary embodiments of the ESD protection system for microdevices, the pixel driver circuit includes at least one switch.
[0045] The display devices and systems disclosed in this paper are designed to reduce ESD damage, improving the light emission efficiency and overall performance of the display system. Therefore, implementations of display systems with microlens arrays are better suited to meet the display requirements of augmented reality (AR) and virtual reality (VR), head-up displays (HUDs), mobile device displays, wearable device displays, high-definition projectors, and automotive displays compared to conventional displays.
[0046] Note that the various embodiments described above can be combined with any other embodiments described herein. The features and advantages described in the specification are not exhaustive, and in particular, many additional features and advantages will be apparent to those skilled in the art from the accompanying drawings, specification, and claims. Furthermore, it should be noted that the language used in the specification has been chosen primarily for readability and instruction purposes and is not intended to define or limit the subject matter of the invention. Attached Figure Description
[0047] To gain a more detailed understanding of this disclosure, reference can be made to the features of various embodiments, some of which are illustrated in the accompanying drawings. However, the drawings only illustrate relevant features of this disclosure and should not be considered limiting, as the specification may allow for other valid features.
[0048] For convenience, "up" is used to indicate the substrate away from the light-emitting structure, "down" indicates the direction towards the substrate, and other directional terms such as top, bottom, above, below, under, and below are explained accordingly.
[0049] Figure 1 The illustration shows a schematic block diagram of an electrostatic discharge (ESD) protection system for a microdisplay according to some embodiments.
[0050] Figure 2 The diagram illustrates a circuit diagram of an ESD protection system for a microdisplay according to some embodiments.
[0051] Figure 3 The diagram illustrates a circuit diagram of an ESD protection unit according to some embodiments.
[0052] Figure 4 The illustration shows a cross-sectional view of an ESD protection unit according to some embodiments.
[0053] Figure 5 The diagram illustrates a circuit diagram of an ESD protection system for a microdisplay according to some embodiments.
[0054] By convention, the various features shown in the accompanying drawings may not be drawn to scale. Therefore, for clarity, the dimensions of various features may be arbitrarily enlarged or reduced. Additionally, some drawings may not depict all components of a given system, method, or apparatus. Finally, the same reference numerals may be used to denote the same features throughout the specification and drawings. Detailed Implementation
[0055] Numerous details are described herein to provide a thorough understanding of the exemplary embodiments illustrated in the accompanying drawings. However, some embodiments may be practiced without many specific details, and the scope of the claims is limited only to those features and aspects specifically set forth in the claims. Furthermore, well-known processes, components, and materials are not described exhaustively so as not to unnecessarily obscure relevant aspects of the embodiments described herein.
[0056] As discussed above, in order to address the problems in the related art, an ESD protection system for microdevices is provided in some embodiments of this disclosure. Figure 1 The illustration shows a schematic block diagram of an electrostatic discharge (ESD) protection system for a microdisplay according to some embodiments.
[0057] Figure 2 The diagram illustrates a circuit diagram of an ESD protection system for a microdisplay according to some embodiments.
[0058] Reference Figure 1 and Figure 2 The ESD protection system for the microdevice includes a pixel driver circuit 01 and a first ESD protection unit 021. The pixel driver circuit 01 is electrically connected to at least one micro-LED pixel 00 and is used to control the on / off state of at least one micro-LED pixel 00. Here, the micro-LED pixel 00 is also electrically connected to a second voltage level 04 (Vcom). The first ESD protection unit 021 is electrically connected to a first voltage level 03 (Vdd) and a second voltage level 04 (Vcom). One end of the micro-pixel driver circuit 01 is connected to a third voltage level 05 (Vdd), and the other end of the micro-pixel driver circuit 01 is connected to the micro-LED pixel 00. In another embodiment, one end of the micro-pixel driver circuit 01 is connected to the first voltage level 03 (Vdd), and the other end of the micro-pixel driver circuit 01 is connected to the micro-LED pixel 00.
[0059] Figure 5 The figure illustrates a circuit diagram of an ESD protection system for a microdisplay according to some embodiments. (Refer to...) Figure 5 and Figures 1 to 2 , Figure 1The ESD protection system further includes a second ESD protection unit 022 and a third ESD protection unit 023. One end of the second ESD protection unit 021 is connected to a first voltage level 03 (Vdd), and the other end is connected to a fourth voltage level 07 (Vss). Similarly, one end of the third ESD protection unit 023 is connected to the first voltage level 03 (Vdd), and the other end is connected to the fourth voltage level 07 (Vss). Furthermore, the second ESD protection unit 023 includes at least two second ESD sub-clamping circuits 0221 and 0222. Preferably, the second ESD sub-clamping circuits are connected in parallel. Here, one end of each second ESD sub-clamping circuit 0221, 0222 is connected to the first voltage level 03 (Vdd), and the other end is connected to the fourth voltage level 07 (Vss).
[0060] Figure 3 The diagram illustrates a circuit diagram of an ESD protection unit according to some embodiments. For example... Figure 3 As shown, the second ESD sub-clamping circuits 0221 and 0222 are formed by a grounded gate N-type metal-oxide-semiconductor (NMOS) ESD network, which can be referenced... Figure 3 . Figure 3 This is an exemplary illustration of a power pin ESD network composed of ground-gate n-channel metal-oxide-semiconductor field-effect transistor (MOSFET) devices. In some embodiments, Figure 3 The left-hand structure 022L is the actual power supply clamping circuit, while Figure 3 The right structure 022R in the diagram illustrates the principle of a power supply clamping ESD protection system. A ground-gate N-type metal-oxide-semiconductor (NMOS) ESD network (such as 022L) is used in complementary metal-oxide-semiconductor (CMOS) technology. Typically, it is an n-channel MOSFET with a MOSFET drain connected to a power supply pin 302 with V'DD. The n-channel MOSFET also connects its source and gate to a ground power rail 304. This circuit remains "off" during normal operation. When the signal pin 302 exceeds the MOSFET fast-return voltage, the circuit discharges to the V'SS power rail. In some instances, the fast-return voltage is the voltage applied to the transistor when avalanche breakdown or impact ionization in the transistor provides sufficient base current to turn it on. When the voltage at the signal pin 302 falls below ground potential, the MOSFET drain is forward biased to the p-well or p-substrate region for electrostatic protection.
[0061] Reference Figure 5An input / output (I / O) circuit 06 is formed next to the pixel driver circuit 01 for receiving signals from external circuitry. A third ESD protection unit 023 is connected to the I / O circuit 06 to perform ESD protection on the I / O circuit 06. In another embodiment, the I / O circuit 06 may be formed around the pixel driver circuit 01 or around the micro-LED pixel 00. The third ESD protection unit 023 includes at least two third ESD sub-clamping circuits connected in series with each other, such as third ESD sub-clamping circuits 0231 and 0232. In some examples, the third ESD sub-clamping circuit 0231 is a PMOS and the third ESD sub-clamping circuit 0232 is an NMOS. One end of one third ESD sub-clamping circuit 0231 is connected to a first voltage level 03 (Vdd), the other end of the third ESD sub-clamping circuit 0231 is connected to another third ESD sub-clamping circuit 0232, and the third ESD sub-clamping circuit 0232 is connected to a fourth voltage level 07 (Vss). Furthermore, the gate and source of the third ESD sub-clamping circuit 0231 are connected to the first level voltage 03 (Vdd), the drain of the third ESD sub-clamping circuit 0231 is connected to the source of the third ESD sub-clamping circuit 0232, and the gate and drain of the third ESD sub-clamping circuit 0232 are connected to the fourth level voltage 07 (Vss). The IO circuit 06 is connected to the drain of the third ESD sub-clamping circuit 0231 and the source of the third ESD sub-clamping circuit 0232.
[0062] Preferably, in some embodiments, the first voltage level 03 (Vdd) is greater than the second voltage level 04 (Vcom). The first voltage level 03 (Vdd) is greater than the third voltage level 05 (Vdd"). The fourth voltage level 07 (Vss) is greater than the second voltage level 04 (Vcom). Furthermore, the first voltage level 03 (Vdd) is greater than the fourth voltage level 07 (Vss). Because the micro-LED pixel 00 can operate at high voltage values, the second voltage level 04 (Vcom) is a negative voltage applied to the micro-LED pixel 00. In some embodiments, preferably, the first voltage level 03 (Vdd) is a positive voltage, the third voltage level 05 (Vdd") is a positive voltage, and the fourth voltage level 07 (Vss) is zero. For example, the voltage of Vdd can be from 1V to 3V, the voltage of Vdd" can be from 1V to 2V, the voltage of Vss can be 0V, and the voltage of Vcom can be from -5V to 0V.
[0063] Reference Figure 2 and Figure 5 In some embodiments, the ESD protection system further includes a fourth ESD protection unit 024. One end of the fourth ESD protection unit 024 is connected to a third level voltage 05 (Vdd), while the other end of the fourth ESD protection unit 024 is connected to a fourth level voltage 07 (Vss).
[0064] In some embodiments, the second ESD protection unit 022, the third ESD protection unit 023, and the fourth ESD protection unit 024 are power rail ESD clamping circuits, which can be referred to Figure 3 The description.
[0065] Reference Figure 5 and Figure 2 Here, the first ESD protection unit 021 is a negative power supply ESD clamping circuit. The first ESD protection unit 021 includes a MOS transistor. Furthermore, the first ESD protection unit has a parasitic diode on the MOS transistor. The gate of the first ESD protection unit 021 is connected to the drain of the first ESD protection unit 021 and the second level voltage 04 (Vcom). The source of the first ESD protection unit 021 is connected to the first level voltage 03 (Vdd). A parasitic diode is parasitic on the MOS transistor. In some embodiments, when the second level voltage 04 (Vcom) is negative and the MOS transistor is preferably NMOS, the cathode of the micro-LED pixel 00 is connected to the second level voltage 04 (Vcom).
[0066] Reference Figure 5 The pixel driver circuit 01 includes at least one switch, such as switches 011, 012, and 013. Preferably, switches 011, 012, and / or 013 are formed by transistors. Switches 011, 012, and 013 are connected in series to achieve three levels of control over the micro-LED pixels to turn on or off, thereby controlling the luminous intensity and luminous duration. For example, switches 011, 012, and 013 are connected in series to control the current of the micro-pixel driver circuit 01 to be turned on or off, control the PWM signal from an external circuit to be turned on or off, and control the scan signal from an external circuit to be turned on or off, respectively.
[0067] In some embodiments, Figure 1 and Figure 2 The micro LED pixel 00 shown can be replaced by a micro LED pixel array, and Figure 1 and Figure 2 The pixel driver circuit 01 controls the on / off state of each micro-LED pixel in the micro-LED pixel array. Preferably, the first ESD protection unit 021 is connected to each micro-LED pixel 00. In another embodiment, the first ESD protection unit 021 may include at least two first ESD sub-clamping circuits, and each of the first ESD sub-clamping circuits is respectively connected to a second level voltage 04 (Vcom) and connected to a first level voltage 03 (Vdd).
[0068] The first ESD protection unit, the second ESD protection unit, the third ESD protection unit, and the fourth ESD protection unit are formed in the semiconductor substrate. Figure 4 The illustration shows a cross-sectional view of an ESD protection unit according to some embodiments. Figure 4 The cross-sectional structure of an ESD protection unit, such as the first ESD protection unit 021, is shown. Figure 4 The semiconductor substrate 400 can be a first type of semiconductor substrate, such as a silicon substrate. In some embodiments, the first ESD protection unit 021 includes: a first type well region 403, a second type well 401, a second type deep well 402, a second type drain 404, a second type source 405, a first implantation region 406, a gate 408, and a second implantation region 407. Furthermore, the first type well region 403 is formed in the first type semiconductor substrate 400. The second type well 401 is formed around the first type well region 403. The second type deep well 402 is formed at the bottom of the second type well 401 and at the bottom of the first type well region 403. The second type drain 404 is formed in the first type well region 403, and the second type source 405 is formed in the first type well region 403. The first implantation region 406 is formed next to the second type source 405. A gate 408 is formed on a portion of a first-type well region 403 between a second-type drain 404 and a second-type source 405, and is connected to the second-type source 405 and a first injection region 406. A second injection region 407 is formed next to a second-type shallow well 401.
[0069] In some examples, the first type is type P and the second type is type N, which will not be limited to the scope of this disclosure. Figure 4 As shown, in some embodiments, an N-deep well 402 is formed in a first-type substrate 400, and an N-well 401 is formed on and around the top edge of the N-deep well 402, thereby forming a P-type well region 403 surrounded by the N-well 401. The N-deep well 402 is formed at the bottom of the N-well 401 and the bottom of the P-type well region 403. An N+ drain 404 and an N+ source 405 are formed in the P-type well region 403. A gate 408 is formed on a portion of the P-type well region 403 between the N+ drain 404 and the N+ source 405. The gate 408 is connected to the N+ source 405 and a first P+ implantation region 406. The first P+ implantation region 406 is formed in the P-type well region 403 and close to the N+ source 405. A second P+ implantation region 407 is formed next to or around the N-well 401. Furthermore, the N+ drain 404 and N-well 401 are connected to the first voltage level 03 (Vdd). The second P+ injection region 407 is connected to the fourth voltage level 07 (Vss). The N+ source 405, the first P+ injection region 406, and the gate 408 are connected to the second voltage level 04 (Vcom), for example... Figure 1 and Figure 2Vcom 04 in the diagram. In some instances, the second P+ injection region 407 is connected to Vss as ground. In some embodiments, the gate 408 may be a gate structure comprising several material layers such as a dielectric layer, spacers, etc. Gate 408 is a conventional gate structure, which will be understood by those skilled in the art and will not be described herein.
[0070] In some embodiments, a microdevice having one or more ESD protection units (e.g., such as...) Figure 5 The micro LEDs shown are selected from a combination of micro-inorganic LED devices and / or micro-organic LED devices. In some embodiments, the micro LED pixel 00 is selected from inorganic micro LEDs or organic micro LEDs. For example, the micro device can be a micro display panel. The micro LED display panel includes a micro LED array forming a pixel array, such as a 640*480 pixel array. In some embodiments, the length of the micro LED display panel cannot exceed 100, 200, 300, 400, or 500 micrometers, and the width of the micro LED display panel cannot exceed 100, 200, 300, 400, or 500 micrometers. In some embodiments, the length of the micro LED display panel cannot exceed 1 cm, and the width of the micro LED display panel cannot exceed 1 cm. In some embodiments, the length of the micro LED display panel cannot exceed 2 cm, and the width of the micro LED display panel cannot exceed 2 cm. In some embodiments, the length of the micro LED display panel cannot exceed 10 cm, and the width of the micro LED display panel cannot exceed 10 cm. In some embodiments, the length of the micro LED display panel cannot exceed 20 cm, and the width of the micro LED display panel cannot exceed 20 cm. The micro LED display panel also includes an IC backplane. The micro-LED display plane includes a micro-LED array comprising multiple inorganic micro-LEDs to display an image. The micro-LED array is electrically connected and bonded to an IC backplane. A first ESD protection unit 021, a second ESD protection unit 022, a third ESD protection unit 023, and a fourth ESD protection unit 024, along with a pixel driver circuit 01, are formed in the IC backplane. In some embodiments, the ESD protection units are part of the IC circuitry and are used to protect the IC circuitry under electrostatic discharge conditions. The ESD protection units prevent current leakage from the IC circuitry in the IC backplane.
[0071] Here, the micro-LEDs can be selected from inorganic LEDs or organic LEDs. On the IC backplane, electrode connection areas are electrically connected to the micro-LED array, and signal line areas are formed around the electrode connection areas. The IC backplane acquires signals such as image data from the outside via the signal lines to control the illumination of the corresponding micro-LEDs. The IC backplane typically employs an 8-bit digital-to-analog converter (DAC). An 8-bit DAC has 256 levels of performance, and each level corresponds to a gray level; that is, an 8-bit DAC can provide 256 different gray levels. Since any of the 256 gray levels can be applied to the micro-LEDs, a gray level ranging from 0 to 255 can be displayed by a single pixel. Optionally, the brightness value of the micro-LEDs can be controlled by the voltage or current amplitude of the signal acquired by the IC backplane, while the gray levels can be indicated by the time interval of the signal (e.g., pulse width).
[0072] Those skilled in the art should understand that microdisplay panels are not limited to the above-described structure and may include more or fewer components than those illustrated, or may combine some components, or may use different components.
[0073] Those skilled in the art will understand that all or part of the steps used to implement the foregoing embodiments can be implemented by hardware, or by a program that instructs the relevant hardware. This program can be stored in flash memory, conventional computer equipment, a central processing module, a control module, etc.
[0074] The above description is merely an embodiment of this disclosure, and this disclosure is not limited thereto. Modifications, equivalent substitutions, and improvements made without departing from the concepts and principles of this disclosure will fall within the protection scope of this disclosure.
[0075] Other embodiments also include, for example, including, Figures 1 to 5 The embodiments shown are subsets of the above embodiments combined or rearranged in various other embodiments.
[0076] While the detailed description contains many details, these should not be construed as limiting the scope of the invention, but merely as illustrating different examples and aspects of the invention. It should be understood that the scope of the invention includes other embodiments not discussed in detail above. For example, the methods described above can be applied to the integration of non-LED and OLED functional devices with control circuitry that is not pixel driver. Examples of non-LED devices include vertical-cavity surface-emitting lasers (VCSELs), photodetectors, microelectromechanical systems (MEMS), silicon photonic devices, power electronic devices, and distributed feedback lasers (DFBs). Examples of other control circuitry include current drivers, voltage drivers, transimpedance amplifiers, and logic circuits.
[0077] The foregoing description of the disclosed embodiments is provided to enable making or using the embodiments and variations thereof described herein. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein can be applied to other embodiments without departing from the spirit or scope of the subject matter disclosed herein. Therefore, this disclosure is not intended to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the following claims and the principles and novel features disclosed herein.
[0078] The features of this invention can be implemented using a computer program product or with the aid of a computer program product, such as a storage medium (of various media) or a computer-readable storage medium (of various media), wherein instructions are stored thereon or thereon, which can be used to program a processing system to perform any of the features presented herein. The storage medium may include, but is not limited to, high-speed random access memory, such as DRAM, SRAM, DDRRAM, or other random access solid-state memory devices, and may include non-volatile memory, such as one or more disk storage devices, optical disk storage devices, flash memory devices, or other non-volatile solid-state memory devices. The memory may optionally include one or more storage devices located remotely from the CPU. The non-volatile memory devices within the memory or optionally the memory include non-transitory computer-readable storage media.
[0079] Features of the invention, stored on any machine-readable medium (of various kinds), can be contained in software and / or firmware for controlling the hardware of a processing system and enabling the processing system to interact with other entities using the results of the invention. Such software or firmware may include, but is not limited to, application code, device drivers, operating systems, and execution environments / containers.
[0080] It should be understood that although the terms “first,” “second,” etc., may be used in this document to describe various elements or steps, these elements or steps should not be limited by these terms. These terms are only used to distinguish one element or step from another.
[0081] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the claims. As used in the description of the embodiments and the appended claims, the singular forms “a,” “an,” and “this” are intended to include multiple forms as well, unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used herein refers to and includes any and all possible combinations of one or more of the associated listed items. It should also be understood that the terms “comprising” and / or “including”, when used in this specification, specify the presence of said features, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups.
[0082] As used herein, the term "if" can be interpreted as meaning, depending on the context, that the prerequisite of a statement is true "in the case of," "when," or "in response to detection." Similarly, the phrases "if it is determined that [the prerequisite of that statement is true]," "if [the prerequisite of the statement is true]," or "when [the prerequisite of the statement is true]" can be interpreted as meaning, depending on the context, that the stated prerequisite is true "when determined," "in response to determined," "according to determined," "when detected," or "in response to detection."
[0083] The foregoing description, used for illustration, has been described with reference to specific embodiments. However, the foregoing illustrative discussion is not intended to be exhaustive or to limit the claims to the precise forms disclosed. Many modifications and variations can be made in light of the foregoing teachings. The embodiments were chosen and described in order to best explain the principles of practical application and operation, thereby enabling others skilled in the art to best utilize the invention and its various embodiments.
Claims
1. An electrostatic discharge (ESD) protection system for a microdevice, comprising: A pixel driver circuit, electrically connected to at least one micro LED pixel, is used to control the micro LED pixel to turn on or off, wherein the micro LED pixel is electrically connected to a second voltage level. as well as The first ESD protection unit is electrically connected to the first voltage level and the second voltage level; The first ESD protection unit is also connected to a fourth voltage level, which is higher than the second voltage level and the first voltage level is higher than the fourth voltage level.
2. The ESD protection system for a microdevice according to claim 1, wherein the cathode of the micro LED pixel is connected to the second voltage level.
3. The ESD protection system for a microdevice according to claim 1, wherein the first level voltage is a positive voltage, the fourth level voltage is zero, and the second level voltage is a negative voltage.
4. The ESD protection system for microdevices according to claim 1, wherein, The first ESD protection unit includes a power supply ESD clamping circuit.
5. The ESD protection system for a microdevice according to claim 1, wherein the first ESD protection unit comprises a MOS transistor; The gate of the first ESD protection unit is connected to the source of the first ESD protection unit and the second level voltage; The drain of the first ESD protection unit is connected to the first voltage level; and the first ESD protection unit has parasitic properties on the MOS transistor.
6. The ESD protection system for a microdevice according to claim 5, wherein the MOS transistor is an NMOS.
7. The ESD protection system for microdevices according to claim 1, wherein the first ESD protection unit comprises: Type 1 semiconductor substrate; A first type of well region is formed in a first type of semiconductor substrate; A second type of well is formed around the first type of well region; A second type of deep well is formed at the bottom of the second type of well and at the bottom of the first type of well region; The second type of source is formed in the first type of well region; A second type of drain is formed in the first type of well region; The first injection region is formed next to the second type of drain; A gate is formed on the first type well region between the second type source and the second type drain, and is connected to the second type source and the first implantation region; as well as The second injection region is formed next to the second type of trap.
8. The ESD protection system for microdevices according to claim 7, wherein, The first type is P-type, the second type is N-type, the first injection region is the first P+ injection region, and the second injection region is the second P+ injection region.
9. The ESD protection system for microdevices according to claim 7, wherein, The second type of well and the second type of drain are connected to the first level voltage, the second injection region is connected to the fourth level voltage, and the first injection region, the second type of source, and the gate are connected to the second level voltage.
10. The ESD protection system for a microdevice according to claim 1, wherein the at least one micro LED pixel is a micro LED pixel array, and the pixel driver circuit controls the turning on or off of each of the micro LED pixels in the micro LED pixel array.
11. The ESD protection system for a microdevice according to claim 9, wherein the first ESD protection unit is connected to each of the micro LED pixels.
12. The ESD protection system for a microdevice according to claim 1, wherein the pixel driver circuit is connected to the first voltage level and the micro LED pixel.
13. The ESD protection system for a microdevice according to claim 1, wherein the system further comprises a second ESD protection unit, and the second ESD protection unit is connected to the first voltage level and the fourth voltage level.
14. The ESD protection system for a microdevice according to claim 13, wherein the first ESD protection unit and the second ESD protection unit are formed in a semiconductor substrate.
15. The ESD protection system for a microdevice according to claim 13, wherein the second ESD protection unit comprises a plurality of second ESD sub-clamping circuits; wherein a first terminal of each second ESD sub-clamping circuit is connected to the first level voltage and the pixel driver circuit, and a second terminal of each second ESD sub-clamping circuit is connected to the fourth level voltage; and the second ESD sub-clamping circuits are connected in parallel with each other.
16. The ESD protection system for a microdevice according to claim 14, wherein the second ESD protection unit includes a power rail ESD clamping circuit.
17. The ESD protection system for microdevices according to claim 1, wherein the microdevice is selected from micro inorganic LED devices or micro organic LED devices; and the micro LED pixel is selected from inorganic micro LEDs or organic micro LEDs.
18. The ESD protection system for a microdevice according to claim 1, wherein the system further comprises a third ESD protection unit, a first terminal of the third ESD protection unit being connected to the first voltage level and a second terminal of the third ESD protection unit being connected to a fourth voltage level.
19. The ESD protection system for a microdevice according to claim 18, wherein the third ESD protection unit is connected to the input / output circuit.
20. The ESD protection system for a microdevice according to claim 18, wherein the third ESD protection unit comprises at least two third ESD sub-clamping circuits; and the third ESD sub-clamping circuits are connected in series with each other.
21. The ESD protection system for a microdevice according to claim 1, wherein a first terminal of the pixel driver circuit is connected to a third-level voltage, and a second terminal of the pixel driver circuit is connected to the micro LED pixel.
22. The ESD protection system for a microdevice according to claim 21, wherein the system further comprises a fourth ESD protection unit, and a first terminal of the fourth ESD protection unit is connected to a third voltage level and a second terminal of the fourth ESD protection unit is connected to a fourth voltage level.
23. The ESD protection system for a microdevice according to claim 22, wherein the fourth level voltage is lower than the third level voltage.
24. The ESD protection system for a microdevice according to claim 1, wherein the pixel driver circuit includes at least one switch.
Citation Information
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