Sapphire substrate double-sided high-efficiency polishing device and polishing method

Abstract

The present invention discloses a sapphire substrate double-sided high-efficiency polishing device and a polishing method thereof, and relates to the technical field of substrate polishing, in order to solve the problem that most of the existing sapphire substrates are polished on one side, and the polishing of the other side needs to be removed and reinstalled, which is time-consuming and labor-intensive, and the overall structure is large, the flexibility is poor, and the polishing efficiency is low. A positioning seat is arranged at the upper end of the base, and the positioning seat is welded and fixed to the base, a rotating groove is arranged on the upper surface of the positioning seat, and the rotating groove and the positioning seat are an integral structure, a rotating seat is arranged inside the rotating groove, a mounting seat is arranged at the upper end of the rotating seat, and the mounting seat and the rotating seat are an integral structure, a rotating shaft is arranged at both ends of the rotating seat, and one end of the rotating shaft is inserted into the inner wall of the rotating groove, the rotating seat is rotatably connected to the positioning seat through the rotating shaft, and connecting seats are arranged on both sides of the rear of the positioning seat.

Description

Technical Field

[0001] The invention relates to the technical field of substrate polishing, in particular to a sapphire substrate double-sided high-efficiency polishing device and a polishing method thereof. Background Art

[0002] Sapphire substrates are mainly used to make LED chips. The production technology of sapphire substrates is mature and the device quality is good. Secondly, sapphire has good stability and can be used in high-temperature growth processes. Finally, sapphire has high mechanical strength and is easy to handle and clean. The surface needs to be polished when used.

[0003] For example, the Chinese authorized patent with announcement number CN218746944U (sapphire substrate polishing device): includes a supporting seat and a mounting table, the supporting seat is provided with a plurality of suction hole groups arranged circumferentially, the suction holes in each suction hole group are arranged in a circle, the bottom of the supporting seat is provided with a plurality of pipes respectively connected to the plurality of suction hole groups, the other end of the pipe is connected to an air pressure pump through an electromagnetic valve, a lifting device is provided on the mounting table, and a polishing disc and a driving device for driving the polishing disc to rotate are installed at the movable end of the lifting device; the sapphire substrate is placed against the suction hole group, the air pressure pump is started to generate negative pressure in the suction hole, so that the sapphire substrate is pressed against the supporting seat, and then the lifting device and the driving device are started to make the polishing disc polish the ceramic sheet, so that the sapphire substrate is conveniently fixed.

[0004] Most of the existing sapphire substrates are polished on one side, and polishing the other side requires removal and reinstallation, which is time-consuming and labor-intensive. In addition, the overall structure is large, the flexibility is poor, and the polishing efficiency is low. Therefore, we provide a sapphire substrate double-sided high-efficiency polishing device and a polishing method. Summary of the invention

[0005] The purpose of the present invention is to provide a sapphire substrate double-sided high-efficiency polishing device and a polishing method thereof, so as to solve the problem raised in the above background technology that most of the existing sapphire substrates are polished on one side, and polishing the other side requires removal and reinstallation, which is time-consuming and labor-intensive, and the overall structure is large, the flexibility is poor, and the polishing efficiency is low.

[0006] To achieve the above-mentioned objectives, the present invention provides the following technical solutions: a sapphire substrate double-sided high-efficiency polishing device, comprising a base, a positioning seat is provided at the upper end of the base, and the positioning seat is welded and fixed to the base, a rotating groove is provided on the upper surface of the positioning seat, and the rotating groove and the positioning seat are an integral structure, a rotating seat is provided inside the rotating groove, a mounting seat is provided at the upper end of the rotating seat, and the mounting seat and the rotating seat are an integral structure, rotating shafts are provided at both ends of the rotating seat, and one end of the rotating shaft is inserted into the inner wall of the rotating groove, the rotating seat is rotatably connected to the positioning seat through the rotating shaft, connecting seats are provided on both sides of the rear of the positioning seat, connecting grooves are provided inside the two connecting seats, and the connecting grooves are open on three sides, a first rotating arm and a second rotating arm are respectively provided inside the two connecting grooves, and the first rotating arm and the second rotating arm both rotate with the connecting groove.

[0007] Preferably, a through hole is provided inside the rotating shaft, and the through hole passes through the rotating shaft and the rotating seat, a first square slot is provided inside the positioning seat, and the first square slot passes through the positioning seat, a first square pin is provided at the front end of the first square slot, and the first square pin passes through the first square slot.

[0008] Preferably, a second square slot is provided inside the first rotating arm and the second rotating arm, and the second square slot passes through the first rotating arm, the second rotating arm and the connecting seat, and a second square pin is provided at one end of the second square slot, and one end of the second square pin passes through the second square slot.

[0009] Preferably, a first vertical arm is provided at the upper end of the first rotating arm, a first connecting arm is provided at one end of the first vertical arm, a first polishing motor is provided at one end of the first connecting arm, and a first polishing disc is provided at one end of the first polishing motor.

[0010] Preferably, a second vertical arm is provided at the upper end of the second rotating arm, a second connecting arm is provided at one end of the second vertical arm, a second polishing motor is provided at one end of the second connecting arm, and a second polishing disc is provided at one end of the second polishing motor.

[0011] Preferably, a push rod groove is provided inside the first vertical arm and the second vertical arm, one end of the push rod groove is open, an electric push rod is provided inside the push rod groove, push rod mounting plates are provided at both ends of the electric push rod, and a single-head fastener is provided on one side of the push rod mounting plate.

[0012] Preferably, a mounting plate is provided on one side of the connecting seat, and the mounting plate is welded and fixed to the connecting seat, a fixing bolt is provided on the upper end of the mounting plate, and the mounting plate is threadedly fixed to the base through the fixing bolt.

[0013] Preferably, a hinge is provided on the other side of the connecting seat, hinge bolts are provided at both ends of the hinge, and the two ends of the hinge are respectively fixed to the base and the connecting seat by the hinge bolts.

[0014] Preferably, a first pad is provided on one side of the positioning seat, and a second pad is provided on the other side of the positioning seat, and both the first pad and the second pad are welded and fixed to the positioning seat.

[0015] Preferably, the polishing method of the sapphire substrate double-sided high-efficiency polishing device comprises the following steps:

[0016] Step 1: Rotate the mounting seat to a vertical state, then insert the first square pin along the first square slot, one end of the first square pin passes through the first square slot, fix the positioning seat and the rotating seat, and then insert the sapphire substrate to be polished into the mounting notch of the mounting seat. If the size is not suitable, put a fixing sleeve on the outside of the sapphire substrate and insert it into the mounting notch through the fixing sleeve;

[0017] Step 2: Rotate the first rotating arm and the second rotating arm to a vertical state, insert the second square latch along the second square slot, and the second square latch also passes through the first rotating arm and the second rotating arm to fix the first rotating arm and the second rotating arm. At this time, the first polishing plate and the second polishing plate are respectively located on both sides of the sapphire substrate, and the electric push rods inside the first vertical arm and the second vertical arm respectively drive the first connecting arm and the second connecting arm to move, so as to adjust the distance between the first polishing plate and the second polishing plate and the sapphire substrate;

[0018] Step 3: After the first polishing disc and the second polishing disc are in contact with the surface of the sapphire substrate, the first polishing motor and the second polishing motor are started to respectively drive the first polishing disc and the second polishing disc to rotate, thereby simultaneously polishing both sides of the sapphire substrate;

[0019] Step 4: When single-sided polishing is required, rotate the mounting seat to a horizontal state so that it contacts the first pad, then insert the first square pin to fix it, and rotate the connecting seat connected to the second rotating arm along the hinge. At this time, the second polishing disc is upward, and then rotate the first rotating arm to a horizontal position. At this time, the first polishing disc is located above the mounting seat. Use the same adjustment and driving method to perform single-sided polishing on the sapphire substrate fixed to the mounting seat. When polishing the other side is required, rotate the mounting seat in the opposite direction, and adjust the rotation direction of the first polishing disc and the second polishing disc in the opposite direction. Then, the second polishing disc can be used to perform single-sided polishing on the sapphire substrate.

[0020] Compared with the prior art, the present invention has the following beneficial effects:

[0021] 1. The present invention provides a positioning seat with a rotating groove at the lower end of the rotating seat, one end of the rotating shaft is inserted into the inner wall of the rotating groove, the rotating seat is rotatably connected with the positioning seat through the rotating shaft to achieve direction adjustment, the mounting seat is rotated, the mounting seat is rotated to a vertical state, and then the first square latch is inserted along the first square slot, one end of the first square latch passes through the first square slot to fix the positioning seat and the rotating seat, the first rotating arm and the second rotating arm are rotated, the first rotating arm and the second rotating arm are rotated to a vertical state, and the second square latch is inserted along the second square slot. At this time, the second square latch also passes through the first rotating arm and the second rotating arm to fix the first rotating arm and the second rotating arm. At this time, the first polishing disc and the second polishing disc are respectively located on both sides of the sapphire substrate, and the electric push rods inside the first vertical arm and the second vertical arm respectively drive the first connecting arm and the second connecting arm to move, so as to adjust the distance between the first polishing disc and the second polishing disc and the sapphire substrate. When the first polishing disc and the second polishing disc are in contact with the surface of the sapphire substrate, the first polishing motor is started. The first polishing disc and the second polishing disc are driven by the second polishing motor to rotate respectively, and the double-sided surfaces of the sapphire substrate are polished at the same time to improve the polishing efficiency. When single-sided polishing is required, the mounting seat is rotated to a horizontal state so as to contact the first pad, and then the first square pin is inserted to fix it. The connecting seat connected to the second rotating arm is rotated along the hinge. At this time, the second polishing disc is upward in height, and then the first rotating arm is rotated to a horizontal position. At this time, the first polishing disc is located above the mounting seat. The same adjustment and driving method is used to polish the single side of the sapphire substrate fixed to the mounting seat. When the other side needs to be polished, the mounting seat is rotated in the opposite direction, and the rotation direction of the first polishing disc and the second polishing disc is also adjusted in the opposite direction, so that the second polishing disc can be used to polish the single side of the sapphire substrate. The whole is achieved through a polishing device by relying on the rotation adjustment method to realize double-sided and single-sided polishing operations, and the two-sided adjustment polishing can be performed without disassembling the sapphire substrate, thereby improving the polishing efficiency and flexibility.

[0022] 2. By arranging the first square latch, the second square latch, the first square slot, the second square slot and the through hole into square shapes, compared with the existing round latch, the four sides of the square latch are perpendicular to each other. After the first square latch and the second square latch are respectively inserted into the first square slot and the second square slot, a limiting effect will be achieved to prevent the first square latch and the second square latch from rotating. In this way, the rotating seat, the first rotating arm and the second rotating arm are fixed to prevent rotation. The latch also facilitates quick disassembly and fixation, thereby improving the flexibility and quickness of the operation of the rotating seat, the first rotating arm and the second rotating arm. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0024] Figure 2 It is a schematic diagram of the overall front view structure of the present invention;

[0025] Figure 3 It is a schematic diagram of the mounting seat structure of the present invention;

[0026] Figure 4 It is a schematic diagram of the internal structure of the first vertical arm of the present invention;

[0027] Figure 5 It is a schematic diagram of the left side structure of the connecting seat of the present invention;

[0028] In the figure: 1, base; 2, positioning seat; 3, rotating groove; 4, rotating seat; 5, mounting seat; 6, first square slot; 7, first square latch; 8, first pad; 9, second pad; 10, first polishing disc; 11, second polishing disc; 12, first polishing motor; 13, second polishing motor; 14, first connecting arm; 15, second connecting arm; 16, first vertical arm; 17, second vertical arm; 18, first rotating arm; 19, second rotating arm; 20, connecting seat; 21, connecting groove; 22, second square slot; 23, second square latch; 24, mounting plate; 25, fixing bolt; 26, mounting notch; 27, rotating shaft; 28, through hole; 29, push rod slot; 30, electric push rod; 31, push rod mounting plate; 32, single-head fastener; 33, hinge; 34, hinge bolt. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0030] See also Figure 1-5An embodiment of the present invention provides a sapphire substrate double-sided high-efficiency polishing device, comprising a base 1, a positioning seat 2 is arranged at the upper end of the base 1, and the positioning seat 2 is welded and fixed to the base 1, a rotating groove 3 is arranged on the upper surface of the positioning seat 2, and the rotating groove 3 and the positioning seat 2 are an integral structure, a rotating seat 4 is arranged inside the rotating groove 3, a mounting seat 5 is arranged at the upper end of the rotating seat 4, and the mounting seat 5 and the rotating seat 4 are an integral structure, both ends of the rotating seat 4 are provided with a rotating shaft 27, and one end of the rotating shaft 27 is inserted into the inner wall of the rotating groove 3, and the rotating seat 4 is rotatably connected to the positioning seat 2 through the rotating shaft 27, and connecting seats 20 are arranged on both sides of the rear of the positioning seat 2, and connecting grooves 21 are arranged inside the two connecting seats 20, and the connecting grooves 21 are in the form of three-sided openings, and the first rotating arm 18 and the second rotating arm 19 are respectively arranged inside the two connecting grooves 21, and the first rotating arm 18 and the second rotating arm 19 are Rotating with the connecting groove 21, a through hole 28 is provided inside the rotating shaft 27, and the through hole 28 passes through the rotating shaft 27 and the rotating seat 4, a first square slot 6 is provided inside the positioning seat 2, and the first square slot 6 passes through the positioning seat 2, a first square latch 7 is provided at the front end of the first square slot 6, and the first square latch 7 passes through the first square slot 6, a second square slot 22 is provided inside the first rotating arm 18 and the second rotating arm 19, and the second square slot 22 passes through the first rotating arm 18, the second rotating arm 19 and the connecting seat 20, a second square latch 23 is provided at one end of the second square slot 22, and one end of the second square latch 23 passes through the second square slot 22, a hinge hinge 33 is provided on the other side of the connecting seat 20, hinge bolts 34 are provided at both ends of the hinge hinge 33, and the two ends of the hinge hinge 33 are respectively fixed to the base 1 and the connecting seat 20 by the hinge bolts 34.

[0031] The mounting seat 5 is rotated to a vertical state, and the first rotating arm 18 and the second rotating arm 19 are rotated to a vertical state. At this time, the first polishing disc 10 and the second polishing disc 11 are respectively located on both sides of the sapphire substrate. The first connecting arm 14 and the second connecting arm 15 are respectively driven to move by two electric push rods 30 to adjust the distance between the first polishing disc 10 and the second polishing disc 11 and the sapphire substrate. When the first polishing disc 10 and the second polishing disc 11 are in contact with the surface of the sapphire substrate, the first polishing motor 12 and the second polishing motor 13 are started to respectively drive the first polishing disc 10 and the second polishing disc 11 to rotate, and the sapphire substrate is polished on both sides at the same time. When single-side polishing is required, the mounting seat 5 is rotated to a horizontal state to contact with the first pad 8, and then the first square latch is inserted. 7 is fixed, and the connecting seat 20 connected to the second rotating arm 19 is rotated along the hinge 33. At this time, the second polishing disc 11 is upward in height, and then the first rotating arm 18 is rotated to a horizontal position. At this time, the first polishing disc 10 is located above the mounting seat 5. The sapphire substrate fixed to the mounting seat 5 is single-sided polished using the same adjustment and driving method. When the other side needs to be polished, the mounting seat 5 is rotated in the opposite direction, and the rotation directions of the first polishing disc 10 and the second polishing disc 11 are also adjusted in the opposite direction. Then, the second polishing disc 11 can be used to polish the sapphire substrate on a single side. The whole is achieved through a polishing device by a rotation adjustment method, and double-sided and single-sided polishing operations are realized, and the two-sided adjustment polishing is performed without disassembling the sapphire substrate, thereby improving the polishing efficiency and flexibility.

[0032] Furthermore, a first vertical arm 16 is provided at the upper end of the first rotating arm 18, a first connecting arm 14 is provided at one end of the first vertical arm 16, a first polishing motor 12 is provided at one end of the first connecting arm 14, a first polishing disk 10 is provided at one end of the first polishing motor 12, a second vertical arm 17 is provided at the upper end of the second rotating arm 19, a second connecting arm 15 is provided at one end of the second vertical arm 17, a second polishing motor 13 is provided at one end of the second connecting arm 15, and a second polishing disk 11 is provided at one end of the second polishing motor 13. The first polishing disk 10 and the second polishing disk 11 are respectively driven to rotate by the first polishing motor 12 and the second polishing motor 13 to perform a polishing operation on the sapphire substrate.

[0033] Furthermore, a push rod groove 29 is provided inside the first vertical arm 16 and the second vertical arm 17. One end of the push rod groove 29 is open. An electric push rod 30 is provided inside the push rod groove 29. Push rod mounting plates 31 are provided at both ends of the electric push rod 30. A single-head fastener 32 is provided on one side of the push rod mounting plate 31. The first connecting arm 14 and the second connecting arm 15 are respectively driven to move by the two electric push rods 30 to adjust the distance between the first polishing plate 10 and the second polishing plate 11 and the sapphire substrate.

[0034] See also Figure 1 A mounting plate 24 is provided on one side of the connecting seat 20, and the mounting plate 24 is welded and fixed to the connecting seat 20. A fixing bolt 25 is provided on the upper end of the mounting plate 24, and the mounting plate 24 is threadedly fixed to the base 1 through the fixing bolt 25. When double-sided polishing is performed simultaneously, the mounting plate 24 and the external fixing bolt 25 are used to strengthen the fixing and stabilizing effect of the connecting seat 20.

[0035] See also Figure 1 A first pad 8 is provided on one side of the positioning seat 2, and a second pad 9 is provided on the other side of the positioning seat 2. The first pad 8 and the second pad 9 are welded and fixed to the positioning seat 2, and the first pad 8 and the second pad 9 have a supporting effect on the rotating horizontal mounting seat 5.

[0036] See also Figure 1-5 , a polishing method of a sapphire substrate double-sided high-efficiency polishing device, comprising the following steps:

[0037] Step 1: Rotate the mounting seat 5 to a vertical state, and then insert the first square pin 7 along the first square slot 6. One end of the first square pin 7 passes through the first square slot 6 to fix the positioning seat 2 and the rotating seat 4. Then insert the sapphire substrate to be polished into the mounting notch 26 of the mounting seat 5. If the size is not suitable, put a fixing sleeve on the outside of the sapphire substrate and insert it into the mounting notch 26 through the fixing sleeve.

[0038] Step 2: Rotate the first rotating arm 18 and the second rotating arm 19 to a vertical state, insert the second square latch 23 along the second square slot 22, and the second square latch 23 also passes through the first rotating arm 18 and the second rotating arm 19 to fix the first rotating arm 18 and the second rotating arm 19. At this time, the first polishing plate 10 and the second polishing plate 11 are respectively located on both sides of the sapphire substrate, and the electric push rods 30 inside the first vertical arm 16 and the second vertical arm 17 respectively drive the first connecting arm 14 and the second connecting arm 15 to move, so as to adjust the distance between the first polishing plate 10 and the second polishing plate 11 and the sapphire substrate;

[0039] Step 3: After the first polishing disc 10 and the second polishing disc 11 are in contact with the surface of the sapphire substrate, the first polishing motor 12 and the second polishing motor 13 are started to respectively drive the first polishing disc 10 and the second polishing disc 11 to rotate, thereby simultaneously polishing both sides of the sapphire substrate;

[0040] Step 4: When single-sided polishing is required, rotate the mounting seat 5 to a horizontal state so that it contacts the first pad 8, then insert the first square pin 7 to fix it, and rotate the connecting seat 20 connected to the second rotating arm 19 along the hinge 33. At this time, the second polishing disc 11 is facing upward, and then rotate the first rotating arm 18 to a horizontal position. At this time, the first polishing disc 10 is located above the mounting seat 5. Use the same adjustment and driving method to perform single-sided polishing on the sapphire substrate fixed to the mounting seat 5. When polishing the other side is required, rotate the mounting seat 5 in the opposite direction, and adjust the rotation direction of the first polishing disc 10 and the second polishing disc 11 in the opposite direction. Then, the second polishing disc 11 can be used to perform single-sided polishing on the sapphire substrate.

[0041] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

Claims

1. A sapphire substrate double-sided high-efficiency polishing device, comprising a base (1), characterized in that: A positioning seat (2) is provided at the upper end of the base (1), and the positioning seat (2) is welded and fixed to the base (1); a rotation groove (3) is provided on the upper surface of the positioning seat (2), and the rotation groove (3) and the positioning seat (2) are an integral structure; a rotating seat (4) is provided inside the rotating groove (3); a mounting seat (5) is provided at the upper end of the rotating seat (4), and the mounting seat (5) and the rotating seat (4) are an integral structure; both ends of the rotating seat (4) are provided with a rotating shaft (27), and one end of the rotating shaft (27) is inserted into the inner wall of the rotating groove (3); the rotating seat (4) is connected to the positioning seat (2) via the rotating shaft (27). 2) rotatable connection, the two sides of the rear of the positioning seat (2) are each provided with a connecting seat (20), the interior of the two connecting seats (20) are each provided with a connecting groove (21), and the connecting groove (21) is in the form of a three-sided opening, the interior of the two connecting grooves (21) are respectively provided with a first rotating arm (18) and a second rotating arm (19), and the first rotating arm (18) and the second rotating arm (19) are both rotatable with the connecting groove (21), the interior of the first rotating arm (18) and the second rotating arm (19) are each provided with a second square slot (22), and the second square slot (22) penetrates the first rotating arm (18), the second rotating arm (19), and the second rotating arm (19). An arm (19) and a connecting seat (20) are provided, one end of the second square slot (22) is provided with a second square latch (23), and one end of the second square latch (23) passes through the second square slot (22), the upper end of the first rotating arm (18) is provided with a first vertical arm (16), one end of the first vertical arm (16) is provided with a first connecting arm (14), one end of the first connecting arm (14) is provided with a first polishing motor (12), one end of the first polishing motor (12) is provided with a first polishing disc (10), the upper end of the second rotating arm (19) is provided with a second vertical arm (17), and the second A second connecting arm (15) is provided at one end of the vertical arm (17), a second polishing motor (13) is provided at one end of the second connecting arm (15), a second polishing disc (11) is provided at one end of the second polishing motor (13), a push rod groove (29) is provided inside the first vertical arm (16) and the second vertical arm (17), one end of the push rod groove (29) is in an open form, an electric push rod (30) is provided inside the push rod groove (29), push rod mounting plates (31) are provided at both ends of the electric push rod (30), and a single-head fastener (32) is provided on one side of the push rod mounting plate (31).

2. The sapphire substrate double-sided high-efficiency polishing device according to claim 1, characterized in that: The rotating shaft (27) is provided with a through hole (28) inside, and the through hole (28) passes through the rotating shaft (27) and the rotating seat (4); the positioning seat (2) is provided with a first square slot (6) inside, and the first square slot (6) passes through the positioning seat (2); a first square latch (7) is provided at the front end of the first square slot (6), and the first square latch (7) passes through the first square slot (6).

3. The sapphire substrate double-sided high-efficiency polishing device according to claim 2, characterized in that: A mounting plate (24) is provided on one side of the connection seat (20), and the mounting plate (24) is fixed to the connection seat (20) by welding; a fixing bolt (25) is provided on the upper end of the mounting plate (24), and the mounting plate (24) is threadedly fixed to the base (1) via the fixing bolt (25).

4. The sapphire substrate double-sided high-efficiency polishing device according to claim 3, characterized in that: A hinge (33) is provided on the other side of the connecting seat (20), hinge bolts (34) are provided at both ends of the hinge (33), and the two ends of the hinge (33) are respectively fixed to the base (1) and the connecting seat (20) via the hinge bolts (34).

5. The sapphire substrate double-sided high-efficiency polishing device according to claim 4, characterized in that: A first pad (8) is provided on one side of the positioning seat (2), and a second pad (9) is provided on the other side of the positioning seat (2), and both the first pad (8) and the second pad (9) are welded and fixed to the positioning seat (2).

6. A polishing method for a sapphire substrate double-sided high-efficiency polishing device, based on the sapphire substrate double-sided high-efficiency polishing device according to claim 5, characterized in that: The following steps are involved: Step 1: Rotate the mounting seat (5) to a vertical position, then insert the first square pin (7) along the first square slot (6), one end of the first square pin (7) passes through the first square slot (6), fix the positioning seat (2) and the rotating seat (4), then insert the sapphire substrate to be polished into the mounting notch (26) of the mounting seat (5), if the size is not suitable, put a fixing sleeve on the outside of the sapphire substrate, and insert it into the mounting notch (26) through the fixing sleeve; Step 2: Rotate the first rotating arm (18) and the second rotating arm (19) to a vertical state, insert the second square latch (23) along the second square slot (22), and the second square latch (23) also passes through the first rotating arm (18) and the second rotating arm (19) to fix the first rotating arm (18) and the second rotating arm (19). At this time, the first polishing plate (10) and the second polishing plate (11) are respectively located on both sides of the sapphire substrate, and the electric push rods (30) inside the first vertical arm (16) and the second vertical arm (17) respectively drive the first connecting arm (14) and the second connecting arm (15) to move, so as to adjust the distance between the first polishing plate (10) and the second polishing plate (11) and the sapphire substrate; Step 3: After the first polishing disc (10) and the second polishing disc (11) are in contact with the surface of the sapphire substrate, the first polishing motor (12) and the second polishing motor (13) are started to respectively drive the first polishing disc (10) and the second polishing disc (11) to rotate, thereby simultaneously polishing both sides of the sapphire substrate; Step 4: When single-sided polishing is required, rotate the mounting seat (5) to a horizontal state so that it contacts the first pad (8), then insert the first square pin (7) to fix it, rotate the connecting seat (20) connected to the second rotating arm (19) along the hinge (33), at this time, the second polishing disc (11) is vertically upward, then rotate the first rotating arm (18) to a horizontal position, at this time, the first polishing disc (10) is located above the mounting seat (5), and use the same adjustment and driving method to perform single-sided polishing on the sapphire substrate fixed to the mounting seat (5). When polishing the other side is required, rotate the mounting seat (5) in the opposite direction, and adjust the rotation direction of the first polishing disc (10) and the second polishing disc (11) in the opposite direction, so that the second polishing disc (11) can be used to perform single-sided polishing on the sapphire substrate.

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