A sensor device capable of generating periodic plasmon-induced transparency and a preparation method thereof

Abstract

The present invention discloses a sensor device capable of generating periodic plasmon-induced transparency and a preparation method thereof, wherein the device structure includes: a prism coupling structure, a plasmon layer, a coupling layer, a planar photon waveguide layer and a biosensor detection layer; along the direction from the prism coupling structure to the biosensor detection layer, the prism coupling structure, the plasmon layer, the coupling layer, the planar photon waveguide layer and the biosensor detection layer are stacked and combined in sequence. The present invention uses a low-loss two-dimensional material purple phosphorus film to provide a planar photon waveguide mode, which couples with a plasmon mode to generate a plasmon-induced transparent signal, and the signal intensity thereof realizes two periodic modulations with the thickness of the purple phosphorus film, which can provide ultra-high spatial displacement detection sensitivity. Interestingly, the short-period variation in the thickness of the purple phosphorus film can be used to modulate the intensity of the plasmon-induced transparent signal at this level, and the long-period variation can be used to modulate the intensity of the multi-level plasmon-induced transparent signal.

Description

Technical Field

[0001] The invention belongs to the field of plasmon device design, and in particular relates to a sensor device capable of generating periodic plasmon-induced transparency and a preparation method thereof. Background Art

[0002] Thanks to the interaction of the two plasmon resonance modes of photons (bright-dark mode, bright-bright mode), Fano resonance usually occurs in a variety of plasmon micro-nano structures, producing plasmon-induced transparency effects, which have broad application prospects and can be used for the study of ultra-sensitive plasma resonance sensing. In recent years, the continuous emergence of emerging two-dimensional materials can provide a feasible path for the development of new plasmon-induced transparent devices. Interestingly, among the many members of the two-dimensional material family, the two-dimensional material Violet Phosphorus (VP) crystal has the characteristics of high refractive index and low loss in the visible light-near infrared region, and is an ideal material for designing plasmon-induced transparency. At present, there is no report on the use of two-dimensional material Violet Phosphorus thin layer to generate plasmon-induced transparent signals. In addition, most of the plasmon-induced transparent signals generated by the reported micro-nano structures do not show the variation law of periodic modulation. However, the new plasmon micro-nano structure proposed in the present invention can modulate a periodically changing plasmon-induced transparent signal.

[0003] In order to promote the better application of plasmon-induced transparency in the field of ultra-sensitive biosensing detection, it is undoubtedly of great significance to design and develop a sensor device that can produce periodic plasmon-induced transparency. Summary of the invention

[0004] In view of the shortcomings of the prior art, the present invention proposes a sensor device and preparation method capable of generating periodic plasmon-induced transparency. The innovation lies in that a two-dimensional material purple phosphorus film is used to provide a planar photon waveguide mode, which interacts with the plasmon mode provided by the noble metal film to generate a periodically modulated plasmon-induced transparency signal. In addition, the sensor device also has ultra-high spatial detection sensitivity and can be used for ultra-sensitive quantitative detection of biological analytes.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] A sensor device capable of generating periodic plasmon-induced transparency comprises: a prism coupling structure, a plasmon layer, a coupling layer, a planar photon waveguide layer and a biosensor detection layer; along the prism coupling structure, from bottom to top, the prism coupling structure, the plasmon layer, the coupling layer, the planar photon waveguide layer and the biosensor detection layer are arranged in sequence; wherein the plasmon resonance mode is provided by a noble metal, and the planar photon waveguide mode is provided by a two-dimensional material purple phosphorus crystal; under the excitation of incident photons of a certain frequency, the two modes interact in the middle coupling layer to generate a plasmon-induced transparency signal; the biosensor detection layer contains a flowing biomolecule solution to be tested, the biomolecule solution to be tested is injected from the left side and flows out from the right side.

[0007] Preferably, the thickness of the plasmon layer is 30-60 nm, the thickness of the coupling layer is 100-700 nm, and the thickness of the planar photon waveguide layer is 65-5000 nm.

[0008] Preferably, the material of the planar photon waveguide layer is a two-dimensional material purple phosphorus crystal, which produces periodic plasmon induced transparency; wherein, starting from 65nm, the short period of thickness variation of the planar photon waveguide layer is 110-120nm, which can be used to modulate the intensity of the plasmon induced transparency signal at this level; the long period of thickness variation of the planar photon waveguide layer is 1150-1250nm, which can be used to modulate the intensity of multi-level plasmon induced transparency signals.

[0009] Preferably, the signal detection mechanism is spatial displacement modulation.

[0010] Preferably, the material of the prism coupling structure is SF11, the material of the plasmon layer is at least one of the noble metals gold, silver, aluminum, and metal oxides, and the material of the coupling layer is silicon dioxide.

[0011] Preferably, the incident photon wavelength required by the sensor device is 633 nm.

[0012] Preferably, when the biological analyte is adsorbed on the surface of the sensor device and produces a 0.0012RIU change, the theoretical sensitivity of the sensor device is 3.61234×10 5 μm / RIU, which can be used for ultrasensitive quantitative detection of biological analytes.

[0013] The present invention also provides a method for preparing a sensor device capable of generating periodic plasmon-induced transparency, which is used to realize the preparation of the sensor device capable of generating periodic plasmon-induced transparency, and is characterized in that it comprises the following steps:

[0014] (1) Evaporate a layer of plasmon metal film on the surface of SF11 prism;

[0015] (2) Continue to deposit a silicon dioxide coupling layer on the plasmon layer;

[0016] (3) A purple phosphorus planar photonic waveguide layer is deposited on the coupling layer.

[0017] Compared with the existing micro-nano structure, the beneficial effects of the present invention are:

[0018] The present invention uses two-dimensional material purple phosphorus crystal to provide a planar photon waveguide mode, which couples with the plasmon mode to generate a plasmon-induced transparent signal, and its signal intensity is modulated in two periodicities (short / long periods) with the thickness of the purple phosphorus film, which can provide ultra-high spatial displacement (Goos- Interestingly, the short-period (110-120nm) variation in the thickness of the purple phosphorus film can be used to modulate the intensity of the plasmon-induced transparency signal at this level, and the long-period (1150-1250nm) variation can be used to modulate the intensity of the multi-level plasmon-induced transparency signal.

[0019] For the slight refractive index change on the surface of the sensor, the spatial displacement detection sensitivity (3.61234×10 5 In addition, the present invention can generate periodically modulated plasmon-induced transparent signals, effectively expanding the application scenarios. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solution of the present invention, the following briefly introduces the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0021] Figure 1 A schematic diagram of a sensor device model capable of generating periodic plasmon-induced transparency according to an embodiment of the present invention;

[0022] Figure 2 Schematic diagram of a plasmon-induced transparent signal and its signal detection mechanism according to an embodiment of the present invention;

[0023] Figure 3 Schematic diagram of modulation of plasmon-induced transparent signals by a silicon dioxide coupling layer according to an embodiment of the present invention;

[0024] Figure 4 Schematic diagram of short-period modulation (117nm) of a plasmon-induced transparent signal by a purple phosphorus waveguide layer according to an embodiment of the present invention;

[0025] Figure 5Schematic diagram of long-period modulation (1200nm) of a purple phosphorus waveguide layer on a plasmon-induced transparent signal according to an embodiment of the present invention;

[0026] Figure 6 Schematic diagram of a response curve of a sensor device to spatial displacement detection according to an embodiment of the present invention. DETAILED DESCRIPTION

[0027] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0028] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0029] Embodiment 1

[0030] like Figure 1 As shown, the present invention provides a sensor device capable of generating periodic plasmon-induced transparency, the structure of which includes: a prism coupling structure, a plasmon layer, a coupling layer, a planar photon waveguide layer and a biosensor detection layer; along the prism coupling structure from bottom to top, there are the prism coupling structure, the plasmon layer, the coupling layer, the planar photon waveguide layer and the biosensor detection layer. Among them, the plasmon resonance mode is provided by a noble metal (silver, gold, aluminum or metal oxide), and the planar photon waveguide mode is provided by a two-dimensional material purple phosphorus crystal. Under the excitation of incident photons, the above two resonance modes interact in the middle coupling layer to generate a plasmon-induced transparent signal. The biosensor detection layer contains a flowing biomolecule solution to be tested, which is injected from the left and flows out from the right.

[0031] In this embodiment, the prism coupling structure is made of SF11. When the incident light with an excitation wavelength of 633nm enters the SF11 prism at a certain angle (61.8511°), the incident photons will excite the plasmon mode of the noble metal film and the optical waveguide mode of the purple phosphorus film, resulting in a strong coupling effect, generating a plasmon induced transparent signal, which is reflected by the SF11 prism and outputs a significantly enhanced GH shift. When the purple phosphorus film is not introduced (VP thickness is 0nm), the micro-nano structure only produces a wide plasma resonance absorption peak. However, when a purple phosphorus thin layer with a thickness of 180nm is introduced, the micro-nano structure produces a significant plasmon induced transparent signal. If GH shift detection is used, it has an ultra-high detection sensitivity, such as Figure 2 shown.

[0032] In this embodiment, the plasmon layer has a thickness of 30-60 nm and is made of at least one of silver, gold, aluminum, and metal oxide, and mainly provides a surface plasmon mode.

[0033] In this embodiment, the thickness of the silicon dioxide coupling layer is 100-700 nm. Figure 3 shown.

[0034] In this embodiment, the thickness of the planar photon waveguide layer is 65-5000 nm.

[0035] In this embodiment, the material of the planar photon waveguide layer is a two-dimensional material purple phosphorus crystal, which produces periodic plasmon induced transparency; wherein, starting from 65nm, the short period of thickness variation of the planar photon waveguide layer is 110-120nm, which can be used to modulate the intensity of the plasmon induced transparency signal at this level; the long period of thickness variation of the planar photon waveguide layer is 1150-1250nm, which can be used to modulate the intensity of multi-level plasmon induced transparency signals.

[0036] In this embodiment, starting from 65 nm, when the thickness of the planar photonic waveguide layer changes by 117 nm, the sensor device can modulate a plasmon-induced transparent signal of one cycle, such as Figure 4 shown.

[0037] In this embodiment, starting from 65nm, when the thickness of the planar photonic waveguide layer changes by 1200nm, the sensor device will modulate the multi-level plasmon-induced transparent signal, and a new energy level splitting will occur every time the thickness increases by 1200nm, resulting in ultra-high detection sensitivity. Figure 5 shown.

[0038] In this embodiment, the signal detection mechanism is spatial displacement modulation (Goos- Shift,GHshift).

[0039] In this embodiment, the material of the prism coupling structure is SF11, the material of the plasmon layer refers to at least one of the precious metals gold, silver, aluminum, and metal oxides, and the material of the coupling layer is silicon dioxide.

[0040] In this embodiment, the incident photon wavelength required by the sensor device is 633 nm.

[0041] In this embodiment, in order to increase the application scenarios of the sensor device, when the biological analyte in the sensing detection layer produces a 0.0012RIU (refractive index unit) change, the spatial displacement signal modulation mode is adopted, and the theoretical spatial displacement detection sensitivity of the sensor device is 3.61234×105 μm / RIU, which can meet the research of ultra-sensitive biosensor quantitative detection, such as Figure 6 described.

[0042] Embodiment 2

[0043] In this embodiment, a method for preparing a sensor device that generates periodic plasmon-induced transparency is provided, comprising the following steps:

[0044] (1) Evaporate a layer of plasmon metal film on the surface of SF11 prism;

[0045] (2) Continue to deposit a silicon dioxide coupling layer on the plasmon layer;

[0046] (3) A purple phosphorus planar photonic waveguide layer is deposited on the coupling layer.

[0047] In the step (1), a metal film is deposited on the surface of the SF11 prism by physical vapor deposition.

[0048] In the step (2), a silicon dioxide coupling layer is deposited on the metal film by plasma enhanced chemical vapor deposition.

[0049] In the step (3), a purple phosphorus waveguide layer is deposited on the surface of the silicon dioxide coupling layer by chemical vapor deposition.

[0050] The specific implementation process is as follows: Plasmon-induced transparent short-period modulation:

[0051] The sensor device for generating periodic plasmon-induced transparency described in 1-1 comprises:

[0052] 38 nm silver film plasmon layer;

[0053] 400 nm silicon dioxide coupling layer;

[0054] 65 nm purple phosphorus planar photonic waveguide layer.

[0055] The preparation method comprises:

[0056] First, a 38nm silver film was deposited on the surface of the SF11 prism by physical vapor deposition.

[0057] Secondly, 400 nm of silicon dioxide is deposited on the silver film using plasma enhanced chemical vapor deposition.

[0058] Finally, a 65nm purple phosphorus film was deposited on the silicon dioxide coupling layer by chemical vapor deposition.

[0059] The sensor device for generating periodic plasmon-induced transparency described in 1-2 comprises:

[0060] 38 nm silver film plasmon layer;

[0061] 400 nm silicon dioxide coupling layer;

[0062] 182 nm purple phosphorus planar photonic waveguide layer.

[0063] The preparation method comprises:

[0064] First, a 38nm silver film was deposited on the surface of the SF11 prism by physical vapor deposition.

[0065] Secondly, 400 nm of silicon dioxide is deposited on the silver film using plasma enhanced chemical vapor deposition.

[0066] Finally, a 182nm purple phosphorus film was deposited on the silicon dioxide coupling layer using chemical vapor deposition.

[0067] It should be pointed out that the above two preparation methods 1-1 and 1-2 can produce short-period modulated plasmon-induced transparent signals at this level.

[0068] Plasmon-induced transparent long-period modulation:

[0069] The sensor device for generating periodic plasmon-induced transparency described in 1-3 comprises:

[0070] 38 nm silver film plasmon layer;

[0071] 400 nm silicon dioxide coupling layer;

[0072] 1265 nm violet phosphorus planar photonic waveguide layer.

[0073] The preparation method comprises:

[0074] First, a 38nm silver film was deposited on the surface of the SF11 prism by physical vapor deposition.

[0075] Secondly, 400 nm of silicon dioxide is deposited on the silver film using plasma enhanced chemical vapor deposition.

[0076] Finally, a 1265nm purple phosphorus film was deposited on the silicon dioxide coupling layer using chemical vapor deposition.

[0077] 1-4 A sensor device for generating periodic plasmon-induced transparency comprises:

[0078] 38 nm silver film plasmon layer;

[0079] 400 nm silicon dioxide coupling layer;

[0080] 2465 nm violet phosphorus planar photonic waveguide layer.

[0081] The preparation method comprises:

[0082] First, a 38nm silver film was deposited on the surface of the SF11 prism by physical vapor deposition.

[0083] Secondly, 400 nm of silicon dioxide is deposited on the silver film using plasma enhanced chemical vapor deposition.

[0084] Finally, a 2465nm purple phosphorus film was deposited on the silicon dioxide coupling layer using chemical vapor deposition.

[0085] It should be pointed out that the above two preparation methods 1-3 and 1-4 can produce long-period modulated multi-level plasmon-induced transparent signals.

[0086] The embodiments described above are only descriptions of the preferred embodiments of the present invention and are not intended to limit the scope of the present invention. Without departing from the design spirit of the present invention, various modifications and improvements made to the technical solutions of the present invention by ordinary technicians in this field should fall within the protection scope determined by the claims of the present invention.

Claims

1. A sensor device capable of generating periodic plasmon-induced transparency, characterized in that: The structure includes: Prism coupling structure, plasmon layer, coupling layer, planar photonic waveguide layer and biosensing detection layer; From bottom to top along the prism coupling structure, there are prism coupling structure, plasmon layer, coupling layer, planar photon waveguide layer and biosensor detection layer in order; wherein, the plasmon layer is provided with a plasma resonance mode by a noble metal, and the planar photon waveguide layer is provided with a planar photon waveguide mode by a two-dimensional material purple phosphorus crystal; under the excitation of incident photons of a certain frequency, the two modes interact in the middle coupling layer to generate a plasmon induced transparent signal; the biosensor detection layer contains a flowing biomolecule solution to be tested, which is injected from the left and flows out from the right; The thickness of the plasmon layer is 30-60 nm, the thickness of the coupling layer is 100-700 nm, and the thickness of the planar photon waveguide layer is 65-5000 nm; The planar photon waveguide layer generates periodic plasmon-induced transparency; wherein, starting from 65nm, the short period of thickness variation of the planar photon waveguide layer is 110-120nm, which is used to modulate the intensity of the plasmon-induced transparency signal of this level; the long period of thickness variation of the planar photon waveguide layer is 1150-1250nm, which is used to modulate the intensity of multi-level plasmon-induced transparency signals.

2. The sensor device capable of generating periodic plasmon-induced transparency according to claim 1, characterized in that: Its signal detection mechanism is spatial displacement modulation.

3. The sensor device capable of generating periodic plasmon-induced transparency according to claim 1, characterized in that: The material of the prism coupling structure is SF11, the material of the plasmon layer refers to at least one of the precious metals gold, silver, aluminum, and metal oxides, and the material of the coupling layer is silicon dioxide.

4. The sensor device capable of generating periodic plasmon-induced transparency according to claim 1, characterized in that: The sensor device requires an incident photon wavelength of 633nm.

5. The sensor device capable of generating periodic plasmon-induced transparency according to claim 1, characterized in that: When the biological analyte is adsorbed on the surface of the sensor and produces a 0.0012RIU change, the theoretical sensitivity of the sensor is 3.61234×10 5 μm / RIU, which can be used for ultrasensitive quantitative detection of biological analytes.

6. A method for preparing a sensor device capable of generating periodic plasmon-induced transparency, for realizing the preparation of a sensor device capable of generating periodic plasmon-induced transparency as claimed in any one of claims 1 to 5, characterized in that: The following steps are involved: (1) Evaporate a layer of plasmon metal film on the surface of SF11 prism; (2) Continue to deposit a silicon dioxide coupling layer on the plasmon layer; (3) A purple phosphorus planar photonic waveguide layer is deposited on the coupling layer.

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