A new type of plasma coaxial electrodeless ultraviolet lamp system

Abstract

The present invention discloses a novel plasma coaxial electrodeless ultraviolet lamp system, which relates to the technical field of coaxial electrodeless ultraviolet lamps. The system comprises an inner conductor tube, an ultraviolet lamp tube plugged into one end of the inner conductor tube, and an outer conductor tube sleeved around the inner conductor tube and the outer side of the ultraviolet lamp tube. The inner conductor tube is provided with a feed port on the side away from the ultraviolet lamp tube. A ignition structure for tip discharge is provided on the tube wall of the inner conductor tube, and an adjustable support assembly is provided inside the inner conductor tube. The ignition structure is provided on the inner conductor tube for exciting strong electromagnetic waves, which facilitates the ultraviolet lamp tube to form a plasma excitation structure capable of exciting the ultraviolet lamp tube to generate plasma under the action of a strong electric field. The inner conductor tube is a hollow copper tube. The present invention utilizes the characteristic of significantly enhanced conductivity after plasma excitation to make it the inner conductor of the coaxial waveguide, greatly reducing the weight of the lamp. Multi-physics field simulations were also performed, and the results showed that the electromagnetic field and plasma in the lamp were uniformly distributed after excitation.

Description

Technical Field

[0001] The present invention relates to the technical field of coaxial electrodeless ultraviolet lamps, and more particularly to the technical field of novel plasma coaxial electrodeless ultraviolet lamp systems. Background Art

[0002] The microwave electrodeless UV lamp utilizes microwave technology to achieve stepless dimming and remote control, combined with ultraviolet technology for sterilization and disinfection. The lamp's brightness and on / off state are controlled by controlling the microwave power. Simultaneously, the ultraviolet portion of the lamp excites the argon-mercury lamp through a strong electromagnetic field, radiating 254nm ultraviolet light to kill bacteria and viruses. This lamp can be widely used in healthcare settings such as hospital operating rooms, clean rooms, and pharmacies for disinfection and sterilization; in the food processing industry for food disinfection and preservation; in homes for air purification and sterilization; and in the water treatment industry for water source disinfection and sterilization. Its energy-saving, environmentally friendly, and effective sterilization properties hold significant application prospects in a variety of fields. The microwave electrodeless UV lamp utilizes three technologies: coaxial microwave technology, gas ionization and excitation in an electric field, and ultraviolet sterilization.

[0003] Microwave technology based on coaxial cables: A coaxial cable is a shielded, non-dispersive, dual-conductor transmission line consisting of two inner and outer coaxial conductors with a dielectric intervening. The outer conductor of a coaxial cable is typically grounded, confining the electromagnetic field between the inner and outer conductors. This results in virtually no radiation loss and is virtually immune to external signal interference. Electromagnetic waves propagate between the inner and outer conductors of the coaxial cable, with the dominant mode being the TEM mode, resulting in a uniform electric field distribution.

[0004] Gas Ionization and Excitation Technology in an Electric Field: The strong electric field surrounding the lamp imparts sufficient energy to some atoms or molecules in the gas, causing them to lose one or more electrons, forming positive ions and free electrons. This process is called ionization, and the resulting positive ions and free electrons form a plasma. During ionization, some atoms or positive ions absorb energy, and the electric field affects their energy level distribution, causing the atoms or positive ions to occupy high energy levels. When these high-energy atoms or positive ions return to low energy levels, they release energy, producing specific spectral lines – a phenomenon known as excitation.

[0005] UV sterilization technology: UV sterilization technology uses ultraviolet radiation to destroy bacteria, viruses, and other microorganisms. Excitation of gas molecules or positive ions radiates 254nm ultraviolet light, which falls within the UVC band and is more effective in destroying the DNA and RNA of microorganisms, thereby achieving a sterilization and disinfection effect.

[0006] However, at an operating frequency of 2.45 GHz, traditional rectangular waveguides (BJ26: 86 x 36 mm) and circular waveguides (BY22: D = 98 mm) are large. Their metal structure also makes them heavy, making them unsuitable for handheld and portable use in small applications. Furthermore, traditional waveguides suffer from uneven electric field distribution, which can lead to uneven UV lamp brightness. Traditional coaxial slot waveguides can be used in small applications, but they require a metal coaxial structure and are still relatively heavy. Summary of the Invention

[0007] The purpose of the present invention is to solve the above technical problems and provide a novel plasma coaxial electrodeless ultraviolet lamp system.

[0008] In order to achieve the above-mentioned purpose, the present invention specifically adopts the following technical solutions:

[0009] The present invention provides a novel plasma coaxial electrodeless ultraviolet lamp system, comprising an inner conductor tube, an ultraviolet lamp tube plugged into one end of the inner conductor tube, and an outer conductor tube sleeved around the inner conductor tube and the outer side of the ultraviolet lamp tube, wherein a power feed port is provided on the side of the inner conductor tube away from the ultraviolet lamp tube;

[0010] The connection between the inner conductor tube and the ultraviolet lamp forms a plasma excitation structure under the action of a strong electric field, which can excite the ultraviolet lamp to generate plasma;

[0011] A ignition structure for tip discharge is arranged on the tube wall of the inner conductor tube, and an adjustable support component for increasing stability is arranged inside the inner conductor tube.

[0012] In one embodiment, the ignition structure includes a metal column assembly disposed at one end of the inner conductor tube close to the ultraviolet lamp tube.

[0013] Specifically, the plasma ignition structure is a group of metal pillars extending from the hollow inner conductor. Due to the tip discharge effect of the metal pillars, a strong electric field will be generated near the metal pillars, which is conducive to the excitation of plasma in the ultraviolet lamp tube. After adding the ignition structure, a strong electric field sufficient to excite the plasma can be generated at a lower input power, thereby causing the ultraviolet lamp tube to ignite and emit light.

[0014] In one embodiment, the metal column assembly includes a plurality of discharge columns uniformly distributed circumferentially at the end of the inner conductor tube, and the axis of each discharge column is parallel to the axis of the inner conductor tube.

[0015] In one embodiment, the adjustable support assembly is an adjustable support column, which is inserted into the inner conductor tube from a side away from the ultraviolet lamp tube, and contacts the end of the ultraviolet lamp tube.

[0016] Specifically, the adjustable support column is made of metal and is shaped like a piston. Its main function is to fix the quartz tube front and back to prevent it from sliding and being damaged.

[0017] In one embodiment, it further includes an ultraviolet lamp fixing bracket, which includes a plurality of support members equidistantly sleeved on the outer wall of the ultraviolet lamp tube, and the outer side of each support member is tightly pressed against the outer conductor tube.

[0018] In one embodiment, each support member includes a fixing ring, a plurality of support arms of the same length uniformly distributed around the outside of the fixing ring, and a fixing member provided at the end of each support arm, and each support arm is located in the radial direction of the fixing ring.

[0019] Specifically, the support member consists of a hollow ring with three supporting arms connected together. The hollow portion can hold and accommodate the UV lamp. The three supporting arms are angled 120° apart. The outer side of the support wall has screw holes, which can be used to fix the support member to the outer conductor tube cover from the outside. The number of support members installed depends on the specific length of the lamp tube.

[0020] In one embodiment, the inner conductor tube is a hollow copper tube.

[0021] Specifically, the inner conductor tube in the traditional coaxial structure is replaced with a hollow copper tube, and the hollow copper tube only retains the feeding port. An ultraviolet lamp tube (quartz tube) filled with argon mercury gas is inserted into the hollow copper tube. The outer conductor tube does not affect the ultraviolet radiation and can prevent electromagnetic wave leakage.

[0022] This solution also leverages the metal-like properties of excited plasma, making it the inner conductor of a coaxial waveguide, significantly reducing the weight of the lamp. Multi-physics simulations demonstrated uniform electromagnetic field and plasma distribution within the lamp after excitation.

[0023] In the case of microwave input (input power is 50W): microwaves are fed into the feeding port on the left and transmitted to the inner conductor tube through the TEM mode (TEM mode, i.e. transverse electromagnetic mode, refers to the electromagnetic wave transmission mode in which the directions of the electric field and magnetic field are perpendicular to the propagation direction), forming a terminal open-circuit structure with a strong field strength.

[0024] Since one end of the UV lamp is inserted into the hollow copper tube, there is a strong electric field at the joint that can excite plasma, causing the entire UV lamp to be lit. The excited plasma forms a coaxial structure with the metal outer wall, and the electromagnetic field can propagate in the intermediate air medium.

[0025] The model is simplified to two-dimensional axisymmetry, and its electron density distribution is simulated in an argon plasma (pressure of 4 Torr). The excited plasma still has a certain skin depth and cannot be regarded as a perfect conductor. As a result, the electromagnetic field between the inner and outer conductors is approximately distributed in a TEM mode, which is periodic and relatively uniform.

[0026] A simulation study was conducted on the S11 parameter of an argon-mercury gas-filled UV lamp at different pressures and powers (S11 is the logarithmic ratio of reflected power to incident power; smaller S11 means less reflection, with -10dB corresponding to 10% of the power being reflected and 90% of the power being absorbed by the load). The simulation showed that when the input power was fixed at 50W, the S11 parameter improved with increasing pressure. At 4 Torr, S11 reached -14.197, and more than 96% of the power was absorbed by the plasma.

[0027] In one embodiment, the outer conductor is a metal mesh.

[0028] Specifically, using a metal mesh as an outer conductor does not affect ultraviolet radiation while preventing electromagnetic wave leakage.

[0029] In one embodiment, air is filled between the inner conductor and the outer conductor and between the inner conductor and the ultraviolet lamp.

[0030] In one embodiment, the UV lamp is filled with an argon-mercury mixed gas.

[0031] In one embodiment, the outer diameter of the hollow copper cylinder is 25 mm to 30 mm.

[0032] Specifically, this solution is rationally designed, significantly reducing the dimensions of the microwave feed structure of the UV lamp compared to traditional rectangular or circular waveguides (the traditional rectangular waveguide BJ26 has a length and width of 86*36 mm; the traditional circular waveguide BY22 has a diameter of 98 mm; the diameter D of this solution is 25mm-30mm). Compared to traditional coaxial slot waveguide excitation UV lamps, this solution does not have the complex coaxial slot metal structure. While maintaining uniformity and high efficiency, this solution significantly optimizes the device's structure, significantly reducing its weight compared to traditional electrodeless UV lamps. Conventional circular waveguides weigh 1000g, conventional rectangular waveguides weigh 682g, and the hollow copper tube of this invention weighs 176g.

[0033] The scheme works at a frequency of 2.45 GHz.

[0034] The beneficial effects of the present invention are as follows:

[0035] Innovatively, the excited electrodeless UV lamp tube is directly used as the inner conductor, and the metal mesh cover is used as the outer conductor to form a quasi-coaxial structure, so that electromagnetic waves can propagate evenly between the inner and outer conductors, thereby making the plasma discharge more uniform and the brightness of the UV lamp uniform. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 This is a schematic structural diagram of a novel plasma coaxial electrodeless ultraviolet lamp system of the present invention;

[0037] Figure 2 yes Figure 1 Left view of;

[0038] Figure 3 yes Figure 1 Axonometric perspective of

[0039] Figure 4 This is the electric field distribution diagram when microwave is input without lamp placed;

[0040] Figure 5 It is based on the electric field distribution diagram that is coaxial with the outer wall of the metal when the metal is equivalently excited into the plasma.

[0041] Figure 6 It is the electric field distribution diagram after the plasma is actually excited;

[0042] Figure 7 After plasma excitation, the electron density distribution diagram of the plasma in the UV lamp tube and the electric field distribution diagram between the two conductors show a complementary relationship;

[0043] Figure 8 The resistance loss distribution diagram in the UV lamp and the electric field distribution diagram between the two conductors after plasma excitation explain Figure 7 The reason for the appearance of complementary patterns is that: where the electric field is strong, the resistance loss is low, the microwave power absorbed here is small, and the electron density is low; while where the electric field is weak, the resistance loss is high, the microwave power absorbed here is large, and the electron density is high.

[0044] Figure 9 This is the distribution of plasma conductivity after excitation. Conductivity represents the ability of a material to conduct current and is measured in Siemens per meter (S / m). It is generally believed that the conductivity of insulators is less than 10^(-8) S / m, the conductivity of conductors is greater than 10^(3) S / m, and the conductivity of semiconductors lies somewhere in between. Simulations show that in this state, the plasma can be considered a semiconductor. As the power increases, the plasma conductivity further increases.

[0045] Figure numerals: 1-inner conductor tube, 2-starting structure, 3-ultraviolet lamp tube, 4-support member, 5-outer conductor tube, 6-adjustable support assembly. DETAILED DESCRIPTION

[0046] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Generally, the components of the embodiments of the present invention described and shown in the drawings herein can be arranged and designed in various different configurations.

[0047] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the invention as claimed, but rather merely represents selected embodiments of the present invention. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without creative effort shall fall within the scope of protection of the present invention.

[0048] It should be noted that similar reference numerals and letters represent similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings. In addition, the terms "first," "second," etc. are used only to distinguish the descriptions and are not to be understood as indicating or implying relative importance.

[0049] In the description of the embodiments of the present invention, it should be noted that the terms "inside", "outside", "upper", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, or are the orientations or positional relationships in which the inventive product is usually placed when in use. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on the present invention.

[0050] Example 1

[0051] This embodiment provides a novel plasma coaxial electrodeless ultraviolet lamp system, comprising an inner conductor tube 1, an ultraviolet lamp tube 3 plugged into one end of the inner conductor tube 1, and an outer conductor tube 5 sleeved around the inner conductor tube 1 and the ultraviolet lamp tube 3. A power feed port is provided on the side of the inner conductor tube 1 away from the ultraviolet lamp tube 3.

[0052] The inner conductor tube 1 and the ultraviolet lamp 3 are connected to form a plasma excitation structure under the action of a strong electric field that can excite the ultraviolet lamp 3 to generate plasma;

[0053] A ignition structure 2 for tip discharge is provided on the tube wall of the inner conductor tube 1 , and an adjustable support component 6 for increasing stability is provided inside the inner conductor tube 1 .

[0054] The ignition structure 2 includes a metal column assembly arranged at one end of the inner conductor tube 1 close to the ultraviolet lamp tube 3.

[0055] The metal column assembly includes multiple discharge columns uniformly distributed circumferentially at the end of the inner conductor tube 1 (the preferred form of the metal column assembly includes two discharge columns distributed in mirror symmetry at the end of the inner conductor tube), and the axis of each discharge column is parallel to the axis of the inner conductor tube 1.

[0056] The ultraviolet lamp 3 is filled with argon-mercury mixed gas.

[0057] Specifically, the plasma ignition structure 2 is a group of metal pillars extending from the hollow inner conductor. Due to the tip discharge effect of the metal pillars, a strong electric field will be generated near the metal pillars, which is beneficial to the excitation of the plasma in the ultraviolet lamp tube 3. After adding the ignition structure 2, a strong electric field sufficient to excite the plasma can be generated at a lower input power, thereby causing the ultraviolet lamp tube 3 to ignite and emit light.

[0058] Example 2

[0059] This embodiment provides a novel plasma coaxial electrodeless ultraviolet lamp system, comprising an inner conductor tube 1, an ultraviolet lamp tube 3 plugged into one end of the inner conductor tube 1, and an outer conductor tube 5 sleeved around the inner conductor tube 1 and the ultraviolet lamp tube 3. A power feed port is provided on the side of the inner conductor tube 1 away from the ultraviolet lamp tube 3.

[0060] The inner conductor tube 1 and the ultraviolet lamp 3 are connected to form a plasma excitation structure under the action of a strong electric field that can excite the ultraviolet lamp 3 to generate plasma;

[0061] A ignition structure 2 for tip discharge is provided on the tube wall of the inner conductor tube 1 , and an adjustable support component 6 for increasing stability is provided inside the inner conductor tube 1 .

[0062] The adjustable support assembly 6 is an adjustable support column, which is inserted into the inner conductor tube 1 from the side away from the ultraviolet lamp 3 in the inner conductor tube 1, and contacts the end of the ultraviolet lamp 3.

[0063] Specifically, the adjustable support column is made of metal and is shaped like a piston. Its main function is to fix the quartz tube front and back to prevent it from sliding and being damaged.

[0064] Example 3

[0065] This embodiment is further optimized based on embodiment 1 or embodiment 2, specifically:

[0066] It also includes an ultraviolet lamp fixing bracket, which includes a plurality of support members 4 equidistantly sleeved on the outer wall of the ultraviolet lamp tube 3 , and the outer side of each support member 4 is tightly pressed against the outer conductor tube 5 .

[0067] Each support member 4 includes a fixing ring, a plurality of support arms of the same length uniformly distributed around the outside of the fixing ring, and a fixing member provided at the end of each support arm. Each support arm is located in the radial direction of the fixing ring.

[0068] Specifically, the support member 4 is composed of a hollow ring with three supporting arms connected together. The hollow portion can hold and accommodate the UV lamp 3. The three supporting arms are angled 120° apart. The outer side of the support wall has screw holes, which can be used to secure the support member 4 to the outer conductor tube 5 cover from the outside. The number of support members 4 installed depends on the specific length of the lamp tube.

[0069] Example 4

[0070] This embodiment is a further optimization based on any one of Embodiments 1 to 3, specifically:

[0071] The inner conductor tube 1 is a hollow copper tube.

[0072] Specifically, the inner conductor tube 1 in the traditional coaxial structure is replaced with a hollow copper tube, and the hollow copper tube only retains the feeding port. An ultraviolet lamp tube 3 (quartz tube) filled with argon mercury gas is inserted into the hollow copper tube. The outer conductor tube 5 does not affect the ultraviolet radiation and can prevent electromagnetic wave leakage.

[0073] This solution also leverages the metal-like properties of excited plasma, making it the inner conductor of a coaxial waveguide, significantly reducing the weight of the lamp. Multi-physics simulations demonstrated uniform electromagnetic field and plasma distribution within the lamp after excitation.

[0074] In the case of microwave input (input power is 50W): microwaves are fed into the feeding port on the left and transmitted to the inner conductor tube 1 through the TEM mode (TEM mode, i.e. transverse electromagnetic mode, refers to the electromagnetic wave transmission mode in which the directions of the electric field and magnetic field are perpendicular to the propagation direction), forming a terminal open-circuit structure with a strong field strength.

[0075] Since one end of the ultraviolet lamp tube 3 is inserted into the hollow copper tube, there is a strong electric field at the insertion point that can excite plasma, causing the entire ultraviolet lamp tube 3 to be lit. The excited plasma forms a coaxial structure with the metal outer wall, and at this time the electromagnetic field can propagate in the intermediate air medium.

[0076] The model is simplified to two-dimensional axisymmetry, and its electron density distribution is simulated in an argon plasma (pressure of 4 Torr). The excited plasma still has a certain skin depth and cannot be regarded as a perfect conductor. As a result, the electromagnetic field between the inner and outer conductors is approximately distributed in a TEM mode, which is periodic and relatively uniform.

[0077] A simulation study was conducted on the S11 parameter of an argon-mercury gas-filled UV lamp 3 at different pressures and powers. (S11 is the logarithmic ratio of reflected power to incident power; smaller S11 indicates less reflection; -10dB corresponds to 10% of the power being reflected and 90% of the power being absorbed by the load.) The simulation showed that when the input power was fixed at 50W, the S11 parameter improved with increasing pressure. At 4 Torr, S11 reached -14.197, indicating that over 96% of the power was absorbed by the plasma.

[0078] in, Figure 4 This is the electric field distribution diagram when microwave is input without lamp placed; Figure 5 It is based on the electric field distribution diagram that is coaxial with the outer wall of the metal when the metal is equivalently excited into the plasma. Figure 6 It is the electric field distribution diagram after the plasma is actually excited; Figure 7 After plasma excitation, the electron density distribution diagram of the plasma in the UV lamp tube and the electric field distribution diagram between the two conductors show a complementary relationship;

[0079] Figure 8 The resistance loss distribution diagram in the UV lamp and the electric field distribution diagram between the two conductors after plasma excitation explain Figure 7 The reason for the appearance of complementary patterns is that: where the electric field is strong, the resistance loss is low, the microwave power absorbed here is small, and the electron density is low; while where the electric field is weak, the resistance loss is high, the microwave power absorbed here is large, and the electron density is high.

[0080] Figure 9 This is the distribution of plasma conductivity after excitation. Conductivity represents the ability of a material to conduct current and is measured in Siemens per meter (S / m). It is generally believed that the conductivity of insulators is less than 10^(-8) S / m, the conductivity of conductors is greater than 10^(3) S / m, and the conductivity of semiconductors lies somewhere in between. Simulations show that in this state, the plasma can be considered a semiconductor. As the power increases, the plasma conductivity further increases.

[0081] Example 5

[0082] This embodiment is a further optimization based on any one of Embodiments 1 to 4, specifically:

[0083] The outer conductor is a metal mesh.

[0084] Specifically, using a metal mesh as an outer conductor does not affect ultraviolet radiation while preventing electromagnetic wave leakage.

[0085] Example 6

[0086] This embodiment is a further optimization based on any one of Embodiments 1 to 5, specifically:

[0087] Air is filled between the inner conductor and the outer conductor and between the inner conductor and the ultraviolet lamp 3 .

[0088] The outer diameter of the hollow copper column is 25mm-30mm.

[0089] Specifically, this solution is rationally designed, significantly reducing the dimensions of the microwave feed structure of the UV lamp compared to traditional rectangular or circular waveguides (the traditional rectangular waveguide BJ26 has a length and width of 86*36 mm; the traditional circular waveguide BY22 has a diameter of 98 mm; the diameter D of this solution is 25mm-30mm). Compared to traditional coaxial slot waveguide excitation UV lamps, this solution does not have the complex coaxial slot metal structure. While maintaining uniformity and high efficiency, this solution significantly optimizes the device's structure, significantly reducing its weight compared to traditional electrodeless UV lamps. Conventional circular waveguides weigh 1000g, conventional rectangular waveguides weigh 682g, and the hollow copper tube of this invention weighs 176g.

[0090] The scheme works at a frequency of 2.45 GHz.

Claims

1. A new type of plasma coaxial electrodeless ultraviolet lamp system, characterized in that: It comprises an inner conductor tube (1), an ultraviolet lamp (3) plugged into one end of the inner conductor tube (1), and an outer conductor tube (5) sleeved on the outer sides of the inner conductor tube (1) and the ultraviolet lamp (3); a feeding port is provided on the side of the inner conductor tube (1) away from the ultraviolet lamp (3); The connection between the inner conductor tube (1) and the ultraviolet lamp (3) forms a plasma excitation structure capable of exciting the ultraviolet lamp (3) to generate plasma under the action of a strong electric field; A ignition structure (2) for tip discharge is provided on the tube wall of the inner conductor tube (1), and an adjustable support component (6) for increasing stability is provided inside the inner conductor tube (1).

2. A novel plasma coaxial electrodeless ultraviolet lamp system according to claim 1, characterized in that: The ignition structure (2) comprises a metal column assembly arranged at one end of the inner conductor tube (1) close to the ultraviolet lamp tube (3).

3. A novel plasma coaxial electrodeless ultraviolet lamp system according to claim 2, characterized in that: The metal column assembly comprises a plurality of discharge columns uniformly distributed circumferentially at the end of the inner conductor tube (1), and the axis of each discharge column is parallel to the axis of the inner conductor tube (1).

4. A novel plasma coaxial electrodeless ultraviolet lamp system according to claim 2, characterized in that: The adjustable support assembly (6) is an adjustable support column, which is inserted into the inner conductor tube (1) from a side of the inner conductor tube (1) away from the ultraviolet lamp tube (3), and the adjustable support column contacts the end of the ultraviolet lamp tube (3).

5. A novel plasma coaxial electrodeless ultraviolet lamp system according to claim 1, characterized in that: It also includes an ultraviolet lamp fixing bracket, which includes a plurality of support members (4) sleeved on the outer wall of the ultraviolet lamp tube (3) at equal intervals, and the outer side of each support member (4) is tightly pressed against the outer conductor tube (5).

6. A novel plasma coaxial electrodeless ultraviolet lamp system according to claim 5, characterized in that: Each of the support members (4) comprises a fixing ring, a plurality of support arms of the same length uniformly distributed on the outside of the fixing ring along a circumference, and a fixing member arranged at the end of each of the support arms.

7. The novel plasma coaxial electrodeless ultraviolet lamp system according to claim 1 is characterized in that: The inner conductor tube (1) is a hollow copper tube.

8. The novel plasma coaxial electrodeless ultraviolet lamp system according to claim 2 is characterized in that: The outer conductor is a metal mesh cover.

9. The novel plasma coaxial electrodeless ultraviolet lamp system according to claim 1 is characterized in that: Air is filled between the inner conductor and the outer conductor and between the inner conductor and the ultraviolet lamp (3).

10. The novel plasma coaxial electrodeless ultraviolet lamp system according to claim 7, characterized in that: The ultraviolet lamp tube (3) is filled with argon-mercury mixed gas.

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