Unipolar magnetic coil charged particle beam scanning device and method

Abstract

The application provides a kind of single pole magnetic coil charged particle beam scanning device and method, including charged particle inlet, and the charged particle beam concentrator of being arranged in the output side of charged particle inlet, the output side of the charged particle beam concentrator is provided with charged particle beam guiding pole flange, the outer wall of the charged particle beam guiding pole flange is provided with a charged particle beam guiding device;The charged particle beam concentrator intersects with the movement direction of charged particle beam, the charged particle beam concentrator is provided with axial magnetic field along the movement direction of charged particle beam, the charged particle beam guiding device is arranged in the side of the movement direction of charged particle beam, the charged particle beam guiding device includes two magnetic poles of opposite magnetic polarity, and only one of the magnetic poles is close to charged particle beam, the application can control the deflection direction of charged particle beam, targeted coating can be realized, and then the longitudinal charged particle beam coverage range of vacuum arc charged particle coating can be expanded, and coating uniformity is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of vacuum arc ion plating, in particular to a single-pole magnetic coil charged particle beam scanning device and method. BACKGROUND

[0002] Vacuum cathode arc plating is one of the commonly used surface modification methods, which forms a high-density plasma near the cathode target surface through arc discharge technology, and deposits on the surface of the workpiece to be plated to enhance the surface properties. Although this plating method has a series of advantages such as high deposition rate, dense film layer, high hardness and good adhesion, etc., but the arc discharge process will release a large amount of large particles and impurities at the same time, which will increase the surface roughness of the film layer deposited on the workpiece surface, reduce the performance of the thin film, and limit its application in high-performance fields.

[0003] In order to improve the performance of the thin film, it is necessary to eliminate the influence of large particles and impurities in the vacuum plating process. In the prior art, a common way to eliminate large particles and impurities is to set a filtering device between the cathode target and the plating vacuum chamber, that is, the magnetic filtering vacuum cathode arc plating technology, which is the best and most widely used method to suppress the influence of large particles in the plating process so far.

[0004] Although the filtering device can improve the performance of the thin film, the charged particles are affected by the magnetic field convergence, and at the same time limited by the outlet area of the filtering device, the cross-sectional area of the charged particle beam is small when entering the vacuum chamber, and the charged particle beam intensity is normally distributed in space, forming a non-uniform thin film thickness on the workpiece surface. Especially when the vacuum chamber is large, the thin film thickness on the workpiece surface at different positions in the vacuum chamber is more different, which seriously limits the application of the technology. SUMMARY

[0005] In order to solve the problems existing in the prior art, the present application provides a single-pole magnetic coil charged particle beam scanning device and method, which is used to solve the technical problem of non-uniform thin film thickness in the vacuum cathode arc plating in the prior art.

[0006] To achieve the above purpose, the present application provides the following technical scheme:

[0007] A single-pole magnetic coil charged particle beam scanning device, comprising a charged particle inlet, and a charged particle beam concentrator arranged on the output side of the charged particle inlet, the output side of the charged particle beam concentrator is provided with a charged particle beam guide flange, and the outer wall of the charged particle beam guide flange is provided with a charged particle beam guide device;

[0008] The charged particle beam guide device is provided on one side of the moving direction of the charged particle beam, and includes two magnetic poles with opposite magnetic properties, and only one of the magnetic poles is close to the charged particle beam.

[0009] Further, the charged particle beam guide device is connected to an alternating current power supply.

[0010] Further, the charged particle beam guide device includes a charged particle beam guide pole and a charged particle beam guide coil wound on the charged particle beam guide pole.

[0011] Further, the charged particle beam guide pole is in a columnar structure, and the axial extension of the charged particle beam guide pole in the columnar structure is perpendicular to the moving direction of the charged particle beam.

[0012] Further, the charged particle beam guide coil is wound on the middle region of the columnar structure.

[0013] Further, the charged particle beam guide pole is made of a magnetic conductive material.

[0014] Further, the charged particle beam guide device includes a charged particle beam guide pole flange and a charged particle beam guide pole coil wound on the charged particle beam guide pole flange.

[0015] Further, the input side of the charged particle guide inlet is provided with a charged particle emission device.

[0016] Further, a vacuum chamber is provided in the moving direction of the charged particle beam, the charged particle guide inlet and the charged particle beam guide device are sealingly connected, and the charged particle beam guide pole flange is sealingly connected to the vacuum chamber.

[0017] The vacuum chamber is provided with a coated sample holder inside in the moving direction of the charged particle beam; and the bottom of the coated sample holder is provided with a turntable.

[0018] A method for a single-pole magnetic coil charged particle beam scanning device, including the following steps:

[0019] The charged particle beam guide device is connected to an alternating current power supply, the charged particle beam guide device is close to the magnetic pole in the moving direction of the charged particle beam, and the magnetic pole periodically forms a change in opposite magnetic properties.

[0020] The charged particle beam is oriented to reach the charged particle beam guide device in the axial magnetic field.

[0021] The charged particle beam is periodically deflected upward or downward when passing through the charged particle beam guiding device.

[0022] Compared with the prior art, the present application has the following beneficial technical effects:

[0023] The present application provides a kind of single pole magnetic coil charged particle beam scanning device and method, including charged particle inlet, and the charged particle beam guiding device of charged particle beam guiding device output side being provided with charged particle beam guiding device output side of charged particle beam guiding device;The outer wall of the charged particle beam guiding device is provided with a charged particle beam guiding device;The charged particle beam guiding device and the movement direction of charged particle beam intersect, the charged particle beam guiding device is provided with axial magnetic field along the movement direction of charged particle beam, the charged particle beam guiding device is arranged on one side of the movement direction of charged particle beam, the charged particle beam guiding device includes two magnetic poles of opposite magnetic polarity, and only one of the magnetic poles is close to charged particle beam, direct current is connected to the charged particle beam guiding device, alternating current is connected to the charged particle beam guiding device, the charged particle beam guiding device forms axial magnetic field along the movement direction of charged particle beam, and the magnetic pole close to the movement direction of charged particle beam of the charged particle beam guiding device periodically forms opposite magnetic polarity of change;Charged particle beam is oriented to reach the charged particle beam guiding device in the axial magnetic field;The charged particle beam is periodically deflected upward or downward when passing through the charged particle beam guiding device;Further, the movement trajectory of charged particle beam is changed, the deflection direction of charged particle beam can be controlled, targeted coating can be realized, and the longitudinal charged particle beam coverage range of vacuum arc charged particle coating can be expanded, and coating uniformity is improved. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 The structure of the charged particle beam guiding device of the present application is shown in the structure diagram of the charged particle beam scanning device of the present application.

[0025] Figure 2 The structure of the charged particle beam guiding device of the present application is shown in the structure diagram of the charged particle beam scanning device of the present application.

[0026] Figure 3 The longitudinal distribution of the charged particle beam of the present application is shown in the longitudinal distribution diagram of the charged particle beam.

[0027] In the drawings: 1, charged particle inlet; 2, charged particle beam guiding device; 5, charged particle beam guiding device; 51, charged particle beam guiding pole; 52, charged particle beam guiding coil; 20, charged particle beam guiding pole flange; 3, charged particle beam guiding pole coil; 7, vacuum chamber; 8, coating sample holder; 9, turntable; 4, charged particle beam; 6, charged particle beam guiding pole flange. DETAILED DESCRIPTION

[0028] In the following certain exemplary embodiments are simply described. As will be realized by those skilled in the art, the described embodiments can be modified in various different ways without departing from the spirit or scope thereof. Accordingly, the drawings and descriptions are to be regarded as illustrative in nature rather than restrictive.

[0029] In the description of the present application, it is to be understood that the orientations or positional relationships indicated by the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like are based on the orientations or positional relationships shown in the drawings, and are merely intended to facilitate the description of the present application and simplify the description, and therefore cannot be understood as indicating or implying that the devices or elements indicated must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0030] In addition, the terms "first", "second", "third", etc. are used only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second", etc. can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly specified and limited.

[0031] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood broadly, for example, can be fixedly connected, can be detachably connected, or integrated; can be mechanically connected, can be electrically connected, or can be communicated; can be directly connected, or indirectly connected through an intermediate medium; can be the communication or interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0032] In the present application, unless otherwise explicitly specified and limited, "on" or "under" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, "on", "above" and "above" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. "Below", "below" and "below" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0033] It should be understood that the terms "comprises" and "comprising," when used in this specification and the following claims, indicate the presence of the described features, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0034] It should also be understood that the terms used in the specification and the following claims are intended to describe particular embodiments and do not intend to limit the present application. As used in the specification and the appended claims, the singular forms "a," "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0035] It should further be understood that the term "and / or" used in the specification and the following claims is intended to refer to any combination of one or more of the associated listed items and all possible combinations thereof.

[0036] Various structural diagrams according to the disclosed embodiments of the present application are shown in the accompanying drawings. These diagrams are not drawn to scale, in which certain details are exaggerated for clarity and others omitted. The shapes and relative sizes of the various regions, layers, and the relative positions of these regions / layers shown in the drawings are merely examples and can deviate in actuality due to manufacturing tolerances or technical limitations, and regions / layers with different shapes, sizes, and relative positions can be additionally designed by those skilled in the art according to actual needs.

[0037] Embodiments of the present application are described in detail below with reference to the accompanying drawings.

[0038] Figure 1 A single-pole magnetic coil charged particle beam scanning device according to an embodiment of the present disclosure is shown in FIG. 1, which includes a charged particle inlet 1, and a charged particle beamlet collimator 2 disposed at the output side of the charged particle inlet 1. The output side of the charged particle beamlet collimator 2 is provided with a charged particle beam guiding pole flange 6, and the outer wall of the charged particle beam guiding pole flange 6 is provided with a charged particle beam guiding device 5. Figure 1 As shown in FIG. 1, the charged particle beamlet collimator 2 is intersected by the movement direction of the charged particle beam, and the charged particle beamlet collimator 2 is provided with an axial magnetic field along the movement direction of the charged particle beam. The charged particle beam guiding device 5 is disposed on one side of the movement direction of the charged particle beam, and the charged particle beam guiding device 5 includes two magnetic poles with opposite magnetic properties, and only one of the magnetic poles is close to the charged particle beam.

[0039] As shown in FIG. 1, the charged particle beamlet collimator 2 is intersected by the movement direction of the charged particle beam, and the charged particle beamlet collimator 2 is provided with an axial magnetic field along the movement direction of the charged particle beam. The charged particle beam guiding device 5 is disposed on one side of the movement direction of the charged particle beam, and the charged particle beam guiding device 5 includes two magnetic poles with opposite magnetic properties, and only one of the magnetic poles is close to the charged particle beam.

[0040] Preferably, in this embodiment of the present disclosure, the charged particle clusterer 2 is connected to a DC power supply, and the charged particle beam guiding device 5 is connected to an AC power supply. It should be noted that, for the charged particle clusterer 2, the DC power supply is connected to the charged particle clustering pole coil 3, and for the charged particle beam guiding device 5, the AC power supply is connected to the charged particle beam guiding coil 52. Specifically, when the charged particle clusterer 2 is connected to a DC power supply, it will generate an axial magnetic field with a stable magnetic field distribution. The axial magnetic field is preferably set so that the side away from the vacuum chamber 7 is the N pole. When the charged particle beam guiding coil 52 is connected to an AC power supply, its two magnetic poles periodically form changing opposite magnetism.

[0041] Furthermore, in the embodiments of this disclosure, such as Figure 2 As shown, the charged particle beam guiding device 5 includes a charged particle beam guiding electrode 51 and a charged particle beam guiding coil 52 wound around the charged particle beam guiding electrode 51. Further, the charged particle beam guiding electrode 51 is a columnar structure, and the axial extension of the columnar charged particle beam guiding electrode 51 intersects with the direction of movement of the charged particle beam. Specifically, the angle between the columnar charged particle beam guiding electrode 51 and the direction of movement of the charged particle beam can be any angle. Further, the charged particle beam guiding coil 52 is wound around the central region of the columnar structure. It should be noted that the number of turns of the charged particle beam guiding coil 52 can be set by those skilled in the art according to actual production needs. Specifically, the more turns, the greater the force exerted by the charged particle beam guiding device 5 on the charged particles 4.

[0042] Furthermore, the charged particle beam guide electrode 51 is made of a magnetically conductive material. Specifically, the magnetically conductive material is a material with magnetic conductivity, which can effectively conduct and concentrate magnetic field lines in a magnetic field, thereby realizing energy conversion and transmission. Examples include pure iron, low-carbon steel, iron-silicon alloys, and ultracrystalline soft magnetic alloys.

[0043] Preferably, in this embodiment of the present disclosure, the charged particle clusterer 2 includes a charged particle clustering flange 20 and a charged particle clustering coil 3 wound on the charged particle clustering flange 20. Specifically, the charged particle clustering flange 20 is a metal tubular structure, and the charged particle clustering coil 3 is wound on the charged particle clustering flange 20 along its axis. Those skilled in the art can set the number of turns of the charged particle clustering coil 3 and the length of the charged particle clustering flange 20 according to actual production needs. Generally speaking, for charged particles with higher density or larger particles, a longer orientation time should be set, that is, a longer charged particle clustering flange 20 or a charged particle clustering coil 3 with more turns.

[0044] Preferably, in the embodiment of the present disclosure, the input side of the charged particle inlet 1 is provided with a charged particle emitting device, further, the charged particle emitting device can adopt a charged particle magnetic filter, which can remove large particles, neutral particles and unnecessary charged particle species in the charged particle beam 4, and retain the required pure charged particle beam 4. Specifically, the charged particle magnetic filter can adopt a linear or curved structure, wherein the linear charged particle magnetic filter usually utilizes the guiding effect of the magnetic field on the charged particle beam to reduce the size of the cathode spot and the proportion of macro-particle clusters; the curved charged particle magnetic filter deflects the charged particles under the joint action of the magnetic field and the electric field, so as to separate the large particle substances from the charged particles.

[0045] Preferably, in the embodiment of the present disclosure, a vacuum chamber 7 is further arranged in the movement direction of the charged particle beam 4, the charged particle inlet 1 and the charged particle buncher 2 are sealingly connected, and the charged particle beam guiding pole flange 6 is sealingly connected to the vacuum chamber 7;

[0046] The vacuum chamber 7 is provided with a coated sample holder 8 inside in the movement direction of the charged particle beam 4;

[0047] Further, the bottom of the coated sample holder 8 is provided with a turntable 9, which is used to drive the coated sample holder 8 to rotate.

[0048] The embodiment also discloses a method of a single-pole magnetic coil charged particle beam scanning device, comprising the following steps:

[0049] A direct current is connected to the charged particle buncher 2, and an alternating current is connected to the charged particle beam guiding device 5, the charged particle buncher 2 forms an axial magnetic field along the movement direction of the charged particle beam 4, and the charged particle beam guiding device 5 periodically forms a changing opposite magnetic near the magnetic pole in the movement direction of the charged particle beam 4;

[0050] The charged particle beam 4 is oriented to the charged particle beam guiding device 5 in the axial magnetic field;

[0051] The charged particle beam 4 periodically deflects upward or downward when passing through the charged particle beam guiding device 5.

[0052] Specifically, according to the magnetic circuit principle, the N-pole generated by the charged particle bunching pole coil 3 and the S-pole of the charged particle beam guiding pole 51 form an axial magnetic circuit, and the charged particle beam guiding device 5 generates a longitudinal magnetic field;

[0053] When the charged particle beam guiding device 5 approaches the S pole of the magnetic pole of the charged particle 4, the longitudinal magnetic circuit generated between the S pole and the N pole will guide the axial magnetic field to shift downward, thereby guiding the charged particle beam 4 to shift downward; when the charged particle beam guiding device 5 approaches the N pole of the magnetic pole of the charged particle 4, the longitudinal magnetic circuit generated between the N pole and the S pole will guide the axial magnetic field to shift upward, thereby guiding the charged particle to shift upward.

[0054] It should be noted that in some embodiments, the charged particle beam guide electrode 51 is connected to a bidirectional current. In this case, the end of the charged particle beam guide electrode 51 near the charged particle beam 4 forms an N pole and a S pole periodically. In these embodiments, the traction force of the charged particle beam guide electrode 51 on the charged particle beam 4 changes periodically in opposite directions.

[0055] In other embodiments, the charged particle beam guide electrode 51 is connected to a unidirectional current. In this case, the end of the charged particle beam guide electrode 51 near the charged particle beam periodically forms an N pole or a S pole. In these embodiments, the traction force of the charged particle beam guide electrode 51 on the charged particle beam 4 changes periodically in the same direction.

[0056] Since the charged particle beam guiding device 5 is connected to an AC power source, the magnetism of the magnetic poles near the direction of movement of the charged particle beam 4 will change periodically. In other words, the magnetic poles near the direction of movement of the charged particle beam 4 will periodically switch between the N pole and the S pole, thereby guiding the charged particle beam 4 to deflect up and down periodically and realizing the scanning of the charged particle beam 4.

[0057] Furthermore, in some embodiments, those skilled in the art can periodically rotate the sample on the coating sample holder 8 by rotating the turntable 9 periodically, and at the same time cooperate with the charged particle clusterer 2 and the charged particle beam guide device 5 to periodically guide the charged particle beam 4. By periodically guiding the movement direction of the charged particle beam 4, linear scanning of the charged particle beam can be achieved, resulting in a more uniform coating process.

[0058] like Figure 3 As shown, in Figure 3 The image on the left is a distribution diagram of the charged particle beam 4 output after only magnetic filtering in the prior art, while the image on the right is a distribution diagram of the charged particle beam 4 formed by the solution provided in this embodiment. It can be seen from the figure that the distribution of the charged particle beam 4 is wider and more uniform.

[0059] It should be noted that the present application is based on the periodic change of the axial magnetic field direction of the charged particle guiding device 5 to realize the pulling process of the charged particle beam, while the multipole field scanning method in the prior art is based on the Lorentz force generated by the magnetic field perpendicular to the direction of charged particle motion to change the direction of charged particle motion, so the present patent is different from the prior art in the basic principle.

[0060] The basic principles and main features of the present application and the advantages of the present application are shown and described above, and it is obvious for those skilled in the art that the present application is not limited to the details of the above exemplary embodiments, and the present application can be implemented in other specific forms without departing from the spirit or essential characteristics of the present application. Therefore, the embodiments should be regarded as exemplary and non-limiting in any respect, and the scope of the present application is defined by the appended claims rather than the above description, and it is intended to encompass all variations falling within the meaning and scope of the equivalent elements of the claims. Any reference signs in the claims should not be regarded as limiting the claims involved.

[0061] In addition, it should be understood that although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be properly combined to form other embodiments that those skilled in the art can understand. The above is only to illustrate the technical idea of the present application, and cannot limit the protection scope of the present application, and any modification made according to the technical idea of the present application on the basis of the technical solution falls within the protection scope of the claims of the present application.

Claims

1. A single-pole magnetic coil charged particle beam scanning device, characterized by, The device comprises a charged particle inlet (1), a charged particle buncher (2) arranged at the outlet side of the charged particle inlet (1), and a charged particle beam guiding flange (6) arranged at the outlet side of the charged particle buncher (2), wherein an outer wall of the charged particle beam guiding flange (6) is provided with a charged particle beam guiding device (5). The charged particle buncher (2) intersects the movement direction of the charged particle beam, and is provided with an axial magnetic field along the movement direction of the charged particle beam, and the charged particle beam guiding device (5) is arranged at one side of the movement direction of the charged particle beam, and comprises two magnetic poles with opposite magnetic properties, and only one of the magnetic poles is close to the charged particle beam. The charged particle buncher (2) comprises a charged particle bunching pole flange (20) and a charged particle bunching pole coil (3) wound on the charged particle bunching pole flange (20). The charged particle buncher (2) is connected to a direct current power supply, and the charged particle beam guiding device (5) is connected to an alternating current power supply.

2. The single-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that The charged particle beam guiding device (5) comprises a charged particle beam guiding pole (51) and a charged particle beam guiding coil (52) wound on the charged particle beam guiding pole (51).

3. The single-pole magnetic coil charged particle beam scanning device according to claim 2, characterized in that The charged particle beam guiding pole (51) has a columnar structure, and the axial extension of the columnar structure of the charged particle beam guiding pole (51) intersects the movement direction of the charged particle beam.

4. The single-pole magnetic coil charged particle beam scanning device according to claim 3, characterized in that The central region of the columnar structure is wound with the charged particle beam guiding coil (52).

5. The two-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that The charged particle beam guiding pole (51) is made of a magnetic conductive material.

6. The single-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that, The input side of the charged particle inlet (1) is provided with a charged particle emitting device.

7. The single-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that, A vacuum chamber (7) is arranged in the movement direction of the charged particle beam, the charged particle inlet (1) and the charged particle buncher (2) are sealingly connected, and the charged particle beam guiding flange (6) is sealingly connected to the vacuum chamber (7). The vacuum chamber (7) is provided with a coated sample holder (8) in the movement direction of the charged particle beam, and the bottom of the coated sample holder (8) is provided with a turntable (9).

8. A method of a single pole magnetic coil charged particle beam scanning apparatus, characterized by, The monopole magnetic coil charged particle beam scanning device according to any one of claims 1-7, The device comprises the following steps: A direct current is connected to the charged particle buncher (2), and an alternating current is connected to the charged particle beam guiding device (5), the charged particle buncher (2) forms an axial magnetic field along the movement direction of the charged particle beam, and the magnetic pole of the charged particle beam guiding device (5) close to the movement direction of the charged particle beam periodically forms a changing opposite magnetic property; The charged particle beam is oriented to the charged particle beam guiding device (5) in the axial magnetic field; The charged particle beam periodically deflects upward or downward when passing through the charged particle beam guiding device (5).

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