Micro-nano bubble enhanced abrasive jet polishing device with controllable abrasive concentration

Abstract

The application discloses a kind of micro-nano bubble enhanced abrasive particle cavitation jet polishing devices with controllable abrasive particle concentration.In the application, nano bubbles are used as gas nuclei to enhance the cavitation inside the flow channel. By using micro-nano bubble water, the number of cavitation bubbles is increased to improve production efficiency. The abrasive particle cavitation jet with high concentration of cavitation bubbles is used to polish the workpiece in the flow channel. Then, the control panel is used to control the abrasive particle concentration of the system by automatically adjusting the volume of the water tank, thereby generating abrasive particles with controllable concentration. The problem of backflow of high-pressure cavitation jet to abrasive particles in solid-liquid mixing is solved by using the mixing structure of "T" type, thereby more effectively polishing the workpiece in the flow channel. It can be applied to the field of industrial production.

Description

Micro-nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration Technical Field

[0001] This invention relates to a jet polishing device, specifically a micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration. Background Technology

[0002] Cavitation jets are highly effective at cleaning object surfaces. When high-pressure water passes through a nozzle, it creates a region with pressure lower than vapor pressure. Dissolved gases in the fluid are released, generating cavitation bubbles that are drawn into the jet, forming a cavitation jet. These cavitation bubbles burst upon impact with the solid surface, releasing microjet streams and shock waves that clean the surface.

[0003] Introducing abrasive particles into a cavitation jet, and mixing the abrasive particle stream with the cavitation jet to form an abrasive cavitation jet, provides excellent material removal capabilities. Under the action of the microjets generated by the collapse of cavitation bubbles, the abrasive particles are accelerated and impact the object surface, generating stronger cutting forces. Abrasive cavitation jets also offer superior polishing capabilities compared to abrasive jets.

[0004] However, limited by the cavitation nozzle, while reducing the nozzle diameter can increase the number of cavitation bubbles, it also reduces the jet diameter and flow rate. Furthermore, during the mixing process of the high-pressure cavitation jet and the low-pressure abrasive jet, a spontaneous backflow from high pressure to low pressure can easily occur. Additionally, the abrasive particle concentration is usually fixed and cannot be adjusted in real time.

[0005] In view of the above situation, it is necessary to propose a micro-nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration. Summary of the Invention

[0006] To address the issues of uneven mixing and backflow, and the inability to adjust abrasive particle concentration in real time in the prior art, this invention proposes a micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration.

[0007] This invention improves efficiency by using micro / nano bubble water to increase the number of cavitation bubbles in the cavitation jet, and further introduces abrasive particles to generate an abrasive cavitation jet to polish the inner surface of the workpiece in the flow channel. Simultaneously, the polishing effect is adjusted by changing the concentration of abrasive particles through adjustable volume.

[0008] The technical solution adopted in this invention is:

[0009] The present invention includes a micro / nano bubble enhanced cavitation jet generating system, an automatic abrasive concentration control system, and a mixing chamber. The micro / nano bubble enhanced cavitation jet generating system is connected to the first input port of the mixing chamber, and the automatic abrasive concentration control system is connected to the second input port of the mixing chamber. The micro / nano bubble enhanced cavitation jet generating system is used to generate a micro / nano bubble enhanced cavitation jet, and the automatic abrasive concentration control system is used to generate an abrasive flow with a preset concentration. A workpiece to be polished is provided at the output port of the mixing chamber.

[0010] The micro-nano bubble enhanced cavitation jet generation system includes a micro-nano bubble generator, a water tank, a liquid level sensor, a booster pump, an accumulator, a pressure regulating valve, and a first pressure gauge. The micro-nano bubble generator is connected to the water tank, which is equipped with a liquid level sensor. The water tank's outlet pipe is sequentially equipped with a booster pump, an accumulator, a pressure regulating valve, and a first pressure gauge along the water outlet direction. The micro-nano bubble enhanced cavitation jet generated in the outlet pipe flows into the first input port of the mixing chamber.

[0011] The automatic abrasive particle concentration control system includes a baffle drive assembly, a baffle, a filter, a photosensitive sensor, a filter water tank, a circulating water pipe, a second ball valve, a second pressure gauge, a diaphragm pump, and a control board. A baffle is placed in the middle of the filter water tank, dividing the liquid inside into upper and lower parts. A filter is installed in the baffle. The baffle drive assembly is connected to the baffle and is used to move the baffle up and down. A photosensitive sensor is installed in the filter water tank below the baffle. The lower part of the liquid in the filter water tank contains abrasive particles. The lower part of the liquid undergoes self-circulation through the circulating water pipe and the first diaphragm pump. The lower part of the liquid generates an abrasive particle flow through the second diaphragm pump, the second ball valve, and the second pressure gauge, and flows into the second input port of the mixing chamber. The baffle drive assembly is connected to the control board.

[0012] The micro-nano bubble-enhanced abrasive cavitation jet polishing device also includes a carrier water tank, a first ball valve, a three-way valve, and a main water outlet pipe; the mixing chamber and the workpiece to be polished are both placed in the carrier water tank, and the first ball valve and the three-way valve are installed in sequence along the water outlet direction in the main water outlet pipe of the carrier water tank. The three-way valve is connected to the abrasive concentration automatic control system.

[0013] The mixing chamber includes a cavitation jet pipe, an abrasive flow pipe, a mixing chamber body, a cavitation jet nozzle, a mixing plate sealing gasket, a mixing plate, and connectors. The mixing chamber body contains both a cavitation jet pipe and an abrasive flow pipe, which are coaxially arranged internally and externally and are not interconnected. The upper part of the abrasive flow pipe is connected to an automatic abrasive concentration control system via a connecting pipe. The inlet of the cavitation jet pipe is connected to a micro / nano bubble-enhanced cavitation jet generation system. A cavitation jet nozzle is installed in the mixing chamber body at the outlet of the cavitation jet pipe. A mixing plate is fixedly installed below the cavitation jet nozzle in the mixing chamber body, and a mixing valve is installed between the mixing plate and the mixing chamber body. The flow plate sealing gasket, the lower surface of the cavitation jet nozzle, and the upper surface of the mixing plate are arranged at intervals. The lower surface of the cavitation jet nozzle is set in a stepped shape, and the upper surface of the mixing plate is also set in a stepped shape, so that three flow channels are formed between the lower surface of the cavitation jet nozzle and the upper surface of the mixing plate. The abrasive flow in the abrasive flow pipe first flows to the mixing plate, and then passes through the three flow channels between the cavitation jet nozzle and the mixing plate in sequence before mixing with the micro-nano bubble enhanced cavitation jet to form a micro-nano bubble enhanced abrasive cavitation jet. The middle part of the mixing plate has an ejection flow channel, and the micro-nano bubble enhanced abrasive cavitation jet is ejected from the ejection flow channel of the mixing plate. The workpiece to be polished is installed under the mixing plate or the main body of the mixing chamber through the connector.

[0014] The lower surface of the cavitation jet nozzle and the upper surface of the mixing plate form three flow channels, each with a width of 0.1mm-3mm.

[0015] The connector includes a threaded connecting plate gasket, a threaded connecting plate, and bolts. The workpiece to be polished is sealed to the mixing plate or the main body of the mixing chamber through the threaded connecting plate gasket, the threaded connecting plate, and bolts.

[0016] The abrasive particles are solid abrasive particles, specifically silicon carbide particles or silicon dioxide particles, with a particle size of 15μm-150μm.

[0017] In the automatic abrasive concentration control system, the movement range of the baffle is 0-400mm, corresponding to abrasive concentration variation range of 0.5%-5%.

[0018] For the micro / nano bubble enhanced cavitation jet generation system, the micro / nano bubble generator is bidirectionally connected to the water tank to produce saturated micro / nano bubble water; the booster pump is connected to the water tank and pumps the saturated micro / nano bubble water into the cavitation jet nozzle of the mixing chamber to generate a micro / nano bubble enhanced cavitation jet. For the abrasive particle concentration automatic control system, the carrying water tank and the filter water tank are connected by water pipes, three-way valves, and ball valves, and the abrasive particles are carried in these two water tanks; the circulating water pipe is connected to both sides of the lower layer of the filter water tank by a pneumatic diaphragm pump to mix and stir the abrasive particles; the upper and lower layers of the filter water tank are separated by a partition, and the two sides of the partition are connected to rubber sealing gaskets, which can move up and down by pulleys; the filter connects the upper and lower layers of the filter water tank and can filter out excess water; the lower layer of the filter water tank is connected to an electric diaphragm pump, ball valve, and pressure gauge to generate an abrasive particle flow that pumps the abrasive particles into the mixing chamber. For the mixing chamber, the main body of the mixing chamber, the mixing plate gasket, the mixing plate, the threaded connecting plate gasket, and the threaded connecting plate are connected by threads to form a continuous flow channel. The abrasive flow and the cavitation jet converge in the mixing plate to generate an abrasive cavitation jet. Some components of the micro / nano bubble enhanced cavitation jet generation system and the abrasive concentration automatic control system are detected and automatically controlled by the control board.

[0019] The beneficial effects of this invention are:

[0020] I. This invention utilizes a micro-nano bubble generator to produce saturated micro-nano bubble water, which is then pumped to a cavitation jet nozzle under the pressure of a booster pump to generate a cavitation jet. The nano-bubbles, acting as gas nuclei, enhance cavitation within the flow channel, resulting in the generation of more cavitation bubbles compared to conventional cavitation jets, thus significantly improving efficiency.

[0021] Second, the mixing chamber designed in this invention can achieve uniform mixing of cavitation jet and abrasive flow, and the modular design facilitates disassembly and replacement.

[0022] Third, the mixing chamber structure designed in this invention mixes the cavitation jet with the abrasive flow after it is ejected. Compared with the traditional method of mixing abrasive particles with water and then ejecting them through the cavitation jet nozzle to form an abrasive cavitation jet, the cavitation jet nozzle has a longer service life and is less prone to clogging.

[0023] Fourth, the mixing chamber structure designed in this invention has a specific gap between the mixing plate and the cavitation jet nozzle, which can effectively block the backflow of high-pressure water flowing through the cavitation jet nozzle to the low-pressure abrasive flow pipeline. The design is simple, has good manufacturability, and is easy to replace.

[0024] Fifth, the lower half of the filter tank designed in this invention uses a pneumatic diaphragm pump for hydraulic stirring, which is highly reliable and easy to install and use.

[0025] VI. The filter tank designed in this invention uses a partition to separate the upper and lower areas. The two sides of the partition are sealed with rubber gaskets. The tank can be moved up and down by a pulley to change the volume of the upper and lower areas of the filter tank and freely adjust the concentration of abrasive particles.

[0026] 7. The key components of this invention are connected through a control board, which can monitor data in real time and perform automatic control. Attached Figure Description

[0027] Figure 1 is a schematic diagram of the structure of the micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive concentration according to the present invention.

[0028] Figure 2 is a perspective view of the mixing chamber of the micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive concentration according to the present invention.

[0029] Figure 3 is an axonometric view of the mixing chamber of the micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive concentration of the present invention.

[0030] Figure 4 is an installation perspective view of the anti-backflow function of the mixing plate portion of the mixing chamber of the micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive concentration of the present invention.

[0031] Figure 5 is a perspective axonometric view of the anti-backflow function of the mixing plate portion of the mixing chamber of the micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive concentration of the present invention.

[0032] In the diagram: 1 is the main inlet pipe, 2 is the main inlet pipe valve, 3 is the pre-filter, 4 is the micro / nano bubble generator, 5 is the water tank, 6 is the level sensor, 7 is the booster pump, 8 is the accumulator, 9 is the pressure regulating valve, 10 is the first pressure gauge, 11 is the carrying water tank, 12 is the mixing chamber, 12-1 is the cavitation jet pipe support, 12-2 is the cavitation jet pipe, 12-3 is the abrasive flow pipe, 12-4 is the main body of the mixing chamber, 12-5 is the cavitation jet nozzle, 12-6 is the mixing plate sealing gasket, 1 2-7 is the mixing plate, 12-8 is the threaded connection plate sealing gasket, 12-9 is the threaded connection plate, 12-10 is the bolt, 13 is the first ball valve, 14 is the three-way valve, 15 is the main outlet pipe, 16 is the pulley, 17 is the rubber sealing gasket, 18 is the partition, 19 is the filter, 20 is the photosensitive sensor, 21 is the filtered water tank, 22 is the circulating water pipe, 23 is the pneumatic diaphragm pump, 24 is the overflow water pipe, 25 is the electric diaphragm pump, 26 is the second ball valve, 27 is the second pressure gauge, and 28 is the control board. Detailed Implementation

[0033] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the present invention.

[0034] As shown in Figure 1, the present invention includes a micro / nano bubble enhanced cavitation jet generating system, an automatic abrasive concentration control system, and a mixing chamber. The micro / nano bubble enhanced cavitation jet generating system is connected to the first input port of the mixing chamber, and the automatic abrasive concentration control system is connected to the second input port of the mixing chamber. The micro / nano bubble enhanced cavitation jet generating system is used to generate a micro / nano bubble enhanced cavitation jet, and the automatic abrasive concentration control system is used to generate an abrasive flow with a preset concentration. A workpiece to be polished is provided at the output port of the mixing chamber.

[0035] The micro-nano bubble-enhanced abrasive cavitation jet polishing device also includes a carrier water tank 11, a first ball valve 13, a three-way valve 14, and a main water outlet pipe 15. The mixing chamber and the workpiece to be polished are both placed in the carrier water tank 11. The first ball valve 13 and the three-way valve 14 are installed sequentially in the main water outlet pipe 15 of the carrier water tank 11 along the water outlet direction. The three-way valve 14 is connected to the lower part of the filter water tank 21 of the abrasive concentration automatic control system.

[0036] The micro-nano bubble enhanced cavitation jet generation system includes a main inlet pipe 1, a main inlet pipe valve 2, a pre-filter 3, a micro-nano bubble generator 4, a water tank 5, a liquid level sensor 6, a booster pump 7, an accumulator 8, a pressure regulating valve 9, and a first pressure gauge 10. The main inlet pipe 1 of the water tank 5 is sequentially equipped with the main inlet pipe valve 2 and the pre-filter 3 along the water inlet direction. The micro-nano bubble generator 4 is connected to the water tank 5. The liquid level sensor 6 is installed inside the water tank 5. The outlet pipe of the water tank 5 is sequentially equipped with the booster pump 7, the accumulator 8, the pressure regulating valve 9, and the first pressure gauge 10 along the water outlet direction. The outlet pipe flows through the first input port of the mixing chamber. A micro-nano bubble enhanced cavitation jet is generated in the outlet pipe and flows into the first input port of the mixing chamber. The booster pump 7 is a high-pressure pump. The main inlet pipe 1, the liquid level sensor 6, the booster pump 7, the pressure regulating valve 9, and the first pressure gauge 10 are all connected to the control board 28. The booster pump 7, pressure regulating valve 9, and first pressure gauge 10 are connected to the control board 28, which can control the booster pump to output a stable pressure to the set point. The micro-nano bubble generator 4 produces high-concentration micro-nano bubble water in the water tank 5, which is pressurized by the booster pump 7 and generates cavitation jets through the cavitation jet nozzles 12-5. The micro-nano bubble generator 4 is normally in operation. The main water inlet valve 2 and the liquid level sensor 6 are connected to the control board 28. When the water level in the water tank 5 drops, the main water inlet valve 2 is opened.

[0037] The main inlet pipe 1 is connected to the pre-filter 3, and the water tank 5 is filled with filtered water. The level sensor 6 and the main inlet pipe valve 2 are connected to the control board 28. When the water level in the water tank drops, the level sensor is triggered, and the main inlet pipe valve 2 opens to inject water. The micro-nano bubble generator 4 is connected to the water tank 5 and converts the filtered water in the water tank 5 into saturated micro-nano bubble water. The booster pump 7 draws the saturated micro-nano bubble water from the water tank 5 and pressurizes it out. The accumulator 8 reduces the pressure fluctuations generated by the booster pump 7. The pressure regulating valve 9 sets the pressure value pumped out by the booster pump 7 and returns the excess saturated micro-nano bubble water to the water tank 5. The first pressure gauge 10 monitors the pressure in real time. The high-pressure micro-nano bubble water pumped out by the booster pump 7 finally enters the mixing chamber 12, where cavitation jets are generated in the cavitation jet nozzles 12-5. The booster pump 7, pressure regulating valve 9, and first pressure gauge 10 are connected to the control board 28 to detect and control the power of the booster pump, ensuring that the actual pressure remains stable at the set pressure. This invention uses micro-nano bubble water to generate cavitation jets, which can produce more cavitation bubbles. The control board automatically controls the remaining water level in the tank, automatically maintaining the booster pump pressure at the set pressure.

[0038] The automatic control system for abrasive particle concentration includes a baffle drive assembly, a rubber sealing gasket 17, a baffle 18, a filter 19, a photosensitive sensor 20, a filter water tank 21, a circulating water pipe 22, an overflow water pipe 24, a second ball valve 26, a second pressure gauge 27, a diaphragm pump, and a control board 28. A baffle 18 is placed in the middle of the filter water tank 21, which divides the liquid in the filter water tank 21 into upper and lower parts. A precision filter 19 is installed in the baffle 18, which can filter out excess water and discharge it through the overflow water pipe 24. The baffle drive assembly passes through the side wall of the filter tank 21 and is tightly connected to the baffle 18 via a rubber sealing gasket 17. The baffle drive assembly is used to move the baffle 18 up and down. The side wall of the filter tank 21 is marked with graduations. A photosensitive sensor 20 is installed inside the filter tank 21 below the baffle 18 to detect the turbidity of the water, i.e., the concentration of abrasive particles in the water. An overflow pipe 24 is installed at the filter tank 21 above the baffle 18. The lower part of the liquid in the filter tank 21 contains abrasive particles, which are solid abrasive particles, specifically silicon carbide particles or silicon dioxide particles, with a particle size of 15μm-150μm. The movement range of the baffle 18 is 0-400mm, corresponding to a change in abrasive particle concentration of 0.5%-5%. The lower portion of the liquid circulates through the circulating water pipe 22 and the first diaphragm pump to prevent abrasive particle sedimentation. This lower portion of the liquid then generates an abrasive particle flow via the second diaphragm pump, the second ball valve 26, and the second pressure gauge 27, flowing into the second input port of the mixing chamber. The diaphragm drive assembly, the photosensitive sensor 20, and the second pressure gauge 27 are all connected to the control board 28. The second diaphragm pump is an electric diaphragm pump 25, the first diaphragm pump is a pneumatic diaphragm pump 23, and the diaphragm drive assembly uses a pulley 16. The photosensitive sensor 20 reads signals and, through the pulley 16 in the filter tank 21, moves the diaphragm 18 up and down to control the volume of the lower half of the filter tank, thus adjusting the abrasive particle concentration. The pulley 16 and the photosensitive sensor 20 are connected to the control board 28, allowing for automatic maintenance or manual control of the abrasive particle concentration.

[0039] The abrasive particles circulate in the lower half of the carrying water tank 11, the filter water tank 21, and the pipeline. A three-way valve 14 connects to the lower half of the filter water tank 21 via a water supply pipe, partially transferring water containing abrasive particles from the carrying water tank 11 to the lower half of the filter water tank 21. A circulating water pipe 22 and a pneumatic diaphragm pump 23 connect the left and right sides of the lower half of the filter water tank 21, using compressed air to perform hydraulic agitation and prevent the abrasive particles from settling. The upper half of the filter water tank 21, free of abrasive particles, is separated from the lower half by a partition 18. A filter 19 filters water from the lower half into the upper half and discharges it through an overflow pipe 24. The partition 18 is sealed by a rubber gasket 17 and can move up and down via a pulley 16, changing the volume of the upper and lower halves of the filter water tank 21. A photosensitive sensor 20 is installed on the partition to detect the abrasive particle concentration and is connected to a control board 28 along with the pulley 16. The electric diaphragm pump 25 draws water mixed with abrasive particles from the lower half of the filter water tank 21, and pumps it into the mixing chamber 12 through the second ball valve 26 and the second pressure gauge 27. The electric diaphragm pump 25 and the second pressure gauge 27 are connected to the control board 28 for automatic control.

[0040] Hydraulic stirring improves sealing while preventing abrasive particle settling. The baffle, driven by a pulley, moves up and down to change its volume. With a constant total abrasive particle volume, changing the volume alters the liquid's capacity, thus allowing for flexible adjustment of the abrasive particle concentration. A photosensitive sensor indirectly measures the abrasive particle concentration and transmits the data to the control board. The control board processes the data from the photosensitive sensor and drives the pulley to control the baffle's up and down movement, thereby controlling the abrasive particle concentration in real time.

[0041] As shown in Figures 2, 3, 4, and 5, the mixing chamber 12 includes a cavitation jet pipe support 12-1, a cavitation jet pipe 12-2, an abrasive flow pipe 12-3, a mixing chamber body 12-4, a cavitation jet nozzle 12-5, a mixing plate sealing gasket 12-6, a mixing plate 12-7, and connecting parts. The mixing chamber body 12-4 is fixedly installed inside the carrying water tank 11 via the cavitation jet pipe support 12-1. The device includes a cavitation jet pipe 12-2 and an abrasive flow pipe 12-3. The cavitation jet pipe 12-2 and the abrasive flow pipe 12-3 are coaxially arranged internally and externally, and are not interconnected. The upper part of the abrasive flow pipe 12-3 is connected to the lower part of the filtered water tank 21 of the automatic abrasive concentration control system via a connecting pipe, and the liquid is connected to the outlet pipe. The inlet of the cavitation jet pipe 12-2 is connected to the micro / nano bubbles. Enhance the connection of the outlet pipe of the cavitation jet generation system; a cavitation jet nozzle 12-5 is installed in the mixing chamber body 12-4 at the outlet of the cavitation jet pipe 12-2. A mixing plate 12-7 is fixedly installed in the mixing chamber body 12-4 below the cavitation jet nozzle 12-5. A mixing plate sealing gasket 12-6 is installed between the mixing plate 12-7 and the mixing chamber body 12-4. The lower surface of the cavitation jet nozzle 12-5 and the upper surface of the mixing plate 12-7 are arranged at intervals. The lower surface of the cavitation jet nozzle 12-5 is set in a stepped shape, and the upper surface of the mixing plate 12-7 is also set in a stepped shape, so that three flow channels are formed between the lower surface of the cavitation jet nozzle 12-5 and the upper surface of the mixing plate 12-7. The width of the three flow channels L1, L2, and L3 formed between the lower surface of the cavitation jet nozzle 12-5 and the upper surface of the mixing plate 12-7 is 0.1mm-3mm. The mixing plate 12-7 has an anti-backflow function. By cooperating with the cavitation jet nozzle 12-5, it forms three gaps to provide resistance and prevent the high-pressure water flow through the cavitation jet nozzle 12-5 from flowing back towards the abrasive flow pipe 12-3. The abrasive flow in the abrasive flow pipe 12-3 first flows onto the mixing plate 12-7, and then passes through the three flow channels between the cavitation jet nozzle 12-5 and the mixing plate 12-7 before mixing with the micro-nano bubble-enhanced cavitation jet to form a micro-nano bubble-enhanced abrasive cavitation jet. The mixing plate 12-7 has an ejection channel in the middle, from which the micro-nano bubble-enhanced abrasive cavitation jet is ejected. The workpiece to be polished is installed below the mixing plate 12-7 or the mixing chamber body 12-4 via a connector. The mixing chamber mixes the cavitation jet with the abrasive flow through the mixing plate 12-7 to generate an abrasive cavitation jet, which polishes the workpiece connected to the threaded connecting plate 12-9.

[0042] The connectors include threaded connecting plate gasket 12-8, threaded connecting plate 12-9, and bolt 12-10. The workpiece to be polished is sealed to the mixing plate 12-7 or the mixing chamber body 12-4 via the threaded connecting plate gasket 12-8, threaded connecting plate 12-9, and bolt 12-10. The threaded connecting plate can be used to mount the workpiece for polishing; the bore diameter of the workpiece ranges from 0.4mm to 10mm.

[0043] The main body of the mixing chamber 12-4 is connected to the cavitation jet pipe 12-2 and the abrasive flow pipe 12-3, respectively. High-pressure water flow and abrasive flow enter the mixing chamber from two directions. The cavitation jet pipe support 12-1 is connected to the cavitation jet pipe 12-2 and the cavitation jet nozzle 12-5. The high-pressure water flow generated by the booster pump 7 passes through the cavitation jet pipe support 12-1 and the cavitation jet pipe 12-2 in sequence, and enters the cavitation jet nozzle 12-5 to generate a cavitation jet. The mixing plate gasket 12-6, mixing plate 12-7, threaded connecting plate gasket 12-8, and threaded connecting plate 12-9 are connected to the mixing chamber body 12-4 by bolts 12-10. The gaskets provide a good seal while forming three narrow gaps L1, L2, and L3. The abrasive flow enters the mixing chamber through the abrasive flow pipe 12-3, passes through gaps L1, L2, and L3 in sequence, and then mixes with the cavitation jet in the mixing plate 12-7 to generate an abrasive cavitation jet, which flows into the threaded connecting plate 12-9. The threaded connecting plate 12-9 connects to the workpiece to be polished, and polishing is performed under the action of the abrasive cavitation jet.

[0044] Incorporating abrasive particles into the cavitation jet can significantly improve the cutting ability of the abrasive particles, effectively polishing the workpiece in the flow channel. The mixing method using a mixing plate, which generates the cavitation jet first and then adds abrasive particles for mixing, has significant advantages over directly generating the abrasive cavitation jet by passing water mixed with abrasive particles through the cavitation jet nozzle, greatly improving the lifespan of the cavitation jet nozzle. The three gaps L1, L2, and L3 between the mixing plate 12-7 and the cavitation jet nozzle 12-5 form a "T" shape, which can provide resistance to prevent the high-pressure cavitation jet from flowing back to the low-pressure abrasive particle flow while effectively mixing.

[0045] Finally, it should be noted that the above embodiments and descriptions are only used to illustrate the technical solutions of the present invention and not to limit it. Those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the disclosure of the technical solutions of the present invention, and all such modifications and substitutions should be covered within the protection scope of the claims of the present invention.

Claims

1. A micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration, characterized in that, The system includes a micro / nano bubble-enhanced cavitation jet generation system, an automatic abrasive particle concentration control system, and a mixing chamber. The micro / nano bubble-enhanced cavitation jet generation system is connected to the first input port of the mixing chamber, and the automatic abrasive particle concentration control system is connected to the second input port of the mixing chamber. The micro / nano bubble-enhanced cavitation jet generation system is used to generate a micro / nano bubble-enhanced cavitation jet, and the automatic abrasive particle concentration control system is used to generate an abrasive particle flow with a preset concentration. A workpiece to be polished is provided at the output port of the mixing chamber for polishing the inner surface of the workpiece. The mixing chamber (12) includes a cavitation jet pipe (12-2), an abrasive particle flow pipe (12-3), a mixing chamber body (12-4), and a cavitation jet nozzle (12-5). 2-5), mixing plate sealing gasket (12-6), mixing plate (12-7), and connectors; cavitation jet pipe (12-2) and abrasive flow pipe (12-3) are provided in the main body of the mixing chamber (12-4). The cavitation jet pipe (12-2) and abrasive flow pipe (12-3) are arranged coaxially inside and outside, and the cavitation jet pipe (12-2) and abrasive flow pipe (12-3) are not connected to each other. The upper part of the abrasive flow pipe (12-3) is connected to the automatic control system of abrasive concentration through a connecting pipe. The inlet of the cavitation jet pipe (12-2) is connected to the micro-nano bubble enhanced cavitation jet generation system; the main body of the mixing chamber (12-4) at the outlet of the cavitation jet pipe (12-5) is connected to the micro-nano bubble enhanced cavitation jet generation system. 4) A cavitation jet nozzle (12-5) is installed in the middle. A mixing plate (12-7) is fixedly installed on the mixing chamber body (12-4) below the cavitation jet nozzle (12-5). A mixing plate sealing gasket (12-6) is installed between the mixing plate (12-7) and the mixing chamber body (12-4). The lower surface of the cavitation jet nozzle (12-5) and the upper surface of the mixing plate (12-7) are arranged at intervals. The lower surface of the cavitation jet nozzle (12-5) is set in a stepped shape, and the upper surface of the mixing plate (12-7) is also set in a stepped shape, so that three flow channels are formed between the lower surface of the cavitation jet nozzle (12-5) and the upper surface of the mixing plate (12-7). The abrasive flow pipe (1) The abrasive flow in 2-3) first flows onto the mixing plate (12-7), then passes through the three channels between the cavitation jet nozzle (12-5) and the mixing plate (12-7) before mixing with the micro-nano bubble-enhanced cavitation jet to form a micro-nano bubble-enhanced abrasive cavitation jet. The mixing plate (12-7) has an ejection channel in the middle, and the micro-nano bubble-enhanced abrasive cavitation jet is ejected from the ejection channel of the mixing plate (12-7). The workpiece to be polished is installed under the mixing plate (12-7) or the mixing chamber body (12-4) through a connector. The width of the three channels formed between the lower surface of the cavitation jet nozzle (12-5) and the upper surface of the mixing plate (12-7) is 0.The diameter is 1mm-3mm; the connecting parts include a threaded connecting plate sealing gasket (12-8), a threaded connecting plate (12-9), and a bolt (12-10). The workpiece to be polished is sealed to the mixing plate (12-7) or the mixing chamber body (12-4) through the threaded connecting plate sealing gasket (12-8), the threaded connecting plate (12-9), and the bolt (12-10).

2. The micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration according to claim 1, characterized in that, The micro-nano bubble enhanced cavitation jet generation system includes a micro-nano bubble generator (4), a water tank (5), a liquid level sensor (6), a booster pump (7), an accumulator (8), a pressure regulating valve (9), and a first pressure gauge (10). The micro-nano bubble generator (4) is connected to the water tank (5). A liquid level sensor (6) is installed in the water tank (5). The booster pump (7), the accumulator (8), the pressure regulating valve (9), and the first pressure gauge (10) are arranged sequentially along the water outlet pipe of the water tank (5) in the direction of water outlet. A micro-nano bubble enhanced cavitation jet is generated in the water outlet pipe and flows into the first input port of the mixing chamber.

3. The micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration according to claim 1, characterized in that, The automatic abrasive concentration control system includes a baffle drive assembly, a baffle (18), a filter (19), a photosensitive sensor (20), a filter water tank (21), a circulating water pipe (22), a second ball valve (26), a second pressure gauge (27), a diaphragm pump, and a control board (28). A baffle (18) is placed in the middle of the filter water tank (21), which divides the liquid in the filter water tank (21) into upper and lower parts. A filter (19) is installed in the baffle (18). The baffle drive assembly and the baffle (18) are connected. The partition drive assembly is used to move the partition (18) up and down. A photosensitive sensor (20) is installed in the filter water tank (21) under the partition (18). The lower part of the liquid in the filter water tank (21) contains abrasive particles. The lower part of the liquid is self-circulated through the circulating water pipe (22) and the first diaphragm pump (23). The lower part of the liquid generates abrasive flow through the second diaphragm pump (25), the second ball valve (26) and the second pressure gauge (27) and flows into the second input port of the mixing chamber. The partition drive assembly is connected to the control board (28).

4. The micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration according to claim 1, characterized in that, The micro-nano bubble-enhanced abrasive cavitation jet polishing device also includes a carrying water tank (11), a first ball valve (13), a three-way valve (14), and a main water outlet pipe (15); the mixing chamber and the workpiece to be polished are both placed in the carrying water tank (11), and the first ball valve (13) and the three-way valve (14) are installed in the main water outlet pipe (15) of the carrying water tank (11) in sequence along the water outlet direction. The three-way valve (14) is connected to the abrasive concentration automatic control system.

5. The micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration according to claim 3, characterized in that, The abrasive particles are solid abrasive particles, specifically silicon carbide particles or silicon dioxide particles, with a particle size of 15μm-150μm.

6. The micro / nano bubble-enhanced abrasive cavitation jet polishing device with controllable abrasive particle concentration according to claim 3, characterized in that, In the automatic abrasive concentration control system, the movement range of the baffle (18) is 0-400mm, corresponding to the abrasive concentration variation range of 0.5%-5%.

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