A real-time monitoring and analysis method and system for etching liquid

Abstract

The present invention discloses a real-time monitoring and analysis method and system for etching liquid, which specifically relates to the field of etching liquid concentration monitoring, and is used to solve the distortion problem caused by environmental fluctuations. The method is to accurately detect and correct key factors in the current environment during image acquisition to ensure that the conditions are consistent with those when the sample is taken, thereby solving the image distortion problem caused by environmental fluctuations. Through a similarity analysis method, the structural features of the current image and the sample image are gradually compared, and the adjustment effect is quantitatively evaluated using the gap, so that each correction can effectively improve the similarity. A nonlinear calculation model is introduced, and the similarity value is optimized through gap calculation to ensure that the etching liquid concentration prediction is more accurate. By gradually adjusting the image features to continuously approach the standard of the sample image, the accuracy of the similarity analysis is greatly improved. In addition, it can effectively cope with changes in complex environments, make the etching liquid concentration monitoring more stable and reliable, and ensure the continuity of the etching process and product quality.

Description

Technical Field

[0001] The present invention relates to the field of etching liquid concentration monitoring, and more specifically, to an etching liquid real-time monitoring and analysis method and system. Background Art

[0002] The etching process is widely used in the field of semiconductor manufacturing and precision machining. The concentration of the etching solution directly affects the uniformity and accuracy of the etching effect. In order to ensure the stability of the etching process and the quality of the product, the concentration of the etching solution needs to be monitored and adjusted in real time. Traditionally, concentration monitoring is performed through regular sampling and analysis, but this process is not only time-consuming and labor-intensive, but may also cause a lag in concentration monitoring, which in turn affects the precise control of the etching process. Therefore, a real-time monitoring system based on image analysis technology came into being. The surface image of the etching solution is obtained through image acquisition equipment, and the concentration changes of the etching solution are analyzed, which greatly improves the efficiency of etching solution concentration monitoring.

[0003] Patent document with publication number CN113820308A proposes a real-time monitoring method and system for etching solution concentration based on machine vision. The method measures the relationship between the etching solution image during the etching process and the original concentration etching solution image through structural similarity, combines the global and local features of the etching solution image, and fully describes the characteristic differences between etching solutions of different concentrations. At the same time, a Gaussian mixture model is used to fit the structural similarity value and its corresponding etching solution sample concentration. The relationship between the etching solution images of different concentrations and the concentration is quantified through the structural similarity value, thereby ensuring the accuracy of automatic calculation of the etching solution concentration. The scheme described in the present disclosure relies on the two-dimensional image data of the solution collected by the camera, avoids the corrosion caused by the direct contact between the sensor and the solution in the prior art, and improves the detection accuracy and convenience to a certain extent.

[0004] The existing etching solution concentration monitoring method based on image analysis has obvious shortcomings in dealing with changes in environmental factors. This method relies on image acquisition equipment to obtain images of the etching solution surface and predicts the concentration through structural similarity analysis. However, changes in the acquisition environment (such as light brightness, contrast, brightness or color, etc.) can significantly affect the image quality. Especially when the lighting conditions are unstable, the brightness, contrast, texture and other features of the acquired image may deviate, which in turn leads to distortion of the similarity calculation results. Specifically, fluctuations in light intensity can cause image details to be lost or overexposed, making it difficult to accurately capture subtle changes on the etching solution surface. At the same time, changes in temperature and humidity can also affect the optical properties of the etching solution, causing the image to present different reflection characteristics, misleading similarity analysis. When the environmental conditions deviate from the preset range of the sample, this method cannot perform effective image compensation or correction, resulting in a significant decrease in the accuracy of concentration prediction. Especially in situations where high-precision monitoring is required, the concentration prediction results will rely heavily on the consistency of external conditions and are difficult to cope with complex changes in the actual production environment.

[0005] In order to solve the above problems, a technical solution is now provided. Summary of the invention

[0006] In order to overcome the above-mentioned defects of the prior art, an embodiment of the present invention provides a real-time monitoring and analysis method and system for etching liquid, which accurately detects and corrects the key factors in the current environment during image acquisition to ensure consistency with the conditions when the sample is taken, thereby solving the problem of image distortion caused by environmental fluctuations. Through the similarity analysis method, the structural features of the current image and the sample image are gradually compared, and the adjustment effect is quantitatively evaluated using the gap, so that each correction can effectively improve the similarity. A nonlinear calculation model is introduced to optimize the similarity value through gap calculation to ensure that the etching liquid concentration prediction is more accurate. By gradually adjusting the image features to continuously approach the standard of the sample image, the accuracy of the similarity analysis is greatly improved. In addition, it can effectively cope with changes in complex environments, make the etching liquid concentration monitoring more stable and reliable, and ensure the continuity of the etching process and product quality to solve the problems raised in the above background technology.

[0007] To achieve the above object, the present invention provides the following technical solutions:

[0008] S1, detecting various factor values ​​of the current image, determining whether they are within the preset range of the sample, and performing similarity analysis between the current image and the sample to obtain a first similarity value, and determining the corresponding etching solution concentration value;

[0009] S2, for factors that exceed the preset range, gradually adjust the corresponding factors of the current image to gradually approach the preset range of the sample;

[0010] S3, after the adjustment is completed, re-analyze the similarity with the sample to obtain a second similarity value, and calculate the absolute difference between the first similarity value and the second similarity value to obtain a first gap value;

[0011] S4, analyzing the similarity difference between the current image before and after the adjustment to obtain a second gap value;

[0012] S5, if both the first gap value and the second gap value meet the set standard, obtain a correction coefficient by nonlinear calculation using the first gap value and the second gap value, calibrate the second similarity value, and determine whether the second similarity value meets the preset standard;

[0013] S6: If the conditions are met, determine the etching solution concentration value under the corresponding sample as the etching solution concentration corresponding to the current image.

[0014] In a preferred embodiment, step S1 includes the following contents:

[0015] Use an image acquisition device to obtain an image of the current etching liquid surface, mark it as the current image, extract image features of the current image, and obtain various factors under the current shooting conditions;

[0016] After obtaining the real-time data of various factors in the current environment, these data are compared with the preset range of the sample one by one; if the current factors are all within the preset range, it means that the current image meets the analysis requirements of the sample and image analysis can be performed directly;

[0017] Preprocess the current image; perform structural similarity analysis on the current image and the sample image, calculate the similarity value, and obtain a first similarity value; if the first similarity is greater than or equal to the corresponding threshold, the sample concentration value is directly used as the concentration judgment result of the current etching solution, and the etching solution concentration value of the corresponding sample is determined according to the first similarity value, and output as the concentration prediction result of the current etching solution.

[0018] In a preferred embodiment, step S2 includes the following contents:

[0019] When it is detected that some factors of the current image deviate from the sample, first analyze and identify the specific factors that exceed the preset range of the sample, and clarify which image features do not meet the standard;

[0020] For factors that are identified to be beyond the preset range of the sample, these factors are adjusted through image processing technology to ensure that each image feature gradually approaches the preset standard range of the sample;

[0021] After each adjustment, a preliminary comparison is made between the corrected current image and the sample image to determine whether the adjustments make the values ​​of various factors of the current image within the preset range; if the adjustment does not meet the standard, continue to make small adjustments until the values ​​of various factors of the current image are within the preset range of the sample.

[0022] In a preferred embodiment, step S3 includes the following contents:

[0023] After completing the adjustment of various factors of the current image, the adjusted current image is compared with the sample image again using the same similarity calculation method, and the similarity value of the image is recalculated and marked as the second similarity value;

[0024] The second similarity value is used as a matching measure between the adjusted current image and the sample image, and is retained for comparison with the result of the first similarity analysis;

[0025] By comparing the first similarity value and the second similarity value, a difference between the two is calculated, and the difference value is marked as a first gap value.

[0026] In a preferred embodiment, step S4 includes the following contents:

[0027] The current image before adjustment is compared with the current image after adjustment by using a structural similarity calculation method; the difference between the images before and after adjustment is quantified according to the result of the structural similarity calculation, and the absolute difference between the similarity values ​​of the two is taken to obtain a second gap value.

[0028] In a preferred embodiment, step S5 includes the following contents:

[0029] Check whether the first gap value and the second gap value both meet a preset standard range;

[0030] When both the first gap value and the second gap value meet the set standard, a nonlinear calculation method is used to combine the two to calculate the correction coefficient;

[0031] Correcting the second similarity value using the calculated correction coefficient;

[0032] The corrected similarity value is compared with the corresponding similarity threshold; if the corrected similarity value is greater than or equal to the preset similarity threshold, it indicates that the adjusted current image matches the sample sufficiently well, and the concentration value of the current etching solution can be determined.

[0033] A real-time monitoring and analysis system for etching liquid, comprising: an environment detection module, an image adjustment module, a similarity analysis module, a difference analysis module, a correction and proofreading module and a concentration display module;

[0034] Environmental detection module: detects the values ​​of various factors of the current image, determines whether it is within the preset range of the sample, and performs similarity analysis with the sample to obtain a first similarity value, and determines the corresponding etching solution concentration value; if the environmental factor value does not meet the standard, it is passed to the image adjustment module, and the current environmental factor value and the first similarity value are passed to the image adjustment module;

[0035] Image adjustment module: for factors beyond the preset range, the corresponding factors of the current image are gradually adjusted to make it gradually close to the preset range of the sample; the adjusted current image is passed to the similarity analysis module;

[0036] Similarity analysis module: after the adjustment is completed, re-analyze the similarity with the sample to obtain a second similarity value, and calculate the absolute difference between the first similarity value and the second similarity value to obtain a first gap value; pass the second similarity value and the first gap value to the difference analysis module;

[0037] Difference analysis module: analyzes the similarity difference between the current image before and after adjustment, obtains a second difference value, and transmits the second difference value to the correction and proofreading module;

[0038] Correction and proofreading module: if both the first gap value and the second gap value meet the set standard, the correction coefficient is obtained by nonlinear calculation using the first gap value and the second gap value, the second similarity value is proofread, and it is determined whether the second similarity value meets the preset standard, and the determination result is transmitted to the concentration presentation module;

[0039] Concentration display module: If the conditions are met, the etching solution concentration value under the corresponding sample is determined as the etching solution concentration corresponding to the current image.

[0040] The technical effects and advantages of the etching liquid real-time monitoring and analysis method and system of the present invention are as follows:

[0041] It can accurately detect and correct the key factors in the current environment during image acquisition to ensure that they are consistent with the conditions when the sample is taken, thereby solving the problem of image distortion caused by fluctuations in environmental factors. During the correction process, the similarity analysis method is used to gradually compare the structural features of the current image and the sample image, and the adjustment effect is evaluated by quantitative gap evaluation, so that each correction can effectively improve the similarity. By introducing a nonlinear calculation model, the first similarity value and the second similarity value are calculated for the gap, and the adjusted similarity value is optimized to ensure that the prediction of the etching solution concentration is more accurate. This method greatly improves the accuracy of similarity analysis by gradually adjusting the brightness, contrast, color and other features of the image to continuously approach the standard of the sample image. At the same time, the gap value verification mechanism can screen out images with poor adjustment effects, avoid inaccurate image correction results from entering the concentration analysis, and ensure the accuracy and stability of the etching solution concentration prediction. This solution can effectively cope with changes in complex environments, make the etching solution concentration monitoring more stable and reliable, and ensure the continuity of the etching process and product quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Figure 1 The present invention is a flow chart of a method for real-time monitoring and analyzing etching liquid.

[0043] Figure 2 The present invention is a structural schematic diagram of a real-time monitoring and analysis system for etching liquid. DETAILED DESCRIPTION

[0044] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0045] Embodiment 1: Figure 1 The present invention provides a real-time monitoring and analysis method for etching liquid, comprising:

[0046] S1, detecting various factor values ​​of the current image, determining whether it is within a preset range of the sample, and performing similarity analysis between the current image and the sample to obtain a first similarity value, and determining a corresponding etching solution concentration value.

[0047] S2, for factors that exceed the preset range, gradually adjust the corresponding factors of the current image to gradually approach the preset range of the sample.

[0048] S3, after the adjustment is completed, re-analyze the similarity with the sample to obtain a second similarity value, and calculate the absolute difference between the first similarity value and the second similarity value to obtain a first gap value.

[0049] S4, analyzing the similarity difference between the current image before and after the adjustment to obtain a second gap value.

[0050] S5, if both the first gap value and the second gap value meet the set standard, obtain a correction coefficient by nonlinear calculation using the first gap value and the second gap value, calibrate the second similarity value, and determine whether the second similarity value meets the preset standard.

[0051] S6: If the conditions are met, determine the etching solution concentration value under the corresponding sample as the etching solution concentration corresponding to the current image.

[0052] The purpose of acquiring various factors in the environment is to ensure that the conditions during image acquisition are consistent with the environment when the sample is taken. Since equipment or environmental factors such as lighting, contrast, brightness or color have a direct impact on the optical properties of the image, changes in these factors may cause deviations in the brightness, contrast and detail performance of the image, thereby affecting the accuracy of the similarity calculation. Therefore, by detecting and comparing various factors in the environment, the stability of the image acquisition conditions can be ensured, thereby improving the accuracy of the etching solution concentration prediction.

[0053] Step S1 includes the following contents:

[0054] Use image acquisition equipment to obtain the image of the current etching liquid surface, mark it as the current image, extract the image features such as brightness, contrast, color balance, texture features, etc. of the current image, and obtain various factors under the current shooting conditions. These features can reflect key factors such as light intensity, environmental contrast, color deviation and detail resolution, which are helpful for analyzing whether the current image meets the preset sample standards and are used for subsequent similarity analysis and correction adjustments.

[0055] After obtaining the real-time data of various factors in the current environment, these data are compared with the preset range of the sample one by one. If the current factors are all within the preset range, it means that the current image meets the analysis requirements of the sample and image analysis can be performed directly.

[0056] Samples refer to standard reference images collected under known conditions, which correspond to etching solutions of a specific concentration. When collecting samples, various environmental factors (such as light intensity, temperature, humidity, etc.) and the concentration of the etching solution are pre-set and known. Through these sample images, the corresponding relationship between the concentration of the etching solution and its image features can be established, which serves as a benchmark for comparative analysis in subsequent real-time monitoring. When it is necessary to determine the current concentration of the etching solution, the real-time collected images are compared with these sample images for similarity, so as to infer the current concentration of the etching solution.

[0057] Preprocess the current image, including image denoising, contrast adjustment, brightness equalization and other operations, to ensure that the image quality meets the requirements of similarity analysis.

[0058] Perform structural similarity analysis on the current image and the sample image. When calculating the similarity value, an image analysis algorithm (such as SSIM) is used to capture the detailed differences between the images.

[0059] After the similarity analysis is completed, a first similarity value is obtained, which is used to determine the concentration change of the current etching solution and match it with the concentration value corresponding to the sample.

[0060] If the first similarity is greater than or equal to the corresponding threshold, it indicates that the currently captured image is highly consistent with the sample image. This means that under the current shooting environment, the optical properties of the etching liquid are very close to the etching liquid properties under the sample conditions. Therefore, it can be considered that the etching liquid concentration value corresponding to the sample can reflect the concentration of the current etching liquid. At this time, the sample concentration value can be directly used as the concentration judgment result of the current etching liquid. According to the first similarity value, the etching liquid concentration value under the corresponding sample is determined and output as the concentration prediction result of the current etching liquid.

[0061] Step S2 includes the following contents:

[0062] When it is detected that some factors of the current image deviate from the sample, the factors that specifically exceed the preset range of the sample are first analyzed and identified to clarify which image features do not meet the standard.

[0063] For factors that are identified as exceeding the preset range of the sample, image processing technology is used to precisely adjust these factors, including brightness, contrast, color balance, noise suppression and sharpening, to ensure that each image feature gradually approaches the preset standard of the sample and achieves the required consistency of optical characteristics. For example:

[0064] In view of the brightness and contrast differences in the first image, the image processing algorithm is used to gradually adjust the brightness curve and contrast so that the light intensity distribution and light and dark levels of the image gradually approach those of the sample image. The adjusted image should reduce local overexposure or overdarkness and restore clear texture and edge features.

[0065] If the color deviation of the first image is large, a color correction algorithm (such as white balance adjustment or tone mapping) is used to gradually correct the colors in the image so that it is consistent with the color distribution of the sample image, ensuring that the hue and saturation in the image meet the preset standards.

[0066] If there is too much noise or blurred texture in the first image, a denoising algorithm is used to suppress the noise, and image sharpening technology is applied to enhance edge clarity to ensure that the detail information in the image conforms to the texture characteristics of the sample image.

[0067] After each adjustment, a preliminary comparison is made between the corrected current image and the sample image to determine whether the adjustments have made the values ​​of various factors of the current image within the preset range; if the adjustment effect is not up to standard, continue to make small adjustments until the values ​​of various factors of the current image are within the sample preset range.

[0068] Through the gradual adjustment of step S2, the image features in the current captured image that exceed the preset range of the sample can be effectively corrected, so that the various factors of the first image gradually reach the standard consistent with the sample. This adjustment method not only improves the usability of the image and ensures that the subsequent similarity analysis is more accurate, but also enhances the system's adaptability to environmental changes and avoids similarity calculation errors caused by external factors. Ultimately, this adjustment process helps to improve the accuracy of concentration prediction and the stability of monitoring, making real-time monitoring more robust.

[0069] Step S3 includes the following contents:

[0070] After completing the adjustment of various factors of the current image, the adjusted current image is compared with the sample image again using the same similarity calculation method, and the similarity value of the image is recalculated and marked as the second similarity value.

[0071] The second similarity value is used as a matching measure between the adjusted current image and the sample image, and is retained for comparison with the result of the first similarity analysis.

[0072] A first similarity value has been obtained by comparing the current image with the sample image. The first similarity value indicates the matching status between the unadjusted image and the sample image.

[0073] By comparing the first similarity value with the second similarity value, the difference between the two is calculated, and the difference value is marked as the first gap value, which reflects the improvement effect of the correction process on the image similarity. The specific calculation method is to take the absolute difference between the two.

[0074] The obtained first gap value is used to evaluate the effectiveness of the adjustment. If the first gap value is small, it means that the effect of the adjustment is limited; if the gap is large, it means that the adjustment improves the similarity between the image and the sample.

[0075] The first difference value is large: it means that after correction, the similarity between the current image and the sample image has been significantly improved, indicating that the image's brightness, contrast, color and other characteristics are significantly closer to the preset standards of the sample. A large difference value means that the adjustment process has successfully improved the quality of the image, making it more in line with the sample conditions.

[0076] The first gap value is small: it indicates that the similarity of the images before and after correction does not change much, which means that the correction effect of environmental factors is limited, the current image is close to the sample image before correction, or the adjusted image still does not achieve the ideal effect. Small gap values ​​may indicate that further analysis of the correction steps or other unidentified factors are needed.

[0077] Through the similarity analysis and gap calculation of step S3, the change in the matching degree between the image and the sample image before and after correction can be intuitively reflected, ensuring that the adjustment process has a clear quantitative basis for improving the image quality. By calculating the first gap value, the effectiveness of the correction measures in improving the similarity can be accurately judged, providing a reliable basis for subsequent concentration prediction. In addition, the analysis of the gap value allows the effect of image adjustment to be quantified, avoiding misjudgment caused by insufficient correction or excessive adjustment, ensuring more accurate image processing, and ultimately improving the accuracy of etching solution concentration prediction and the reliability of monitoring.

[0078] Step S4 includes the following contents:

[0079] Use a structural similarity calculation method (such as SSIM) to compare the current image before adjustment with the current image after adjustment to analyze the differences in structural features between the two, including changes in brightness, contrast, texture information, etc. Similarity analysis should fully consider changes in local details and overall structure of the image to quantify the difference between the image before and after correction.

[0080] According to the result of the structural similarity calculation, the difference between the images before and after the adjustment is quantified, and the absolute difference between the similarity values ​​of the two is taken to obtain the second gap value.

[0081] The second gap value is mainly used to quantify the degree of change in the structural features of the current image before and after adjustment, reflecting the impact of the current image adjustment process on the image structural features (such as brightness, contrast, texture, etc.). Through structural similarity calculation, the second gap value can accurately reflect the improvement of the adjustment measures on the overall and local details of the image. It is not only used to evaluate whether the corrected image is significantly optimized in structure, but also provides a quantitative basis for judging the effectiveness of the adjustment. A larger second gap value indicates that the structural features of the adjusted image are significantly optimized, while a smaller gap value indicates that the change before and after the adjustment is small, which may mean that the impact of the adjustment measures is limited or the image quality has a high consistency.

[0082] Step S5 includes the following contents:

[0083] First, check whether the first gap value and the second gap value both meet the preset standard range. The preset standard is determined according to the actual monitoring needs and is usually used to measure the matching degree between the image before and after adjustment and between the image and the sample after adjustment. When the gap values ​​of the two are within the standard range, it indicates that the image adjustment effect meets the requirements.

[0084] The first gap value reaching the standard means that the similarity between the current image and the sample image has been significantly improved before and after correction, indicating that after environmental factor correction, the quality of the current image and the matching degree of the sample image have been significantly improved, and the correction measures have played their due role. The first gap value reaching the standard means that the deviation between the structural features of the image and the sample has been effectively reduced.

[0085] The second gap value that meets the standard indicates that the difference in the structural characteristics of the current image before and after correction is in line with expectations, indicating that the correction process has had a sufficient impact on the structural characteristics of the image, such as brightness, contrast, and texture. The second gap value that meets the standard indicates that the image adjustment has a practical effect and the image quality has been fully optimized to make it more in line with the required image standards. This significant change in structural characteristics is also the basis for further concentration analysis.

[0086] Analyzing and checking in advance whether the first gap value and the second gap value both meet the preset standard range is to ensure that the image adjustment and correction process has produced sufficient optimization effects on the structural features of the current image. If these two gap values ​​do not meet the standards, it indicates that the adjustment effect is limited, which may be because the difference between the current captured image and the sample image has not been fully corrected, or the picture structure changes before and after the adjustment are not enough to improve the similarity. In this case, continuing with the similarity correction and concentration prediction may lead to deviations in the results. Therefore, by checking the gap values ​​in advance, images with poor adjustment effects can be screened out, avoiding the use of inaccurate correction results for similarity analysis, thereby improving the reliability and prediction accuracy of subsequent similarity correction.

[0087] When both the first gap value and the second gap value meet the set standard, a nonlinear calculation method is used to combine the two to calculate the correction coefficient. The nonlinear calculation formula may take the form of a composite function, the purpose of which is to quantify the overall effect of the correction through the interaction relationship of the gap values.

[0088] Example calculation formula: ;

[0089] in, represents the first gap value, represents the second gap value, is the correction coefficient. This correction coefficient is used to correct the similarity value.

[0090] The second similarity value is corrected by the calculated correction coefficient. The purpose of the correction is to correct the similarity value according to the changes in the image structure characteristics before and after the adjustment, so that it can more accurately reflect the actual matching situation of the current image.

[0091] The expression of the similarity value after proofreading is: ;

[0092] in, is the second similarity value, is the corrected similarity value.

[0093] The corrected similarity value is compared with the corresponding similarity threshold. If the corrected similarity value is greater than or equal to the preset similarity threshold, it indicates that the adjusted current image matches the sample sufficiently well, and the concentration value of the current etching solution can be determined.

[0094] Step S6 includes the following contents:

[0095] If the corrected similarity value is greater than or equal to the preset similarity threshold, the etching solution concentration value under the corresponding sample is determined as the etching solution concentration corresponding to the current image.

[0096] The present invention effectively solves the image distortion problem caused by environmental fluctuations by introducing the detection of current shooting environmental factors and the gradual correction of image features, ensuring that the image acquisition conditions are highly consistent with the sample conditions. Through structural similarity calculation, not only the current image is compared with the sample, but also the gap calculation of the first similarity value and the second similarity value is used to accurately quantify the correction effect, ensuring that each adjustment has substantial improvement. In particular, a nonlinear calculation model is introduced, and the first gap value and the second gap value are combined to further optimize the corrected similarity value, so that the concentration prediction result is more accurate and reliable. Compared with the traditional similarity calculation method, the present invention can more effectively cope with a variety of interference factors in a complex production environment, such as changes in illumination, contrast, noise, etc., and gradually adjust the image features to achieve a step-by-step approach to the sample preset standard, thereby maximizing the accuracy of similarity analysis. In addition, by setting a preset standard range and a gap value verification mechanism, images that do not meet the requirements can be screened out, avoiding the use of inaccurate correction results for concentration prediction, thereby significantly improving the stability and accuracy of etching solution concentration prediction, and ultimately ensuring the continuity of the etching process and the stability of product quality. This method not only improves the real-time performance of concentration monitoring, but also enhances its robustness to changes in the external environment, truly realizing high-precision and high-reliability monitoring of etching solution concentration.

[0097] Embodiment 2: Figure 2 The present invention provides an etching liquid real-time monitoring and analysis system, comprising: an environment detection module, an image adjustment module, a similarity analysis module, a difference analysis module, a correction and proofreading module and a concentration display module;

[0098] Environmental detection module: detects the values ​​of various factors of the current image, determines whether it is within the preset range of the sample, and performs similarity analysis with the sample to obtain a first similarity value, and determines the corresponding etching solution concentration value; if the environmental factor value does not meet the standard, it is passed to the image adjustment module, and the current environmental factor value and the first similarity value are passed to the image adjustment module;

[0099] Image adjustment module: for factors beyond the preset range, the corresponding factors of the current image are gradually adjusted to make it gradually close to the preset range of the sample; the adjusted current image is passed to the similarity analysis module;

[0100] Similarity analysis module: after the adjustment is completed, re-analyze the similarity with the sample to obtain a second similarity value, and calculate the absolute difference between the first similarity value and the second similarity value to obtain a first gap value; pass the second similarity value and the first gap value to the difference analysis module;

[0101] Difference analysis module: analyzes the similarity difference between the current image before and after adjustment, obtains a second difference value, and transmits the second difference value to the correction and proofreading module;

[0102] Correction and proofreading module: if both the first gap value and the second gap value meet the set standard, the correction coefficient is obtained by nonlinear calculation using the first gap value and the second gap value, the second similarity value is proofread, and it is determined whether the second similarity value meets the preset standard, and the determination result is transmitted to the concentration presentation module;

[0103] Concentration display module: If the conditions are met, the etching solution concentration value under the corresponding sample is determined as the etching solution concentration corresponding to the current image.

[0104] The above formulas are all dimensionless and numerical calculations. The formula is a formula for the most recent real situation obtained by collecting a large amount of data and performing software simulation. The preset parameters in the formula are set by technicians in this field according to actual conditions.

[0105] The above description is only by way of illustration of certain exemplary embodiments of the present invention. It is undoubted that those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

[0106] It should be noted that, in this article, if there are relational terms such as first and second, etc., they are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "including a..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0107] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A real-time monitoring and analysis method for etching solution, characterized in that: Includes steps: S1, detecting various factor values ​​of the current image, determining whether it is within the preset range of the sample, and performing similarity analysis between it and the sample to obtain a first similarity value, and determining the corresponding etching solution concentration value; S2, for factors that exceed the preset range, gradually adjust the corresponding factors of the current image to gradually approach the preset range of the sample; S3, after the adjustment is completed, re-analyze the similarity with the sample to obtain a second similarity value, and calculate the absolute difference between the first similarity value and the second similarity value to obtain a first gap value; S4, analyzing the similarity difference between the current image before and after the adjustment to obtain a second gap value; S5, if both the first gap value and the second gap value meet the set standard, obtain a correction coefficient by nonlinear calculation using the first gap value and the second gap value, calibrate the second similarity value, and determine whether the second similarity value meets the preset standard; S6: If the conditions are met, determine the etching solution concentration value under the corresponding sample as the etching solution concentration corresponding to the current image.

2. The method for real-time monitoring and analyzing etching solution according to claim 1, characterized in that: Step S1 includes the following contents: Use an image acquisition device to obtain an image of the current etching liquid surface, mark it as the current image, extract image features of the current image, and obtain various factors under the current shooting conditions; After obtaining the real-time data of various factors in the current environment, these data are compared with the preset range of the sample one by one; if the current factors are all within the preset range, it means that the current image meets the analysis requirements of the sample and image analysis can be performed directly; Preprocessing the current image; performing structural similarity analysis on the current image and the sample image, calculating a similarity value, and obtaining a first similarity value; If the first similarity is greater than or equal to the corresponding threshold, the sample concentration value is directly used as the concentration judgment result of the current etching solution. According to the first similarity value, the etching solution concentration value of the corresponding sample is determined and output as the concentration prediction result of the current etching solution.

3. The method for real-time monitoring and analyzing etching solution according to claim 2, characterized in that: Step S2 includes the following contents: When it is detected that some factors of the current image deviate from the sample, first analyze and identify the specific factors that exceed the preset range of the sample, and clarify which image features do not meet the standard; For factors that are identified to be beyond the preset range of the sample, these factors are adjusted through image processing technology to ensure that each image feature gradually approaches the preset standard range of the sample; After each adjustment, a preliminary comparison is made between the corrected current image and the sample image to determine whether the adjustments make the values ​​of various factors of the current image within the preset range; if the adjustment does not meet the standard, continue to make small adjustments until the values ​​of various factors of the current image are within the preset range of the sample.

4. The method for real-time monitoring and analyzing etching solution according to claim 3, characterized in that: Step S3 includes the following contents: After completing the adjustment of various factors of the current image, the adjusted current image is compared with the sample image again using the same similarity calculation method, and the similarity value of the image is recalculated and marked as the second similarity value; The second similarity value is used as a matching measure between the adjusted current image and the sample image, and is retained for comparison with the result of the first similarity analysis; By comparing the first similarity value and the second similarity value, a difference between the two is calculated, and the difference value is marked as a first gap value.

5. The method for real-time monitoring and analyzing etching solution according to claim 4, characterized in that: Step S4 includes the following contents: The current image before adjustment is compared with the current image after adjustment by using a structural similarity calculation method; the difference between the images before and after adjustment is quantified according to the result of the structural similarity calculation, and the absolute difference between the similarity values ​​of the two is taken to obtain a second gap value.

6. The method for real-time monitoring and analyzing etching solution according to claim 5, characterized in that: Step S5 includes the following contents: Check whether the first gap value and the second gap value both meet a preset standard range; When both the first gap value and the second gap value meet the set standard, a nonlinear calculation method is used to combine the two to calculate the correction coefficient; Correcting the second similarity value using the calculated correction coefficient; The corrected similarity value is compared with the corresponding similarity threshold; if the corrected similarity value is greater than or equal to the preset similarity threshold, it indicates that the adjusted current image matches the sample sufficiently well, and the concentration value of the current etching solution can be determined.

7. The method for real-time monitoring and analyzing etching solution according to claim 6, characterized in that: Step S6 includes the following contents: If the corrected similarity value is greater than or equal to the preset similarity threshold, the etching solution concentration value under the corresponding sample is determined as the etching solution concentration corresponding to the current image.

8. A real-time monitoring and analysis system for etching liquid, used to implement the real-time monitoring and analysis method for etching liquid according to any one of claims 1 to 7, characterized in that: include: Environmental detection module, image adjustment module, similarity analysis module, difference analysis module, correction and proofreading module and concentration presentation module; Environmental detection module: detects the values ​​of various factors of the current image, determines whether it is within the preset range of the sample, and performs similarity analysis with the sample to obtain a first similarity value, and determines the corresponding etching solution concentration value; if the environmental factor value does not meet the standard, it is passed to the image adjustment module, and the current environmental factor value and the first similarity value are passed to the image adjustment module; Image adjustment module: for factors beyond the preset range, the corresponding factors of the current image are gradually adjusted to make it gradually close to the preset range of the sample; the adjusted current image is passed to the similarity analysis module; Similarity analysis module: after the adjustment is completed, re-analyze the similarity with the sample to obtain a second similarity value, and calculate the absolute difference between the first similarity value and the second similarity value to obtain a first gap value; pass the second similarity value and the first gap value to the difference analysis module; Difference analysis module: analyzes the similarity difference between the current image before and after adjustment, obtains a second difference value, and transmits the second difference value to the correction and proofreading module; Correction and proofreading module: if both the first gap value and the second gap value meet the set standard, the correction coefficient is obtained by nonlinear calculation using the first gap value and the second gap value, the second similarity value is proofread, and it is determined whether the second similarity value meets the preset standard, and the determination result is transmitted to the concentration presentation module; Concentration display module: If the conditions are met, the etching solution concentration value under the corresponding sample is determined as the etching solution concentration corresponding to the current image.

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