Antireflection film, method for manufacturing the same, and perovskite photovoltaic module

Abstract

This invention relates to the field of perovskite photovoltaic module technology, specifically to an antireflective film, its preparation method, and a perovskite photovoltaic module. The preparation method of the antireflective film of this invention includes the following steps: coating an antireflective coating solution onto the glass surface of a pre-encapsulated perovskite photovoltaic module substrate; then sequentially performing room temperature curing, washing, and drying. This method solves the high energy consumption problem caused by high-temperature curing and tempering. The resulting antireflective film has a uniform, dense, and flat film layer with strong mechanical properties, high porosity, and high light transmittance gain; it can increase the power gain generated by the photovoltaic effect of perovskite, effectively improving power generation and increasing economic benefits.

Description

Technical Field

[0001] This invention relates to the field of perovskite photovoltaic module technology, and more specifically, to an antireflective film, its preparation method, and a perovskite photovoltaic module. Background Technology

[0002] With the development of photovoltaic light-emitting technology, anti-reflective coating (AR) technology has also gained attention. However, with current FTO float glass manufacturing processes, even the best-transmitting glass only achieves 80%–84% light transmittance, leaving approximately 15%–20% of sunlight either not passing through or being reflected (e.g., ...). Figure 1 As shown, light cannot be transferred to the perovskite chip to generate electricity. To improve the utilization rate of sunlight, crystalline silicon solar cell modules typically have one or more layers of anti-reflective coatings applied to the tempered or heat-strengthened glass surface of the front panel to reduce light reflection. Current anti-reflective coatings are mainly prepared using high-temperature coating solutions, therefore they can only be applied before module encapsulation (because applying coating after encapsulation will cause the encapsulation film to age and deteriorate). Furthermore, high temperatures inevitably cause glass deformation, resulting in problems such as glass warping and large waveform curvature, affecting subsequent perovskite cell manufacturing processes and ultimately impacting the performance of the perovskite cells.

[0003] In view of this, the present invention is hereby proposed. Summary of the Invention

[0004] One objective of this invention is to provide a method for preparing an antireflective film, thereby solving the technical problem in the prior art where the preparation of an antireflective film using a high-temperature coating solution before product packaging results in glass warping and large waveform curvature, which affects the subsequent perovskite solar cell manufacturing process.

[0005] Another objective of this invention is to provide an antireflective film with a uniform, dense, and flat film layer, strong mechanical properties, high porosity, and a large gain in light transmittance.

[0006] Another object of the present invention is to provide a perovskite photovoltaic module.

[0007] In order to achieve the above-mentioned objectives of the present invention, the following technical solution is adopted:

[0008] The method for preparing an antireflective film includes the following steps:

[0009] An anti-reflective coating is applied to the glass surface of the encapsulated perovskite photovoltaic module substrate; then, room temperature curing, washing, and drying are carried out in sequence.

[0010] In one embodiment, before applying the anti-reflective coating solution, the process further includes preheating the encapsulated perovskite photovoltaic module substrate.

[0011] In one embodiment, the preheating treatment specifically includes: heating the encapsulated perovskite photovoltaic module substrate to 40-80°C and holding it at that temperature for 10-30 minutes.

[0012] In one embodiment, after the preheating treatment, the process further includes: continuously heating the encapsulated perovskite photovoltaic module substrate.

[0013] In one embodiment, the continuous heat treatment maintains the temperature of the encapsulated perovskite photovoltaic module substrate at 40–80°C.

[0014] In one embodiment, the antireflective coating solution comprises an organosilicon monomer, an alkaline catalyst, a template agent, and a solvent; wherein the molar amount of the organosilicon monomer accounts for 1% to 5% of the total molar amount of the antireflective coating solution, the molar amount of the alkaline catalyst accounts for 1% to 3% of the total molar amount of the antireflective coating solution, the molar amount of the template agent accounts for 0.1% to 0.5% of the total molar amount of the antireflective coating solution, and the molar amount of the solvent accounts for 98% to 91.5% of the total molar amount of the antireflective coating solution.

[0015] In one embodiment, the organosilicon monomer includes at least one selected from tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane, octyltrimethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, chloropropyltriethoxysilane, and 3-mercaptopropyltrimethoxysilane.

[0016] In one embodiment, the alkaline catalyst includes at least one selected from ammonia, tetramethylammonium hydroxide, sodium hydroxide, potassium hydroxide, acrylamide, ethylenediamine, hexamethylenediamine, and triethylamine.

[0017] In one embodiment, the template agent includes alkylammonium bromide.

[0018] In one embodiment, the solvent includes at least one selected from ethanol, water, isopropanol, tert-butanol, ethylene glycol, and glycerol.

[0019] In one embodiment, the method for preparing the anti-reflective coating solution includes: mixing an alkaline catalyst, a template agent, and a solvent to obtain a first mixed solution; adding an organosilicon monomer dropwise to the first mixed solution, followed by stirring and aging.

[0020] In one embodiment, the stirring process takes 2 to 4 hours.

[0021] In one embodiment, the aging process takes 20 to 25 hours.

[0022] In one embodiment, the coating method includes at least one of roller coating, spray coating, and dip coating.

[0023] In one embodiment, the room temperature curing temperature is 18–30°C, and the room temperature curing time is 5–30 min.

[0024] In one embodiment, the washing process uses ethanol and / or water.

[0025] An antireflective film is prepared by the method described above; the thickness of the antireflective film is 80-120 nm.

[0026] A perovskite photovoltaic module includes a perovskite photovoltaic module substrate and an antireflective coating disposed on the surface of float glass of the perovskite photovoltaic module substrate; the antireflective coating is an antireflective coating as described above or an antireflective coating prepared by the method described above.

[0027] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0028] (1) The method of the present invention can avoid the problems of large warpage and large waveform curvature of FTO glass caused by high temperature sintering; it can solve the problem of low transmittance of FTO glass, improve visible light transmittance, and increase the output power (photoelectric conversion efficiency) of perovskite thin film battery; it can avoid the problems of FTO conductive layer contamination, increased sheet resistance and internal battery defects caused by contaminants caused by water or alcohol cleaning after using antireflective coating process on FTO alone; it can solve the problem that high temperature sintering antireflective film cannot be used after perovskite thin film battery is packaged; the method of preparing antireflective film at room temperature can reduce energy consumption and save equipment development funds.

[0029] (2) The antireflective film of the present invention has a uniform, dense and flat film layer, strong mechanical properties, high porosity and high light transmittance gain.

[0030] (3) The perovskite photovoltaic module of the present invention has high light transmittance gain and high power gain. Attached Figure Description

[0031] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0032] Figure 1 The IU curve and power curve of the perovskite photovoltaic module and the perovskite photovoltaic module substrate of Embodiment 1 of the present invention;

[0033] Figure 2 This is a schematic diagram of the perovskite photovoltaic module of the present invention. Detailed Implementation

[0034] The embodiments of the present invention will be described in detail below with reference to examples. However, those skilled in the art will understand that the following examples are for illustrative purposes only and should not be considered as limiting the scope of the invention. Unless otherwise specified in the examples, conventional conditions or conditions recommended by the manufacturer are followed. Reagents or instruments whose manufacturers are not specified are all commercially available conventional products.

[0035] According to one aspect of the present invention, the present invention relates to a method for preparing an antireflective film for perovskite photovoltaic modules, comprising the following steps:

[0036] An anti-reflective coating is applied to the glass surface of the encapsulated perovskite photovoltaic module substrate; then, room temperature curing, washing, and drying are carried out in sequence.

[0037] This invention involves coating an anti-reflective coating solution onto the light-receiving surface (float glass) of an FTO film layer under low-temperature conditions after the perovskite photovoltaic module substrate is encapsulated. This reduces production difficulty and investment in tempering equipment, while also solving the high energy consumption problem caused by high-temperature curing and tempering. The low-temperature coating improves the transmittance of the FTO glass, increases the power gain generated by the photovoltaic effect of perovskite, effectively increases power generation, and improves economic benefits. This invention uses room-temperature curing, reducing the impact of high-temperature curing processes on the thermal stability of perovskite cells, thus improving cell performance. After curing, the coating layer is washed to achieve a porous structure. Without washing, template agents remain, and the reduction of refractive index relies solely on the pores formed by the accumulation of silica catalyzed by alkali, resulting in a lower gain effect. This invention eliminates the need for pre-synthesizing hollow silica microspheres, using a "one-pot" method to directly generate a porous coating layer on the glass surface. It is simple to operate, highly practical, low-cost, and suitable for large-scale production.

[0038] The perovskite photovoltaic module substrate of this invention is encapsulated through lamination, lamination + autoclave, vacuum bag + autoclave, and roll forming + autoclave processes. The perovskite photovoltaic module substrate includes a perovskite cell. An FTO film and float glass are sequentially laminated on the first surface of the perovskite cell. An encapsulating film and backsheet glass are sequentially laminated on the second surface of the perovskite cell. PIB butyl adhesive is used to seal the sides of the perovskite cell and between the float glass and the backsheet glass. A junction box is provided on the surface of the backsheet glass. Figure 2 As shown, after removing the antireflection layer, the structure of the perovskite photovoltaic module substrate is shown in the schematic diagram.

[0039] In one embodiment, before applying the anti-reflective coating solution, the process further includes preheating the encapsulated perovskite photovoltaic module substrate. The purpose of preheating is to improve the bonding between the coating solution and the glass, and also to facilitate solvent evaporation and film formation. In one embodiment, the preheating process specifically includes heating the encapsulated perovskite photovoltaic module to 40–80°C, for example, 40°C, 45°C, 50°C, 55°C, 60°C, 65°C, 70°C, 75°C, or 80°C, and then holding it at that temperature for 10–30 minutes, for example, 10 minutes, 15 minutes, 20 minutes, 25 minutes, or 30 minutes. Generally, the optimal temperature for perovskite photovoltaic modules is 45–65°C, and the optimal holding time is 15–20 minutes. The heating equipment includes a laminator, a roller press, or a separate heating table.

[0040] In one embodiment, after the preheating treatment, the process further includes: subjecting the encapsulated perovskite photovoltaic module substrate to continuous geothermal treatment. In one embodiment, the continuous geothermal treatment maintains the temperature of the encapsulated perovskite photovoltaic module substrate at 40–80°C.

[0041] In one embodiment, the heat source used in the heat treatment includes a roller coating machine, wherein the working surface temperature of the roller coating machine is set to 40-80°C to maintain the surface temperature of the perovskite photovoltaic module after heating. In another embodiment, the roller coating operation can begin when the surface temperature of the perovskite photovoltaic module substrate is detected by infrared detection to be between 45°C and 65°C.

[0042] In one embodiment, the antireflective coating solution comprises an organosilicon monomer, an alkaline catalyst, a template agent, and a solvent; wherein the molar amount of the organosilicon monomer accounts for 1% to 5% of the total molar amount of the antireflective coating solution, the molar amount of the alkaline catalyst accounts for 1% to 3% of the total molar amount of the antireflective coating solution, the molar amount of the template agent accounts for 0.1% to 0.5% of the total molar amount of the antireflective coating solution, and the molar amount of the solvent accounts for 98% to 91.5% of the total molar amount of the antireflective coating solution.

[0043] In one embodiment, the molar amount of the organosilicon monomer accounts for 1%, 2%, 3%, 4%, or 5% of the total molar amount of the antireflective coating solution. When the molar amount of the organosilicon monomer is <1%, the resulting film thickness is insufficient, and there is no significant gain effect; when the molar amount of the organosilicon monomer is >5%, the resulting film thickness is excessive, and the porosity decreases, resulting in no significant gain effect. In one embodiment, the organosilicon monomer includes at least one of tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane, octyltrimethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, chloropropyltriethoxysilane, and 3-mercaptopropyltrimethoxysilane.

[0044] In one embodiment, the molar amount of the alkaline catalyst accounts for 1%, 1.5%, 2%, 2.5%, or 3% of the total molar amount of the antireflective coating solution. When the molar amount of the alkaline catalyst is <1%, the catalytic rate is too low and the aging time is too long; when the molar amount of the alkaline catalyst is >3%, the catalytic rate is too fast, easily leading to the rapid formation and sedimentation of silica particles, resulting in experimental failure. In one embodiment, the alkaline catalyst includes at least one selected from ammonia, tetramethylammonium hydroxide, sodium hydroxide, potassium hydroxide, acrylamide, ethylenediamine, hexamethylenediamine, and triethylamine.

[0045] In one embodiment, the molar amount of the template agent accounts for 0.1%, 0.2%, 0.3%, 0.4%, or 0.5% of the total molar amount of the antireflective coating solution. When the molar amount of the template agent is <0.1%, excessive silica accumulates on the template agent, leading to an increase in individual size and increased film surface roughness; when the molar amount of the template agent is >0.5%, the template agent is excessive and not completely deposited by silica, resulting in increased porosity and decreased film mechanical properties. In one embodiment, the template agent comprises alkyl ammonium bromide. Alkyl ammonium bromide includes at least one of hexadecyltrimethylammonium bromide, dodecyltrimethylammonium bromide, and didodecyldimethylammonium bromide.

[0046] In one embodiment, the solvent accounts for 98%, 89%, 90%, 91%, or 1.5% of the total molar amount of the antireflective coating solution. In one embodiment, the solvent includes at least one selected from ethanol, water, isopropanol, tert-butanol, ethylene glycol, and glycerol.

[0047] Conventional room-temperature coating solutions are divided into alkaline and acidic types. Alkaline catalytic coating solutions often use polyacrylic acid as a template agent and ammonia as a catalyst. Due to the rapid hydrolysis rate and the generally large molecular weight of the polymer, the overall template is relatively large when silica accumulates, resulting in large silica particles. This leads to poor mechanical properties and uneven distribution in the formed antireflective film. Conventional acidic catalytic antireflective coating solutions use alkylamine template agents and hydrochloric acid as catalysts. Due to the slow hydrolysis of acidic catalysts, the formed silica particles are small and form slowly, resulting in a dense antireflective film, but with poor gain effect. This invention employs both an acidic template agent and an alkaline catalyst. The template agent is long-chain, so the film coated after silica deposition is denser than the film obtained by the alkaline catalyst template agent due to the acidic template agent, but not to the degree of acidic catalyst. This gives it the advantages of both acid and alkaline catalysis. While ensuring the flatness of the film and improving its mechanical strength, it also has higher porosity, permeability, and better hydrophobicity. Therefore, its gain effect and weather resistance are improved.

[0048] In one embodiment, the method for preparing the antireflective coating solution includes: mixing an alkaline catalyst, a template agent, and a solvent to obtain a first mixed solution; adding an organosilicon monomer dropwise to the first mixed solution, followed by stirring and aging. This invention obtains an antireflective coating solution through stirring and aging, which can impart better mechanical properties, porosity, and transmittance to the antireflective film, thereby improving the gain effect and fire resistance of perovskite photovoltaic modules.

[0049] In one embodiment, the stirring treatment time is 2 to 4 hours, for example, 2 hours, 2.5 hours, 3 hours, 3.5 hours or 4 hours.

[0050] In one embodiment, the aging process takes 20 to 25 hours, for example, 20 hours, 21 hours, 22 hours, 23 hours, 24 hours, or 25 hours. Before the aging process, the container is sealed with plastic wrap.

[0051] In one embodiment, the coating method includes at least one of roller coating, spray coating, and dip coating.

[0052] In one embodiment, the coating method is roller coating. Before roller coating, the roller brush is immersed in an anti-reflective coating solution for 30 to 60 seconds, such as 30, 35, 40, 45, 50, 55, or 60 seconds. Before each roller coating of the anti-reflective film, the sponge roller brush should be fully immersed once, and the silica AR anti-reflective coating solution should completely cover the roller brush for 30 to 60 seconds to allow the roller brush to fully absorb the coating solution.

[0053] In one embodiment, the roller coating pressure is 20–60 N, for example, 20 N, 25 N, 28 N, 30 N, 35 N, 40 N, 45 N, 50 N, 55 N, or 60 N. The roller brush is pressed against the float glass surface of the perovskite module substrate. Using appropriate roller coating pressure, the coating solution can overflow from the sponge roller brush at a uniform speed during the roller coating process and be evenly applied to the surface of the perovskite photovoltaic module substrate, thereby improving the mechanical properties, porosity, and transmittance gain of the film layer.

[0054] In one embodiment, the roller coating uses a brush with a moving speed of 200 to 600 cm / min, for example, 200 cm / min, 250 cm / min, 300 cm / min, 350 cm / min, 400 cm / min, 450 cm / min, 500 cm / min, 550 cm / min or 600 cm / min.

[0055] In one embodiment, the room-temperature curing temperature is 18–30°C, such as 18°C, 20°C, 22°C, 25°C, 28°C, 30°C, etc. The room-temperature curing time is 5–30 minutes, such as 5 minutes, 10 minutes, 15 minutes, 20 minutes, 25 minutes, or 30 minutes, etc. This invention reduces the impact of high-temperature curing processes on the thermal stability of perovskite solar cells and improves cell performance by employing a suitable room-temperature curing time.

[0056] In one embodiment, the washing process uses ethanol and / or water. In another embodiment, the glass surface is cleaned with ethanol or water to remove the template agent, and then rinsed 2-4 times with pure water. Cleaning with ethanol and / or water after encapsulation will not damage the FTO.

[0057] In one embodiment, the drying process includes air drying with an air knife.

[0058] In one embodiment, the product is dried and then cured at room temperature for 3 to 7 days.

[0059] According to another aspect of the present invention, the present invention also relates to an antireflection film for perovskite photovoltaic modules, which is prepared by the method for preparing the antireflection film; the thickness of the antireflection film is 80-120 nm, for example 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, etc.

[0060] According to another aspect of the present invention, the present invention also relates to a perovskite photovoltaic module, comprising a perovskite photovoltaic module substrate with the above-described antireflective film or an antireflective film prepared by the above-described method disposed on the float glass surface of the perovskite photovoltaic module substrate.

[0061] The perovskite photovoltaic module of this invention has high average light transmittance, a large increase in average light transmittance, high short-circuit current density, and high conversion efficiency.

[0062] The following explanation, in conjunction with specific embodiments, comparative examples, and accompanying drawings, further clarifies the situation.

[0063] Example 1

[0064] The method for preparing an antireflective film includes the following steps:

[0065] (1) Preheat the encapsulated perovskite photovoltaic module substrate, i.e., heat it to 55°C and keep it warm for 20 minutes; place the preheated perovskite photovoltaic module substrate on the worktable of the roller coating equipment and set the temperature of the worktable to 55°C to maintain the surface temperature of the perovskite photovoltaic module substrate after heating.

[0066] (2) After the surface temperature of the perovskite photovoltaic module substrate is detected by infrared and is 55℃, the anti-reflective coating liquid is roller coated onto the surface of the float glass of the perovskite photovoltaic module substrate. Before each roller coating, the sponge roller should be fully immersed once, and the anti-reflective coating liquid should cover the roller. The immersion time is 45s to allow the roller to fully absorb the coating liquid. The roller coating pressure is 40N and the moving speed of the roller is 400cm / min.

[0067] The preparation method of the anti-reflective coating solution includes: adding 250 mL of ethanol (4.282 mol), 20 mL of water (1.11 mol), 8 g of hexadecyltrimethylammonium bromide (0.022 mol), and 5 mL of ammonia water (0.13 mol) to a flask in sequence, and stirring until the hexadecyltrimethylammonium bromide is completely dissolved. Then, while stirring, slowly add 30 mL of tetraethoxysilane (0.135 mol). After the addition is completed, continue stirring for 3 hours, then seal with plastic wrap and continue aging for 24 hours.

[0068] (3) The perovskite photovoltaic module substrate after roller coating was cured at room temperature for 8 minutes. The glass surface was cleaned with ethanol to remove the template agent, and then cleaned twice with pure water and dried with an air knife. The thickness of the obtained antireflective film was 100 nm.

[0069] Example 2

[0070] The method for preparing an antireflective film includes the following steps:

[0071] (1) Preheat the encapsulated perovskite photovoltaic module substrate, i.e., heat it to 40°C and keep it warm for 30 minutes; place the preheated perovskite photovoltaic module substrate on the worktable of the roller coating equipment and set the temperature of the worktable to 50°C to maintain the surface temperature of the perovskite photovoltaic module substrate after heating.

[0072] (2) After the surface temperature of the perovskite photovoltaic module substrate is detected by infrared and found to be 50°C, the anti-reflective coating solution is roller coated onto the surface of the float glass of the perovskite photovoltaic module substrate. Before each roller coating, the sponge roller should be fully immersed once, and the anti-reflective coating solution should cover the roller. The immersion time is 30s to allow the roller to fully absorb the coating solution. The roller coating pressure is 60N and the moving speed of the roller is 200cm / min.

[0073] The preparation method of the anti-reflective coating solution includes: adding 250 mL of ethanol (4.282 mol), 20 mL of water (1.11 mol), 8 g of hexadecyltrimethylammonium bromide (0.022 mol), and 5 mL of ammonia water (0.13 mol) to a flask in sequence, and stirring until the hexadecyltrimethylammonium bromide is completely dissolved. Then, while stirring, slowly add 30 mL of tetraethoxysilane (0.135 mol). After the addition is completed, continue stirring for 3 hours, then seal with plastic wrap and continue aging for 24 hours.

[0074] (3) The perovskite photovoltaic module substrate after roller coating was cured at room temperature for 5 minutes, the glass surface was cleaned with ethanol to remove the template agent, and then cleaned twice with pure water and dried with an air knife. The thickness of the obtained antireflective film was 120 nm.

[0075] Example 3

[0076] The method for preparing an antireflective film includes the following steps:

[0077] (1) Preheat the encapsulated perovskite photovoltaic module substrate, i.e., heat it to 80°C and keep it warm for 10 minutes; place the preheated perovskite photovoltaic module substrate on the worktable of the roller coating equipment and set the temperature of the worktable to 60°C to maintain the surface temperature of the perovskite photovoltaic module substrate after heating.

[0078] (2) After the surface temperature of the perovskite photovoltaic module substrate is detected by infrared and reaches 60°C, the anti-reflection coating liquid is sprayed onto the surface of the float glass of the perovskite photovoltaic module substrate.

[0079] The preparation method of the anti-reflective coating solution includes: adding 250 mL of ethanol (4.282 mol), 20 mL of water (1.11 mol), 8 g of hexadecyltrimethylammonium bromide (0.022 mol), and 5 mL of ammonia water (0.13 mol) to a flask in sequence, and stirring until the hexadecyltrimethylammonium bromide is completely dissolved. Then, while stirring, slowly add 30 mL of tetraethoxysilane (0.135 mol). After the addition is completed, continue stirring for 3 hours, then seal with plastic wrap and continue aging for 24 hours.

[0080] (3) The coated perovskite photovoltaic module substrate was cured at room temperature for 20 minutes, the glass surface was cleaned with ethanol to remove the template agent, and then rinsed twice with pure water and dried with an air knife. The thickness of the obtained antireflective film was 80 nm.

[0081] Example 4

[0082] The method for preparing the antireflective coating, excluding the method for preparing the antireflective coating solution, includes: sequentially adding 4.3 mol of isopropanol, 1.2 mol of water, 0.02 mol of dodecyltrimethylammonium bromide, and 0.13 mol of ethylenediamine to a flask, and stirring until the dodecyltrimethylammonium bromide is completely dissolved. Then, while stirring, slowly add 0.15 mol of dimethyldimethoxysilane. After the addition is complete, continue stirring for 3 hours, then seal with plastic wrap and continue aging for 24 hours; other conditions are the same as in Example 1.

[0083] Example 5

[0084] The method for preparing the antireflective coating, excluding the method for preparing the antireflective coating solution, includes: sequentially adding 4.5 mol of isopropanol, 1.5 mol of water, 0.02 mol of dodecyltrimethylammonium bromide, 0.01 mol of bis(dodecyldimethylammonium bromide)acrylamide, and 0.15 mol of triethylamine to a flask, and stirring until the hexadecyltrimethylammonium bromide is completely dissolved. Then, while stirring, slowly and simultaneously add 0.15 mol of 3-aminopropylmethyldiethoxysilane and 0.15 mol of 3-mercaptopropyltrimethoxysilane. After the addition is complete, continue stirring for 3 hours, then seal with plastic wrap and continue aging for 24 hours; other conditions are the same as in Example 1.

[0085] Comparative Example 1

[0086] The method for preparing the antireflective film, except for step (3), is as follows: the perovskite photovoltaic module substrate after roller coating is cured at room temperature for 20 minutes to obtain an antireflective film with a thickness of 100 nm; other conditions are the same as in Example 1.

[0087] Comparative Example 2

[0088] The method for preparing the antireflective coating, excluding the method for preparing the antireflective coating solution, includes: sequentially adding 3.999 mol of ethanol, 1.11 mol of water, 0.04 mol of hexadecyltrimethylammonium bromide, and 0.13 mol of ammonia to a flask, and stirring until the hexadecyltrimethylammonium bromide is completely dissolved. Then, while stirring, slowly add 0.4 mol of tetraethoxysilane. After the addition is complete, continue stirring for 3 hours, then seal with plastic wrap and continue aging for 24 hours; other conditions are the same as in Example 1.

[0089] Experimental Example

[0090] In the examples and comparative examples, the perovskite photovoltaic module area is 0.72m². 2The average light transmittance, short-circuit current, and conversion efficiency of the perovskite photovoltaic modules obtained in the examples and comparative examples were tested, and the results are shown in Table 1. Light transmittance was obtained using UV-vis testing; short-circuit current and conversion efficiency were obtained by testing the cell performance using a solar simulator. Specifically, the photoelectric conversion efficiency was tested using a steady-state solar simulator under standard sunlight at AM1.5G (1000 W / m²). 2 The voltage scan range was set to 7.5V to -0.1V, and the scan rate was 200mV / s. The IU curve and power curve of the perovskite photovoltaic module and its substrate in Embodiment 1 of this invention are shown below. Figure 1 As shown.

[0091] Table 1 Test Results

[0092]

[0093]

[0094] As shown in Table 1, the perovskite photovoltaic module obtained by the method of the present invention has high average light transmittance, a large increase in average light transmittance, high short-circuit current density, and high conversion efficiency. Comparative Example 1, without washing treatment, had residual template agent, resulting in a perovskite photovoltaic module with relatively low average light transmittance, low increase in average light transmittance, low short-circuit current density, and low conversion efficiency. In Comparative Example 2, the antireflective coating solution had an excessively high proportion of hexadecyltrimethylammonium bromide and tetraethoxysilane, affecting the film structure of the antireflective film, resulting in a perovskite photovoltaic module with relatively low average light transmittance, low increase in average light transmittance, low short-circuit current density, and low conversion efficiency.

[0095] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for preparing an antireflective film, characterized in that, Includes the following steps: An anti-reflective coating is applied to the glass surface of the encapsulated perovskite photovoltaic module substrate, followed by room temperature curing, washing, and drying. The antireflective coating solution comprises organosilicon monomers, alkaline catalysts, template agents, and solvents. The glass is FTO glass; The alkaline catalyst is at least one selected from ammonia, tetramethylammonium hydroxide, sodium hydroxide, potassium hydroxide, acrylamide, ethylenediamine, hexamethylenediamine, and triethylamine. The template agent is alkylammonium bromide; the alkylammonium bromide includes at least one of hexadecyltrimethylammonium bromide, dodecyltrimethylammonium bromide, and bis(dodecyldimethylammonium bromide); The curing time at room temperature is 5~30 minutes.

2. The method for preparing the antireflective film according to claim 1, characterized in that, Includes the following features (1) to (4): (1) Before applying the anti-reflective coating solution, the process also includes: preheating the encapsulated perovskite photovoltaic module substrate; (2) The preheating treatment specifically includes: heating the encapsulated perovskite photovoltaic module substrate to 40~80℃ and holding it at that temperature for 10~30 minutes; (3) After the preheating treatment, the process further includes: continuous geothermal treatment of the encapsulated perovskite photovoltaic module substrate; (4) The continuous geothermal treatment maintains the temperature of the encapsulated perovskite photovoltaic module substrate at 40~80℃.

3. The method for preparing the antireflective film according to claim 1, characterized in that, in, The molar amount of the organosilicon monomer accounts for 1% to 5% of the total molar amount of the antireflective coating solution, the molar amount of the alkaline catalyst accounts for 1% to 3% of the total molar amount of the antireflective coating solution, the molar amount of the template agent accounts for 0.1% to 0.5% of the total molar amount of the antireflective coating solution, and the molar amount of the solvent accounts for 98% to 91.5% of the total molar amount of the antireflective coating solution.

4. The method for preparing the antireflective film according to claim 3, characterized in that, It includes at least one of the following features (1) to (2): (1) The organosilicon monomer is at least one of tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane, octyltrimethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, chloropropyltriethoxysilane, and 3-mercaptopropyltrimethoxysilane; (2) The solvent is at least one of ethanol, water, isopropanol, tert-butanol, ethylene glycol and glycerol.

5. The method for preparing the antireflective film according to claim 3, characterized in that, Includes the following features (1) to (3): (1) The method for preparing the anti-reflective coating solution includes: mixing an alkaline catalyst, a template agent and a solvent to obtain a first mixed solution; adding an organosilicon monomer dropwise to the first mixed solution, followed by stirring and aging treatment; (2) The stirring treatment time is 2~4 hours; (3) The aging process takes 20 to 25 hours.

6. The method for preparing the antireflective film according to claim 1, characterized in that, The coating method includes at least one of roller coating, spray coating, and dip coating.

7. The method for preparing the antireflective film according to claim 1, characterized in that, The room temperature curing temperature is 18~30℃.

8. The method for preparing the antireflective film according to claim 1, characterized in that, The washing process uses ethanol and / or water.

9. An antireflective film, characterized in that, The antireflective film is prepared by the method described in any one of claims 1 to 8; the thickness of the antireflective film is 80 to 120 nm.

10. A perovskite photovoltaic module, characterized in that, The invention includes a perovskite photovoltaic module substrate and an antireflective film disposed on the surface of float glass of the perovskite photovoltaic module substrate; the antireflective film is the antireflective film of claim 9 or the antireflective film prepared by any one of claims 1 to 8.

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