Solution supply device and semiconductor device

Abstract

The invention discloses a solution supply device and semiconductor equipment, and the solution supply device is used for providing a mixed solution for a processing device. Comprising a first solution input end, a second solution input end, a first conveying pipeline, a second conveying pipeline, a mixing tank arranged at the junction of the first conveying pipeline and the second conveying pipeline, a main conveying pipeline connected with the mixing tank, and a main discharge pipeline of the main conveying pipeline connected between the mixing tank and a treatment device, the control component is in communication connection with the main discharge pipeline and the main conveying pipeline, and is used for enabling the main conveying pipeline to provide the mixed solution for the treatment device, and discharging the solution with the unstable flow rate through the main discharge pipeline. According to the invention, the effect of improving the volume proportion precision of each chemical component in the mixed liquid is realized.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor equipment, and further to a solution supply device and semiconductor equipment. Background Art

[0002] In semiconductor wet cleaning and etching equipment, different solutions need to be mixed in proportion. In order to ensure that the amount of thin film etched by the product is stable within a certain range, there are high requirements for the stability of the concentration of the mixed solution. Common mixed solutions include, for example: DHF solution (a mixture of water and 49% hydrofluoric acid), SC1 solution (a mixture of ammonia, hydrogen peroxide and water in a volume ratio of 1:2:50), HF / HNO3 solution (a mixture of hydrofluoric acid and nitric acid). The existing equipment controls the proportion volume of each component chemical solution by adjusting the injection flow of the chemical solution in different input pipelines to achieve the purpose of configuring the target concentration solution.

[0003] However, due to limitations such as pipeline design and the time required for valve response control, the concentration of the solution fluctuates greatly during the mixing process. In addition, as the number of online real-time refills increases, the concentration drift will have a cumulative effect, which will cause the solution to etch the product film in an unstable manner and even cause the product to be scrapped.

[0004] For example, in the invention patent with application number 200510075183.4, a chemical mixing and supplying device and method are disclosed, such as Figure 1 As shown, the chemical mixing and supplying device includes: a first chemical source part 112, a second chemical source part 122, a first delivery line 114, a second delivery line 124, a main delivery line 140, a mixer 142 located in the main delivery line 140, first and fourth flow meters 116 and 126, a discharge line 150, and a control component 130 for comparing the chemical mixing ratio calculated based on the flow rate data provided by the first and fourth flow meters 116 and 126 with the preset chemical mixing ratio to control the flow rate of the chemical. The discharge line 150 is connected to the first and second delivery lines 114 and 124, respectively, and can be connected to the chemical source parts 112 and 122, respectively. Because the flow rate of the initially delivered chemical is very unstable, the initially delivered chemical is discharged from the discharge line 150 for 3-5 seconds, and then a stable flow rate is maintained, that is, the chemical is discharged during the flow rate adjustment process.

[0005] Although the above-mentioned discharge line 150 can be used to discharge the unstable flowing chemicals in the first and second delivery lines 114 and 124, and prevent the chemicals with unstable flow from flowing to the main delivery line 140 and the mixer 142. However, when the delivery of chemicals to the discharge line 150 is stopped and the chemicals are delivered to the main delivery line 140, the chemicals delivered by the first delivery line 114 and the second delivery line 124 will be mixed in the main delivery line 140. Due to the changes in the pipe resistance and pressure inside the pipeline before and after the switch valve, the flow rate of the chemicals in the first delivery line 114 and the second delivery line 124 changes sharply, resulting in the instability of the flow rate of the chemicals mixed by the first delivery line 114 and the second delivery line 124 and input to the main delivery line 140, which in turn leads to the deviation of the mixing ratio of the chemicals input to the mixer 142 from the main delivery line 140, and the deviation of the concentration of the chemical solution provided by the mixer 142 to the treatment device 10.

[0006] Therefore, this patent aims to improve the volume ratio accuracy of each chemical component in the mixed liquid. Summary of the invention

[0007] In view of the above technical problems, the purpose of the present invention is to improve the volume ratio accuracy of each chemical component in the mixed liquid. In order to achieve the above purpose, the present invention provides a solution supply device and a semiconductor device.

[0008] In some embodiments, the present invention provides a solution supply device for providing a mixed solution to a processing device, comprising:

[0009] A first solution input end is used to receive an injected first solution; a second solution input end is used to receive an injected second solution; a first delivery pipeline is connected to the first solution input end; a second delivery pipeline is connected to the second solution input end; a mixing tank is connected to an end of the first delivery pipeline away from the first solution input end, and an end of the second delivery pipeline away from the second solution input end, for mixing the first solution and the second solution to form a mixed solution; a main delivery pipeline is connected between the mixing tank and the treatment device, for providing the mixed solution to the treatment device; a main discharge line is connected to the main delivery pipeline; a control component is communicatively connected to the main discharge line and the main delivery pipeline, for discharging the mixed solution with an unstable flow through the main discharge pipeline before the main delivery pipeline provides the mixed solution to the treatment device.

[0010] In some embodiments, the present invention provides a semiconductor device including a semiconductor processing apparatus and the above solution supplying apparatus.

[0011] Compared with the prior art, the present invention has the following beneficial effects:

[0012] The present invention adds a main discharge pipeline after the liquid is mixed, discharges the solution with abnormal concentration due to unstable flow rate in the early stage of the mixed solution through the main discharge pipeline, and then delivers it into the processing device after the liquid flow rate is stabilized, thereby improving the volume ratio accuracy of each component in the mixed solution. The present invention also provides a voltage stabilizer in the pipeline to stabilize the hydraulic pressure being delivered, so that the liquid with a stable flow rate is delivered into the processing device, thereby improving the volume ratio accuracy of each component in the mixed solution. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The preferred implementation modes will be described below in a clear and understandable manner with reference to the accompanying drawings to further illustrate the above-mentioned characteristics, technical features, advantages and implementation methods of the present invention.

[0014] Figure 1 is a structural diagram of a chemical mixing and supplying device of the background technology of the present invention;

[0015] Figure 2 It is a schematic diagram of an embodiment of the solution supply device of the present invention;

[0016] Figure 3 is a schematic diagram of another embodiment of the solution supply device of the present invention;

[0017] Figure 4 is a schematic diagram of another embodiment of the solution supply device of the present invention;

[0018] Figure 5 It is a schematic diagram of another embodiment of the solution supply device of the present invention. DETAILED DESCRIPTION

[0019] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the specific implementation methods of the present invention will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings and other implementation methods can be obtained based on these drawings without creative work.

[0020] In order to simplify the drawings, only the parts related to the invention are schematically shown in each figure, and they do not represent the actual structure of the product. In addition, in order to simplify the drawings and facilitate understanding, in some figures, only one of the parts with the same structure or function is schematically drawn or marked. In this article, "one" not only means "only one", but also means "more than one".

[0021] In this document, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0022] In addition, in the description of the present application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0023] [Example 1]

[0024] like Figure 2 As shown, this embodiment discloses a solution supply device 200, which includes a first solution input end 211, a second solution input end 221, a first delivery pipeline 210, a second delivery pipeline 220, a main delivery pipeline 230, a main discharge pipeline 240, a mixing tank 250 and a control component 270.

[0025] The first solution input end 211 is used to receive the injected first solution, and the second solution input end 221 is used to receive the injected second solution, and the first solution is different from the second solution. The first delivery pipeline 210 is connected to the first solution input end 211, and the second delivery pipeline 220 is connected to the second solution input end 221. The mixing tank 250 is connected to one end of the first delivery pipeline 210 away from the first solution input end 211, and one end of the second delivery pipeline 220 away from the second solution input end 221, that is, the mixing tank 250 is arranged at the confluence of the first delivery pipeline 210 and the second delivery pipeline 220, or the first delivery pipeline 210 and the second delivery pipeline 220 are respectively connected to the mixing tank 250, for mixing the solutions respectively delivered by the first delivery pipeline 210 and the second delivery pipeline 220. The main delivery pipeline 230 is connected between the mixing tank 250 and the treatment device 300, for providing the mixed solution to the treatment device 300.

[0026] In addition, the main discharge pipeline 240 is connected to the main delivery pipeline 230, which is equivalent to a branch of the main delivery pipeline 230. The control component 270 is connected to the main delivery pipeline 230 and the main discharge pipeline 240 respectively, and is used to control the main discharge pipeline 240 to discharge the mixed solution before the main delivery pipeline 230 provides the mixed solution to the treatment device 300. Figure 2The solution with unstable flow rate is discharged in the DR direction shown. This embodiment can stably deliver the mixed solution in the mixing tank 250 to the processing device 300, thereby improving the volume ratio accuracy of each component in the mixed solution, so that the mixed solution supplied to the processing device 300 each time has an accurate concentration.

[0027] This application does not limit how to discharge the solution. In some embodiments, a second regulating valve 241 is provided on the main discharge pipeline 240, and a first regulating valve 231 is provided on the main delivery pipeline 230 between the main discharge pipeline 240 and the treatment device 300. The first regulating valve 231 is located between the main discharge pipeline 240 and the treatment device 300, and the first regulating valve 231 and the second regulating valve 241 are respectively connected to the control component 270 for communication. Before the main delivery pipeline 230 provides the mixed solution to the treatment device 300, the control component 270 closes the first regulating valve 231 and opens the second regulating valve 241 to discharge the solution with an unstable flow through the main discharge pipeline 240. When the main delivery pipeline 230 provides the mixed solution to the treatment device 300, the control component 270 first opens the first regulating valve 231. At this time, the solution in the main delivery pipeline 230 is divided into two parts, one part continues to be discharged by the main discharge pipeline 240, and the other part is supplied to the treatment device 300. After the first regulating valve 231 and the second regulating valve 241 are simultaneously in the open state for a preset time, the solution flow in the main delivery pipeline 230 will tend to stabilize. At this time, the second regulating valve 241 is closed. At this time, all the solution in the main delivery pipeline 230 is supplied to the processing device 300.

[0028] Preferably, the main discharge pipeline 240 is provided with a second flow meter 242, and the main delivery pipeline 230 is provided with a first flow meter 232 between the main discharge pipeline 240 and the treatment device 300, and the first flow meter 232 and the second flow meter 242 are respectively connected to the control component 270 for communication. Before the main delivery pipeline 230 provides the mixed solution to the treatment device 300, the flow value of the solution flow in the main discharge pipeline 240 detected by the second flow meter 242 when the flow rate is stable is the first detection value. When the main delivery pipeline 230 provides the mixed solution to the treatment device 300, the flow rate of the solution in the main delivery pipeline 230 will change due to the opening of the first regulating valve 231. At this time, the real-time value of the solution flow rate (i.e., the solution flow rate in the branch 233 of the main delivery pipeline 230) delivered from the main delivery pipeline 230 to the treatment device 300 detected by the first flow meter 232 is defined as the second detection value, and the real-time value of the solution flow rate in the main discharge pipeline 240 detected by the second flow meter 242 is defined as the third detection value. The control component 270 adjusts the opening rate of the first regulating valve 231 and the closing rate of the second regulating valve 241 to keep the sum of the second detection value and the third detection value equal to the first detection value, thereby maintaining the flow stability in the main delivery pipeline 230. Finally, the first regulating valve 231 is fully opened and the second regulating valve 241 is fully closed. At this time, the second detection value is equal to the first detection value, and the third detection value is equal to zero.

[0029] Preferably, if Figure 3 As shown, a feed tank 234 (daily tank) may also be provided on the main delivery pipeline 230. The feed tank 234 is located between the main discharge pipeline 240 and the treatment device 300, and is used to buffer the mixed solution from the mixing tank 250 and supply it to the treatment device 300. In the drawings of this embodiment, the feed tank 234 is provided after the first regulating valve 231 and the second flow meter 242 and before the treatment device 300, so as to improve the volume ratio accuracy of each component in the mixed solution entering the feed tank 234, so that the mixed solution supplied to the treatment device 300 by the feed tank 234 each time has an accurate concentration.

[0030] In some embodiments, a third regulating valve 212 and a third flowmeter 213 are provided on the first delivery pipeline 210, and the third regulating valve 212 is located between the first solution input end 211 and the third flowmeter 213. A fourth regulating valve 222 and a fourth flowmeter 223 are provided on the second delivery pipeline 220, and the fourth regulating valve 222 is located between the second solution input end 221 and the fourth flowmeter 223, that is, along the solution flow direction in the first delivery pipeline 210 or the second delivery pipeline 220, the third flowmeter 213 is downstream of the third regulating valve 212, and the fourth flowmeter 223 is downstream of the fourth regulating valve 222, so as to detect the actual flow in the first delivery pipeline 210 or the second delivery pipeline 220 that may fluctuate due to the action of the third regulating valve 212 or the fourth regulating valve 222. The third regulating valve 212 and the fourth regulating valve 222, the third flowmeter 213 and the fourth flowmeter 223 are respectively connected to the control component 270 for communication, and the control component 270 can receive the flow information signal sent by the third flowmeter 213 and the fourth flowmeter 223, and control the opening of the third regulating valve 212 and the fourth regulating valve 222 to adjust the flow of each pipeline. It should be noted that the first, second, third and fourth regulating valves 231, 241, 212 and 222 are preferably flow control valves (FCV), and can also be ordinary gate valves.

[0031] When the third regulating valve 212 and the fourth regulating valve 222 are selected as flow control valves, the control component 270 can control the concentration ratio by controlling the flow ratio of the solutions in the first delivery pipeline 210 and the second delivery pipeline 220 respectively through the flow control valves, that is, the control component 270 detects the flow data in the first delivery pipeline 210 and the second delivery pipeline 220 respectively through the third flow meter 213 and the fourth flow meter 223, calculates the flow ratio of different chemical solutions injected into the first solution input end 211 and the second solution input end 221, compares the calculated flow ratio with the preset solution volume mixing ratio, and outputs a control signal for controlling the opening rate of the third regulating valve 212 and the fourth regulating valve 222, thereby controlling the concentration of the mixed solution, so that the first solution and the second solution are mixed to form a mixed solution with the above-mentioned preset solution volume mixing ratio, thereby achieving the preset concentration ratio.

[0032] In practical applications, take the case where the first solution input end 211 injects HF (hydrogen fluoride) solution and the second solution input end 221 injects DIW (deionized water) as an example:

[0033] First, only the second, third and fourth regulating valves 241, 212 and 222 are opened, and the first regulating valve 231 is closed. The control component 270 controls the flow ratio of HF or DIW in the first delivery pipeline 210 and the second delivery pipeline 220 through the third regulating valve 212 and the fourth regulating valve 222, respectively, to adjust the concentration of the mixed solution in the mixing tank 250, and the HF / DIW mixed solution with large flow fluctuations caused by changes in pressure or pipe resistance is discharged from the main discharge pipeline 240. Secondly, after the second flowmeter 242 detects that the solution flow in the main discharge pipeline 240 is stable, the control component 270 opens the first regulating valve 231 to inject the HF / DIW mixed solution with a stable flow into the feed tank 234, and in the above process, the control component 270 adjusts the opening rate of the first regulating valve 231 and the closing rate of the second regulating valve 241 according to the above-mentioned control method to maintain the stability of the flow in the main delivery pipeline 230.

[0034] [Example 2]

[0035] like Figure 4 As shown, this embodiment discloses a solution supply device 200, which is similar to the first embodiment and includes a first solution input end 211, a second solution input end 221, a first delivery pipeline 210, a second delivery pipeline 220, a main delivery pipeline 230, a main discharge pipeline 240, a mixing tank 250, a feed tank 234 and a control component 270. The connection method of the above components and pipelines is the same as that of the first embodiment, and will not be repeated here. The difference between this embodiment and the first embodiment is that a buffer tank 214 and a circulation pipeline 215 are added to the first delivery pipeline 210, and a secondary discharge pipeline 224 is added to the second delivery pipeline 220.

[0036] Among them, the buffer tank 214 is located between the first solution input end 211 and the third regulating valve 212, one end of the circulation pipeline 215 is connected to the first delivery pipeline 210 between the buffer tank 214 and the first solution input end 211, and the other end is connected to the first delivery pipeline 210 between the buffer tank 214 and the third regulating valve 212, and the circulation pipeline 215 is equipped with a fifth regulating valve 216 and a fifth flowmeter 217. One end of the secondary discharge pipeline 224 is connected to the first delivery pipeline 210 between the second solution input end 221 and the fourth regulating valve 222, and the secondary discharge pipeline 224 is equipped with a sixth regulating valve 225 and a sixth flowmeter 226. The fifth regulating valve 216, the sixth regulating valve 225, the fifth flowmeter 217 and the sixth flowmeter 226 are also respectively connected to the control component 270 for communication.

[0037] In practical applications, take the case where the first solution input end 211 injects HF (hydrogen fluoride) solution and the second solution input end 221 injects DIW (deionized water) as an example:

[0038] First, only the fifth regulating valve 216 and the sixth regulating valve 225 are opened, and the first, second, third and fourth regulating valves 231, 241, 212 and 222 are closed. The HF solution will circulate in the buffer tank 214 and the circulation pipeline 215 at the set flow rate, and the DIW will begin to be regulated in a stable flow rate through the secondary discharge pipeline 224. Secondly, when the flow rates of the HF solution and DIW reach the set value and stabilize for a period of time, the fifth regulating valve 216 and the sixth regulating valve 225 are closed, and the second, third and fourth regulating valves 241, 212 and 222 are opened synchronously, and the first regulating valve 231 is still in a closed state. The HF solution stops entering the circulation pipeline 215, and the DIW stops being discharged from the secondary discharge pipeline 224. The HF solution and DIW will converge in the mixing tank 250, and the HF / DIW mixed solution after passing through the mixing tank 250 flows to the main discharge pipeline 240, and the HF / DIW mixed solution with a large flow fluctuation caused by the change of pressure or pipe resistance is discharged from the main discharge pipeline 240. Finally, after the second flow meter 242 detects that the flow rate is stable, the first regulating valve 231 is opened to inject the HF / DIW mixed solution with a stable flow rate into the feed tank 234 .

[0039] [Example 3]

[0040] like Figure 5 As shown, this embodiment discloses a solution supply device 200, which is similar to the first embodiment and includes a first solution input end 211, a second solution input end 221, a first delivery pipeline 210, a second delivery pipeline 220, a main delivery pipeline 230, a mixing tank 250, a feed tank 234 and a control component 270. The connection method of the above components and pipelines is the same as that of the first embodiment, and will not be repeated here. The difference between this embodiment and the first embodiment is that a voltage stabilizer 260 is added to the first delivery pipeline 210 and the second delivery pipeline 220, respectively.

[0041] In addition, since the first delivery pipeline 210 and the second delivery pipeline 220 respectively maintain a constant pressure in the pipeline through the stabilizer 260, the pressure of the solution entering the main delivery pipeline 230 remains unchanged, thereby ensuring the effect of dynamic stability of the flow rate, that is, the stabilizer 260 can play the same technical effect as the main discharge pipeline 240 in the first embodiment, so the main delivery pipeline 230 may not be connected to the main discharge pipeline 240 in this embodiment. Among them, the stabilizer 260 can use a hydraulic balance valve, or it can be composed of a controller, a pressure sensor and a flow control valve. The pressure sensor is connected to the inside of the pipe and transmits the pressure signal to the controller. The controller controls the opening of the flow control valve according to the received pressure signal, so that the pressure in the pipe is maintained at a constant state. The controller can be independent of the control component 270, or it is a part of the control component 270.

[0042] In practical applications, take the case where the first solution input end 211 injects HF (hydrogen fluoride) solution and the second solution input end 221 injects DIW (deionized water) as an example:

[0043] If the main delivery pipeline 230 is connected to the main discharge pipeline 240: first open the second, third and fourth regulating valves 241, 212 and 222, close the first regulating valve 231, and the HF solution and DIW are respectively passed through the regulators 260 of their respective pipelines and merged in the mixing tank 250, and the HF / DIW mixed solution is discharged for a specified time through the main discharge pipeline 240. When the feed tank 234 needs to be replenished, close the second regulating valve 241, open the first regulating valve 231, and inject the HF / DIW mixed solution with a stable flow into the feed tank 234.

[0044] If the main delivery pipeline 230 is not connected to the main discharge pipeline 240, the first, third and fourth regulating valves 231, 212 and 222 are directly opened to allow the HF solution and DIW to merge in the mixing tank 250 through the regulators 260 of their respective pipelines, and the HF / DIW mixed solution injected into the feed tank 234 is maintained in a dynamic balance of the hydraulic pressure in the main delivery pipeline 230 by using the regulators 260 on the first and second delivery pipelines 210 and 220, so as to provide a stable flow rate for the feed tank 234, so as to ensure the accuracy of the concentration of the HF / DIW mixed solution.

[0045] [Example 4]

[0046] This embodiment discloses a semiconductor device, which includes a processing device 300 and a solution supply device 200 in any of the above embodiments. The above processing device 300 includes but is not limited to a wafer cleaning tank or a wafer etching tank, and the solution supply device 200 can provide a mixed solution to one or more of the above wafer cleaning tanks and wafer etching tanks through a main delivery pipeline 230, thereby performing etching and cleaning processes on the wafer. In this embodiment, by setting the above solution supply device 200 in the semiconductor device, the stability of the amount of etched film in the etching process can be improved, and the cleanliness of the substrate surface in the cleaning process can be improved.

[0047] It should be noted that the above embodiments can be freely combined as needed. The above are only preferred embodiments of the present invention. For ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A solution supply device for providing a mixed solution to a treatment device, characterized in that: include: A first solution input end, used for receiving an injected first solution; A second solution input end, used for receiving the injected second solution; A first delivery pipeline connected to the first solution input end; a second delivery pipeline connected to the second solution input end; a mixing tank connected to an end of the first delivery pipeline away from the first solution input end and an end of the second delivery pipeline away from the second solution input end, for mixing the first solution and the second solution to form a mixed solution; a main delivery pipeline, connected between the mixing tank and the processing device, for providing a mixed solution to the processing device; a main discharge pipeline connected to the main delivery pipeline; A control component is communicatively connected with the main discharge pipeline and the main delivery pipeline, and is used to discharge the mixed solution with an unstable flow through the main discharge pipeline before the main delivery pipeline provides the mixed solution to the treatment device.

2. The solution supply device according to claim 1, characterized in that: A first regulating valve is provided on the main delivery pipeline, and the first regulating valve is located between the main discharge pipeline and the processing device; A second regulating valve is provided on the main discharge pipeline; The control component is in communication with the first regulating valve and the second regulating valve, respectively, and is configured to: before the main delivery pipeline provides the mixed solution to the treatment device, the control component closes the first regulating valve and opens the second regulating valve to discharge the mixed solution with an unstable flow rate through the main discharge pipeline; and When the main delivery pipeline provides the mixed solution to the processing device, the control component controls the first regulating valve to open, and controls the first regulating valve and the second regulating valve to be in the open state for a preset time, and then closes the second regulating valve.

3. The solution supply device according to claim 1, characterized in that: A first regulating valve and a first flow meter are sequentially arranged on the main delivery pipeline, and the first regulating valve and the first flow meter are located between the main discharge pipeline and the treatment device; The main discharge pipeline is provided with a second regulating valve and a second flow meter in sequence; The control component is respectively connected to the first regulating valve, the first flow meter, the second regulating valve and the second flow meter in communication, and is configured as follows: Before the main delivery pipeline provides the mixed solution to the treatment device, the control component closes the first regulating valve and opens the second regulating valve, and the flow value of the solution flow in the main discharge pipeline detected by the second flow meter when it is stable is a first detection value; When the main delivery pipeline provides a mixed solution to the treatment device, the real-time value of the solution flow rate delivered from the main delivery pipeline to the treatment device detected by the first flowmeter is a second detection value, and the real-time value of the solution flow rate in the main discharge pipeline detected by the second flowmeter is a third detection value, and the control component adjusts the opening rate of the first regulating valve and the closing rate of the second regulating valve so that the sum of the second detection value and the third detection value is equal to the first detection value.

4. The solution supply device according to claim 1, characterized in that: The main conveying pipeline is provided with a feed tank, which is located between the main discharge pipeline and the treatment device and is used for buffering the mixed solution from the mixing tank and supplying it to the treatment device.

5. The solution supply device according to claim 1, characterized in that: A third regulating valve and a third flow meter are provided on the first delivery pipeline; A fourth regulating valve and a fourth flow meter are provided on the second delivery pipeline; The control component is also configured to: receive flow data detected by the third flow meter and the fourth flow meter, calculate the flow ratio of the first solution and the second solution, compare the flow ratio with a preset mixing ratio, and output a control signal for controlling the opening rate of the third regulating valve and the fourth regulating valve, so that the first solution and the second solution are mixed to form a mixed solution with the preset mixing ratio.

6. The solution supply device according to claim 1, characterized in that: The first delivery pipeline and the second delivery pipeline are respectively provided with pressure stabilizers for stabilizing the hydraulic pressure in the first delivery pipeline and the second delivery pipeline.

7. The solution supply device according to claim 1, characterized in that: include: A buffer tank, provided in the first delivery pipeline; A circulation pipeline is connected before and after the buffer tank of the first delivery pipeline, and is used to recover the first solution with unstable flow through the circulation pipeline before the first delivery pipeline provides the first solution to the mixing tank.

8. The solution supply device according to claim 1 or 7, characterized in that: include: The secondary discharge pipeline is connected to the second delivery pipeline and is used to discharge the second solution with an unstable flow rate through the secondary discharge pipeline before the second delivery pipeline provides the second solution to the mixing tank.

9. A solution supply device for providing a mixed solution to a treatment device, characterized in that: include: A first solution input end, used for receiving an injected first solution; A second solution input end, used for receiving the injected second solution; A first delivery pipeline connected to the first solution input end; a second delivery pipeline connected to the second solution input end; a mixing tank connected to an end of the first delivery pipeline away from the first solution input end and an end of the second delivery pipeline away from the second solution input end, for mixing the first solution and the second solution to form a mixed solution; The main delivery pipeline is connected between the mixing tank and the processing device and is used to provide the mixed solution to the processing device; wherein, The first delivery pipeline and the second delivery pipeline are respectively provided with pressure stabilizers for stabilizing the hydraulic pressure in the first delivery pipeline and the second delivery pipeline.

10. A semiconductor device, characterized in that: The invention comprises a processing device for processing a semiconductor and a solution supply device as claimed in any one of claims 1 to 9.

Images