LDI splicing improvement method and device, equipment and storage medium

Abstract

The invention relates to an LDI splicing improvement method and device, computer equipment, a storage medium and a computer program product. The method comprises the following steps: calculating error values of exposure patterns of different spatial light modulators at different positions on the basis of an actual exposure pattern formed by obtaining a plurality of preset position exposure correction patterns; calculating the number of pulses required by different spatial light modulators for overturning at different positions based on the error value; obtaining a mapping relation between the pulse number and a corresponding spatial light modulator; and adjusting the pulse number of the spatial light modulator based on the mapping relation, and performing exposure based on the adjusted pulse number. According to the method, the actual exposure pattern formed by the exposure correction pattern is obtained, the error values of the exposure patterns of different spatial light modulators at different positions are calculated, and the pulse number of the different spatial light modulators at different positions is calculated based on the error values. The spatial light modulator is enabled to turn over directly according to the adjusted pulse number, so that the problem of pattern splicing dislocation of different light paths exposed at different positions caused by motion errors generated in the motion process of the motion table is solved.

Description

Technical Field

[0001] The present application relates to the technical field of LDI exposure, and in particular to an LDI splicing improvement method, device, equipment and storage medium. Background Art

[0002] LDI (Laser Direct Imaging) laser direct writing equipment is a high-tech equipment used for precision pattern generation. It is mainly used in printed circuit boards (PCBs), microelectronic devices and other manufacturing fields that require high-resolution patterns. LDI laser direct writing equipment uses a laser beam to directly expose photosensitive materials without the use of traditional masks.

[0003] Production plants have increasingly higher requirements for the production capacity of LDI laser direct writing equipment. In order to increase production capacity, most LDI manufacturers use multi-light path scanning imaging technology to improve production capacity. Through spot splicing and workpiece table movement, a production board is scanned back and forth several times to complete the exposure.

[0004] However, due to the movement error of the workpiece stage of the LDI equipment, the graphics exposed at different positions by different optical paths will be misaligned, and the misalignment at different positions is different. In particular, the optical path structure is a single-scan imaging device with a front-to-back cross-distribution. The front and back rows of optical paths are separated by a certain distance, and the light spots need to be spliced ​​front and back in coordination with the movement of the workpiece stage to complete a single scan exposure of the entire plate. Summary of the invention

[0005] Based on this, it is necessary to provide an LDI stitching improvement method, device, computer equipment, computer-readable storage medium and computer program product that can solve the problem of graphic misalignment in one-time imaging of LDI equipment in response to the above technical problems.

[0006] In a first aspect, the present application provides a method for improving LDI splicing. The method comprises:

[0007] Acquire an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0008] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0009] Acquire a mapping relationship between the number of pulses and a corresponding spatial light modulator;

[0010] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0011] In one embodiment, the step of obtaining an actual exposure pattern formed by multiple exposure correction patterns at preset positions and calculating an error value of the exposure pattern of the spatial light modulator comprises:

[0012] Based on a plurality of preset position exposure correction patterns, the formed actual exposure pattern is measured, and the splicing misalignment deviation values ​​between adjacent spatial light modulators are respectively measured;

[0013] The error values ​​between the first spatial light modulator and other spatial light modulators at multiple preset positions are calculated based on the splicing misalignment deviation value.

[0014] In one embodiment, the step of calculating the number of pulses required for flipping the spatial light modulator based on the error value comprises:

[0015] The number of pulses required for flipping the spatial light modulator at the exposure start position and other positions is calculated, wherein the exposure start position is a first preset position.

[0016] In one embodiment, calculating the number of pulses required for flipping the spatial light modulator at the exposure start position based on the error value includes:

[0017] Based on the interval of the trigger pulse of the moving stage and the error value, the pulse deviation amount of the flipping of the spatial light modulator at the preset position is calculated, and the pulse deviation amount is the number of pulses required to increase or decrease to adjust the error value;

[0018] Calculating the number of pulses required for flipping the spatial light modulator at a preset position based on the flipping distance of the spatial light modulator, the spacing of the trigger pulses of the motion stage and the pulse deviation;

[0019] The number of pulses required for flipping the spatial light modulator at the exposure start position is the number of pulses required for flipping the spatial light modulator at the first preset position.

[0020] In one of the embodiments, before obtaining the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions and calculating the error value of the exposure pattern of the spatial light modulator, the method further includes:

[0021] The maximum size of the statistical exposure graph;

[0022] Dividing the maximum size into regions according to a preset subdivision size, wherein the length of the preset subdivision size is an integer multiple of the flipping distance of the spatial light modulator;

[0023] The plurality of preset positions are respectively located at the boundary positions of the divided areas, and the preset positions are spaced at the same interval.

[0024] In one of the embodiments, based on the number of flipping times of the spatial light modulator in the preset length region, the error value and the interval of the trigger pulse of the moving stage, the pulse deviation amount of the flipping of the spatial light modulator at other positions is calculated;

[0025] Based on the pulse deviation of the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the spacing of the trigger pulses of the moving stage, the number of pulses required for flipping the spatial light modulator at other positions is calculated.

[0026] In one embodiment, obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator includes:

[0027] Generate a pulse compensation data table based on the spatial light modulator mapping relationship, wherein the pulse compensation data table includes different divided areas and corresponding pulse quantities;

[0028] The pulse compensation data table is stored in the spatial light modulator counter card.

[0029] In a second aspect, the present application also provides a LDI splicing improvement device. The device comprises:

[0030] An error value calculation module, used to obtain an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0031] A pulse number calculation module, used for calculating the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions based on the error value;

[0032] A mapping relationship storage module, used for obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0033] The pulse correction module is used to adjust the pulse quantity of the spatial light modulator based on the mapping relationship, and perform exposure based on the adjusted pulse quantity.

[0034] In a third aspect, the present application further provides a computer device. The computer device includes a memory and a processor, the memory stores a computer program, and the processor implements the following steps when executing the computer program:

[0035] Acquire an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0036] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0037] Acquire a mapping relationship between the number of pulses and a corresponding spatial light modulator;

[0038] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0039] In a fourth aspect, the present application further provides a computer-readable storage medium. The computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the following steps are implemented:

[0040] Acquire an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0041] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0042] Acquire a mapping relationship between the number of pulses and a corresponding spatial light modulator;

[0043] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0044] In a fifth aspect, the present application further provides a computer program product. The computer program product includes a computer program, and when the computer program is executed by a processor, the following steps are implemented:

[0045] Acquire an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0046] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0047] Acquire a mapping relationship between the number of pulses and a corresponding spatial light modulator;

[0048] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0049] The above-mentioned LDI splicing improvement method, device, computer equipment, storage medium and computer program product calculate the error value of the exposure pattern of the spatial light modulator based on the actual exposure pattern formed by obtaining exposure correction patterns at multiple preset positions; calculate the number of pulses required for the spatial light modulator to flip based on the error value; obtain the mapping relationship between the number of pulses and the corresponding spatial light modulator; adjust the number of pulses of the spatial light modulator based on the mapping relationship, and perform exposure based on the adjusted number of pulses. The present application adopts the above-mentioned method to subdivide the grating ruler signal through a subdivision box, and the grating ruler subdivided by the subdivision box can trigger the pulse signal after reaching a preset number of resolutions, and then calculate the error value of the exposure pattern of different spatial light modulators at different positions by obtaining the actual exposure pattern formed by the exposure correction pattern, and calculate the number of pulses required for the flipping of different spatial light modulators at different positions based on the error value, so that the spatial light modulator flips directly according to the adjusted number of pulses, so as to overcome the problem of misalignment of the pattern splicing of different optical paths exposed at different positions caused by the motion error generated during the movement of the moving stage. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] Figure 1 A schematic diagram of the structure of an LDI splicing device in one embodiment;

[0051] Figure 2 A schematic diagram of the optical path of an LDI splicing device in one embodiment;

[0052] Figure 3 A schematic diagram of the front and rear optical paths of an LDI splicing device in one embodiment;

[0053] Figure 4 A schematic diagram of a theoretical splicing of an LDI splicing device in one embodiment;

[0054] Figure 5 A schematic diagram of the theory and practice of the motion process of the motion stage of the LDI splicing device in one embodiment;

[0055] Figure 6 A schematic diagram of actual light spot splicing of an LDI splicing device in an embodiment;

[0056] Figure 7 A schematic diagram of light spot splicing of an LDI splicing improvement method in one embodiment;

[0057] Figure 8 is a flow chart of an LDI splicing improvement method in one embodiment;

[0058] Fig. 9 is an error diagram of a splicing location in an LDI splicing improvement method in one embodiment;

[0059] Fig.10It is a structural block diagram of an LDI splicing improvement device in one embodiment;

[0060] Fig.11 FIG. 4 is a diagram showing the internal structure of a computer device in one embodiment. DETAILED DESCRIPTION

[0061] In order to make the purpose, technical solution and advantages of the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0062] The LDI splicing improvement method provided in the embodiment of the present application can be applied to Figure 1 The LDI exposure device shown in the figure. Among them, DMD is the spatial light modulator used by most LDI manufacturers. It flips the lens according to the received pulse signal to achieve the purpose of controlling the laser; the motion stage is a precision motion platform that can send pulse signals according to the resolution of the grating scale; due to production capacity requirements, most LDI manufacturers use multi-light path scanning imaging technology to arrange multiple light paths in a row for synchronous scanning and exposure, and some also use the lens barrel in a row. Figure 1 The advantage of staggered arrangement of front and back rows is that the motion table only needs to scan once to complete the exposure, which greatly improves the production capacity.

[0063] Reference Figure 2 , Figure 3 and Figure 4 , the light paths are arranged in a staggered manner, resulting in the DMD forming a front-to-back spot pattern from left to right; in order to form a complete image, the light spot of the rear light path will lag behind the front light path by a distance D for exposure. Theoretically, the center distance d of the two lens barrels needs to be exactly equal to the actual distance D of the motion stage to form a Figure 4 The stitching pattern shown.

[0064] The above is based on the result that the motion table moves straight when scanning. However, in actual production, the guide rail cannot be completely straight. Figure 5 The motion of the motion platform is affected by the Yaw value, pitch value, roll value, etc. of the guide rail, resulting in a curved motion trajectory. Figure 6 As shown, there are inconsistencies in the left, middle, right, top, middle, and bottom of the whole board. In addition, in actual production, the motion stage cannot achieve the same motion distance as the theoretical distance, that is, there is a direct error between D and d, and the splicing error will be greater.

[0065] like Figure 1As shown, the grating ruler signal is subdivided through the subdivision box. The grating ruler generally has a pitch of 20um, which can trigger a pulse signal. After being subdivided by the subdivision box, the resolution can reach 100nm or even smaller to trigger a pulse signal.

[0066] like Figure 7 As shown, the maximum product size W to be produced is subdivided into multiple small areas of size M (M is mostly small areas of about 50 mm). In this area, the DMD flips once every N distance, and the DMD in M ​​area flips M / N times. P is the spacing of the motion stage trigger pulse signal (pso). After the motion stage moves N / P pulse signals, the DMD flips once.

[0067] In one embodiment, referring to Figure 8 , this method is applied to Figure 1 The device in is taken as an example to illustrate, in this embodiment, the method includes the following steps:

[0068] Step 202, obtaining an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculating an error value of the exposure pattern of the spatial light modulator.

[0069] Among them, multiple preset positions are boundary positions of subdivided small areas. Taking preset positions a, b, and c as examples, dry film and PCB board (or other products) are used to expose very thin long horizontal lines at positions a, b, and c. Other correction patterns can also be exposed. As long as the correction effect can be achieved, thin long horizontal lines are exposed in this embodiment.

[0070] Step 204 , calculating the number of pulses required for flipping the spatial light modulator based on the error value.

[0071] Among them, refer to Fig. 9 After the exposure of very thin long horizontal lines, the splicing misalignment deviation values ​​between adjacent DMDs are measured. Taking the position of the first DMD as a reference, the splicing misalignment deviation values ​​between each DMD and DMD1 are calculated. Taking DMD1 and DMD2 as an example, the splicing misalignment deviation values ​​d1, d2, and d3 of positions a, b, and c are measured.

[0072] Step 206: Obtain a mapping relationship between the number of pulses and the corresponding spatial light modulator.

[0073] The host computer forms a mapping relationship between the calculated pulse numbers required for triggering all DMDs and the position values ​​of the corresponding areas.

[0074] Step 208: adjusting the pulse quantity of the spatial light modulator based on the mapping relationship, and performing exposure based on the adjusted pulse quantity.

[0075] In the above-mentioned LDI splicing improvement method, the grating ruler signal is subdivided by a subdivision box. The grating ruler subdivided by the subdivision box can reach a preset number of resolutions before triggering a pulse signal. Then, the error values ​​of the exposure patterns of different spatial light modulators at different positions are calculated by obtaining the actual exposure pattern formed by the exposure correction pattern. The number of pulses flipped by different spatial light modulators at different positions is calculated based on the error value, so that the spatial light modulator is directly flipped according to the adjusted number of pulses, so as to overcome the problem of splicing misalignment of patterns exposed at different positions by different optical paths caused by motion errors generated during the movement of the moving stage.

[0076] In one embodiment, based on acquiring an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, calculating the error value of the exposure pattern of the spatial light modulator specifically includes:

[0077] Based on a plurality of preset position exposure correction patterns, the formed actual exposure pattern is measured, and the splicing misalignment deviation values ​​between adjacent spatial light modulators are respectively measured;

[0078] The error values ​​between the first spatial light modulator and other spatial light modulators at multiple preset positions are calculated based on the splicing misalignment deviation value.

[0079] Among them, refer to Figure 7 and Fig. 9 , use dry film and PCB board to expose very thin long horizontal lines at positions a, b, and c, and measure the stitching images at a, b, and c after development.

[0080] In one embodiment, calculating the number of pulses required for flipping the spatial light modulator based on the error value includes:

[0081] Calculate the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions, where the exposure start position is the first preset position. Figure 7 , the exposure starting position is position a.

[0082] In one embodiment, the specific process of calculating the number of pulses may include:

[0083] Based on the spacing and error value of the trigger pulses of the motion stage, the flip pulse deviation of the spatial light modulator at the preset position is calculated, and the pulse deviation is the number of pulses required to increase or decrease to adjust the error value;

[0084] The number of pulses required for flipping the spatial light modulator at the preset position is calculated based on the flipping distance of the spatial light modulator, the spacing of the trigger pulses of the motion stage and the pulse deviation.

[0085] Among them, d1 / p calculated at position a is the number of pulses that DMD2 needs to reduce at the starting position. Since the deviations of the grating scale or the motion stage are mostly gradual, it can be considered that the motion error subdivided into small intervals is almost very small, and the number of pulses from position a to position b can be considered to be gradual; the number of pulses that DMD2 needs to change at position b is d2 / p. Since the DMD flips every N times between a and b, the DMD flips M / N times between a and b. Since the number of pulses from position a to position b is gradual, that is, the splicing misalignment deviation value at each DMD flip from position a to position b (excluding position a, including position b) is d1-(d1-d2) / (M / N)*(i-1), i∈[1, M / N];

[0086] Among them, i is the number of flipping times, the distance of left high and right low in splicing is negative, d1 is the error value measured at position a after development, d2 is the error value measured at position b after development, d3 is the error value measured at position c after development, M is a small area of ​​preset length, and N is the flipping distance of the spatial light modulator.

[0087] In this embodiment, the grating scale signal is subdivided by a subdivision box. The grating scale subdivided by the subdivision box can reach a preset number of resolutions before triggering a pulse signal. Then, by acquiring the actual exposure pattern formed by the exposure correction pattern, the error values ​​of the exposure patterns of different spatial light modulators at different positions are calculated. Based on the error value, the number of pulses required for flipping different spatial light modulators at different positions is calculated, so that the spatial light modulator is flipped directly according to the adjusted number of pulses, so as to overcome the problem of misalignment of splicing of patterns exposed at different positions by different optical paths caused by the errors generated during the movement of the moving stage.

[0088] In one embodiment, since the number of pulses required to change the DMD flipping will delay the influence of the previous pattern deviation, the calculation of the specific number of pulses at the subsequent position includes:

[0089] Based on the flipping times of the spatial light modulator in the preset length region, the error value and the spacing of the trigger pulses of the moving stage, the flipping pulse deviation of the spatial light modulator at other positions is calculated;

[0090] Based on the pulse deviation of the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the spacing of the trigger pulses of the moving stage, the number of pulses required for flipping the spatial light modulator at other positions is calculated.

[0091] Among them, the number of pulses for the first flip from position a to position b is N / P-d1 / P; the number of pulses required for subsequent DMD flipping until position b is N / P+(d1 / P-d2 / P) / (M / N); in order to better find the pattern with the subsequent formula, it is N / P-(d2 / P-d1 / P) / (M / N); after the pulse number compensation between a and b, the splicing misalignment deviation value of each DMD flip between position b and position c (excluding position b and including position c) is (d3-d2) / (M / N)*(i-1), i∈[1, M / N]; among them, i is the number of flips, and the distance of left high and right low of splicing is negative.

[0092] Since the number of pulses required for DMD flipping is changed, the subsequent graphics will be affected by the deviation of the previous graphics; therefore, the number of pulses for the first flip from position b to position c is the pulse value between a and b, which is N / P-(d2 / P-d1 / P) / (M / N); until position c, the number of pulses required for DMD flipping is N / P-(d3 / P-d2 / P) / (M / N); the number of pulses required for DMD flipping in the same interval is N / P-(dm / P-dn / P) / (M / N); after the entire board is subdivided into small areas, the formula for the number of pulses E required for DMD flipping is:

[0093] At position a: E = N / P-d1 / P;

[0094] At position a~b: N / P-(d2 / P-d1 / P) / (M / N);

[0095] At positions b to c: N / P-(d3 / P-d2 / P) / (M / N);

[0096] Afterwards area: N / P-(dm / P-dn / P) / (M / N);

[0097] Among them, d1 is the error value measured at position a after development, d2 is the error value measured at position b after development, d3 is the error value measured at position c after development, dm is the error value measured at position m after development, dn is the error value measured at position n after development, M is a small area of ​​preset length, N is the flipping distance of the spatial light modulator, and P is the spacing of the trigger pulses of the motion stage.

[0098] In this embodiment, the grating scale signal is subdivided by a subdivision box. The grating scale subdivided by the subdivision box can reach a preset number of resolutions before triggering a pulse signal. Then, by acquiring the actual exposure pattern formed by the exposure correction pattern, the error values ​​of the exposure patterns of different spatial light modulators at different positions are calculated. Based on the error value, the number of pulses of different spatial light modulators flipped at different positions is calculated, so that the spatial light modulator is flipped directly according to the adjusted number of pulses, so as to overcome the problem of misalignment of splicing of patterns exposed at different positions by different optical paths caused by errors generated during the movement of the moving stage.

[0099] In one embodiment, obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator includes:

[0100] Generate a pulse compensation data table based on the spatial light modulator mapping relationship, wherein the pulse compensation data table includes different divided areas and corresponding pulse quantities;

[0101] The pulse compensation data table is stored in the spatial light modulator counter card.

[0102] In one embodiment, before obtaining the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions and calculating the error value of the exposure pattern of the spatial light modulator, the method further includes:

[0103] The maximum size of the statistical exposure graph;

[0104] The maximum size is divided into regions according to a preset subdivision size, wherein the preset subdivision size length is an integer multiple of the flipping distance of the spatial light modulator;

[0105] The plurality of preset positions are respectively located at the boundary positions of the divided areas, and the preset positions are spaced at the same interval.

[0106] The graphics required by the customer are divided into regions, and a pulse compensation data table is generated and given to Figure 1 The DMD counting board in the image processing unit has different pulse numbers required for each DMD flipping in different areas. During normal exposure, the motion stage subdivides the pulse signal and sends it to the DMD counting board. The DMD counting board then counts all DMDs according to the pulse number counts corresponding to different areas generated by the host computer. When the number reaches a certain level, it will give the corresponding DMD flipping signal for projection, thereby changing the splicing.

[0107] This embodiment adopts the above method, and subdivides the grating scale signal through a subdivision box. The grating scale subdivided by the subdivision box can reach a preset number of resolutions before triggering a pulse signal, and then the actual exposure pattern formed by acquiring the exposure correction pattern is calculated to calculate the error values ​​of the exposure patterns of different spatial light modulators at different positions. The number of pulses flipped by different spatial light modulators at different positions is calculated based on the error value, so that the spatial light modulator is flipped directly according to the adjusted number of pulses, so as to overcome the problem of misalignment of splicing of patterns exposed at different positions by different optical paths caused by errors generated during the movement of the moving platform.

[0108] It should be understood that, although the various steps in the flowcharts involved in the above-mentioned embodiments are displayed in sequence according to the indication of the arrows, these steps are not necessarily executed in sequence according to the order indicated by the arrows. Unless there is a clear explanation in this article, the execution of these steps does not have a strict order restriction, and these steps can be executed in other orders. Moreover, at least a part of the steps in the flowcharts involved in the above-mentioned embodiments can include multiple steps or multiple stages, and these steps or stages are not necessarily executed at the same time, but can be executed at different times, and the execution order of these steps or stages is not necessarily to be carried out in sequence, but can be executed in turn or alternately with other steps or at least a part of the steps or stages in other steps.

[0109] Based on the same inventive concept, the embodiment of the present application also provides an LDI splicing improvement device for implementing the LDI splicing improvement method involved above. The implementation scheme for solving the problem provided by the device is similar to the implementation scheme recorded in the above method, so the specific limitations in one or more LDI splicing improvement device embodiments provided below can refer to the limitations of the LDI splicing improvement method above, and will not be repeated here.

[0110] In one embodiment, Fig.10 As shown, a LDI splicing improvement device is provided, comprising: an error value calculation module, a pulse quantity calculation module, a mapping relationship storage module and a pulse correction module, wherein:

[0111] An error value calculation module, used to obtain an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0112] A pulse number calculation module, used for calculating the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions based on the error value;

[0113] A mapping relationship storage module, used for obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0114] The pulse correction module is used to adjust the pulse quantity of the spatial light modulator based on the mapping relationship, and perform exposure based on the adjusted pulse quantity.

[0115] In one embodiment, the error value calculation module is also used to: expose correction patterns based on multiple preset positions; measure the actual exposure pattern formed; respectively measure the stitching misalignment deviation values ​​between adjacent spatial light modulators; and calculate the error values ​​between the first spatial light modulator and other spatial light modulators at multiple preset positions based on the stitching misalignment deviation values.

[0116] In one embodiment, the pulse number calculation module is also used to: calculate the pulse deviation amount for flipping the spatial light modulator at a preset position based on the spacing and error value of the motion stage trigger pulses, wherein the pulse deviation amount is the number of pulses required to increase or decrease to adjust the error value; calculate the number of pulses required for flipping the spatial light modulator at a preset position based on the flipping distance of the spatial light modulator, the spacing and pulse deviation of the motion stage trigger pulses.

[0117] In one embodiment, the pulse number calculation module is also used to: calculate the pulse deviation amount of the flipping of the spatial light modulator at other positions based on the number of flipping times of the spatial light modulator in a preset length area, the error value and the spacing of the trigger pulses of the moving stage; calculate the number of pulses required for the flipping of the spatial light modulator at other positions based on the pulse deviation amount of the flipping of the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the spacing of the trigger pulses of the moving stage.

[0118] In one embodiment, the mapping relationship storage module is also used to: perform segmentation based on a preset correction pattern to obtain different areas after segmentation; generate a pulse compensation data table based on the spatial light modulator mapping relationship, wherein the pulse compensation data table includes different areas after segmentation and the corresponding number of pulses; and store the pulse compensation data table in the spatial light modulator counting board.

[0119] In one embodiment, the error value calculation module is also used to: count the maximum size of the exposure pattern; divide the maximum size into areas according to a preset subdivision size, wherein the preset subdivision size length is an integer multiple of the flipping distance of the spatial light modulator; and multiple preset positions are respectively located at the boundary positions of each divided area, and the preset positions are spaced at the same interval.

[0120] Each module in the above LDI splicing improvement device can be implemented in whole or in part by software, hardware or a combination thereof. Each module can be embedded in or independent of a processor in a computer device in the form of hardware, or can be stored in a memory in a computer device in the form of software, so that the processor can call and execute the operations corresponding to each module.

[0121] In one embodiment, a computer device is provided. The computer device may be a server, and its internal structure diagram may be as follows: Fig.11 As shown. The computer device includes a processor, a memory and a network interface connected through a system bus. Among them, the processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system, a computer program and a database. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The database of the computer device is used to store data. The network interface of the computer device is used to communicate with an external terminal through a network connection. When the computer program is executed by the processor, a LDI splicing improvement method is implemented.

[0122] In one embodiment, a computer device is provided. The computer device may be a terminal, and its internal structure diagram may be as follows: Fig.11 As shown. The computer device includes a processor, a memory, a communication interface, a display screen and an input device connected through a system bus. Among them, the processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system and a computer program. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The communication interface of the computer device is used to communicate with an external terminal in a wired or wireless manner, and the wireless manner can be achieved through WIFI, a mobile cellular network, NFC (near field communication) or other technologies. When the computer program is executed by the processor, a method for improving LDI splicing is implemented.

[0123] Those skilled in the art will understand that Fig.11 The structure shown in the figure is only a block diagram of a part of the structure related to the solution of the present application, and does not constitute a limitation on the computer device to which the solution of the present application is applied. The specific computer device may include more or fewer components than those shown in the figure, or combine certain components, or have a different arrangement of components.

[0124] In one embodiment, a computer device is provided, including a memory and a processor, wherein a computer program is stored in the memory, and the processor implements the steps in the above-mentioned method embodiments when executing the computer program.

[0125] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored. When the computer program is executed by a processor, the steps in the above-mentioned method embodiments are implemented.

[0126] In one embodiment, a computer program product is provided, including a computer program, which implements the steps in the above method embodiments when executed by a processor.

[0127] It should be noted that the user information (including but not limited to user device information, user personal information, etc.) and data (including but not limited to data used for analysis, stored data, displayed data, etc.) involved in this application are all information and data authorized by the user or fully authorized by all parties.

[0128] Those skilled in the art can understand that all or part of the processes in the above-mentioned embodiment methods can be completed by instructing the relevant hardware through a computer program, and the computer program can be stored in a non-volatile computer-readable storage medium. When the computer program is executed, it can include the processes of the embodiments of the above-mentioned methods. Among them, any reference to the memory, database or other medium used in the embodiments provided in the present application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetoresistive random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. As an illustration and not limitation, RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM). The database involved in each embodiment provided in this application may include at least one of a relational database and a non-relational database. Non-relational databases may include distributed databases based on blockchains, etc., but are not limited to this. The processor involved in each embodiment provided in this application may be a general-purpose processor, a central processing unit, a graphics processor, a digital signal processor, a programmable logic device, a data processing logic device based on quantum computing, etc., but are not limited to this.

[0129] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0130] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the present application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the present application shall be subject to the attached claims.

Claims

1. A LDI splicing improvement method, characterized in that: The method comprises: Acquire an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator; Calculating the number of pulses required for flipping the spatial light modulator based on the error value; Acquire a mapping relationship between the number of pulses and a corresponding spatial light modulator; The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

2. The method according to claim 1, characterized in that The step of obtaining an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions and calculating an error value of the exposure pattern of the spatial light modulator comprises: Based on a plurality of preset position exposure correction patterns, the formed actual exposure pattern is measured, and the splicing misalignment deviation values ​​between adjacent spatial light modulators are respectively measured; The error values ​​between the first spatial light modulator and other spatial light modulators at multiple preset positions are calculated based on the splicing misalignment deviation value.

3. The method according to claim 1, characterized in that The step of calculating the number of pulses required for flipping the spatial light modulator based on the error value comprises: The number of pulses required for flipping the spatial light modulator at the exposure start position and other positions is calculated, wherein the exposure start position is a first preset position.

4. The method according to claim 3, characterized in that The step of calculating the number of pulses required for flipping the spatial light modulator at the exposure start position based on the error value comprises: Based on the interval of the trigger pulse of the moving stage and the error value, the pulse deviation amount of the flipping of the spatial light modulator at the preset position is calculated, and the pulse deviation amount is the number of pulses required to increase or decrease to adjust the error value; Based on the flipping distance of the spatial light modulator, the spacing of the trigger pulses of the moving stage and the pulse deviation, the number of pulses required for flipping the spatial light modulator at the preset position is calculated. The number of pulses required for flipping the spatial light modulator at the exposure start position is the number of pulses required for flipping the spatial light modulator at the first preset position.

5. The method according to any one of claims 1 to 4, characterized in that: Before obtaining the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions and calculating the error value of the exposure pattern of the spatial light modulator, the method further includes: The maximum size of the statistical exposure graph; Dividing the maximum size into regions according to a preset subdivision size, wherein the length of the preset subdivision size is an integer multiple of the flipping distance of the spatial light modulator; The plurality of preset positions are respectively located at the boundary positions of the divided areas, and the preset positions are spaced at the same interval.

6. The method according to claim 5, characterized in that The method further comprises: Based on the number of flipping times of the spatial light modulator in the preset length region, the error value and the spacing of the trigger pulses of the moving stage, the pulse deviation amount of the flipping of the spatial light modulator at other positions is calculated; Based on the pulse deviation of the flipping of the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the interval of the trigger pulse of the moving stage, the number of pulses required for the flipping of the spatial light modulator at other positions is calculated.

7. The method according to claim 1, characterized in that The step of obtaining a mapping relationship between the number of pulses and the corresponding spatial light modulator comprises: Generate a pulse compensation data table based on the spatial light modulator mapping relationship, wherein the pulse compensation data table includes different divided areas and corresponding pulse quantities; The pulse compensation data table is stored in the spatial light modulator counter card.

8. An LDI splicing improvement device, characterized in that: The device comprises: An error value calculation module, used to obtain an actual exposure pattern formed by multiple exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator; A pulse number calculation module, used for calculating the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions based on the error value; A mapping relationship storage module, used for obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator; The pulse correction module is used to adjust the pulse quantity of the spatial light modulator based on the mapping relationship and perform exposure based on the adjusted pulse quantity.

9. A computer device comprising a memory and a processor, wherein the memory stores a computer program, wherein: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 7 are implemented.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 7 are implemented.

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