LDI splicing improvement method, device, equipment and storage medium

Abstract

The present application relates to a method, device, computer equipment, storage medium and computer program product for improving LDI splicing. The method comprises: calculating the error values ​​of different spatial light modulators exposing patterns at different positions based on the actual exposure pattern formed by obtaining exposure correction patterns at multiple preset positions; calculating the number of pulses required for flipping different spatial light modulators at different positions based on the error value; obtaining a mapping relationship between the number of pulses and the corresponding spatial light modulator; adjusting the number of pulses of the spatial light modulator based on the mapping relationship, and performing exposure based on the adjusted number of pulses. By adopting the method, it is possible to calculate the error values ​​of different spatial light modulators exposing patterns at different positions by obtaining the actual exposure pattern formed by the exposure correction pattern, and calculate the number of pulses required for flipping different spatial light modulators at different positions based on the error value, so that the spatial light modulator is flipped directly according to the adjusted number of pulses, thereby overcoming the problem of misalignment of patterns exposed at different positions by different optical paths caused by motion errors generated during the movement of the moving stage.

Description

Technical Field

[0001] The present application relates to the technical field of LDI exposure, and in particular to an LDI splicing improvement method, device, equipment and storage medium. Background Art

[0002] LDI (Laser Direct Imaging) laser direct writing equipment is a high-tech device used for precision pattern generation. It is mainly used in printed circuit boards (PCBs), microelectronic devices and other manufacturing fields that require high-resolution patterns. LDI laser direct writing equipment uses a laser beam to directly expose photosensitive materials without the use of traditional masks.

[0003] Production plants have increasingly higher requirements for the production capacity of LDI laser direct writing equipment. To improve production capacity, most LDI manufacturers use multi-light path scanning imaging technology to improve production capacity. By splicing light spots and coordinating with the movement of the workpiece stage, a production board can be scanned back and forth several times to complete the exposure.

[0004] However, due to the movement error of the workpiece stage of the LDI equipment, the graphics exposed at different positions by different optical paths will be misaligned, and the misalignment situation at different positions is different. This is especially true for single-scan imaging devices with a front-to-back cross-distribution of optical paths. The front and back rows of optical paths are separated by a certain distance, and the light spots need to be spliced ​​back and forth in conjunction with the movement of the workpiece stage to complete a single scan exposure of the entire plate. Summary of the Invention

[0005] Based on this, it is necessary to provide an LDI stitching improvement method, device, computer equipment, computer-readable storage medium and computer program product that can solve the problem of graphic misalignment in one-time imaging of LDI equipment in response to the above technical problems.

[0006] In a first aspect, the present application provides a method for improving LDI splicing. The method comprises:

[0007] Acquire an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0008] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0009] Acquire a mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0010] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0011] In one embodiment, obtaining an actual exposure pattern formed by multiple exposure correction patterns at preset positions and calculating an error value of the exposure pattern of the spatial light modulator includes:

[0012] Based on multiple preset position exposure correction patterns, the actual exposure pattern formed is measured, and the stitching misalignment deviation values ​​between adjacent spatial light modulators are respectively measured;

[0013] The error values ​​between the first spatial light modulator and other spatial light modulators at multiple preset positions are calculated based on the splicing misalignment deviation value.

[0014] In one embodiment, calculating the number of pulses required for flipping the spatial light modulator based on the error value includes:

[0015] The number of pulses required for flipping the spatial light modulator at the exposure start position and other positions is calculated, where the exposure start position is a first preset position.

[0016] In one embodiment, calculating the number of pulses required for flipping the spatial light modulator at the exposure start position based on the error value includes:

[0017] Calculating a pulse deviation amount for flipping the spatial light modulator at a preset position based on the interval of the trigger pulses of the motion stage and the error value, wherein the pulse deviation amount is the number of pulses required to increase or decrease to adjust the error value;

[0018] Calculating the number of pulses required for flipping the spatial light modulator at a preset position based on the flipping distance of the spatial light modulator, the spacing of the trigger pulses of the motion stage, and the pulse deviation;

[0019] The number of pulses required for flipping the spatial light modulator at the exposure start position is the same as the number of pulses required for flipping the spatial light modulator at the first preset position.

[0020] In one embodiment, before acquiring the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions and calculating the error value of the exposure pattern of the spatial light modulator, the method further includes:

[0021] The maximum size of the statistical exposure graphic;

[0022] Dividing the maximum size into regions according to a preset subdivision size, wherein the preset subdivision size length is an integer multiple of the flip distance of the spatial light modulator;

[0023] The plurality of preset positions are respectively located at the boundary positions of the divided areas, and the preset positions are spaced at the same interval.

[0024] In one embodiment, based on the number of flips of the spatial light modulator in a preset length region, the error value, and the interval of the trigger pulses of the motion stage, the pulse deviation of the flip of the spatial light modulator at other positions is calculated;

[0025] Based on the pulse deviation of the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the interval of the motion stage trigger pulses, the number of pulses required for flipping the spatial light modulator at other positions is calculated.

[0026] In one embodiment, obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator includes:

[0027] generating a pulse compensation data table based on a spatial light modulator mapping relationship, wherein the pulse compensation data table includes different divided regions and corresponding pulse quantities;

[0028] The pulse compensation data table is stored in the spatial light modulator counter card.

[0029] In a second aspect, the present application also provides an LDI splicing improvement device. The device includes:

[0030] an error value calculation module, configured to obtain an actual exposure pattern formed by exposure correction patterns at multiple preset positions and calculate an error value of the exposure pattern of the spatial light modulator;

[0031] a pulse number calculation module, configured to calculate the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions based on the error value;

[0032] A mapping relationship storage module, used to obtain a mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0033] The pulse correction module is used to adjust the pulse quantity of the spatial light modulator based on the mapping relationship, and perform exposure based on the adjusted pulse quantity.

[0034] In a third aspect, the present application further provides a computer device. The computer device includes a memory and a processor. The memory stores a computer program. When the processor executes the computer program, the following steps are performed:

[0035] Acquire an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0036] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0037] Acquire a mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0038] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0039] In a fourth aspect, the present application further provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the following steps:

[0040] Acquire an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0041] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0042] Acquire a mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0043] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0044] In a fifth aspect, the present application further provides a computer program product. The computer program product includes a computer program that, when executed by a processor, implements the following steps:

[0045] Acquire an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator;

[0046] Calculating the number of pulses required for flipping the spatial light modulator based on the error value;

[0047] Acquire a mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0048] The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

[0049] The above-mentioned LDI splicing improvement method, device, computer equipment, storage medium and computer program product calculate the error value of the exposure pattern of the spatial light modulator based on the actual exposure pattern formed by obtaining exposure correction patterns at multiple preset positions; calculate the number of pulses required for the spatial light modulator to flip based on the error value; obtain the mapping relationship between the number of pulses and the corresponding spatial light modulator; adjust the number of pulses of the spatial light modulator based on the mapping relationship, and perform exposure based on the adjusted number of pulses. The present application adopts the above-mentioned method to subdivide the grating scale signal through a subdivision box. The grating scale subdivided by the subdivision box can trigger the pulse signal after reaching a preset number of resolutions, and then calculate the error value of the exposure pattern of different spatial light modulators at different positions by obtaining the actual exposure pattern formed by the exposure correction pattern. Based on the error value, the number of pulses required for the flipping of different spatial light modulators at different positions is calculated, so that the spatial light modulator is flipped directly according to the adjusted number of pulses, so as to overcome the problem of splicing misalignment of patterns exposed at different positions by different optical paths caused by motion errors generated during the movement of the moving stage. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] Figure 1 Schematic diagram of the structure of an LDI splicing device in one embodiment;

[0051] Figure 2 Schematic diagram of the optical path of an LDI splicing device in one embodiment;

[0052] Figure 3 A schematic diagram of the front and rear optical paths of an LDI splicing device in one embodiment;

[0053] Figure 4 A schematic diagram of a theoretical splicing of an LDI splicing device in one embodiment;

[0054] Figure 5 Schematic diagram of the theoretical and practical motion process of the motion stage of the LDI splicing device in one embodiment;

[0055] Figure 6 A schematic diagram of actual light spot splicing of an LDI splicing device in one embodiment;

[0056] Figure 7 A schematic diagram of spot stitching of an LDI stitching improvement method in one embodiment;

[0057] Figure 8 Flowchart of an LDI splicing improvement method in one embodiment;

[0058] Figure 9 An error diagram of a splicing location in an LDI splicing improvement method according to an embodiment;

[0059] Figure 10A structural block diagram of an LDI splicing improvement device in one embodiment;

[0060] Figure 11 FIG. 1 is a diagram showing the internal structure of a computer device in one embodiment. DETAILED DESCRIPTION

[0061] In order to make the purpose, technical solutions and advantages of this application more clear, the following further describes this application in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain this application and are not intended to limit this application.

[0062] The LDI splicing improvement method provided in the embodiment of the present application can be applied to Figure 1 The LDI exposure device shown in the figure. Among them, DMD is the spatial light modulator used by most LDI manufacturers. It controls the laser by flipping the lens according to the received pulse signal. The motion stage is a precision motion platform that can send pulse signals according to the resolution of the grating scale. Due to production capacity requirements, most LDI manufacturers use multi-path scanning imaging technology to arrange multiple light paths into a row for synchronous scanning and exposure. Some also use the lens barrel to press Figure 1 The advantage of staggered arrangement of front and back rows is that the motion stage only needs to scan once to complete the exposure, which greatly improves the production capacity.

[0063] Reference Figure 2 、 Figure 3 and Figure 4 , the light paths are staggered, resulting in the DMD forming a front-to-back spot pattern from left to right; in order to form a complete image, the light spot of the rear light path will lag behind the front light path by a distance D for exposure. Theoretically, the center distance d of the two lens barrels and the actual distance D of the motion stage need to be exactly equal to form such a Figure 4 The stitching graphics shown.

[0064] The above is based on the result that the motion table moves straight when scanning. However, in actual production, the guide rail cannot be completely straight. Figure 5 The motion of the motion platform is affected by the Yaw value, pitch value, roll value of the guide rail, etc., which results in the motion trajectory of the motion platform being curved. Figure 6 As shown, there are inconsistencies in the left, center, right, top, center, and bottom of the entire board. In addition, in actual production, the motion stage cannot achieve the same movement distance as the theoretical distance. That is, there is a direct error between D and d, which will further increase the splicing error.

[0065] like Figure 1As shown in the figure, the grating ruler signal is subdivided by the subdivision box. The grating ruler generally has a pitch of 20um, which can trigger a pulse signal. After subdivision by the subdivision box, the resolution can reach 100nm or even smaller to trigger a pulse signal.

[0066] like Figure 7 As shown in the figure, the maximum product size W to be produced is subdivided into multiple small areas of size M (M is mostly a small area of ​​about 50 mm). In this area, the DMD flips once every N distance. The DMD in the M area flips M / N times. P is the spacing of the motion stage trigger pulse signal (pso). After the motion stage moves N / P pulse signals, the DMD flips once.

[0067] In one embodiment, referring to Figure 8 , this method is applied to Figure 1 Taking the device in the embodiment as an example, in this embodiment, the method includes the following steps:

[0068] Step 202 : obtaining an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, and calculating an error value of the exposure pattern of the spatial light modulator.

[0069] Among them, multiple preset positions are the boundary positions of subdivided small areas. Taking the preset positions a, b, and c as an example, dry film and PCB board (or other products) are used to expose very thin long horizontal lines at positions a, b, and c. Other correction patterns can also be exposed. As long as the correction effect can be achieved, in this embodiment, thin long horizontal lines are exposed.

[0070] Step 204 : Calculate the number of pulses required for flipping the spatial light modulator based on the error value.

[0071] Among them, reference Figure 9 After developing a very thin long horizontal line, measure the splicing misalignment deviation value between adjacent DMDs. Taking the position of the first DMD as the reference, calculate the splicing misalignment deviation value of each DMD and DMD1. Taking DMD1 and DMD2 as an example, measure the splicing misalignment deviation values ​​d1, d2, and d3 of positions a, b, and c.

[0072] Step 206: Obtain a mapping relationship between the number of pulses and the corresponding spatial light modulator.

[0073] The host computer forms a mapping relationship between the calculated number of pulses required to trigger all DMDs and the position values ​​of the corresponding areas.

[0074] Step 208 : adjusting the pulse quantity of the spatial light modulator based on the mapping relationship, and performing exposure based on the adjusted pulse quantity.

[0075] In the above-mentioned LDI stitching improvement method, the grating scale signal is subdivided by a subdivision box. The grating scale subdivided by the subdivision box can trigger a pulse signal after reaching a preset number of resolutions. Then, the error value of the exposure pattern of different spatial light modulators at different positions is calculated by obtaining the actual exposure pattern formed by the exposure correction pattern. The number of pulses of different spatial light modulators flipped at different positions is calculated based on the error value, so that the spatial light modulator is directly flipped according to the adjusted number of pulses, so as to overcome the problem of splicing misalignment of patterns exposed at different positions by different optical paths caused by motion errors generated during the movement of the moving stage.

[0076] In one embodiment, calculating the error value of the exposure pattern of the spatial light modulator based on acquiring the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions specifically includes:

[0077] Based on multiple preset position exposure correction patterns, the actual exposure pattern formed is measured, and the stitching misalignment deviation values ​​between adjacent spatial light modulators are respectively measured;

[0078] The error values ​​between the first spatial light modulator and other spatial light modulators at the plurality of preset positions are calculated based on the splicing misalignment deviation value.

[0079] Among them, reference Figure 7 and Figure 9 , use dry film and PCB board to expose very thin long horizontal lines at positions a, b, and c, and measure the stitching images at positions a, b, and c after development.

[0080] In one embodiment, calculating the number of pulses required for flipping the spatial light modulator based on the error value includes:

[0081] Calculate the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions, where the exposure start position is the first preset position. Figure 7 , the exposure starting position is position a.

[0082] In one embodiment, the specific process of calculating the number of pulses may include:

[0083] Calculating the flip pulse deviation of the spatial light modulator at the preset position based on the spacing and error value of the trigger pulses of the motion stage, where the pulse deviation is the number of pulses required to increase or decrease to adjust the error value;

[0084] The number of pulses required for flipping the spatial light modulator at the preset position is calculated based on the flipping distance of the spatial light modulator, the spacing of the trigger pulses of the motion stage, and the pulse deviation.

[0085] Among them, d1 / p calculated at position a is the number of pulses that DMD2 needs to reduce at the starting position. Since the deviation of the grating scale or motion stage is mostly gradual, it can be considered that the motion error subdivided into small intervals is almost very small, and the number of pulses from position a to position b can be considered to be gradual; the number of pulses that DMD2 needs to change at position b is d2 / p. Since the DMD flips every N times between a and b, the DMD flips M / N times between a and b. Since the number of pulses from position a to position b is gradual, that is, the splicing misalignment deviation value each time the DMD flips from position a to position b (excluding position a and including position b) is d1-(d1-d2) / (M / N)*(i-1), i∈[1, M / N];

[0086] Where i is the number of flips, the distance between the left high and the right low of the stitching is negative, d1 is the error value measured at position a after development, d2 is the error value measured at position b after development, d3 is the error value measured at position c after development, M is a small area with a preset length, and N is the flipping distance of the spatial light modulator.

[0087] In this embodiment, the grating scale signal is subdivided by a subdivision box. The grating scale subdivided by the subdivision box can trigger a pulse signal after reaching a preset number of resolutions. Then, by obtaining the actual exposure pattern formed by the exposure correction pattern, the error values ​​of the exposure patterns of different spatial light modulators at different positions are calculated. Based on the error values, the number of pulses required for flipping the different spatial light modulators at different positions is calculated, so that the spatial light modulator is directly flipped according to the adjusted number of pulses, thereby overcoming the problem of splicing misalignment of patterns exposed at different positions by different optical paths caused by the errors generated during the movement of the moving stage.

[0088] In one embodiment, since the number of pulses required to change the DMD flipping will affect the subsequent pattern deviation, the calculation of the specific number of pulses at the subsequent position includes:

[0089] Calculate the pulse deviation of the flip of the spatial light modulator at other positions based on the number of flips of the spatial light modulator in the preset length area, the error value and the interval of the trigger pulse of the motion stage;

[0090] Based on the pulse deviation of the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the interval of the motion stage trigger pulse, the number of pulses required for flipping the spatial light modulator at other positions is calculated.

[0091] Among them, the number of pulses for the first flip from position a to position b is N / P-d1 / P; the number of pulses required for subsequent DMD flips until position b is N / P+(d1 / P-d2 / P) / (M / N); in order to better find the pattern with the subsequent formula, it is N / P-(d2 / P-d1 / P) / (M / N); after compensating the number of pulses between a and b, the splicing misalignment deviation value of each DMD flip between position b and position c (excluding position b and including position c) is (d3-d2) / (M / N)*(i-1), i∈[1,M / N]; among them, i is the number of flips, and the distance of left high and right low in splicing is negative.

[0092] Since the number of pulses required for DMD flipping is changed, the subsequent graphics will be affected by the deviation of the previous graphics; therefore, the number of pulses for the first flip from position b to position c is the pulse value between a and b, which is N / P-(d2 / P-d1 / P) / (M / N); subsequently, until position c, the number of pulses required for DMD flipping is N / P-(d3 / P-d2 / P) / (M / N); and the number of pulses required for DMD flipping in the same interval is N / P-(dm / P-dn / P) / (M / N). After subdividing the entire board into small areas, the formula for the number of pulses E required for DMD flipping is:

[0093] At position a: E = N / P - d1 / P;

[0094] At position a~b: N / P-(d2 / P-d1 / P) / (M / N);

[0095] At positions b to c: N / P-(d3 / P-d2 / P) / (M / N);

[0096] Afterwards area: N / P-(dm / P-dn / P) / (M / N);

[0097] Wherein, d1 is the error value measured at position a after development, d2 is the error value measured at position b after development, d3 is the error value measured at position c after development, dm is the error value measured at position m after development, dn is the error value measured at position n after development, M is a small area of ​​preset length, N is the flipping distance of the spatial light modulator, and P is the pitch of the motion stage trigger pulse.

[0098] In this embodiment, the grating scale signal is subdivided by a subdivision box. The grating scale subdivided by the subdivision box can trigger a pulse signal after reaching a preset number of resolutions. Then, by obtaining the actual exposure pattern formed by the exposure correction pattern, the error value of the exposure pattern of different spatial light modulators at different positions is calculated. Based on the error value, the number of pulses of the different spatial light modulators flipped at different positions is calculated, so that the spatial light modulator is directly flipped according to the adjusted number of pulses, so as to overcome the problem of splicing misalignment of patterns exposed at different positions by different optical paths caused by errors generated during the movement of the moving stage.

[0099] In one embodiment, obtaining the mapping relationship between the number of pulses and the corresponding spatial light modulator includes:

[0100] generating a pulse compensation data table based on a spatial light modulator mapping relationship, wherein the pulse compensation data table includes different divided regions and corresponding pulse quantities;

[0101] The pulse compensation data table is stored in the spatial light modulator counter card.

[0102] In one embodiment, before obtaining the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions and calculating the error value of the exposure pattern of the spatial light modulator, the method further includes:

[0103] The maximum size of the statistical exposure graphic;

[0104] The maximum size is divided into regions according to a preset subdivision size, where the length of the preset subdivision size is an integer multiple of the flip distance of the spatial light modulator;

[0105] The plurality of preset positions are respectively located at the boundary positions of the divided areas, and the preset positions are spaced at the same interval.

[0106] Among them, the graphics required by the customer are divided into regions, and the pulse compensation data table is generated and given to Figure 1 The DMD counting board in the image processing unit requires different numbers of pulses for each DMD flip in different areas. During normal exposure, the motion stage subdivides the pulse signal and sends it to the DMD counting board. The DMD counting board then counts all DMDs separately according to the number of pulses corresponding to different areas generated by the host computer. When the number reaches a certain level, it sends a separate DMD flip signal to project the image, thereby changing the splicing.

[0107] This embodiment adopts the above method, and subdivides the grating scale signal through a subdivision box. The grating scale subdivided by the subdivision box can reach a preset number of resolutions before triggering the pulse signal. Then, by obtaining the actual exposure pattern formed by the exposure correction pattern, the error value of the exposure pattern of different spatial light modulators at different positions is calculated. Based on the error value, the number of pulses of the different spatial light modulators flipped at different positions is calculated, so that the spatial light modulator is flipped directly according to the adjusted number of pulses, so as to overcome the problem of splicing misalignment of patterns exposed at different positions by different optical paths caused by errors generated during the movement of the moving stage.

[0108] It should be understood that, although the various steps in the flowcharts involved in the various embodiments described above are displayed in sequence according to the instructions of the arrows, these steps are not necessarily executed in sequence in the order indicated by the arrows. Unless otherwise specified herein, there is no strict order restriction on the execution of these steps, and these steps can be executed in other orders. Moreover, at least a portion of the steps in the flowcharts involved in the various embodiments described above can include multiple steps or multiple stages, and these steps or stages are not necessarily executed and completed at the same time, but can be executed at different times, and the execution order of these steps or stages is not necessarily to be carried out in sequence, but can be executed in turn or alternately with other steps or at least a portion of steps or stages in other steps.

[0109] Based on the same inventive concept, embodiments of the present application also provide an LDI splicing improvement device for implementing the aforementioned LDI splicing improvement method. The solution provided by this device is similar to the solution described in the aforementioned method. Therefore, the specific limitations of one or more embodiments of the LDI splicing improvement device provided below can be found in the above-described limitations of the LDI splicing improvement method and will not be further elaborated here.

[0110] In one embodiment, Figure 10 As shown, an LDI splicing improvement device is provided, comprising: an error value calculation module, a pulse number calculation module, a mapping relationship storage module and a pulse correction module, wherein:

[0111] an error value calculation module, configured to obtain an actual exposure pattern formed by exposure correction patterns at multiple preset positions and calculate an error value of the exposure pattern of the spatial light modulator;

[0112] a pulse number calculation module, configured to calculate the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions based on the error value;

[0113] A mapping relationship storage module, used to obtain a mapping relationship between the number of pulses and the corresponding spatial light modulator;

[0114] The pulse correction module is used to adjust the pulse quantity of the spatial light modulator based on the mapping relationship, and perform exposure based on the adjusted pulse quantity.

[0115] In one embodiment, the error value calculation module is also used to: expose correction patterns based on multiple preset positions; measure the actual exposure pattern formed; respectively measure the stitching misalignment deviation values ​​between adjacent spatial light modulators; and calculate the error values ​​between the first spatial light modulator and other spatial light modulators in multiple preset positions based on the stitching misalignment deviation values.

[0116] In one embodiment, the pulse number calculation module is also used to: calculate the pulse deviation amount for flipping the spatial light modulator at a preset position based on the spacing and error value of the motion stage trigger pulses, wherein the pulse deviation amount is the number of pulses required to increase or decrease to adjust the error value; calculate the number of pulses required for flipping the spatial light modulator at a preset position based on the flipping distance of the spatial light modulator, the spacing and pulse deviation amount of the motion stage trigger pulses.

[0117] In one embodiment, the pulse number calculation module is also used to: calculate the pulse deviation of the spatial light modulator flipping at other positions based on the number of flipping times of the spatial light modulator within a preset length area, the error value and the spacing of the motion stage trigger pulses; calculate the number of pulses required for the spatial light modulator flipping at other positions based on the pulse deviation of the spatial light modulator flipping at other positions, the flipping distance of the spatial light modulator and the spacing of the motion stage trigger pulses.

[0118] In one embodiment, the mapping relationship storage module is also used to: perform segmentation based on a preset correction pattern to obtain different areas after segmentation; generate a pulse compensation data table based on the spatial light modulator mapping relationship, wherein the pulse compensation data table includes different areas after segmentation and the corresponding number of pulses; and store the pulse compensation data table in the spatial light modulator counting board.

[0119] In one embodiment, the error value calculation module is further used to: count the maximum size of the exposure pattern; divide the maximum size into areas according to a preset subdivision size, where the length of the preset subdivision size is an integer multiple of the flipping distance of the spatial light modulator; and multiple preset positions are respectively located at the boundary positions of each divided area, and the preset positions are spaced at the same interval.

[0120] Each module in the aforementioned LDI splicing improvement device can be implemented in whole or in part through software, hardware, or a combination thereof. Each module can be embedded in or independent of a processor in a computer device in hardware form, or can be stored in a computer device memory in software form, so that the processor can call and execute the corresponding operations of each module.

[0121] In one embodiment, a computer device is provided. The computer device may be a server, and its internal structure diagram may be as follows: Figure 11 As shown. The computer device includes a processor, a memory, and a network interface connected via a system bus. The processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system, a computer program, and a database. The internal memory provides an environment for the operation of the operating system and computer program in the non-volatile storage medium. The database of the computer device is used to store data. The network interface of the computer device is used to communicate with an external terminal via a network connection. When the computer program is executed by the processor, it implements an LDI splicing improvement method.

[0122] In one embodiment, a computer device is provided. The computer device may be a terminal, and its internal structure diagram may be as follows: Figure 11 As shown. The computer device includes a processor, memory, communication interface, display screen and input device connected via a system bus. The processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system and a computer program. The internal memory provides an environment for the operation of the operating system and computer program in the non-volatile storage medium. The communication interface of the computer device is used to communicate with an external terminal in a wired or wireless manner, and the wireless manner can be achieved through WIFI, a mobile cellular network, NFC (near field communication) or other technologies. When the computer program is executed by the processor, a method for improving LDI splicing is implemented.

[0123] Those skilled in the art will understand that Figure 11 The structure shown in the figure is only a block diagram of a part of the structure related to the solution of the present application, and does not constitute a limitation on the computer device to which the solution of the present application is applied. The specific computer device may include more or fewer components than shown in the figure, or combine certain components, or have a different component arrangement.

[0124] In one embodiment, a computer device is provided, including a memory and a processor. The memory stores a computer program, and the processor implements the steps in the above method embodiments when executing the computer program.

[0125] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored. When the computer program is executed by a processor, the steps in the above-mentioned method embodiments are implemented.

[0126] In one embodiment, a computer program product is provided, including a computer program, which implements the steps in the above method embodiments when executed by a processor.

[0127] It should be noted that the user information (including but not limited to user device information, user personal information, etc.) and data (including but not limited to data used for analysis, stored data, displayed data, etc.) involved in this application are all information and data authorized by the user or fully authorized by all parties.

[0128] Those skilled in the art will appreciate that all or part of the processes in the above-mentioned embodiment methods can be implemented by instructing the relevant hardware through a computer program, and the computer program can be stored in a non-volatile computer-readable storage medium. When the computer program is executed, it can include the processes of the embodiments of the above-mentioned methods. Among them, any reference to memory, database or other media used in the embodiments provided in this application may include at least one of non-volatile and volatile memory. Non-volatile memory may include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory may include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM). The database involved in the various embodiments provided herein may include at least one of a relational database and a non-relational database. Non-relational databases may include, but are not limited to, distributed databases based on blockchains. The processor involved in the various embodiments provided herein may be, but are not limited to, a general-purpose processor, a central processing unit, a graphics processing unit, a digital signal processor, a programmable logic unit, a data processing logic unit based on quantum computing, and the like.

[0129] The technical features of the above embodiments can be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0130] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present application. It should be noted that a person of ordinary skill in the art may make various modifications and improvements without departing from the spirit of the present application, and these modifications and improvements fall within the scope of protection of the present application. Therefore, the scope of protection of the present application shall be determined by the appended claims.

Claims

1. A method for improving LDI splicing, characterized in that: The method comprises: Acquire an actual exposure pattern formed by a plurality of exposure correction patterns at preset positions, and calculate an error value of the exposure pattern of the spatial light modulator; Calculating the number of pulses required for flipping the spatial light modulator based on the error value; Acquire a mapping relationship between the number of pulses and the corresponding spatial light modulator; The pulse quantity of the spatial light modulator is adjusted based on the mapping relationship, and exposure is performed based on the adjusted pulse quantity.

2. The method according to claim 1, characterized in that The step of obtaining an actual exposure pattern formed by multiple exposure correction patterns at preset positions and calculating an error value of the exposure pattern of the spatial light modulator includes: Based on multiple preset position exposure correction patterns, the actual exposure pattern formed is measured, and the stitching misalignment deviation values ​​between adjacent spatial light modulators are respectively measured; The error values ​​between the first spatial light modulator and other spatial light modulators at multiple preset positions are calculated based on the splicing misalignment deviation value.

3. The method according to claim 1, characterized in that Calculating the number of pulses required for flipping the spatial light modulator based on the error value includes: The number of pulses required for flipping the spatial light modulator at the exposure start position and other positions is calculated, where the exposure start position is a first preset position.

4. The method according to claim 3, characterized in that Calculating the number of pulses required for flipping the spatial light modulator at the exposure start position based on the error value includes: Calculating a pulse deviation amount for flipping the spatial light modulator at a preset position based on the interval of the trigger pulses of the motion stage and the error value, wherein the pulse deviation amount is the number of pulses required to increase or decrease to adjust the error value; Calculating the number of pulses required for flipping the spatial light modulator at a preset position based on the flipping distance of the spatial light modulator, the spacing of the trigger pulses of the motion stage, and the pulse deviation; The number of pulses required for flipping the spatial light modulator at the exposure start position is the same as the number of pulses required for flipping the spatial light modulator at the first preset position.

5. The method according to any one of claims 1 to 4, characterized in that: Before obtaining the actual exposure pattern formed by the exposure correction patterns at the plurality of preset positions and calculating the error value of the exposure pattern of the spatial light modulator, the method further includes: The maximum size of the statistical exposure graphic; Dividing the maximum size into regions according to a preset subdivision size, wherein the preset subdivision size length is an integer multiple of the flip distance of the spatial light modulator; The plurality of preset positions are respectively located at the boundary positions of the divided areas, and the preset positions are spaced at the same interval.

6. The method according to claim 5, characterized in that The method further comprises: Calculate the pulse deviation of the spatial light modulator flip at other positions based on the number of flips of the spatial light modulator in the preset length area, the error value and the interval of the trigger pulse of the motion stage; The number of pulses required for flipping the spatial light modulator at other positions is calculated based on the pulse deviation of flipping the spatial light modulator at other positions, the flipping distance of the spatial light modulator and the interval of the trigger pulses of the moving stage.

7. The method according to claim 1, characterized in that The acquiring of the mapping relationship between the number of pulses and the corresponding spatial light modulator includes: generating a pulse compensation data table based on a spatial light modulator mapping relationship, wherein the pulse compensation data table includes different divided regions and corresponding pulse quantities; The pulse compensation data table is stored in the spatial light modulator counter card.

8. An LDI splicing improvement device, characterized in that: The device comprises: an error value calculation module, configured to obtain an actual exposure pattern formed by exposure correction patterns at multiple preset positions and calculate an error value of the exposure pattern of the spatial light modulator; a pulse number calculation module, configured to calculate the number of pulses required for flipping the spatial light modulator at the exposure start position and other positions based on the error value; A mapping relationship storage module, used to obtain a mapping relationship between the number of pulses and the corresponding spatial light modulator; The pulse correction module is configured to adjust the number of pulses of the spatial light modulator based on the mapping relationship and perform exposure based on the adjusted number of pulses.

9. A computer device comprising a memory and a processor, wherein the memory stores a computer program, wherein: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 7 are implemented.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 7 are implemented.

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