A fine-adjustable ejector device with feedback detection function

Abstract

The invention discloses a fine-adjustable ejector pin device with a feedback detection function, the fine-adjustable ejector pin device comprising a support ring, a base, an ejector pin, a detection mechanism and an adjustment mechanism, a connecting seat is provided on one side of the support ring, the connecting seat is externally connected to a cylinder, the base is tightly connected to the support ring, the ejector pin is slidably connected to the base, four groups of ejector pins are provided, the detection mechanism is tightly connected to the support ring, the detection mechanism is used to detect the horizontality of the ejector pin, the adjustment mechanism is tightly connected to the support ring, and the adjustment mechanism is used to adjust the position of the ejector pin, the ejector pin device of the present application is installed in a wafer processing chamber, the base is fixed on the support ring to provide support for the ejector pin, during installation, the ejector pin and the support ring assembly are adjusted to a horizontal level with a level meter, the ejector pin support ring assembly is installed on the cylinder, the level is adjusted by screwing an outer nut, if the levelness of the ejector pin changes during use, the deviation degree of the levelness is judged by the detection mechanism, and then the deviated ejector pin is adjusted to a horizontal level by the adjustment mechanism.

Description

Technical Field

[0001] The invention relates to the field of semiconductor technology, in particular to a fine-tunable ejector pin device with a feedback detection function. Background Art

[0002] Most of the semiconductor manufacturing equipment is carried out in a vacuum environment or in a closed space at the bottom. The process chamber requires a pin device as a transmission medium to interact with the robot for wafer transmission. The pin device generally adopts a three-pin or four-pin mechanism. For example, the pin device is in the lower position, the robot transfers the wafer to the process chamber, the pin device lifts up to separate the wafer from the robot, the robot withdraws from the process chamber, the pin device descends, and places the wafer on the wafer stage; the wafer is transferred out of the process chamber in the opposite direction. In order to avoid the wafer from being offset when it lands on the wafer stage, the horizontality of the wafer on the pin device is required to be consistent with the wafer stage. At this time, the height of the pin device needs to be adjusted to ensure that the height difference of the three or four pins is consistent, and the verticality must also be met synchronously. If a hard connection method is used, it is necessary to test the processing accuracy without any error to ensure it, which is difficult to meet in reality and the scrap rate is high.

[0003] However, after being used for a period of time, the support ring of the existing ejector device will change its levelness due to factors such as vibration, resulting in inconsistent and unadjustable height differences of the three-pin or four-pin mechanism, which can easily damage the wafer during transportation. Summary of the invention

[0004] The object of the present invention is to provide a fine-adjustable ejector pin device with a feedback detection function to solve the problems raised in the above background technology.

[0005] In order to solve the above technical problems, the present invention provides the following technical solutions: a fine-adjustable ejector device comprises a support ring, a base, an ejector, a detection mechanism and an adjustment mechanism; a connecting seat is provided on one side of the support ring, the connecting seat is externally connected to a cylinder, the base is tightly connected to the support ring, the ejector is slidably connected to the base, four groups of ejectors are provided, the detection mechanism is tightly connected to the support ring, the detection mechanism is used to detect the horizontality of the ejector, the adjustment mechanism is tightly connected to the support ring, and the adjustment mechanism is used to adjust the position of the ejector.

[0006] The ejector device of the present application is installed in a wafer processing chamber, and the base is fixed on the support ring to provide support for the ejector. During installation, the ejector and the support ring assembly are adjusted to a horizontal level using a level meter, the ejector support ring assembly is installed on the cylinder, and the level is adjusted by rotating the outer nut. The working process is roughly as follows: the robot carries the wafer into the process chamber through the wafer transfer port; the cylinder rises, driving the support ring assembly to rise, and the support ring drives the ejector to rise; the height of the ejector is higher than the surface of the robot, the ejector holds up the wafer and separates the wafer from the robot; the robot exits the process chamber; the ejector descends through the cylinder and the support ring, so that the wafer falls onto the wafer stage; at this time, the height of the ejector is lower than the surface of the wafer stage; the process of the process chamber begins; the process of the process chamber ends; the ejector rises and holds up the wafer through the cylinder and the support ring; the robot enters the process chamber through the wafer transfer port; the ejector descends, so that the wafer falls onto the robot, and the ejector is separated from the wafer; the robot carries the wafer out of the process chamber; the wafer placement process ends. If the levelness of the ejector pin changes during use, the detection mechanism determines the degree of deviation of the levelness, and then the deviated ejector pin is adjusted to be level through the adjustment mechanism.

[0007] Furthermore, the detection mechanism includes a detection column, a support column, a laser source, a photoresistor, a reflector and a telescopic rod. The detection column is tightly connected to the support ring, the detection column is located at the center of the support ring, the support column is tightly connected to the support ring, the position of the support column corresponds to the ejector pin, the laser source is tightly connected to the detection column, the photoresistor is tightly connected to the detection column, several photoresistors are arranged along the upper and lower sides of the laser source, the bottom of the reflector abuts against the support column, one end of the telescopic rod is tightly connected to the reflector, the other end of the telescopic rod is hinged to the ejector pin, the output end of the laser source faces the reflector, and the laser source and the reflector are on the same horizontal plane.

[0008] The detection column is installed at the center of the support ring so that the distance between the detection column and the four ejector pins is the same. The support column is used to provide support for the reflector. In the initial state, the laser source and the reflector are on the same horizontal plane, and the light generated by the laser source will not irradiate the photoresistor. When the photoresistor is not irradiated by light, the resistance value tends to infinity. When the photoresistor is irradiated by light, the resistance value decreases, and the corresponding circuit is turned on; when the levelness of the ejector pin changes after being used for a period of time, if the ejector pin deviates upward, the reflector is deflected downward with the support column as a fulcrum under the drive of the telescopic rod, and the light irradiated by the laser source on the reflector is reflected and irradiated to the photoresistor below the laser source; if the ejector pin deviates downward, the reflector is deflected upward with the support column as a fulcrum under the drive of the telescopic rod, and the light irradiated by the laser source on the reflector is reflected and irradiated to the photoresistor above the laser source; by judging the position where the light irradiates on several photoresistors, the offset direction and distance of the ejector pin can be judged.

[0009] Furthermore, the distance between the reflector and the detection column is much greater than the distance between the reflector and the ejector pin.

[0010] The offset of the ejector position is often caused by factors such as vibration. The offset distance is often very small, and it is difficult to measure the offset distance using conventional detection methods. By setting the distance between the reflector and the detection column to be much larger than the distance between the reflector and the ejector, the optical lever principle is used to amplify the deflection distance of the ejector, making it easier to measure.

[0011] Furthermore, a movable groove is provided in the base, the ejector pin is slidably connected to the movable groove, a center ring is sleeved on the ejector pin, the movable groove is connected to the adjustment mechanism, and transmission fluid is filled in the movable groove.

[0012] The center ring is used to provide lateral support for the ejector pin, thereby ensuring the verticality of the ejector pin. The adjustment mechanism drives the ejector pin to move up and down along the movable groove by changing the transmission fluid pressure in the movable groove, thereby fine-tuning the position of the ejector pin.

[0013] Furthermore, the adjustment mechanism includes a protective shell, an electromagnet, a piston, a repelling magnet and a connecting hose. The protective shell is tightly connected to the support ring, a first chamber and a second chamber are provided in the protective shell, the electromagnet is tightly connected to the first chamber, the electromagnet is externally connected to a power supply, the piston is slidingly connected to the second chamber, the repelling magnet is tightly connected to the piston, one end of the connecting hose is connected to the second chamber, and the other end of the connecting hose is connected to the movable groove.

[0014] The protective shell is fixed on the supporting ring to provide protection for the adjusting mechanism. When the ejector pin is offset, the magnetic force of the electromagnet pushes the repelling magnet to move, thereby driving the piston to slide in the second chamber, thereby changing the pressure of the transmission fluid in the second chamber, and transmitting the pressure to the movable groove through the connecting hose, thereby driving the ejector pin to move up and down along the movable groove, thereby fine-tuning the position of the ejector pin.

[0015] Furthermore, a mounting groove is provided in the detection column, an adjusting resistor is provided in the mounting groove, a plurality of contacts are provided on the adjusting resistor, the plurality of contacts are electrically connected to the photoresistors, the plurality of contacts correspond to the plurality of photoresistors one by one, and the adjusting resistor is electrically connected to the electromagnet.

[0016] The mounting groove is used to provide an installation base for the adjusting resistor. Because the photoresistors are arranged in groups in an array, when a certain photoresistor is irradiated by the light reflected by the reflector, the circuit on the photoresistor is connected, and the current flows along the photoresistor to the adjusting resistor, and finally flows to the electromagnet to provide power to the electromagnet; and the greater the offset distance of the ejector pin, the greater the deflection angle of the reflector, the farther the photoresistor irradiated by the reflected light is from the laser source, the shorter the distance the current passes through the adjusting resistor, the smaller the corresponding resistance value, the greater the current transmitted to the electromagnet, and the greater the magnetic force of the repelling magnet, thereby realizing automatic adjustment of the magnetic force of the electromagnet according to the deflection distance of the ejector pin.

[0017] Furthermore, two groups of adjusting resistors are arranged along the upper and lower sides of the laser source, and the two groups of adjusting resistors are in opposite directions to the circuit conduction of the electromagnet;

[0018] When the reflector is tilted upward: the facing ends of the electromagnet and the repelling magnet are the same magnetic poles;

[0019] When the reflector is tilted downward: the facing ends of the electromagnet and the repelling magnet are opposite magnetic poles.

[0020] When the reflector tilts upward, it indicates that the ejector pin is deflected downward. At this time, the facing ends of the electromagnet and the repelling magnet are poles of the same name. According to the principle of like poles repel each other, the magnetic force of the electromagnet pushes the repelling magnet to move away from the electromagnet. The transmission fluid in the second chamber is compressed, thereby transmitting the pressure to the ejector pin, driving the ejector pin to move up and return to the horizontal position. When the reflector tilts downward, the surface ejector pin deflects upward. At this time, the facing ends of the electromagnet and the repelling magnet are poles of different names. According to the principle of opposites attract each other, the magnetic force of the electromagnet attracts the repelling magnet to move toward the electromagnet. The volume of the second chamber increases, forming a negative pressure, which drives the ejector pin to move down and return to the horizontal position under the action of pressure. The magnetic force direction of the electromagnet is automatically adjusted according to the offset direction of the ejector pin, and the position of the ejector pin is fine-tuned to ensure the level of the ejector pin.

[0021] Furthermore, a guide groove is provided on the support column, the guide groove is V-shaped, and the bottom end of the reflector abuts against the guide groove.

[0022] The V-shaped guide groove is used to provide a guide for the deflection of the reflector to prevent the reflector from sliding on the support column.

[0023] Furthermore, the base is connected to the support ring via threads.

[0024] The base can be inserted into the support ring to adjust the distance through the nut, so that the ejector pin can be adjusted to a horizontal state during installation.

[0025] Compared with the prior art, the beneficial effects achieved by the present invention are as follows: when the level of the ejector changes after being used for a period of time, if the ejector is offset upward, the reflector is deflected downward with the support column as the fulcrum under the drive of the telescopic rod, and the light irradiated by the laser source to the reflector is reflected and irradiated to the photoresistor below the laser source; if the ejector is offset downward, the reflector is deflected upward with the support column as the fulcrum under the drive of the telescopic rod, and the light irradiated by the laser source to the reflector is reflected and irradiated to the photoresistor above the laser source; by judging the position of the light irradiated on several photoresistors, the offset direction and distance of the ejector can be judged. By setting the distance between the reflector and the detection column to be much larger than the distance between the ejector and the detection column, the deflection distance of the ejector is amplified by the principle of optical lever, so as to facilitate measurement.

[0026] The greater the offset distance of the ejector pin, the greater the deflection angle of the reflector, the farther the photoresistor illuminated by the reflected light is from the laser source, the shorter the distance the current passes through the adjusting resistor, the smaller the corresponding resistance value, the greater the current transmitted to the electromagnet, and the greater the magnetic force repelling the magnet, thereby realizing automatic adjustment of the magnetic force of the electromagnet according to the deflection distance of the ejector pin.

[0027] When the reflector tilts upward, it indicates that the ejector pin is deflected downward. At this time, the facing ends of the electromagnet and the repelling magnet are poles of the same name. According to the principle of like poles repel each other, the magnetic force of the electromagnet pushes the repelling magnet to move away from the electromagnet. The transmission fluid in the second chamber is compressed, thereby transmitting the pressure to the ejector pin, driving the ejector pin to move up and return to the horizontal position. When the reflector tilts downward, the surface ejector pin deflects upward. At this time, the facing ends of the electromagnet and the repelling magnet are poles of different names. According to the principle of opposites attract each other, the magnetic force of the electromagnet attracts the repelling magnet to move toward the electromagnet. The volume of the second chamber increases, forming a negative pressure, which drives the ejector pin to move down and return to the horizontal position under the action of pressure. The magnetic force direction of the electromagnet is automatically adjusted according to the offset direction of the ejector pin, and the position of the ejector pin is fine-tuned to ensure the level of the ejector pin. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation of the present invention. In the accompanying drawings:

[0029] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0030] Figure 2 is a partial cross-sectional view of the present invention;

[0031] Figure 3 yes Figure 2 A local enlarged view of point A;

[0032] Figure 4 It is a schematic diagram of the testing organization;

[0033] Figure 5 yes Figure 4 A partial enlarged view of point B;

[0034] Figure 6 yes Figure 4 A partial enlarged view of point C;

[0035] Figure 7 is a partial cross-sectional view of the detection column;

[0036] Figure 8 yes Figure 7 A partial enlarged view of point D;

[0037] Fig. 9yes Figure 7 A local enlarged view of point E;

[0038] Fig.10 It is a circuit diagram of photoresistor, adjustment resistor and electromagnet;

[0039] In the figure: 1-support ring, 11-connecting seat, 2-base, 21-movable groove, 3-thimble, 4-detection mechanism, 41-detection column, 411-installation groove, 42-support column, 421-guide groove, 43-laser source, 44-photoresistor, 45-reflector, 46-telescopic rod, 47-adjustment resistor, 5-adjustment mechanism, 51-protective shell, 511-first chamber, 512-second chamber, 52-electromagnet, 53-piston, 54-repelling magnet, 56-connecting hose, 6-center circle. DETAILED DESCRIPTION

[0040] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0041] The present invention provides a technical solution:

[0042] like Figure 1 As shown, the fine-adjustable ejector device includes a support ring 1, a base 2, an ejector 3, a detection mechanism 4 and an adjustment mechanism 5. A connecting seat 11 is provided on one side of the support ring 1, and the connecting seat 11 is externally connected to a cylinder. The base 2 is tightly connected to the support ring 1, and the ejector 3 is slidably connected to the base 2. The ejector 3 is provided with four groups. The detection mechanism 4 is tightly connected to the support ring 1, and the detection mechanism 4 is used to detect the horizontality of the ejector 3. The adjustment mechanism 5 is tightly connected to the support ring 1, and the adjustment mechanism 5 is used to adjust the position of the ejector 3.

[0043] The ejector device of the present application is installed in a wafer processing chamber, and the base 2 is fixed on the support ring 1 to provide support for the ejector 3. During installation, the ejector 3 and the support ring 1 assembly are adjusted to a horizontal level using a level meter, and the ejector support ring assembly is installed on the cylinder, and the level is adjusted by rotating the outer nut. The working process is roughly as follows: the robot carries the wafer into the process chamber through the wafer transfer port; the cylinder rises, driving the support ring 1 assembly to rise, and the support ring 1 drives the ejector 3 to rise; the height of the ejector 3 is higher than the surface of the robot, and the ejector 3 holds up the wafer and separates the wafer from the robot; the robot exits the process chamber; the ejector 3 descends through the cylinder and the support ring 1, so that the wafer falls onto the wafer stage; at this time, the height of the ejector 3 is lower than the surface of the wafer stage; the process of the process chamber begins; the process of the process chamber ends; the ejector 3 rises and holds up the wafer through the cylinder and the support ring 1; the robot enters the process chamber through the wafer transfer port; the ejector 3 descends, so that the wafer falls onto the robot, and the ejector 3 separates from the wafer; the robot carries the wafer out of the process chamber; the wafer placement process ends. If the levelness of the ejector pin 3 changes during use, the detection mechanism 4 determines the degree of deviation of the levelness, and the adjustment mechanism 5 adjusts the deviated ejector pin 3 to be level.

[0044] like Figure 4-6 As shown, the detection mechanism 4 includes a detection column 41, a support column 42, a laser source 43, a photoresistor 44, a reflector 45 and a telescopic rod 46. The detection column 41 is tightly connected to the support ring 1, and the detection column 41 is located at the center of the support ring 1. The support column 42 is tightly connected to the support ring 1, and the position of the support column 42 corresponds to the ejector pin 3. The laser source 43 is tightly connected to the detection column 41, and the photoresistor 44 is tightly connected to the detection column 41. Several photoresistors 44 are arranged along the upper and lower sides of the laser source 43. The bottom of the reflector 45 abuts against the support column 42, one end of the telescopic rod 46 is tightly connected to the reflector 45, and the other end of the telescopic rod 46 is hinged to the ejector pin 3. The output end of the laser source 43 faces the reflector 45, and the laser source 43 and the reflector 45 are on the same horizontal plane.

[0045] The detection column 41 is installed at the center of the support ring 1, so that the distance between the detection column 41 and the four ejector pins 3 is the same. The support column 42 is used to provide support for the reflector 45. In the initial state, the laser source 43 and the reflector 45 are on the same horizontal plane, and the light generated by the laser source 43 will not irradiate the photoresistor 44. When the photoresistor 44 is not irradiated by light, the resistance value tends to infinity. When the photoresistor 44 is irradiated by light, the resistance value becomes smaller, and the corresponding circuit is turned on; when the levelness of the ejector pin 3 changes after being used for a period of time, if the ejector pin 3 deviates upward, Driven by the telescopic rod 46, the reflector 45 deflects downward with the support column 42 as a fulcrum, and the light irradiated by the laser source 43 to the reflector 45 is reflected and irradiated to the photoresistor 44 below the laser source 43; if the ejector 3 deviates downward, driven by the telescopic rod 46, the reflector 45 deflects upward with the support column 42 as a fulcrum, and the light irradiated by the laser source 43 to the reflector 45 is reflected and irradiated to the photoresistor 44 above the laser source 43; by judging the positions where the light irradiates on several photoresistors 44, the displacement direction and distance of the ejector 3 can be judged.

[0046] like Figure 4 As shown, the distance between the reflector 45 and the detection column 41 is much greater than the distance between the reflector 45 and the ejector pin 3 .

[0047] The offset of the position of the ejector pin 3 is often caused by factors such as vibration, and the offset distance is often very small. Conventional detection methods are difficult to measure the offset distance. By setting the distance between the reflector 45 and the detection column 41 to be much larger than the distance between the reflector 45 and the ejector pin 3, the deflection distance of the ejector pin 3 is amplified by the principle of optical lever, thereby facilitating measurement.

[0048] like Figure 7-8 , Figure 2-3 As shown, a movable groove 21 is provided in the base 2, the ejector pin 3 is slidably connected to the movable groove 21, a center ring 6 is sleeved on the ejector pin 3, the movable groove 21 is connected to the adjustment mechanism 5, and the movable groove 21 is filled with transmission fluid.

[0049] The center ring 6 is used to provide lateral support for the ejector pin 3 to ensure the verticality of the ejector pin 3 . The adjustment mechanism 5 drives the ejector pin 3 to move up and down along the movable groove 21 by changing the transmission fluid pressure in the movable groove 21 , thereby fine-tuning the position of the ejector pin 3 .

[0050] like Figure 7-9As shown, the adjustment mechanism 5 includes a protective shell 51, an electromagnet 52, a piston 53, a repelling magnet 54 and a connecting hose 56. The protective shell 51 is tightly connected to the support ring 1. A first chamber 511 and a second chamber 512 are provided in the protective shell 51. The electromagnet 52 is tightly connected to the first chamber 511. The electromagnet 52 is externally connected to a power supply. The piston 53 is slidably connected to the second chamber 512. The repelling magnet 54 is tightly connected to the piston 53. One end of the connecting hose 56 is connected to the second chamber 512, and the other end of the connecting hose 56 is connected to the movable groove 21.

[0051] The protective shell 51 is fixed on the support ring 1 to provide protection for the adjustment mechanism 5. When the ejector pin 3 is offset, the magnetic force of the electromagnet 52 pushes the repelling magnet 54 to move, thereby driving the piston 53 to slide in the second chamber 512, thereby changing the pressure of the transmission fluid in the second chamber 512, and transmitting the pressure to the movable groove 21 through the connecting hose 56, thereby driving the ejector pin 3 to move up and down along the movable groove 21, thereby fine-tuning the position of the ejector pin 3.

[0052] like Figure 7-10 As shown, a mounting groove 411 is provided in the detection column 41, and an adjustment resistor 47 is provided in the mounting groove 411. The adjustment resistor 47 is provided with a plurality of contacts, and the plurality of contacts are electrically connected to the photoresistors 44. The plurality of contacts correspond one to one to the plurality of photoresistors 44, and the adjustment resistor 47 is electrically connected to the electromagnet 52.

[0053] The mounting groove 411 is used to provide a mounting base for the adjusting resistor 47. Since the photoresistors 44 are arranged in an array in a plurality of groups, when a certain photoresistor 44 is irradiated with the light reflected by the reflector 45, the circuit on the photoresistor 44 is connected, and the current flows along the photoresistor 44 to the adjusting resistor 47, and finally flows to the electromagnet 52, providing power to the electromagnet 52. Moreover, the greater the offset distance of the ejector pin 3, the greater the deflection angle of the reflector 45, the farther the certain photoresistor 44 irradiated by the reflected light is from the laser source 43, the shorter the distance that the current passes through the adjusting resistor 47, the smaller the corresponding resistance value, the greater the current transmitted to the electromagnet 52, and the greater the magnetic force of the repelling magnet 54, thereby realizing automatic adjustment of the magnetic force of the electromagnet 52 according to the deflection distance of the ejector pin 3.

[0054] like Figure 7-10 As shown, two groups of adjustment resistors 47 are arranged along the upper and lower sides of the laser source 43, and the circuit conduction directions of the two groups of adjustment resistors 47 and the electromagnet 52 are opposite;

[0055] When the reflector 45 is tilted upward: the facing ends of the electromagnet 52 and the repelling magnet 54 are the same magnetic poles;

[0056] When the reflector 45 is tilted downward, the facing ends of the electromagnet 52 and the repelling magnet 54 are magnetic poles of opposite names.

[0057] When the reflector 45 tilts upward, it indicates that the ejector pin 3 is deflected downward. At this time, the facing ends of the electromagnet 52 and the repelling magnet 54 are poles of the same name. According to the principle of like charges repel each other, the magnetic force of the electromagnet 52 pushes the repelling magnet 54 to move away from the electromagnet 52, and the transmission fluid in the second chamber 512 is compressed, thereby transmitting the pressure to the ejector pin 3, driving the ejector pin 3 to move upward and return to the horizontal position; when the reflector 45 tilts downward, the surface ejector pin 3 deflects upward. At this time, the facing ends of the electromagnet 52 and the repelling magnet 54 are poles of different names. According to the principle of opposite charges attract each other, the magnetic force of the electromagnet 52 attracts the repelling magnet 54 to move toward the electromagnet 52, and the volume of the second chamber 512 increases, forming a negative pressure, which drives the ejector pin 3 to move downward and return to the horizontal position under the action of the pressure. It is realized that the magnetic force direction of the electromagnet 52 is automatically adjusted according to the deflection direction of the ejector pin 3, and the position of the ejector pin 3 is finely adjusted to ensure the level of the ejector pin 3.

[0058] like Figure 6 As shown, a guide groove 421 is provided on the support column 42 . The guide groove 421 is V-shaped, and the bottom end of the reflector 45 abuts against the guide groove 421 .

[0059] The V-shaped guide groove 421 is used to provide guidance for the deflection of the reflector 45 to prevent the reflector 45 from sliding on the support column 42 .

[0060] like Figure 2 As shown, the base 2 is connected to the support ring 1 via threads.

[0061] The base 2 can be inserted into the support ring 1 to adjust the distance by means of a nut, so that the ejector pin 3 can be adjusted to a horizontal state during installation.

[0062] The working principle of the present invention is as follows: when the levelness of the ejector pin 3 changes after being used for a period of time, if the ejector pin 3 deviates upward, driven by the telescopic rod 46, the reflector 45 deflects downward with the support column 42 as a fulcrum, and the light irradiated by the laser source 43 onto the reflector 45 is reflected and irradiated onto the photoresistor 44 below the laser source 43; if the ejector pin 3 deviates downward, driven by the telescopic rod 46, the reflector 45 deflects upward with the support column 42 as a fulcrum, and the light irradiated by the laser source 43 onto the reflector 45 is reflected and irradiated onto the photoresistor 44 above the laser source 43; by judging the positions where the light irradiates on a number of photoresistors 44, the deviation direction and distance of the ejector pin 3 can be judged. Because the photoresistors 44 are arranged in a plurality of groups in an array, when a certain photoresistor 44 is irradiated by the light reflected by the reflector 45, the circuit on the photoresistor 44 is connected, and the current flows along the photoresistor 44 to the adjustment resistor 47, and finally flows to the electromagnet 52, providing power for the electromagnet 52; and the greater the offset distance of the ejector pin 3, the greater the deflection angle of the reflector 45, the farther the certain photoresistor 44 irradiated by the reflected light is from the laser source 43, the shorter the distance that the current passes through the adjustment resistor 47, the smaller the corresponding resistance value, the greater the current transmitted to the electromagnet 52, and the greater the magnetic force of the repelling magnet 54, thereby realizing automatic adjustment of the magnetic force of the electromagnet 52 according to the deflection distance of the ejector pin 3. When the reflector 45 tilts upward, it indicates that the ejector pin 3 is deflected downward. At this time, the facing ends of the electromagnet 52 and the repelling magnet 54 are poles of the same name. According to the principle of like charges repel each other, the magnetic force of the electromagnet 52 pushes the repelling magnet 54 to move away from the electromagnet 52, and the transmission fluid in the second chamber 512 is compressed, thereby transmitting the pressure to the ejector pin 3, driving the ejector pin 3 to move upward and return to the horizontal position; when the reflector 45 tilts downward, the surface ejector pin 3 deflects upward. At this time, the facing ends of the electromagnet 52 and the repelling magnet 54 are poles of different names. According to the principle of opposite charges attract each other, the magnetic force of the electromagnet 52 attracts the repelling magnet 54 to move toward the electromagnet 52, and the volume of the second chamber 512 increases, forming a negative pressure, which drives the ejector pin 3 to move downward and return to the horizontal position under the action of the pressure. It is realized that the magnetic force direction of the electromagnet 52 is automatically adjusted according to the deflection direction of the ejector pin 3, and the position of the ejector pin 3 is finely adjusted to ensure the level of the ejector pin 3.

[0063] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0064] Finally, it should be noted that the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A fine-adjustable ejector device with feedback detection function, characterized in that: The finely adjustable ejector device comprises a support ring (1), a base (2), an ejector pin (3), a detection mechanism (4) and an adjustment mechanism (5); a connecting seat (11) is provided on one side of the support ring (1); the connecting seat (11) is externally connected to a cylinder; the base (2) is tightly connected to the support ring (1); the ejector pin (3) is slidably connected to the base (2); four groups of ejector pins (3) are provided; the detection mechanism (4) is tightly connected to the support ring (1); the detection mechanism (4) is used to detect the horizontality of the ejector pin (3); the adjustment mechanism (5) is tightly connected to the support ring (1); the adjustment mechanism (5) is used to adjust the position of the ejector pin (3); The regulating mechanism (5) comprises a protective shell (51), an electromagnet (52), a piston (53), a repelling magnet (54) and a connecting hose (56); the protective shell (51) is tightly connected to the supporting ring (1); a first chamber (511) and a second chamber (512) are provided in the protective shell (51); the electromagnet (52) is tightly connected to the first chamber (511); the electromagnet (52) is externally connected to a power source; the piston (53) is slidably connected to the second chamber (512); the repelling magnet (54) is tightly connected to the piston (53); one end of the connecting hose (56) is in communication with the second chamber (512); and the other end of the connecting hose (56) is in communication with the movable groove (21).

2. The fine-adjustable ejector device with feedback detection function according to claim 1, characterized in that: The detection mechanism (4) comprises a detection column (41), a support column (42), a laser source (43), a photoresistor (44), a reflector (45) and a telescopic rod (46); the detection column (41) is tightly connected to the support ring (1); the detection column (41) is located at the center of the support ring (1); the support column (42) is tightly connected to the support ring (1); the position of the support column (42) corresponds to the ejector pin (3); the laser source (43) is tightly connected to the detection column (41); The photoresistor (44) is tightly connected to the detection column (41), and a plurality of photoresistors (44) are arranged along the upper and lower sides of the laser source (43). The bottom of the reflector (45) abuts against the support column (42), one end of the telescopic rod (46) is tightly connected to the reflector (45), and the other end of the telescopic rod (46) is hinged to the ejector pin (3). The output end of the laser source (43) faces the reflector (45), and the laser source (43) and the reflector (45) are on the same horizontal plane.

3. The fine-adjustable ejector device with feedback detection function according to claim 2, characterized in that: The distance between the reflector (45) and the detection column (41) is much greater than the distance between the reflector (45) and the ejector pin (3).

4. The fine-adjustable ejector device with feedback detection function according to claim 2, characterized in that: The base (2) is provided with a movable groove (21), the ejector pin (3) is slidably connected to the movable groove (21), a center ring (6) is sleeved on the ejector pin (3), the movable groove (21) is connected to the adjustment mechanism (5), and the movable groove (21) is filled with transmission fluid.

5. The fine-adjustable ejector device with feedback detection function according to claim 2, characterized in that: The detection column (41) is provided with a mounting groove (411), the mounting groove (411) is provided with an adjustment resistor (47), the adjustment resistor (47) is provided with a plurality of contacts, the plurality of contacts are electrically connected to the photoresistors (44), the plurality of contacts correspond to the plurality of photoresistors (44) in a one-to-one manner, and the adjustment resistor (47) is electrically connected to the electromagnet (52).

6. The fine-adjustable ejector device with feedback detection function according to claim 5, characterized in that: Two groups of the regulating resistors (47) are arranged along the upper and lower sides of the laser source (43), and the circuit conduction directions of the two groups of regulating resistors (47) and the electromagnets (52) are opposite; When the reflector (45) is tilted upward, the facing ends of the electromagnet (52) and the repelling magnet (54) have the same magnetic poles; When the reflector (45) is tilted downward, the facing ends of the electromagnet (52) and the repelling magnet (54) are magnetic poles of opposite names.

7. The fine-adjustable ejector device with feedback detection function according to claim 2, characterized in that: The support column (42) is provided with a guide groove (421), the guide groove (421) is V-shaped, and the bottom end of the reflector (45) abuts against the guide groove (421).

8. The fine-adjustable ejector device with feedback detection function according to claim 1, characterized in that: The base (2) is connected to the support ring (1) via threads.

Images