Precise polishing device for nonlinear optical crystal based on micro-nano hydrolysis

Abstract

The invention discloses an efficient low-defect precise polishing device capable of stably hydrolyzing nonlinear optical crystals KDP and DKDP. The efficient low-defect precise polishing device comprises a precise polishing system and a polishing solution injection system. The high-precision rotary table system is placed on the left side of the workbench and is a main movement mechanism for polishing the crystal elements, and the movement precision of the high-precision rotary table system is crucial to control and maintain the machining precision; the polishing liquid injection system is placed on the right side of the workbench and is an auxiliary liquid injection mechanism for polishing the crystal elements. The two symmetrical stations are adopted for polishing, and the sizes of the stations can be flexibly adjusted through the limiting ring guide wheels to adapt to polishing of crystal workpieces of different sizes; the marble polishing disc can effectively damp and absorb shock, and the polishing liquid can be conveniently recycled by grooving the side edge; an active pressurizing device is adopted, so that the surface shape change can be controlled in real time; and a constant-temperature control system is adopted to ensure uniform components of the polishing solution sprayed on the surface of the crystal workpiece.

Description

Technical Field

[0001] The invention belongs to the technical field of precision and ultra-precision crystal polishing, and specifically relates to a precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis, and is particularly suitable for crystals with deliquescent properties, such as KDP and DKDP. Background Art

[0002] KDP (potassium dihydrogen phosphate) and DKDP (deuterated potassium dihydrogen phosphate) are the core components of inertial confinement laser fusion (ICF). Due to their excellent optical and piezoelectric properties, they are widely used in optical components in laser systems, such as laser amplifiers, frequency converters, etc., which are essential for achieving efficient laser focusing and energy conversion. Their surface accuracy directly affects the quality, stability and focusing effect of the laser beam, and thus affects the performance of the entire device. Therefore, high-precision KDP and DKDP crystal surface polishing technology is particularly important.

[0003] However, KDP and DKDP crystals have material properties such as easy deliquesce, high brittleness, low hardness, and strong anisotropy. Traditional polishing methods, such as magnetorheological polishing (MRF), chemical mechanical polishing (CMP), and single-point diamond fly cutting, cannot avoid the influence of residual particles and heating effects on the crystal surface. Therefore, in view of the easy deliquesce of KDP and DKDP crystals, a new polishing method of abrasive-free water dissolution is adopted. This method uses a specific polishing liquid to remove the material on the crystal surface by dissolution rather than mechanical grinding, thereby avoiding the influence of residual particles and heating effects on the crystal surface.

[0004] However, although the abrasive-free water-soluble polishing method has shown good application prospects, there are still some challenges in current research. The main problems lie in the preparation of the polishing liquid and the design of the polishing device. The composition and concentration of the polishing liquid have a crucial influence on the polishing effect and need to be precisely controlled. At the same time, the structural design of the polishing device also needs to be further optimized to ensure its long-term stability and expand the size range of processable crystal elements. At present, only one-time experimental results can be obtained, and the long-term stability of the device cannot be guaranteed. The size range of crystal elements that can be polished by the device is small, and there are few processing stations, which seriously affects the processing efficiency. Summary of the invention

[0005] In order to overcome the above-mentioned problems existing in the prior art, the present invention proposes a precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis. Through a precise turntable system and an optimized polishing liquid injection system, the problems of low precision, easy damage, unstable polishing liquid temperature, etc. in the polishing process of KDP and DKDP crystals are effectively solved, and high-efficiency and low-defect precision polishing is achieved. In addition, multiple stations can be operated simultaneously to improve the polishing efficiency.

[0006] In order to achieve the above object, the technical solution adopted by the present invention is:

[0007] A precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis, characterized by comprising:

[0008] The polishing system is placed on one side of the workbench and serves as the main motion mechanism for polishing such crystal components; and

[0009] The polishing liquid injection system is placed on the other side of the workbench and serves as an auxiliary polishing liquid injection mechanism for polishing such crystal components;

[0010] Wherein, the polishing system comprises:

[0011] -Marble rotating platform with polishing pads on the surface for single-sided polishing of crystal elements;

[0012] - Two sets of support and limit assemblies are symmetrically arranged on both sides of the marble rotating platform, each set of support and limit assemblies includes a support arm, a column, a bearing, a guide wheel and a limit ring, the column is connected to one end of the support arm, and the other end of the support arm is arc-shaped and adapted to the limit ring located on the marble rotating platform; the curved end of the support arm is provided with a slot and is connected to the guide wheel located on the marble rotating platform through a bearing, and the guide wheel is used to limit the limit ring without affecting the rotation of the limit ring;

[0013] - Two sets of pressure devices, respectively arranged on the limit ring, each set of pressure devices includes a linear guide rail, a spherical head and a pressure block, the spherical head is fixed on the linear guide rail, the pressure block is used to provide pressure to the crystal, and the spherical head and the pressure block are movably connected by bolts to ensure that the pressure block can rotate and swing up and down and left and right with the crystal element during polishing;

[0014] The polishing liquid injection system comprises:

[0015] - Transparent beaker for holding polishing liquid;

[0016] - a temperature sensor, placed in the transparent beaker, for detecting the temperature of the polishing liquid in real time and transmitting the temperature signal to the thermostat in real time;

[0017] - a thermostat, placed at the bottom of the transparent beaker, used to adjust the temperature of the polishing liquid according to the temperature signal of the temperature sensor to ensure that the temperature of the polishing liquid is constant;

[0018] -The tail of the injection tube is square, used to connect the suction tube, and the other end is flat; the injection tube has the function of atomizing liquid. After the polishing liquid is atomized by the injection tube, the micro-water mist is evenly spread on the marble flat turntable through the flat end;

[0019] - One end of the pipette is placed at the bottom of the transparent beaker, and the other end is fixed to the tail of the injection tube;

[0020] -The pressure regulating valve controls the water intake, and the pneumatic switch controls the air intake;

[0021] The polishing system also includes a control and operation terminal, which has the functions of controlling and operating the rotation and speed adjustment of the marble rotating platform.

[0022] The outer wall of the limit ring is affixed with a buffer tape to reduce vibrations generated during processing, and the inner wall is affixed with a polyurethane layer to prevent the crystal element from colliding with the limit ring during processing and causing damage to the crystal element.

[0023] The guide wheel is affixed with a buffer tape.

[0024] The linear guide rail can be pulled up and down to adjust the height of the pressing block, thereby achieving pressurization of crystal workpieces with different thicknesses.

[0025] The outer side of the marble turntable is a water tank made of sheet metal parts, which is used to discharge excess polishing liquid during polishing.

[0026] The crystal is a KDP crystal or a DKDP crystal.

[0027] Compared with the prior art, the present invention has the following advantages:

[0028] 1) The present invention uses a non-completely locked design between the pressing block and the spherical head to allow the pressing block to rotate and slightly swing with the crystal workpiece during the polishing process, and can automatically adapt to crystal workpieces of different thicknesses and shapes, ensuring uniform distribution of polishing pressure and reducing surface defects caused by uneven pressure. The use of a limiting ring combined with an external buffer tape and an inner wall polyurethane layer effectively reduces vibrations and collisions during processing, protects the integrity of the crystal element, and improves polishing accuracy. It can ensure uniform distribution of polishing pressure and stable rotation of the crystal workpiece, reducing the occurrence of surface defects. At the same time, the gas-liquid mixed micro-water mist technology improves the coverage uniformity and permeability of the polishing liquid, further improving polishing accuracy and efficiency. The use of limiting rings and buffer materials effectively reduces vibrations and collisions during processing, avoiding damage and scratches to crystal elements.

[0029] 2) The water intake and air intake are precisely controlled by the pressure regulating valve and the pneumatic switch, and the gas is injected into the polishing liquid to form a micro-water mist, which can significantly improve the coverage uniformity and permeability of the polishing liquid and enhance the polishing effect. At the same time, the temperature sensor and the thermostat are used to monitor and adjust the temperature of the polishing liquid in real time to ensure that the polishing process is carried out within the optimal temperature range, thereby avoiding fluctuations in polishing quality caused by temperature changes. The present invention realizes real-time monitoring and adjustment of the temperature of the polishing liquid, ensuring the stability and consistency of the polishing process. At the same time, the integrated control of the overall structure reduces the difficulty of operation and labor costs, and improves production efficiency and product quality. Through innovative technologies such as modular design and dynamic adaptive pressure devices, it can adapt to the polishing needs of crystal workpieces of different thicknesses, shapes and materials. This wide adaptability makes the device have broad application prospects and market potential in the field of crystal processing. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a structural schematic diagram of a polishing system in a precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis of the present invention;

[0031] Figure 2 It is a schematic diagram of the structure of the pressurizing device in the polishing system of the present invention;

[0032] Figure 3 It is a structural schematic diagram of a polishing liquid injection system in a precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis of the present invention;

[0033] In the figure: 1. Support arm; 2. Column; 3. Bearing; 4. Guide wheel; 5. Limit ring; 6. Switch; 7. Support base; 8. Operation interface; 9. Emergency stop button; 10. Marble turntable; 11. Polishing pad; 12. Sink; 13. Linear guide; 14. Ball head; 15. Pressure block; 16. Pressurizing device; 17. Filling tube; 18. Pipette; 19. Temperature sensor; 20. Thermostat; 21. Transparent beaker; 22. Temperature sensor support frame; 23. Pressure regulating valve; 24. Pneumatic switch. DETAILED DESCRIPTION

[0034] The specific implementation of the present invention is described in detail below in combination with the technical solution and the accompanying drawings, but this should not limit the protection scope of the present invention.

[0035] A precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis comprises: a polishing system, which is placed on one side of a workbench and serves as the main motion mechanism for polishing such crystal elements; and a polishing liquid injection system, which is placed on the other side of the workbench and serves as an auxiliary polishing liquid injection mechanism for polishing such crystal elements.

[0036] See also Figure 1 , Figure 1It is a structural schematic diagram of the polishing system in the precision polishing device of nonlinear optical crystal based on micro-nano hydrolysis of the present invention. As shown in the figure, the polishing system includes a marble rotating platform 10, two columns 2, a limit ring 5, two pressure devices 16 and a system operation interface 8; the surface of the marble plane turntable 10 is affixed with a polishing pad 11 for single-sided polishing of such crystal elements, and the outer side of the marble turntable 10 is a water tank 12 composed of sheet metal parts, which can discharge the polishing liquid in the processing process into a recovery bottle; the two columns 2 are on both sides of the water tank 12, and the columns 2 are connected to support arms 1, which have a certain curvature to match the limit ring 5, and guide wheels 4 with buffer tapes are installed at both ends of the bend, which are used to limit the limit ring 5 without affecting the rotation of the limit ring 5; the pressure device 16 is placed on the limit ring; the operation interface 8 is located at the front end of the device, and has functions such as switch control and large plate rotation speed adjustment. The material of the limit ring 5 is quartz glass, and a buffer tape is attached to the outside to reduce the vibration generated during the processing. Polyurethane is attached to the inner arm to prevent the crystal element from colliding with the limit ring 5 during the processing, which may cause damage to the crystal element.

[0037] The pressure device 16 applies pressure to the crystal workpiece by its own weight. The pressure block 15 is fixed to the spherical head 14 by bolts but not completely locked. During polishing, the pressure block 15 can rotate with the crystal workpiece and swing slightly up and down and left and right. The spherical head 14 is fixed on the linear guide rail 13. The height of the pressure block 15 can be adjusted by pulling up and down the central axis of the guide rail to apply pressure to crystal workpieces of different thicknesses, such as Figure 2 shown.

[0038] Figure 3 It is a structural schematic diagram of the polishing liquid injection system in the precision polishing device of nonlinear optical crystal based on micro-nano hydrolysis of the present invention. As shown in the figure, the polishing liquid injection system includes an injection tube 17, a pipette 18, a temperature sensor 19, a thermostat 20 and a transparent beaker 21; the transparent beaker 21 is filled with specially prepared polishing liquid; the temperature sensor 19 is placed in the transparent beaker 21, and can detect the temperature of the polishing liquid in real time; the thermostat 20 is located in the lower half of the transparent beaker 21, and is used to keep the temperature of the polishing liquid constant; one end of the pipette 18 is immersed in the polishing liquid in the transparent beaker 21, and the other end is connected to the tail of the injection tube 17, and the injection tube 17 will spray the polishing liquid in the pipette 18 on the marble flat turntable 10.

[0039] The working principle of the present invention is as follows:

[0040] When the precision turntable unit is working, the entire marble rotating platform 10 is above the base, and the spindle unit is located inside the base, which is the main power mechanism of the marble rotating platform 10. The spindle is driven by the motor to rotate, and the program is compiled to form an operating system to control the speed and time of the motor rotation, so as to realize the stepless speed regulation function of the marble rotating platform 10; the switch controls the power supply of the entire equipment, and the emergency stop button is directly connected to the motor, which can immediately stop the rotation of the marble rotating platform 10 when encountering dangerous situations. There are grid-shaped grooves engraved on the surface of the marble. During the rotation process, the polishing liquid enters the grooves and flows evenly, and the polishing liquid in the processing process can be discharged into the water tank 12 for easy recycling.

[0041] When the injection unit is working, the water intake is controlled by the pressure regulating valve 23, and the air intake is controlled by the pneumatic switch 24. A proper amount of gas is injected into the polishing liquid to form a micro mist, and then the micro mist after the gas-liquid mixture is evenly spread on the marble flat turntable 10 by the injection pipe 17. The transparent beaker 21 contains a specially prepared polishing liquid, and the temperature sensor 19 is placed in the polishing liquid to detect the temperature of the polishing liquid in real time. When the temperature drops to the set threshold, the temperature information is fed back to the system, and the thermostat 20 receives the signal to start heating the polishing liquid; when the temperature reaches the preset temperature, the thermostat stops working.

[0042] The test shows that the marble turntable in the present invention is flexible in design and manufacture, and the mold can be perfectly combined with the product; it can damp and reduce shock: reduce steps and time during equipment installation and debugging, and improve the processing accuracy of the workpiece; it has heat resistance: compared with metal castings, it can reduce the thermal expansion coefficient and minimize the heat resistance gradient; it has high precision: it can be processed to the precision of 000 level; it is an ideal reference surface; it has high stability: it can still maintain high precision under the action of external force. At the same time, the guide wheel can flexibly adjust the width, replace the limit ring of appropriate size according to the size of the crystal element, and match the limit ring size by increasing or decreasing the distance between the two guide wheels. The temperature of the polishing liquid can be detected in real time through the temperature sensor, and a certain temperature can be maintained under the action of the thermostat. The polishing liquid in the transparent beaker is pumped through the air pipe to make the internal components of the polishing liquid uniform, and it is evenly sprinkled in the limit ring in the form of water mist, which improves the consistency of the removal rate of polishing at various positions on the surface of this type of crystal element.

[0043] The present invention is not limited to this embodiment, and any equivalent concepts or changes within the technical scope disclosed by the present invention are included in the protection scope of the present invention.

Claims

1. A precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis, characterized in that: include: The polishing system is placed on one side of the workbench and serves as the main motion mechanism for polishing this type of crystal element; and The polishing liquid injection system is placed on the other side of the workbench and serves as an auxiliary polishing liquid injection mechanism for polishing such crystal components; Wherein, the polishing system comprises: - a marble rotating platform (10) with a polishing pad (11) attached to the surface for single-sided polishing of the crystal element; - two sets of support and limit assemblies, symmetrically arranged on both sides of the marble rotating platform (10), each set of support and limit assemblies comprising a support arm (1), a column (2), a bearing (3), a guide wheel (4) and a limit ring (5), the column (2) being connected to one end of the support arm (1), the other end of the support arm (1) being arc-shaped and adapted to the limit ring (5) located on the marble rotating platform (10); a groove is provided at the curved end of the support arm (1), and the groove is connected to the guide wheel (4) located on the marble rotating platform (10) through the bearing (3), and the guide wheel (4) is used to limit the limit ring (5) without affecting the rotation of the limit ring (5); - two sets of pressure devices (16), respectively arranged on the limiting ring (5), each set of pressure devices (16) comprises a linear guide rail (13), a spherical head (14) and a pressure block (15), the spherical head (14) is fixed on the linear guide rail (13), the pressure block (15) is used to provide pressure to the crystal, and the spherical head (14) and the pressure block (15) are movably connected by bolts to ensure that the pressure block (15) can rotate and swing up and down and left and right with the crystal element during polishing; The polishing liquid injection system comprises: - a transparent beaker (21) for containing polishing liquid; - a temperature sensor (19), placed in the transparent beaker (21), for detecting the temperature of the polishing liquid in real time and transmitting the temperature signal to the thermostat in real time; - a thermostat (20), placed at the bottom of the transparent beaker (21), for adjusting the temperature of the polishing liquid according to the temperature signal of the temperature sensor (19), so as to ensure that the temperature of the polishing liquid is constant; - The tail of the injection tube (17) is square and used to connect to the suction tube (18), and the other end is flat; the injection tube (17) has the function of atomizing liquid, and after the polishing liquid is atomized by the injection tube (17), the micro mist is evenly spread on the marble flat turntable (10) through the flat end; - One end of the pipette (18) is placed at the bottom of the transparent beaker (21), and the other end is fixed to the tail of the injection tube (17).

2. The precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis according to claim 1, characterized in that: The polishing system also includes a control and operation terminal, which has the functions of controlling and operating the rotation and speed adjustment of the marble rotating platform (10).

3. The precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis according to claim 1, characterized in that: The outer wall of the limiting ring (5) is affixed with a buffer tape for reducing vibrations generated during processing, and the inner wall is affixed with a polyurethane layer for preventing the crystal element from colliding with the limiting ring during processing, thereby preventing the crystal element from being damaged.

4. The precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis according to claim 1, characterized in that: The guide wheel (4) is affixed with a buffer tape.

5. The precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis according to claim 1, characterized in that: The linear guide rail (13) can be pulled up and down, thereby adjusting the height of the pressing block (15) to achieve pressurization of crystal workpieces with different thicknesses.

6. The precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis according to claim 1, characterized in that: The outer side of the marble turntable (10) is a water tank (12) formed of sheet metal parts, which is used to discharge excess polishing liquid during polishing.

7. The precision polishing device for nonlinear optical crystals based on micro-nano hydrolysis according to any one of claims 1 to 6, characterized in that: The crystal is a KDP crystal or a DKDP crystal.

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