Preparation method of nano cerium oxide polishing material

Abstract

The invention provides a preparation method of a nano cerium oxide polishing material, and belongs to the technical field of nano materials. The preparation method of the nano cerium oxide polishing material comprises the following steps: S1, mixing; s2, carrying out hydrothermal synthesis; s3, carrying out solid-liquid separation; s4, activating and sanding; s5, preparing mixed powder; s6, performing grinding pretreatment; and S7, preparing the nano cerium oxide polishing material. The preparation method comprises the following steps: firstly, putting mixed powder into a grinding and rubbing assembly for grinding and rubbing pretreatment, wherein the treatment time is 1.5 hours; performing rubbing pretreatment on the treated materials through a rubbing assembly, finally performing extrusion-rubbing pretreatment on the mixed materials subjected to rubbing pretreatment through an extrusion-rubbing assembly, and heating the mixed powder subjected to grinding pretreatment to 310-450 DEG C; the preparation method of the nano cerium oxide polishing material has the advantages that the process is simple, the process controllability is high, and better use experience is brought to a user.

Description

Technical Field

[0001] The invention relates to the technical field of nano materials, and in particular to a method for preparing a nano cerium oxide polishing material. Background Art

[0002] Cerium oxide is an inorganic substance with the chemical formula CeO2, light yellow or yellowish brown powder. Density 7.13g / cm3, melting point 2397℃, insoluble in water and alkali, slightly soluble in acid. At 2000℃ and 15MPa, cerium oxide can be reduced with hydrogen to obtain cerium trioxide. When the temperature is between 2000℃ and the pressure is between 5MPa, cerium oxide is slightly yellow with a slight red, and pink. Its performance is to make polishing materials, catalysts, catalyst carriers (auxiliaries), ultraviolet absorbers, fuel cell electrolytes, automobile exhaust absorbers, electronic ceramics, etc. At present, the market usually adopts the precipitation-roasting method with cerium rare earth as raw material to prepare nano cerium oxide polishing powder. The rare earth cerium oxide polishing powder prepared by this method has uniform composition, moderate particle size and good crystal consistency. The product is widely used in optical glass, photomask and liquid crystal display. However, this method is more complicated and the process is difficult to control. How to prepare nano cerium oxide polishing material suitable for the optical field, therefore, the present invention designs a preparation method of nano cerium oxide polishing material. Summary of the invention

[0003] In order to make up for the above shortcomings, the present invention provides a method for preparing nano cerium oxide polishing material, aiming to improve the current market usually adopts the precipitation-calcination method using cerium rare earth as raw material to prepare nano cerium oxide polishing powder, the rare earth cerium oxide polishing powder prepared by this method has uniform composition, moderate particle size and good crystal consistency, and the product is widely used in the fields of optical glass, photomask and liquid crystal display. However, this method is relatively complicated and the process is difficult to control.

[0004] The present invention is achieved in that: The present invention provides a method for preparing a nano cerium oxide polishing material, comprising the following steps: S1: mixing, mixing cerium salt, deionized water, metal salt and peroxide to obtain a first suspension; S2: hydrothermal synthesis, injecting the first suspension into a hydrothermal synthesis reaction device for hydrothermal synthesis to obtain a second suspension; S3: solid-liquid separation, using a solid-liquid separator to perform solid-liquid separation on the second suspension to obtain cerium oxide crystals; S4: activating and sand grinding, activating and sand grinding the cerium oxide crystals in sequence to obtain nano cerium oxide; S5: preparing a mixed powder, first taking 98-99.7% of nano cerium oxide and 1.2-0.7% of copper powder according to the mass ratio, stirring and mixing in a container to obtain a mixed powder, the mixing time is 0.8h; S6: grinding pretreatment, using the cerium oxide polishing material processing device to grind the mixed powder for pretreatment, firstly placing the mixed powder in a grinding and kneading component for rolling and kneading pretreatment, the processing time is 1.5h; the treated material is kneaded pretreatment by the kneading component, and finally, the kneaded pretreated mixed material is squeezed and kneaded pretreatment by the squeezing and kneading component; S7: Prepare nano-cerium oxide polishing material, heat the mixed powder after the grinding pretreatment to 310-450°C, and then move it into a die for extrusion molding to prepare nano-cerium oxide polishing material.

[0005] In one embodiment of the present application, the cerium salt in step S1 is selected from at least one of cerium nitrate, cerium chloride, cerium oxalate, cerium sulfate, cerium carbonate, cerium phosphate, cerium methanesulfonate, cerium pyrophosphate, and cerium cyanophosphate.

[0006] In one embodiment of the present application, the method for preparing the first suspension in step S1 comprises the following steps: mixing a cerium salt and deionized water, adjusting the pH value to 1-5, mixing the obtained acidic system with a metal salt, adjusting the pH value to 9-13, and mixing the obtained alkaline system with a peroxide to obtain a first suspension.

[0007] In one embodiment of the present application, the temperature of the hydrothermal synthesis reaction in step S2 is greater than 95°C, and the time is 22-38h, and the temperature of the activation in step S4 is greater than 650°C, and the time is 1.2-3.5h.

[0008] In one embodiment of the present application, the solid-liquid separation in step S2 includes an electrical control box and a drainage bucket, a reducer is installed on one side of the electrical control box, and a feed port is installed on one side of the reducer, a box body is installed on one side of the feed port, and a discharge port is installed on one side of the box body, a base is installed below the box body, and a drainage port is installed below the base, an inner cylinder is provided inside the box body, and a dragon blade is provided inside the inner cylinder, a dragon shaft penetrates inside the dragon blade, a filter hole is opened at the bottom of the inner wall of the box body, a filter plate is installed below the inner cylinder, and locking screws are installed on both sides of the filter plate, the drainage bucket is located below the filter plate, a row wheel is provided inside the feed port, and a positioning shaft penetrates inside the row wheel.

[0009] In one embodiment of the present application, the hydrothermal synthesis reaction device in step S2 includes a magnetic stirring base, a heating layer integrated with the magnetic stirring base, an outermost insulation layer, and an innermost reaction module. The magnetic stirring base is a digital display temperature-controlled magnetic stirrer, provided with a temperature and speed display interface and a knob, and the insulation layer is a double-layer cylindrical shape, including an outer insulation layer and an inner heat storage layer; a connecting hole is provided on the top of the insulation layer, and the insulation layer material of the insulation layer is not unique.

[0010] In one embodiment of the present application, the cerium oxide polishing material processing device in step S6 includes a base assembly and a grinding and rubbing assembly arranged on the base assembly, and the grinding and rubbing assembly grinds and rubs the material; the base assembly includes a support frame, and a support leg is provided on the lower side of the support frame; buffer channels are relatively opened on both sides of the support frame, and a sliding shaft is vertically provided in the buffer channel; both sides of the grinding and rubbing assembly are slidably fitted on the sliding shaft through a connecting shaft; compression springs are respectively passed through the upper and lower sides of the sliding shaft, and a fixed clamping block is fixed on the upper side of the buffer channel; a buffer push rod is fixed on the lower side of the buffer channel through a horizontal plate, and a movable clamping block is fixed on the pushing head of the buffer push rod; grooves corresponding to the connecting shaft are relatively provided on the lower side of the fixed clamping block and the upper side of the movable clamping block, and the grinding and rubbing assembly includes a grinding and rubbing groove and a motor groove, a discharge channel is opened in the bottom center of the grinding and rubbing groove, and a vibration motor is provided on the grinding and rubbing groove; the motor groove is fixed to the two side walls of the support frame through the mounting frames on both sides.

[0011] In one embodiment of the present application, the upper end of the motor slot extends into the discharge channel, and its outer edge has a flange corresponding to the discharge channel; a grinding and rubbing motor is provided in the motor slot, and the motor shaft of the grinding and rubbing motor is fixed by a rotating plate; shaft channels are provided on both sides of the rotating plate, and the grinding wheel rotates with the shaft channel through a linkage, and the bottom of the grinding wheel contacts the bottom of the grinding and rubbing slot; at the same time, a broken line scraper is provided on the side of the rotating plate, and the bottom of the scraper is an inclined structure, and one side contacts the bottom of the grinding and rubbing slot, and the rubbing component is arranged at the bottom of the support frame and is located at the lower side of the grinding and rubbing component; the rubbing component includes a rubbing The invention relates to a plate and a kneading ring, wherein the kneading ring is located in the kneading plate; three fixed ears are arranged at equal intervals on the outer edge of the kneading plate, and a driving plate is rotatably matched on the fixed ears; rubbing particles are arranged on the bottom of the kneading ring, and the rubbing particles are in contact with the kneading plate; three swing ears are arranged at equal intervals on the outer edge of the kneading ring; the outer edge of the swing ear is hinged to the side of the driving plate; a fixed ear is extended outwardly from the rotating shaft on one side and is fixed to the motor shaft of the kneading motor; a discharging opening is opened in the center of the lower side of the kneading plate, and a discharging plate with a plurality of gaps is arranged on the discharging opening; a star-shaped discharger is arranged on the lower side of the supporting frame, which is used to discharge the mixed material processed by the kneading assembly.

[0012] In one embodiment of the present application, an assembly line is provided between the legs of the support frame, and the squeezing and rubbing assembly is provided at the other end of the assembly line; the assembly line is provided with a bearing plate for receiving the mixed material; a cylindrical bearing cavity is provided in the center of the bearing plate, and the squeezing and rubbing assembly includes a positioning frame and an adjustment support, and a lifting cylinder is vertically provided in the positioning frame; the adjustment support is driven up and down by the lifting cylinder; a mounting angle plate is provided on the upper side of the positioning frame, and a guide wheel frame is provided on one side of the mounting angle plate, and the driving wheel and the driven wheel are rotatably matched on the guide wheel frame, and the driving wheel and the driven wheel are linked; ... The rubbing motor is connected to the input end of the reducer, and the output end of the reducer is connected to the driving wheel; the driven wheel corresponds to the position of the push block, and the push block is rotatably matched with a push shaft; one end of the push shaft is rotatably connected to the push block, and the other end of the push shaft passes through the driven wheel and extends into the positioning frame and is fixed to the circular rubbing board; an annular cover is provided on the positioning frame and the outer edge of the rubbing board, and fixed correction ears are relatively provided on both sides of the annular cover, a conical block is arranged on the lower side of the fixed correction ear, and a movable correction ear is relatively provided on the upper outer edge of the bearing cavity, and a guide channel corresponding to the conical block is provided on the movable correction ear.

[0013] In one embodiment of the present application, the metal cation in the metal salt in step S1 includes one of Y3+, La3+, Ce3+, Pr3+, Nd3+, Nd2+, Fe3+ and Zn2+, and the anion includes one of NO3-, SO42-, PO43-, C2O42- or a halogen anion.

[0014] The beneficial effects of the present invention are as follows: the present invention obtains a method for preparing a nano cerium oxide polishing material through the above design. When in use, cerium salt, deionized water, metal salt and peroxide are mixed to obtain a first suspension, the first suspension is injected into a hydrothermal synthesis reaction device for hydrothermal synthesis to obtain a second suspension, the second suspension is subjected to solid-liquid separation by a solid-liquid separator to obtain cerium oxide crystals, the cerium oxide crystals are activated and sand-milled in sequence to obtain nano cerium oxide, 98-99.7% of nano cerium oxide and 1.2-0.7% of copper powder are first taken in a container according to a mass ratio and stirred and mixed to obtain a mixed powder, and the mixture is mixed. The time is 0.8h, and the mixed powder is pre-treated by grinding using a cerium oxide polishing material processing device. The mixed powder is first placed in a grinding and rubbing component for grinding and kneading pre-treatment, and the processing time is 1.5h; the treated material is pre-treated by kneading through the kneading component, and finally, the pre-kneaded mixed material is pre-treated by extrusion and rubbing through the extrusion and rubbing component, and then the mixed powder after grinding and pre-treatment is heated to 310-450°C; then it is moved to a die for extrusion molding to obtain a nano cerium oxide polishing material. The preparation method of the nano cerium oxide polishing material is simple in process, strong in process controllability, and brings a better user experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0016] Figure 1 The system block diagram of the method for preparing nano cerium oxide polishing material of the present invention. DETAILED DESCRIPTION

[0017] In order to make the purpose, technical solutions and advantages of the implementation methods of this application clearer, the technical solutions in the implementation methods of this application will be clearly and completely described below in conjunction with the drawings in the implementation methods of this application. Obviously, the described implementation methods are part of the implementation methods of this application, not all of the implementation methods. Based on the implementation methods in this application, all other implementation methods obtained by ordinary technicians in this field without creative work are within the scope of protection of this application. Example

[0018] See also Figure 1 The present invention provides a technical solution: a method for preparing a nano-cerium oxide polishing material, comprising the following steps: S1: mixing, mixing cerium salt, deionized water, metal salt and peroxide to obtain a first suspension, wherein the cerium salt in step S1 is selected from at least one of cerium nitrate, cerium chloride, cerium oxalate, cerium sulfate, cerium carbonate, cerium phosphate, cerium methanesulfonate, cerium pyrophosphate and cerium cyanophosphate, and the preparation method of the first suspension in step S1 comprises the following steps: mixing the cerium salt and deionized water, adjusting the pH value to 1-5, mixing the obtained acidic system with the metal salt, adjusting the pH value to 9-13, and mixing the obtained alkaline system with the peroxide to obtain the first suspension, wherein the metal cation in the metal salt in step S1 comprises one of Y3+, La3+, Ce3+, Pr3+, Nd3+, Nd2+, Fe3+ and Zn2+, and the anion comprises one of NO3-, SO42-, PO43-, C2O42- or halogen anion; S2: hydrothermal synthesis, injecting the first suspension into a hydrothermal synthesis reaction device for hydrothermal synthesis to obtain a second suspension, the temperature of the hydrothermal synthesis reaction in the step S2 is greater than 95°C, and the time is 22-38h, the temperature of the activation in the step S4 is greater than 650°C, and the time is 1.2-3.5h, the solid-liquid separation in the step S2 includes an electric control box and a liquid discharge bucket, a reducer is installed on one side of the electric control box, and a feed port is installed on one side of the reducer, a box is installed on one side of the feed port, and a discharge port is installed on one side of the box, a base is installed below the box, and a liquid discharge port is installed below the base, an inner cylinder is arranged inside the box, and a Jiaolong blade is arranged inside the inner cylinder, and a Jiaolong shaft runs through the inside of the Jiaolong blade; A filter hole is provided at the bottom of the inner wall of the box body, a filter plate is installed below the inner cylinder, and locking screws are installed on the left and right sides of the filter plate, the liquid drain bucket is located below the filter plate, a row wheel is provided inside the feed port, and a positioning shaft runs through the row wheel, the hydrothermal synthesis reaction device in step S2 includes a magnetic stirring base, a heating layer integrated with the magnetic stirring base, an outermost insulation layer, and an innermost reaction module, the magnetic stirring base is a digital display temperature control magnetic stirrer, provided with a temperature and speed display interface and a knob, the insulation layer is a double-layer cylindrical shape, including an outer insulation layer and an inner heat storage layer; a connecting hole is provided on the top of the insulation layer, and the insulation layer of the insulation layer is not made of a unique material; S3: solid-liquid separation, using a solid-liquid separator to perform solid-liquid separation on the second suspension to obtain cerium oxide crystals; S4: activating and sand grinding, activating and sand grinding the cerium oxide crystals in sequence to obtain nano cerium oxide; S5: preparing a mixed powder, first taking 98-99.7% of nano cerium oxide and 1.2-0.7% of copper powder according to the mass ratio, stirring and mixing in a container to obtain a mixed powder, the mixing time is 0.8h; S6: grinding pretreatment, using the cerium oxide polishing material processing device to grind the mixed powder for pretreatment, first the mixed powder is placed in a grinding and kneading component for grinding and kneading pretreatment, the processing time is 1.5 hours; the treated material is kneaded pretreatment by the kneading component, and finally, the kneaded pretreated mixed material is squeezed and kneaded pretreatment by the squeezing and kneading component, the cerium oxide polishing material processing device in step S6 includes a base component and a grinding and kneading component arranged on the base component, the grinding and kneading component performs grinding and kneading treatment on the material; the base component includes a support frame, the lower side of which has legs; the two sides of the support frame are relatively provided with buffer seats A punching channel, a sliding shaft is vertically arranged in the buffer channel; both sides of the rolling and rubbing assembly are slidably matched on the sliding shaft through a connecting shaft; compression springs are respectively passed through the upper and lower sides of the sliding shaft, and a fixed clamping block is fixed on the upper side of the buffer channel; a buffer push rod is fixed on the lower side of the buffer channel through a horizontal plate, and a movable clamping block is fixed on the push head of the buffer push rod; grooves corresponding to the connecting shaft are relatively arranged on the lower side of the fixed clamping block and the upper side of the movable clamping block, and the rolling and rubbing assembly includes a rolling and rubbing groove and a motor groove, a discharging channel is opened at the bottom center of the rolling and rubbing groove, and a vibration motor is arranged on the rolling and rubbing groove; the motor groove is fixed to the two side walls of the support frame through the mounting frames on both sides; The upper end of the motor slot extends into the discharge channel, and its outer edge has a flange corresponding to the discharge channel; a grinding and rubbing motor is arranged in the motor slot, and the motor shaft of the grinding and rubbing motor is fixed by a rotating plate; rotating shaft channels are opened on both sides of the rotating plate, and the grinding wheel rotates with the rotating shaft channel through a linkage, and the bottom of the grinding wheel contacts the bottom of the grinding and rubbing slot; at the same time, a broken line scraper is arranged on the side of the rotating plate, and the bottom of the scraper is an inclined structure, and one side contacts the bottom of the grinding and rubbing slot, and the rubbing assembly is arranged at the bottom of the support frame and is located at the lower side of the grinding and rubbing assembly; the rubbing assembly includes a rubbing disc and a rubbing ring, The kneading ring is located inside the kneading disk; three fixed ears are arranged at equal intervals on the outer edge of the kneading disk, and a driving plate is rotatably matched on the fixed ears; rubbing particles are arranged at the bottom of the kneading ring, and the rubbing particles are in contact with the kneading disk; three swing ears are arranged at equal intervals on the outer edge of the kneading ring; the outer edge of the swing ear is hinged to the side of the driving plate; a fixed ear extends outward from a rotating shaft on one side and is fixed to the motor shaft of the kneading motor; a discharging opening is opened in the center of the lower side of the kneading disk, and a discharging disk with a plurality of gaps is arranged on the discharging opening; a star-shaped discharger is arranged on the lower side of the support frame, which is used to discharge the mixed material processed by the kneading assembly; An assembly line is arranged between the legs of the support frame, and the squeezing and rubbing assembly is arranged at the other end of the assembly line; a bearing plate for receiving the mixed material is provided on the assembly line; a cylindrical bearing cavity is provided in the center of the bearing plate, and the squeezing and rubbing assembly includes a positioning frame and an adjustment support, and a lifting cylinder is vertically arranged in the positioning frame; the adjustment support is driven up and down by the lifting cylinder; a mounting angle plate is arranged on the upper side of the positioning frame, and a guide wheel frame is arranged on one side of the mounting angle plate, and the driving wheel and the driven wheel are rotatably matched on the guide wheel frame, and the driving wheel and the driven wheel are linked; the squeezing and rubbing motor and the reduction gear are connected. The input end of the reducer is connected, and the output end of the reducer is connected to the driving wheel; the driven wheel corresponds to the position of the push block, and the push block is rotatably matched with a push shaft; one end of the push shaft is rotatably connected to the push block, and the other end of the push shaft passes through the driven wheel and extends into the positioning frame and is fixed to the circular squeezing plate; an annular cover is provided on the positioning frame and the outer edge of the squeezing plate, and fixed correction ears are provided on both sides of the annular cover, and a conical block is provided on the lower side of the fixed correction ear, and a movable correction ear is provided on the upper outer edge of the bearing cavity, and a guide channel corresponding to the conical block is provided on the movable correction ear; S7: Prepare nano-cerium oxide polishing material, heat the mixed powder after the grinding pretreatment to 310-450°C, and then move it into a die for extrusion molding to prepare nano-cerium oxide polishing material.

[0019] Specifically, the working principle of the preparation method of the nano cerium oxide polishing material is as follows: when in use, cerium salt, deionized water, metal salt and peroxide are mixed to obtain a first suspension, the first suspension is injected into a hydrothermal synthesis reaction device for hydrothermal synthesis to obtain a second suspension, the second suspension is subjected to solid-liquid separation by a solid-liquid separator to obtain cerium oxide crystals, the cerium oxide crystals are activated and sand-milled in sequence to obtain nano cerium oxide, 98-99.7% of nano cerium oxide and 1.2-0.7% of copper powder are first stirred and mixed in a container according to a mass ratio to obtain a mixed powder, and the mixing time is 0.8h The mixed powder is pre-treated by grinding using a cerium oxide polishing material processing device. The mixed powder is first placed in a grinding and rubbing component for grinding and kneading pre-treatment, with a processing time of 1.5 hours; the treated material is pre-treated by kneading through the kneading component, and finally, the pre-kneaded mixed material is pre-treated by extrusion and rubbing through the extrusion and rubbing component, and then the mixed powder pre-treated by grinding is heated to 310-450°C; then it is moved into a die for extrusion molding to obtain a nano cerium oxide polishing material. The preparation method of the nano cerium oxide polishing material is simple in process, strong in process controllability, and brings a better user experience.

[0020] The above description is only an embodiment of the present application and is not intended to limit the scope of protection of the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application should be included in the scope of protection of the present application. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings.

Claims

1. A method for preparing a nano cerium oxide polishing material, It is characterized in that The following steps are involved: S1: mixing, mixing cerium salt, deionized water, metal salt and peroxide to obtain a first suspension; S2: hydrothermal synthesis, injecting the first suspension into a hydrothermal synthesis reaction device for hydrothermal synthesis to obtain a second suspension; S3: solid-liquid separation, using a solid-liquid separator to perform solid-liquid separation on the second suspension to obtain cerium oxide crystals; S4: activating and sand grinding, activating and sand grinding the cerium oxide crystals in sequence to obtain nano cerium oxide; S5: preparing a mixed powder, first taking 98-99.7% of nano cerium oxide and 1.2-0.7% of copper powder according to the mass ratio, stirring and mixing in a container to obtain a mixed powder, the mixing time is 0.8h; S6: grinding pretreatment, using the cerium oxide polishing material processing device to grind the mixed powder for pretreatment, firstly placing the mixed powder in a grinding and kneading component for rolling and kneading pretreatment, the processing time is 1.5h; the treated material is kneaded pretreatment by the kneading component, and finally, the kneaded pretreated mixed material is squeezed and kneaded pretreatment by the squeezing and kneading component; S7: Prepare nano-cerium oxide polishing material, heat the mixed powder after the grinding pretreatment to 310-450°C, and then move it into a die for extrusion molding to prepare nano-cerium oxide polishing material.

2. A method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The cerium salt in step S1 is selected from at least one of cerium nitrate, cerium chloride, cerium oxalate, cerium sulfate, cerium carbonate, cerium phosphate, cerium methanesulfonate, cerium pyrophosphate, and cerium cyanophosphate.

3. The method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The preparation method of the first suspension in step S1 comprises the following steps: mixing cerium salt and deionized water, adjusting the pH value to 1-5, mixing the obtained acidic system with metal salt, adjusting the pH value to 9-13, and mixing the obtained alkaline system with peroxide to obtain the first suspension.

4. The method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The temperature of the hydrothermal synthesis reaction in step S2 is greater than 95°C and the time is 22-38h. The temperature of the activation in step S4 is greater than 650°C and the time is 1.2-3.5h.

5. The method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The solid-liquid separation in step S2 includes an electric control box and a drainage hopper, a reducer is installed on one side of the electric control box, and a feed port is installed on one side of the reducer, a box body is installed on one side of the feed port, and a discharge port is installed on one side of the box body, a base is installed below the box body, and a drainage port is installed below the base, an inner cylinder is arranged inside the box body, and a dragon blade is arranged inside the inner cylinder, a dragon shaft penetrates inside the dragon blade, filter holes are opened at the bottom of the inner wall of the box body, a filter plate is installed below the inner cylinder, and locking screws are installed on the left and right sides of the filter plate, the drainage hopper is located below the filter plate, a row wheel is arranged inside the feed port, and a positioning shaft penetrates inside the row wheel.

6. The method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The hydrothermal synthesis reaction device in step S2 includes a magnetic stirring base, a heating layer integrated with the magnetic stirring base, an outermost insulation layer, and an innermost reaction module. The magnetic stirring base is a digital display temperature-controlled magnetic stirrer, provided with a temperature and speed display interface and a knob. The insulation layer is a double-layer cylindrical shape, including an outer insulation layer and an inner heat storage layer; a connecting hole is provided on the top of the insulation layer, and the insulation layer material of the insulation layer is not unique.

7. The method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The cerium oxide polishing material processing device in the step S6 includes a base assembly and a grinding and rubbing assembly arranged on the base assembly, and the grinding and rubbing assembly grinds and rubs the material; the base assembly includes a support frame, and a support leg is provided on the lower side of the support frame; buffer channels are relatively opened on both sides of the support frame, and a sliding shaft is vertically provided in the buffer channel; both sides of the grinding and rubbing assembly are slidably fitted on the sliding shaft through a connecting shaft; compression springs are respectively passed through the upper and lower sides of the sliding shaft, and a fixed clamping block is fixed on the upper side of the buffer channel; a buffer push rod is fixed on the lower side of the buffer channel through a horizontal plate, and a movable clamping block is fixed on the pushing head of the buffer push rod; grooves corresponding to the connecting shaft are relatively provided on the lower side of the fixed clamping block and the upper side of the movable clamping block, and the grinding and rubbing assembly includes a grinding and rubbing groove and a motor groove, a discharge channel is opened in the bottom center of the grinding and rubbing groove, and a vibration motor is provided on the grinding and rubbing groove; the motor groove is fixed to the two side walls of the support frame through the mounting frames on both sides.

8. The method for preparing a nano cerium oxide polishing material according to claim 7, It is characterized in that The upper end of the motor slot extends into the discharge channel, and its outer edge has a flange corresponding to the discharge channel; a grinding and rubbing motor is arranged in the motor slot, and the motor shaft of the grinding and rubbing motor is fixed by a rotating plate; rotating shaft channels are opened on both sides of the rotating plate, and the grinding wheel rotates with the rotating shaft channel through a linkage, and the bottom of the grinding wheel contacts the bottom of the grinding and rubbing slot; at the same time, a broken line scraper is arranged on the side of the rotating plate, and the bottom of the scraper is an inclined structure, and one side contacts the bottom of the grinding and rubbing slot, and the rubbing assembly is arranged at the bottom of the support frame and is located at the lower side of the grinding and rubbing assembly; the rubbing assembly includes a rubbing disc and a rubbing ring, The kneading ring is located inside the kneading disk; three fixed ears are arranged at equal intervals on the outer edge of the kneading disk, and a driving plate is rotatably fitted on the fixed ears; rubbing particles are arranged on the bottom of the kneading ring, and the rubbing particles are in contact with the kneading disk; three swing ears are arranged at equal intervals on the outer edge of the kneading ring; the outer edge of the swing ear is hinged to the side of the driving plate; a fixed ear is extended outwardly from the rotating shaft on one side and is fixed to the motor shaft of the kneading motor; a discharging opening is provided in the center of the lower side of the kneading disk, and a discharging disk with a plurality of gaps is provided on the discharging opening; a star-shaped discharger is provided on the lower side of the supporting frame, which is used to discharge the mixed material processed by the kneading assembly.

9. The method for preparing a nano cerium oxide polishing material according to claim 8, It is characterized in that An assembly line is arranged between the legs of the support frame, and the squeezing and rubbing assembly is arranged at the other end of the assembly line; a bearing plate for receiving the mixed material is provided on the assembly line; a cylindrical bearing cavity is provided in the center of the bearing plate, and the squeezing and rubbing assembly includes a positioning frame and an adjustment support, and a lifting cylinder is vertically arranged in the positioning frame; the adjustment support is driven up and down by the lifting cylinder; a mounting angle plate is arranged on the upper side of the positioning frame, and a guide wheel frame is arranged on one side of the mounting angle plate, and the driving wheel and the driven wheel are rotatably matched on the guide wheel frame, and the driving wheel and the driven wheel are linked; the squeezing and rubbing motor and the reduction gear are connected. The input end of the reducer is connected, and the output end of the reducer is connected to the driving wheel; the driven wheel corresponds to the position of the push block, and the push block is rotatably matched with a push shaft; one end of the push shaft is rotatably connected to the push block, and the other end of the push shaft passes through the driven wheel and extends into the positioning frame and is fixed to the circular squeezing plate; an annular cover is provided on the positioning frame and the outer edge of the squeezing plate, and fixed correction ears are provided on both sides of the annular cover, and a conical block is provided on the lower side of the fixed correction ear, and a movable correction ear is provided on the upper outer edge of the bearing cavity, and a guide channel corresponding to the conical block is provided on the movable correction ear.

10. The method for preparing a nano cerium oxide polishing material according to claim 1, It is characterized in that The metal cation in the metal salt in step S1 includes one of Y3+, La3+, Ce3+, Pr3+, Nd3+, Nd2+, Fe3+ and Zn2+, and the anion includes one of NO3-, SO42-, PO43-, C2O42- or a halogen anion.

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