Narrow-band module, method for manufacturing narrow-band module, and method for manufacturing electronic device

Abstract

The narrowband module includes: a mirror including a bottom surface and a light reflecting surface; a grating which performs wavelength dispersion on the light reflected by the reflecting surface; a base plate to which the bottom surface of the mirror is fixed by an adhesive; a rotary table on which the base plate is disposed, the rotary table rotating the base plate about a rotation axis perpendicular to a plane on which wavelength dispersion of light is performed, and rotating the mirror about the rotation axis; and a drive unit that rotates the rotary table about a rotation axis on which the center of gravity of the mirror, the center of gravity of the adhesive, the center of gravity of the base plate, and the center of gravity of the rotary table are located.

Description

Technical Field

[0001] The present invention relates to a narrowband module, a method for manufacturing the narrowband module and a method for manufacturing an electronic device. Background Art

[0002] In recent years, in semiconductor exposure devices, as semiconductor integrated circuits become smaller and more highly integrated, there is a demand for improved resolution. Therefore, the wavelength of light emitted from the exposure light source is being shortened. For example, as a gas laser device for exposure, a KrF excimer laser device that outputs a laser with a wavelength of about 248nm and an ArF excimer laser device that outputs a laser with a wavelength of about 193nm are used.

[0003] The spectral line width of the natural oscillation light of the KrF excimer laser device and the ArF excimer laser device is wide, which is 350pm to 400pm. Therefore, if the projection lens is made of a material that allows ultraviolet rays such as KrF and ArF lasers to pass through, chromatic aberration may sometimes occur. As a result, the resolution may be reduced. Therefore, it is necessary to narrow the spectral line width of the laser output from the gas laser device to a level where the chromatic aberration can be ignored. Therefore, in order to narrow the spectral line width, a narrowing module (Line Narrowing Module: LNM) containing narrowing elements (etalon, grating, etc.) is sometimes provided in the laser resonator of the gas laser device. Hereinafter, a gas laser device with a narrowed spectral line width will be referred to as a narrowed gas laser device.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: U.S. Patent Application Publication No. 2021 / 0336407

[0007] Patent Document 2: Japanese Patent Application Publication No. 2007-219160

[0008] Patent Document 3: Japanese Patent No. 5331827 Summary of the invention

[0009] A narrowband module of one embodiment of the present invention may include: a reflector including a bottom surface and a light reflecting surface; a grating that performs wavelength dispersion on light reflected by the reflecting surface; a base plate to which the bottom surface of the reflector is fixed by an adhesive; a rotating table configured with the base plate, so that the base plate rotates around an axis with a rotation axis as an axis, so that the reflector rotates around the axis with the rotation axis as an axis, and the rotation axis is perpendicular to the plane on which the light is dispersed in wavelength; and a driving unit that rotates the rotating table around the axis with the rotation axis as an axis, and the center of gravity of the reflector, the center of gravity of the adhesive, the center of gravity of the base plate and the center of gravity of the rotating table are located on the rotation axis.

[0010] In a manufacturing method of a narrowband module of one embodiment of the present invention, the narrowband module may include: a reflector, which includes a bottom surface and a light reflecting surface; a grating, which disperses the wavelength of light reflected by the reflecting surface; a base plate, to which the bottom surface of the reflector is fixed by an adhesive; a rotating table, which is configured with a base plate, so that the base plate rotates around an axis with a rotation axis as an axis, so that the reflector rotates around the axis with the rotation axis as an axis, and the rotation axis is perpendicular to the plane on which the light is dispersed in wavelength; and a driving unit, which rotates the rotating table around the axis with the rotation axis as an axis. The manufacturing method of the narrowband module includes a configuration step, in which the reflector, the adhesive, the base plate and the rotating table are respectively configured in such a way that the center of gravity of the reflector, the center of gravity of the adhesive, the center of gravity of the base plate and the center of gravity of the rotating table are located on the rotation axis.

[0011] A method for manufacturing an electronic device according to one embodiment of the present invention may also include the following steps: generating laser light using a gas laser device, outputting the laser light to an exposure device, and exposing the laser light to a photosensitive substrate in the exposure device to manufacture the electronic device, wherein the gas laser device has a narrowband module, and the narrowband module has: a reflector including a bottom surface and a light reflecting surface; a grating that performs wavelength dispersion on light reflected by the reflecting surface; a base plate, to which the bottom surface of the reflector is fixed by an adhesive; a rotating table having a base plate configured so that the base plate rotates around an axis with a rotation axis as an axis, so that the reflector rotates around an axis with the rotation axis as an axis, and the rotation axis is perpendicular to a plane on which the light is dispersed in wavelength; and a driving unit that rotates the rotating table around an axis with the rotation axis as an axis, and the center of gravity of the reflector, the center of gravity of the adhesive, the center of gravity of the base plate, and the center of gravity of the rotating table are located on the rotation axis. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Hereinafter, several embodiments of the present disclosure will be described with reference to the accompanying drawings, merely as examples.

[0013] Figure 1 It is a schematic diagram showing an example of the overall schematic configuration of an electronic device manufacturing apparatus.

[0014] Figure 2 It is a schematic diagram showing an overall schematic configuration example of a gas laser device according to a comparative example.

[0015] Figure 3 It is a front view of the reflector unit of the comparative example.

[0016] Figure 4 It is a top view of the reflector unit of the comparative example.

[0017] Figure 5 It is a side view of the reflector unit of the comparative example.

[0018] Figure 6 It is a top view of the driving unit.

[0019] Figure 7 This is a front view of the reflector unit according to Embodiment 1.

[0020] Figure 8 This is a top view of the reflector unit according to Embodiment 1.

[0021] Fig. 9 This is a side view of the reflector unit according to Embodiment 1.

[0022] Fig.10 This is a flowchart showing an assembly process in the method for manufacturing the narrowband module according to the first embodiment.

[0023] Fig.11 This is a front view of the reflector during the reflector fixing process.

[0024] Fig.12 This is a side view of the reflector during the reflector fixing step.

[0025] Fig.13 This is a diagram showing a state where an adhesive is applied to the side surface of the reflecting mirror and the base plate in the reflecting mirror fixing step of the first embodiment.

[0026] Fig.14 It is a side view of the reflector unit according to the second embodiment.

[0027] Fig.15 It is a side view of a mirror unit according to a modified example of the second embodiment.

[0028] Fig.16 This is a front view of the reflector unit according to the third embodiment.

[0029] Fig.17 It is a top view of the reflector unit according to the third embodiment.

[0030] Fig.18 It is a side view of the reflector unit according to the third embodiment.

[0031] Fig.19 This is a diagram for explaining application of an adhesive to the back surface of the reflecting mirror and the contact surface of the base plate in the reflecting mirror fixing step of the third embodiment. DETAILED DESCRIPTION

[0032] 1. Description of an electronic device manufacturing apparatus used in an exposure process of an electronic device

[0033] 2. Description of the gas laser device of the comparative example

[0034] 2.1 Structure

[0035] 2.2 Actions

[0036] 2.3 Topics

[0037] 3. Description of the Narrowband Module of Implementation Method 1

[0038] 3.1 Structure

[0039] 3.2 Manufacturing Method of Narrowband Module

[0040] 3.3 Action and Effect

[0041] 4. Description of the narrowband module of the second embodiment

[0042] 4.1 Structure

[0043] 4.2 Action and Effect

[0044] 5. Description of the narrowband module of implementation mode 3

[0045] 5.1 Structure

[0046] 5.2 Manufacturing Method of Narrowband Module

[0047] 5.3 Action and Effect

[0048] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

[0049] The embodiments described below represent several examples of the present disclosure and do not limit the content of the present disclosure. In addition, the structures and actions described in each embodiment are not necessarily all necessary as the structures and actions of the present disclosure. In addition, the same reference symbols are marked on the same components, and repeated descriptions are omitted. In addition, in some drawings, reference symbols are omitted for some components for ease of observation.

[0050] 1. Description of an electronic device manufacturing apparatus used in an exposure process of an electronic device

[0051] Figure 1 Schematic diagram showing an overall schematic configuration example of an electronic device manufacturing apparatus used in an exposure process of an electronic device. Figure 1As shown, the manufacturing device used in the exposure process includes a gas laser device 100 and an exposure device 200. The exposure device 200 includes an illumination optical system 210 and a projection optical system 220, and the illumination optical system 210 has a plurality of reflection mirrors 211, 212, and 213. The illumination optical system 210 illuminates the mask pattern of the mask stage RT by the laser light incident from the gas laser device 100. The projection optical system 220 performs reduced projection of the laser light transmitted through the mask so that it is imaged on a workpiece (not shown) arranged on the workpiece stage WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with a photoresist. The exposure device 200 exposes the workpiece with the laser light reflecting the mask pattern by moving the mask stage RT and the workpiece stage WT in parallel in synchronization. By transferring the device pattern to the semiconductor wafer using the above exposure process, a semiconductor device as an electronic device can be manufactured.

[0052] 2. Description of the gas laser device of the comparative example

[0053] 2.1 Structure

[0054] A gas laser device 100 of a comparative example will be described. It should be noted that the comparative example of the present disclosure is a method that the applicant recognizes as being known only to the applicant, and is not a publicly known example recognized by the applicant himself.

[0055] Figure 2 : is a schematic diagram showing an overall schematic structural example of a gas laser device 100 of a comparative example. The gas laser device 100 is, for example, an ArF excimer laser device using a mixed gas containing argon (Ar), fluorine (F2) and neon (Ne). The gas laser device 100 outputs a laser having a central wavelength of approximately 193 nm. In addition, the gas laser device 100 may also be a gas laser device other than the ArF excimer laser device, for example, it may also be a KrF excimer laser device using a mixed gas containing krypton (Kr), F2 and Ne. In this case, the gas laser device 100 emits a laser having a central wavelength of approximately 248 nm. A mixed gas containing Ar, F2 and Ne as a laser medium, and a mixed gas containing Kr, F2 and Ne as a laser medium are sometimes referred to as laser gas.

[0056] The gas laser device 100 includes a housing 110 and a laser oscillator 130 , a detection unit 160 , a shutter 170 , and a laser processor 190 arranged in an internal space of the housing 110 as main structures.

[0057] The laser oscillator 130 includes a cavity device CH, a charger (not shown), a pulse power module (not shown), a narrowband module 60 , and an output coupling mirror 70 as main structures.

[0058] exist Figure 2, the internal structure of the cavity device CH viewed from a direction substantially perpendicular to the traveling direction of the laser light is shown. The cavity device CH includes a housing 30, a pair of windows 31a, 31b, and a pair of electrodes 32a, 32b as main structures. Hereinafter, the direction parallel to the optical axis direction of the laser light emitted from the cavity device CH is defined as the X direction, the direction perpendicular to the X direction is defined as the Y direction, and the direction perpendicular to the X direction and the Y direction is defined as the Z direction for description.

[0059] The housing 30 includes an internal space where light is generated by excitation of the laser medium in the laser gas. The light travels toward the windows 31a and 31b. The laser gas is supplied to the internal space of the housing 30 from a laser gas supply source (not shown) through a pipe (not shown).

[0060] A pair of windows 31a and 31b are provided on the wall surface of the housing 30. The window 31a is located at one end side in the direction of travel of the laser in the housing 30, and the window 31b is located at the other end side in the direction of travel. The windows 31a and 31b are inclined at a Brewster angle relative to the direction of travel of the laser to suppress reflection of P polarized light of the laser. The laser light oscillated as described later is emitted to the outside of the housing 30 through the windows 31a and 31b.

[0061] In the internal space of the housing 30, the electrodes 32a and 32b are separated and opposed to each other in the Z direction, and the long sides of the electrodes 32a and 32b are along the X direction. The electrode 32b is located below the electrode 32a in the Z direction. Figure 2 32a is shown larger than electrode 32a for easy viewing, but is roughly the same size as electrode 32a. The space between electrode 32a and electrode 32b is between window 31a and window 31b. Electrodes 32a and 32b are discharge electrodes for exciting the laser medium by glow discharge. In this example, electrode 32a is a cathode and electrode 32b is an anode.

[0062] The electrode 32a is supported by an unillustrated electrical insulating portion that closes an unillustrated opening of the housing 30. The material of the electrical insulating portion can be, for example, alumina ceramics having low reactivity with F2 gas. In addition, a feedthrough portion, unillustrated, composed of a conductive member, is disposed on the electrical insulating portion. The feedthrough portion applies the voltage supplied from the pulse power module to the electrode 32a. The electrode 32b is supported by an unillustrated electrode holding portion and is electrically connected to the electrode holding portion.

[0063] The charger (not shown) is a DC power supply device that charges the charging capacitor (not shown) provided in the pulse power module with a prescribed voltage. The charger is arranged outside the housing 30 and is connected to the pulse power module. The pulse power module includes a switch (not shown) controlled by the laser processor 190. When the switch changes from off to on, the pulse power module generates a pulsed high voltage using the electric energy charged to the charging capacitor, and applies the high voltage between the electrode 32a and the electrode 32b. When the high voltage is applied between the electrode 32a and the electrode 32b, a discharge is generated between the electrode 32a and the electrode 32b. The laser medium in the housing 30 is excited by the energy of the discharge, and the excited laser medium emits light when it transitions to the ground state. The emitted light is emitted to the outside of the housing 30 through the windows 31a and 31b.

[0064] The narrowband module 60 includes a housing 68 and a prism 61, a prism 62, a prism 63, a reflector unit 400, and a grating 66 as main structures arranged in the inner space of the housing 68. One end of the optical tube 68a is connected to the housing 68 in a manner surrounding an opening provided in the housing 68. The other end of the optical tube 68a is connected to the rear side of the housing 30 in a manner surrounding the window 31b.

[0065] The prisms 61, 62, and 63 expand the beam width of the light emitted from the window 31b and make the light incident on the grating 66. In addition, the prisms 61, 62, and 63 reduce the beam width of the reflected light from the grating 66 and make the light pass through the window 31b and return to the internal space of the housing 30. In addition, the prisms 61, 62, and 63 respectively disperse the wavelength of the light transmitted through them on the XY plane and emit it.

[0066] Each prism 61, prism 62, and prism 63 is fixed to a carrier 61D, a carrier 62D, and a carrier 63D as a carrier. The carriers 61D and 62D are fixed to the bottom surface of the housing 68 in the internal space of the housing 68. On the other hand, the carrier 63D is fixed to a rotating table 63a, and the rotating table 63a is arranged on the bottom surface of the housing 68 in the internal space of the housing 68. The rotating table 63a rotates the carrier 63D and the prism 63 around an imaginary rotation axis of the rotating table 63a, and the imaginary rotation axis of the rotating table 63a is perpendicular to the XY plane in which the wavelength of the light emitted from the prisms 61, 62, 63, and the grating 66 is dispersed. The rotating table 63a is connected to the motor 63b and rotated by the motor 63b. The motor 63b is electrically connected to the laser processor 190. The laser processor 190 adjusts the rotation angle of the rotating table 63a by controlling the motor 63b. In addition, the placement portion 63D may be integrated with the rotating table 63a.

[0067] The reflecting mirror unit 400 includes a reflecting mirror 410 and a holding unit 420 as main structures.

[0068] The reflector 410 is arranged between the prism 63 and the grating 66 on the optical path of the light in the narrowband module 60. The reflector 410 reflects the light from the prism 63 toward the grating 66, and reflects the light from the grating 66 toward the prism 63. That is, the reflector 410 adjusts the optical path of the light to match the limited space in the internal space of the shell 68 by returning the light traveling in the internal space of the shell 68. The reflector 410 may also be arranged between the prisms as long as it can adjust the optical path of the light. The holding unit 420 includes a driving body 455, and the driving body 455 is used to rotate the reflector 410 around an axis with an imaginary rotation axis of the reflector 410 as an axis, and the imaginary rotation axis of the reflector 410 is perpendicular to the XY plane in which the light is wavelength dispersed. Regarding the reflector 410 and the holding unit 420, use Figure 3 , Figure 4 , Figure 5 and Figure 6 This will be described later.

[0069] The prism 63 and the reflector 410 are slightly rotated around their respective rotation axes to change their directions, and the directions of the light emitted from the prism 63 and the reflector 410 are changed, and the incident angle of the light incident on the grating 66 is adjusted. By adjusting the incident angle of the light incident on the grating 66, the wavelength of the light reflected by the grating 66 and incident on the cavity device CH is adjusted. Therefore, the light emitted from the window 31b of the housing 30 is reflected by the prism 61, the prism 62, the prism 63 and the reflector 410, and the wavelength of the light incident on the housing 30 is adjusted to a desired wavelength. It should be noted that the number of prisms is three in this example, but as long as at least one rotating prism is included like the prism 63, it can be less than two or more than four.

[0070] The surface of the grating 66 is made of a material with high reflectivity, and a plurality of grooves are provided on the surface at predetermined intervals. The cross-sectional shape of each groove is, for example, a right triangle. The grating 66 reflects the light incident from the reflector 410 to the grating 66 through these grooves, so that the light is wavelength dispersed in the XY plane, and diffracted in a direction corresponding to the wavelength of the light. The grating 66 is configured by Littrow in such a way that the incident angle of the light incident from the reflector 410 to the grating 66 is consistent with the diffraction angle of the diffracted light of the desired wavelength. Thus, the light near the desired wavelength is returned to the housing 30 through the prism 61, the prism 62, the prism 63 and the reflector 410. The grating 66 is fixed to a carrier 66D as a carrier, and the carrier 66D is fixed to the housing 68 in the internal space of the housing 68.

[0071] The output coupling mirror 70 is arranged in the inner space of the optical path tube 71 connected to the front side of the housing 30, opposite to the window 31a. The output coupling mirror 70 transmits a part of the laser light from the window 31a, and reflects the other part and returns to the inner space of the housing 30 through the window 31a. In this way, the grating 66 and the output coupling mirror 70 constitute a Fabry-Perot type laser resonator, and the housing 30 is arranged on the optical path of the laser resonator.

[0072] The detection unit 160 mainly includes a housing 161 and beam splitters 162 and 163, a photosensor 164, and a wavelength monitor 165 disposed in the interior space of the housing 161. The housing 161 has an opening, and the optical tube 71 is connected to the housing 161 so as to surround the opening.

[0073] The beam splitter 162 is disposed on the optical path of the laser light. The beam splitter 162 allows a portion of the laser light traveling from the output coupling mirror 70 to pass through the shutter 170 with high transmittance, and reflects the other portion of the laser light toward the beam splitter 163. The beam splitter 163 allows a portion of the laser light from the beam splitter 162 to pass through the optical sensor 164, and reflects the other portion of the laser light toward the wavelength monitor 165.

[0074] The optical sensor 164 measures the pulse energy E of the laser light incident on the light receiving surface of the optical sensor 164. The optical sensor 164 is electrically connected to the laser processor 190, and outputs a signal related to the measured pulse energy E to the laser processor 190. The wavelength monitor 165 includes a spectrometer and an image sensor. The spectrometer forms interference fringes of the laser light from the beam splitter 163 on the light receiving surface of the image sensor. The image sensor generates image data of the interference fringes. The image sensor is electrically connected to the laser processor 190, and outputs a signal related to the generated image data to the laser processor 190.

[0075] An opening is provided on the side of the housing 161 opposite to the side connected to the optical tube 71, and the optical tube 171 is connected to the housing 161 so as to surround the opening. The optical tube 171 is connected to the housing 110, and a shutter 170 is arranged inside the optical tube 171.

[0076] The internal spaces of the optical tubes 68a, 71, 171, and the housings 68 and 161 are supplied and filled with a purge gas. The purge gas contains an inert gas such as nitrogen (N2). The purge gas is supplied from a purge gas supply source (not shown) through a pipe (not shown). In addition, the optical tube 171 is connected to the exposure device 200 through an opening of the housing 110 and the optical tube 300, and the optical tube 300 connects the housing 110 and the exposure device 200. As described later, the laser light after passing through the shutter 170 is incident on the exposure device 200.

[0077] The laser processor 190 of the present disclosure is a processing device including a storage device 190a storing a control program and a CPU (Central Processing Unit) 190b executing the control program. The laser processor 190 is specially configured or programmed to execute various processes included in the present disclosure, and controls the entire gas laser device 100.

[0078] The laser processor 190 sends and receives various signals to and from the exposure processor 230 of the exposure device 200. For example, the laser processor 190 receives signals indicating the light emission trigger Tr and the target energy Et described later from the exposure processor 230. The target energy Et is a target value of the energy of the laser used in the exposure process. The laser processor 190 controls the charging voltage of the charger based on the pulse energy E and the target energy Et received from the light sensor 164 and the exposure processor 230. The pulse energy of the laser is controlled by controlling the charging voltage. In addition, the laser processor 190 sends a command signal for turning on or off the switch to the pulse power module.

[0079] In addition, the laser processor 190 is electrically connected to the shutter 170 to control the opening and closing of the shutter 170. Specifically, the laser processor 190 closes the shutter 170 until the difference ΔE between the pulse energy E received from the detection unit 160 and the target energy Et received from the exposure processor 230 is within the allowable range. If the difference ΔE is within the allowable range, the laser processor 190 sends a reception preparation completion signal to the exposure processor 230 to notify that the reception preparation of the light emission trigger Tr has been completed. Upon receiving the reception preparation completion signal, the exposure processor 230 sends a signal indicating the light emission trigger Tr to the laser processor 190, and the laser processor 190 opens the shutter 170 upon receiving the signal indicating the light emission trigger Tr. The light emission trigger Tr is defined by a predetermined repetition frequency f and a predetermined number of pulses P of the laser, and is a timing signal for the exposure processor 230 to cause the laser oscillator 130 to perform laser oscillation, and is an external trigger. The repetition frequency f of the laser is, for example, greater than 100 Hz and less than 10 kHz.

[0080] In addition, the laser processor 190 receives a signal related to the image data from the wavelength monitor 165, and uses the image data to measure the wavelength of the laser. For example, the laser processor 190 also receives a signal indicating the target long wavelength λ of the laser from the exposure processor 230. L t, target short wavelength of laser λ S The laser processor 190 controls the motor 63b synchronously with the light emission trigger Tr to rotate the prism 63, and controls the holding unit 420 to rotate the reflector 410, so that the wavelength of the measured laser light is periodically switched to the target long wavelength λ L t and the target short wavelength λ SThus, the incident angle of the laser beam to the grating 66 is adjusted, and the wavelength of the laser beam is periodically switched to the target long wavelength λ. L t and target short wavelength λ S In addition, the wavelength of the laser light is roughly adjusted by the rotation adjustment of the prism 63, and the wavelength of the laser light is finely adjusted by the rotation adjustment of the reflection mirror 410.

[0081] The exposure processor 230 of the present disclosure is a processing device including a storage device 230a storing a control program and a CPU 230b executing the control program. The exposure processor 230 is specially configured or programmed to execute various processes included in the present disclosure. In addition, the exposure processor 230 controls the entire exposure device 200.

[0082] Next, a mirror unit 400 according to a comparative example will be described. Figure 3 is a front view of a reflector unit 400 of a comparative example, Figure 4 is a top view of a reflector unit 400 of a comparative example, Figure 5 4 is a side view of a mirror unit 400 according to a comparative example.

[0083] The reflector 410 of the reflector unit 400 includes a bottom surface 411, a light reflecting surface 412, and a back surface 413 opposite to the reflecting surface 412. The reflector 410 is held by a holding unit 420 so as to be rotatable around a rotation axis RA of the reflector 410, the rotation axis RA being perpendicular to an XY plane in which wavelength dispersion of light is performed by the prism 61, the prism 62, the prism 63, and the grating 66. The rotation axis RA is a virtual axis that is perpendicular to the bottom surface 411, parallel to the in-plane direction of the reflecting surface 412, and passes through the reflector 410.

[0084] The holding unit 420 includes a base plate 430 , a rotating table 440 , and a driving portion 450 .

[0085] The base plate 430 is in the shape of a cuboid, and the main surface of the base plate 430 is in the shape of a rectangle. The bottom surface 411 of the reflector 410 is fixed to the base plate 430 by an adhesive 500. Figure 4 In the figure, the adhesive 500 is hatched for easy viewing. The base plate 430 is located inside the reflector 410 in the X direction and protrudes outside the reflector 410 in the Y direction. Therefore, the reflector 410 is fixed to the base plate 430 by the adhesive 500 at a part of the bottom surface 411.

[0086] The adhesive 500 may be epoxy resin, for example, and the adhesive 500 shrinks when cured during bonding. The adhesive 500 of the comparative example is provided in a portion of the overlapping region between the bottom surface 411 of the reflector 410 and the base plate 430, and is provided so as not to protrude from the bottom surface 411 of the reflector 410 and the base plate 430.

[0087] The base plate 430 is disposed on the rotating table 440 so as to be rotatable about the rotation axis RA as an axis. When the base plate 430 is rotated by the rotating table 440, the reflecting mirror 410 is also rotated about the rotation axis RA as an axis.

[0088] When the reflector 410 is fixed to the base plate 430 by the adhesive 500 and the base plate 430 is arranged on the rotating table 440, the center of gravity 410G of the reflector 410, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440 are located on the rotating axis RA. The center of gravity 410G is the center of gravity of the reflector 410 including the rod 441 described later installed on the rotating table 440. The center of gravity 500G of the adhesive 500 is located at a position deviated from the rotating axis RA. The center of gravity 500G is the point where the resultant force of the centrifugal force generated in the XY plane surrounded by the adhesive 500 is balanced when the adhesive 500 rotates around the rotating axis RA. Figure 3 , Figure 4 as well as Figure 5 In FIG. 5 , a virtual axis that is orthogonal to the rotation axis RA and perpendicular to the reflection surface 412 of the reflection mirror 410 when viewed along the rotation axis RA is represented as a first axis 500a. Figure 4 In FIG. 4 , an imaginary axis perpendicular to the rotation axis RA and the first axis 500 a is represented as a second axis 500 b . The first axis 500 a is along the Y-axis direction, and the second axis 500 b is along the X-axis direction and parallel to the reflection surface 412 .

[0089] The main surface of the rotating table 440 is circular, and the base plate 430 is fixed to one main surface of the rotating table 440 by fixing bolts (not shown). In order to rotate the base plate 430, the rotating table 440 is connected to the driving unit 450, and the driving unit 450 rotates the rotating table 440 around the rotation axis RA.

[0090] Figure 6 4 is a top view of the driving unit 450. The driving unit 450 includes a stage block 451 and a driving body 455. The stage block 451 is fixed to the housing 68 in the internal space of the housing 68. A circular opening 451a and a rectangular hole 451b are provided in the stage block 451. The opening 451a penetrates the stage block 451 in the Z direction. The hole 451b is provided inside the stage block 451, extends in the X direction, and the end in the X direction is connected to the opening 451a.

[0091] A rotating table 440 is provided in the opening 451a. The rotating table 440 is connected to the stage block 451 via a plurality of spokes 453. The spokes 453 are connected to the outer peripheral surface of the rotating table 440 and the inner peripheral surface of the stage block 451 at the opening 451a. The rotating table 440 protrudes from the stage block 451 toward the reflector 410 in the Z direction. A rod 441 is mounted on the outer peripheral surface of the rotating table 440 at a position different from the spokes 453. The rod 441 extends from the opening 451a to the hole 451b. The driving body 455 contacts the end of the rod 441 on the opposite side of the rotating table 440.

[0092] The driving body 455 is located in the hole 451b along the X direction. The driving body 455 is electrically connected to the laser processor 190, and can vibrate slightly in the X direction under the control of the laser processor 190. When the driving body 455 vibrates slightly in the X direction, the rod 441 vibrates in the X direction. As a result, the rotating table 440 rotates slightly around the rotation axis RA at high speed. In addition, when the rotating table 440 rotates slightly at high speed, the spokes 453 are not cut off due to the high-speed fine rotation, but deform in the rotation direction corresponding to the rotation. Therefore, even if the rotating table 440 rotates slightly at high speed, it is connected to the carrier block 451 through the spokes 453. As a material of the carrier block 451 including such spokes 453, stainless steel such as SUS304 can be cited, for example.

[0093] 2.2 Action

[0094] Next, the operation of the gas laser device 100 according to the comparative example will be described.

[0095] Before the gas laser device 100 emits laser light, purge gas is filled from a purge gas supply source (not shown) into the inner spaces of the optical tubes 68a, 71, 171, 300 and the inner spaces of the housings 68 and 161. Laser gas is supplied to the inner space of the housing 30 from a laser gas supply device (not shown).

[0096] When the gas laser device 100 emits a laser, the laser processor 190 receives a signal indicating the target energy Et and a signal indicating the light emission trigger Tr from the exposure processor 230. When receiving the signal indicating the target energy Et, the laser processor 190 closes the shutter 170 and drives the charger. In addition, the laser processor 190 turns on the switch of the pulse power module. As a result, the pulse power module uses the electric energy retained in the charger to apply a pulsed high voltage between the electrode 32a and the electrode 32b. This high voltage generates a discharge between the electrode 32a and the electrode 32b, and the laser medium contained in the laser gas between the electrode 32a and the electrode 32b becomes an excited state, and emits light when the laser medium returns to the ground state. When the light passes through the window 31b and further passes through the prism 61, the prism 62, and the prism 63, the width of the light is expanded in the direction of travel of the light each time it passes through, and the light is wavelength dispersed each time it passes through. In addition, the light from the prism 63 is guided to the grating 66 by the reflector 410 at a specified incident angle, reflected by the grating 66 and subjected to wavelength dispersion, and diffracted in a direction corresponding to the wavelength. Then, the light of the desired wavelength is reflected by the grating 66 at the same reflection angle as the incident angle. The light reflected by the grating 66 passes through the prism 61, the prism 62, the prism 63 and the reflector 410 and propagates from the window 31b to the internal space of the shell 30 again. The light propagated to the internal space of the shell 30 is narrow-banded. Through the narrow-banded light, the laser medium in the excited state produces stimulated emission, and the light is amplified. The light resonates between the grating 66 and the output coupling mirror 70, and the light is amplified each time it passes through the discharge space in the internal space of the shell 30, generating laser oscillation. In addition, a part of the laser light passes through the output coupling mirror 70 as a pulsed laser and travels to the beam splitter 162.

[0097] A portion of the laser light traveling toward the beam splitter 162 is reflected by the beam splitter 162. A portion of the reflected laser light is transmitted through the beam splitter 163 and received by the optical sensor 164. The optical sensor 164 measures the pulse energy E of the received laser light. The optical sensor 164 outputs a signal indicating the pulse energy E to the laser processor 190. The laser processor 190 controls the charging voltage so that the difference ΔE between the pulse energy E and the target energy Et is within the allowable range. The laser processor 190 closes the shutter 170 until the difference ΔE is within the allowable range. When the difference ΔE is within the allowable range, the laser processor 190 sends a reception preparation completion signal to the exposure processor 230. When the exposure processor 230 receives the reception preparation completion signal, it sends a signal indicating the light emission trigger Tr to the laser processor 190, and when the laser processor 190 receives the signal indicating the light emission trigger Tr, it opens the shutter 170. Thus, the laser light travels toward the exposure device 200.

[0098] In addition, another part of the laser light reflected by the beam splitter 162 is reflected by the beam splitter 163 and received by the wavelength monitor 165. The wavelength monitor 165 outputs a signal related to the image data of the laser light to the laser processor 190. The laser processor 190 uses the received image data to measure the wavelength of the laser light. The laser processor 190 controls the motor 63b to control the prism 63 in synchronization with the light emission trigger Tr, and controls the driving main body 455 to rotate the reflector 410, so that the measured wavelength of the laser light is periodically switched to the target long wavelength λ. L t and the target short wavelength λ S Thus, the incident angle of the laser beam to the grating 66 is adjusted, and the wavelength of the laser beam is periodically switched to the target long wavelength λ. L t and target short wavelength λ S The gas laser device 100 performs dual-wavelength oscillation in which the oscillation wavelength of the pulsed laser light emitted from the gas laser device 100 to the exposure device 200 is periodically switched to two wavelengths every one to several pulses.

[0099] 2.3 Topics

[0100] In the narrowband module 60 of the comparative example, when viewed along the rotation axis RA direction, the adhesive 500 is arranged asymmetrically with respect to the first axis 500a and the second axis 500b, and the thickness of the adhesive 500 is uneven in the rotation axis RA direction. Therefore, as described above, the center of gravity 500G of the adhesive 500 deviates from the rotation axis RA. When the reflector 410 is slightly rotated at high speed in this state, the reflector 410 sometimes generates unnecessary vibration. As a result, the incident angle of the light incident from the reflector 410 to the grating 66 sometimes changes from the pre-conceived incident angle, and the wavelength of the light reflected by the grating 66 changes from the pre-conceived wavelength. Therefore, it is sometimes impossible to adjust the wavelength of the light with high precision.

[0101] Therefore, in the following embodiment, a narrowband module 60 capable of adjusting the wavelength of light with high accuracy is exemplified.

[0102] 3. Description of the Narrowband Module of Implementation Method 1

[0103] Next, the narrowband module 60 according to Embodiment 1 will be described. The same reference numerals are given to the same configurations as those described above, and the duplicate description will be omitted unless otherwise specified.

[0104] 3.1 Structure

[0105] Figure 7 is a front view of the reflector unit 400 of this embodiment. Figure 8 is a top view of the reflector unit 400 of this embodiment. Fig. 94 is a side view of the reflector unit 400 of the present embodiment. The reflector 410 of the reflector unit 400 of the present embodiment is in the shape of a cuboid. The bottom surface 411 is along the XY plane, and its shape is a rectangle that is long in the X direction. The reflection surface 412 and the back surface 413 are along the XZ plane and perpendicular to the bottom surface 411, and their shapes are rectangles that are long in the X direction.

[0106] The center of gravity 500G of the adhesive 500 of this embodiment is located on the rotation axis RA together with the center of gravity 410G of the reflector 410, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440. The center of gravity being located on the rotation axis RA in this embodiment means that the center of gravity is located within 0.5 mm from the rotation axis RA in the XY plane. That is, the allowable range of the center of gravity deviation from the rotation axis RA is less than 0.5 mm. The adhesive 500 of this embodiment is provided in the entire area where the bottom surface 411 of the reflector 410 and the base plate 430 overlap each other. Figure 8 In the figure, for the sake of convenience, the adhesive 500 is shaded and the adhesive 500 is shown to be smaller than the overlapping area. The adhesive 500 of this embodiment is arranged to be linearly symmetrical with respect to the first axis 500a when viewed along the rotation axis RA direction. In addition, the adhesive 500 is arranged to be linearly symmetrical with respect to the second axis 500b when viewed along the rotation axis RA direction.

[0107] In the direction of the rotation axis RA, the adhesive 500 is provided between the bottom surface 411 of the reflector 410 and the base plate 430 with a uniform thickness. For example, the thickness of the adhesive 500 in the direction of the rotation axis RA is greater than or equal to 0.05 mm and less than or equal to 0.15 mm. For example, the bonding area of ​​the adhesive 500 to the bottom surface 411 of the reflector 410 and the base plate 430 is 184 mm. 2 Above and 196mm 2 For example, the adhesive force between the adhesive 500 and the bottom surface 411 of the reflector 410 and the base plate 430 is 27 MPa or more and 31 MPa or less. In addition, the thickness, the bonding area, and the bonding force may be out of the above-mentioned ranges.

[0108] The main surface of the base plate 430 is rectangular in shape as in the comparative example, but may be a polygon with an even number of vertices, an ellipse, or a circle. Examples of the polygon include a quadrilateral, a hexagon, and an octagon.

[0109] The driving unit 450 of this embodiment rotates the reflector 410 at high speed about the rotation axis RA via the rotating table 440 and the base plate 430. During the high-speed fine rotation, in the XY plane, for example, the reflector 410 rotates within an angle range of more than 0.3 mrad and less than 0.9 mrad. Preferably, the reflector 410 rotates at an angle of 0.6 mrad. In addition, the driving unit 450 rotates the rotating table 440 about the rotation axis RA so that the incident angle of the light incident on the grating 66 is periodically switched to any one of a first incident angle and a second incident angle different from the first incident angle. The first incident angle is when the wavelength of the laser becomes the target long wavelength λ L t angle, the second incident angle is the wavelength of the laser becomes the target short wavelength λ S The angle of t.

[0110] 3.2 Manufacturing method of narrowband module

[0111] Next, a method for manufacturing the narrowband module 60 of the present embodiment will be described. Hereinafter, the method for manufacturing the narrowband module 60 may be simply referred to as a manufacturing method. Fig.10 1 is a flowchart showing an assembly process in the manufacturing method of the present embodiment. In the assembly process of the present embodiment, the reflector 410, the adhesive 500, the base plate 430, and the rotating table 440 are assembled in such a manner that the center of gravity 410G of the reflector 410, the center of gravity 500G of the adhesive 500, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440 are located on the rotating axis RA. The assembly process includes a placement process SP11, a reflector fixing process SP12, and a base plate fixing process SP13.

[0112] (Configuration process SP11)

[0113] This step is a step of arranging the reflecting mirror 410 and the base plate 430 so that the bottom surface 411 of the reflecting mirror 410 and the base plate 430 are separated from each other.

[0114] Fig.11 is a front view of the reflector 410 in this process, Fig.12 is a side view of the reflector 410 in this process. Fig.11 and Fig.12 , the reflecting mirror 410 and the base plate 430 are shown in a state where the reflecting mirror 410 and the base plate 430 are positioned by the jigs 600 and 630, respectively, before the adhesive 500 is applied to the reflecting mirror 410 and the base plate 430. The jig 600 is a jig different from the jig 630.

[0115] The shape of the fixture 600 is a flat plate, and the main surface of the fixture 600 is located in the XZ plane. Three support platforms 601 are provided on the main surface to be separated from each other. The support platform 601 is integral with the fixture 600, and the reflection surface 412 of the reflector 410 is in contact with each support platform 601, and each support platform 601 supports the reflector 410. At this time, the reflection surface 412 and the back surface 413 are located in the XZ plane, and the bottom surface 411 is located in the XY plane. One of the three support platforms 601 is provided at a position overlapping with the rotation axis RA, and is provided at a position closer to the bottom surface 411 than the remaining two support platforms 601. The remaining two support platforms 601 are provided at positions that are line-symmetrical with respect to the rotation axis RA.

[0116] In addition, three positioning pins 603 and two support bases 607 that respectively support two plungers 605 are provided on the main surface of the jig 600. The positioning pins 603 are integrated with the jig 600, and the support bases 607 are fixed to the jig 600 by fixing bolts (not shown).

[0117] The two positioning pins 603 are arranged in parallel in the X direction at positions that are line symmetrical with respect to the rotation axis RA and face the bottom surface 411. The remaining positioning pin 603 faces the side surface 414 that contacts the bottom surface 411, the reflection surface 412, and the back surface 413.

[0118] The plunger 605 on one side is arranged on the rotation axis RA, abuts against the side surface 415 opposite to the bottom surface 411, and applies force to the reflector 410 toward the two positioning pins 603 arranged side by side in the X direction. As a result, the bottom surface 411 of the reflector 410 is pressed by the two positioning pins 603. In addition, the plunger 605 on the other side is provided on the side opposite to the remaining one positioning pin 603 across the reflector 410, abuts against the side surface 416 opposite to the side surface 414, and applies force to the reflector 410 toward the remaining one positioning pin 603. As a result, the side surface 414 is pressed by the remaining one positioning pin 603. Moreover, the reflector 410 is positioned by the positioning pins 603 and the plunger 605.

[0119] The base plate 430 includes three injection ports 431 of the same inner diameter for injecting the adhesive 500 into the gap S1 described later. The injection ports 431 are arranged at equal intervals in the X direction perpendicular to the rotation axis RA along the Z direction. One injection port 431 is located on the rotation axis RA as described later. The remaining two injection ports 431 are arranged at positions that are line-symmetrical with respect to one injection port 431, that is, the rotation axis RA, when viewed in a direction perpendicular to the reflection surface 412.

[0120] The YZ cross-sectional shape of the jig 630 is an L-shape, and the jig 630 includes: a flat plate portion 630a, which is erected in the Y direction relative to the jig 600; and a flat plate portion 630b, which is connected to the flat plate portion 630a on the side opposite to the reflector 410 than the flat plate portion 630a, and is arranged on the main surface of the jig 600. In the flat plate portion 630a of the jig 630, the base plate 430 is positioned on the jig 630 by inserting the positioning pin 701 into the base plate 430 and the jig 630, and the base plate 430 is fixed to the jig 630 by the fixing bolt 703, so that the jig 630 supports the base plate 430. The jig 630 supporting the base plate 430 is fixed to the jig 600 at the flat plate portion 630b by the fixing bolt 705 in such a manner that the base plate 430 faces the bottom surface 411 and the injection port 431 in the middle of the three is located on the rotation axis RA. By being fixed, the center of gravity 430G of the base plate 430 is located on the rotation axis RA.

[0121] A pair of protrusions 631 are provided on the flat plate portion 630a of the jig 630, and the protrusions 631 are located outside the base plate 430 supported by the jig 630. As described above, when the jig 630 supporting the base plate 430 is fixed to the jig 600, the protrusions 631 abut against the region of the bottom surface 411 that does not overlap with the base plate 430. When the protrusions 631 abut against the bottom surface 411, the protrusions 631 protrude from the jig 630 to provide a gap S1 between the bottom surface 411 and the base plate 430 in the Z direction. That is, the reflector 410 and the base plate 430 do not contact each other. As described later, the adhesive 500 is injected into the gap S1 from the injection port 431. Thus, this process is a process in which, in a state where the reflector 410 is positioned on the jig 600 and the base plate 430 is supported on the jig 630, the bottom surface 411 of the reflector 410 is separated from the base plate 430 by the protrusion 631, a gap S1 is provided, and the reflector 410 and the base plate 430 are arranged. When the reflector 410 and the base plate 430 are arranged, this process is completed, and the manufacturing method enters the reflector fixing process SP12.

[0122] (Mirror fixing process SP12)

[0123] This step is a step of fixing the reflecting mirror 410 to the base plate 430 using the adhesive 500 so that the center of gravity 410G of the reflecting mirror 410 , the center of gravity 500G of the adhesive 500 , and the center of gravity 430G of the base plate 430 are located on the rotation axis RA. Fig.134 is a diagram showing a state in which an injector 800 of the adhesive 500 is inserted into the injection port 431, and the adhesive 500 is applied to the bottom surface 411 of the reflector 410 and the base plate 430. A cutout 633 is provided in the area of ​​the jig 630 overlapping the injection port 431, and the injector 800 is directly inserted into the injection port 431 through the cutout 633. The adhesive 500 is injected from the injector 800 into the gap S1 through the injection port 431. In this way, the adhesive 500 is injected from the back side of the base plate 430 opposite to the reflector 410. In this embodiment, one injector 800 is sequentially inserted into the three injection ports 431, and the adhesive 500 is sequentially injected from each injection port 431. The injection amount of the adhesive 500 can also be adjusted by the operator while visually confirming the application range of the adhesive 500 so that the center of gravity 500G of the cured adhesive 500 is located on the rotation axis RA. By this method, it is possible to arrange the adhesive 500 whose center of gravity 500G is located on the rotation axis RA in the gap S1. The reflector 410 is fixed to the base plate 430 by bonding the adhesive 500 to the bottom surface 411 and the base plate 430 and curing. In addition, three injectors 800 may be respectively inserted into three injection ports 431, and the same amount of adhesive 500 may be injected from each injection port 431 at the same time. In addition, the adhesive 500 may sometimes remain in each injection port 431. In this case, the amount of adhesive 500 remaining in each injection port 431 may be adjusted so that the center of gravity 430G of the base plate 430 does not deviate from the rotation axis RA. For example, the amount of adhesive 500 remaining in each injection port 431 may be equal.

[0124] Thus, in this process, the reflector 410 is fixed to the base plate 430 by the adhesive 500 in a state where the reflector 410 is positioned on the jig 600 and the base plate 430 is supported by the jig 630. Specifically, this process is a process of injecting the adhesive 500 from the injection port 431 into the gap S1 and fixing the reflector 410 to the base plate 430 by the injected adhesive 500. Thus, the center of gravity 410G of the reflector 410, the center of gravity 500G of the adhesive 500, and the center of gravity 430G of the base plate 430 are located on the rotation axis RA.

[0125] When the reflector 410 is fixed to the base plate 430, the force applied to the reflector 410 by the plunger 605 is released, and the fixing bolt 705 fixing the jig 630 to the jig 600 is removed. In addition, the positioning pin 701 for positioning the base plate 430 to the jig 630 and the fixing bolt 703 for fixing the base plate 430 to the jig 630 are removed. Then, the base plate 430 to which the reflector 410 is fixed is removed from the jig 600 and the jig 630. Then, this step is completed, and the manufacturing method enters the base plate fixing step SP13.

[0126] (Base plate fixing process SP13)

[0127] This step is a step of fixing the base plate 430 to which the reflector 410 is fixed by the adhesive 500 in the reflector fixing step SP12 by using the fixing bolts so that the center of gravity 440G of the reflector 410 is located on the rotation axis RA. The fixing bolts are engaged with the holes in the base plate 430 from which the fixing bolts 703 have been removed. In this way, the center of gravity 410G of the reflector 410, the center of gravity 500G of the adhesive 500, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440 are located on the rotation axis RA. Thus, this step is completed and the manufacturing method is completed.

[0128] 3.3 Action and Effect

[0129] In the narrowband module 60 of the present embodiment, when the driving unit 450 causes the rotating table 440 to rotate around the rotation axis RA, the rotating table 440 causes the base plate 430 to rotate around the rotation axis RA. As a result, the reflector 410 fixed to the base plate 430 by the adhesive 500 also rotates around the rotation axis RA. By the rotation of the reflector 410, the direction of the light from the reflecting surface 412 of the reflector 410 changes, and the incident angle of the light incident on the grating 66 is adjusted. By adjusting the incident angle, the wavelength of the light reflected by the grating 66 is adjusted. However, in the narrowband module 60 of the present embodiment, the center of gravity 410G of the reflector 410, the center of gravity 500G of the adhesive 500, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440 are located on the rotation axis RA. According to this structure, compared with the case where any of the centers of gravity 410G, 500G, 430G, and 440G are not located on the rotation axis RA, even if the reflector 410 is slightly rotated at high speed, it is possible to suppress unnecessary vibration of the reflector 410. Thus, it is possible to suppress the incident angle of light incident on the grating 66 from changing from the incident angle assumed in advance, and it is possible to suppress the wavelength of light reflected by the grating 66 from changing from the wavelength assumed in advance. Therefore, in the narrowband module 60 of this embodiment, the wavelength of light can be adjusted with high precision.

[0130] Furthermore, when the centers of gravity 410G, 500G, 430G, and 440G are located on the rotation axis RA, it is possible to suppress the separation of the reflector 410 from the base plate 430 and the unintentional tilting of the reflector 410 relative to the base plate 430 when the reflector 410 is finely rotated at high speed. Thus, it is possible to suppress the incident angle of light incident on the grating 66 from changing from a pre-conceived incident angle, and it is possible to suppress the wavelength of light reflected by the grating 66 from changing from a pre-conceived wavelength.

[0131] Furthermore, if the generation of unnecessary vibration in the reflector 410 is suppressed as described above, the vibration can be suppressed from propagating to the prism 61, prism 62, prism 63, and grating 66 through the housing 68, and the shaking of the prism 61, prism 62, prism 63, and grating 66 can be suppressed. As a result, the incident angle of the light incident on the grating 66 can be further suppressed from changing from the pre-conceived incident angle, and the wavelength of the light reflected by the grating 66 can be suppressed from changing from the pre-conceived wavelength.

[0132] In addition, in the narrowband module 60 of the present embodiment, the adhesive 500 is provided with a uniform thickness between the bottom surface 411 of the reflector 410 and the base plate 430 in the direction of the rotation axis RA. According to this structure, it is possible to suppress the center of gravity 500G of the adhesive 500 from deviating from the rotation axis RA compared to the case where the adhesive 500 is provided with a non-uniform thickness between the bottom surface 411 and the base plate 430. In addition, as long as the center of gravity 500G of the adhesive 500 is located on the rotation axis RA, the adhesive 500 does not need to be provided with a uniform thickness between the bottom surface 411 of the reflector 410 and the base plate 430 in the direction of the rotation axis RA.

[0133] In the narrowband module 60 of this embodiment, the driving unit 450 rotates the rotating stage 440 about the rotation axis RA so that the incident angle of light on the grating 66 is periodically switched to either a first incident angle or a second incident angle different from the first incident angle.

[0134] In this structure, the wavelength of the light reflected by the grating 66 is periodically switched to two wavelengths, and dual-wavelength oscillation is performed. Through this dual-wavelength oscillation, the workpiece irradiated with laser light can be irradiated with two lasers having different focal depths. Compared with the case of single-wavelength oscillation in which the focal depth remains unchanged, the focal depths of the two lasers are offset relative to the shallow part and the deep part of the workpiece. By irradiating the two laser beams to the same part of the workpiece, for example, a thin and deep uniform hole can be machined on the workpiece compared with the case of single-wavelength oscillation. In addition, the drive unit 450 may not rotate the rotating table 440 around the rotation axis RA as the axis, so that the incident angle of the light is periodically switched to any one of the first incident angle and the second incident angle.

[0135] The adhesive 500 of the present embodiment is arranged to be linearly symmetrical with respect to the first axis 500a and the second axis 500b respectively when viewed along the direction of the rotation axis RA. However, if the center of gravity 500G of the adhesive 500 is located on the rotation axis RA, the adhesive 500 may also be arranged not to be linearly symmetrical with respect to the first axis 500a and the second axis 500b respectively. In addition, the reflecting surface 412 may also be inclined relative to the bottom surface 411, and the rotation axis RA may also be inclined relative to the reflecting surface 412. In the base plate 430 of the present embodiment, the injection port 431 may not be arranged on the rotation axis RA. In the base plate 430 of the present embodiment, three injection ports 431 are arranged, but the number of the injection ports 431 is not particularly limited. In the case where an even number of injection ports 431 are arranged, each injection port 431 is preferably arranged at a position linearly symmetrical with respect to the rotation axis RA when viewed in a direction perpendicular to the reflecting surface 412. When an odd number of injection ports 431 are provided, one injection port 431 may be provided on the rotation axis RA, and the remaining injection ports 431 may be provided at positions that are line-symmetrical with respect to the rotation axis RA when viewed in a direction perpendicular to the reflection surface 412 .

[0136] 4. Description of the narrowband module of the second embodiment

[0137] Next, the narrowband module 60 according to Embodiment 2 will be described. The same reference numerals are given to the same configurations as those described above, and the duplicate description will be omitted unless otherwise specified.

[0138] 4.1 Structure

[0139] Fig.14 : is a side view of the reflector unit 400 of the present embodiment. In the reflector unit 400 of the present embodiment, the shape of the reflector 410 is different from the shape of the reflector 410 of the first embodiment, and the position of the adhesive 500 is different from the position of the adhesive 500 of the first embodiment. In addition, in the reflector unit 400 of the present embodiment, the center of gravity 500G of the adhesive 500 is also located on the rotation axis RA together with the center of gravity 410G of the reflector 410, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440.

[0140] The reflector 410 of this embodiment is in the shape of a right triangular prism. The YZ cross-sectional shape of the reflector 410 is a right triangle, the angle formed by the bottom surface 411 and the reflecting surface 412 is a right angle, and the back surface 413 is inclined relative to the bottom surface 411 .

[0141] The adhesive 500 of this embodiment does not extend from the bottom surface 411 in such a manner that the center of gravity 500G of the adhesive 500 is located on the rotation axis RA, and is disposed at a position closer to the rotation axis RA side than the pair of outer edges of the bottom surface 411 along the X direction when viewed from the X direction. That is, the adhesive 500 does not overlap with the pair of outer edges of the bottom surface 411 along the X direction when viewed in the direction of the rotation axis RA, but is disposed at a position closer to the second axis 500b than the outer edges. In addition, when viewed from the X direction, the adhesive 500 is disposed to be line-symmetrical with respect to the rotation axis RA. In addition, similarly to the first embodiment, the adhesive 500 is disposed to be line-symmetrical with respect to the first axis 500a and the second axis 500b, respectively, when viewed in the direction of the rotation axis RA.

[0142] 4.2 Action and Effect

[0143] In the narrowband module 60 of the present embodiment, the reflector 410 is in the shape of a right-angled triangular prism. According to this structure, the reflector 410 can be made lighter than a rectangular parallelepiped reflector 410 having the same shape and size as the right-angled triangular prism reflector 410 in the shape of a bottom surface 411 and a reflective surface 412. As a result, the reflector 410 can be easily rotated at high speed.

[0144] In addition, in a modified example of the narrowband module 60 of this embodiment, as shown in FIG. Fig.15 As shown, the adhesive 500 may be arranged in such a manner that the center of gravity 500G of the adhesive 500 is located on the rotation axis RA, a portion of the adhesive 500 extends from the bottom surface 411 without overlapping with the bottom surface 411, and the remaining portion does not extend from the bottom surface 411 but overlaps with the bottom surface 411. In this case, the portion is arranged on the side opposite to the rotation axis RA with the outer edge of one of the pair of outer edges of the bottom surface 411 along the X direction on the side of the reflection surface 412 as a reference when viewed along the X direction. In addition, the remaining portion is arranged at a position closer to the rotation axis RA side than the outer edge of the other of the pair of outer edges of the bottom surface 411 along the X direction on the side of the back surface 413 when viewed along the X direction. In the reflector fixing step SP12, a guide is provided on the jig 630, and the above-mentioned portion of the adhesive 500 flows through the guide in a manner of overflowing from the bottom surface 411.

[0145] In other variations of the narrowband module 60 of the present embodiment, the shape of the reflector 410 may also be a right-angled trapezoidal column. The YZ cross-sectional shape of the reflector 410 is a right-angled trapezoid, the angle formed by the bottom surface 411 and the reflecting surface 412 and the angle formed by the side surface 415 opposite to the bottom surface 411 and the reflecting surface 412 are right angles, and the back surface 413 is inclined relative to the bottom surface 411 and the side surface 415.

[0146] 5. Description of the narrowband module of implementation mode 3

[0147] Next, the narrowband module 60 according to Embodiment 3 will be described. Note that the same reference numerals are used for the same configurations as those described above, and the duplicate description will be omitted unless otherwise specified.

[0148] 5.1 Structure

[0149] Fig.16 is a front view of the reflector unit 400 of this embodiment. Fig.17 is a top view of the reflector unit 400 of this embodiment. Fig.18 4 is a side view of the reflector unit 400 of this embodiment. In the reflector unit 400 of this embodiment, the base plate 430 is different from the base plate 430 of the first embodiment, and the reflector 410 is further fixed to the base plate 430 by an adhesive 500 on the back surface 413, which is different from the first embodiment. Fig.17 , the adhesive 500 is shaded, and for easy observation, the adhesive 500 is shown to be smaller than the area where the adhesive 500 is applied. In addition, the adhesive 500 of this embodiment is different from that of Embodiment 1 in that it is arranged to be not linearly symmetrical with respect to the second axis 500b when observed along the direction of the rotation axis RA. In addition, in the reflector unit 400 of this embodiment, the center of gravity 500G of the adhesive 500 is also located on the rotation axis RA together with the center of gravity 410G of the reflector 410, the center of gravity 430G of the base plate 430, and the center of gravity 440G of the rotating table 440.

[0150] The base plate 430 of the present embodiment further includes a pair of protrusions 433 protruding from the surface of the base plate 430 bonded to the bottom surface 411 of the reflector 410 in the direction of the rotation axis RA. The pair of protrusions 433 are arranged to be line-symmetrical with respect to the first axis 500a in the X direction along the reflection surface 412 and perpendicular to the rotation axis RA. The protrusions 433 are located at a position lower than the side surface 415 of the reflector 410 opposite to the bottom surface 411 in the Z direction, and are located inside the reflector 410 in the X direction. For example, the shape of the protrusions 433 is a rectangular parallelepiped.

[0151] The projections 433 are provided with contact surfaces 433a that are opposite to the back surface 413 of the reflector 410 and are smaller than the back surface 413. The back surface 413 is further fixed to each contact surface 433a by an adhesive 500. The adhesive 500 is the same amount in each contact surface 433a. As the adhesive 500 of the back surface 413, the same epoxy resin as the adhesive 500 of the bottom surface 411 can be cited. In addition, the adhesive 500 of the back surface 413 is integrated with the adhesive 500 of the bottom surface 411.

[0152] In the base plate 430 of the present embodiment, even if a pair of protrusions 433 are provided, the center of gravity 430G of the base plate 430 is located on the rotation axis RA. Therefore, the base plate 430 of the present embodiment includes a protrusion 435 that protrudes toward the reflection surface 412 side in a direction farther from the rotation axis RA than the bottom surface 411. In the XY plane, the closer to the first axis 500a, the more the protrusion 435 protrudes relative to the bottom surface 411. Therefore, when viewed along the rotation axis RA direction, the point of the protrusion 435 that is farthest from the bottom surface 411 of the reflector 410 overlaps with the first axis 500a.

[0153] In addition, in the adhesive 500 on the bottom surface 411 of the present embodiment, even if the adhesive 500 is provided on the back surface 413, the adhesive 500 on the bottom surface 411 is located on the rotation axis RA. Therefore, the adhesive 500 on the bottom surface 411 of the present embodiment extends from the bottom surface 411 of the reflector 410 in the base plate 430 in the Y direction and is provided to the protrusion 435.

[0154] 5.2 Manufacturing Method of Narrowband Module

[0155] Next, a method for manufacturing the narrowband module 60 according to the present embodiment will be described. Fig.19 : is a diagram for explaining the arrangement process SP11 of the present embodiment. The arrangement process SP11 of the present embodiment is different from the embodiment 1 in that when the protrusion 631 of the fixture 630 abuts against the bottom surface 411, a gap S2 is further provided between the back surface 413 and the abutting surface 433a in the Y direction. That is, the reflector 410 and the protrusion 433 do not contact each other. This process is also a process as follows: when the reflector 410 is positioned on the fixture 600 and the base plate 430 is supported on the fixture 630, the back surface 413 of the reflector 410 is separated from the abutting surface 433a by using the protrusion 631 of the fixture 630, and the gap S2 is provided. As described later, an adhesive 500 is provided in the gap S2.

[0156] The difference between the reflector fixing step SP12 of the present embodiment and the first embodiment is that, in the first embodiment, the adhesive 500 is injected into the gap S1 from the back side of the base plate 430 opposite to the reflector 410, but in the present embodiment, the adhesive 500 is injected into the gap S1 from the back side of the base plate 430 opposite to the reflector 410. Fig.19 As indicated by the middle arrow, the liquid is also injected into the gap S2 from the back side of the protrusion 433 on the opposite side to the reflector 410 .

[0157] Each protrusion 433 includes an injection port 433b for injecting the adhesive 500 into the gap S2. The injection port 433b is along the Y direction. Fig.19The adhesive 500 is injected from the injector through the injection port 433b into the gap S2. That is, the adhesive 500 is injected into the gap S2 from the back side of the protrusion 433 on the side opposite to the reflector 410 as shown by the arrow. The operator adjusts the injection amount of the adhesive 500 while visually observing the coating range of the adhesive 500. The reflector 410 is further fixed to the base plate 430 by the adhesive 500 being bonded to the back side 413 and the abutting surface 433a and solidified. In this way, this process is also a process of injecting the adhesive 500 from the injection port 431 into the gap S2 between the back side 413 and the abutting surface 433a, and further fixing the reflector 410 to the base plate 430 using the injected adhesive 500.

[0158] 5.3 Action and Effect

[0159] In the narrowband module 60 of the present embodiment, the back surface 413 is fixed to each contact surface 433a by an adhesive 500. According to this structure, it is possible to suppress the reflector 410 from being accidentally tilted relative to the surface of the base plate 430 that is bonded to the bottom surface 411 of the reflector 410, and it is possible to suppress the reflector 410 from being deviated from the axis about the rotation axis RA relative to the base plate 430. As a result, it is possible to suppress the incident angle of the light incident on the grating 66 from changing from the incident angle assumed in advance, and it is possible to suppress the wavelength of the light reflected by the grating 66 from changing from the wavelength assumed in advance.

[0160] In the narrowing module 60 of this embodiment, the shape of the protrusion 433 is not particularly limited as long as the abutment surface 433a is provided. The shape of the protrusion 435 is not particularly limited as long as the center of gravity 430G of the base plate 430 is located on the rotation axis RA.

[0161] The adhesive 500 on the back surface 413 may be different from the adhesive 500 on the bottom surface 411. In addition, the adhesive 500 on the back surface 413 may not be integrated with the adhesive 500 on the bottom surface 411.

[0162] The above description is not limiting but merely illustrative. Therefore, it is obvious to those skilled in the art that changes can be made to the embodiments of the present disclosure without departing from the scope of the claims. In addition, it is also obvious to those skilled in the art that the embodiments of the present disclosure can be used in combination.

[0163] Unless expressly stated otherwise, the terms used in this specification and claims should be interpreted as "non-restrictive" terms. For example, the terms "include" or "comprise" should be interpreted as "not limited to what is described as comprising". The term "have" should be interpreted as "not limited to what is described as having". In addition, the indefinite article "one" should be interpreted as meaning "at least one" or "one or more". In addition, the term "at least one of A, B and C" should be interpreted as "A", "B", "C", "A+B", "A+C", "B+C" or "A+B+C". Furthermore, it should be interpreted to also include combinations of them with parts other than "A", "B", and "C".

Claims

1. A narrowband module, comprising: a reflector comprising a bottom surface and a light reflecting surface; a grating for performing wavelength dispersion on the light reflected by the reflection surface; a base plate, to which the bottom surface of the reflector is fixed by an adhesive; A rotating table, which is provided with the base plate, so that the base plate rotates around a rotation axis, so that the reflector rotates around the rotation axis, and the rotation axis is perpendicular to the plane where the light is subjected to wavelength dispersion; and a driving unit that causes the rotating table to rotate about the rotating axis, The center of gravity of the reflecting mirror, the center of gravity of the adhesive, the center of gravity of the base plate, and the center of gravity of the rotating table are located on the rotating shaft.

2. The narrowband module according to claim 1, wherein: The rotation axis is parallel to the in-plane direction of the reflecting surface, The adhesive is provided so as to be line-symmetrical with respect to a first axis that is orthogonal to the rotation axis and perpendicular to the reflection surface of the reflection mirror when viewed along the rotation axis direction.

3. The narrowband module according to claim 1, wherein: The rotation axis is parallel to the in-plane direction of the reflecting surface, The adhesive is provided so as to be line-symmetrical with respect to a second axis that is orthogonal to the rotation axis and parallel to the reflection surface of the reflection mirror when viewed along the rotation axis direction.

4. The narrowband module according to claim 1, wherein: The adhesive is provided with a uniform thickness between the bottom surface of the reflector and the base plate in the direction of the rotation axis.

5. The narrowband module according to claim 1, wherein: The thickness of the adhesive in the direction of the rotation axis is not less than 0.05 mm and not more than 0.15 mm, The bonding area between the adhesive and the bottom surface of the reflector and the base plate is 184 mm 2 Above and 196mm 2 the following, The adhesive force between the adhesive and the bottom surface of the reflector and the base plate is 27 MPa or more and 31 MPa or less.

6. The narrowband module according to claim 1, wherein: The driving unit rotates the rotating stage about the rotation axis so that the incident angle of the light on the grating is periodically switched to one of a first incident angle and a second incident angle different from the first incident angle.

7. The narrowband module according to claim 1, wherein: The reflector is in the shape of a cuboid.

8. The narrowband module according to claim 1, wherein: The reflector is in the shape of a right-angled triangular prism.

9. The narrowband module according to claim 1, wherein: The rotation axis is parallel to the in-plane direction of the reflecting surface, The reflector includes a back surface opposite to the reflective surface, The base plate further includes a pair of protrusions protruding toward the rotation axis. The pair of protrusions are arranged to be line-symmetrical with respect to a first axis that is orthogonal to the rotation axis and perpendicular to the reflection surface of the reflection mirror when viewed along the rotation axis direction. Each of the protrusions is provided with an abutment surface opposite to the back surface, The back surface is fixed to each of the abutting surfaces by the adhesive.

10. A method for manufacturing a narrowband module, wherein: The narrowband module has: a reflector comprising a bottom surface and a light reflecting surface; a grating for performing wavelength dispersion on the light reflected by the reflection surface; a base plate, to which the bottom surface of the reflector is fixed by an adhesive; A rotating table, which is provided with the base plate, so that the base plate rotates around the axis of rotation, so that the reflector rotates around the axis of rotation, and the axis of rotation is perpendicular to the plane of wavelength dispersion of the light; as well as a driving unit that causes the rotating table to rotate about the rotating axis, The manufacturing method of the narrowband module includes an assembly step, in which the reflector, the adhesive, the base plate and the turntable are assembled in such a way that the center of gravity of the reflector, the center of gravity of the adhesive, the center of gravity of the base plate and the center of gravity of the turntable are located on the rotation axis.

11. The method for manufacturing a narrowband module according to claim 10, wherein: The base plate includes an injection port, The assembly process includes: an arrangement step of respectively arranging the reflecting mirror and the base plate in such a manner that the bottom surface of the reflecting mirror and the base plate are separated from each other; and The reflecting mirror fixing step includes injecting the adhesive from the injection port into the gap between the bottom surface and the base plate, and fixing the reflecting mirror to the base plate using the injected adhesive.

12. The method for manufacturing a narrowband module according to claim 11, wherein: The injection port is arranged on the rotating shaft.

13. The method for manufacturing a narrowband module according to claim 12, wherein: The injection port is further arranged at a position which is line-symmetrical with respect to the rotation axis when viewed in a direction perpendicular to the reflection surface.

14. The method for manufacturing a narrowband module according to claim 11, wherein: The rotation axis is parallel to the in-plane direction of the reflecting surface, The reflector also includes a back surface opposite to the reflective surface, The base plate further includes a pair of protrusions protruding toward the rotation axis. The pair of protrusions are arranged to be line-symmetrical with respect to a first axis that is orthogonal to the rotation axis and perpendicular to the reflection surface of the reflection mirror when viewed along the rotation axis direction. Each of the protrusions is provided with a contact surface opposite to the back surface and an injection port communicating with the contact surface. In the arrangement step, the back surface of the reflector is separated from the contact surface of the protrusion. In the reflecting mirror fixing step, the adhesive is injected into the gap between the back surface and the abutting surface from the injection port of each of the protrusions, and the reflecting mirror is further fixed to the base plate by the injected adhesive.

15. A method for manufacturing an electronic device, comprising the following steps: Using a gas laser device to generate laser light, outputting the laser to an exposure device, exposing the laser light onto a photosensitive substrate in the exposure device to manufacture an electronic device, The gas laser device has a narrowband module, and the narrowband module has: a reflector comprising a bottom surface and a light reflecting surface; a grating for performing wavelength dispersion on the light reflected by the reflection surface; a base plate, to which the bottom surface of the reflector is fixed by an adhesive; A rotating table, which is provided with the base plate, so that the base plate rotates around the axis of rotation, so that the reflector rotates around the axis of rotation, and the axis of rotation is perpendicular to the plane of wavelength dispersion of the light; as well as a driving unit that causes the rotating table to rotate about the rotating axis, The center of gravity of the reflecting mirror, the center of gravity of the adhesive, the center of gravity of the base plate, and the center of gravity of the rotating table are located on the rotating shaft.

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