A high-stability shock-absorbing base for supporting a monochromator and a test method thereof

Abstract

The application provides a damping base for an optical device and a testing method thereof, relates to a damping base for an optical device and a testing method of damping effect of the damping base, and aims at solving the problems of poor structure bearing capacity, poor stability and influence on operation and use of a device of a support base for supporting a monochromator. The application comprises a platform assembly, a support assembly, a connecting assembly and an adjusting assembly; the damping base is provided with a double-layer platform composed of a first platform and a second platform, leveling supports arranged between the first platform and the second platform, and damping pads, damping shims, lifting rings and other components. The damping base has the advantages of high stability and good damping effect. The testing method of the high-stability damping base for supporting a monochromator provided by the application comprises the following steps in sequence: assembling the damping base, adjusting the levelness of the upper surface of the second platform and testing the damping effect. The method has the advantage of simple operation.

Description

Technical Field

[0001] The present invention relates to a shock-absorbing base for optical devices and a test method for the shock-absorbing effect thereof, and in particular to a high-stability shock-absorbing base for supporting a monochromator and a test method for the shock-absorbing effect thereof. Background Art

[0002] Synchrotron radiation refers to the electromagnetic radiation emitted by relativistic charged particles traveling along curved paths under the influence of electromagnetic fields. Synchrotron radiation possesses excellent properties and is widely used in fundamental research across various disciplines. Its key attributes include broad spectrum, high brightness, high collimation, pulsed nature, polarization, and high purity. These characteristics have played a significant role in the development of science and technology in the 20th century. Currently, third-generation synchrotron radiation facilities are widely used in various scientific research fields, including physics, chemistry, biology, medicine, materials science, and archaeology.

[0003] Beam stability is an important indicator for evaluating the performance of synchrotron radiation. There are many factors that affect the stability of synchrotron radiation. When the beam is stored in the storage ring, the biggest influence comes from the noise in the beam track. When transmitted outside the ring, especially in the double-crystal monochromator, mechanical vibration and vibration sources in the surrounding environment will seriously affect the stability of the beam. Any optical element directly related to the beam transmission in the double-crystal monochromator, if there is a slight offset or vibration, will cause the final focused light spot to be unstable and have poor focusing ability, affecting subsequent experiments and use.

[0004] Currently, the existing support base for supporting the monochromator is shown in Figure 1 The platform assembly 01 is comprised of a base plate 021, a support 024 mounted on the base plate 021, a platform assembly 01 mounted on the support 024, and a fixing assembly 04 mounted on the base plate 021 and connected to the platform assembly 01. The base plate 021 and support 024 are required because the bottom surface of the platform assembly 01 is not completely smooth and does not conform to the ground. This has the disadvantages of poor shock absorption, inconvenient installation, and complex operation, which can affect the handling and use of the load. Summary of the Invention

[0005] The purpose of the present invention is to solve the shortcomings of the existing support base for supporting monochromators, such as poor shock absorption effect, inconvenient installation, complicated operation, and impact on the operation and use of the supported objects, and to provide a high-stability shock absorption base for supporting monochromators and a testing method thereof.

[0006] The design idea of ​​the present invention is to provide a double-layer platform consisting of a first platform and a second platform, and to arrange a leveling support between the first platform and the second platform to ensure that the device has a good shock absorption effect.

[0007] To achieve the above objectives, the technical solutions provided by the present invention are:

[0008] A high-stability vibration-damping base for supporting a monochromator, which has the following special features:

[0009] The utility model comprises a platform assembly, a support assembly, a connection assembly and twelve adjustment assemblies; the platform assembly comprises a first platform and a second platform of a rectangular parallelepiped; the support assembly comprises a base plate, four shock-absorbing pads, two connection pads and four leveling supports; the four shock-absorbing pads are arranged between the upper surface of the base plate and the four corner positions of the lower surface of the first platform; the fixed ends of the twelve adjustment assemblies are respectively fixed to the upper surface of the base plate; the twelve adjustment assemblies are divided into four symmetrical groups of two, each group has three adjustment assemblies, two of which are respectively arranged at the side corner positions of the upper surface of the base plate near the first platform, and the other fixed end is arranged at the middle position of the side of the upper surface of the base plate near the first platform, and is equidistant from the other two; and ten The adjusting ends of the two adjusting components are respectively in contact with the side surfaces of the first platform; the two connecting pads are arranged in parallel on the upper surface of the first platform, and are respectively close to the long sides of the upper surface and parallel to the long sides of the upper surface; the four leveling supports are divided into two groups, and two in each group are respectively arranged at the two end positions on the upper surface of one of the connecting pads; the second platform is arranged on the upper surface of the four leveling supports, and the two long sides of its lower surface are parallel to the long sides of the upper surface, and are respectively close to the two groups of leveling supports. The upper surface of the second platform is used to support the monochromator; the connecting component is used to connect the base plate and the adjusting component, the base plate and the shock-absorbing pad and the first platform, the first platform and the connecting pad, and the connecting pad and the leveling support and the second platform.

[0010] Furthermore, the leveling support includes a lower module, an upper module and a wedge block located between the lower module and the upper module; the lower surface of the lower module and the upper surface of the upper module are plane and arranged parallel to each other; the lower surface of the upper module and the upper surface of the lower module are respectively adapted to fit the upper surface and lower surface of the wedge block; the thin ends of the upper module and the lower module are arranged correspondingly to the thick end of the wedge block, and the thick end is arranged correspondingly to the thin end of the wedge block; the upper and lower surfaces of the wedge block are provided with slide grooves or slide rails, and the lower surface of the upper module and the upper surface of the lower module are correspondingly provided with slide rails or slide grooves; the middle part of the wedge block is provided with a long strip second through hole consistent with the extension direction of the slide groove or slide rail; the upper and lower modules are provided with There are corresponding mounting holes, in which a leveling column located between the upper module and the lower module and passing through the second through hole is installed. The upper module and the lower module can move up and down along the axial direction of the leveling column; a threaded hole is provided on the leveling column; a leveling bolt is passed through the first through hole on the wedge block, and the leveling bolt passes through the threaded hole on the leveling; a limiting ring is provided on the leveling bolt, and a limiting section is formed between the limiting ring and the tail end of the leveling bolt, and the limiting section is a light rod section, and the thick end of the wedge block is located in the limiting section; third through holes corresponding to each other are provided on the upper module and the lower module, and the third through hole also corresponds to the position of the second through hole, and the third through hole is used for the passage of the connecting component when the connecting plate is connected to the leveling support and the second platform.

[0011] Furthermore, a limiting boss is provided in the middle of the leveling column, and a threaded hole on the leveling column is provided through the limiting boss; the lower surface of the upper module and the upper surface of the lower module are provided with corresponding wedge-shaped grooves; the bottom surfaces of the wedge-shaped grooves are respectively parallel to the corresponding upper surface of the upper module and the lower surface of the lower module; the leveling column is located between the two wedge-shaped grooves, and the third through hole is provided corresponding to the wedge-shaped groove; a limiting pin is provided at the front end of the leveling bolt, and the limiting pin is located in the second through hole.

[0012] Furthermore, the adjustment assembly includes a right-angle holder, a caliper head, and a platform adjustment bolt; the right-angle holder constitutes the fixed end, and the caliper head and platform adjustment bolt constitute the adjustment end. The horizontal end of the right-angle holder is fixed to the upper surface of the base plate, the caliper head is mounted on the end of the platform adjustment bolt, and the platform adjustment bolt is threadedly connected to the vertical end of the right-angle holder. The adjustment assembly is used to clamp the first platform, thereby increasing the overall stability of the shock-absorbing base.

[0013] Furthermore, a shock-absorbing gasket is provided between each leveling support and the second platform to reduce wear between the upper surface of the leveling support and the lower surface of the second platform and to increase the contact area between the upper surface of the leveling support and the lower surface of the second platform.

[0014] Furthermore, two sets of square grooves are provided on two opposing side surfaces of the second platform. The connecting assembly includes a plurality of first fastening bolts for connecting and tightening the horizontal end of the right-angle fixture in the adjustment assembly to the base plate, a plurality of second fastening bolts for connecting and tightening the first platform to the shock-absorbing pad and base plate, a plurality of third fastening bolts for connecting the second platform to the leveling support and the connecting pad, and a plurality of fourth fastening bolts for connecting and tightening the connecting pad to the first platform. The third fastening bolts extend from bottom to top through the connecting pad, the leveling support, and the lower portion of the second platform, with their tail ends positioned within the square grooves. A nut is provided at the tail ends of the third fastening bolts to engage therewith. The connecting assembly is used to ensure the stability and safety of the overall structure of the shock-absorbing base.

[0015] Furthermore, the first platform and the second platform are made of marble, which has the characteristics of good rigidity, high hardness, strong wear resistance and long service life, and can effectively isolate the vibration transmitted from the external environment to the monochromator placed on the upper surface of the second platform; the shock-absorbing gasket is made of nylon, which has the advantages of high temperature resistance, wear resistance and high toughness, so that the leveling support and the second platform are in closer contact and less likely to slide relative to each other; the shock-absorbing pad is made of organic composite material, which can effectively weaken the vibration transmitted from the external environment to the first platform, and can make the first platform and the base plate tightly connected; the connecting pad is made of structural steel, which has the advantage of high strength.

[0016] Furthermore, two opposing side surfaces of the second platform are provided with lifting rings. The total number of the lifting rings is at least four, and they are symmetrically arranged with at least two on each side surface. The lifting rings are used to facilitate the lifting of the second platform, and providing at least four lifting rings can meet lifting requirements.

[0017] At the same time, the present invention also provides a method for testing the high-stability shock-absorbing base for supporting a monochromator, which is special in that it includes the following steps:

[0018] S1, assemble the high stability vibration-damping base for supporting the monochromator;

[0019] S2, making the upper surface of the second platform level by adjusting the leveling support;

[0020] S3, knock on the bottom plate, the side walls of the first platform and the second platform, and at the same time test the shock absorption effect of the upper surface of the second platform through an autocollimator or an interferometer; if the shock absorption effect meets the design requirements, the test is completed; if the shock absorption effect does not meet the test requirements, disassemble the high-stability shock absorption base used to support the monochromator, return to step S1 and reassemble until the shock absorption effect on the upper surface of the second platform meets the design requirements.

[0021] Furthermore, step S2 is specifically as follows:

[0022] By rotating the leveling bolt in the leveling support, the wedge block in the leveling support moves, thereby adjusting the level of the upper module in the leveling support so that the upper surface of the second platform located on the leveling support is level.

[0023] Compared with the prior art, the present invention has the following beneficial effects:

[0024] 1. The present invention provides a high-stability, shock-absorbing base for supporting a monochromator. The platform assembly comprises a double-layer platform consisting of a first platform and a second platform. Four leveling supports are disposed between the first and second platforms, and twelve adjustment components are disposed on the bottom plate. The components are tightly connected, and the shock-absorbing base has the advantages of good stability and strong load-bearing capacity.

[0025] 2. The leveling support in the high-stability shock-absorbing base for supporting the monochromator provided by the present invention can adjust the levelness of the upper surface of the second platform to ensure the stability of the monochromator placed on the upper surface of the second platform;

[0026] 3. The high-stability, shock-absorbing base for supporting a monochromator provided by the present invention has shock-absorbing pads disposed between the upper surface of its base plate and the four corners of the lower surface of the first platform, and shock-absorbing gaskets disposed between each leveling support and the second platform. This has the advantage of excellent shock absorption and can effectively avoid resonance induced by ground vibration.

[0027] 4. The high-stability shock-absorbing base for supporting a monochromator provided by the present invention is made of marble. Marble has the characteristics of good rigidity, high hardness, strong wear resistance and long service life, and can effectively isolate the vibration transmitted from the external environment to the monochromator placed on the upper surface of the second platform; the material of the shock-absorbing gasket is nylon. Nylon has the advantages of high temperature resistance, wear resistance and high toughness, so that the contact between the leveling support and the second platform is closer and less likely to slide relative to each other; the material of the shock-absorbing pad is an organic composite material, which can effectively weaken the vibration transmitted from the external environment to the first platform and can make the first platform and the bottom plate tightly connected; the material of the connecting pad is structural steel, which has the advantage of high strength; and a lifting ring is provided to facilitate the lifting of the second platform;

[0028] 5. The high-stability shock-absorbing base for supporting the monochromator provided by the present invention is provided with a lifting ring to facilitate the lifting of the second platform;

[0029] 6. The testing method of the high-stability shock-absorbing base for supporting a monochromator provided by the present invention has the advantage of being easy to operate. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 Schematic diagram of the structure of an existing support base for supporting a monochromator;

[0031] Figure 1 Description of the reference numerals: 01-platform assembly, 021-base plate, 024-support, 04-fixing assembly.

[0032] Figure 2 This is a schematic structural diagram of an embodiment of a high-stability shock-absorbing base for supporting a monochromator according to the present invention;

[0033] Figure 3 Schematic diagram of the structure of the leveling support and the shock-absorbing gasket in an embodiment of the high-stability shock-absorbing base for supporting a monochromator of the present invention;

[0034] Figure 4 Schematic diagram of the structure of the adjustment assembly in an embodiment of the high-stability shock-absorbing base for supporting a monochromator of the present invention;

[0035] Figure 5 Schematic diagram of the internal structure of the leveling support in an embodiment of the high-stability shock-absorbing base for supporting a monochromator of the present invention;

[0036] Figure 6 This is a simulation analysis flow chart of an embodiment of a high-stability vibration-absorbing base for supporting a monochromator according to the present invention;

[0037] Figures 2 to 5 Explanation of the reference numerals: 1- platform assembly, 11- first platform, 12- second platform; 2- support assembly, 21- bottom plate, 22- shock-absorbing pad, 23- connecting pad, 24- leveling support, 2401- lower module, 2402- wedge block, 2403- upper module, 2404- leveling bolt, 2405- limiting ring, 2406- leveling column, 2407- limiting latch, 2408- slide rail, 2409- slide groove, 2 410-first through hole, 2411-second through hole, 2412-third through hole, 2413-mounting hole, 2414-wedge-shaped groove, 241-shock-absorbing gasket; 3-connecting assembly, 31-first fastening bolt, 32-second fastening bolt, 33-third fastening bolt, 34-fourth fastening bolt; 4-adjustment assembly, 41-right-angle holder, 42-caliper end, 43-platform adjustment bolt; 5-square groove; 6-lifting ring. DETAILED DESCRIPTION

[0038] The present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0039] See also Figures 2 to 5The embodiment of the present invention provides a high-stability shock-absorbing base for supporting a monochromator, comprising a platform assembly 1, a support assembly 2, a connection assembly 3 and twelve adjustment assemblies 4; the platform assembly 1 comprises a first platform 11 and a second platform 12 of a rectangular parallelepiped; the support assembly 2 comprises a base plate 21, four shock-absorbing pads 22, two connection pads 23 and four leveling supports 24; the four shock-absorbing pads 22 are arranged between the upper surface of the base plate 21 and the four corner positions of the lower surface of the first platform 11; the fixed ends of the twelve adjustment assemblies 4 are respectively fixed to the upper surface of the base plate 21; the twelve adjustment assemblies 4 are divided into four symmetrical groups of two, with three adjustment assemblies 4 in each group, and the fixed ends of two of them are respectively arranged on the side of the upper surface of the base plate 21 close to the first platform 11 Corner position, the other fixed end is arranged on the upper surface of the base plate 21 close to the middle position of the side of the first platform 11, and is equidistant from the other two; and the adjustment ends of the twelve adjustment components 4 are respectively in contact with the side of the first platform 11; the two connecting pads 23 are arranged in parallel on the upper surface of the first platform 11, and are respectively close to the long side positions of the upper surface, and are parallel to the long side of the upper surface; the four leveling supports 24 are divided into two groups, and two in each group are respectively arranged at the two end positions of the upper surface of one of the connecting pads 23; the second platform 12 is arranged on the upper surface of the four leveling supports 24, and the two long sides of its lower surface are parallel to the long sides of the upper surface, and are respectively close to the two groups of leveling supports 24, and the upper surface of the second platform 12 is used to support the monochromator.

[0040] The leveling support 24 includes a lower module 2401, an upper module 2403, and a wedge block 2402 located between the lower module 2401 and the upper module 2403; the lower surface of the lower module 2401 and the upper surface of the upper module 2403 are planes and are arranged parallel to each other; the lower surface of the upper module 2403 and the upper surface of the lower module 2401 are respectively adapted to fit with the upper surface and the lower surface of the wedge block 2402; the thin ends of the upper module 2403 and the lower module 2401 are aligned with the thick end of the wedge block 2402 The thick end should be arranged corresponding to the thin end of the wedge block 2402; the upper and lower surfaces of the wedge block 2402 are provided with a slide groove 2409 or a slide rail 2408, and the lower surface of the upper module 2403 and the upper surface of the lower module 2401 are provided with a slide rail 2408 or a slide groove 2409; the middle part of the wedge block 2402 is provided with a long strip second through hole 2411 in the same direction as the extension direction of the slide groove 2409 or the slide rail 2408; the upper module 2403 and the lower module 2401 are provided with corresponding The mounting hole 2413 is provided with a leveling column 2406 located between the upper module 2403 and the lower module 2401 and passing through the second through hole 2411. The upper module 2403 and the lower module 2401 can move up and down along the axis of the leveling column 2406. The leveling column 2406 is provided with a threaded hole. The wedge block 2402 is provided with a leveling bolt 2404 through the first through hole 2410. The leveling bolt 2404 passes through the threaded hole on the leveling column 2406. 04 is provided with a limit ring 2405, and a limit section is formed between the limit ring 2405 and the tail end of the leveling bolt 2404. The limit section is a light rod section, and the thick end of the wedge block 2402 is located in the limit section; the upper module 2403 and the lower module 2401 are provided with corresponding third through holes 2412, and the third through holes 2412 also correspond to the position of the second through holes 2411. The third through hole 2412 is used for the passage of the connecting component 3 when the connecting pad 23 is connected to the leveling support 24 and the second platform 12.

[0041] A limiting boss is provided in the middle of the leveling column 2406, and the threaded hole on the leveling column 2406 is provided through the limiting boss; the lower surface of the upper module 2403 and the upper surface of the lower module 2401 are provided with corresponding wedge-shaped grooves 2414; the bottom surfaces of the wedge-shaped grooves 2414 are respectively parallel to the corresponding upper surface of the upper module 2403 and the lower surface of the lower module 2401; the leveling column 2406 is located between the two wedge-shaped grooves 2414, and the third through hole 2412 is provided corresponding to the wedge-shaped groove 2414; the front end of the leveling bolt 2404 is provided with a limiting pin 2407, and the limiting pin 2407 is located in the second through hole 2411.

[0042] The adjustment assembly 4 includes a right-angle holder 41, a caliper head 42, and a platform adjustment bolt 43. The right-angle holder 41 constitutes the fixed end, while the caliper head 42 and platform adjustment bolt 43 constitute the adjustment end. The horizontal end of the right-angle holder 41 is fixed to the upper surface of the base plate 21, and the caliper head 42 is mounted on the end of the platform adjustment bolt 43. The platform adjustment bolt 43 is threadedly connected to the vertical end of the right-angle holder 41. The adjustment assembly 4 is used to clamp the first platform 11 and increase the overall stability of the shock-absorbing base. In actual application scenarios, the number of adjustment assemblies 4 can be increased as needed.

[0043] A shock-absorbing pad 241 is provided between each leveling support 24 and the second platform 12. The shock-absorbing pad 241 is used to reduce wear between the upper surface of the leveling support 24 and the lower surface of the second platform 12, and to increase the contact area between the upper surface of the leveling support 24 and the lower surface of the second platform 12.

[0044] The first platform 11 and the second platform 12 are made of marble, which has the characteristics of good rigidity, high hardness, strong wear resistance, and long service life. Marble can effectively isolate the vibration transmitted from the external environment to the monochromator placed on the upper surface of the second platform 12. The material of the shock-absorbing gasket 241 is nylon, which has the advantages of high temperature resistance, wear resistance, and high toughness. This allows the leveling support 24 to have a closer contact with the second platform 12 and is less likely to slide relative to each other. The material of the shock-absorbing pad 22 is an organic composite material, which can effectively reduce the vibration transmitted from the external environment to the first platform 11 and ensure a tight connection between the first platform 11 and the base plate 21. The material of the connecting pad 23 is structural steel, which has the advantage of high strength. These materials have been carefully selected. If replaced with other materials, the shock-absorbing effect of the shock-absorbing base and the connection strength of related components may be reduced.

[0045] Two sets of square grooves 5 are provided on two opposing side surfaces of the second platform 12. The connecting assembly 3 includes twenty-four first fastening bolts 31 for connecting and tightening the adjustment assembly 4 to the base plate 21; four second fastening bolts 32 for connecting and tightening the first platform 11, the shock-absorbing pad 22, and the base plate 21; four third fastening bolts 33 for connecting the second platform 12, the leveling support 24, and the connecting pad 23; and four fourth fastening bolts 34 for connecting and tightening the connecting pad 23 to the first platform 11. The third fastening bolts 33 extend from bottom to top through the connecting pad 23, the leveling support 24, and the lower portion of the second platform 12, with their tail ends positioned within the square grooves 5. Nuts are provided at the tail ends of the third fastening bolts 33 to engage with them. The connecting assembly 3 ensures the stability and safety of the overall structure of the shock-absorbing base. In actual applications, the number of bolts can be increased as needed, but the number of bolts should not be less than that in this embodiment, otherwise the stability and safety of the overall structure of the shock-absorbing base may be reduced.

[0046] Two opposing side surfaces of the second platform 12 are provided with lifting rings 6. There are four lifting rings 6, symmetrically arranged with two on each side surface. The purpose of these lifting rings 6 is to facilitate the lifting of the second platform 12. Four lifting rings 6 are sufficient to meet lifting requirements. In actual applications, if the second platform 12 is heavy, the number of lifting rings 6 can be increased to meet lifting requirements.

[0047] This embodiment also provides a method for adjusting the high-stability vibration-absorbing base for supporting a monochromator, comprising the following steps:

[0048] S1, assemble the high stability vibration-damping base for supporting the monochromator;

[0049] S2, by rotating the leveling bolt 2404 of the leveling support 2, the wedge block 2402 in the leveling support 24 moves, thereby adjusting the level of the upper module 2403 in the leveling support 24 so that the upper surface of the second platform 12 located on the leveling support 24 is level;

[0050] S3, knock on the side walls of the bottom plate 21, the first platform 11 and the second platform 12, and at the same time test the shock absorption effect of the upper surface of the second platform 12 through an autocollimator or an interferometer; if the shock absorption effect meets the design requirements, the test is completed; if the shock absorption effect does not meet the test requirements, disassemble the high-stability shock absorption base used to support the monochromator, return to step S1 and reassemble until the shock absorption effect on the upper surface of the second platform 12 meets the design requirements.

[0051] This embodiment also uses computer software SOLIDWORKS and ANSYS to simulate and analyze the structure of the vibration-absorbing base used for the high-stability monochromator design, and compares it with the existing technology, see Figure 6, the specific steps of simulation analysis are as follows:

[0052] S1, using SOLIDWORKS to draw a three-dimensional model of the prior art and this embodiment;

[0053] S2, using ANSYS to constrain, apply materials, mesh, set boundary conditions, and set algorithms for the three-dimensional models of the prior art and this embodiment;

[0054] S3, using ANSYS to perform modal analysis of the three-dimensional model of the prior art and this embodiment;

[0055] S4, using ANSYS to perform random vibration analysis of the three-dimensional model of the prior art and this embodiment;

[0056] S5, summarizing and organizing the data obtained in the above steps.

[0057] The results of the simulation analysis are as follows:

[0058] The results of the modal analysis in step S3 are shown in Table 1;

[0059] Table 1. First to eighth order natural frequency data obtained by modal analysis of the three-dimensional model of the prior art and this embodiment.

[0060]

[0061] As can be seen from Table 1, the first eight natural frequencies of the three-dimensional model of this embodiment are all greater than 100 Hz; compared with the prior art, the first to eighth natural frequencies of the three-dimensional model of this embodiment are all improved.

[0062] The results of random vibration analysis in step S4 are shown in Table 2;

[0063] Table 2 Displacement spectrum density response data obtained by random vibration analysis of the three-dimensional model of the prior art and this embodiment

[0064]

[0065] As can be seen from Table 2, the platform assembly 1 of the double-layer structure adopted in the three-dimensional model has a reduced displacement spectrum density response value when the random vibration frequencies are 0.01, 14, and 100 compared with the prior art. That is, compared with the prior art, the shock absorption effect of this embodiment is improved.

[0066] Compared with the prior art, combined with the above simulation analysis results, the beneficial effects of the embodiments of the present invention are:

[0067] 1. The embodiment of the present invention provides a high-stability, shock-absorbing base for supporting a monochromator. The platform assembly 1 is a double-layer platform consisting of a first platform 11 and a second platform 12. Four leveling supports 24 are disposed between the first and second platforms 11, 12. Twelve adjustment assemblies 4 are disposed on the bottom plate 21. The components are tightly connected, and the shock-absorbing base has the advantages of good stability and strong load-bearing capacity.

[0068] 2. The leveling support 24 in the high-stability shock-absorbing base for supporting the monochromator provided in an embodiment of the present invention can adjust the levelness of the upper surface of the second platform 12 to ensure the stability of the monochromator placed on the upper surface of the second platform 12;

[0069] 3. The high-stability, shock-absorbing base for supporting a monochromator provided in an embodiment of the present invention has shock-absorbing pads 22 disposed between the upper surface of its base plate 21 and the four corners of the lower surface of the first platform 11. Shock-absorbing pads 241 are also disposed between each leveling support 24 and the second platform 12. Simulation analysis shows that, compared with existing technologies, this shock-absorbing base enhances its ability to attenuate excitation energy from ground vibrations with an effective frequency of 0 to 100 Hz, and its natural frequency is greater than 100 Hz. This provides excellent shock absorption and effectively prevents resonance induced by ground vibrations.

[0070] 4. The high-stability shock-absorbing base for supporting a monochromator provided in an embodiment of the present invention comprises marble, which has the characteristics of good rigidity, high hardness, strong wear resistance, and long service life, and can effectively isolate the vibration transmitted from the external environment to the monochromator placed on the upper surface of the second platform 12; the shock-absorbing gasket 241 is made of nylon, which has the advantages of high temperature resistance, wear resistance, and high toughness, so that the contact between the leveling support 24 and the second platform 12 is closer and less likely to slide relative to each other; the shock-absorbing pad 22 is made of an organic composite material, which can effectively weaken the vibration transmitted from the external environment to the first platform 11 and ensure a tight connection between the first platform 11 and the base plate 21; the connecting pad 23 is made of structural steel, which has the advantage of high strength;

[0071] 5. The high-stability shock-absorbing base for supporting the monochromator provided in an embodiment of the present invention is provided with a lifting ring 6 to facilitate the lifting of the second platform 12;

[0072] 6. The testing method for the high-stability shock-absorbing base for supporting a monochromator provided in an embodiment of the present invention has the advantage of being easy to operate.

[0073] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit them. For ordinary professional and technical personnel in this field, the specific technical solutions recorded in the above embodiments can be modified, or some of the technical features therein can be replaced by equivalents. These modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions protected by the present invention.

Claims

1. A high-stability shock-absorbing base for supporting a monochromator, characterized by: It comprises a platform component (1), a support component (2), a connection component (3) and twelve adjustment components (4); The platform assembly (1) comprises a first platform (11) and a second platform (12) in the form of a rectangular parallelepiped; The support assembly (2) comprises a base plate (21), four shock-absorbing pads (22), two connecting pads (23) and four leveling supports (24); The four shock-absorbing pads (22) are arranged between the upper surface of the bottom plate (21) and the four corner positions of the lower surface of the first platform (11); The fixed ends of the twelve adjustment components (4) are respectively fixed to the upper surface of the base plate (21); the twelve adjustment components (4) are divided into four symmetrical groups, with three adjustment components (4) in each group, two of which are respectively arranged at the corner positions of the side surfaces of the upper surface of the base plate (21) close to the first platform (11), and the fixed end of another is arranged at the middle position of the side surface of the upper surface of the base plate (21) close to the first platform (11), and is arranged equidistant from the other two; and the adjustment ends of the twelve adjustment components (4) are respectively in contact with the side surfaces of the first platform (11); The two connecting pads (23) are arranged in parallel on the upper surface of the first platform (11), and are respectively close to the long sides of the upper surface and parallel to the long sides of the upper surface; The four leveling supports (24) are divided into two groups, with two in each group respectively arranged at two ends of the upper surface of one of the connecting pads (23); The second platform (12) is arranged on the upper surface of the four leveling supports (24), and the two long sides of the lower surface are parallel to the long sides of the upper surface and are respectively close to the two groups of leveling supports (24). The upper surface of the second platform (12) is used to support the monochromator; The connecting assembly (3) is used to connect the bottom plate (21) and the adjustment assembly (4), the bottom plate (21) and the shock-absorbing pad (22) and the first platform (11), the first platform (11) and the connecting pad (23), and the connecting pad (23) and the leveling support (24) and the second platform (12).

2. The high-stability shock-absorbing base for supporting a monochromator according to claim 1, characterized in that: The leveling support (24) includes a lower module (2401), an upper module (2403), and a wedge-shaped block (2402) located between the lower module (2401) and the upper module (2403); the lower surface of the lower module (2401) and the upper surface of the upper module (2403) are planes and are arranged parallel to each other; the lower surface of the upper module (2403) and the upper surface of the lower module (2401) are respectively adapted to fit the upper surface and the lower surface of the wedge-shaped block (2402); the thin ends of the upper module (2403) and the lower module (2401) are arranged correspondingly to the thick end of the wedge-shaped block (2402), and the thick end is arranged correspondingly to the thin end of the wedge-shaped block (2402); The upper and lower surfaces of the wedge block (2402) are both provided with a slide groove (2409) or a slide rail (2408), and the lower surface of the upper module (2403) and the upper surface of the lower module (2401) are correspondingly provided with a slide rail (2408) or a slide groove (2409); the middle portion of the wedge block (2402) is provided with a second long through hole (2411) extending in the same direction as the slide groove (2409) or the slide rail (2408); The upper module (2403) and the lower module (2401) are provided with corresponding mounting holes (2413), and a leveling column (2406) is installed in the mounting hole (2413) and is located between the upper module (2403) and the lower module (2401) and passes through the second through hole (2411). The upper module (2403) and the lower module (2401) can move up and down along the axial direction of the leveling column (2406); a threaded hole is provided on the leveling column (2406); a leveling bolt (2404) is passed through the first through hole (2410) on the wedge block (2402), and the leveling bolt (2404) passes through the leveling column (2406). a threaded hole on the upper portion; a limiting ring (2405) is provided on the leveling bolt (2404); a limiting section is formed between the limiting ring (2405) and the tail end of the leveling bolt (2404); the limiting section is a light rod section, and the thick end of the wedge block (2402) is located in the limiting section; a third through hole (2412) corresponding to each other is provided on the upper module (2403) and the lower module (2401), and the third through hole (2412) corresponds to the position of the second through hole (2411) at the same time, and the third through hole (2412) is used for the connection component (3) to pass through when the connection pad (23) is connected to the leveling support (24) and the second platform (12).

3. The high-stability shock-absorbing base for supporting a monochromator according to claim 2, characterized in that: A limiting boss is provided in the middle of the leveling column (2406), and a threaded hole on the leveling column (2406) passes through the limiting boss; The lower surface of the upper module (2403) and the upper surface of the lower module (2401) are provided with corresponding wedge-shaped grooves (2414); the bottom surfaces of the wedge-shaped grooves (2414) are respectively parallel to the corresponding upper surface of the upper module (2403) and the lower surface of the lower module (2401); the leveling column (2406) is located between the two wedge-shaped grooves (2414), and the third through hole (2412) is provided corresponding to the wedge-shaped groove (2414); the front end of the leveling bolt (2404) is provided with a limiting pin (2407), and the limiting pin (2407) is located in the second through hole (2411).

4. The high-stability shock-absorbing base for supporting a monochromator according to any one of claims 1 to 3, characterized in that: The adjustment assembly (4) includes a right-angle fixer (41), a caliper end (42) and a platform adjustment bolt (43); the right-angle fixer (41) constitutes the fixed end, the caliper end (42) and the platform adjustment bolt (43) constitute the adjustment end, the horizontal end of the right-angle fixer (41) is fixedly arranged on the upper surface of the base plate (21), the caliper end (42) is installed on the end of the platform adjustment bolt (43), and the platform adjustment bolt (43) is threadedly connected to the vertical end of the right-angle fixer (41).

5. The high-stability shock-absorbing base for supporting a monochromator according to claim 3, characterized in that: A shock-absorbing gasket (241) is provided between each leveling support (24) and the second platform (12).

6. The high-stability shock-absorbing base for supporting a monochromator according to claim 4, characterized in that: Two groups of square grooves (5) are provided on two opposite side surfaces of the second platform (12); The connecting assembly (3) includes a plurality of first fastening bolts (31) for connecting and fastening the horizontal end of the right-angle fixer (41) in the adjusting assembly (4) and the base plate (21), a plurality of second fastening bolts (32) for connecting and fastening the first platform (11) and the shock-absorbing pad (22) and the base plate (21), a plurality of third fastening bolts (33) for connecting the second platform (12) and the leveling support (24) and the connecting pad (23), and a plurality of fourth fastening bolts (34) for connecting and fastening the connecting pad (23) and the first platform (11); wherein the third fastening bolts (33) pass through the connecting pad (23), the leveling support (24) and the lower part of the second platform (12) from bottom to top in sequence, and the tail end of the third fastening bolt (33) is located in the square groove (5), and the tail end of the third fastening bolt (33) is provided with a nut that matches it.

7. The high-stability vibration-absorbing base for supporting a monochromator according to claim 5, characterized in that: The first platform (11) and the second platform (12) are made of marble; the shock-absorbing gasket (241) is made of nylon; the shock-absorbing pad (22) is made of an organic composite material; and the connecting pad (23) is made of structural steel.

8. The high-stability vibration-absorbing base for supporting a monochromator according to claim 7, characterized in that: Two opposite side surfaces of the second platform (12) are provided with lifting rings (6); the total number of the lifting rings (6) is at least four, and they are symmetrically arranged in a manner of at least two on each side surface.

9. A method for testing the high-stability vibration-absorbing base for supporting a monochromator according to any one of claims 1 to 8, characterized in that: The following steps are involved: S1, assemble the high stability vibration-damping base for supporting the monochromator; S2, adjusting the leveling support (24) to make the upper surface of the second platform (12) level; S3, knocking the side walls of the bottom plate (21), the first platform (11) and the second platform (12), and at the same time testing the shock absorption effect of the upper surface of the second platform (12) by using an autocollimator or an interferometer; if the shock absorption effect meets the design requirements, the test is completed; if the shock absorption effect does not meet the test requirements, disassembling the high-stability shock absorption base for supporting the monochromator, returning to step S1 and reassembling until the shock absorption effect of the upper surface of the second platform (12) meets the design requirements.

10. The method for testing a high-stability vibration-absorbing base for supporting a monochromator according to claim 9, characterized in that: Step S2 is specifically as follows: By rotating the leveling bolt (2404) in the leveling support (24), the wedge block (2402) in the leveling support (24) moves, thereby adjusting the horizontality of the upper module (2403) in the leveling support (24) so ​​that the upper surface of the second platform (12) located on the leveling support (24) is horizontal.

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