Mask cleaning method, device, equipment, storage medium and product

Abstract

The present application discloses a mask cleaning method, apparatus, equipment, storage medium, and product, relating to the field of semiconductor manufacturing technology. The method includes: immersing a mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; activating a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask. The present application adopts the method of applying a variable electric field and a variable magnetic field when cleaning the mask with the cleaning liquid, and controls the charged particles to separate from the mask surface by the variable electric field and the variable magnetic field, thereby reducing the retention of charged particles in the cleaning liquid on the mask. Therefore, applying a variable electromagnetic field to the cleaning liquid can reduce the retention of charged particles on the mask, thereby reducing the possibility of fog defects on the mask surface, and ultimately significantly improving the cleaning effect of the mask.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to mask cleaning methods, devices, equipment, storage media and products. Background Art

[0002] During the semiconductor manufacturing process, haze defects gradually develop on masks when exposed to lasers of specific wavelengths. These defects are primarily caused by ammonium sulfate compounds and manifest as organic or inorganic residues on the mask. The presence of haze defects has a serious impact on product quality, potentially leading to a significant drop in product yield. Furthermore, once haze defects develop on a mask, it must be returned to the manufacturer for repair. This is especially true for phase masks, as each cleaning reduces the phase angle. Once it falls below the specified value, the mask must be scrapped.

[0003] Existing mask cleaning technology uses chemical solvents to clean organic matter, particles and other impurities on the mask surface. However, when using chemical solutions, charged particles will remain on the mask, resulting in a significant reduction in the cleaning effect of the mask.

[0004] Therefore, how to improve the cleaning effect of the mask is an urgent problem to be solved.

[0005] The above content is only used to assist in understanding the technical solution of this application and does not constitute an admission that the above content is prior art. Summary of the Invention

[0006] The main purpose of this application is to provide a mask cleaning method, device, equipment, storage medium and product, aiming to solve the technical problem of poor mask cleaning effect.

[0007] To achieve the above objectives, the present application proposes a mask cleaning method, the method comprising:

[0008] Immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0009] The preset variable electric field and variable magnetic field are activated to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0010] In one embodiment, the step of activating a preset variable electric field and a variable magnetic field to control charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned to obtain a cleaned target mask includes:

[0011] When a liquid cleaning start signal is received, a preset variable electric field and variable magnetic field are activated;

[0012] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0013] When a liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off to obtain a cleaned target mask.

[0014] In one embodiment, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the south pole of the variable magnetic field to be on the same side to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned includes:

[0015] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0016] When the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0017] When the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0018] In one embodiment, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the south pole of the variable magnetic field to be on the same side to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned includes:

[0019] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0020] When the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0021] When the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0022] In one embodiment, the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned includes:

[0023] Obtaining a contamination rating for the reticle to be cleaned;

[0024] Immersing the mask to be cleaned in flowing cleaning liquid;

[0025] The surface of the mask to be cleaned is cleaned based on a preset time period corresponding to the contamination rating.

[0026] In one embodiment, before the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned, the step includes:

[0027] Acquiring concentration information of the cleaning liquid and size information of the mask to be processed;

[0028] The concentration information and the size information are input into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

[0029] In addition, to achieve the above-mentioned purpose, the present application also proposes a mask cleaning device, which includes:

[0030] A cleaning module, configured to immerse the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0031] The activation module is used to activate the preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0032] In addition, to achieve the above-mentioned purpose, the present application also proposes a mask cleaning device, which includes: a memory, a processor, and a computer program stored on the memory and runnable on the processor, and the computer program is configured to implement the steps of the mask cleaning method described above.

[0033] In addition, to achieve the above-mentioned purpose, the present application also proposes a storage medium, which is a computer-readable storage medium and stores a computer program. When the computer program is executed by a processor, the steps of the mask cleaning method described above are implemented.

[0034] In addition, to achieve the above-mentioned purpose, the present application also provides a computer program product, which includes a computer program. When the computer program is executed by a processor, the steps of the mask cleaning method described above are implemented.

[0035] One or more technical solutions proposed in this application have at least the following technical effects:

[0036] Compared to the related art, which uses chemical solvents to clean organic matter, particles, and other impurities from the surface of the mask, but the use of chemical solutions will retain charged particles on the mask, the present application immerses the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; and activates a preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask. It can be understood that the present application uses a variable electric field and a variable magnetic field when cleaning the mask with the cleaning liquid. When charged particles appear in the cleaning liquid, the variable electric field and variable magnetic field are used to control the charged particles to separate from the mask surface, thereby reducing the retention of charged particles in the cleaning liquid on the mask, thereby reducing the possibility of fog defects on the mask surface during subsequent use. Therefore, based on the application of a variable electromagnetic field to the cleaning liquid, it is possible to reduce the retention of charged particles on the mask, thereby reducing the possibility of fog defects on the mask surface, and ultimately achieving a significant improvement in the cleaning effect of the mask. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and, together with the description, serve to explain the principles of the present application.

[0038] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0039] Figure 1 A schematic diagram of a process flow provided for an embodiment of the mask cleaning method of the present application;

[0040] Figure 2 A schematic diagram of a simplified apparatus of an embodiment of the mask cleaning method of the present application;

[0041] Figure 3 A schematic diagram of the movement of charged particles in the mask cleaning method according to an embodiment of the present application;

[0042] Figure 4 This is a schematic diagram of the module structure of the mask cleaning device according to an embodiment of the present application;

[0043] Figure 5 Schematic diagram of the equipment structure of the hardware operating environment involved in the mask cleaning method in the embodiment of the present application.

[0044] Description of Figure Numbers:

[0045] 1. Chemical liquid nozzle; 2. Variable magnetic field; 3. Variable electric field;

[0046] 4. Mask support structure; 5. Mask; 6. Cleaning liquid;

[0047] 7. Positively charged particles; 8. Negatively charged particles.

[0048] The purpose, features and advantages of this application will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0049] It should be understood that the specific embodiments described herein are merely used to explain the technical solutions of the present application and are not intended to limit the present application.

[0050] In order to better understand the technical solution of the present application, a detailed description will be given below in conjunction with the accompanying drawings and specific implementation methods.

[0051] The main solution of the embodiment of the present application is: immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0052] The preset variable electric field and variable magnetic field are activated to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0053] In this embodiment, the present application uses a mask cleaning device as the execution body. For the convenience of description, it is specifically described below as "device".

[0054] Because in the existing technology, the mask will gradually develop fog defects when irradiated by laser of a specific wavelength. The fog defects are mainly caused by ammonium sulfate compounds, which manifest as organic or inorganic residues on the mask. The existence of fog defects has a serious impact on product quality and may cause a significant drop in product qualification rate. In addition, once the mask produces fog defects, it needs to be returned to the factory for repair. Especially for phase masks, each cleaning will cause its phase angle to decrease. Once it falls below the standard value, the mask needs to be scrapped. Existing mask cleaning technology uses chemical solvents to clean organic matter, particles and other impurities on the surface of the mask. However, when using chemical solutions, charged particles will remain on the mask, resulting in a significant reduction in the cleaning effect of the mask.

[0055] The present application provides a solution, which adopts the method of applying a variable electric field and a variable magnetic field when cleaning the mask with a cleaning liquid. When charged particles appear in the cleaning liquid, the charged particles are controlled to detach from the surface of the mask by the variable electric field and the variable magnetic field, thereby reducing the retention of charged particles in the cleaning liquid on the mask, thereby reducing the possibility of fog defects appearing on the surface of the mask during subsequent use. Therefore, based on the application of a variable electromagnetic field to the cleaning liquid, it is possible to reduce the retention of charged particles on the mask, thereby reducing the possibility of fog defects appearing on the surface of the mask, and ultimately achieving a significant improvement in the cleaning effect of the mask.

[0056] This embodiment utilizes electric and magnetic fields to assist the cleaning liquid, effectively treating the charged particles generated after the reaction, thereby improving the cleaning effect. This method is particularly suitable for precision cleaning, with advantages such as good cleaning effect, short cleaning time, and minimal damage to the mask.

[0057] Based on this, the embodiment of the present application provides a mask cleaning method, referring to Figure 1 , Figure 1 This is a flow chart of the first embodiment of the mask cleaning method of the present application.

[0058] In this embodiment, the mask cleaning method includes steps S10 to S20:

[0059] Step S10, immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0060] It should be noted that the reticle to be cleaned refers to the reticle that needs to be cleaned. Reticle lithography is commonly used in photolithography processes in fields such as semiconductor manufacturing and flat panel displays, performing masking and pattern transfer functions. During use, the reticle surface may become contaminated with various contaminants and requires regular cleaning to maintain its performance. The cleaning liquid is a liquid specifically designed for cleaning reticles, including but not limited to deionized water, organic solvents, surfactants, and other ingredients, used to dissolve and remove contaminants from the reticle surface.

[0061] Exemplarily, the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned includes:

[0062] Obtaining a contamination rating for the reticle to be cleaned;

[0063] Immersing the mask to be cleaned in flowing cleaning liquid;

[0064] The surface of the mask to be cleaned is cleaned based on a preset time period corresponding to the contamination rating.

[0065] It should be noted that the mask to be cleaned refers to a mask that needs to be cleaned. The mask is usually used in the photolithography process in the fields of semiconductor manufacturing, flat panel display, etc., and plays the role of shielding and pattern transfer. During use, the surface of the mask may be contaminated with various pollutants and needs to be cleaned regularly to ensure its performance. The pollution rating: This is a quantitative assessment of the degree of contamination on the surface of the mask, and is usually rated based on factors such as the type, quantity, and distribution of pollutants. Different pollution ratings may correspond to different cleaning strategies and parameters to ensure effective cleaning results. The cleaning liquid is a liquid specially used for cleaning masks, including but not limited to deionized water, organic solvents, surfactants and other ingredients, which are used to dissolve and remove pollutants on the surface of the mask. The preset time is a cleaning time pre-set according to the pollution rating of the mask. Different pollution ratings may correspond to different cleaning times to ensure that pollutants are effectively removed without excessive cleaning.

[0066] It is understood that flowing cleaning liquid can better carry away contaminants and maintain the cleanliness and effectiveness of the cleaning liquid.

[0067] Exemplarily, the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned includes:

[0068] Acquiring concentration information of the cleaning liquid and size information of the mask to be processed;

[0069] The concentration information and the size information are input into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

[0070] It should be noted that the concentration information of the cleaning liquid refers to the concentration of the active ingredients in the cleaning liquid, which may include the concentration of the cleaning agent, the proportion of the solvent, etc. Concentration information is very important for determining the cleaning effect and selecting appropriate cleaning conditions. The size information of the mask to be processed refers to the size of the mask to be cleaned, including length, width, thickness, etc. The size information helps to determine the amount of cleaning liquid and the cleaning time required during the cleaning process. The power calculation model is a pre-set mathematical model used to calculate the working power of the variable electric field and the variable magnetic field based on the concentration of the cleaning liquid and the size of the mask. The model takes into account the influence of the electric field and the magnetic field on the cleaning effect, as well as the power required for masks of different sizes and cleaning liquids of different concentrations. The working power to be adjusted of the variable electric field and the variable magnetic field refers to the working power of the electric field and the magnetic field that is suitable for the current cleaning conditions, which is obtained according to the power calculation model. By adjusting the power of the electric field and the magnetic field, the cleaning effect and efficiency can be optimized.

[0071] It can be understood that by adjusting the power of the electric field and the magnetic field according to the concentration of the cleaning liquid and the size of the mask, the movement of the charged particles can be more effectively controlled, thereby improving the cleaning effect.

[0072] Step S20 , activating a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0073] It should be noted that the variable electric field is an electric field whose intensity and / or direction can be changed. During the cleaning process, the moving direction and speed of the charged particles can be affected by changing the electric field.

[0074] Additionally, it should be noted that the variable magnetic field is one that can change its strength and / or direction. By changing the magnetic field, the movement of charged particles can be affected. Charged particles are particles with an electrical charge. During the cleaning process, reactions in the cleaning liquid generate charged particles. The electric and magnetic fields act to dislodge these charged particles from the reticle surface. The target reticle is one that has achieved the desired cleanliness level after cleaning. After cleaning, contaminants on the reticle surface are removed, restoring its original performance and cleanliness.

[0075] Exemplarily, the step of activating a preset variable electric field and a variable magnetic field to control charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned to obtain a cleaned target mask includes:

[0076] When a liquid cleaning start signal is received, a preset variable electric field and variable magnetic field are activated;

[0077] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0078] When a liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off to obtain a cleaned target mask.

[0079] It should be noted that the variable electric field is one whose intensity and / or direction can be changed. During the cleaning process, changing the electric field can influence the direction and speed of charged particles. The variable magnetic field is one whose intensity and / or direction can be changed, thereby influencing the movement of charged particles. Charged particles are particles with an electric charge. During the cleaning process, reactions in the cleaning liquid generate charged particles. Through the action of the electric and magnetic fields, these charged particles can be detached from the reticle surface.

[0080] In addition, it should be noted that the liquid cleaning start signal is a control signal used to indicate the start of the cleaning process. When this signal is received, the system will start to activate and adjust the electric field and magnetic field. The change frequency refers to the frequency of change of the electric field and magnetic field, that is, the number of times the electric field and magnetic field change per unit time. Adjusting the change frequency can affect the motion law of charged particles, thereby optimizing the cleaning effect. The liquid cleaning end signal is a control signal used to indicate the end of the cleaning process. When this signal is received, the device will stop activating and adjusting the electric field and magnetic field to complete the cleaning process.

[0081] As you can understand, in electricity and magnetism, the negative pole and the south pole represent the direction of charge and magnetic flux, respectively. Placing the negative and south poles on the same side generates a net force in a specific direction, making it easier for charged particles to detach from the mask surface.

[0082] Exemplarily, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the south pole of the variable magnetic field to be on the same side to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned includes:

[0083] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0084] When the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0085] When the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0086] It should be noted that the frequency of change of the variable electric and magnetic fields refers to the frequency of change of the electric and magnetic fields, that is, the number of times the electric and magnetic fields change per unit time. Adjusting the frequency of change can influence the motion of charged particles, thereby optimizing the cleaning effect. The first horizontal magnetic pole and electrode refer to the first horizontally arranged magnetic pole and electrode, representing the directions of the magnetic and electric fields, respectively. In this material, the first horizontal magnetic pole is the south pole and the electrode is the negative pole, generating a net force in a specific direction that facilitates the detachment of positively charged particles from the reticle surface. The second horizontal magnetic pole and electrode refer to the second horizontally arranged magnetic pole and electrode, representing the directions of the magnetic and electric fields, respectively. The second horizontal magnetic pole is the north pole and the electrode is the positive pole, generating a net force in a specific direction that facilitates the detachment of negatively charged particles from the reticle surface. Positively and negatively charged particles refer to particles with positive and negative charges. During the cleaning process, reactions in the cleaning liquid generate charged particles. The electric and magnetic fields can be used to detach these charged particles from the reticle surface.

[0087] Exemplarily, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the south pole of the variable magnetic field to be on the same side to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned includes:

[0088] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0089] When the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0090] When the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0091] It should be noted that the frequency of change of the variable electric and magnetic fields refers to the frequency of change of the electric and magnetic fields, that is, the number of times the electric and magnetic fields change per unit time. Adjusting the frequency of change can influence the motion of charged particles, thereby optimizing the cleaning effect. The first vertical magnetic pole and electrode refer to the first vertically arranged magnetic pole and electrode, representing the directions of the magnetic and electric fields, respectively. In this section of material, the first vertical magnetic pole is the south pole and the electrode is the negative pole. This may be to generate a net force in a specific direction, making it easier for positively charged particles to detach from the reticle surface. The second vertical magnetic pole and electrode refer to the second vertically arranged magnetic pole and electrode, representing the directions of the magnetic and electric fields, respectively. In this section of material, the second vertical magnetic pole is the north pole and the electrode is the positive pole. This may be to generate a net force in a specific direction, making it easier for negatively charged particles to detach from the reticle surface. Positively charged particles and negatively charged particles refer to particles with positive and negative charges. During the cleaning process, reactions in the cleaning liquid generate charged particles. Through the action of electric and magnetic fields, these charged particles can be separated from the surface of the mask.

[0092] This embodiment provides a mask cleaning method, which applies a variable electric field and a variable magnetic field when cleaning the mask with a cleaning liquid. When charged particles appear in the cleaning liquid, the charged particles are controlled to detach from the mask surface through the variable electric field and the variable magnetic field, thereby reducing the retention of charged particles in the cleaning liquid on the mask, thereby reducing the possibility of fog defects appearing on the mask surface during subsequent use. Therefore, based on the application of a variable electromagnetic field to the cleaning liquid, it is possible to reduce the retention of charged particles on the mask, thereby reducing the possibility of fog defects appearing on the mask surface, and ultimately achieving a significant improvement in the mask cleaning effect.

[0093] In one feasible embodiment, a suitable cleaning liquid is selected and brought into contact with the reticle to be cleaned, ensuring that the cleaning liquid fully covers the reticle surface and initiating the chemical reaction process. During the reaction between the cleaning liquid and the reticle, the charged particles generated by the reaction are monitored in real time. This can be achieved through conductivity testing or other suitable methods. Based on the properties of the monitored charged particles (positive or negative charge), the parameters of the variable electric and magnetic fields are adjusted. By adjusting the orientation and position of the electrodes and magnetic poles, the charged particles can effectively move and detach from the reticle surface under the combined action of the electric and magnetic fields. When the presence of charged particles is detected, the preset variable electric and magnetic fields are activated. The frequency of change of the electric and magnetic fields is ensured to match the response frequency of the charged particles to maximize the cleaning effect. During the cleaning process, the parameters of the electric and magnetic fields are adjusted in real time based on the number and distribution of charged particles to ensure the efficiency and accuracy of the cleaning process. When the cleaning reaction is detected to be nearing completion and the number of charged particles has significantly decreased, the electric and magnetic fields are gradually reduced and eventually turned off. At this point, the contaminants on the reticle surface have been effectively removed.

[0094] For example, in order to help understand the implementation process of the mask cleaning method obtained by combining this embodiment with the above embodiments, please refer to Figure 2 , Figure 2 A schematic diagram of a mask cleaning method is provided, specifically:

[0095] First, a contamination rating of the mask to be cleaned is obtained through optical inspection or other methods. The contamination rating can be divided according to the type, quantity, and distribution of contaminants to facilitate adjustment of cleaning parameters in subsequent steps.

[0096] Immerse the mask to be cleaned in flowing cleaning liquid, ensuring that all parts of the mask are fully contacted by the cleaning liquid. The cleaning liquid can be deionized water, chemical solvents, or other suitable cleaning agents.

[0097] The frequency of the variable electric and magnetic fields is adjusted based on the contamination level of the mask and the characteristics of the cleaning liquid. The frequency should be selected to effectively remove charged particles from the mask surface under the action of the electric and magnetic fields.

[0098] Make sure the negative pole of the variable electric field is in the same direction as the south pole of the variable magnetic field. This can be achieved by adjusting the position of the electrodes and the magnetic poles. Figure 3 When the first horizontal magnetic pole is the S pole and the second horizontal magnetic pole is the N pole, the first horizontal electrode should be the negative pole and the second horizontal electrode should be the positive pole. The reaction in the cleaning liquid generates charged particles. Through the action of the electric field and the magnetic field, these charged particles can be separated from the surface of the mask.

[0099] When a liquid cleaning start signal is received, the preset variable electric field and variable magnetic field are activated. The activation of the electric and magnetic fields causes the charged particles in the cleaning liquid to be subjected to force and thus detach from the mask surface.

[0100] When the liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off. At this point, the charged particles on the surface of the mask have been effectively removed, and a cleaned target mask is obtained.

[0101] It should be noted that the above examples are only used to understand the present application and do not constitute a limitation on the mask cleaning method of the present application. More simple transformations based on this technical concept are all within the scope of protection of the present application.

[0102] This application also provides a mask cleaning device, please refer to Figure 4 , the mask cleaning device comprises:

[0103] The cleaning module 10 is used to immerse the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0104] The activation module 20 is used to activate a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0105] And / or, the activation module 20 includes:

[0106] A first activation module is configured to activate a preset variable electric field and a variable magnetic field when receiving a liquid cleaning start signal;

[0107] a first adjustment module, configured to adjust the frequency of change of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the south pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0108] The first closing module is used to close the variable electric field and the variable magnetic field when receiving a liquid cleaning end signal, so as to obtain a cleaned target mask.

[0109] And / or, the first adjustment module includes:

[0110] a second adjustment module, configured to adjust the changing frequencies of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0111] a first control module, configured to control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole;

[0112] The second control module is used to control the negatively charged particles in the cleaning liquid to detach from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole.

[0113] And / or, the first adjustment module includes:

[0114] a third adjustment module, configured to adjust the changing frequencies of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0115] a third control module, configured to control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole;

[0116] The fourth control module is used to control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole.

[0117] And / or, the cleaning module 10 includes:

[0118] A first acquisition module is used to obtain a contamination rating of the mask to be cleaned;

[0119] a first immersion module, configured to immerse the mask to be cleaned in flowing cleaning liquid;

[0120] The first cleaning module is configured to clean the surface of the mask to be cleaned based on a preset time duration corresponding to the contamination rating.

[0121] And / or, the mask cleaning device includes:

[0122] A second acquisition module is used to acquire concentration information of the cleaning liquid and size information of the mask to be processed;

[0123] The first calculation module is used to input the concentration information and the size information into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

[0124] The reticle cleaning device provided in this application, utilizing the reticle cleaning method of the aforementioned embodiment, can resolve the technical problem of poor reticle cleaning performance. Compared to the prior art, the beneficial effects of the reticle cleaning device provided in this application are the same as those of the reticle cleaning method provided in the aforementioned embodiment. Other technical features of the reticle cleaning device are the same as those disclosed in the aforementioned embodiment and are not further elaborated here.

[0125] The present application provides a mask cleaning device, which includes: at least one processor; and a memory communicatively connected to the at least one processor; wherein the memory stores instructions that can be executed by the at least one processor, and the instructions are executed by the at least one processor so that the at least one processor can execute the mask cleaning method in the above-mentioned embodiment one.

[0126] Reference below Figure 5 , which shows a schematic structural diagram of a mask cleaning device suitable for implementing embodiments of the present application. The mask cleaning device in the embodiments of the present application can include, but is not limited to, mobile terminals such as mobile phones, tablet computers, laptop computers, digital broadcast receivers, PDAs (Personal Digital Assistants), PMPs (Portable Media Players), and in-vehicle terminals (e.g., in-vehicle navigation terminals), as well as fixed terminals such as digital TVs and desktop computers. Figure 5 The mask cleaning device shown is merely an example and should not limit the functions and scope of use of the embodiments of the present application.

[0127] like Figure 5As shown, the reticle cleaning apparatus may include a processing device 1001 (e.g., a central processing unit, a graphics processing unit, etc.), which can perform various appropriate actions and processes based on programs stored in a read-only memory (ROM) 1002 or programs loaded from a storage device 1003 into a random access memory (RAM) 1004. RAM 1004 also stores various programs and data required for the operation of the reticle cleaning apparatus. Processing device 1001, ROM 1002, and RAM 1004 are interconnected via a bus 1005. An input / output (I / O) interface 1006 is also connected to the bus. Typically, the following systems may be connected to I / O interface 1006: input device 1007 including, for example, a touchscreen, touchpad, keyboard, mouse, image sensor, microphone, accelerometer, gyroscope, etc.; output device 1008 including, for example, a liquid crystal display (LCD), speaker, vibrator, etc.; storage device 1003 including, for example, a magnetic tape, hard disk, etc.; and communication device 1009. Communication device 1009 can allow the reticle cleaning apparatus to communicate wirelessly or wired with other apparatuses to exchange data. Although the figure shows a reticle cleaning apparatus with various systems, it should be understood that it is not required to implement or have all of the systems shown. More or fewer systems may be implemented or have alternatively.

[0128] In particular, according to the embodiments disclosed in the present application, the processes described above with reference to the flowcharts can be implemented as computer software programs. For example, the embodiments disclosed in the present application include a computer program product comprising a computer program carried on a computer-readable medium, the computer program comprising program code for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from a network via a communication device, or installed from a storage device 1003, or installed from a ROM 1002. When the computer program is executed by the processing device 1001, the above-mentioned functions defined in the method of the embodiment disclosed in the present application are executed.

[0129] The reticle cleaning device provided in this application, utilizing the reticle cleaning method of the aforementioned embodiment, can resolve the technical problem of poor reticle cleaning performance. Compared to the prior art, the reticle cleaning device provided in this application has the same beneficial effects as the reticle cleaning method provided in the aforementioned embodiment. Other technical features of the reticle cleaning device are the same as those disclosed in the aforementioned embodiment and are not further elaborated here.

[0130] It should be understood that the various parts disclosed in this application can be implemented using hardware, software, firmware, or a combination thereof. In the description of the above embodiments, specific features, structures, materials, or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0131] The above description is merely a specific embodiment of the present application, but the scope of protection of the present application is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in this application should be included in the scope of protection of this application. Therefore, the scope of protection of this application should be based on the scope of protection of the claims.

[0132] The present application provides a computer-readable storage medium having computer-readable program instructions (ie, computer program) stored thereon, wherein the computer-readable program instructions are used to execute the mask cleaning method in the above embodiment.

[0133] The computer-readable storage medium provided in this application may be, for example, a USB flash drive, but is not limited to electrical, magnetic, optical, electromagnetic, infrared, or semiconductor systems, systems or devices, or any combination thereof. More specific examples of computer-readable storage media may include, but are not limited to: an electrical connection with one or more wires, a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination thereof. In this embodiment, the computer-readable storage medium may be any tangible medium that contains or stores a program that can be used by or in conjunction with an instruction execution system, system or device. The program code contained on the computer-readable storage medium may be transmitted using any appropriate medium, including but not limited to: wires, optical cables, RF (Radio Frequency), etc., or any suitable combination thereof.

[0134] The computer-readable storage medium may be included in the mask cleaning device, or may exist independently without being assembled into the mask cleaning device.

[0135] The above-mentioned computer-readable storage medium carries one or more programs. When the above-mentioned one or more programs are executed by the mask cleaning equipment, the mask cleaning equipment: immerses the mask to be cleaned in the cleaning liquid to clean the surface of the mask to be cleaned; activates the preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to detach from the surface of the mask to be cleaned, thereby obtaining a target mask that has been cleaned.

[0136] Computer program code for performing the operations of the present application may be written in one or more programming languages, or a combination thereof, including object-oriented programming languages ​​such as Java, Smalltalk, C++, and conventional procedural programming languages ​​such as "C" or similar programming languages. The program code may be executed entirely on the user's computer, partially on the user's computer, as a stand-alone software package, partially on the user's computer and partially on a remote computer, or entirely on the remote computer or server. In cases involving a remote computer, the remote computer may be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or may be connected to an external computer (e.g., through the Internet using an Internet service provider).

[0137] The flow charts and block diagrams in the accompanying drawings illustrate the possible architecture, functions and operations of the systems, methods and computer program products according to various embodiments of the present application. In this regard, each box in the flow chart or block diagram can represent a module, program segment or a part of code, and the module, program segment or a part of code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the box can also occur in a different order than that marked in the accompanying drawings. For example, two boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each box in the block diagram and / or flow chart, and the combination of the boxes in the block diagram and / or flow chart can be implemented by a dedicated hardware-based system that performs the specified function or operation, or can be implemented by a combination of dedicated hardware and computer instructions.

[0138] The modules described in the embodiments of the present application may be implemented in software or hardware, wherein the name of a module does not necessarily limit the unit itself.

[0139] The computer-readable storage medium provided in this application stores computer-readable program instructions (i.e., a computer program) for executing the above-described reticle cleaning method, thereby resolving the technical issue of poor reticle cleaning performance. Compared to the prior art, the beneficial effects of the computer-readable storage medium provided in this application are similar to those of the reticle cleaning method provided in the above-described embodiments, and are not further elaborated here.

[0140] The present application also provides a computer program product, comprising a computer program, which implements the steps of the above-mentioned mask cleaning method when executed by a processor.

[0141] The computer program product provided in this application can solve the technical problem of poor mask cleaning effect. Compared with the prior art, the beneficial effects of the computer program product provided in this application are the same as those of the mask cleaning method provided in the above embodiment, which will not be repeated here.

[0142] The above description is only part of the embodiments of the present application and does not limit the patent scope of the present application. All equivalent structural transformations made by using the contents of the present application specification and drawings under the technical concept of the present application, or direct / indirect application in other related technical fields are included in the patent protection scope of the present application.

Claims

1. A mask cleaning method, characterized in that: The method includes: Immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; When a liquid cleaning start signal is received, a preset variable electric field and variable magnetic field are activated; Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned; The step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side includes: Monitor the properties of charged particles in the cleaning liquid and adjust the parameters of the variable electric field and variable magnetic field according to the monitoring results; By adjusting the direction and position of the electrodes and magnetic poles, it is ensured that the charged particles can effectively move and leave the mask surface under the combined action of the electric field and magnetic field; When a liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off to obtain a cleaned target mask.

2. The method according to claim 1, wherein The step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned includes: Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction; When the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned; When the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

3. The method according to claim 1, wherein The step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned includes: Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction; When the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned; When the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

4. The method according to claim 1, wherein The step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned comprises: Obtaining a contamination rating for the reticle to be cleaned; Immersing the mask to be cleaned in flowing cleaning liquid; The surface of the mask to be cleaned is cleaned based on a preset time period corresponding to the contamination rating.

5. The method according to claim 1, wherein The step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned comprises: Acquiring concentration information of the cleaning liquid and size information of the mask to be cleaned; The concentration information and the size information are input into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

6. A mask cleaning device, characterized in that: The device comprises: A cleaning module, used for immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; A first activation module is configured to activate a preset variable electric field and a variable magnetic field when receiving a liquid cleaning start signal; a first adjustment module, configured to adjust the frequency of change of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the south pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned; The step of adjusting the changing frequencies of the variable electric field and the variable magnetic field and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side includes: Monitor the properties of charged particles in the cleaning liquid and adjust the parameters of the variable electric field and variable magnetic field according to the monitoring results; By adjusting the direction and position of the electrodes and magnetic poles, it is ensured that the charged particles can effectively move and leave the mask surface under the combined action of the electric field and magnetic field; The first closing module is used to close the variable electric field and the variable magnetic field when receiving a liquid cleaning end signal, so as to obtain a cleaned target mask.

7. A mask cleaning device, characterized in that: The device comprises: a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the computer program is configured to implement the steps of the mask cleaning method according to any one of claims 1 to 5.

8. A storage medium, characterized in that: The storage medium is a computer-readable storage medium, and a computer program is stored on the storage medium. When the computer program is executed by a processor, the steps of the mask cleaning method according to any one of claims 1 to 5 are implemented.

9. A computer program product, characterized in that The computer program product comprises a computer program, and when the computer program is executed by a processor, the steps of the mask cleaning method according to any one of claims 1 to 5 are implemented.

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