Polishing device and method for mute type linear guide rail pair

By introducing vacuum suction cups and filtration and recycling technologies into the polishing device, the problems of insufficient cage versatility and large amount of polishing liquid are solved, and stable adsorption and recycling of polishing liquid for products of different specifications are realized, reducing polishing costs.

CN119188574AInactive Publication Date: 2024-12-27SHANDONG WEIPENG AUTOMATION TECH CO LTD
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Patent Information

Application Number
CN202411582322.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-07
Publication Date
2024-12-27
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

The cages of existing polishing devices are not versatile and cannot adapt to products of different specifications. The amount of polishing liquid is large, which increases the polishing cost.

Method used

A polishing device including a polishing frame, pulling limit assembly, filter mesh, vacuum suction cup, telescopic adjustment assembly and pressurized assembly was designed. The products are absorbed by vacuum suction cups, and stable adsorption of products of different specifications are realized, and filtered and recovered. Polishing liquid, reduce the amount of polishing liquid.

Benefits of technology

It enhances the adsorption stability of products of different specifications, realizes the recycling of polishing liquid, and reduces the polishing cost.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to the technical field of polishing devices, in particular to a polishing device and method for a mute type linear guide rail pair. The polishing device and method for the mute type linear guide rail pair aim at solving the technical problems that in the prior art, the universality of a holder is not high, the using amount of polishing liquid is large, and the polishing cost is increased. According to the technical scheme, the polishing device for the mute type linear guide rail pair comprises a polishing rack; the polishing machine further comprises a polishing liquid storage box, a drawing limiting assembly, a filter screen, a supporting plate, a first motor, a polishing table, a polishing pad, an anti-splashing assembly, a polishing head assembly, a supporting column, an adjusting locking bolt, a telescopic adjusting assembly, a pressurizing assembly, an access door, a liquid supply pump, a liquid inlet pipe and a universal bamboo joint pipe. The vacuum adsorption mechanism is additionally arranged, the stability of a product during polishing is effectively kept, the polishing solution is filtered and recycled, cyclic utilization of the polishing solution is achieved, and the use amount of the polishing solution is greatly reduced.
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Description

Technical Field

[0001] The present invention relates to the technical field of polishing devices, and in particular to a polishing device and method for a silent linear guide pair. Background Art

[0002] The linear guide is composed of a guide rail with a raceway, a slider on the guide rail, a rolling body that circulates between the slider and the guide rail, a return device, and a sealed end cover. It can not only easily realize precise linear motion but also has high rigidity and high load-bearing capacity. As the advantages of linear guide pairs are continuously understood and accepted by more and more applications, linear guide pairs have been developed at a high speed. Silent linear guide pairs reduce the pollution of noise to the environment, so they are widely used. In order to reduce the noise generated during operation, polishing processing is indispensable for linear guide pairs in the production process. However, when the existing polishing device is working, in order to maintain stability during polishing, the shape and size of the cage need to match the product. Therefore, the cage is not versatile and can only be applied to products of a certain specification. Products with large size differences cannot guarantee their stability in the cage, and the polishing liquid is continuously sprayed on the polishing table. The amount of polishing liquid used is large, which increases the cost of polishing. Summary of the invention

[0003] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a polishing device and method for a silent linear guide pair. The polishing device and method for a silent linear guide pair are intended to solve the technical problems in the prior art that the retaining frame is not universal, the amount of polishing liquid used is large, and the polishing cost is increased.

[0004] The technical solution of the present invention is: a polishing device for a silent linear guide pair, comprising a polishing machine frame; also comprising a polishing liquid storage box, a pull-out limit assembly, a filter, a support plate, a first motor, a polishing table, a polishing pad, an anti-splash assembly, a polishing head assembly, a support column, an adjustment locking bolt, a telescopic adjustment assembly, a pressurizing assembly, an inspection door, a liquid supply pump, a liquid inlet pipe and a universal bamboo tube; the polishing liquid storage box is fixedly connected to the upper end of the bottom of the polishing machine frame; the pull-out limit assembly is fixedly connected to the inner walls on both sides of the polishing frame; the pull-out limit assembly and the other pull-out limit assembly are snap-connected with the filter; the inner wall on the rear side of the polishing frame is fixedly connected to the support plate; the upper end of the support plate is fixedly connected to the first motor; the upper end of the motor shaft of the first motor is fixedly connected to the polishing table; the upper end of the polishing table is adhesively connected to the polishing pad; the upper end of the polishing frame is fixedly connected to the anti-splash assembly; the upper end of the polishing pad is movable A polishing head assembly is movably connected; the upper end of the polishing machine frame is fixedly connected to support columns equidistantly distributed in a ring about the polishing table; an adjusting locking bolt is threadedly connected to the upper end of the support column; a telescopic adjustment assembly is movably connected to the outer side of the adjusting locking bolt; a pressurizing assembly is fixedly connected to the inner end of the telescopic adjustment assembly; the front end of the polishing machine frame is rotatably connected to an inspection door symmetrically distributed on the left and right; the rear end of the polishing machine frame is fixedly connected to a liquid supply pump; a liquid inlet pipe is installed between the inlet end of the liquid supply pump and the polishing liquid storage box; a universal bamboo tube is installed at the outlet end of the liquid supply pump; the polishing head assembly includes a retaining frame; a lifting cylinder is installed on the upper end of the retaining frame; a vacuum suction cup is fixedly connected to the telescopic end of the lower side of the lifting cylinder; the telescopic adjustment assembly includes a rotating ring; an external fixing block is fixedly connected to the outer side of the rotating ring; a guide groove is opened at the upper end of the external fixing block; a guide slider is slidably connected in the guide groove; a rack is fixedly connected to the upper end of the guide slider.

[0005] Preferably, the pull-out limit assembly includes a pull-out fixed seat; an open groove is provided on the inner side of the pull-out fixed seat; a limiting protrusion is fixedly connected to the upper end of the bottom of the front side of the opening groove; counterweight columns are inserted in the pull-out fixed seat and are symmetrically distributed front and back; the upper and lower ends of the counterweight columns are fixedly connected to a limiting counterweight plate, and the limiting counterweight plate and the counterweight column press the filter down to prevent the filter from tilting and affecting the filtering effect.

[0006] Preferably, the sum of the heights of the limiting protrusion, the filter screen and the limiting counterweight plate is less than the height of the opening slot; the filter screen is installed in the opening slot to prevent the filter screen from slipping, and the disassembly and assembly is convenient.

[0007] Preferably, the anti-splash assembly includes a fixing ring; a ferrule is sleeved on the outer side of the upper end of the fixing ring; the outer surface of the fixing ring is provided with inner holes symmetrically distributed on the left and right; the outer side of the ferrule is provided with outer holes corresponding to the inner holes; positioning pins are inserted in the inner and outer holes; a pull plate is fixedly connected to the outer side of the positioning pin; a spring is fixedly connected between the pull plate and the ferrule, and the ferrule is used to limit the working range of the retaining frame to ensure the comprehensiveness of the polishing, and the ferrule has the effect of shielding the polishing liquid.

[0008] Preferably, the polishing head assembly also includes a vacuum pump installed on the upper end of the retaining frame; a vacuum tube is installed between the vacuum pump and the vacuum suction cup; the diameter of the retaining frame is equal to the diameter of the polishing table, which further enhances the adsorption effect of the product in the retaining frame, and multiple products can be placed in the retaining frame to maintain the consistency of polishing degree of the same batch of products.

[0009] Preferably, four retaining racks are provided; the sum of the areas of the retaining racks is smaller than the area of ​​the polishing table, so that different products can be polished at the same time and different pressures can be applied.

[0010] Preferably, the telescopic adjustment assembly also includes a second motor installed on the upper end of the external fixed block; a gear meshing with the rack is installed on the outer side of the output shaft of the second motor; a rotating ring is sleeved on the outer side of the adjusting locking bolt, and the rotational motion of the gear is converted into linear motion through the rack, driving the horizontal connecting plate to move, thereby realizing telescopic adjustment and ensuring the fixing effect of the retaining frame.

[0011] Preferably, the pressure assembly includes a horizontal connecting plate; the horizontal connecting plate is threadedly connected to an adjusting screw; the lower end of the adjusting screw is fixedly connected to a clamping block and an anti-slip pad in sequence, and the anti-slip pad can be used to increase the friction between the retaining frame, thereby preventing the retaining frame from slipping.

[0012] A polishing method for a silent linear guide pair, comprising a polishing device for a silent linear guide pair as described in any one of the above, and the steps are as follows:

[0013] Step 1: Select a cage of appropriate size according to the specifications of the linear guide pair, and determine the number of cages. According to the polishing requirements, stick the appropriate polishing pad to the surface of the polishing table, then pull the pull plate outward, the spring is stretched, and the ferrule is put on the outside of the fixed ring, and the ferrule is rotated to align the inner and outer holes. Under the action of the spring rebound force, the positioning column is inserted into the inner hole. The ferrule can prevent the cage from moving to the outside of the polishing pad to ensure the polishing effect. According to the height of the linear guide pair, the lifting cylinder controls the lifting of the vacuum suction cup to ensure that the linear guide pair is partially exposed outside the cage. Turn on the vacuum pump and cooperate with the vacuum tube to generate negative air pressure in the vacuum suction cup, thereby firmly sucking the linear guide pair;

[0014] Step 2: Place the holder on the upper end of the polishing pad, adjust it to a suitable position, loosen the adjusting locking bolt on the upper end of the support column, and then rotate the rotating ring, start the second motor on the upper end of the external fixing block, and the second motor drives the gear to rotate. Due to the meshing of the gear and the rack, the guide slider is driven to slide in the guide groove, and the horizontal connecting plate moves synchronously until the adjusting screw stops near the center of the holder, and the adjusting screw is rotated, and the pressing block and the anti-skid pad are lowered to apply pressure to the holder;

[0015] Step 3: bend the universal bamboo tube to adjust it to a suitable position and liquid outlet angle, turn on the liquid supply pump, draw the polishing liquid in the polishing liquid storage box through the liquid inlet pipe and the universal bamboo tube and spray it on the polishing table, turn on the first motor at the upper end of the support plate, drive the polishing table to rotate, and complete the polishing operation;

[0016] Step 4: The polishing liquid and waste chips are blocked by the ferrule, and then flow into the polishing machine frame, and are filtered through the pull-out limit assembly and the filter on the inside of another pull-out limit assembly. The polishing liquid is returned to the polishing liquid storage box for reuse. Open the inspection door, check the polishing liquid regularly, and then add new polishing liquid or replace the polishing liquid. When the filter needs to be cleaned, push the filter upward from the bottom, and the limit counterweight plate is upward, driving the counterweight column in the pull-out fixed seat to move upward until the lower end of the filter is higher than the upper end of the limit protrusion, and then move the filter forward, and the filter is removed from the open slot. Clean or replace the filter, and then reverse the steps just now to reinstall the filter.

[0017] Beneficial effects of the present invention:

[0018] 1. A vacuum adsorption mechanism is added to further adsorb the product, effectively maintaining the stability of the product during polishing. It can adsorb products of different specifications, making it more versatile. By filtering and recovering the polishing liquid, the recycling of the polishing liquid is achieved, which greatly reduces the amount of polishing liquid used, thereby reducing the cost of polishing;

[0019] 2. The polishing area is limited by the ferrule to prevent the retaining frame from moving to the outside of the polishing pad, resulting in incomplete polishing. At the same time, the ferrule blocks the splashing polishing liquid to ensure the cleanliness of the polishing frame and reduce the waste of polishing liquid. The polishing head assembly has two specifications, so different products can be polished at the same time and different pressures can be applied. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 The first stereoscopic structural schematic diagram of the polishing device for the silent linear guide pair of the present invention is shown;

[0021] Figure 2 The second stereoscopic structural schematic diagram of the polishing device for the silent linear guide pair of the present invention is shown;

[0022] Figure 3 The figure shows a cross-sectional three-dimensional structure diagram of a polishing device for a silent linear guide pair of the present invention;

[0023] Figure 4 The three-dimensional structure schematic diagram of the pull-out limit assembly and the filter screen in the polishing device for the silent linear guide pair of the present invention is shown;

[0024] Figure 5The three-dimensional structure schematic diagram of the anti-splash component in the polishing device for the silent linear guide pair of the present invention is shown;

[0025] Figure 6 The three-dimensional structure schematic diagram of the polishing head assembly in the polishing device for the silent linear guide pair of the present invention is shown;

[0026] Figure 7 The three-dimensional structure schematic diagram of the telescopic adjustment component and the pressurizing component in the polishing device for the silent linear guide pair of the present invention is shown;

[0027] Figure 8 Shown is a three-dimensional structural schematic diagram of another form of the polishing head assembly in the polishing device for the silent linear guide pair of the present invention.

[0028] Explanation of the reference numerals: 1. Polishing frame; 2. Polishing liquid storage box; 3. Pull-out limit assembly; 31. Pull-out fixed seat; 32. Opening groove; 33. Limiting protrusion; 34. Counterweight plug column; 35. Limiting counterweight plate; 4. Filter; 5. Support plate; 6. First motor; 7. Polishing table; 8. Polishing pad; 9. Anti-splash assembly; 91. Fixed ring; 92. Card sleeve; 93. Inner plug hole; 94. Outer plug hole; 95. Positioning plug column; 96. Pull plate; 97. Spring; 10. Polishing head assembly; 101. Retaining frame; 102. Lifting cylinder ; 103, vacuum suction cup; 104, vacuum pump; 105, vacuum tube; 11, support column; 12, adjustment locking bolt; 13, telescopic adjustment assembly; 131, rotating ring; 132, external fixing block; 133, guide groove; 134, guide slider; 135, rack; 136, second motor; 137, gear; 14, pressurizing assembly; 141, horizontal connecting plate; 142, adjustment screw rod; 143, clamping block; 144, anti-slip pad; 15, inspection door; 16, liquid supply pump; 17, liquid inlet pipe; 18, universal bamboo tube. DETAILED DESCRIPTION

[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0030] See also Figure 1-3The present invention provides an embodiment: a polishing device for a silent linear guide pair, comprising a polishing machine frame 1; further comprising a polishing liquid storage box 2, a pull-out limit assembly 3, a filter screen 4, a support plate 5, a first motor 6, a polishing table 7, a polishing pad 8, an anti-splash assembly 9, a polishing head assembly 10, a support column 11, an adjustment locking bolt 12, a telescopic adjustment assembly 13, a pressurizing assembly 14, an inspection door 15, a liquid supply pump 16, a liquid inlet pipe 17 and a universal bamboo tube 18; the polishing machine frame 1 is fixedly connected to the polishing liquid storage box 2 at the upper end of the bottom; the inner walls on both sides of the polishing machine frame 1 are fixedly connected to the pull-out limit assembly 3; the pull-out limit assembly 3 and the other pull-out limit assembly 3 are clamped and connected with the filter screen 4; the inner wall on the rear side of the polishing machine frame 1 is fixedly connected to the support plate 5; the upper end of the support plate 5 is fixedly connected to the first motor 6; the upper end of the motor shaft of the first motor 6 is fixedly connected to a polishing table 7; the upper end of the polishing table 7 is adhesively connected to a polishing pad 8; the upper end of the polishing machine frame 1 is fixedly connected to an anti-splash component 9; the upper end of the polishing pad 8 is movably connected to a polishing head component 10; the upper end of the polishing machine frame 1 is fixedly connected to support columns 11 distributed equidistantly in a ring about the polishing table 7; the upper end of the support column 11 is threadedly connected to an adjusting locking bolt 12; the outer side of the adjusting locking bolt 12 is movably connected to a telescopic adjustment component 13; the inner end of the telescopic adjustment component 13 is fixedly connected to a pressurizing component 14; the front end of the polishing machine frame 1 is rotatably connected to an inspection door 15 distributed symmetrically on the left and right; the rear end of the polishing frame 1 is fixedly connected to a liquid supply pump 16; a liquid inlet pipe 17 is installed between the inlet end of the liquid supply pump 16 and the polishing liquid storage box 2; and a universal bamboo tube 18 is installed at the outlet end of the liquid supply pump 16.

[0031] See also Figure 4-5 In this embodiment, the pull-out limit assembly 3 includes a pull-out fixed seat 31; an opening groove 32 is opened inside the pull-out fixed seat 31; a limit protrusion 33 is fixedly connected to the upper end of the bottom of the front side of the opening groove 32; a counterweight plug 34 symmetrically distributed front and back is inserted into the pull-out fixed seat 31; the upper and lower ends of the counterweight plug 34 are fixedly connected to a limit counterweight plate 35; the sum of the heights of the limit protrusion 33, the filter screen 4 and the limit counterweight plate 35 is less than the height of the opening groove 32; The filter screen 4 is installed in the open groove 32; the splash-proof assembly 9 includes a fixing ring 91; a sleeve 92 is sleeved on the outer side of the upper end of the fixing ring 91; the outer surface of the fixing ring 91 is provided with inner holes 93 which are symmetrically distributed on the left and right; the outer side of the sleeve 92 is provided with outer holes 94 corresponding to the inner holes 93; positioning pins 95 are inserted in the inner holes 93 and the outer holes 94; a pull plate 96 is fixedly connected to the outer side of the positioning pin 95; a spring 97 is fixedly connected between the pull plate 96 and the sleeve 92.

[0032] See also Figure 6-8In this embodiment, the polishing head assembly 10 includes a holder 101; a lifting cylinder 102 is installed on the upper end of the holder 101; a vacuum suction cup 103 is fixedly connected to the telescopic end of the lower side of the lifting cylinder 102; the polishing head assembly 10 also includes a vacuum pump 104 installed on the upper end of the holder 101; a vacuum tube 105 is installed between the vacuum pump 104 and the vacuum suction cup 103; the diameter of the holder 101 is equal to the diameter of the polishing table 7; there are 4 holders 101; the sum of the areas of the holders 101 is less than the area of ​​the polishing table 7; the telescopic adjustment assembly 13 includes a rotating ring 131; the outer side of the rotating ring 131 is fixedly connected to an external fixing block 132 ; A guide groove 133 is provided at the upper end of the external fixing block 132; a guide slider 134 is slidably connected in the guide groove 133; a rack 135 is fixedly connected to the upper end of the guide slider 134; the telescopic adjustment component 13 also includes a second motor 136 installed at the upper end of the external fixing block 132; a gear 137 meshing with the rack 135 is installed on the outer side of the output shaft of the second motor 136; the rotating ring 131 is sleeved on the outer side of the adjusting locking bolt 12; the pressurizing component 14 includes a horizontal connecting plate 141; an adjusting screw 142 is connected to the inner thread of the horizontal connecting plate 141; the lower end of the adjusting screw 142 is fixedly connected to a clamping block 143 and an anti-slip pad 144 in sequence.

[0033] A polishing method for a silent linear guide pair, comprising a polishing device for a silent linear guide pair as described in any one of the above, and the steps are as follows:

[0034] Step 1: Select a holder 101 of appropriate size according to the specifications of the linear guide pair, and determine the number of holders 101. According to the polishing requirements, stick the appropriate polishing pad 8 to the surface of the polishing table 7, then pull the pull plate 96 outward, the spring 97 is stretched, and the ferrule 92 is sleeved on the outside of the fixing ring 91, and the ferrule 92 is rotated to align the inner plug hole 93 and the outer plug hole 94. Under the action of the rebound force of the spring 97, the positioning pin 95 is inserted into the inner plug hole 93. The ferrule 92 can prevent the holder 101 from moving to the outside of the polishing pad 8 to ensure the polishing effect. According to the height of the linear guide pair, the lifting cylinder 102 controls the lifting of the vacuum suction cup 103 to ensure that the linear guide pair is partially exposed outside the holder 101. Turn on the vacuum pump 104 and cooperate with the vacuum tube 105 to generate negative air pressure in the vacuum suction cup 103, so as to firmly suck the linear guide pair;

[0035] Step 2: Place the holder 101 on the upper end of the polishing pad 8, adjust it to a suitable position, loosen the adjusting locking bolt 12 on the upper end of the support column 11, and then rotate the rotating ring 131, start the second motor 136 on the upper end of the external fixing block 132, and the second motor 136 drives the gear 137 to rotate. Since the gear 137 and the rack 135 are meshed, the guide slider 134 is driven to slide in the guide groove 133, and the horizontal connecting plate 141 moves synchronously until the adjusting screw 142 stops close to the center of the holder 101, rotate the adjusting screw 142, and the pressing block 143 and the anti-skid pad 144 descend to apply pressure to the holder 101;

[0036] Step 3: bend the universal bamboo tube 18 to adjust it to a suitable position and liquid outlet angle, turn on the liquid supply pump 16, draw the polishing liquid in the polishing liquid storage box 2 through the liquid inlet pipe 17 and spray it on the polishing table 7 through the universal bamboo tube 18, turn on the first motor 6 at the upper end of the support plate 5, drive the polishing table 7 to rotate, and complete the polishing operation;

[0037] Step 4: The polishing liquid and waste chips are blocked by the sleeve 92, and then flow into the polishing machine frame 1, and are filtered through the pull-out limit assembly 3 and the filter screen 4 inside another pull-out limit assembly 3. The polishing liquid is then returned to the polishing liquid storage box 2 for reuse. The inspection door 15 is opened, the polishing liquid is checked regularly, and then new polishing liquid is added or replaced. When the filter screen 4 needs to be cleaned, the filter screen 4 is pushed upward from the lower end, and the limit counterweight plate 35 is upward, driving the counterweight plug column 34 in the pull-out fixed seat 31 to move upward until the lower end of the filter screen 4 is higher than the upper end of the limit protrusion 33, and then the filter screen 4 is moved forward, and the filter screen 4 is removed from the opening groove 32. The filter screen 4 is cleaned or replaced, and then the previous steps are reversed to reinstall the filter screen 4.

[0038] Through the above steps, a vacuum adsorption mechanism is added to further adsorb the product, effectively maintaining the stability of the product during polishing, and can adsorb products of different specifications, with greater versatility. By filtering and recovering the polishing liquid, the polishing liquid can be recycled, greatly reducing the amount of polishing liquid used, thereby reducing the cost of polishing.

[0039] The embodiments of the present invention are described in detail above with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge scope of those skilled in the art without departing from the spirit of the present invention.

Claims

1. A polishing device for a silent linear guide pair, comprising a polishing frame (1); characterized in that: The polishing machine frame (1) also includes a polishing liquid storage box (2), a pull-out limit assembly (3), a filter screen (4), a support plate (5), a first motor (6), a polishing table (7), a polishing pad (8), an anti-splash assembly (9), a polishing head assembly (10), a support column (11), an adjustment locking bolt (12), a telescopic adjustment assembly (13), a pressurizing assembly (14), an inspection door (15), a liquid supply pump (16), a liquid inlet pipe (17) and a universal bamboo tube (18); the polishing liquid storage box (2) is fixedly connected to the upper end of the bottom of the polishing machine frame (1); the inner walls on both sides of the polishing machine frame (1) are fixedly connected to A pull-out limit assembly (3); a filter screen (4) is connected to the pull-out limit assembly (3) and another pull-out limit assembly (3); a support plate (5) is fixedly connected to the inner wall of the rear side of the polishing frame (1); a first motor (6) is fixedly connected to the upper end of the support plate (5); a polishing table (7) is fixedly connected to the upper end of the motor shaft of the first motor (6); a polishing pad (8) is adhesively connected to the upper end of the polishing table (7); an anti-splash assembly (9) is fixedly connected to the upper end of the polishing frame (1); a polishing head assembly (10) is movably connected to the upper end of the polishing pad (8); the upper end of the polishing frame (1) is fixedly connected to the polishing table (7); ) support columns (11) are equidistantly distributed in an annular shape; the upper end of the support column (11) is threadedly connected with an adjusting locking bolt (12); the outer side of the adjusting locking bolt (12) is movably connected with a telescopic adjustment component (13); the inner end of the telescopic adjustment component (13) is fixedly connected with a pressurizing component (14); the front end of the polishing frame (1) is rotatably connected with an inspection door (15) symmetrically distributed on the left and right; the rear end of the polishing frame (1) is fixedly connected with a liquid supply pump (16); a liquid inlet pipe (17) is installed between the inlet end of the liquid supply pump (16) and the polishing liquid storage box (2); a universal bamboo is installed at the outlet end of the liquid supply pump (16) The polishing head assembly (10) comprises a retaining frame (101); a lifting cylinder (102) is installed at the upper end of the retaining frame (101); a vacuum suction cup (103) is fixedly connected to the telescopic end of the lower side of the lifting cylinder (102); the telescopic adjustment assembly (13) comprises a rotating ring (131); an external fixing block (132) is fixedly connected to the outer side of the rotating ring (131); a guide groove (133) is formed at the upper end of the external fixing block (132); a guide slider (134) is slidably connected in the guide groove (133); and a rack (135) is fixedly connected to the upper end of the guide slider (134).

2. A polishing device for a silent linear guide pair according to claim 1, characterized in that: The pull-out limit assembly (3) comprises a pull-out fixed seat (31); an open slot (32) is provided inside the pull-out fixed seat (31); a limit convex block (33) is fixedly connected to the upper end of the bottom of the front side of the open slot (32); a counterweight plug post (34) symmetrically distributed front and back is inserted into the pull-out fixed seat (31); and the upper and lower ends of the counterweight plug post (34) are fixedly connected to a limit counterweight plate (35).

3. A polishing device for a silent linear guide pair according to claim 2, characterized in that: The sum of the heights of the limiting protrusion (33), the filter screen (4) and the limiting counterweight plate (35) is smaller than the height of the opening slot (32); and the filter screen (4) is installed in the opening slot (32).

4. A polishing device for a silent linear guide pair according to claim 1, characterized in that: The splash-proof assembly (9) comprises a fixing ring (91); a clamping sleeve (92) is sleeved on the outer side of the upper end of the fixing ring (91); the outer surface of the fixing ring (91) is provided with inner plug holes (93) symmetrically distributed on the left and right; the outer side of the clamping sleeve (92) is provided with outer plug holes (94) corresponding to the inner plug holes (93); positioning pins (95) are inserted into the inner plug holes (93) and the outer plug holes (94); a pull plate (96) is fixedly connected to the outer side of the positioning pin (95); and a spring (97) is fixedly connected between the pull plate (96) and the clamping sleeve (92).

5. The polishing device for a silent linear guide pair according to claim 1, characterized in that: The polishing head assembly (10) further comprises a vacuum pump (104) installed at the upper end of the retaining frame (101); a vacuum tube (105) is installed between the vacuum pump (104) and the vacuum suction cup (103); and the diameter of the retaining frame (101) is equal to the diameter of the polishing table (7).

6. A polishing device for a silent linear guide pair according to claim 1, characterized in that: Four retaining frames (101) are provided; the sum of the areas of the retaining frames (101) is smaller than the area of ​​the polishing table (7).

7. A polishing device for a silent linear guide pair according to claim 1, characterized in that: The telescopic adjustment assembly (13) also includes a second motor (136) mounted on the upper end of the outer fixing block (132); a gear (137) meshingly connected to the rack (135) is mounted on the outer side of the output shaft of the second motor (136); and the rotating ring (131) is sleeved on the outer side of the adjusting locking bolt (12).

8. The polishing device for a silent linear guide pair according to claim 1, characterized in that: The pressurizing assembly (14) comprises a horizontal connecting plate (141); the horizontal connecting plate (141) is internally threadedly connected with an adjusting screw rod (142); the lower end of the adjusting screw rod (142) is sequentially fixedly connected with a pressing block (143) and an anti-slip pad (144).

9. A polishing method for a silent linear guide pair, characterized in that A polishing device for a silent linear guide pair according to any one of claims 1 to 7, comprising the following steps: Step 1: Select a holder (101) of appropriate size according to the specifications of the linear guide pair, and determine the number of holders (101). Stick a suitable polishing pad (8) to the surface of the polishing table (7) according to the polishing requirements, then pull the pull plate (96) outward, the spring (97) is stretched, the ferrule (92) is put on the outside of the fixing ring (91), and the ferrule (92) is rotated to align the inner plug hole (93) and the outer plug hole (94). Under the action of the rebound force of the spring (97), the ferrule (92) is positioned. The column (95) is inserted into the inner insertion hole (93), and the clamping sleeve (92) can prevent the retaining frame (101) from moving to the outside of the polishing pad (8) to ensure the polishing effect. According to the height of the linear guide pair, the lifting cylinder (102) controls the lifting of the vacuum suction cup (103) to ensure that the linear guide pair is partially exposed outside the retaining frame (101). The vacuum pump (104) is turned on and cooperated with the vacuum tube (105) to generate negative air pressure in the vacuum suction cup (103), thereby firmly sucking the linear guide pair; Step 2: Place the holder (101) on the upper end of the polishing pad (8), adjust it to a suitable position, loosen the adjusting locking bolt (12) on the upper end of the support column (11), then rotate the rotating ring (131), start the second motor (136) on the upper end of the external fixing block (132), and the second motor (136) drives the gear (137) to rotate. Due to the meshing of the gear (137) and the rack (135), the guide slider (134) is driven to slide in the guide groove (133), and the horizontal connecting plate (141) moves synchronously until the adjusting screw (142) stops near the center of the holder (101), rotate the adjusting screw (142), and the pressing block (143) and the anti-skid pad (144) descend to apply pressure to the holder (101); Step 3: bend the universal bamboo tube (18) to adjust it to a suitable position and liquid outlet angle, start the liquid supply pump (16), draw the polishing liquid in the polishing liquid storage box (2) through the liquid inlet pipe (17) and spray it on the polishing table (7) through the universal bamboo tube (18), start the first motor (6) at the upper end of the support plate (5), drive the polishing table (7) to rotate, and complete the polishing operation; Step 4: The polishing liquid and waste chips are blocked by the sleeve (92), and then flow into the polishing machine frame (1), and are filtered through the pull-out limit assembly (3) and the filter screen (4) inside the other pull-out limit assembly (3). The polishing liquid is then returned to the polishing liquid storage box (2) for reuse. The inspection door (15) is opened, the polishing liquid is checked regularly, and then new polishing liquid is added or replaced. When the filter screen (4) needs to be cleaned, the filter screen (4) is pushed upward from the lower end, and the limit counterweight plate (35) is upward, driving the counterweight plug (34) in the pull-out fixed seat (31) to move upward until the lower end of the filter screen (4) is higher than the upper end of the limit protrusion (33), and then the filter screen (4) is moved forward and removed from the opening groove (32). The filter screen (4) is cleaned or replaced, and then the previous steps are reversed to reinstall the filter screen (4).