Ion beam current uniformity measuring device

Abstract

The invention provides an ion beam uniformity measuring device, which comprises a body, a central electrode, a plurality of edge electrodes and an adjusting assembly, and is characterized in that the body is provided with a receiving surface facing an ion beam incident direction, and the central electrode is fixedly arranged at the central position of the receiving surface and is provided with a first measuring end exposed on the receiving surface; the edge electrodes are movably arranged on the receiving face and provided with second measuring ends capable of being exposed on the receiving face, and the adjusting assembly can move the edge electrodes respectively so as to adjust the distance between the edge electrodes and the central electrode. The problem that in the prior art, when the uniformity of ion sources in different ranges needs to be measured when different wafers are machined, a measuring device needs to be replaced repeatedly is solved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing, and in particular to an ion beam uniformity measuring device. Background Art

[0002] The ion beam source is the core component of the IBE etcher, and its uniformity plays a decisive role in the uniformity of the etching process of the IBE etcher. Poor uniformity will not only lead to a decrease in the performance or efficiency of the etching process, but even cause the failure of the etching process. Therefore, how to accurately measure the uniformity of the ion beam source density distribution is of great significance.

[0003] For etching wafers of different sizes, it is necessary to develop ion beam sources of different sizes. In the process of ion beam source development, it is necessary to measure the uniformity of ion beam sources of different sizes. For example, for the ion beam source corresponding to a 4-inch wafer, it is necessary to measure the uniformity of the ion source within a diameter of 100 mm; for the ion beam source corresponding to an 8-inch wafer, it is necessary to measure the uniformity of the ion source within a diameter of 200 mm; for the ion beam source corresponding to a 12-inch wafer, it is necessary to measure the uniformity of the ion source within a diameter of 300 mm. In addition, when measuring an ion source of a given size, it is necessary to adjust the position of the measuring electrode with high precision to measure the ion beam current density and its uniformity at different positions. The current method is to open the vacuum chamber, replace measuring devices of different sizes, and then perform measurements. However, each time the chamber is opened and replaced with a measuring device of different sizes, not only increases the R&D cost, but also reduces the R&D efficiency and harms the life of the chamber. Summary of the invention

[0004] The present invention aims to at least solve the problem in the prior art that the measuring device needs to be repeatedly replaced when the uniformity of ion sources in different ranges needs to be measured when processing different wafers, and proposes an ion beam uniformity measuring device.

[0005] To achieve the purpose of the present invention, an ion beam uniformity measuring device is provided, comprising a body, a central electrode, a plurality of edge electrodes and an adjustment assembly, wherein the body is provided with a receiving surface facing the ion beam injection direction, the central electrode is fixedly arranged at the center position of the receiving surface and is provided with a first measuring end exposed on the receiving surface;

[0006] The edge electrode is movably arranged on the receiving surface and is provided with a second measuring end capable of being exposed on the receiving surface. The adjustment component can move the plurality of edge electrodes respectively to adjust the spacing between the plurality of edge electrodes and the central electrode.

[0007] Optionally, the plurality of edge electrodes are arranged along a circular array to form at least one edge electrode group, and the edge electrode group is arranged concentrically with the central electrode.

[0008] Optionally, the adjustment component is provided with a slide structure, the slide structure is arranged on the receiving surface, and the edge electrode can move along the slide structure.

[0009] Optionally, the slideway structure includes a plurality of slideways, the plurality of slideways are respectively extended along the radial direction of the receiving surface, and the plurality of edge electrodes are arranged in the plurality of slideways in a one-to-one correspondence and can move along the extension direction of the slideways.

[0010] Optionally, the slideway is arranged to penetrate the body in the axial direction, a first limiter is arranged on the inner side wall extending in the length direction of the slideway, and the edge electrode is provided with a second limiter matching the first limiter.

[0011] Optionally, the main body includes a fixing plate and a fixing ring fixedly arranged along the outer circumferential surface of the fixing plate, the receiving surface is arranged on the fixing plate, and one end of the slideway extends to the edge of the fixing plate.

[0012] Optionally, the adjustment component also includes a sliding rod, a slider capable of moving along the sliding rod, and a plurality of connecting rods. The sliding rod is fixedly arranged at the center of the receiving surface and extends in a direction perpendicular to the receiving surface. The plurality of connecting rods are arranged one-to-one correspondingly to the plurality of edge electrodes. The first end of the connecting rod is hinged to the slider, and the second end of the connecting rod is hinged to the side of the edge electrode facing away from the second measuring end.

[0013] Optionally, the adjustment component also includes a driving source, which is used to drive the slider to slide along the slide rod; the ion beam uniformity measurement device also includes a control component, which is electrically connected to the driving source, and the control component controls the slider to slide along the slide rod by controlling the driving source.

[0014] Optionally, the slide rod is a lead screw, the slider has an internal threaded hole matching the lead screw, and the driving source is connected to the lead screw for driving the lead screw to rotate so as to drive the slider to move along the axial direction of the lead screw.

[0015] Optionally, the ion beam uniformity measuring device further comprises a measuring component, the measuring component comprises a current measuring device and a first connecting wire; the central electrode is provided with a central measuring electrode, the central measuring electrode is provided with a first collecting end for receiving the ion beam;

[0016] The slide bar is insulated and connected to the central measuring electrode. A first connection channel is provided on the slide bar. One end of the first connection wire is electrically connected to the current measuring device. The other end of the first connection wire can pass through the first connection channel and be electrically connected to the first collecting end.

[0017] Optionally, the ion beam uniformity measuring device further includes a measuring component, the measuring component includes a current measuring device and a plurality of second connecting wires, the plurality of second connecting wires are arranged in one-to-one correspondence with the plurality of connecting rods; the edge electrode is provided with an edge measuring electrode, the edge measuring electrode is provided with a second collecting end for receiving the ion beam;

[0018] The connecting rod is insulated and connected to the edge measurement electrode. A second connection channel is provided on the connecting rod. The first ends of the plurality of second connection wires are electrically connected to the current measuring device. The second ends of the plurality of second connection wires can respectively pass through their corresponding second connection channels and be electrically connected to the second collecting end.

[0019] Optionally, the central electrode is provided with a central measuring electrode and a first insulating sleeve, the first insulating sleeve is made of an insulating material, the first insulating sleeve is provided to cover the outer side of the central measuring electrode, and the first insulating sleeve is further provided with a first opening capable of exposing the first measuring end;

[0020] The ion beam uniformity measuring device also includes a support member, which is arranged in contact with the bottom of the first insulating sleeve and is fixedly connected to the body.

[0021] Optionally, the central measuring electrode includes a first selection end, a first insulating ring, a first electron screening end, a second insulating ring and a first collecting end which are sequentially stacked along the ion beam flow direction.

[0022] Optionally, the edge electrode includes an edge measuring electrode and a second insulating sleeve, the second insulating sleeve is made of insulating material, the second insulating sleeve is arranged to cover the outer side of the edge measuring electrode, the second insulating sleeve is also provided with a second opening capable of exposing the second measuring end, and the second limiter is arranged on the second insulating sleeve.

[0023] Optionally, the edge measurement electrode includes a second selection end, a third insulating ring, a second electron screening end, a fourth insulating ring and a second collecting end which are sequentially stacked and arranged along the ion beam flow direction.

[0024] The present invention has the following beneficial effects: by utilizing the adjustment component in the above technical solution, a plurality of edge electrodes are arranged around a central electrode with a central electrode as the center, and the spacing distance between the edge electrodes and the central electrode can be adjusted. The edge electrodes and the central electrode can receive ion beams, and the current values ​​after the edge electrodes and the central electrode receive the ion beams are measured, and the ion beam uniformity of the area enclosed by the edge electrodes is measured through calculation. Since the spacing between the edge electrodes and the central electrode is adjustable, the area of ​​the enclosed area can be adjusted according to different requirements, and the uniformity of the ion beam in the enclosed area can be measured. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 A schematic diagram of the structure of an embodiment of an ion beam uniformity measuring device used in the present invention;

[0026] Figure 2 It is a schematic diagram of the cross-sectional structure of the body adopted by the present invention;

[0027] Figure 3A schematic structural diagram of another embodiment of the main body adopted by the present invention;

[0028] Figure 4 A schematic diagram of the structure of the central electrode used in the present invention;

[0029] Figure 5 A schematic diagram of the structure of the edge electrode used in the present invention;

[0030] Figure 6 This is a schematic diagram of the structure of the ion beam uniformity measurement device used in the present invention disposed in an etcher.

[0031] Reference numerals

[0032] 100-body, 110-fixed plate, 111-receiving surface, 120-fixed ring, 200-center electrode, 210-first collecting end, 220-first selecting end, 230-first insulating ring, 240-first electron screening end, 250-second insulating ring, 260-first insulating sleeve, 300-edge electrode, 310-second collecting end, 320-second selecting end, 330-third insulating ring, 340-second electron screening end , 350-fourth insulating ring, 360-second insulating sleeve, 361-second limiter, 400-adjusting component, 410-slideway, 411-first limiter, 420-slide rod, 421-first connection channel, 430-slider, 440-connecting rod, 441-second connection channel, 450-driving source, 500-control component, 600-ion beam, 700-support, 800-insulator, 900-current measuring device,

[0033] 910 - first connecting wire, 920 - second connecting wire, 1000 - process chamber, 1010 - connecting flange, 1100 - ion source generation system, 1200 - lower electrode system, 1300 - first fixed shell,

[0034] 1400 - second fixed shell. DETAILED DESCRIPTION

[0035] In order to enable those skilled in the art to better understand the technical solution of the present invention, the ion beam uniformity measurement device provided by the present invention is described in detail below with reference to the accompanying drawings.

[0036] refer to Figures 1 to 6As shown, in order to achieve the purpose of the present invention, an ion beam uniformity measuring device is provided, which includes a body 100, a center electrode 200, a plurality of edge electrodes 300 and an adjusting component 400. The body 100 is provided with a receiving surface 111 facing the injection direction of the ion beam 600. The center electrode 200 is fixedly arranged at the center position of the receiving surface 111 and is provided with a first measuring end exposed on the receiving surface 111; the edge electrode 300 is movably arranged on the receiving surface 111 and is provided with a second measuring end that can be exposed on the receiving surface 111. The adjusting component 400 can move the plurality of edge electrodes 300 to ... The edge electrode 300 is used to adjust the spacing between the plurality of edge electrodes 300 and the center electrode 200. For example, in the case where the plurality of edge electrodes 300 surround the center electrode 200 to form an annular structure, the spacing between the plurality of edge electrodes 300 and the center electrode 200 can be made equal by adjusting the components; in the case where the plurality of edge electrodes 300 surround the center electrode 200 to form a plurality of annular structures with different radii, the spacing between the plurality of edge electrodes 300 and the center electrode 200 in the same annular structure can be made equal by adjusting the components, so as to increase the detection area and improve the detection accuracy.

[0037] It should be noted that for etching wafers of different sizes, it is necessary to measure the uniformity of the ion beam source within different size ranges. During the measurement process, it is necessary to adjust the position of the measuring electrode with high precision to measure the ion beam current density and its uniformity at different positions. At the same time, wafer processing is usually carried out in a vacuum environment. Accordingly, the processing equipment is usually provided with a vacuum chamber. In the prior art, it is necessary to open the vacuum chamber, replace the measuring devices of different sizes, and then perform the measurement. However, each time the chamber is opened and replaced with a measuring device of a different size, the vacuum environment of the vacuum chamber will be destroyed, and the vacuum equipment needs to be reused to restore the vacuum state in the chamber. Such a measurement process requires a lot of time and cost, which reduces the efficiency of research and development. In addition, due to the repeated opening of the chamber, the sealing of the chamber will be affected, which may harm the life of the chamber.

[0038] by Figure 1Taking the ion beam uniformity measuring device shown as an example, the adjustment component 400 in the above technical solution is used to move multiple edge electrodes 300 so that the multiple edge electrodes 300 can form a measurement area centered on the central electrode 200 and arranged around the central electrode 200, wherein the multiple edge electrodes 300 can be arranged to form a ring or a multi-ring structure around the central electrode 200, then the constructed measurement area is the area enclosed by the edge electrodes of the outermost ring, the edge electrodes 300 and the central electrode 200 can receive the ion beam 600, and the current values ​​after the edge electrodes 300 and the central electrode 200 receive the ion beam 600 are measured, and then the uniformity of the ion beam 600 in the area enclosed by the edge electrodes 300 is measured through calculation. At the same time, the adjustment component 400 can also adjust the spacing distance between the edge electrode 300 and the center electrode 200 by moving the edge electrode 300 closer to or away from the center electrode 200 at the same time, thereby adjusting the area of ​​the measurement area enclosed by the edge electrode 300, thereby achieving the purpose of measuring the uniformity of the ion beam 600 in different enclosed areas without changing the equipment.

[0039] Among them, the receiving surface 111 is set to be perpendicular to the direction of the ion beam 600 so that the ion beam 600 can bombard the receiving surface 111. The first measuring end of the center electrode 200 and the second measuring end of the edge electrode 300 are used to receive the ion beam 600. Since the main body 100 can be made of high temperature resistant and sputtering resistant materials, such as graphite, molybdenum and other materials, which will block the ion beam 600, the first measuring end and the second measuring end need to be exposed to the receiving surface so as to receive the ion beam.

[0040] The structures measured for the edge electrode 300 and the center electrode 200 can be calculated to obtain the uniformity of the ion beam in the following manner:

[0041] The central electrode 200 and the plurality of edge electrodes 300 are sequentially arranged as 1-N, i.e., 1 is the central electrode 200, and 2-N are the numbers of the plurality of edge electrodes 300, respectively. The distances between the plurality of edge electrodes 300 and the central electrode 200 are adjusted so that the enclosed area of ​​the plurality of edge electrodes 300 is the measurement area. The ion current amplitudes (current values) generated by the edge electrodes 300 and the central electrode 200 receiving the ion beam are measured, and the corresponding ion current amplitudes I1 to I N , compare I1 to I N The magnitude of the ion current amplitude is obtained, and the maximum and minimum values ​​of the ion current amplitude are set as I max and I min , the uniformity U of the ion beam in the measurement area is calculated according to the following formula:

[0042] U=(I max / SI min / S) / (I max / S+I min / S);

[0043] The measuring parts of the central electrode 200 and the edge electrode 300 may adopt the same structure, and S is the area of ​​the part actually used for receiving the ion beam in the measuring parts of the central electrode 200 and the edge electrode 300 .

[0044] In addition, the adjustment component 400 can have multiple implementations, such as a robotic arm, a telescopic rod, a slide rail, etc. can all be used as implementations. Taking a robotic arm as an example, the edge electrodes 300 can be grabbed by the robotic arm and then placed one by one at the measurement position to achieve the purpose of moving multiple edge electrodes 300.

[0045] Among them, multiple edge electrodes 300 form at least one edge electrode group along a circular array, and the edge electrode group is arranged concentrically with the center electrode 200, that is, a state is formed in which the edge electrode group surrounds the center electrode 200 with the center as the center. When only one group of edge electrode groups is set, the radius of the circular array formed by the edge electrode group can be the radius of the measurement area.

[0046] As an optional embodiment, the adjustment component 400 is provided with a slide structure, and the slide structure is provided on the receiving surface 111, and the edge electrode 300 can move along the slide structure. The slide structure can guide the movement of the edge electrode 300 on the receiving surface so that it can move to the predetermined position more accurately, wherein the slide structure can have a variety of embodiments, which may include one or more slides, these slides can extend in a straight direction, can also be curved slides, and can also be a structural form composed of a straight line and a curve. The straight slide can be set to be symmetrical along a straight line passing through the center position on the receiving surface, and two edge electrodes 300 are arranged on the straight slide. The adjustment component 400 can move the edge electrode 300 along the above-mentioned straight slide and make it equidistant relative to the center electrode 200. Such a setting scheme can also achieve the purpose of measuring the uniformity of ion beams in different ranges. In addition, if Figure 3 As shown, as an optional embodiment, the above-mentioned linear slides can be arranged in parallel with multiple ones, a part of the linear slides can be extended in a direction parallel to any radial straight line of the receiving surface 111, and another part of the linear slides can be located on the radial straight line. Similarly, the curved slides can also have multiple embodiments to achieve the purpose of guiding the edge electrode 300 to slide.

[0047] As a specific implementation method, Figure 1-2As shown, the slideway structure includes a plurality of slideways 410, and the plurality of slideways 410 are respectively extended in the radial direction of the receiving surface 111, and the plurality of edge electrodes 300 are arranged in the plurality of slideways 410 in a one-to-one correspondence, and can move along the extension direction of the slideways 410. Any number of slideways 410 can be provided, and they are evenly arranged in the circumferential direction of the receiving surface 111, that is, the angles between two adjacent slideways 410 are equal. The figure shows that 8 slideways 410 are provided, which is only an example and should not be regarded as a limitation to the present application.

[0048] In addition, if Figure 1 As shown, one end of each slideway 410 close to the center electrode 200 gradually converges to the center position, but the slideway 410 has a certain width, resulting in that after converging to a certain extent, one end of multiple slideways 410 will be connected and cannot continue to extend. This position is still at a certain distance from the center electrode 200, and the minimum measurement range of the device is the distance of the above interval. In order to reduce the lower limit of the measurement range of the device as much as possible, the width of the slideway 410 can be set as narrow as possible to reduce the distance between the slideway 410 and the center electrode 200.

[0049] The slideway 410 can be implemented in various ways, such as a slide groove, a polished rod, a slide rail, etc., and can be selected according to actual conditions. Figure 1-2 As shown in the example, the slide 410 is arranged in the axial direction through the main body 100, and a first limiter 411 is arranged on the inner side wall extending in the length direction of the slide 410, and the edge electrode 300 is provided with a second limiter 361 matching the first limiter 411. In order to facilitate the setting of the slide 410, simplify the structure of the slide 410, and prevent it from being corroded by the ion beam, the slide 410 is arranged with the help of the main body 100. As mentioned above, the main body 100 can be made of high temperature resistant and sputtering resistant materials, and can block the bombardment of the ion beam. The slide 410 is recessed in the main body 100, so that the main body 100 is used to protect the structure of the slide 410. The first limiter 411 matches the second limiter 361, so as to prevent the edge electrode 300 from falling off the slide 410 and limit the edge electrode 300 to slide only along the slide 410. There is no special limitation on the implementation of the first limiter 411 and the second limiter 361. Figure 1-2 As shown in the example, the first limiting member 411 is a groove extending along the inner wall of the slide 410, and the second limiting member 361 is a protrusion matching the groove, and the protrusion is embedded in the groove, so that the edge electrode 300 is limited in the slide 410 and can slide smoothly along the slide 410.

[0050] In order to facilitate the installation of the edge electrode 300 into the slideway 410, as shown in FIG. Figure 1-2As shown, the body 100 includes a fixing plate 110 and a fixing ring 120 fixedly arranged along the outer circumference of the fixing plate 110, the receiving surface 111 is arranged on the fixing plate 110, and one end of the slideway 410 extends to the edge of the fixing plate 110. Through the above structure, the edge electrode 300 can be installed through the opening of the slideway 410 located at the edge of the fixing plate 110, and then the port of the slideway 410 is closed by the fixing ring 120. The fixing ring 120 can be as shown in FIG. Figure 1 As shown, it is composed of two identical semicircles, which are mutually buckled on the outer circumference of the fixing plate 410, thereby completing the setting of the fixing ring 120. The fixing ring 120 and the fixing plate 110 can be made of high temperature resistant and sputtering resistant materials, such as graphite, molybdenum and the like.

[0051] In order to drive the edge electrode 300 to slide along the slideway 410, a variety of driving structures may be provided, such as providing a telescopic rod in the slideway 410 along the extension direction of the slideway 410, so as to adjust the length of the telescopic rod to adjust the position of the edge electrode 300 in the slideway 410. Alternatively, the edge electrode 300 includes a driving wheel or other structure to directly drive the edge electrode 300 to move in the slideway 410.

[0052] As an optional implementation, Figure 1-2 As shown, the adjustment assembly also includes a slide bar 420, a slider 430 that can move along the slide bar 420, and a plurality of connecting rods 440. The slide bar 420 is fixedly arranged at the center of the receiving surface 111 and extends in a direction perpendicular to the receiving surface 111. The plurality of connecting rods 440 are arranged one by one in correspondence with the plurality of edge electrodes 300. The first end of the connecting rod 440 is hinged to the slider 430, and the second end of the connecting rod 440 is hinged to the side of the edge electrode 300 away from the second measuring end. The slide bar 420 is a lead screw, and the slider 430 has an internal threaded hole that matches the lead screw. The driving source 450 is connected to the lead screw and is used to drive the lead screw to rotate so as to drive the slider 430 to move along the axial direction of the lead screw. The first end of the connecting rod 440 can rotate relative to the slider 430, and the second end can rotate relative to the edge electrode 300, and the second end can only move along the extension direction of the slideway 410 with the edge electrode 300. Therefore, as the slider 430 moves, the connecting rod 440 can rotate, thereby driving the second end of the connecting rod 440 to move along the slideway 410. The slide bar 420 is arranged at the center of the receiving surface 111, that is, corresponding to the center electrode 200, so that the movement mode of multiple connecting rods 440 is the same, thereby achieving the purpose of adjusting the positions of multiple edge electrodes 300 at the same time, and the moving distances of multiple edge electrodes 300 are equal, so that the adjustment component 400 can adjust multiple edge electrodes 300 to gather or disperse at the same time with the center electrode 200 as the center.

[0053] The slide bar 420 is fixed in the process chamber by a fixing structure, and can also be directly connected to the center electrode 200 to achieve the purpose of fixing. Since the connecting rod 440 needs to be connected to the edge electrode 300, the body 100 or the slideway 410 needs to be provided with a corresponding avoidance structure so that the connecting rod 440 can pass through and connect to the edge electrode 300. Figure 1-2 The slideway 410 shown is arranged to penetrate the body 100 along the thickness direction, so that the bottom of the slideway 410 can be connected to the side of the body 100 away from the receiving surface 111, and the connecting rod 440 can be connected to the edge electrode 300 through the bottom of the slideway 410.

[0054] In order to automatically adjust the position of the edge electrode 300, as Figure 1 as well as Figure 6 As shown, the adjustment component 400 also includes a driving source 450, which is used to drive the slider 430 to slide along the slide bar 420; the ion beam uniformity measurement device also includes a control component 500, which is electrically connected to the driving source 450, and the control component 500 controls the slider 430 to slide along the slide bar 420 by controlling the driving source 450. Specifically, the driving source 450 can be built with a feedback circuit to feedback its position to the control component 500; or, the control component 500 can also measure the specific position of the slider 430 through a sensor such as a position sensor, that is, the distance of the slider relative to the center electrode 200, and the length of the connecting rod 440 is known, so the distance between the edge electrode 300 and the center electrode 200 can be calculated by the Pythagorean theorem. Of course, the position of the edge electrode 300 can also be directly measured by using a distance sensor, a position sensor or other equipment, and fed back to the control component 500 at the same time. When the edge electrode 300 moves to the target position, the control component 500 can control the driving source 450 to stop operating.

[0055] In order to measure the current value after the central electrode receives the ion beam, such as Figure 4 As shown, the ion beam uniformity measuring device further includes a measuring component, which includes a current measuring device 900 and a first connecting wire 910; the central electrode 200 is provided with a central measuring electrode, and the central measuring electrode is provided with a first collecting end 210 for receiving the ion beam; the sliding rod 420 is insulated and connected to the central measuring electrode, and a first connecting wire channel 421 is provided on the sliding rod 420, one end of the first connecting wire 910 is electrically connected to the current measuring device 900, and the other end of the first connecting wire 910 can pass through the first connecting wire channel 421 and be electrically connected to the first collecting end 210. Among them, the current measuring device 900 can be an ammeter.

[0056] The central measuring electrode can be Figure 4As shown, it includes a first selection end 220, a first insulating ring 230, a first electron screening end 240, a second insulating ring 250 and a first collecting end 210 which are sequentially arranged along the flow direction of the ion beam, wherein a channel for the ion beam to pass through is arranged in the center of the first selection end 220, the first insulating ring 230, the first electron screening end 240 and the second insulating ring 250, and the cross-sectional area of ​​the channel is the value of S in the formula for calculating the uniformity of the ion beam in the above technical solution.

[0057] A positive potential U1 is applied to the first selection end 220, a negative potential -U2 is applied to the first electronic screening end 240, and a negative potential -U3 is applied to the first collection end 210, and U3=U1+U2, wherein U1, U2, and U3 are all absolute values. Through the above settings, the different potentials applied to the first selection end 220 and the first electronic screening end 240 are used to screen the passing ion beam so that the ions therein can pass through and the electrons are separated. Since the ions are positively charged, a negative potential is applied to the first collection end 210 to collect the ions. In addition, to measure the uniformity of the ion beam, it is necessary to measure the number of ions passing through per unit time. However, since the ions can be accelerated or decelerated by the electric field, the number of ions collected per unit time increases or decreases. By making U3=U1+U2, the acceleration and deceleration process of the ions can be balanced, so that the overall speed of the ions is the same as that of the ions that have not undergone the acceleration and deceleration process, thereby avoiding the measurement error caused by the acceleration and deceleration effect of the electric field on the ions. The first insulating ring 230 and the second insulating ring 250 are made of insulating materials and serve to isolate other live parts from each other. Since the sliding rod 420 is usually also made of metal materials, it needs to be insulated and connected to the first collecting end 210. For example, Figure 4 As shown, the first collecting end 210 is connected via an insulator 800 . The insulator 800 may be made of insulating material and fixedly connected to the bottom of the first collecting end 210 .

[0058] In order to enable the current measuring device 900 to be electrically connected to the first collecting end 210 to measure the current generated by the ions collected by the first collecting end 210, as shown in FIG. Figure 3 As shown, a hollow first connection channel 421 may be provided in the slide rod 420, and the outlet end of the first connection channel 421 may be provided with an end connected to the slide rod 420 and the first collecting end 210. The first connection channel 421 can protect the first connecting wire 910 on the one hand, and simplify the wire setting on the other hand.

[0059] Similarly, if Figure 5As shown, the measurement assembly also includes a plurality of second connecting wires 920, and the plurality of second connecting wires 920 are arranged one by one with the plurality of connecting rods 440; the edge electrode 300 is provided with an edge measuring electrode, and the edge measuring electrode is provided with a second collecting end 310 for receiving the ion beam; wherein the connecting rod 440 is insulated and connected to the edge measuring electrode, and a second connecting channel 441 is arranged on the connecting rod 440, and the first ends of the plurality of second connecting wires 920 are electrically connected to the current measuring device 900, and the second ends of the plurality of second connecting wires 920 can respectively pass through their corresponding second connecting channels 441 and be electrically connected to the second collecting end 310. The edge measuring electrode can adopt the same structure as the central measuring electrode, and the edge measuring electrode includes a second selection end 320, a third insulating ring 330, a second electron screening end 340, a fourth insulating ring 350 and a second collecting end 310 which are sequentially arranged in a superimposed manner along the flow direction of the ion beam. Then similarly, the second selection end 320 and the second electron screening end 340 work together to screen the passing ion beam so that the ions therein can pass through and the electrons therein can be separated. The third insulating ring 330 and the fourth insulating ring 350 also play the role of insulation and isolation, and the second collecting end 310 is used to collect ions.

[0060] Similar to the sliding rod 420, in order to facilitate the connection between the second connecting wire 920 and the edge measurement electrode and protect the second connecting wire 920, a second connection channel 441 is provided in the connecting rod 440. The connecting rod 440 can also be connected to the edge measurement electrode through the insulator 800.

[0061] In addition, in order to insulate the central measuring electrode from the main body 100, the central electrode is provided with a central measuring electrode and a first insulating sleeve 260. The first insulating sleeve 260 is made of insulating material and is arranged to cover the outer side of the central measuring electrode. The first insulating sleeve 260 is also provided with a first opening capable of exposing the first measuring end. Furthermore, in order to strengthen the fixation of the first insulating sleeve 260, the ion beam uniformity measuring device further includes a support member 700. The support member 700 is arranged to fit the bottom of the first insulating sleeve 260 and is fixedly connected to the main body 100. The first insulating sleeve 260 can be as shown in FIG. Figure 4 As shown, the side wall of the central measuring electrode is insulated from the body 100. Accordingly, the sliding rod 420 can also be directly insulated and connected to the central electrode 200 through the first insulating sleeve 260.

[0062] Similar to the center electrode, Figure 5As shown, the edge electrode 300 includes an edge measuring electrode and a second insulating sleeve 360. The second insulating sleeve 360 ​​is made of insulating material and is arranged to cover the outer side of the edge measuring electrode. The second insulating sleeve 360 ​​is also provided with a second opening capable of exposing the second measuring end. As an embodiment, a second limiter 361 is arranged on the second insulating sleeve 360.

[0063] As an embodiment of disposing the ion beam uniformity measuring device in the process chamber 1000, Figure 6 As shown, an ion source generating system 1100 for generating an ion beam 600 is disposed on one side of the process chamber 1000, and a lower electrode system 1200 is disposed on the other side. An ion beam uniformity measuring device is disposed between the ion source generating system 1100 and the lower electrode system 1200. The ion beam uniformity measuring device may include a first fixed shell 1300 and a second fixed shell 1400. The first fixed shell 1300 and the second fixed shell 1400 may be fixedly disposed in the process chamber 1000 through a fixed structure. The first fixed shell 1300 and the second fixed shell 1400 may also play a role in protecting the adjusting component 400 and components such as connecting wires. In order to facilitate the various connecting lines of the ion beam uniformity measuring device to pass through the side wall of the process chamber 1000 and enable the process chamber 1000 to be sealed, a connecting flange 1010 may also be provided on the process chamber 1000, and the second fixed shell 1400 is connected to the connecting flange 1010, and various connecting lines may pass through the side wall of the process chamber 1000 through the connecting flange 1010.

[0064] It is to be understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present invention, but the present invention is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. An ion beam uniformity measuring device, characterized in that: It comprises a body, a central electrode, a plurality of edge electrodes and an adjustment component, wherein the body is provided with a receiving surface facing the ion beam injection direction, the central electrode is fixedly arranged at the center position of the receiving surface and is provided with a first measuring end exposed on the receiving surface; The edge electrode is movably arranged on the receiving surface and is provided with a second measuring end that can be exposed on the receiving surface. The adjustment component can move the plurality of edge electrodes respectively to adjust the spacing between the plurality of edge electrodes and the central electrode.

2. The ion beam uniformity measuring device according to claim 1, characterized in that: The plurality of edge electrodes are arranged in a circular array to form at least one edge electrode group, and the edge electrode group is arranged concentrically with the central electrode.

3. The ion beam uniformity measuring device according to claim 1, characterized in that: The adjustment component is provided with a slideway structure, the slideway structure is arranged on the receiving surface, and the edge electrode can move along the slideway structure.

4. The ion beam uniformity measuring device according to claim 3, characterized in that: The slideway structure comprises a plurality of slideways, and the plurality of slideways are respectively extended along the radial direction of the receiving surface. The plurality of edge electrodes are arranged in the plurality of slideways in a one-to-one correspondence and can move along the extension direction of the slideways.

5. The ion beam uniformity measuring device according to claim 4, characterized in that: The slideway is arranged to penetrate the body along the axial direction, a first limiting member is arranged on the inner side wall extending along the length direction of the slideway, and a second limiting member matching the first limiting member is arranged on the edge electrode.

6. The ion beam uniformity measuring device according to claim 4, characterized in that: The main body comprises a fixing plate and a fixing ring fixedly arranged along the outer peripheral surface of the fixing plate, the receiving surface is arranged on the fixing plate, and one end of the slideway extends to the edge of the fixing plate.

7. The ion beam uniformity measuring device according to claim 1, characterized in that: The adjustment assembly further includes a slide bar, a slider capable of moving along the slide bar, and a plurality of connecting rods. The slide bar is fixedly arranged at a position corresponding to the center of the receiving surface and extends in a direction perpendicular to the receiving surface. The plurality of connecting rods are arranged in one-to-one correspondence with the plurality of edge electrodes, the first end of the connecting rod is hinged to the slider, and the second end of the connecting rod is hinged to a side of the edge electrode away from the second measuring end.

8. The ion beam uniformity measuring device according to claim 7, characterized in that: The adjustment assembly further includes a driving source, and the driving source is used to drive the slider to slide along the slide rod; The ion beam uniformity measuring device further includes a control component, wherein the control component is electrically connected to the driving source, and the control component controls the sliding block to slide along the sliding rod by controlling the driving source.

9. The ion beam uniformity measuring device according to claim 8, characterized in that: The slide rod is a lead screw, the slider has an internal threaded hole matching the lead screw, and the driving source is connected to the lead screw for driving the lead screw to rotate so as to drive the slider to move along the axial direction of the lead screw.

10. The ion beam uniformity measuring device according to claim 7, characterized in that: The ion beam uniformity measuring device further comprises a measuring component, wherein the measuring component comprises a current measuring device and a first connecting wire; The central electrode is provided with a central measuring electrode, and the central measuring electrode is provided with a first collecting end for receiving an ion beam; The slide bar is insulated and connected to the central measuring electrode. A first connection channel is provided on the slide bar. One end of the first connection wire is electrically connected to the current measuring device. The other end of the first connection wire can pass through the first connection channel and be electrically connected to the first collecting end.

11. The ion beam uniformity measuring device according to claim 7, characterized in that: The ion beam uniformity measuring device further comprises a measuring assembly, wherein the measuring assembly comprises a current measuring device and a plurality of second connecting wires, wherein the plurality of second connecting wires are arranged in a one-to-one correspondence with the plurality of connecting rods; The edge electrode is provided with an edge measurement electrode, and the edge measurement electrode is provided with a second collecting end for receiving an ion beam; The connecting rod is insulated and connected to the edge measurement electrode, and a second connection channel is provided on the connecting rod. The first ends of the plurality of second connection wires are electrically connected to the current measuring device, and the second ends of the plurality of second connection wires can respectively pass through their corresponding second connection channels and be electrically connected to the second collecting end.

12. The ion beam uniformity measuring device according to claim 1, characterized in that: The central electrode is provided with a central measuring electrode and a first insulating sleeve, the first insulating sleeve is made of insulating material, the first insulating sleeve is arranged to cover the outer side of the central measuring electrode, and the first insulating sleeve is also provided with a first opening capable of exposing the first measuring end; The ion beam uniformity measuring device further comprises a support member, which is arranged to be attached to the bottom of the first insulating sleeve and is fixedly connected to the body.

13. The ion beam uniformity measuring device according to claim 12, characterized in that: The central measuring electrode comprises a first selection end, a first insulating ring, a first electron screening end, a second insulating ring and a first collecting end which are sequentially stacked and arranged along the flow direction of the ion beam.

14. The ion beam uniformity measuring device according to claim 5, characterized in that: The edge electrode includes an edge measuring electrode and a second insulating sleeve, the second insulating sleeve is made of insulating material, the second insulating sleeve is arranged to cover the outer side of the edge measuring electrode, the second insulating sleeve is also provided with a second opening capable of exposing the second measuring end, and the second limiter is arranged on the second insulating sleeve.

15. The ion beam uniformity measuring device according to claim 14, characterized in that: The edge measurement electrode comprises a second selection end, a third insulating ring, a second electron screening end, a fourth insulating ring and a second collecting end which are sequentially stacked and arranged along the flow direction of the ion beam.

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