Display panel, display device and preparation method of display panel

Abstract

The invention discloses a display panel, a display device and a preparation method of the display panel. The display panel comprises a substrate; the pixel defining layer is arranged on one side of the substrate, the pixel defining layer comprises pixel limiting parts and pixel openings defined by the pixel limiting parts, and light-emitting elements are arranged in the pixel openings; the isolation structure is arranged on the side, away from the substrate, of the pixel defining layer, the isolation structure comprises an isolation part and an isolation opening defined by the isolation part, and at least part of the orthographic projection of the isolation part on the substrate extends out of the orthographic projection of the pixel defining part on the substrate, or at least part of the orthographic projection of the isolation part on the substrate extends out of the orthographic projection of the pixel defining part on the substrate. At least part of the boundary of the orthographic projection of the isolation part on the substrate coincides with part of the boundary of the orthographic projection of the pixel limiting part on the substrate. The yield of the display panel can be improved, and the display quality of the display panel is ensured.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel, a display device, and a method for manufacturing a display panel. Background Art

[0002] With the development and popularization of display technology in recent years, display panels have been applied to various electronic devices, such as mobile phones, tablet computers or other portable electronic devices.

[0003] However, the inventors of the present application have discovered that the quality of current display panels needs to be further improved. Summary of the invention

[0004] The present application provides a display panel, a display device and a method for manufacturing a display panel, which can ensure the display quality of the display panel.

[0005] A first aspect of an embodiment of the present application provides a display panel, comprising: a substrate; a pixel definition layer, arranged on one side of the substrate, the pixel definition layer comprising a pixel defining portion and a pixel opening surrounded by the pixel defining portion, wherein a light-emitting element is arranged in the pixel opening; an isolation structure, arranged on a side of the pixel definition layer away from the substrate, the isolation structure comprising an isolation portion and an isolation opening surrounded by the isolation portion, wherein the orthographic projection of the isolation portion on the substrate at least partially extends beyond the orthographic projection of the pixel defining portion on the substrate, or, at least a portion of the boundary of the orthographic projection of the isolation portion on the substrate coincides with a portion of the boundary of the orthographic projection of the pixel defining portion on the substrate.

[0006] A second aspect of an embodiment of the present application provides a display panel, comprising: a substrate; a pixel definition layer, arranged on one side of the substrate, the pixel definition layer comprising a pixel defining portion and a pixel opening formed by the pixel defining portion, wherein a light-emitting element is arranged in the pixel opening; an isolation structure, arranged on a side of the pixel definition layer away from the substrate, the isolation structure comprising an isolation portion and an isolation opening formed by the isolation portion, wherein the orthographic projection of the pixel opening on the substrate at least partially extends within the orthographic projection of the isolation portion on the substrate, or, at least a portion of the boundary of the orthographic projection of the pixel opening on the substrate coincides with a portion of the boundary of the orthographic projection of the isolation portion on the substrate.

[0007] A third aspect of an embodiment of the present application provides a display device, comprising the display panel of any one of the above items.

[0008] A fourth aspect of an embodiment of the present application provides a method for preparing a display panel, the method comprising: forming a pixel definition layer and an isolation structure on one side of a substrate; wherein the pixel definition layer comprises a pixel defining portion and a pixel opening enclosed by the pixel defining portion, and the isolation structure comprises an isolation portion and an isolation opening enclosed by the isolation portion, wherein the orthographic projection of the isolation portion on the substrate at least partially extends beyond the orthographic projection of the pixel defining portion on the substrate, or, at least a portion of the boundary of the orthographic projection of the isolation portion on the substrate coincides with a portion of the boundary of the orthographic projection of the pixel defining portion on the substrate.

[0009] The beneficial effect is: the present application sets the isolation part's orthographic projection on the substrate to at least partially extend beyond the orthographic projection of the pixel defining part on the substrate, or, at least part of the boundary of the orthographic projection of the isolation part on the substrate coincides with part of the boundary of the orthographic projection of the pixel defining part on the substrate, that is, the present application sets at least part of the boundary of the pixel defining part not exceeding the boundary of the isolation part, so that the isolation part can protect at least part of the pixel defining part, avoiding damage to the surface of the pixel defining part when forming the functional layer in the light-emitting element, thereby avoiding the problem of discontinuity of the film layer in the light-emitting element caused by surface damage of the pixel defining part, thereby improving the yield of the display panel and ensuring the display quality of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work, among which:

[0011] Figure 1 It is a schematic structural diagram of an embodiment of a display panel of the present application;

[0012] Figure 2 yes Figure 1 Schematic diagram of some specific structures in ;

[0013] Figure 3 yes Figure 1 A schematic diagram of the structure of a middle substrate, a pixel definition layer, and an isolation structure in one embodiment;

[0014] Figure 4 yes Figure 1 A schematic diagram of the structure of a middle substrate, a pixel definition layer, and an isolation structure in another embodiment;

[0015] Figure 5 yes Figure 1 A schematic diagram of the structure of a middle substrate, a pixel definition layer, and an isolation structure in another embodiment;

[0016] Figure 6 yes Figure 1 A schematic diagram of the structure of a middle substrate, a pixel definition layer, and an isolation structure in another embodiment;

[0017] Figure 7 yes Figure 1 A schematic diagram of the structure of a middle substrate, a pixel definition layer, and an isolation structure in another embodiment;

[0018] Figure 8 It is a structural schematic diagram of an embodiment of a display device of the present application;

[0019] Fig. 9 is a diagram of a manufacturing process of a display panel of the present application in one embodiment;

[0020] Fig.10 is a diagram of a preparation process of a display panel of the present application in another embodiment;

[0021] Fig.11 It is a diagram of the preparation process of the display panel of the present application in another embodiment. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0023] It should be noted that the terms "first" and "second" in this application are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first" and "second" can explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units that are not listed, or optionally also includes other steps or units inherent to these processes, methods, products or devices.

[0024] See also Figure 1 , Figure 1 1 is a schematic structural diagram of an embodiment of a display panel of the present application. The display panel 100 includes a substrate 110 , a pixel definition layer 120 , a light emitting element 130 and an isolation structure 140 .

[0025] The substrate 110 plays a supporting role in the display panel 100. Figure 2 In one embodiment, the substrate 110 includes a substrate 111 and a driving circuit layer 112, wherein the substrate 111 may be a flexible substrate or a rigid substrate. When the substrate 111 is a flexible substrate, its material may be polyimide (PI), or it may be a multilayer structure in which organic layers and inorganic layers are alternately stacked. For example, the substrate 111 includes an inorganic layer, an organic layer, and an inorganic layer stacked in sequence. At this time, the multilayer structure in which the organic layer and the inorganic layer are alternately stacked can take into account the flexibility and strength of the substrate 111, so that the display panel 100 has a bendable function and can resist fracture and deformation; when the substrate 111 is a rigid substrate, its material may be glass or metal. The present application does not limit the structure of the substrate 111. The driving circuit layer 112 includes a driving circuit 1121, which is used to drive the light-emitting element 130 to emit light, wherein the driving circuit 1121 includes a transistor 11211 and a storage capacitor 11212 and other structures. The driving circuit 1121 may be, for example, a 2T1C circuit, a 7T1C circuit, a 7T2C circuit, or a 9T1C circuit, and the present application does not limit its specific structure. The "2T1C circuit" refers to a pixel circuit including two thin film transistors (T) and one capacitor (C) in the pixel circuit, and the other "7T1C circuit", "7T2C circuit", "9T1C circuit", etc. are analogous.

[0026] The pixel definition layer 120 is disposed on one side of the substrate 110, and the pixel definition layer 120 includes a pixel defining portion 121 and a pixel opening 122 formed by the pixel defining portion 121, and a light-emitting element 130 is disposed in the pixel opening 122. Specifically, the light-emitting element 130 is disposed in the pixel opening 122. The pixel defining portion 121 is used to define the light-emitting element 130, and is used to prevent the light emitted by adjacent light-emitting elements 130 from interfering with each other. Among them, the number of pixel openings 122 can be multiple, and a light-emitting element 130 is disposed in each pixel opening 122. Among them, the pixel defining portion 121 can be formed of an organic material such as polyimide (PI), polyamide, benzocyclobutene (BCB), acrylic resin or phenolic resin, or formed of an inorganic material such as SiNx. The present application does not limit the material of the pixel defining portion 121. In one embodiment, the pixel defining portion 121 is a grid-like structure as a whole, and the pixel opening 122 is the mesh in the grid-like structure.

[0027] Among them combined Figure 1 and Figure 2, the light-emitting element 130 includes a first electrode 131, a light-emitting material layer 132, and a second electrode 133 which are sequentially stacked in a direction Y away from the substrate 110. The light-emitting element 130 may be a top light-emitting element (emitting light in a direction Y away from the substrate 110) or a bottom light-emitting element (emitting light toward the substrate 110). In one embodiment, the first electrode 131 is an anode and the second electrode 133 is a cathode. In one embodiment, Figure 2 As shown, the first electrode 131 is electrically connected to the driving circuit 1121. In one embodiment, the light emitting element 130 may further include a hole injection layer, a hole transport layer, an electron blocking layer, an electron injection layer, an electron transport layer, a hole blocking layer and other film layers. The present application does not limit the specific structure of the light emitting element 130.

[0028] Continue reading Figure 1 , the isolation structure 140 is arranged on the side of the pixel definition layer 120 away from the substrate 110, and the isolation structure 140 includes an isolation portion 141 and an isolation opening 142 formed by the isolation portion 141. The isolation portion 141 can prevent the light from crosstalk between two adjacent light-emitting elements 130. In one embodiment, the orthographic projection of the light-emitting element 130 on the substrate 110 overlaps with the orthographic projection of the isolation opening 142 on the substrate 110 at least partially, that is, the light emitted by the light-emitting element 130 is emitted from the isolation opening 142. In one embodiment, the isolation portion 141 is conductive, and the second electrode 133 of the light-emitting element 130 is electrically connected to the isolation portion 141, so that a voltage can be applied to the second electrode 133 through the isolation portion 141, which can reduce the transmission impedance and ensure the uniformity of the voltage application, thereby improving the uniformity of the display of the display panel 100. Of course, in other embodiments, the material of the isolation portion 141 can also be an insulating material, such as an inorganic material or an organic material, which is not limited in this application. In one embodiment, the overall structure of the isolation portion 141 is in a grid shape, and the isolation openings 142 are mesh holes of the grid.

[0029] Continue reading Figure 1 In one embodiment, the orthographic projection of the isolation portion 141 on the substrate 110 at least partially extends beyond the orthographic projection of the pixel defining portion 121 on the substrate 110, that is, in a direction parallel to the substrate 110, at least a portion of the boundary of the isolation portion 141 protrudes from the boundary of the pixel defining portion 121. It can also be understood that the orthographic projection of the pixel opening 122 on the substrate 110 at least partially extends within the orthographic projection of the isolation portion 141 on the substrate 110, wherein the boundary of the orthographic projection of the pixel opening 122 on the substrate 110 is also the boundary of the orthographic projection of the pixel defining portion 121 on the substrate 110.

[0030] See also Figure 3In another embodiment, at least a portion of the boundary of the isolating portion 141 projected on the substrate 110 overlaps with a portion of the boundary of the pixel defining portion 121 projected on the substrate 110. That is, in the solution of the present application, at least a portion of the boundary of the pixel defining portion 121 does not exceed the boundary of the isolating portion 141. That is, at least a portion of the isolating portion 122 projected on the substrate 110 overlaps with a portion of the boundary of the isolating portion 141 projected on the substrate 110.

[0031] In one embodiment, during the preparation process, after the pixel opening 122 and the isolation opening 142 are formed, the functional layers in the light-emitting element 130 (specifically, the layers may include a hole injection layer, a hole transport layer, an electron blocking layer, a light-emitting material layer 132, a hole blocking layer, an electron transport layer, an electron injection layer, a second electrode 133, etc.) are formed in the pixel opening 122 and the isolation opening 142. At this time, since at least part of the boundary of the pixel defining portion 121 does not exceed the boundary of the isolation portion 141, during the process of forming the light-emitting element 130, the isolation portion 141 can protect at least part of the pixel defining portion 121 to avoid damaging the surface of the pixel defining portion 121 when forming the functional layers in the light-emitting element 130, thereby avoiding the problem of discontinuity of the film layer in the light-emitting element 130 caused by surface damage of the pixel defining portion 121, thereby improving the yield of the display panel 100 and ensuring the display quality of the display panel 100.

[0032] Compared with the prior art in which the orthographic projection of the isolation portion 141 on the substrate 110 is located within the orthographic projection of the pixel defining portion 121 on the substrate 110, the present application sets at least part of the boundary of the pixel defining portion 121 not exceeding the boundary of the isolation portion 141, which is equivalent to reducing the width of the pixel defining portion 121 while keeping the isolation portion 141 unchanged, thereby increasing the opening area of ​​the pixel opening 122, and further improving the aperture ratio of the display panel 100.

[0033] In one embodiment, the width of the pixel defining portion 121 is set to be in the range of 10 to 25 μm, i.e., 10 to 25 micrometers, for example, the width of the pixel defining portion 121 is 10 μm, 15 μm, 20 μm or 25 μm, etc., to ensure the aperture ratio of the display panel 100. The width of the pixel defining portion 121 mentioned here may specifically be an average width, a maximum width or a minimum width of the pixel defining portion 121.

[0034] Combination Figure 1 as well as Figure 4In one embodiment, the orthographic projections of the pixel defining portion 121 on the substrate 110 are all located within the orthographic projections of the isolation portion 141 on the substrate 110, that is, in a direction parallel to the substrate 110, the boundaries of the isolation portion 141 all protrude beyond the boundaries of the pixel defining portion 121 (it can also be understood that the boundaries of the orthographic projections of the pixel opening 122 on the substrate 110 are all located within the orthographic projections of the isolation portion 141 on the substrate 110), thereby enhancing the protective effect of the isolation portion 141 on the pixel defining portion 121.

[0035] Of course, in other implementations, it may also be the case that: in a direction parallel to the substrate 110, part of the boundary of the isolation portion 141 protrudes from the boundary of the pixel defining portion 121, and another part of the boundary of the isolation portion 141 does not protrude from the boundary of the pixel defining portion 121. In this case, the isolation portion 141 can also provide partial protection for the pixel defining portion 121.

[0036] Continue reading Figure 3 In another embodiment, the orthographic projection of the pixel defining portion 121 on the substrate 110 and the orthographic projection of the isolation portion 141 on the substrate 110 completely overlap, that is, in a direction parallel to the substrate 110, the boundary of the isolation portion 141 and the pixel defining portion 121 completely overlap (it can also be understood that the boundary of the orthographic projection of the pixel opening 122 on the substrate 110 and the boundary of the orthographic projection of the isolation portion 141 on the substrate 110 completely overlap), and at this time, the protective effect of the isolation portion 141 on the pixel defining portion 121 can also be guaranteed.

[0037] See also Figure 5 In another embodiment, in a direction parallel to the substrate 110, part of the boundary of the isolation portion 141 coincides with the boundary of the pixel defining portion 121, and another part of the boundary of the isolation portion 141 protrudes from the boundary of the pixel defining portion 121. At this time, the protective effect of the isolation portion 141 on the pixel defining portion 121 can also be ensured.

[0038] Continue reading Figure 1 as well as Figure 4, the distance that the boundary of the isolation portion 141 protrudes from the boundary of the pixel defining portion 121 in the direction parallel to the substrate 110 is defined as the distance d1 (that is, the distance that the boundary of the pixel defining portion 121 is retracted relative to the boundary of the isolation portion 141 in the direction parallel to the substrate 110). In one embodiment, the range of d1 is greater than or equal to 0 and less than or equal to 1.5μm, for example, d1 is equal to 0, 0.5μm, 0.8μm, 1.0μm, 1.2μm or 1.5μm. Specifically, setting the range of d1 to be greater than or equal to 0 and less than or equal to 1.5μm can ensure the protective effect of the isolation portion 141 on the pixel defining portion 121, and also prevent the isolation portion 141 from affecting the light emission of the light emitting element 130 and avoiding affecting the subsequent overlap of the second electrode 133 and the isolation structure 140. It should be noted that the size of d1 can be adjusted according to actual conditions, and this application does not impose specific restrictions. The distance d1 can also be understood as the distance between the third boundary C and the boundary of the orthographic projection of the isolation portion 141 on the substrate 110, wherein the orthographic projection of the pixel opening 122 on the substrate 110 includes the third boundary C, and the third boundary C is covered by the orthographic projection of the isolation portion 141 on the substrate 110, that is, the distance range between the third boundary C and the boundary of the orthographic projection of the isolation portion 141 on the substrate 110 is greater than or equal to 0 and less than or equal to 1.5 μm.

[0039] See also Figure 6 In another embodiment, in a direction parallel to the substrate 110, the pixel defining portion 121 includes a first boundary A and a second boundary B located on both sides of the isolation portion 141, the first boundary A is retracted relative to the boundary of the isolation portion 141, and the second boundary B is protruded relative to the boundary of the isolation portion 141, so that the isolation portion 141 can be used to protect the pixel defining portion 121, and the isolation portion 141 can be prevented from affecting the emission of light from the light emitting element 130. In other words, the orthographic projection of the pixel opening 122 on the substrate 110 further includes a fourth boundary D, and the fourth boundary D is arranged opposite to the third boundary C in a direction parallel to the substrate 110, wherein the fourth boundary D is located outside the orthographic projection of the isolation portion 141 on the substrate 110. Specifically, the third boundary C coincides with the first boundary A, and the fourth boundary D coincides with the second boundary B.

[0040] Continue reading Figure 6 , the distance that the second boundary B protrudes from the boundary of the isolation portion 141 is defined as d2. In one embodiment, the range of d2 is greater than 0 and less than or equal to 1.5 μm, for example, d2 is equal to 0.5 μm, 0.8 μm, 1.0 μm, 1.2 μm or 1.5 μm. In other words, the distance between the fourth boundary D and the boundary of the orthographic projection of the isolation portion 141 on the substrate 110 is greater than 0 and less than or equal to 1.5 μm.

[0041] Continue reading Figure 6 In one embodiment, the distance d1 by which the first boundary A is retracted relative to the boundary of the isolation portion 141 is equal to the distance d2 by which the second boundary B is protruded relative to the boundary of the isolation portion 141, that is, in a direction parallel to the substrate 110, the distance between the third boundary C and the boundary of the orthographic projection of the isolation portion 141 on the substrate 110 is equal to the distance between the fourth boundary D and the boundary of the orthographic projection of the isolation portion 141 on the substrate 110. Of course, in other embodiments, d1 may also be different from d2, which is set according to actual needs.

[0042] See also Figure 7 In other embodiments, it can also be arranged that in a direction parallel to the substrate 110, a portion of the boundary of the pixel defining portion 121 protrudes relative to the boundary of the isolation portion 141, and a portion of the boundary of the pixel defining portion 121 is flush with the boundary of the isolation portion 141. At this time, since the portion of the boundary of the pixel defining portion 121 does not protrude from the boundary of the isolation portion 141, the isolation portion 141 can also protect the pixel defining portion 121.

[0043] In one embodiment, considering that the isolation portion 141 protrudes from the pixel defining portion 121 in a direction parallel to the substrate 110 and may affect the light emission of the light emitting element 130, the light emitting direction of the display panel 100 is set to the direction of the light emitting element 130 toward the substrate 110, that is, the light emitting element 130 emits light toward the substrate 110, thereby ensuring the display quality of the display panel 100. Of course, in other embodiments, the light emitting direction of the display panel 100 can also be set to the direction of the substrate 110 toward the light emitting element 130. In short, the present application can set the light emitting direction of the light emitting element 130 according to actual needs.

[0044] Continue reading Figure 1 In the direction Y away from the substrate 110, the width of the pixel defining portion 121 is reduced to ensure that the film layer of the light emitting element 130 can be better formed in the pixel opening 122 (that is, in the direction Y away from the substrate 110, the width of the pixel opening 122 is increased). Figure 1 In one embodiment, the cross section of the pixel defining portion 121 is a trapezoid, that is, the cross section of the pixel opening 122 is an inverted trapezoid.

[0045] In one embodiment, the surface of the pixel defining portion 121 facing away from the substrate 110 and the side surface of the pixel defining portion 121 are both smoothly arranged, that is, the surface of the pixel defining portion 121 facing away from the substrate 110 and the side surface of the pixel defining portion 121 have no depressions or protrusions, and are both smooth planes, so as to ensure the continuity of the film layer in the light-emitting element 130.

[0046] Continue reading Figure 1In one embodiment, the isolation portion 141 includes a first surface 1401 and a second surface 1402, the second surface 1402 is located on a side of the first surface 1401 away from the substrate 110, wherein the orthographic projection of the first surface 1401 on the substrate 110 is located within the orthographic projection of the second surface 1402 on the substrate 110, and the orthographic projection of the second surface 1402 on the substrate 110 at least partially extends beyond the orthographic projection of the pixel defining portion 121 on the substrate 110.

[0047] Specifically, the isolation portion 141 is generally wide at the top and narrow at the bottom. In this way, during the preparation process, the functional layers in the light-emitting element 130 (the functional layers include hole injection layer, hole transport layer, electron blocking layer, light-emitting material layer 132, hole blocking layer, electron transport layer, electron injection layer and other film layers) can be evaporated on the entire surface first, and at the edge of the isolation portion 141, due to the presence of the step difference, the functional layer of the light-emitting element 130 will be disconnected at the edge of the isolation portion 141, so that the functional layer of the light-emitting element 130 can be completely in the isolation opening 142, so that the preparation of the functional layer does not require precision mask plate alignment, which can reduce costs.

[0048] At the same time, in this embodiment, the orthographic projection of the second surface 1402 on the substrate 110 at least partially extends beyond the orthographic projection of the pixel defining portion 121 on the substrate 110 (that is, the orthographic projection of the pixel opening 122 on the substrate 110 at least partially extends within the orthographic projection of the second surface 1402 on the substrate 110), or at least a portion of the boundary of the orthographic projection of the second surface 1402 on the substrate 110 coincides with the boundary of the orthographic projection of the pixel defining portion 121 on the substrate 110 (that is, at least a portion of the boundary of the orthographic projection of the pixel opening 122 on the substrate 110 coincides with a portion of the boundary of the orthographic projection of the second surface 1402 on the substrate 110), that is, the second surface 1402 of the isolation portion 141 is used to protect the pixel defining portion 121.

[0049] In one embodiment, the orthographic projection of the pixel defining portion 121 on the substrate 110 is located within the orthographic projection of the second surface 1402 on the substrate 110, and the second surface 1402 of the isolation portion 141 is used to fully protect the pixel defining portion 121. In another embodiment, the boundary of the orthographic projection of the pixel defining portion 121 on the substrate 110 completely overlaps with the boundary of the orthographic projection of the second surface 1402 on the substrate 110.

[0050] Continue reading Figure 1The isolation portion 141 includes an isolation column 1411 and a crown portion 1412 which are sequentially arranged in a direction Y away from the substrate 110, wherein the orthographic projection of the isolation column 1411 on the substrate 110 is located within the orthographic projection of the crown portion 1412 on the substrate 110, that is, in a direction X parallel to the substrate 110, the isolation column 1411 is retracted relative to the crown portion 1412, so that the isolation structure 140 as a whole is roughly wide at the top and narrow at the bottom.

[0051] Continue reading Figure 1 In one embodiment, the orthographic projection of the crown 1412 on the substrate 110 at least partially extends beyond the orthographic projection of the pixel defining portion 121 on the substrate 110 (i.e., the orthographic projection of the pixel opening 122 on the substrate 110 at least partially extends within the orthographic projection of the crown 1402 on the substrate 110), or at least a portion of the boundary of the orthographic projection of the crown 1412 on the substrate 110 coincides with the boundary of the orthographic projection of the pixel defining portion 121 on the substrate 110 (i.e., at least a portion of the boundary of the orthographic projection of the pixel opening 122 on the substrate 110 coincides with a portion of the boundary of the orthographic projection of the crown 1402 on the substrate 110). Specifically, the crown 1412 is used to protect the pixel defining portion 121.

[0052] In one embodiment, the material of the isolation column 1411 includes aluminum, and the material of the crown 1412 includes titanium. In other embodiments, in order to reduce the transmission impedance of the isolation portion 141, the isolation portion 141 may further include an isolation layer (not shown), the isolation layer is located between the isolation column 1411 and the substrate 110, and the orthographic projection of the isolation layer on the substrate 110 is located outside the orthographic projection of the isolation column 1411 on the substrate 110. In one embodiment, the material of the isolation layer includes molybdenum. In this case, the isolation portion 141 is a combination of a molybdenum layer, an aluminum layer, and a titanium layer. This combination can ensure that the impedance of the isolation portion 141 is the lowest, and the titanium layer can also protect the aluminum layer to prevent the aluminum layer from being etched.

[0053] Continue reading Figure 1 In one embodiment, the second electrode 133 extends from the pixel opening 122 to overlap with the isolation portion 141 , specifically overlaps with the isolation column 1411 , so that when the isolation portion 141 is conductive, a voltage can be applied to the second electrode 133 through the isolation portion 141 .

[0054] Continue reading Figure 1The display panel 100 further includes a first encapsulation layer 150, which is partially disposed in the pixel opening 122 and located on the side of the light-emitting element 130 away from the substrate 110, and partially extends from the pixel opening 122 to the side of the isolation portion 141 away from the substrate 110. The light-emitting element 130 is encapsulated by the first encapsulation layer 150 to prevent external water and oxygen from invading the light-emitting element 130. Since the boundary of the pixel defining portion 121 in the present application does not exceed the boundary of the isolation portion 141, the isolation portion 141 is used to protect the pixel defining portion 121, ensuring that the surface and side surface of the pixel defining portion 121 away from the substrate 110 are smooth, which can ensure the continuity of the deposition of each film layer in the light-emitting element 130, thereby ensuring the film-forming coverage of the first encapsulation layer 150 and the encapsulation effect of the first encapsulation layer 150.

[0055] In one embodiment, see Figure 1 In order to improve the ability of the display panel 100 to resist water and oxygen intrusion, the display panel 100 further includes a second encapsulation layer 160 and a third encapsulation layer 170 .

[0056] The second encapsulation layer 160 is located between the first encapsulation layer 150 and the third encapsulation layer 170. In one embodiment, the first encapsulation layer 150 and the third encapsulation layer 170 are inorganic layers, and the inorganic layers have high density to isolate water and oxygen. The second encapsulation layer 160 is an organic layer, and thus has a larger thickness to flatten the surface of the display panel 100.

[0057] See also Figure 8 The present application also protects a display device 200, which includes a display panel 210. The display panel 210 has the same structure as the display panel 100 in any of the above embodiments. The specific structure can be found in the above related content and will not be repeated here.

[0058] The display device 200 may be any device with a restriction function, such as a mobile phone, a computer, a game console, etc., and is not limited here.

[0059] Combine the following Fig. 9 as well as Fig.10 The following describes a method for preparing the display panel 100. The method includes:

[0060] S100 : forming a pixel definition layer 120 and an isolation structure 140 on one side of a substrate 110 .

[0061] In one embodiment, see Fig. 9 , step S100 specifically includes:

[0062] S110 : forming a full-surface and continuous pixel definition material layer 1201 on one side of the substrate 110 .

[0063] S120 : forming an isolation portion 141 and an isolation opening 142 surrounded by the isolation portion 141 on a side of the pixel definition material layer 1201 facing away from the substrate 110 .

[0064] S130 : patterning the pixel definition material layer 1201 to form a pixel definition layer 120 , wherein the pixel definition layer 120 includes a pixel definition portion 121 and a pixel opening 122 surrounded by the pixel definition portion 121 .

[0065] Specifically, in this embodiment, after the isolation portion 141 and the isolation opening 142 are formed, the entire pixel definition material layer 1201 is patterned to form the pixel defining portion 121 and the isolation opening 142 surrounded by the pixel defining portion 121 .

[0066] In one embodiment, before forming the pixel definition layer 120, the first electrode 131 in the light-emitting element 130 is formed. At this time, in the above-mentioned preparation process, when forming the isolation portion 141 and the isolation opening 142 enclosed by the isolation portion 141, since the pixel definition material layer 1201 has not been patterned, the first electrode 131 can be protected by the pixel definition material layer 1201, thereby ensuring the display quality of the display panel 100.

[0067] In one embodiment, step S130 further includes steps of forming the light emitting material layer 132 , the second electrode 133 , the first encapsulation layer 150 , the second encapsulation layer 160 and the third encapsulation layer 170 in the light emitting element 130 .

[0068] In one embodiment, in the above step S130 , the pixel definition material layer 1201 is patterned by a dry etching process. At this time, the ratio of the process gas can be adjusted so that the boundary of the pixel defining portion 121 obtained by patterning the pixel definition material layer 1201 does not exceed the boundary of the isolation portion 141 .

[0069] See also Fig.10 In another embodiment, step S100 specifically includes:

[0070] S160 : forming a full-surface and continuous pixel definition material layer 1201 on one side of the substrate 110 .

[0071] S170 : patterning the pixel definition material layer 1201 to form a pixel definition layer 120 , wherein the pixel definition layer 120 includes a pixel definition portion 121 and a pixel opening 122 enclosed by the pixel definition portion 121 .

[0072] S180 : forming an isolation portion 141 and an isolation opening 142 surrounded by the isolation portion 141 on a side of the pixel definition layer 120 facing away from the substrate 110 .

[0073] Specifically, Fig. 9 The difference between the implementation modes is that, in this implementation mode, the pixel definition material layer 1201 is first patterned to obtain the pixel opening 122 before forming the isolation structure 140, and then the isolation portion 141 and the isolation opening 142 are formed after obtaining the pixel opening 122, which can effectively ensure that the boundary of the pixel defining portion 121 does not exceed the boundary of the isolation portion 141.

[0074] In one embodiment, step S180 further includes steps of forming the light emitting material layer 132 , the second electrode 133 , the first encapsulation layer 150 , the second encapsulation layer 160 and the third encapsulation layer 170 in the light emitting element 130 .

[0075] See also Fig.11 In another embodiment, before forming the pixel definition material layer 1201, a first electrode 131 is formed. When the first electrode 131 is located between the substrate 110 and the pixel definition material layer 1201 and is partially exposed from the pixel opening 122, before step S180, the process further includes: forming a protective layer 180 on the first electrode 131 exposed in the pixel opening 122, wherein the thickness of the protective layer 180 is less than or equal to the thickness of the pixel definition layer 120, and the protective layer 180 is removed after forming the isolation portion 141, that is, at this time, the preparation process of the display panel 100 includes:

[0076] S160 : forming a full-surface and continuous pixel definition material layer 1201 on one side of the substrate 110 .

[0077] S170 : patterning the pixel definition material layer 1201 to obtain a pixel definition layer 120 , wherein the pixel definition layer 120 includes a pixel definition portion 121 and a pixel opening 122 enclosed by the pixel definition portion 121 .

[0078] S190 : forming a protection layer 180 on the first electrode 131 exposed in the pixel opening 122 .

[0079] S180 : forming an isolation portion 141 and an isolation opening 142 surrounded by the isolation portion 141 on a side of the pixel definition layer 120 facing away from the substrate 110 .

[0080] S200 : removing the protective layer 180 , and forming other remaining film layers of the light emitting element 130 in the pixel opening 122 .

[0081] Specifically, when the isolation opening 142 is formed, the protection layer 180 can protect the first electrode 131 and prevent the first electrode 131 from being damaged, thereby ensuring the production yield of the display panel 100 .

[0082] In one embodiment, the material of the protective layer 180 includes an organic material. In this case, when removing the protective layer 180 , it can be removed by exposure and development to avoid damaging the first electrode 131 when removing the protective layer 180 .

[0083] In a specific embodiment, the material of the protective layer 180 includes photoresist and OC glue. In short, the present application does not limit the material of the protective layer 180.

[0084] The above description is only an embodiment of the present application and does not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A display panel, characterized in that: The display panel comprises: substrate; A pixel definition layer is arranged on one side of the substrate, the pixel definition layer comprises a pixel definition portion and a pixel opening formed by the pixel definition portion, and a light emitting element is arranged in the pixel opening; An isolation structure is arranged on the side of the pixel definition layer facing away from the substrate, and the isolation structure includes an isolation portion and an isolation opening enclosed by the isolation portion, wherein the orthographic projection of the isolation portion on the substrate at least partially extends beyond the orthographic projection of the pixel defining portion on the substrate, or at least a portion of the boundary of the orthographic projection of the isolation portion on the substrate coincides with a portion of the boundary of the orthographic projection of the pixel defining portion on the substrate.

2. The display panel according to claim 1, characterized in that: The orthographic projections of the pixel defining portion on the substrate are all located within the orthographic projections of the isolation portion on the substrate, or the orthographic projections of the pixel defining portion on the substrate and the orthographic projections of the isolation portion on the substrate completely overlap; Preferably, the width of the pixel defining portion is in the range of 10 to 25 μm.

3. The display panel according to claim 1, characterized in that: In a direction parallel to the substrate, a distance range of a boundary of the pixel defining portion that is retracted relative to a boundary of the isolation portion is greater than or equal to 0 and less than or equal to 1.5 μm.

4. The display panel according to claim 1, characterized in that: In a direction parallel to the substrate, the pixel defining portion includes a first boundary and a second boundary located on opposite sides of the isolation portion; the first boundary of the pixel defining portion is retracted relative to the boundary of the isolation portion, and the second boundary of the pixel defining portion is convex relative to the boundary of the isolation portion; Preferably, in a direction parallel to the substrate, the second boundary protrudes from the boundary of the isolation portion by a distance greater than 0 and less than or equal to 1.5 μm; Preferably, a distance that the first boundary is retracted relative to the boundary of the isolation portion is equal to a distance that the second boundary is protruded relative to the boundary of the isolation portion.

5. The display panel according to claim 1, characterized in that: The light emitting direction of the display panel is the direction from the light emitting element toward the substrate.

6. The display panel according to claim 1, characterized in that: The width of the pixel defining portion decreases in a direction away from the substrate; Preferably, the cross section of the pixel defining portion is trapezoidal.

7. The display panel according to claim 1, characterized in that: The orthographic projection of the isolation opening on the substrate at least partially overlaps with the orthographic projection of the light emitting element on the substrate; Preferably, the isolation portion comprises a first surface and a second surface, the second surface is located on a side of the first surface away from the substrate, wherein the orthographic projection of the first surface on the substrate is located within the orthographic projection of the second surface on the substrate; Preferably, the orthographic projection of the second surface on the substrate at least partially extends beyond the orthographic projection of the pixel defining portion on the substrate, or at least a portion of the boundary of the orthographic projection of the second surface on the substrate coincides with a portion of the boundary of the orthographic projection of the pixel defining portion on the substrate; Preferably, the isolation portion includes an isolation column and a crown portion which are arranged in sequence in a direction away from the substrate, wherein the orthographic projection of the isolation column on the substrate is located within the orthographic projection of the crown portion on the substrate, the orthographic projection of the crown portion on the substrate at least partially extends beyond the orthographic projection of the pixel defining portion on the substrate, or at least a portion of the boundary of the orthographic projection of the crown portion on the substrate coincides with a portion of the boundary of the orthographic projection of the pixel defining portion on the substrate.

8. The display panel according to claim 1, characterized in that: The surface of the pixel defining portion facing away from the substrate and the side surface of the pixel defining portion are both arranged to be smooth.

9. The display panel according to claim 1, characterized in that: The light emitting element comprises a first electrode, a light emitting material layer and a second electrode which are sequentially stacked in a direction away from the substrate, wherein the second electrode extends from the pixel opening to overlap with the isolation portion; Preferably, the material of the isolation portion includes a conductive material; Preferably, the display panel further includes: A first encapsulation layer, partly disposed in the pixel opening and located on a side of the light-emitting element away from the substrate, and partly extending from the pixel opening to a side of the isolation portion away from the substrate; Preferably, the material of the first encapsulation layer includes an inorganic material.

10. A display panel, characterized in that: The display panel comprises: substrate; A pixel definition layer is arranged on one side of the substrate, the pixel definition layer comprises a pixel definition portion and a pixel opening formed by the pixel definition portion, and a light emitting element is arranged in the pixel opening; An isolation structure is arranged on the side of the pixel definition layer away from the substrate, and the isolation structure includes an isolation portion and an isolation opening formed by the isolation portion, wherein the orthographic projection of the pixel opening on the substrate at least partially extends into the orthographic projection of the isolation portion on the substrate, or at least a portion of the boundary of the orthographic projection of the pixel opening on the substrate coincides with a portion of the boundary of the orthographic projection of the isolation portion on the substrate.

11. The display panel according to claim 10, characterized in that: The boundaries of the orthographic projection of the pixel opening on the substrate are all located within the orthographic projection of the isolation portion on the substrate, or the boundaries of the orthographic projection of the pixel opening on the substrate completely overlap with the boundaries of the orthographic projection of the isolation portion on the substrate.

12. The display panel according to claim 10, characterized in that: The orthographic projection of the pixel opening on the substrate includes a third boundary, and the third boundary is covered by the orthographic projection of the isolation portion on the substrate, wherein the distance between the third boundary and the orthographic projection boundary of the isolation portion on the substrate ranges from greater than or equal to 0 to less than or equal to 1.5 μm.

13. The display panel according to claim 12, characterized in that: The orthographic projection of the pixel opening on the substrate further includes a fourth boundary, wherein the fourth boundary is located outside the orthographic projection of the isolation portion on the substrate; Preferably, in a direction parallel to the substrate, the fourth boundary is arranged opposite to the third boundary; Preferably, in a direction parallel to the substrate, a distance between the fourth boundary and a boundary of an orthographic projection of the isolation portion on the substrate is greater than 0 and less than or equal to 1.5 μm; Preferably, in a direction parallel to the substrate, a distance between the third boundary and a boundary of an orthographic projection of the isolation portion on the substrate is equal to a distance between the fourth boundary and a boundary of an orthographic projection of the isolation portion on the substrate.

14. The display panel according to claim 10, characterized in that: The light emitting direction of the display panel is the direction from the light emitting element to the substrate; Preferably, the width of the pixel opening increases in a direction away from the substrate; preferably, the cross section of the pixel opening is an inverted trapezoid.

15. The display panel according to claim 10, characterized in that: The orthographic projection of the isolation opening on the substrate at least partially overlaps with the orthographic projection of the light emitting element on the substrate; Preferably, the isolation portion comprises a first surface and a second surface, the second surface is located on a side of the first surface away from the substrate, wherein the orthographic projection of the first surface on the substrate is located within the orthographic projection of the second surface on the substrate; Preferably, the orthographic projection of the pixel opening on the substrate at least partially extends into the orthographic projection of the second surface on the substrate, or at least a portion of the boundary of the orthographic projection of the pixel opening on the substrate coincides with a portion of the boundary of the orthographic projection of the second surface on the substrate; Preferably, the isolation portion includes an isolation column and a crown portion which are arranged in sequence in a direction away from the substrate, wherein the orthographic projection of the isolation column on the substrate is located within the orthographic projection of the crown portion on the substrate, the orthographic projection of the pixel opening on the substrate at least partially extends within the orthographic projection of the crown portion on the substrate, or, at least a portion of the boundary of the orthographic projection of the pixel opening on the substrate coincides with a portion of the boundary of the orthographic projection of the crown portion on the substrate.

16. A display device, characterized in that: Comprising the display panel as claimed in any one of claims 1 to 15.

17. A method for preparing a display panel, characterized in that: The method comprises: forming a pixel definition layer and an isolation structure on one side of the substrate; The pixel definition layer includes a pixel defining portion and a pixel opening formed by the pixel defining portion, and the isolation structure includes an isolation portion and an isolation opening formed by the isolation portion, wherein the orthographic projection of the isolation portion on the substrate at least partially extends beyond the orthographic projection of the pixel defining portion on the substrate, or at least a portion of the boundary of the orthographic projection of the isolation portion on the substrate coincides with a portion of the boundary of the orthographic projection of the pixel defining portion on the substrate.

18. The method according to claim 17, characterized in that The step of forming a pixel definition layer and an isolation structure on one side of the substrate includes: Forming a whole and continuous pixel definition material layer on one side of the substrate; forming the isolation portion and the isolation opening surrounded by the isolation portion on a side of the pixel definition material layer away from the substrate; Patterning the pixel definition material layer to form the pixel definition layer, wherein the pixel definition layer includes the pixel definition portion and the isolation opening surrounded by the pixel definition portion; Preferably, the step of patterning the pixel definition material layer comprises: The pixel definition material layer is patterned by using a dry etching process.

19. The method according to claim 17, characterized in that The step of forming a pixel definition layer and an isolation structure on one side of the substrate includes: Forming a whole and continuous pixel definition material layer on one side of the substrate; Patterning the pixel definition material layer to form the pixel definition layer, wherein the pixel definition layer includes the pixel definition portion and the pixel opening formed by the pixel definition portion; forming the isolation portion and the isolation opening surrounded by the isolation portion on a side of the pixel definition layer away from the substrate; Preferably, the method also includes forming a light-emitting element in the pixel opening; wherein the light-emitting element includes a first electrode, a light-emitting material layer and a second electrode stacked in sequence in a direction away from the substrate, and the first electrode is located between the substrate and the pixel definition layer and is partially exposed from the pixel opening.

20. The method according to claim 19, characterized in that Before forming the isolation portion on the side of the pixel definition layer away from the substrate and the isolation opening formed by the isolation portion, the method further includes: forming a protective layer on the first electrode exposed in the pixel opening, wherein the thickness of the protective layer is less than or equal to the thickness of the pixel definition layer, and the protective layer is removed after forming the isolation portion and the isolation opening; Preferably, the material of the protective layer includes organic material.

Images