Detection device configured to detect fault of electrode and method of operating the same

Abstract

The detection apparatus configured to detect a defective electrode according to various embodiments includes: a measurement module configured to acquire a thickness measurement value of at least one electrode; and a processor electrically connected to the measurement module, in which the processor confirms a groove formed in the at least one electrode based on the thickness measurement value, and detects the at least one electrode as a defective electrode when confirming a waveform groove corresponding to a reference shape.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2022-0134436 filed in the Korean Intellectual Property Office on October 18, 2022, the entire contents of which are incorporated herein by reference. Technical Field

[0003] Various embodiments disclosed herein relate to a detection device configured to detect bad electrodes and methods of operating the same, and more particularly, to a technique for detecting bad electrodes that can cause a gap to form in a coupling surface with a separator membrane. Background Art

[0004] Recently, secondary batteries are being increasingly developed and used because they are rechargeable and have a smaller size and a larger capacity.

[0005] This secondary battery is manufactured in the form of an electrode assembly consisting of a positive electrode, a separator and a negative electrode, which is contained in a battery case together with an electrolyte solution. For example, the electrode assembly can be manufactured by stacking the positive electrode and the negative electrode with the separator interposed therebetween, and then applying a certain level of heat and pressure. In this case, the portions where the electrode and the separator face each other can be contained in the battery case in a state where they are coupled (e.g., bonded) by heat and pressure. Summary of the invention

[0006] [Technical issues]

[0007] Generally, the coupling state between the electrode and the separator in the electrode assembly is related to the performance of the secondary battery. For example, when the portion where the electrode and the separator face each other (e.g., the coupling surface) has a uniform thickness, the performance of the secondary battery can be ensured to be at a certain level. On the contrary, when at least a portion of the portion where the electrode and the separator face each other has an uneven thickness due to weakened bonding strength, etc., the performance of the secondary battery cannot be ensured to be at a certain level. For example, in the case where a portion of the coupling surface has an uneven thickness, the consumption of the electrolyte solution may increase due to high resistance, thereby causing expansion of the battery cell and causing performance degradation of the secondary battery due to lithium plating.

[0008] At least one of various embodiments of the present invention is directed to providing a detection apparatus configured to detect a bad electrode that can cause degradation in performance of a secondary battery, and a method of operating the same.

[0009] At least one of the various embodiments of the present invention is directed to providing a detection apparatus configured to detect bad electrodes capable of causing the formation of gaps (eg, spaces) in an electrode assembly based on variations in thickness of the electrodes, and a method of operating the same.

[0010] [Technical solution]

[0011] According to various embodiments, a detection device configured to detect bad electrodes includes: a measurement module, which is configured to obtain a thickness measurement value of at least one electrode; and a processor, which is electrically connected to the measurement module, wherein the processor is configured to confirm a groove formed in at least one electrode based on the thickness measurement value, and when a waveform groove corresponding to a reference shape is confirmed, the at least one electrode is detected as a bad electrode.

[0012] According to various embodiments, the processor can be configured to confirm a wavy groove of the following form based on a reference thickness of at least one electrode, in which a platform area that increases to a certain level or more compared to the reference thickness and a sinking area that decreases to a certain level or less compared to the reference thickness are continuously formed.

[0013] According to various embodiments, the reference shape may include at least one of a specified area and a specified depth.

[0014] According to various embodiments, the processor may be configured to confirm a groove formed in at least one electrode in an inclined portion where the thickness gradually decreases.

[0015] According to various embodiments, the inclined portion may be formed in a cutting or coating process during a process of manufacturing at least one electrode.

[0016] According to various embodiments, the processor may be configured to confirm the groove in an upper end portion of the electrode within a certain range toward the other end with reference to an edge of an electrode tab formed on at least one electrode.

[0017] According to various embodiments, the processor may be configured to obtain a thickness measurement value of an electrode assembly in which a positive electrode and a negative electrode having substantially the same size are stacked with a separator interposed therebetween.

[0018] According to various embodiments, the processor may be configured to acquire a thickness measurement value of an electrode assembly in which a negative electrode having a relatively large size and a positive electrode having a relatively small size are stacked with a separator interposed therebetween.

[0019] According to various embodiments, the processor can be configured to: when a wavy groove corresponding to a reference shape is confirmed, confirm the distance between the position where the sinking area starts after the platform area and the edge of the positive electrode; when the distance is included in a specified range, detect at least one electrode as a normal electrode; and when the distance is outside the specified range, detect at least one electrode as a bad electrode.

[0020] According to various embodiments, the detection apparatus may further include a memory, wherein the processor may be configured to reset the reference shape based on the shape of the wave-shaped groove formed in the defective electrode and store the reset reference shape in the memory.

[0021] The method of operating the detection device according to various embodiments includes: an operation of obtaining a thickness measurement value of at least one electrode; an operation of confirming a groove formed in at least one electrode based on the thickness measurement value; and an operation of detecting at least one electrode as a bad electrode when a waveform groove corresponding to a reference shape is confirmed.

[0022] According to various embodiments, the wave groove may include a form in which, based on a reference thickness of at least one electrode, a platform region increased to a certain level or more compared to the reference thickness and a sinking region decreased to a certain level or less compared to the reference thickness are continuously formed.

[0023] According to various embodiments, the reference shape may include at least one of a specified area and a specified depth.

[0024] According to various embodiments, the operating method may include an operation of confirming a groove formed in at least one electrode in an inclined portion where a thickness gradually decreases.

[0025] According to various embodiments, the inclined portion may be formed in a cutting or coating process during a process of manufacturing at least one electrode.

[0026] According to various embodiments, the operating method may include an operation of confirming a groove in an upper end portion of an electrode within a range toward the other end with reference to an edge of an electrode tab formed on at least one electrode.

[0027] According to various embodiments, an operation method may include an operation of acquiring a thickness measurement value of an electrode assembly in which a positive electrode and a negative electrode having substantially the same size are stacked with a separation film interposed therebetween.

[0028] According to various embodiments, an operation method may include an operation of acquiring a thickness measurement value of an electrode assembly in which a negative electrode having a relatively large size and a positive electrode having a relatively small size are stacked with a separator interposed therebetween.

[0029] According to various embodiments, the operating method may include: when a waveform groove corresponding to a reference shape is confirmed, an operation of confirming the distance between the position where the sinking area of ​​the impregnation area starts after the platform area and the edge of the positive electrode; when the distance is included in a specified range, an operation of detecting at least one electrode as a normal electrode; and an operation of detecting at least one electrode as a bad electrode when the distance is outside the specified range.

[0030] According to various embodiments, the operating method may include an operation of resetting a reference shape based on a shape of a waveform groove formed in a defective electrode, and an operation of storing the re-set reference shape.

[0031] [Beneficial Effects]

[0032] According to various embodiments disclosed herein, according to a detection device configured to detect electrode failure and a method for operating the same, a secondary battery that ensures performance at a certain level can be manufactured by detecting bad electrodes that can cause gaps to form in an electrode assembly based on changes in electrode thickness.

[0033] The effects that can be obtained herein are not limited to the above-mentioned effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1a to Figure 1c is a view schematically illustrating a secondary battery according to various embodiments.

[0035] Figure 2 is a view showing a configuration of a detection device configured to detect a malfunction of an electrode according to various embodiments.

[0036] Figure 3a and 3b is a view for describing a defective electrode causing a gap to be formed in an electrode assembly.

[0037] Figures 4a to 4d is a view for describing an operation of detecting a bad electrode according to various embodiments.

[0038] Figure 5 is a view for describing another operation of detecting a bad electrode according to various embodiments.

[0039] Figure 6a and 6b is a diagram for describing the performance of a detection apparatus according to various embodiments.

[0040] Figure 7 is a flowchart for describing the operation of a detection device according to various embodiments.

[0041] Figure 8 is a flowchart for describing another operation of a detection device according to various embodiments.

[0042] Figure 9a and Figure 9b is a view for describing an operation of setting a quality requirement standard of an electrode in a detection apparatus according to various embodiments. DETAILED DESCRIPTION

[0043] Hereinafter, some embodiments of the present invention will be described in detail with reference to the exemplary drawings. When adding reference numerals to the components in each drawing, it should be noted that the same components have the same reference numerals as much as possible even if they are shown in different drawings. In addition, when describing the embodiments of the present invention, when it is determined that the detailed description obscures the understanding of the embodiments of the present invention, the detailed description of the related known configurations or functions will be omitted.

[0044] Terms such as first, second, A, B, (a), and (b) may be used to describe components of embodiments of the present invention. These terms are used only for the purpose of distinguishing one component from another, and the nature, order, sequence, etc. of the corresponding components are not limited by these terms. In addition, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meanings as those commonly understood by technicians in the field to which the present invention belongs. Terms defined in generally used dictionaries should be interpreted as having a meaning consistent with the meaning of the terms from the context of the relevant technology, and should not be interpreted as an ideal or overly formal meaning unless clearly defined in this document.

[0045] In addition, the various embodiments of this document and the terms used herein are not intended to limit the technical features described herein to the specified embodiments, and should be understood to include various modifications, equivalents or substitutes of the corresponding embodiments. In the description of the accompanying drawings, similar reference numerals may be used for similar or related parts. Unless the context clearly indicates otherwise, the singular form of the noun corresponding to the project may include one or more projects. In this document, each of the phrases such as "A or B", "at least one of A and B", "at least one of A or B", "A, B or C", "at least one of A, B and C" and "at least one of A, B or C" may include any one of the items listed together in the corresponding phrases among these phrases or all possible combinations thereof. Terms such as "first", "second", "one" or "two" may be used simply to distinguish the corresponding component from another, and do not limit the corresponding component in another aspect (e.g., importance or order). When a certain component (e.g., a first component) is described as being “coupled” or “connected” (with or without the term “functionally” or “communicatively”) to another component (e.g., a second component), this means that the certain component may be connected to the other component directly (e.g., by wire or wirelessly) or through a third component.

[0046] Figure 1a to Figure 1c is a view schematically illustrating a secondary battery according to various embodiments.

[0047] refer to Figure 1a to Figure 1c , the secondary battery 100 according to various embodiments may be configured in a form in which an electrode assembly 120 and an electrolyte solution are accommodated in a battery case 110 .

[0048] According to various embodiments, the battery case 110 may include a first case 112 (eg, an upper case) and a second case 114 (eg, a lower case). The first case 112 may include a space configured to accommodate at least a portion of the electrode assembly 120, and the second case 114 may include a space configured to accommodate another portion of the electrode assembly 120.

[0049] According to one embodiment, the electrode assembly 120 and the electrolyte solution may be accommodated in the inner space by coupling the first case 112 to the second case 114 , and the edges of the first case 112 and the second case 114 may be sealed in a state of accommodating the electrode assembly 120 and the electrolyte solution.

[0050] According to various embodiments, the electrode assembly 120 may be configured in a form in which a first electrode 122 (eg, a negative electrode or a negative electrode plate) and a second electrode 125 (eg, a positive electrode or a positive electrode plate) are stacked with a separation film 121 interposed therebetween.

[0051] According to one embodiment, each of the electrodes 122 and 125 may be formed in a structure in which an active material slurry is applied to a current collector. For example, the slurry may be formed by stirring a particulate active material, an auxiliary conductor, a binder, a plasticizer, etc. in a state where a solvent is added.

[0052] According to one embodiment, each of the electrodes 122 and 125 may have an uncoated portion to which the slurry is not applied, and an electrode tab 123 or 126 corresponding to each of the electrodes 122 and 125 may be attached to the uncoated portion. In addition, each of the electrode tabs 123 and 126 may be coupled by being attached to one end of an electrode lead 124 or 127, and the other end of the electrode lead 124 or 127 may be exposed to the outside of the battery case 110 and provided as an electrode terminal that may be connected to another secondary battery or an external device such as a load or a charging device.

[0053] According to various embodiments, each of the electrodes 122 and 125 and the separator 121 may be maintained in a state of being coupled (e.g., joined) by heat and pressure in the electrode assembly 120, and in order to ensure that the performance of the secondary battery 100 is at a certain level, each of the electrodes 122 and 125 and the separator 121 need to be coupled to form a coupling surface (e.g., a joining surface) having a uniform thickness. For example, consumption of the electrolyte solution in the electrode assembly 120 may increase in a portion having an uneven thickness of the coupling surface, thereby causing expansion of the battery cell and causing performance degradation of the secondary battery 100 due to lithium plating.

[0054] In this regard, according to various embodiments described in detail with reference to the following drawings, at least one of the electrodes 122 and 125 causing a state of uneven thickness when coupled to the separation film 121 can be detected. Therefore, since the electrodes 122 and 125 causing a state of uneven thickness when coupled to the separation film 121 can be detected before or after manufacturing the electrode assembly 120, the secondary battery 100 ensuring performance at a certain level can be manufactured.

[0055] The following will refer to Figure 2 6 to 6 describe in detail a detection device configured to detect a failure of the electrodes 122 and 125 according to various embodiments.

[0056] Figure 2 is a diagram showing a configuration of a detection device configured to detect a failure of an electrode according to various embodiments. In addition, Figure 3a and Figure 3b is a view for describing a bad electrode causing a gap to be formed in an electrode assembly, Figures 4a to 4d is a view for describing an operation of detecting a bad electrode according to various embodiments, and Figure 5 is a view for describing another operation of detecting a bad electrode according to various embodiments.

[0057] Reference Figure 2 According to various embodiments, the detection device 200 may include a measurement module 202, a memory 204, an output module 206, and a processor 208. However, this is merely exemplary, and various embodiments are not limited thereto. For example, at least one of the components of the detection device 200 may be omitted, or one or more other components (e.g., an input device or a power management device) may be added as a component of the detection device 200. In addition, at least one of the above components may be integrated with another component.

[0058] According to various embodiments, the measurement module 202 may be configured to obtain a thickness measurement value of at least one of the electrodes 122 and 125. According to one embodiment, the measurement module 202 may measure a thickness measurement value of at least one of the electrodes 122 and 125 coupled to the separation film 121. For example, the measurement module 202 may include a light emitter configured to emit light toward at least one of the electrodes 122 and 125 and a light receiver configured to detect light reflected from at least one of the electrodes 122 and 125.

[0059] According to various embodiments, the memory 204 may include programs, algorithms, routines, and / or commands related to the operation (or control) of the detection device 200 .

[0060] For example, the memory 204 may include at least one type of storage medium among a flash memory type, a hard disk type, a micro type, or a card type (e.g., a secure digital (SD) card or a processor digital (XD) card), and a random access memory (RAM), a static RAM (SRAM), a read-only memory (ROM), a programmable ROM (PROM), an electrically erasable PROM (EEPROM), a magnetic RAM (MRAM), a magnetic disk, or an optical disk type memory, and various embodiments are not limited thereto.

[0061] According to various embodiments, the output module 206 may provide information about the operation of the detection device 200. For example, at least a portion of the information output by the output module 206 may include the result of detecting at least one of the electrodes 122 and 125 (e.g., a bad electrode) causing uneven thickness when coupled to the separation film 121.

[0062] According to one embodiment, the output module 206 may include a display configured to output visual information. For example, the display may include one or more of a liquid crystal display, a thin film transistor liquid crystal display, an organic light emitting diode, a flexible display, a three-dimensional (3D) display, and a transparent display. In addition, the display may include a touch sensor configured to detect touch.

[0063] However, this is only exemplary, and various embodiments are not limited thereto. For example, at least some of the information about the operation of the detection device 200 can be provided as auditory information. In this case, the output module 206 can also include an audio output device (e.g., a speaker) configured to output an audio signal to the outside of the detection device 200.

[0064] According to various embodiments, the processor 208 may control one or more other components of the detection device 200 (eg, the measurement module 202 , the memory 204 , and the output module 206 ) and perform various data processing or calculations.

[0065] For example, the processor 208 may detect at least one of the electrodes 122 and 125 causing uneven thickness when coupled to the separator 121. As described above, when a coupling surface formed by coupling at least one of the electrodes 122 and 125 to the separator 121 has an uneven thickness, the performance of the secondary battery 100 may be degraded.

[0066] The thickness of the coupling surface may be determined by the shape of at least one of the electrodes 122 and 125. For example, Figure 3a and Figure 3b As shown, when at least one of the electrodes 122 and 125 in which a relatively sunken region (e.g., groove) 310 is formed compared to the periphery is coupled to the separation film 121, this may cause a gap (e.g., space) 320 having a certain size to be formed in a portion (e.g., coupling surface) in which at least one of the electrodes 122 and 125 and the separation film 121 face each other. According to one embodiment, as Figure 4a As shown, the groove 310 may be a corrugated groove including a form in which a region 402 (e.g., a platform region) that increases to a certain level or more compared to the reference thickness 401 (e.g., an average thickness) and a region 404 (e.g., a sinking region) that decreases to a certain level or less compared to the reference thickness 401 are continuously formed with reference to a reference thickness 401 (e.g., an average thickness) of the surfaces of the electrodes 122 and 125. The gap 320 formed by the corrugated groove 310 is a portion in which at least a portion of the electrode 122 or 125 and at least a portion of the separation film 121 are not coupled around the groove 310 formed in the electrode 122 or 125 with weakened coupling strength (e.g., bonding strength), and may cause formation of a coupling surface having an uneven thickness.

[0067] In this regard, the processor 208 may detect at least one of the electrodes 122 and 125 having a shape in which the groove 310 (e.g., a wave-shaped groove) is formed as a bad electrode, which causes the formation of the gap 320 in the electrode assembly 120 when coupled to the separation film 120. Therefore, the electrode assembly 120 can be prevented from being manufactured as a bad electrode, and thus the secondary battery 100 ensuring performance at a certain level can be manufactured. The processor 208 according to various embodiments related to this point will be described in detail below.

[0068] According to various embodiments, as part of the operation of detecting bad electrodes, the processor 208 can confirm a thickness change of at least one of the electrodes 122 and 125. For example, the processor 208 can measure the thickness (e.g., thickness change) of at least one of the electrodes 122 and 125 based on the measurement values ​​obtained by the measurement module 202.

[0069] According to various embodiments, the processor 208 may determine, based on the measured thickness, whether a groove 310 sunken compared to the periphery has been formed in at least one of the electrodes 122 and 125. Preferably, the processor 208 may determine whether a wave-shaped groove has been formed in which, with reference to a reference thickness 401 (e.g., average thickness) of the surfaces of the electrodes 122 and 125 as a reference, a region 402 (e.g., a platform region) that increases to a certain level or more compared to the reference thickness 401 and a region 404 (e.g., a sunken region) that decreases to a certain level or less compared to the reference thickness 401 are continuously formed.

[0070] According to one embodiment, when the thickness of at least one of the electrodes 122 and 125 changes in the same direction (or the same sign), the processor 208 may determine that the groove 310 is not formed in the corresponding electrode.

[0071] According to another embodiment, when a turning point at which a direction of thickness variation of at least one of the electrodes 122 and 125 changes is present, the processor 208 may determine that at least one groove 310 has been formed in the corresponding electrode.

[0072] According to various embodiments, when it is confirmed that the groove 310 has been formed in at least one of the electrodes 122 and 125, the processor 208 may determine whether the confirmed groove 310 may cause the formation of the gap 320 in the electrode assembly 120 when at least one of the electrodes 122 and 125 and the separation film 120 are coupled. For example, the processor 208 may determine that the groove 310 having a specified size and / or a specified depth formed in at least one of the electrodes 122 and 125 may cause the formation of the gap 320.

[0073] According to one embodiment, Figure 4a As shown, the processor 208 can determine the depth of the groove 310 based on the difference 420 between the maximum value 422 corresponding to the maximum thickness of the measurement target (e.g., the maximum thickness of the platform area) and the minimum value 424 corresponding to the minimum thickness of the measurement target (e.g., the minimum thickness of the sinking area) among the measurement values ​​410 obtained by the measurement module 202. In addition, the processor 208 can determine the size of the groove 310 based on the range of continuously obtaining the measurement values ​​corresponding to the thickness less than or equal to a certain level. However, this is only exemplary, and various embodiments are not limited thereto. For example, various known techniques can be applied to determine the size and / or depth of the groove 310 formed in at least one of the electrodes 122 and 125.

[0074] At least one of the electrodes 122 and 125 may be defined as having a main body portion and an upper end portion. The upper end portion may be defined as an area within a certain range toward the other end with the edge of the electrode 122 or 125 (e.g., the edge of the electrode tab 124 or 127) as a reference. In addition, the main body portion may be defined as the remaining area excluding the upper end portion of the electrode 122 or 125. Generally, the groove 310 causing the gap 320 to be formed in the electrode assembly 120 is relatively more likely to be formed in the upper end portion than in the main body portion of the electrode 122 or 125.

[0075] In this regard, the processor 208 according to various embodiments may limit the determination area in which it is determined whether to form the groove 310 to the upper end portion of the electrode 122 or 125 .

[0076] According to one embodiment, Figure 4b As shown, the electrode assembly 120 may be configured in a form where the negative electrode 122 and the positive electrode 125 having substantially the same size are stacked with the separator 121 inserted therebetween. In this case, the processor 208 may limit the upper end portion 430 in a certain range d toward the other end with the edge 431 of the electrode terminal 123 or 126 as a reference to the determined area. In other words, the processor 208 may omit the operation of determining whether the groove 310 is formed in the main body portion of the electrode 122 or 125 excluding the determined area. However, this is merely exemplary, and various embodiments are not limited thereto. For example, the operation of determining whether the groove 310 is formed may be performed only on the main body portion of the electrode 122 or 125, or may be performed on all upper end portions and main body portions.

[0077] According to another embodiment, Figure 4c As shown, the electrode assembly 120 may be configured in a form in which the negative electrode 122 and the positive electrode 125 having different sizes are stacked with the separator 121 interposed therebetween. In this case, the processor 208 may limit the upper end portion 440 where the two electrodes 122 and 125 do not face each other to a determined area. In other words, the processor 208 may determine whether to form the groove 310 only in the determined area (A+B), and the determined area (A+B) includes the area A between the edge 122-1 of the first electrode (e.g., the negative electrode 122) having a relatively large size and the edge 123-1 of the electrode tab 123 and the area B between the edge 122-1 of the first electrode and the edge 125-1 of the second electrode 125 having a relatively small size.

[0078] According to various embodiments, an inclined portion may be formed on an upper end portion of the electrode 122 or 125. For example, in a cutting process, an inclined portion whose thickness gradually decreases toward an edge of the electrode 122 or 125 without substantially cutting the edge of the electrode 122 or 125 (for example, the edge 122-1 of the first electrode 122) at a right angle may be formed. As another example, in a coating process, an inclined portion in which the thickness of the slurry decreases toward the edge of the electrode 122 or 125 may be formed.

[0079] Therefore, the processor 208 may define a range for acquiring a maximum value corresponding to a maximum thickness of the measurement target and a range for acquiring a minimum value corresponding to a minimum thickness of the measurement target with reference to the inclined portion.

[0080] According to one embodiment, Figure 4d As shown, the processor 208 may define a boundary 452 (eg, Figure 4c The edge 125-1 of the second electrode 125 shown in FIG. 1 is defined as a determination starting point, and a certain range from the determination starting point is defined as a maximum value calculation range 454 (e.g., a platform area detection range). For example, the maximum value calculation range 454 may be a range of 2 mm to 5 mm from the determination starting point. Preferably, the range within 3 mm from the determination starting point may be the maximum value calculation range.

[0081] According to one embodiment, the processor 208 may define a certain range from the maximum value calculation point 456 as the minimum value calculation range 458 (e.g., the sinking area detection range). For example, the minimum value calculation range 458 may be a range from 8 mm to 15 mm from the maximum value calculation point 456. Preferably, a range within 10 mm from the maximum value calculation point 456 may be the minimum value calculation range.

[0082] According to various embodiments, as described above, processor 208 may detect a bad electrode based on grooves 310 formed in electrode 122 or 125 .

[0083] Additionally or alternatively, the processor 208 may also consider the location of the groove 310 when detecting a bad electrode. For example, when the location where the groove 310 is formed is closer to the boundary 452 between the main portion and the upper end portion of the electrode 122 or 125 (e.g., Figure 4c When the edge 125-1 of the second electrode 125 is formed, a gap 320 having a relatively small size can be formed. In this regard, Figure 5 As shown, when the boundary 510 between the main body portion and the upper end portion of the electrode 122 or 125 (eg, Figure 4cWhen the distance 514 between the edge 125 - 1 of the second electrode 125 shown and the location 512 where the groove is formed corresponds to a specified range, the processor 208 can determine that the corresponding electrode forming the groove 310 (which can cause the formation of the gap 320 in the electrode assembly 120) is formed as a normal electrode.

[0084] According to one embodiment, the processor 208 may determine the distance 514 between the edge of the platform area (i.e., the portion 512 where the sinking area starts) and the boundary 510 between the main body portion and the upper end portion. For example, the portion 512 where the sinking area starts may be defined within a range of 5% of the depth of the sinking area. For example, the distance 514 between the portion 512 where the sinking area starts and the boundary 510 between the main body portion and the upper end portion (e.g., Figure 5 As shown in the figure, it can be defined as the width of the platform area. In other words, it can be determined that an electrode in which a platform area and a sinking area with a width within a specified range are continuously formed is a normal electrode. On the other hand, it can be determined that an electrode in which a platform area and a sinking area with a width exceeding the specified range are continuously formed is a bad electrode.

[0085] Figure 6a and 6b is a diagram for describing the performance of a detection apparatus according to various embodiments.

[0086] refer to Figure 6a and 6b , it can be seen that the gap 320 may be formed in the electrode assembly 120 by at least one of the electrodes 122 and 125 .

[0087] Specifically, Figure 6a is a view showing the relationship between the shape of the target electrode and the gap.

[0088] For example, the third target electrode (case 3) 605 is a reference electrode as a reference for quality requirements. It can be seen that the shape of the first target electrode (case 1) 601 has a shape similar to the third target electrode 605 in which the thickness gradually decreases as the width decreases. Similar to the thickness change 615 of the third target electrode 605, this means that the thickness 611 of the first target electrode 601 without a turning point (where the direction of the thickness change is changed) can be detected as the thickness of a normal electrode that does not cause the formation of a gap.

[0089] On the other hand, it can be seen that the shape of the second target electrode (Case 2) 603 has a shape in which the thickness decreases as the width decreases, which is different from the third target electrode 605. Unlike the thickness variation 615 of the third target electrode 605, this means that the thickness 613 of the second target electrode 603 having a turning point in which the direction of the thickness variation is changed can be detected as the thickness of a poor electrode that causes gap formation.

[0090] Figure 6b is a view showing an electrode assembly 120 formed of a target electrode, and shows Figure 6a The test results are very accurate.

[0091] Specifically, it can be seen that Figure 6b (a) shows the electrode assembly 120 manufactured using the first target electrode 601 detected as a normal electrode, and a gap 620 having a relatively small size is formed between the first target electrode 601 and the separation film 121 .

[0092] In comparison, it can be seen that Figure 6b (b) shows the electrode assembly 120 manufactured by using the second target electrode 603 detected as a bad electrode, and a gap 630 having a relatively large size is formed between the second target electrode 603 and the separation film 121 .

[0093] As described above, the detection apparatus 200 according to various embodiments may accurately detect a bad electrode that may cause a gap to be formed in the electrode assembly 120 based on a thickness variation of the electrode 122 or 125 .

[0094] In the following, reference will be made to Figures 7 to 9b A method of operating a detection device according to various embodiments is described in detail.

[0095] Figure 7 1 is a flow chart for describing the detection operation of the detection device according to various embodiments. Each operation in the following embodiments can be performed sequentially, but not necessarily sequentially. For example, the order of each operation can be changed, and at least two operations can be performed in parallel. In addition, according to the embodiment, at least one of the following operations can be omitted.

[0096] refer to Figure 7 In operation 710, the detection device 200 (eg, the processor 208) may measure the thickness of the negative electrode 122 coupled to the positive electrode 125. According to one embodiment, as Figure 4c As shown, the detection apparatus 200 can measure the thickness of the negative electrode 122 in a state where the negative electrode 122 having a relatively large size and the positive electrode 125 having a relatively small size are layered with the separator 121 interposed therebetween.

[0097] According to various embodiments, in operation 720, the detection device 200 (e.g., the processor 208) may determine whether the gap 320 is formed in the coupling region based on the measured thickness. According to one embodiment, the detection device 200 may determine whether the negative electrode 122 has a shape that causes the formation of the gap 320. For example, the detection device 200 may confirm whether the groove 310 having a specified depth and / or size has been formed based on the thickness change of the negative electrode 122. For example, the detection device 200 may determine whether a wave groove in which a region 402 (e.g., a platform region) that increases to a certain level or more compared to the reference thickness 401 and a region 404 (e.g., a sinking region) that decreases to a certain level or less compared to the reference thickness 401 has been formed continuously has been formed.

[0098] According to various embodiments, in operation 730, the detection device 200 (e.g., the processor 208) may determine a fault of the negative electrode 122 based on a result of determining whether the gap 320 is formed. According to one embodiment, the detection device 200 may determine the negative electrode 122 in which the groove 310 having a specified depth and / or size has been formed as a bad negative electrode.

[0099] Figure 8 is a flowchart for describing another operation of the detection device according to various embodiments. Figure 8 The operation can be expressed as Figure 7 Those operations of various embodiments of operation 730 in.

[0100] refer to Figure 8 In operation 810 , the detection apparatus 200 (eg, the processor 208 ) according to various embodiments may determine a location of the groove 310 formed in the negative electrode 122 .

[0101] According to various embodiments, in operation 820 , the detection apparatus 200 (eg, the processor 208 ) may determine whether the position of the groove 310 is within a certain distance based on the edge of the positive electrode 125 .

[0102] According to various embodiments, in operation 830 , when the position of the groove 310 is included within a certain distance based on the edge of the positive electrode 125 , the detection apparatus 200 (eg, the processor 208 ) may determine the negative electrode 122 in which the groove 310 has been formed as a normal negative electrode.

[0103] According to various embodiments, in operation 840 , when the position of the groove 310 is not included within a certain distance based on the edge of the positive electrode 125 , the inspection apparatus 200 (eg, the processor 208 ) may determine the negative electrode 122 in which the groove 310 has been formed as a bad negative electrode.

[0104] Figure 9a and Figure 9b is a view for describing an operation of setting a quality requirement standard for an electrode in a detection apparatus according to various embodiments.

[0105] refer to Figure 9a and Figure 9b , the detection device 200 according to various embodiments may set a quality requirement standard based on a result of determining the quality (or analysis result) of the electrode 122 or 125 .

[0106] According to various embodiments, the detection device 200 may store the result of determining the quality of the electrode 122 or 125 in the form of a table. For example, the detection device 200 may store the shape of the groove 310 formed in the electrode 122 or 125 determined to be normal. The shape of the groove 310 may include at least one of the formation position of the groove 310, the area of ​​the groove 310, and the depth of the groove 310. For example, when the wave groove 310 is formed in the electrode 122 or 125, the detection device 200 may store the shape of the platform area and the shape of the sinking area.

[0107] According to various embodiments, the detection device 200 may set the approximation 910 of the stored shape of the groove as a standard for determining normality. Figure 9b As shown, the range of the groove 310 that can be determined as normal can be specified 920 based on the shape of the groove 310 confirmed on the normal electrode. The standard can be updated whenever the quality requirement determination operation is performed. Therefore, the detection device 200 can determine the electrode that has formed the groove 310 included in the specified range as a normal electrode, and determine the electrode that has formed the groove 310 not included in the specified range as a bad electrode.

[0108] As described above, the detection device 200 according to various embodiments can set a standard for determining normality based on the result of determining the normality of the electrode 122 or 125. However, this is only exemplary, and various embodiments are not limited thereto. For example, the detection device 200 according to various embodiments can store the shape of the groove 310 formed in the electrode 122 or 125 determined to be bad, and set the approximate value of the stored shape of the groove 310 as the standard for determining a fault.

[0109] The above description is merely an exemplary description of the technical spirit of the present invention, and those skilled in the art to which the present invention pertains will be able to variously modify and change the present invention without departing from the basic characteristics of the present invention.

[0110] Therefore, the embodiments disclosed in the present invention are not intended to limit the technical spirit of the present invention, but are used to describe the present invention, and the scope of the technical spirit of the present invention is not limited by these embodiments. The scope of the present invention should be interpreted by the attached claims, and all technical spirits within the equivalent scope should be interpreted as included in the scope of the present invention.

Claims

1. A detection device configured to detect a bad electrode, the detection device comprising: a measurement module configured to obtain a thickness measurement of at least one electrode; as well as a processor, the processor being electrically connected to the measurement module, Wherein, the processor is configured to: identifying a groove formed in the at least one electrode based on the thickness measurement; When the waveform groove corresponding to the reference shape is confirmed, the at least one electrode is detected as a defective electrode.

2. The detection device according to claim 1, wherein: The processor is configured to confirm the waveform groove in the following form based on a reference thickness of the at least one electrode: a platform area that increases to a certain level or more compared to the reference thickness and a sinking area that decreases to a certain level or less compared to the reference thickness are continuously formed.

3. The detection device according to claim 1, wherein: The reference shape includes at least one of a specified area and a specified depth.

4. The detection device according to claim 1, wherein: The processor is configured to confirm the groove formed in the at least one electrode in an inclined portion where the thickness gradually decreases.

5. The detection device according to claim 4, wherein: The inclined portion is formed in a cutting or coating process in a process of manufacturing the at least one electrode.

6. The detection device according to claim 1, wherein: The processor is configured to confirm the groove in an upper end portion of the electrode within a certain range toward the other end with reference to an edge of an electrode tab formed on the at least one electrode.

7. The detection device according to claim 1, wherein: The processor is configured to obtain a thickness measurement value of an electrode assembly in which positive and negative electrodes having substantially the same size are stacked with a separator interposed therebetween.

8. The detection device according to claim 2, wherein: The processor is configured to obtain a thickness measurement value of an electrode assembly in which a negative electrode having a relatively large size and a positive electrode having a relatively small size are stacked with a separator interposed therebetween.

9. The detection device according to claim 8, wherein: The processor is configured to: When the wave-shaped groove corresponding to the reference shape is confirmed, the distance between the position where the sinking area starts after the platform area and the edge of the positive electrode is confirmed; When the distance is within a specified range, detecting the at least one electrode as a normal electrode; When the distance is outside the specified range, the at least one electrode is detected as a bad electrode.

10. The detection device according to claim 1, further comprising a memory, in, The processor is configured to: resetting the reference shape based on the shape of the wave-shaped groove formed in the defective electrode; The reset reference shape is stored in the memory.

11. A method of operating a detection device, comprising: an operation of obtaining a thickness measurement of at least one electrode; confirming operation of a groove formed in the at least one electrode based on the thickness measurement; When the waveform groove corresponding to the reference shape is confirmed, the at least one electrode is detected as an operation of a defective electrode.

12. The method according to claim 11, wherein: The wave-shaped groove includes a form in which a platform area increased to a certain level or more compared with the reference thickness and a sinking area decreased to a certain level or less compared with the reference thickness are continuously formed based on the reference thickness of the at least one electrode.

13. The method according to claim 11, wherein: The reference shape includes at least one of a specified area and a specified depth.

14. The method according to claim 11, comprising an operation of confirming the groove formed in the at least one electrode in an inclined portion where the thickness gradually decreases.

15. The method according to claim 14, wherein: The inclined portion is formed in a cutting or coating process in a process of manufacturing the at least one electrode. 16 . The method according to claim 11 , comprising an operation of confirming the groove in an upper end portion of the electrode within a range toward the other end with reference to an edge of an electrode tab formed on the at least one electrode. 17 . The method according to claim 11 , comprising the operation of obtaining a thickness measurement value of an electrode assembly in which positive and negative electrodes having substantially the same size are stacked with a separator interposed therebetween. 18 . The method according to claim 12 , comprising an operation of obtaining a thickness measurement value of an electrode assembly in which a negative electrode having a relatively large size and a positive electrode having a relatively small size are stacked with a separator interposed therebetween.

19. The method according to claim 18, comprising: When the wave-shaped groove corresponding to the reference shape is confirmed, an operation of confirming the distance between the position where the sinking area starts after the platform area and the edge of the positive electrode; When the distance is within a specified range, detecting the at least one electrode as an operation of a normal electrode; When the distance is outside the specified range, the at least one electrode is detected as an operation of a bad electrode.

20. The method according to claim 11, comprising an operation of resetting the reference shape based on the shape of the wave-shaped groove formed in the defective electrode; and An operation that stores the reset reference shape.

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