Carrier transport system, vacuum deposition system and method of transporting carrier

Abstract

The invention relates to a carrier transport system (100) for transporting carriers in a vacuum processing system in a main transport direction (T) along a first transport path (T1) and along a second transport path (T2) extending close to the first transport path (T1) and for transferring carriers in a path switching direction (S) between the first transport path (T1) and the second transport path (T2). The carrier transport system comprises a common movable support (119) on which the first carrier holder (110) and the second carrier holder (120) are arranged at a distance from each other in the path switching direction (S). In a first transport state (i) sharing the movable support (119), the first carrier holder (110) is configured to hold the first carrier (10) in alignment with the first transport path (T1) and the second carrier holder (120) is configured to hold the second carrier (20) in alignment with the second transport path (T2) laterally spaced from the first carrier (10). The common movable support is movable in the path switching direction (S) to synchronously move the first carrier holder (110) and the second carrier holder (120) in the path switching direction (S). A vacuum deposition system having such a carrier transport system and a method of transporting a carrier in a vacuum processing system are further described.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to systems and methods for transporting carriers, particularly carriers for carrying large area substrates. More specifically, embodiments of the present disclosure relate to systems and methods for transporting carriers that can be employed, for example, in vacuum processing systems for vertical substrate processing, particularly for material deposition on large area substrates for display manufacturing. Specifically, embodiments of the present disclosure relate to carrier transport systems, vacuum deposition systems, and methods for transporting carriers. Background Art

[0002] Techniques for depositing layers on substrates include, for example, sputtering deposition, physical vapor deposition (PVD), chemical vapor deposition (CVD), and thermal evaporation. Coated substrates can be used in a variety of applications and in a variety of technical fields. For example, coated substrates can be used in the field of displays. Displays can be used to manufacture television screens, computer monitors, mobile phones, other handheld devices, etc. for displaying information. Typically, displays are produced by coating substrates with stacks of different material layers.

[0003] In order to deposit one or more material layers on a substrate, a vacuum deposition system arranged with a vacuum processing chamber, such as a deposition chamber and optionally other processing modules, such as a cleaning module, an etching module, a loading module and / or a transport module, can be used. A plurality of substrates can be processed continuously or quasi-continuously in a vacuum deposition system, which can be, for example, an inline processing system or a cluster system.

[0004] The substrate is usually carried by a substrate carrier (i.e., a carrying device for carrying the substrate). The carrier carrying the substrate is usually transported through the vacuum deposition system along one or more transport paths in the main transport direction T, for example into or through a vacuum processing chamber containing a deposition source or another processing device. At least two transport paths can be arranged close to each other in the vacuum deposition system, for example, a first transport path for transporting the carrier into the vacuum processing chamber in a forward direction and a second transport path for transporting the carrier in a return direction opposite to the forward direction after substrate processing. The carrier transport system can be arranged to move the carrier between the first transport path and the second transport path in a path switching direction S transverse to the main transport direction T, in particular perpendicular to the main transport direction.

[0005] However, such a path switching of carriers between two transport paths may be time consuming and may therefore reduce the throughput of the system. Furthermore, the processing cycle may be increased by the fact that the path switching of a first carrier in a vacuum chamber needs to be completed before a subsequent carrier can be loaded into the vacuum processing chamber; and / or the first carrier may need to be unloaded from a track section of a path switching device before a subsequent carrier can be transported onto the track section. Furthermore, particles generated during path switching due to wear of moving parts may lead to a deterioration of the manufacturing process. Therefore, it is necessary to transport carriers in a path switching direction transverse to the main transport direction in a vacuum chamber in a fast and time-saving manner.

[0006] It would therefore be beneficial to provide improved systems and methods for carrier transport, particularly in vacuum processing chambers, and improved vacuum deposition systems that overcome at least some of the problems discussed above. Summary of the invention

[0007] In view of the above, a carrier transport system, a vacuum deposition system and a method of transporting a carrier according to the independent claims are provided. Further aspects, advantages and features are apparent from the dependent claims, the description and the drawings.

[0008] According to one aspect of the present disclosure, there is provided a carrier transport system for transporting a carrier in a vacuum processing chamber along a first transport path T1 in a main transport direction T and along a second transport path T2 extending close to the first transport path, and for transferring the carrier between the first transport path T1 and the second transport path T2 in a path switching direction S. The carrier transport system includes: a common movable support, a first carrier holder defining a first track section and a second carrier holder defining a second track section are arranged at the common movable support so as to be laterally spaced apart from each other in the path switching direction. In a first transport state of the common movable support, the first carrier holder is configured to keep the first carrier aligned with the first transport path, and the second carrier holder is configured to keep the second carrier aligned with the second transport path, i.e., laterally spaced apart from the first carrier. The common movable support is movable in the path switching direction to synchronously move the first carrier holder and the second carrier holder in the path switching direction S.

[0009] In some embodiments, by moving the common movable support in the path switching direction, the first carrier held by the first carrier holder may switch the transport path from the first transport path to the second transport path and / or vice versa, or the first carrier may be moved to a processing position D laterally offset from the first transport path and the second transport path. Alternatively or additionally, by moving the common movable support in the path switching direction, the second carrier held by the second carrier holder may switch the transport path from the second transport path to the first transport path, or vice versa, or the second carrier may be moved to a processing position D laterally offset from the first transport path and the second transport path.

[0010] In some embodiments, the carrier transport system can be configured to transport the carrier in a substantially vertical orientation. Specifically, when held by the first carrier holder and / or the second carrier holder, and during transport along the first transport path and the second transport path, the carrier and the substrate carried by the carrier can be oriented substantially vertically.

[0011] According to another aspect of the present disclosure, there is provided a vacuum deposition system including a carrier transport system as disclosed herein. The vacuum deposition system includes: a first vacuum processing chamber, the first vacuum processing chamber accommodating a first processing device, in particular a first deposition source; and a second vacuum processing chamber, the second vacuum processing chamber accommodating a second processing device, in particular a second deposition source. The first transport path T1 and the second transport path T2 extend linearly in the main transport direction T and pass through the first vacuum processing chamber and the second vacuum processing chamber close to each other. The common movable support of the vacuum transport system is configured to move the carrier in the first vacuum processing chamber at least between the first transport path T1 and the second transport path T2 and optionally to a processing position D to coat a substrate carried by the carrier with the first deposition source, and the processing position D deviates from the first transport path and the second transport path in the path switching direction S.

[0012] According to another aspect of the present disclosure, a method for transporting a carrier in a vacuum processing system, in particular using the carrier transport system described herein, is provided. The method comprises: (a) transporting the carrier along a first transport path in a main transport direction T to a second carrier holder (or a first carrier holder) arranged in a first vacuum processing chamber, the first carrier holder and the second carrier holder being arranged at a common movable support member spaced apart from each other and respectively configured to hold the carrier; (b) moving the common movable support member in a path switching direction to synchronously move the first carrier holder and the second carrier holder in the path switching direction until the carrier is positioned at a processing position; (c) processing a substrate carried by the carrier at the processing position; (d) moving the common movable support member in the path switching direction to synchronously move the first carrier holder and the second carrier holder in the path switching direction until the carrier is positioned on the second transport path or alternatively on the first transport path; and (e) transporting the carrier away from the second carrier holder (or away from the first carrier holder) along the second transport path or alternatively along the first transport path.

[0013] Embodiments also relate to apparatus for performing the disclosed methods and include apparatus parts for performing each described method aspect. These method aspects can be performed by hardware components, computers programmed by appropriate software, any combination of the two, or in any other manner. In addition, embodiments according to the present disclosure also relate to methods for operating the described apparatus. The methods for operating the described apparatus include method aspects for performing each function of the apparatus. Embodiments also relate to methods for manufacturing processed substrates, particularly coated substrates, in the vacuum deposition system described herein and / or using the carrier transport system described herein. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In order to be able to understand in detail the manner in which the above-mentioned features of the present disclosure are achieved, a more particular description of the present disclosure briefly summarized above may be made by reference to embodiments. The accompanying drawings relate to embodiments of the present disclosure and are described below:

[0015] Figure 1 shows a schematic top view of a carrier transport system according to embodiments described herein, with the common movable support in a first transport state (i);

[0016] Figure 2 Shows Figure 1 Schematic top view of a carrier transport system of , the common movable support being in a second transport state (ii);

[0017] Figure 3 Shows Figure 1 Schematic top view of a carrier transport system of , the common movable support being in a third transport state (iii);

[0018] Figure 4 Shows Figure 1 Schematic top view of a carrier transport system of , the common movable support being in a fourth transport state (iv);

[0019] Figure 5 shows a schematic cross-sectional view of a carrier transport system according to embodiments described herein;

[0020] Figure 6 The fourth transport state (iv) is shown. Figure 5 A schematic cross-sectional view of a carrier transport system;

[0021] Fig. 7A and Figure 7B shows a schematic top view of a vacuum deposition system according to embodiments described herein, the vacuum deposition system being used to perform a method of transporting a carrier according to embodiments described herein;

[0022] Figure 8 shows a schematic top view of a vacuum deposition system according to the described embodiments;

[0023] Fig. 9 A flow chart is shown for illustrating a method of transporting a carrier according to an embodiment described herein; and

[0024] Fig.10 A schematic top view of a vacuum deposition system is shown for illustrating methods of transporting a carrier according to embodiments described herein. DETAILED DESCRIPTION

[0025] Reference will now be made in detail to various embodiments of the present disclosure, one or more examples of which are illustrated in the accompanying drawings. In the following description of the drawings, the same reference numerals denote the same components. Only the differences with respect to the various embodiments are described. Each example is provided by way of explanation of the present disclosure, but this is not meant to limit the present disclosure. Further, features illustrated or described as part of one embodiment may be used on other embodiments or used in combination with other embodiments to produce yet another embodiment. This specification is intended to include such modifications and changes.

[0026] The carrier transport system can be configured to transport the carrier in a vacuum environment, in particular in a vacuum chamber or in a vacuum processing system, the vacuum processing system comprising a plurality of vacuum chambers arranged close to each other (e.g., in a linear arrangement). One, two or more transport paths can be arranged close to each other in the vacuum chamber, wherein the carrier can be moved or delivered along one or more transport paths in a main transport direction T. A first transport path T1 can extend in the vacuum processing chamber adjacent to, for example, a second transport path T2 substantially parallel to the first transport path T1 or extend through the vacuum processing chamber. The first transport path T1 and the second transport path T2 can extend in the main transport direction T, respectively, which can be a substantially horizontal direction. Optionally, as Figure 1 As shown, the first transport path and the second transport path may extend linearly through two, three or more vacuum chambers arranged in a substantially linear arrangement.

[0027] A plurality of carrier drive units 301 (such as drive rollers and / or linear motors) for advancing the carrier in the main transport direction T may be arranged, for example, at regular intervals along the first transport path T1 and along the second transport path T2. The plurality of carrier drive units 301 may be configured to move the carrier between several vacuum chambers of the vacuum processing system along the first transport path and the second transport path.

[0028] The first transport path T1 and the second transport path T2 may be spaced apart from each other by a distance X in the path switching direction S, which is a direction transverse or perpendicular to the main transport direction T. The distance X between the first transport path T1 and the second transport path T2 in the path switching direction S may be 1 cm or more, in particular 2 cm or more; and / or 50 cm or less, in particular 20 cm or less. For example, the distance X may be 5 cm or more and 10 cm or less.

[0029] The carrier transport system 100 described herein may be part of a vacuum processing system, in particular a vacuum deposition system configured to deposit materials on a substrate carried by a carrier. The vacuum deposition system may be an in-line processing system, enabling continuous or quasi-continuous processing of substrates. The carrier transport system may be configured to transfer the carrier from a first position on a first transport path T1 to at least one of a second transport path T2 and a processing position D, where the substrate carried by the carrier faces the processing device 105, in particular toward a deposition source, and may be processed. Specifically, the carrier transport system may laterally shift the carrier from a first position on the first transport path T1 to a second position away from the first transport path in a path switching direction S. When the carrier is moved from one transport path to another transport path or to a processing position D in a path switching direction S, the lateral movement may also be referred to as "path switching".

[0030] Figure 1is a schematic cross-sectional view of a carrier transport system 100 according to an embodiment described herein. The carrier transport system 100 includes a common movable support 119, and a first carrier holder 110 defining a first track section and a second carrier holder 120 defining a second track section are arranged at the common movable support. The first carrier holder 110 and the second carrier holder 120 are arranged at the common movable support 119 in a path switching direction S and are spaced apart from each other laterally. In particular, the first carrier holder 110 and the second carrier holder 120 may be respectively mounted at the common movable support 119 or formed integrally with the common movable support, so that movement of the common movable support 119 causes corresponding movement of both the first carrier holder and the second carrier holder. In particular, the first carrier holder 110 and the second carrier holder 120 may be fixedly mounted at the common movable support 119 so as to follow the movement of the common movable support 119 in the path switching direction S.

[0031] For example, the common movable support 119 may include a movable support arm or a support rod, which extends at least partially through the vacuum processing chamber 101 in the path switching direction S, and the first carrier holder 110 may be fixed on the support arm or the support rod at a first position, and the second carrier holder 120 may be fixed on the support arm or the support rod at a second position deviating from the first position in the path switching direction S, and in particular, the distance X between the two basically corresponds to the distance between the first transport path T1 and the second transport path T2.

[0032] In some embodiments, which may be combined with other embodiments described herein, the movable support arm or support rod may extend through the side wall of the vacuum processing chamber 101. Optionally, a flexible element (not shown), such as a bellows, may be provided for allowing relative movement between the movable support arm or support rod and the side wall of the vacuum chamber while maintaining vacuum separation between the interior of the vacuum chamber and the surrounding environment where the motor 118 may be located. The first carrier holder and the second carrier holder may be connected, in particular fixedly connected, to the movable support arm or support rod within the vacuum chamber.

[0033] The first carrier holder 110 is configured to hold the first carrier 10, in particular in a substantially vertical orientation, and to define a first track section extending along the main transport direction T, so that the first carrier can be transported to or from the first track section along the first transport path or the second transport path in the main transport direction T. The second carrier holder 120 is configured to hold the second carrier 20, in particular in a substantially vertical orientation, and to define a second track section extending in the main transport direction T, so that the second carrier can be transported to or from the second track section along the first transport path or the second transport path in the main transport direction T. The first track section defined by the first carrier holder 110 and the second track section defined by the second carrier holder 120 may be substantially spaced apart from each other by a distance X in the path switching direction S.

[0034] The common movable support 119 is configured to be movable in the path switching direction S to synchronously move the first carrier holder 110 and the second carrier holder 120 in the path switching direction S. In particular, a motor 118 or other drive, in particular a single motor, may be provided to move the common movable support 119 and the first carrier holder and the second carrier holder (and optionally the (multiple) carriers held by the carrier holders) fixed thereto together in the path switching direction S.

[0035] exist Figure 1 In the embodiment, the common movable support 119 is arranged in a first transport state (i), in which the first carrier holder 110 is kept aligned with the first transport path T1, so that the first carrier 10 can be transported to or from the first carrier holder along the first transport path T1 in the main transport direction T, for example, via the carrier driving unit 301, and in this state, the second carrier holder 120 is kept aligned with the second transport path T2, so that the second carrier 20 can be transported to or from the second carrier holder along the second transport path T2 in the main transport direction T, for example, via the carrier driving unit 301. Specifically, in the first transport state (i), the first track segment and the second track segment defined by the first carrier holder and the second carrier holder, respectively, are arranged in alignment with the first transport path and the second transport path, so that the carrier can be transported on or above the first track segment and the second track segment along the first transport path T1 and along the second transport path T2 into and / or through the first vacuum processing chamber 101. A carrier driving unit 301 , such as a driving roller or a linear motor, may be disposed along the first and second transport paths to propel the carrier along the first and second transport paths over the first and second track sections.

[0036] The movement of the common movable support 119 in the path switching direction S results in corresponding movement of both the first carrier holder and the second carrier holder in the path switching direction, since the carrier holders are fixedly mounted on the common movable support 119. Therefore, the carrier transport system may also be referred to as a "dual movable track" (or "DMT"), since two track sections arranged at a fixed lateral interval from each other may be synchronously moved in the path switching direction via a common drive. The advantages of this path switching arrangement compared to other path switching arrangements are as follows:

[0037] (1) Due to Figure 1 In the first transport state (i) shown, the two track segments are arranged on the first transport path and the second transport path at a distance X corresponding to the distance between the first transport path and the second transport path, so that the carrier transport system 100 can be used as a conveying module that allows a linear carrier to be routed through the first vacuum processing chamber 101 along the two transport paths above the two track segments. For example, the first carrier 10 (e.g., carrying the unprocessed first substrate 11) can be linearly transported through the vacuum processing chamber 101 into the second vacuum processing chamber 102 on the first transport path T1 above the first track segment in a forward direction, while the second carrier (e.g., carrying the unprocessed first substrate 11) can be linearly transported on the second transport path T2 above the second track segment in a return direction. Figure 1 1 , a second substrate 21 (schematically depicted in FIG. 1 ) subjected to processing in a second vacuum processing chamber 102 is transported linearly through the vacuum processing chamber 101 into another vacuum chamber 103, for example for unloading. In particular, the path switching function may be at least temporarily not used, and a (possibly simultaneous) linear carrier transport over two track sections (possibly in opposite directions) through the vacuum processing chamber 101 may be performed. Such a carrier transfer is not possible with a "single movable track" of only one transversely movable track section, because a "single movable track" does not allow for the simultaneous transport of two carriers close to each other.

[0038] (2) Since the common movable support 119 can be moved in the path switching direction S, the position of the carrier can be switched from the first transport path T1 to the second transport path T2, and / or vice versa, by lateral movement of the common movable support. The "track switching function" enhances flexibility and enables more or different carrier transport sequences without significantly increasing complexity. In addition, compared to a carrier transport system having two laterally movable track sections (which can also be moved relative to each other), the "dual movable track" with a fixed distance between the two track sections as described herein is less complex and less costly because the number of drives, the number of supports, and / or the number of vacuum feedthroughs can be reduced. Other path switching mechanisms that allow two separate movable track sections to move past each other in the path switching direction are typically complex and have a high maintenance frequency. The DMT described herein is more robust and enables more reliable carrier support and delivery.

[0039] (3) Since the common movable support 119 is movable in the path switching direction S, the common movable support can also move at least one of the first carrier holder and the second carrier holder to a processing position D laterally deviated from the first transport path and the second transport path to process the substrate carried by the carrier in the vacuum processing chamber 101, for example to coat the substrate with a material. Therefore, the first vacuum processing chamber 101 can be used not only as a conveying module for carrier transport in the main transport direction T, but also optionally for performing path switching and / or as a layer deposition module for coating the substrate at the processing position D (or as a module for performing another processing action on the substrate at the processing position D). A single movable track is less flexible in this respect because when the single movable track is occupied by a carrier, the corresponding vacuum chamber cannot be used in other ways, while a double movable track has a free track section for example for linear substrate transport through the vacuum chamber, even if one of the two tracks is occupied for example for carrier transport or substrate processing.

[0040] Thus, the dual movable rails described herein allow for flexible carrier routing to efficiently use the system layout and constitute a cost-effective and robust design suitable for achieving high throughput without the need for expensive and complex design solutions that may require more frequent maintenance. The uptime of the system may be increased and the cycle time of an inline processing system may be reduced.

[0041] In some embodiments, which may be combined with other embodiments described herein, the common movable support 119 may be movable together with the first carrier holder 110 and the second carrier holder 120 in the path switching direction S between two or more of the following transport states: Figure 1a first transport state (i) shown, in which the first track section is aligned with the first transport path T1 and the second track section is aligned with the second transport path T2; Figure 2 a second transport state (ii) shown, in which the second track section is positioned at a processing position D deviating from the first transport path and the second transport path; and / or Figure 3 In the third transport state (iii) shown, in the third transport state, the second track section is aligned with the first transport path T1, for example, for moving the second carrier 20 along the first transport path T1. Optionally, in the second transport state (ii), the first track section may be aligned with the second transport path T2, for example, for moving the first carrier 10 along the second transport path T2 (see Figure 2 ).

[0042] Figure 2 The carrier transport system 100 is shown after the common movable support 119 has been moved in the path switching direction S to the second transport state (ii). Figure 1 Starting from the first transport state (i) shown, the common movable support 119 can be moved, for example, toward the processing device 105 by a distance X or a distance different from X until the second carrier holder 110 is positioned at the processing position D. Here, the second substrate 21 carried by the second carrier 20 held on the second carrier holder 120 faces the processing device 105 for processing (e.g. Figure 2 As shown by the arrows in FIG. 2 , the arrows illustrate material deposition on the second substrate 21).

[0043] If the distance between the second transport path T2 and the processing position D corresponds to the distance X between the first transport path and the second transport path (as illustrated in the figure), in the second transport state (ii), the first carrier holder 110 can be substantially aligned with the second transfer channel T2. At least one of the first carrier holder and the second carrier holder can support the carrier during the movement of the common movable support 119 in the path switching direction S.

[0044] The "processing position D" may be understood as a position deviating from the first transport path and the second transport path, at which the substrate carried by the carrier will be positioned for processing, in particular coating with a coating material. Specifically, the "processing position D" may be arranged between the second transport path T2 and the processing device 105, and the second transport path T2 may be arranged between the first transport path T1 and the processing position D. The distance between the first transport path and the second transport path does not necessarily correspond to the distance between the second transport path T2 and the processing position D, but this is possible.

[0045] When the common movable support 119 is in the second transport state (ii), the processing device 105 may be a deposition source, in particular a sputtering source, and may coat the second substrate 21 held on the second carrier holder 120 with a material. Therefore, the common movable support 119 may be moved from the first transport state (i) to the second transport state (ii) to transfer the second carrier holder 120 from the second transport path T2 to the processing position D for processing the second substrate 21 carried by the second carrier 20. Optionally, the first carrier holder 110 may simultaneously perform a track switch from the first transport path T1 to the second transport path T2.

[0046] Figure 3 The carrier transport system 100 is shown after moving the common movable support 119 to the third transport state (iii) in the path switching direction S. Figure 1 Starting from the illustrated first transport state (i), the common movable support 119 may be moved, for example, a distance X away from the handling device 105, until the second carrier holder 120 is substantially aligned with the first transport path T1. The second carrier holder 120 may be occupied by a carrier during the movement.

[0047] In some embodiments, in the third transport state (iii), the second carrier holder 120 (rather than the first carrier holder 110) may hold a carrier. In particular, in the third transport state (iii), the first carrier holder 110 may be positioned at a first stop position P1, which may be a position close to a chamber wall of the vacuum processing chamber. When the common movable support is in the third transport state (iii), the first carrier holder 110 positioned at the first stop position P1 may be in an idle state (not available for carrier support).

[0048] Optionally, in some embodiments, the common movable support 119 may be moved to the position in the second transport state (ii) by moving the common movable support 119 further toward the processing device 105, in particular by moving the common movable support 119 a distance X. Figure 4 Thus, in the fourth transport state (iv), the first track section can be positioned at a processing position so that the first substrate 11 (e.g., a substrate 12) carried by the first carrier 10 held by the first carrier holder 110 can be processed, in particular coated with a material. Figure 4 As shown by the arrows in FIG. 1 , the arrows illustrate material deposition on the first substrate 11).

[0049] In some embodiments, which may be combined with other embodiments described herein, when the common movable support 119 is in the fourth transport state (iv), the second track segment may be positioned at a (second) rest position P2. The second rest position P2 may be a position close to the processing device 105. For example, the second track segment may be arranged near the processing device 105 or even partially overlap the processing device (when viewed from above). In some embodiments, as Figure 4 and Figure 6 As schematically depicted in FIG. 1 , the second carrier holder 120 may, for example, be arranged at least partially below the processing device 105 or below the mask when the common movable support 119 is in the fourth transport state (iv).

[0050] When a carrier carrying a substrate is on the first carrier holder 110 (the first carrier holder is a carrier holder that is farther from the processing device 105), the fourth transport state (iv) may enable the processing device 105 to process the substrate. In some embodiments, in the fourth transport state (iv), the first carrier holder 110 (rather than the second carrier holder 120) may hold the carrier because the second carrier holder 120 may be in the second stop position P2, which may not be used to hold the carrier, for example, because the available space above the second carrier holder 120 may not be sufficient at the second stop position P2 (see Figure 6 ).

[0051] In some embodiments, the common movable support 119 can be moved between at least the following transport states: a first transport state (i), in which the carrier transport system can be used as a conveying module for transporting linear carriers through the first vacuum processing chamber along the first transport path and the second transport path; a second transport state (ii), in which the second track segment is positioned at the processing position D, and the first track segment is optionally aligned with the second transport path T2; a third transport state (iii), in which the second track segment is aligned with the first transport path T1, and the first track segment can be positioned at the first stop position P1; and an optional fourth transport state (iv), in which the first track segment is positioned at the processing position (D), and the second track segment can be optionally positioned at the second stop position P2.

[0052] In particular, the common movable support 119 is movable in the path switching direction S such that both the first track section and the second track section can be transferred between the first transport path T1 , the second transport path T2 and the deposition position D.

[0053] As used herein, a “rest position” is to be understood as a position of a carrier holder in which the carrier holder is idle, ie cannot be used to hold a carrier.

[0054] Figure 5 1 shows a schematic cross-sectional view of a carrier transport system 100 according to an embodiment described herein. Figure 1 The sectioning plane is designated as "Y". Figure 5 The carrier transport system 100 may include Figure 1 For some or all features of the embodiments, reference can be made to the above explanations and they will not be repeated here.

[0055] In particular, the carrier transport system 100 comprises a common movable support 119 at which the first carrier holder 110 and the second carrier holder 120 can be fixedly mounted at a relative distance corresponding to the distance between the first transport track T1 and the second transport track T2. Figure 5 In the first transport state (i) depicted in FIG. 1 , the first carrier holder 110 is configured to hold the first carrier 10 aligned with the first transport path T1 so that the first carrier can be transported into or through the vacuum processing chamber 101 along the first transport path T1 (the first transport path may be a forward path). The second carrier holder 120 is configured to hold the second carrier 20 aligned with the second transport path T2 so that the second carrier can be transported into or through the vacuum processing chamber 101 along the second transport path T2 (the second transport path may be a return path). The common movable support 119 is movable in the path switching direction S to move the first carrier holder 110 and the second carrier holder 120 in the path switching direction S.

[0056] like Figure 5 As depicted in the cross-sectional view of FIG. 1 , during transportation by the carrier transport system 100, the first carrier 10 (and the first substrate 11 carried by the first carrier 10) and the second carrier 20 (and the second substrate 21 carried by the second carrier 20) have a substantially vertical orientation V. As used herein, "substantially vertical" may be understood as a completely vertical orientation or an orientation that deviates from a completely vertical orientation by + / -10° or less. Carrier transport in a substantially vertical orientation and / or substrate processing in a substantially vertical orientation is particularly space-saving and reduces the footprint and cost of the vacuum deposition system.

[0057] The carrier transport system 100 comprises a first carrier holder 110 configured to hold a first carrier 10, in particular in a substantially vertical orientation, and a second carrier holder 120 configured to hold a second carrier 20, in particular in a substantially vertical orientation. The first drive unit 112 may be configured to transport the first carrier 10 to or from the first carrier holder 110 in a main transport direction T, and the second drive unit 122 may be configured to transport the second carrier 20 to or from the second carrier holder 120 in the main transport direction T.

[0058] In some implementations, at least one of the first drive unit 112 and the second drive unit 122 includes a linear motor (linear motor) configured to drive the corresponding carrier without contact along the main transport direction T. In some embodiments, a plurality of first drive units 112 and a plurality of second drive units 122 may be arranged, for example, at regular intervals along the main transport direction T, respectively. Alternatively or additionally, the drive unit may include a mechanical drive (such as one or more drive rollers) that can be driven to rotate by a motor to move the corresponding carrier in the main transport direction T on the one or more drive rollers.

[0059] In some implementations, the first drive unit and the second drive unit may be disposed at the first carrier holder and the second carrier holder and may move together with the common movable support 119 in the path switching direction S during path switching (see, for example, the first and second drive units respectively supported on the common movable support 119). Figure 5 Alternatively or additionally, a plurality of drive units (e.g., linear motors or rollers) may be fixedly arranged in the vacuum processing chamber 101 to drive the first carrier 10 onto or off the first carrier holder 110 along the first transport path or the second transport path and / or to drive the second carrier 20 onto or off the second carrier holder 120 along the first transport path or the second transport path (see, e.g., Figure 1 The carrier driving unit 301 in the embodiment of the present invention.

[0060] like Figure 5 As depicted, the first carrier holder 110 and the second carrier holder 120 may have substantially corresponding arrangements and corresponding features. Hereinafter, the first carrier holder 110 will be described in more detail, but it should be understood that the second carrier holder 120 may be similarly configured.

[0061] In some embodiments, at least one of the first carrier holder 110 and the second carrier holder 120 includes at least one magnetic suspension unit 114, which is used to magnetically offset at least a portion of the weight of the carrier. Specifically, the first carrier holder 110 may include at least one first magnetic suspension unit, in particular a suspension magnet, which is used to magnetically offset at least a portion of the weight of the first carrier 10 when it is held by the first carrier holder 110; and / or the second carrier holder 120 may include at least one second magnetic suspension unit, in particular a suspension magnet, which is used to magnetically offset at least a portion of the weight of the second carrier 20 when it is held by the second carrier holder 120.

[0062] Specifically, when the first carrier is supported on the first carrier holder 110, 10% or more, in particular 30% or more, or even 50% or more of the weight of the first carrier may be magnetically held by one or more magnetic levitation units. In some embodiments, the first carrier 10 may be fully suspended, i.e., held in a non-contact suspended state relative to the first carrier holder 110 by at least one magnetic levitation unit 114 and / or by other magnetic levitation units.

[0063] In some embodiments, a first portion (e.g., between 20% and 60%, in particular between 30% and 50%) of the weight of the first carrier 10 supported on the first carrier holder 110 is magnetically held by at least one magnetic levitation unit 114, and a second portion (e.g., between 20% and 60%, in particular between 30% and 50%) of the weight of the first carrier 10 is supported on a mechanical support (e.g., between at least one support roller 116), such as Figure 5 Schematically depicted in . Optionally, a third part of the weight of the first carrier (e.g., between 10% and 50%, in particular between 20% and 30%) may be magnetically held by a first carrier top holder 201, which may be at least partially arranged above the first carrier. In some embodiments, the first carrier top holder 201 may also be moved in the path switching direction S, for example by moving a common upper support 203 on which the first carrier top holder 201 may be mounted.

[0064] The (partial or complete) magnetic support of the carrier on the carrier holder can reduce the friction of the carrier during transportation and during path switching, so that the generation of small particles can be reduced or avoided, which can have a negative impact on the substrate processing in the vacuum processing chamber. The quality of the substrate processing, in particular the layer deposition quality, can be improved.

[0065] In some embodiments, which may be combined with other embodiments described herein, at least one magnetic suspension unit 114, in particular at least one first magnetic suspension unit of the first carrier holder and / or at least one second magnetic suspension unit in the second carrier holder is a passive magnet, in particular a permanent magnet. The passive magnet may attract the first carrier upwards, for example by exerting an attractive magnetic force on the countermagnet 15 or on the ferromagnetic material of the carrier (such as steel) in an upward direction.

[0066] In some embodiments, in particular if the first carrier holder is at least partially arranged above the first carrier, an active levitation magnet may be provided at the first carrier holder 110 instead of or in addition to the passive magnet. An active levitation magnet is a levitation magnet (such as a coil) whose strength is actively controlled to maintain a predetermined gap distance between at least one first carrier holder and the first carrier. A passive levitation magnet is a levitation magnet whose strength is not actively controlled.

[0067] In some embodiments, which may be combined with other embodiments described herein, at least one of the first carrier holder 110 and the second carrier holder 120 includes at least one supporting roller 116 for mechanically supporting at least a portion of the weight of the carrier. Specifically, the first carrier holder 110 may include at least one first supporting roller for mechanically supporting at least a portion of the weight of the first carrier, and the second carrier holder 120 may include at least one second supporting roller for mechanically supporting at least a portion of the weight of the second carrier.

[0068] As described above, a portion of the weight of the first carrier 10 may be magnetically held by at least one first magnetic levitation unit of the first carrier holder 110, and a second portion of the weight of the first carrier 10 may be mechanically supported on at least one first support roller of the first carrier holder 110. The mechanical support may further stabilize the corresponding carrier in the path switching direction S. At least one support roller 116 may rotate around a rotation axis extending in the path switching direction S. Complete contactless suspension of the carrier by magnetic force is challenging and typically uses active control of (multiple) magnetic levitation units to maintain a stable position of the suspended carrier, which is more complicated. On the other hand, by (only) magnetically holding a portion of the carrier weight and mechanically supporting the remainder of the carrier weight, the carrier may be held in a stable position via mechanical supports while reducing problems associated with friction via partial magnetic suspension. Therefore, Figure 5 The illustrated carrier transport system allows for reliable path switching of a carrier in a path switching direction S between two or more transport paths while reducing the generation of small particles that negatively impact substrate processing without unnecessary complexity.

[0069] like Figure 5As schematically depicted in , the common movable support 119 may be at least partially arranged below the carrier transport space, through which the first carrier and / or the second carrier may be transported along the first transport path and the second transport path. Specifically, the first carrier holder and / or the second carrier holder may support the corresponding carrier "from below", for example magnetically interacting with the lower part or lower surface of the carrier and / or supporting the lower carrier part via at least one supporting roller. Alternatively or additionally, the common movable support 119 may be at least partially arranged above the carrier transport space to hold the first carrier and / or the second carrier "from above", for example via one or more magnetic levitation units configured to magnetically interact with the upper surface of the carrier.

[0070] exist Figure 5 In the exemplary embodiment of the present invention, a common movable support 119 is arranged below the carrier transport space to support the carrier "from below", i.e., the first carrier holder 110 is configured to support the lower part of the first carrier, and the second carrier holder 120 is configured to support the lower part of the second carrier. In addition, a common upper support 203 (shown in dashed lines as optional) is provided for holding and / or stabilizing the carrier "from above".

[0071] In some embodiments that can be combined with other embodiments described herein, the carrier transport system 100 comprises: a first carrier top holder 201 for holding and / or stably holding an upper portion of a first carrier 10 on a first carrier holder 110; and a second carrier top holder 202 for holding and / or stably holding an upper portion of a second carrier 20 on a second carrier holder 120. The first carrier top holder 201 and the second carrier top holder 202 can be fixedly mounted at a common upper support 203 (e.g., a support arm or a support rod), which can extend substantially in a path switching direction S and can be moved in the path switching direction S, in particular together with the common movable support 119.

[0072] The common movable support 119 and the common upper support 203 may be moved in the path switching direction S via one common drive. Alternatively, a first motor or drive may be provided for moving the common movable support 119, and a second motor or drive may be provided for moving the common upper support 203. The first motor and the second motor may be adapted to move the upper support and the lower support simultaneously, so that the upper and lower portions of the held (multiple) carriers may be supported and moved synchronously in the path switching direction S.

[0073] Figure 6 Shows the different transport states Figure 5The carrier transport system 100, i.e. after the common movable support 119 is moved in the path switching direction S together with the first carrier holder 110 and the second carrier holder 120 mounted on the common movable support. In the depicted transport state, the first track section defined by the first carrier holder 110 is positioned at the processing position D, so that the substrate carried by the first carrier 10 held on the first carrier holder 110 can be processed with the processing device 105, in particular coated with a material. The second track section defined by the second carrier holder 120 can be arranged at a second stop position P2, which can be near the processing device 105 or the deposition area and / or partially below (or above) the processing device or the deposition area. After processing, the common movable support 119 can be moved toward Figure 6 1 and 2 until the first track section is aligned with the second transport track T2 (which may be a return path) so that the processed substrate can be transported away from the first carrier holder 110 along the second transport path T2, for example, for unloading from a vacuum processing system.

[0074] The carrier transport system 100 described herein may be configured for transporting carriers along the first transport path T1 and along the second transport path T2 and in the path switching direction S while the transported carriers are oriented substantially vertically. In other words, the carrier transport system 100 may be adapted for transport of vertically oriented carriers.

[0075] The embodiments described herein may be used to transport a carrier carrying at least one of a large area substrate, a glass substrate, a wafer, a semiconductor substrate, a mask, a shield, and other objects. 2 The carrier can carry a single object, such as a 1 m2 or larger surface area. 2 or larger, especially 5m 2 or 10m 2 The carrier may include a large area substrate of a size of 1000 mm or larger, or a plurality of objects of a smaller size, such as a plurality of semiconductor wafers. The carrier may include a chuck device configured to hold at least one substrate at the carrier, such as a magnetic chuck, an electrostatic chuck and / or a mechanical holder, such as a clamp or a mechanical chuck.

[0076] The transported carrier may be a carrier having a length of 1 m 2 or larger, especially 5m 2 Thus, each of the carriers may have a 1 m2 surface area for carrying a substrate thereon. 2 or larger, especially 5m 2The carrier may have a dimension in the main transport direction T of 1 m or more, for example 2 m or more.

[0077] The carrier transport system 100 according to any of the embodiments described herein can be used in a vacuum deposition system 1000, which includes at least a first vacuum processing chamber 101, the first vacuum processing chamber accommodating a first processing device 105, which can be a first deposition source for depositing a material on a substrate carried by the carrier. The carrier transport system 100 can be configured to transfer a carrier carrying a substrate within the first vacuum processing chamber 101 between a first transport path T1, a second transport path T2, and a processing position D for depositing a layer on the substrate with a deposition source.

[0078] Fig. 7A and Figure 7B A schematic top view of a vacuum deposition system 1000 according to an embodiment described herein is shown. The vacuum deposition system 1000 comprises: a first vacuum processing chamber 101, which accommodates a first processing device 105 that can serve as a first deposition source; and a second vacuum processing chamber 102, which accommodates a second processing device 106 that can serve as a second deposition source. The first vacuum processing chamber 101 can be arranged close to the second vacuum processing chamber 102, in particular by a closable opening 109 or a closable lock for closing the transport between the first vacuum processing chamber and the second vacuum processing chamber.

[0079] The first vacuum processing chamber 101 may be arranged at a first side (upstream) of the second vacuum processing chamber 102. Specifically, the first vacuum processing chamber 101 may be arranged between the second vacuum processing chamber 102 and one or more vacuum loading modules 103, which may be configured to load carriers into the vacuum processing system and / or unload carriers from the vacuum processing system after processing. One, two or more vacuum loading modules may be positioned as one or more vacuum gates, which are used to improve vacuum conditions in the first vacuum processing chamber and the second vacuum processing chamber during loading and unloading of carriers from the vacuum system.

[0080] In some embodiments, the vacuum deposition system 1000 may include one or more vacuum loading modules 103 disposed at a first (upstream) side of the first vacuum processing chamber 101, and the second vacuum processing chamber 102 disposed at a second (downstream) side of the first vacuum processing chamber 101 opposite to the first side. Fig. 7A and Figure 7BAs depicted, the second vacuum processing chamber 102 may optionally be the last vacuum processing chamber along the first transport path and the second transport path. Alternatively, more than two vacuum processing chambers may be arranged in one production line.

[0081] The first transport path T1 may be configured as a forward path (or "entrance path") for moving a carrier from one or more vacuum load modules 103 through the first vacuum processing chamber 101 into the second vacuum processing chamber 102 and into the vacuum deposition system for processing. The second transport path may be configured as a return path (or "exit path") for moving a carrier from the second vacuum processing chamber 102 through the first vacuum processing chamber 101 and through the one or more vacuum load modules 103 and out of the vacuum deposition system 1000 for unloading.

[0082] The first transport path T1 and the second transport path T2 may extend linearly through the first vacuum processing chamber and the second vacuum processing chamber in the main transport direction T, and in particular, the first transport path and the second transport path have a distance X therebetween. The carrier transport system 100 described herein may include a common movable support 119 configured to move the carrier into the first vacuum processing chamber 101 at least between the first transport path T1 and the second transport path T2, thereby enabling path switching and / or transferring the carrier to a processing position D for substrate processing with the first processing device 105.

[0083] In some embodiments that may be combined with other embodiments described herein, a second carrier transport system 200 (path switching device) may be provided, which is configured to transfer a carrier between the first transport path T1 and the second transport path T2 in the path switching direction S in the second vacuum processing chamber 102, and optionally to a second processing position D2 deviating from the first transport path and the second transport path for substrate processing with the second processing device 106. At the second processing position D1, a substrate carried by a corresponding carrier may be coated with a material.

[0084] The second carrier transport system may include a dual movable track (DMT) as described herein, i.e., the second carrier transport system 200 may substantially correspond to the carrier transport system 100 in the first vacuum processing chamber 101. In other embodiments, the second carrier transport system 200 may be a single movable track (SMT) including one single track section that can be transferred between the first transport path T1, the second transport path T2, and the second processing position D2 in the path switching direction. Compared with the DMT, the SMT may be less complex and may be more robust. The second vacuum processing chamber 102 may not be used as a conveying module for transporting a carrier into another subsequent vacuum chamber, so that it may be sufficient to adopt the SMT here.

[0085] Alternatively, if Figure 8 , a second carrier transport system 300 for carrier transfer in the second vacuum processing chamber 102 may include two laterally movable track sections, which may also be movable relative to each other and optionally even pass each other. Compared to the carrier transport system 100 with DMT as described herein, such a second carrier transport system 300 is more complex, but may further reduce the system's cycle time, because the subsequent carrier may already be loaded on the second carrier holder, while the first carrier holder may still be occupied, e.g., being processed.

[0086] Fig. 9 A flow chart is shown for illustrating a method of transporting a carrier in a vacuum processing system, in particular a vacuum deposition system for depositing one or more material layers on a substrate, according to embodiments described herein. Fig. 9 The method shown in the figure can be Fig. 7A and Figure 7B Vacuum deposition system, Figure 8 or in another vacuum processing system described herein.

[0087] In block 911, a carrier carrying a substrate is transported along a first transport path T1 (the first transport path may be a forward path) in a main transport direction T to a second carrier holder 120 (or alternatively to a first carrier holder 110), the first carrier holder and the second carrier holder being arranged in a first vacuum processing chamber 101. The first carrier holder 110 and the second carrier holder 120 are arranged (fixedly mounted) at a common movable support 119 at two positions spaced apart in a path switching direction S. In particular, the first carrier holder 110 and the second carrier holder 120 are mounted on a common movable support arm or support rod, which extends partially through the first vacuum processing chamber 101 in the path switching direction S. The distance between the first carrier holder and the second carrier holder substantially corresponds to the distance X between the first transport path and the second transport path. The first carrier holder 110 and the second carrier holder 120 are respectively configured to hold a carrier, in particular having a substantially vertical orientation.

[0088] In block 912, the common movable support 119 is moved in the path switching direction S to synchronously move the first carrier holder 110 and the second carrier holder 120 in the path switching direction S toward the first processing device 105 to position the carrier at the processing position D. For example, Figure 7B , a state is shown in which the second carrier 20 held on the second carrier holder 120 has been transferred from the first transport path T1 to the processing position D. At the processing position D, the carrier faces the first processing device 105, in particular, the deposition source.

[0089] In block 913, the substrate carried by the carrier is processed at a processing location D, in particular coated with a material.

[0090] In block 914, the common movable support 119 is moved backward in the path switching direction S to synchronously move the first carrier holder 110 and the second carrier holder 120 away from the first processing device 105 in the path switching direction S until the carrier is positioned on the second transport path T2, which may be a return path arranged between the first transport path T1 and the processing position D (see Figure 7B ).

[0091] In block 915 , the carrier carrying the processed substrate is transported away from the first carrier holder along a second transport path T2 , and in particular transported into one or more vacuum load modules 103 for unloading from the vacuum deposition system.

[0092] In some embodiments that may be combined with other embodiments described herein, at least a portion of the weight of the carrier held by the second (or first) carrier holder is magnetically counteracted, in particular by at least one suspension magnet of the carrier holder. Alternatively or additionally, at least a portion of the weight of the carrier held by the second (or first) carrier holder is supported on at least one supporting roller of the carrier holder.

[0093] The vacuum deposition system may further include a second vacuum processing chamber 102, the second vacuum processing chamber accommodating a second processing device 106, in particular a second deposition source, the second processing device being arranged adjacent to the first vacuum processing chamber 101 (e.g., downstream of the first vacuum processing chamber). The first transport path T1 and the second transport path T2 may extend linearly and laterally spaced apart from each other through the first vacuum processing chamber 101 and through the second vacuum processing chamber 102 (see Fig. 7A and Figure 7B , showing such a system).

[0094] exist Fig. 9 The method illustrated in FIG. 1 may be performed particularly when the second vacuum processing chamber 102 is not operational, is not in a vacuum state, and / or is undergoing repair or maintenance. Figure 7B As schematically depicted in FIG. 1 , the closable opening 109 between the first vacuum processing chamber and the second vacuum processing chamber may be closed, and the second vacuum processing chamber 102 may not be under vacuum conditions (eg, filled with gas) for example, for servicing the second processing tool 106 .

[0095] On the other hand, Fig. 7A As depicted, if the second vacuum processing chamber 102 is operational, the first vacuum processing chamber 101 may be used as a transport module for transporting a carrier through the first vacuum processing chamber 101 into the second vacuum processing chamber 102. Here, substrate coating may be performed in the second vacuum processing chamber 102 (exclusively or additionally), and the common movable support 119 may be maintained at Fig. 7A The first transport state (i) depicted in FIG. 1 is thus achieved, so that a transport channel in the main transport direction T is realized above the first track section and the second track section.

[0096] Specifically, in Fig. 7AIn the transport state (i), the carrier may be transported through the first vacuum processing chamber 101 along the first transport path T1 (serving as a forward path) over the first track section defined by the first carrier holder 110, the carrier may be processed in the second vacuum processing chamber 102, and then the carrier may be transported back through the first vacuum processing chamber 101 along the second transport path (serving as a return path) over the second track section defined by the second carrier holder 120. The dual movable tracks in the first vacuum processing chamber 101 reduce the takt time compared to the single movable track because the subsequent carrier to be processed may already be waiting on the first track section, and the second movable track may be loaded with the carrier that has already been processed in the second vacuum processing chamber.

[0097] In some embodiments, the first vacuum processing chamber 101 can provide redundancy. If it is operational, coating can be performed in the second vacuum processing chamber 102, and the first track segment and the second track segment can be maintained in the first transport position (i) to provide a transport channel through the first vacuum processing chamber 101. If the second vacuum processing chamber 102 is not operational, coating can be performed in the first vacuum processing chamber 101, and according to the Fig. 9 In the method illustrated in FIG. 1 , a second track section defined by a second carrier holder 120 (or alternatively, a first carrier holder 110 ) can be used to transfer a carrier from a first transport path (serving as a forward path) to a processing position D for processing and return in a path switching direction S to a second transport path (serving as a return path).

[0098] In particular, the vacuum deposition system 1000 can be used to deposit a (single) layer ("single layer coating") on a substrate in the second vacuum processing chamber 102 or alternatively in the first vacuum processing chamber 101 (e.g., if the second vacuum processing chamber 102 is not operational). Since the two vacuum processing chambers provide redundancy, the uptime of the system can be increased, and processing can also be continued during maintenance of the second vacuum processing module.

[0099] The vacuum deposition system may alternatively or additionally be used to deposit two layers on a substrate ("two-layer coating"). In particular, a first material may be deposited with a first deposition source in a first vacuum processing chamber 101, and a second material may be deposited over the first material in a second vacuum processing chamber 102, or vice versa, using the carrier transport system 100 and the second carrier transport system 200 to transfer the carrier toward the corresponding deposition source in the corresponding vacuum processing chamber. Fig.10The arrows illustrate possible substrate transport sequences. A double movable track in the first vacuum processing chamber reduces the cycle time compared to a single movable track and is less expensive and more robust than two opposing movable tracks. Alternatively, the first material can also be deposited in the second vacuum processing chamber and the second material can be deposited in the first vacuum processing chamber.

[0100] The vacuum deposition system may alternatively or additionally be used to deposit three layers on the substrate ("triple coating"). For example, a first material may be deposited with a first deposition source in the first vacuum processing chamber 101, a second material may be deposited over the first material with a second deposition source in the second vacuum processing chamber 102, and the first material may be deposited over the second material again in the first vacuum processing chamber 101.

[0101] The above-described carrier transport sequence and additional carrier transport sequences are possible through the vacuum deposition system, for example for depositing two, three or more layers on a substrate, because the dual movable track DMT as described herein disposed in at least one or more of the vacuum processing chambers of the vacuum deposition system enhances the flexibility of substrate routing and substrate transfer, is robust and reliable, and requires less space than other designs. In addition, a reduced number of drives (e.g., only one drive) may be required, because the first track segment and the second track segment may be moved together. A redundant system as described herein is also possible.

[0102] According to some embodiments described herein, the processing device in the first vacuum processing chamber and / or the second vacuum processing chamber may be a sputtering source configured to deposit material on the substrate by sputtering at the processing position. One or more of the following materials may be deposited on the substrate by sputtering in the vacuum processing chamber(s): ITO, IGZO, metal, Al, Cu, Ti, Mb, and MbNi.

[0103] While the foregoing is directed to embodiments, other and further embodiments may be devised without departing from the basic scope, and the scope is determined by the appended claims.

Claims

1. A carrier transport system (100) for transporting a carrier in a vacuum processing chamber along a first transport path (T1) in a main transport direction (T) and along a second transport path (T2) extending close to the first transport path (T1), and for transferring the carrier between the first transport path (T1) and the second transport path (T2) in a path switching direction (S), the carrier transport system comprising: a common movable support (119), a first carrier holder (110) defining a first track section and a second carrier holder (120) defining a second track section being arranged at the common movable support so as to be spaced apart from each other in the path switching direction (S), wherein in a first transport state (i) of the common movable support (119), the first carrier holder (110) is configured to keep the first carrier (10) aligned with the first transport path (T1), and the second carrier holder (120) is configured to keep the second carrier (20) aligned with the second transport path (T2), The common movable support is movable in the path switching direction (S) to synchronously move the first carrier holder (110) and the second carrier holder (120) in the path switching direction (S).

2. The carrier transport system according to claim 1, wherein the common movable support (119) is movable together with the first carrier holder (110) and the second carrier holder (120) in the path switching direction (S) between two or more of the following states: the first transport state (i), in which the first track section is aligned with the first transport path (T1), and the second track section is aligned with the second transport path (T2); a second transport state (ii), in which the second track section (120) is positioned at a processing position (D) offset from the first transport path and the second transport path for processing the substrate carried by the second carrier with a processing device (105); as well as A third transport state (iii), in which the second track section (120) is aligned with the first transport path (T1) to move the second carrier (20) along the first transport path (T1).

3. The carrier transport system according to claim 2, wherein in the second transport state (ii), the first track section is aligned with the second transport path (T2) to move the first carrier (10) along the second transport path.

4. The carrier transport system according to claim 2 or 3, wherein in the third transport state (iii), the first track section is positioned at a first stop position (P1) near a chamber wall of the vacuum processing chamber and is in an idle state.

5. The carrier transport system according to any one of claims 2 to 4, wherein the common movable support (119) is movable together with the first carrier holder (110) and the second carrier holder (120) in the path switching direction (S) between at least the following states: the first transport state (i); the second transport state (ii), in which the second track section is positioned at a processing position (D), wherein in the second transport state (ii), the first track section is optionally aligned with the second transport path (T2); the third transport state (iii), in which the second track section is aligned with the first transport path (T1), and the first track section is positioned at a first stop position (P1); and An optional fourth transport state (iv), in which the first track section is positioned at the processing position (D).

6. A carrier transport system according to claim 5, wherein in the fourth transport state (iv), the second track section is positioned at a second stop position (P2) near a processing device (105) and / or partially below the processing device and is in an idle state.

7. A carrier transport system according to any one of claims 1 to 6, wherein at least one of the first carrier holder (110) and the second carrier holder (120) comprises at least one magnetic levitation unit (114), and the at least one magnetic levitation unit is used to magnetically offset at least a part of the gravity of the carrier.

8. The carrier transport system according to claim 7, wherein the at least one magnetic levitation unit (114) is a passive magnet, in particular a permanent magnet.

9. The carrier transport system according to any one of claims 1 to 8, wherein at least one of the first carrier holder (110) and the second carrier holder (120) comprises at least one support roller (116) for mechanically supporting at least a portion of the weight of the carrier.

10. The carrier transport system according to any one of claims 1 to 9, further comprising: A first drive unit (112), which is used to transport the first carrier (10) to the first carrier holder (110) or leave the first carrier holder in the main transport direction (T); and / or a second drive unit (122), which is used to transport the second carrier (10) to the second carrier holder (120) or leave the second carrier holder in the main transport direction (T).

11. The carrier transport system according to claim 10, wherein at least one of the first drive unit (112) and the second drive unit (122) comprises a linear motor, which is configured to drive the first carrier (10) or the second carrier (20) in a contactless manner along the main transport direction (T).

12. A carrier transport system according to any one of claims 1 to 11, wherein the common movable support member (119) includes a movable support arm or a support rod, which extends through the side wall of the vacuum processing chamber (101) and can be moved in the path switching direction (S) via a motor (118) arranged outside the vacuum processing chamber (101).

13. The carrier transport system according to any one of claims 1 to 12, further comprising: A first carrier top retainer (201), the first carrier top retainer is used to retain or stabilize the upper part of the first carrier (10) retained by the first carrier retainer (110); and a second carrier top retainer (202), the second carrier top retainer is used to retain or stabilize the upper part of the second carrier (20) retained by the second carrier retainer (120), the first carrier top retainer and the second carrier top retainer are fixed at a common upper support member (203), and the common upper support member can be moved synchronously with the common movable support member (119) in the path switching direction (S).

14. A carrier transport system according to any one of claims 1 to 13, wherein the carrier transport system is configured to transport the carrier along the first transport path (T1) and along the second transport path (T2) and in the path switching direction (S) while the transported carrier is oriented substantially vertically.

15. A vacuum deposition system (1000) having a carrier transport system (100) according to any one of claims 1 to 14, the vacuum deposition system comprising: a first vacuum processing chamber (101) accommodating a first processing device (105) as a first deposition source; a second vacuum processing chamber (102) accommodating a second processing device (106) as a second deposition source, wherein the first transport path (T1) and the second transport path (T2) extend linearly in the main transport direction (T) and pass through the first vacuum processing chamber and the second vacuum processing chamber close to each other; The common movable support (119) of the carrier transport system (100) is configured to move a carrier between the first transport path (T1) and the second transport path (T2) in the first vacuum processing chamber (101).

16. The vacuum deposition system according to claim 15 further comprises a second carrier transport system (200), wherein the second carrier transport system is configured to move the carrier between the first transport path (T1), the second transport path (T2) and a second processing position (D2) for processing the substrate with the second processing equipment (106) in the second vacuum processing chamber (106) in the path switching direction (S).

17. The vacuum deposition system according to claim 15 or 16, further comprising one or more vacuum loading modules (103), wherein the one or more vacuum loading modules are arranged on a first side of the first vacuum processing chamber (101), and the second vacuum processing chamber (102) is arranged on a second side of the first vacuum processing chamber (101) opposite to the first side.

18. A method for transporting a carrier in a vacuum processing system, the method comprising: (a) transporting a carrier along a first transport path (T1) in a main transport direction (T) to a second carrier holder (120) or a first carrier holder (110) arranged in a first vacuum processing chamber (101), wherein the first carrier holder and the second carrier holder are arranged at a common movable support (119) spaced apart from each other in a path switching direction (S) and are respectively configured to hold the carrier; (b) moving the common movable support in the path switching direction (S) to synchronously move the first carrier holder and the second carrier holder in the path switching direction (S) until the carrier is positioned at a processing position (D); (c) processing the substrate carried by the carrier; (d) moving the common movable support in the path switching direction (S) to synchronously move the first carrier holder (110) and the second carrier holder (120) in the path switching direction (S) until the carrier is positioned on the second transport path (T2) or alternatively on the first transport path (T1); and (e) transporting the carrier away from the second carrier holder (120) or away from the first carrier holder (110) along the second transport path (T2) or alternatively along the first transport path (T1).

19. The method according to claim 18, further comprising: magnetically counteracting at least a portion of the weight of the carrier held by the first carrier holder (110) or the second carrier holder (120); as well as At least a portion of the weight of the carrier is supported on at least one support roller (116) of the first carrier holder or the second carrier holder.

20. The method according to claim 18 or 19, wherein a second vacuum processing chamber (102) accommodating a second processing device (106) is arranged adjacent to the first vacuum processing chamber (101), and the first transport path (T1) and the second transport path (T2) extend through the first vacuum processing chamber (101) and the second vacuum processing chamber (102) linearly and laterally spaced apart from each other; Wherein (a) to (e) are performed when the second vacuum processing chamber (102) is inoperable, not in a vacuum state, and / or undergoing any one or more of repair or maintenance.

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