Gate switch device and gate control method

By automatically controlling the opening and closing of the gate, the problem of low productivity of the chemical vapor deposition furnace is solved, the efficient transportation of reaction vessels between different chambers and the stability of the atmosphere environment are achieved, and production efficiency and product quality are improved.

CN119217525BActive Publication Date: 2025-10-03苏州精材半导体科技有限公司 +1
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Patent Information

Application Number
CN202411383184.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-09-30
Publication Date
2025-10-03
Estimated Expiration
2044-09-30

AI Technical Summary

Technical Problem

The productivity of existing chemical vapor deposition furnaces is low, mainly due to the fact that imprecise gate control affects the atmosphere when the reaction vessel moves between multiple chambers, making continuous production impossible.

Method used

An automated control strategy is adopted to generate signals through atmosphere detection components and position detection components to accurately control the opening and closing of the gate, ensuring the efficient transportation of reaction vessels between different chambers and the stability of the atmosphere environment.

Benefits of technology

The efficiency of the process and product quality are improved, the impact on the chamber atmosphere is reduced, and the efficient operation of the continuous chemical vapor deposition furnace is achieved.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present invention belongs to the technical field of silicon carbide material manufacturing, and discloses a gate control method and a gate switch device. The gate control method includes responding to a first signal generated when the atmosphere environment of the first cavity and / or the second cavity in the cover is completed, driving the gate to move from the first position to the second position, exposing the opening on the cover between the first cavity and the second cavity; responding to a second signal generated after the reaction container moves from the first cavity to the designated position of the second cavity, driving the gate to move from the second position to the first position, closing the opening on the cover between the first cavity and the second cavity. The gate control method and gate switch device in the present invention can drive the gate to move through the driving component based on the first signal generated by the atmosphere detection component and the second signal generated by the position detection component, thereby realizing automatic control and effectively improving work efficiency.
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Description

Technical Field

[0001] The present invention belongs to the technical field of silicon carbide material manufacturing, and in particular relates to a gate switch device applied in a silicon carbide material manufacturing system and a corresponding gate control method. Background Art

[0002] Silicon carbide is a representative ceramic material that is widely used throughout industry due to its excellent physical, chemical and electrical properties.

[0003] In recent years, the importance of silicon carbide (SiC) has been growing rapidly with the development of semiconductor processing components using it. In particular, SiC is widely used in semiconductor etching processes due to its high plasma tolerance. Silicon carbide for semiconductor etching processes is a traditional method of manufacturing SiC. However, due to the inability of this method to meet quality and performance requirements, chemical vapor deposition (CVD) is often used in the prior art.

[0004] Chemical vapor deposition (CVD) of silicon carbide uses a mixture of Si-containing gases such as SiH₄, SiCl₂, and SiCl₄ and C-containing gases such as C₂H₂, CH₄, and C₃H₄ as the raw material gas, or alternatively CH₃SiCl₃, CH₃SiH₃, (CH₃)₃SiH₃, etc. While some deposition methods use monolithic raw materials, the production of silicon carbide materials via CVD suffers from low productivity because the process is performed in a batch-type CVD furnace. However, upgrading a batch-type CVD furnace to a continuous CVD furnace requires addressing the gate control issues of the reaction vessel. Summary of the Invention

[0005] In order to solve the deficiencies of the prior art, the present invention discloses a gate control method for chemical vapor deposition of silicon carbide materials, comprising:

[0006] In response to a first signal generated when the atmosphere environment of the first cavity and / or the second cavity in the housing is established, the gate is driven to move from the first position to the second position to expose the opening on the housing between the first cavity and the second cavity;

[0007] In response to a second signal generated after the reaction container moves from the first cavity to a designated position of the second cavity, the gate is driven to move from the second position to the first position to close the opening of the cover between the first cavity and the second cavity.

[0008] A further technical solution may also be that the first signal includes:

[0009] a first preparation signal, which is generated when the atmosphere environments in the first cavity and the second cavity are established and the atmosphere environments in the first cavity and the second cavity are the same;

[0010] A first completion signal is generated after the reaction in the reaction container is completed and the atmosphere environment in the second chamber is completed.

[0011] A further technical solution may be that the control method further includes:

[0012] In response to the first signal, driving the second conveying assembly to move from the fourth position to the third position so that the second conveying assembly is mated with the first conveying assembly in the housing;

[0013] In response to the second signal, the second conveying assembly is driven to move from the third position to the fourth position, thereby releasing the cooperation between the second conveying assembly and the first conveying assembly.

[0014] A further technical solution may be that when the gate is in the first position,

[0015] detecting the air pressure of the first cavity and / or the second cavity and generating corresponding air pressure data;

[0016] Generate air pressure feedback information based on the comparison result of the air pressure data and the corresponding target air pressure data;

[0017] In response to the air pressure feedback information, the gate is driven to continue moving a set distance in a direction toward the second position pointing to the first position;

[0018] The current position of the driving gate is set as a new first position.

[0019] A further technical solution may be that, along the direction of movement of the reaction container, the housing is formed with a preparation chamber, a reaction chamber and a heat treatment chamber connected in sequence;

[0020] When the gate is disposed between the preparation chamber and the reaction chamber, the first chamber is the preparation chamber, and the second chamber is the reaction chamber. In response to the first preparation signal, the gate is driven to move to connect the preparation chamber and the reaction chamber.

[0021] When the gate is disposed between a reaction chamber and a heat treatment chamber, the first chamber is the reaction chamber, and the second chamber is the heat treatment chamber. In response to the first completion signal, the gate is driven to move to connect the reaction chamber and the heat treatment chamber.

[0022] The second aspect of the present invention further discloses a gate switch device, which is applied to silicon carbide material manufacturing equipment, comprising:

[0023] a gate capable of resting on a cover of the manufacturing device and used to seal an opening of the cover to isolate the first cavity and the second cavity of the manufacturing device from each other;

[0024] a driving assembly connected to the gate and configured to drive the gate to move between a first position and a second position;

[0025] An atmosphere detection component, disposed in the housing, for detecting the atmosphere in the first cavity and the second cavity;

[0026] a position detection component for detecting the position of a reaction vessel of the manufacturing equipment;

[0027] a control component, electrically connected to the drive component, the position detection component and the atmosphere detection component respectively;

[0028] When the gate is in the first position, the opening of the cover is closed to isolate the first cavity and the second cavity;

[0029] When the gate is located at the second position, the opening of the cover shell is exposed to connect the first cavity and the second cavity.

[0030] A further technical solution may also be that the driving component includes:

[0031] a guide member connected to the gate and used to guide the gate to move;

[0032] A housing, the housing being connected to the cover to form a relatively closed moving cavity, and the gate moving in the moving cavity;

[0033] A driving device is connected to the gate and is used to drive the gate to move.

[0034] A further technical solution may also be that the gate includes:

[0035] an abutting surface, used for abutting against the cover shell, wherein the abutting surface and an opposite surface of the cover shell are parallel to each other;

[0036] Along the direction from the second position toward the first position, the abutting surface is inclined toward the side where the gate is located.

[0037] A further technical solution may be that a line connecting the first position and the second position is parallel to a horizontal plane.

[0038] A further technical solution may also include:

[0039] An air pressure detection component is arranged in the cover shell and is used to detect the air pressure in the first cavity and the second cavity. The air pressure detection component is electrically connected to the control component.

[0040] A further technical solution may be that the cover forms an enclosing structure to constitute the first cavity and the second cavity;

[0041] The four sides of the abutting surface abut against the cover shell.

[0042] A further technical solution may also include:

[0043] a second conveying assembly, configured to cooperate with the first conveying assembly disposed in the housing, wherein the second conveying assembly is capable of moving back and forth between a third position and a second position;

[0044] When the second conveying assembly is located at the third position, the second conveying assembly is connected and matched with the first conveying assembly;

[0045] When the second conveying assembly is located at the fourth position, the second conveying assembly is disengaged from the first conveying assembly.

[0046] A further technical solution may also include:

[0047] a guide assembly connected to the second conveying assembly and configured to guide the movement of the second conveying assembly;

[0048] The switching component is connected to the second conveying component and is used to drive the second conveying component to move.

[0049] The gate control method and gate switch device adopt an automated control strategy. The drive component can accurately control the movement of the gate through a first signal generated by an atmosphere detection component and a second signal generated by a position detection component. This signal-based automated control method significantly improves work efficiency. First, the atmosphere detection component can monitor the atmosphere in the cavity in real time and control the opening and closing state of the gate, thereby optimizing the process and ensuring product quality. Secondly, the position detection component provides accurate position information of the reaction vessel between the cavities, so that the movement of the gate can respond accurately, ensuring efficient and accurate transportation of the reaction vessel between the cavities. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] In order to more clearly illustrate the embodiments of the present invention or the existing technical solutions, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0051] Figure 1 Schematic diagram of the structure of silicon carbide material manufacturing equipment in an embodiment of the present invention;

[0052] Figure 2 Schematic diagram of the structure of the gate switch device in an embodiment of the present invention. The direction indicated by the arrow in the figure is the direction from the second position to the first position, wherein the gate is in the first position and the second conveying assembly is in the fourth position;

[0053] Figure 3 2 is another structural schematic diagram of the gate switch device according to an embodiment of the present invention. The direction indicated by the arrow in the figure is the direction from the second position to the first position, wherein the gate is in the second position and the second conveying assembly is in the third position.

[0054] Figure 4 Schematic diagram of the structure of the gate in an embodiment of the present invention;

[0055] Figure 5 Schematic diagram of the flow of the gate control method in an embodiment of the present invention.

[0056] Description of reference numerals:

[0057] A: First cavity; B: Second cavity; C: Gate switch device;

[0058] 1. Gate; 11. Abutment surface;

[0059] 2. Cover; 21. Preparation chamber; 22. Reaction chamber; 23. Heat treatment chamber;

[0060] 3. Guide parts;

[0061] 4. Second conveying assembly;

[0062] 5. First conveying assembly;

[0063] 6. Housing; 61. Moving cavity. DETAILED DESCRIPTION

[0064] To make the objectives, technical solutions, and advantages of the present invention more clear, the technical solutions of the present invention will be clearly and completely described below in conjunction with specific embodiments and corresponding drawings. Obviously, the embodiments described are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0065] To improve the low productivity of intermittent chemical vapor deposition furnaces, the applicant of this patent seeks to develop a continuous chemical vapor deposition furnace. In this type of chemical vapor deposition furnace, the reaction vessel passes through a preparation chamber, a reaction chamber, and a heat treatment chamber in sequence. The atmosphere and temperature are prepared in the preparation chamber, chemical vapor deposition is performed in the reaction chamber, and post-processing and cooling operations are performed in the heat treatment chamber.

[0066] That is to say, in the process of continuous chemical vapor deposition, the reaction vessel needs to be transported in sequence through the preparation chamber, reaction chamber and heat treatment chamber. This is because when three different chambers are used to implement a segmented continuous process, since each chamber is relatively independent, when the reaction vessel completes work in one chamber and moves to the next chamber, the previous chamber can be connected to a new reaction vessel to achieve continuous operation. That is to say, when a supply system for chemical vapor deposition equipment is provided, the preparation chamber, reaction chamber and heat treatment chamber of the continuous chemical vapor deposition furnace can operate on different reaction vessels at the same time.

[0067] The applicant has discovered that, during the use of a continuous chemical vapor deposition furnace, it is necessary to precisely control the opening of the gate to accommodate the movement of the reaction vessel between multiple chambers.

[0068] In view of this, the inventors of the present invention provide a gate control method and a gate switch device applied to a continuous vapor deposition furnace to meet the above needs.

[0069] Implementation Method 1

[0070] A first aspect of this embodiment discloses a gate control method applied to chemical vapor deposition of silicon carbide materials, comprising:

[0071] In response to a first signal generated when the atmosphere of the first cavity A and / or the second cavity B in the housing 2 is established, the gate 1 is driven to move from the first position to the second position, exposing the opening between the first cavity A and the second cavity B on the housing 2;

[0072] In response to the second signal generated after the reaction container moves from the first cavity A to the designated position of the second cavity B, the gate 1 is driven to move from the second position to the first position to close the opening between the first cavity A and the second cavity B on the cover 2.

[0073] A second aspect of this embodiment discloses a gate switch device C, which is applied to silicon carbide material manufacturing equipment, comprising:

[0074] a gate 1 , the gate 1 being capable of resting against a housing 2 of the manufacturing equipment to seal an opening of the housing 2 to isolate a first cavity A and a second cavity B of the manufacturing equipment from each other;

[0075] A driving assembly (not shown in the drawings), connected to the gate 1, for driving the gate 1 to move between the first position and the second position;

[0076] An atmosphere detection component is provided in the housing 2 and is used to detect the atmosphere in the first cavity A and the second cavity B;

[0077] a position detection component for detecting the position of a reaction vessel of the manufacturing equipment;

[0078] a control component, electrically connected to the drive component, the position detection component and the atmosphere detection component respectively;

[0079] When the gate 1 is in the first position, it closes the opening of the cover 2 to isolate the first cavity A and the second cavity B;

[0080] When the gate 1 is located at the second position, the opening of the cover 2 is exposed to connect the first cavity A and the second cavity B.

[0081] When the reaction container is located in the first cavity A, the gate 1 is located in the second position and abuts against the cover 2, sealing the opening on the cover 2 connecting the first cavity A and the second cavity B to isolate the first cavity A and the second cavity B from each other.

[0082] Specifically, in this embodiment, Figure 5 As shown, when the reaction container needs to move from the first cavity A to the second cavity B, the atmosphere detection component arranged on the cover 2 detects the atmosphere of the first cavity A and the second cavity B respectively, and sends the detection data to the control component; the control component obtains the detection data from the atmosphere detection component and analyzes it; when the detection data corresponding to the first cavity A and / or the second cavity B reaches the set range, it means that the atmosphere of the first cavity A and / or the second cavity B is completed, the control component generates a first signal and sends it to the drive component, and the drive component drives the gate 1 to move from the first position to the second position in response to the first signal, exposing the opening on the cover 2 between the first cavity A and the second cavity B, so as to connect the first cavity A and the second cavity B, so that the reaction container can pass through the opening and move from the first cavity A to the specified position of the second cavity B, as shown Figure 2 shown.

[0083] like Figure 5 As shown, when the position detection component detects that the reaction container moves from the first cavity A to the specified position of the second cavity B, it generates a second signal and sends it to the drive component; in response to the second signal, the drive component drives the gate 1 to move from the second position to the first position, closing the opening on the cover 2 between the first cavity A and the second cavity B, so as to re-isolate the first cavity A and the second cavity B, as shown in FIG. Figure 3 shown.

[0084] It should be noted that, in this embodiment, Figure 1As shown, the silicon carbide material manufacturing equipment can be a continuous chemical vapor deposition furnace, comprising a housing 2, a gas support device, and a reaction vessel. The housing 2 forms a sequentially connected preparation chamber 21, a reaction chamber 22, and a heat treatment chamber 23. The reaction vessel is transported and sequentially passed through the preparation chamber 21, the reaction chamber 22, and the heat treatment chamber 23. The gas support device is connected to the housing 2 and is used to provide a gas environment. The preparation chamber 21 is used to secure and mount the substrate using a fixture, preparing it for the chemical vapor deposition process to match the required production quantity. The reaction chamber 22 is similar to conventional chemical vapor deposition equipment. The heat treatment chamber 23 can heat treat chemical vapor deposition products such as silicon carbide to control and improve the product purity level. The gate switch device C in this embodiment can be positioned between the preparation chamber 21 and the reaction chamber 22 to isolate or connect the preparation chamber 21 and the reaction chamber 22; it can also be positioned between the reaction chamber 22 and the heat treatment chamber 23 to isolate or connect the reaction chamber 22 and the heat treatment chamber 23.

[0085] As can be seen from the above, the reaction containers in different cavities (preparation chamber 21, reaction chamber 22 and heat treatment chamber 23) represent different processes; accordingly, each cavity needs to build a corresponding atmosphere environment in order to meet the requirements of its own process. Therefore, by using the atmosphere detection component to detect the atmosphere environment of each cavity, the preparation status of each cavity can be obtained in real time; when the detection data corresponding to the first cavity A and / or the second cavity B reaches the set range, it means that the atmosphere environment of the first cavity A and / or the second cavity B is completed, which also means that the reaction container can enter the next process. In other words, through the setting of the atmosphere detection component, the process status can be monitored in real time, and the gate 1 can be automatically controlled based on the detection data detected by the atmosphere detection component. Among them, the atmosphere environment can include parameters such as air pressure, composition, component content, and temperature.

[0086] It is worth mentioning that the gate switch device C can be set between the two cavities as described above, for connecting or closing the two cavities; it can also be set at the opening of any cavity, only for closing or opening the opening of the cavity.

[0087] The gate 1 control method and the gate switch device C in this embodiment adopt an automated control strategy. The driving component can accurately control the movement of the gate 1 based on the first signal generated by the atmosphere detection component and the second signal generated by the position detection component. This signal-based automated control method significantly improves work efficiency. First, through the atmosphere detection component, the atmosphere environment in the cavity can be monitored in real time, and the opening and closing state of the gate 1 can be controlled, thereby optimizing the process and ensuring product quality. Secondly, the position detection component provides accurate position information of the reaction vessel between the cavities, so that the movement of the gate 1 can respond accurately, ensuring efficient and accurate transportation of the reaction vessel between the cavities.

[0088] In some embodiments, the first signal comprises:

[0089] A first preparation signal, which is generated when the atmospheres in the first cavity A and the second cavity B are completed and the atmospheres in the first cavity A and the second cavity B are the same;

[0090] The first completion signal is generated after the reaction in the reaction container is completed and the atmosphere environment in the second chamber B is completed.

[0091] When the gate 1 is set between the preparation chamber 21 and the reaction chamber 22, the first cavity A is the preparation chamber 21, and the second cavity B is the reaction chamber 22. From the above, it can be seen that the reaction vessel needs to be prepared for the chemical vapor deposition process in the preparation chamber 21, and after the reaction chamber 22 is prepared, it moves into the reaction chamber 22. Since the atmosphere required for the chemical vapor deposition process needs to be constructed in the reaction chamber 22; but when the reaction vessel moves from the preparation chamber 21 to the reaction chamber 22, it is necessary to open the gate 1 to connect the preparation chamber 21 and the reaction chamber 22. In the process of connecting the reaction chamber 22 and the preparation chamber 21, air flow will be generated, which may affect the atmosphere that has been prepared in the reaction chamber 22; this makes it necessary to rebuild the atmosphere in the reaction chamber 22 after the reaction vessel moves to the reaction chamber 22 and closes the gate 1, which greatly affects the production efficiency.

[0092] Therefore, it is necessary to construct the same atmospheric environment as that of the reaction chamber 22 in the preparation chamber 21, so as to reduce the impact of the atmospheric environment in the reaction chamber 22 during the process of the reaction vessel moving from the preparation chamber 21 to the reaction chamber 22. The first preparation signal generated after the atmospheric environment in the preparation chamber 21 and the reaction chamber 22 is constructed represents that the preparation work for the reaction vessel to move from the preparation chamber 21 to the reaction chamber 22 has been completed. In response to the first preparation signal, the drive component drives the gate 1 to move from the first position to the second position, exposing the opening on the cover 2 between the preparation chamber 21 and the reaction chamber 22, so that the reaction vessel can move from the preparation chamber 21 to the reaction chamber 22. At this time, since the atmospheric environments of the preparation chamber 21 and the reaction chamber 22 are the same, the reaction vessel has less impact on the atmospheric environment in the reaction chamber 22 when it moves; after the reaction vessel moves to the specified position of the reaction chamber 22 and the gate 1 is closed, the next process can be carried out quickly, which greatly saves efficiency.

[0093] When the gate 1 is set between the reaction chamber 22 and the heat treatment chamber 23, the first cavity A is the reaction chamber 22, and the second cavity B is the heat treatment chamber 23. As can be seen from the above, the reaction vessel may affect the atmosphere of the two connected cavities during movement. Therefore, constructing an atmosphere in the heat treatment chamber 23 can, on the one hand, meet the atmosphere requirements required for heat treatment; on the other hand, it can reduce the mutual influence between the reaction chamber 22 and the heat treatment chamber 23 when they are connected, thereby improving work efficiency. The first completion signal generated after the atmosphere in the heat treatment chamber 23 is constructed represents that the preparation work for the reaction vessel to move from the reaction chamber 22 to the heat treatment chamber 23 has been completed. In response to the first completion signal, the drive component drives the gate 1 to move from the second position to the first position, closing the opening between the first cavity A and the second cavity B on the cover 2, so that the reaction vessel can move from the reaction chamber 22 to the heat treatment chamber 23. In this way, the atmosphere in the reaction chamber 22 is less affected and can be quickly restored to the required atmosphere to meet process requirements and improve work efficiency; and the atmosphere in the heat treatment chamber 23 has been constructed. After the reaction container moves to the heat treatment chamber 23, heat treatment can be carried out quickly to improve work efficiency.

[0094] In some embodiments, the drive assembly may include:

[0095] A guide member 3 connected to the gate 1 and used to guide the movement of the gate 1;

[0096] A housing 6 is connected to the cover 2 to form a relatively closed moving cavity 61, and the gate moves in the moving cavity 61;

[0097] A driving device (not shown in the drawings) is connected to the gate 1 and is used to drive the gate 1 to move.

[0098] Specifically, the guide member 3 can be a combination of a slide rail and a slider, or the guide member 3 can also be a combination of a guide rod and a guide hole. The above two guide structures are both widely used guide structures in the prior art and are therefore not described in detail here. Importantly, the combination of the outer shell 6 and the cover shell 2 forms a relatively closed movable cavity 61, in which the gate 1 can move within the movable cavity 61. The purpose of this design is twofold: first, the movable cavity 61 provides the necessary space for the movement of the gate 1; second, when the gate 1 is exposed to the opening of the cover shell 2, the outer shell 6 can still form a relative seal with the cover shell 2, thereby effectively preventing outside air from entering the interior of the cover shell 2, avoiding adverse effects on the atmosphere of the first cavity A and the second cavity B in the cover shell 2.

[0099] The driving device may be a pneumatic cylinder or an electric cylinder. Due to the requirements of the chemical deposition process, the strength of the cavity is required to be high. Therefore, in order to meet the requirements, the weight of the gate 1 is relatively large. Therefore, in some preferred embodiments, the driving device may be an oil cylinder.

[0100] Implementation Method 2

[0101] This embodiment provides a gate switch device C and a gate 1 control method. This embodiment is a further improvement made based on the first embodiment, and its improvement is: Figure 4 As shown, the gate 1 includes:

[0102] The abutting surface 11 is used to abut against the cover shell 2 , and the abutting surface 11 and an opposite surface of the cover shell 2 are parallel to each other.

[0103] Specifically, if Figure 4 As shown, the first position is located at the opening of the housing 2, while the second position is located at the side of the housing 2. In other words, when the gate 1 moves from the second position to the first position, it moves from the side of the housing 2 to the position where the opening of the housing 2 is located, thereby closing the opening. When the gate 1 is in the first position, the abutment surface 11 of the gate 1 can abut against the housing 2.

[0104] In some embodiments, the abutting surface 11 and the opposite surface of the cover shell 2 are designed to be parallel to each other. This configuration ensures that the parts of the abutting surface 11 that are in contact with the cover shell 2 are evenly stressed, thereby ensuring the reliability of the closure. Furthermore, in some embodiments, a sealing material is provided between the abutting surface 11 and the opposite surface of the cover shell 2. When the abutting surface 11 abuts against the cover shell 2, uniform pressure can be applied to the sealing material, thereby achieving effective closure. In these embodiments, by setting the abutting surface 11 and the opposite surface of the cover shell 2 to be parallel, the sealing material between the two can withstand pressure evenly, avoiding the problem of local over-extrusion. This uniform pressure distribution not only improves the sealing performance of the sealing material, but also extends its service life.

[0105] It is worth noting that in this embodiment, Figure 4 As shown, along the direction from the second position to the first position, the abutment surface 11 is inclined toward the side where the gate 1 is located. This arrangement allows the gate 1 to gradually decrease the distance between the abutment surface 11 of the gate 1 and the opposite surface of the cover 2 during the process of moving from the second position to the first position. Through this design, the gate 1 can not only move to the specified position during the linear motion from the first position to the second position, but also simultaneously achieve abutment with the opposite surface of the cover 2. This integrated action simplifies the operating process, while effectively reducing the complexity of the entire structure, improving the reliability of the structure and the convenience of maintenance.

[0106] In some embodiments, the line connecting the first position and the second position is perpendicular to the horizontal plane. For example, the first position is located between the first cavity A and the second cavity B, while the second position is located above the cover 2; the gate 1 moves up and down in the longitudinal direction to close or expose the opening of the cover 2. In this embodiment, the movement direction of the gate 1 is the same as the direction of gravity of the gate 1, and under the action of gravity of the gate 1, the gate 1 has a tendency to move from the second position to the first position. Combined with the inclined setting of the abutment surface 11, the gate 1 naturally tends to approach the opposite surface of the cover 2 under the action of gravity. Therefore, when the gate 1 is in the first position, the abutment surface 11 can always maintain abutment with the opposite surface of the cover 2 without the action of external force, so that the sealing material between the abutment surface 11 and the cover 2 is continuously squeezed, thereby maintaining good sealing performance.

[0107] In some other embodiments, the line connecting the first position and the second position is parallel to the horizontal plane. Figure 1 、 Figure 2 and Figure 3 As shown, the first position is between the first cavity A and the second cavity B, while the second position is to one side of the housing 2. In this case, the gate 1 moves horizontally to the left and right to close or expose the opening of the housing 2. Unlike the previously mentioned vertical movement embodiment, the movement of the gate 1 in this embodiment relies primarily on the drive assembly. This drive-driven movement method allows for more precise control of the movement of the gate 1 and also provides a basis for intelligent control. This method allows for precise adjustment of the movement of the gate 1 to meet higher-level operational requirements.

[0108] In some other embodiments, the gate switch device C may further include:

[0109] An air pressure detection component is provided in the housing 2 and is used to detect the air pressure in the first cavity A and the second cavity B. The air pressure detection component is electrically connected to the control component.

[0110] The air pressure detection assembly is located within housing 2, and its primary function is to monitor the air pressure within first cavity A and second cavity B. The control assembly receives real-time air pressure data from the air pressure detection assembly, accurately monitoring changes in air pressure within first cavity A and second cavity B. This configuration not only lays the foundation for intelligent control but also directly improves product quality by ensuring air pressure stability during the process. Furthermore, this ability to monitor air pressure in real time significantly enhances safety and reliability, effectively reducing the potential risk of accidents caused by air pressure fluctuations or anomalies.

[0111] In other embodiments, the air pressure data collected by the air pressure detection component can not only be used to monitor the air pressure changes in the first cavity A and the second cavity B, but can also be directly used as an important basis for the control component to control the gate 1. Specifically,

[0112] When the gate 1 is located at the first position, the air pressure of the first cavity A and / or the second cavity B is detected, and corresponding air pressure data is generated;

[0113] Generate air pressure feedback information based on the comparison result of the air pressure data and the corresponding target air pressure data;

[0114] In response to the air pressure feedback information, the gate 1 is driven to continue moving a set distance in the direction of the second position pointing to the first position;

[0115] The current position of the driving gate 1 is set as a new first position.

[0116] The difference between the air pressure data in the cavity and the corresponding target air pressure data may be caused by the insufficient sealing performance of gate 1. The reasons for the insufficient sealing performance of gate 1 mainly include the following: 1. When the abutment pressure between the abutment surface 11 of gate 1 and the opposite surface of cover shell 2 is insufficient, the sealing material may not be fully squeezed, resulting in poor sealing effect; 2. Over time, the sealing material between gate 1 and cover shell 2 may shrink due to aging, resulting in a decrease in sealing performance. Both of these situations will affect the sealing effect of gate 1, and thus cause the air pressure in the cavity to differ from the target air pressure. Therefore, timely detection and maintenance of the sealing performance of gate 1 is crucial to ensure the stability of the process and product quality. In this embodiment, the gas detection component detects the air pressure in the cavity and sends the air pressure data to the controller; the controller compares the detected air pressure data with the corresponding target air pressure data, and generates air pressure feedback information if there is a difference between the two; in response to the air pressure feedback information, the gate 1 is driven to continue to move a set distance in the direction of the second position pointing to the first position, so as to increase the abutment pressure between the abutment surface 11 of the gate 1 and the opposite surface of the cover 2 or continue to extrude the aged sealing material to restore the sealing performance of the gate 1. In addition, the current position of the driven gate 1 is set as the new first position to ensure that the gate 1 can maintain its sealing performance during the next use. Through the above-mentioned steps of detecting air pressure, generating feedback information, driving the gate 1 to move and updating the position, there are at least the following advantages:

[0117] 1. Ensure that the air pressure in the first cavity A and the second cavity B is maintained within the set target range, thereby optimizing the process and product quality;

[0118] 2. Improve the automation level of the system, reduce the need for manual intervention, and improve operational efficiency and reliability;

[0119] 3. Through continuous position adjustment, dynamic response to air pressure changes is achieved, enhancing the flexibility and adaptability of the system;

[0120] 4. Prevent production interruption or equipment damage due to unstable air pressure and extend the service life of the system.

[0121] It is worth noting that the sealing performance of aged sealing materials can be restored by increasing the extrusion pressure in the early stage. However, once the sealing material ages to a certain extent, this method of increasing the pressure will no longer be effective. Therefore, in some embodiments, a third position may be provided; along the direction from the second position to the first position, the third position is located after the first position. When the gate 1 is in the third position, it means that the sealing performance of the sealing material is insufficient and needs to be replaced. Specifically, the controller monitors the current first position of the gate 1, and compares the current first position with the set third position. If the distance between the two is less than the set threshold, a warning message is generated. The purpose of this warning message is to notify the staff and prompt them to replace the sealing material to ensure the normal operation and safety of the system.

[0122] Implementation Method 3

[0123] This embodiment is a further improvement based on the first embodiment or the second embodiment, and the improvement is that: the cover 2 forms an enclosed structure to form the first cavity A and the second cavity B;

[0124] The four sides of the abutting surface 11 abut against the cover 2 .

[0125] The housing 2 is designed as an enclosed structure, forming a first cavity A and a second cavity B. This structural design enables the housing 2 to effectively enclose and define the spaces within the two cavities. Furthermore, because the abutment surface 11 is in close contact with the housing 2 on all sides, this arrangement ensures uniform and tight contact between the abutment surface 11 and the housing 2, thereby forming an effective seal between the abutment surface 11 and the housing 2. This sealing configuration helps prevent foreign matter from entering the cavity while maintaining a stable internal environment, which is crucial for ensuring the smooth progress of the process and the quality of the product.

[0126] According to the above description, the reaction container needs to be moved between the first cavity A and the second cavity B. Therefore, the present invention needs to set up a conveying structure to achieve effective conveying of the reaction container. However, since the gate 1 needs to move during operation and eventually abuts against the cover 2, the traditional conveying structure may interfere with the movement of the gate 1, affecting its normal operation. Therefore, in some embodiments, such as Figure 2 and Figure 3 As shown, the gate switch device C may further include:

[0127] a second conveying assembly 4, configured to cooperate with the first conveying assembly 5 disposed within the housing 2, wherein the second conveying assembly 4 is capable of moving back and forth between a third position and a second position;

[0128] When the second conveying assembly 4 is located at the third position, the second conveying assembly 4 is connected and matched with the first conveying assembly 5;

[0129] When the second conveying assembly 4 is located at the fourth position, the second conveying assembly 4 is released from the first conveying assembly 5 .

[0130] Accordingly, if Figure 5 As shown, the gate 1 control method further includes:

[0131] In response to the first signal, the second conveying assembly 4 is driven to move from the fourth position to the third position, so that the second conveying assembly 4 is matched with the first conveying assembly 5 in the housing 2;

[0132] In response to the second signal, the second conveying assembly 4 is driven to move from the third position to the fourth position, and the cooperation between the second conveying assembly 4 and the first conveying assembly 5 is released.

[0133] In this embodiment, if Figure 2 and Figure 3 As shown, the first conveying assembly 5 is arranged inside the housing 2, and the second conveying assembly 4 is arranged outside the housing 2. The first conveying assembly 5 can reciprocate between the third position and the second position to connect with or separate from the second conveying assembly 4. When the driving assembly responds to the first signal and drives the gate 1 to move from the second position to the first position, that is, from the outside of the housing 2 to between the two cavities, the second conveying assembly 4 will move from the third position to the fourth position, thereby releasing the cooperation with the first conveying assembly 5 and making room for the movement of the gate 1, as shown in FIG. Figure 3 shown.

[0134] In addition, if Figure 5 As shown, when the driving component responds to the second signal, the gate 1 moves from the second position to the first position, that is, from the outside of the housing 2 to between the two cavities. In this process, the movement of the gate 1 provides the necessary space for the second conveying component 4 to move from the fourth position to the third position and re-establish connection with the first conveying component 5, as shown in FIG. Figure 2 shown.

[0135] The ingenuity of this design lies in the fact that it allows the movement of gate 1 and second conveyor assembly 4 to proceed independently of each other, ensuring smooth and efficient system operation. By coordinating the movement of gate 1 and second conveyor assembly 4, efficient transport of reaction vessels between chambers is achieved while avoiding potential motion interference issues.

[0136] It is worth noting that in this embodiment, by arranging the first conveying assembly 5 inside the cover shell 2 and utilizing the enclosed structure of the cover shell 2, when the gate 1 abuts the cover shell 2, it is possible to achieve effective sealing of the cavity while maintaining a high sealing performance. This design ensures the environmental stability of the cavity during the reaction vessel transportation process, which is crucial for ensuring the smooth progress of the process and product quality. In addition, by coordinating the movement of the gate 1 and the second conveying assembly 4, while achieving efficient transportation of the reaction vessel, it is ensured that the sealing performance of the cavity is not affected. This coordinated operation mechanism not only improves the operating efficiency of the system, but also enhances the overall performance and reliability of the system.

[0137] Furthermore, in this embodiment, the movement of the second conveying assembly 4 is also performed within the movement chamber 61 .

[0138] In this embodiment, in order to ensure the stability of the reaction container transportation, the first transportation component 5 and the second transportation component 4 can be transportation rollers.

[0139] In some embodiments, the gate switch device C further includes:

[0140] a guide assembly connected to the second conveying assembly 4 and configured to guide the movement of the second conveying assembly 4;

[0141] The switching component is connected to the second conveying component 4 and is used to drive the second conveying component 4 to move.

[0142] Through the coordinated operation of the guide assembly and the switching assembly, the gate switch device C of the present invention can achieve efficient and precise control of the second conveying assembly 4, thereby ensuring smooth and safe conveyance of the reaction containers between the cavities.

[0143] The guide assembly can be a combination of a slide rail and a slider, or a guide rod and a guide hole. Both of these guide structures are widely used in the prior art and will not be described in detail here. This guide assembly essentially functions the same as the guide member 3 described above. The switching assembly can be a pneumatic cylinder or an electric cylinder.

[0144] In some embodiments, as Figure 2 and Figure 3 As described above, the guide member 3 of the present invention is not only used to guide the movement of the gate 1, but also serves as a guide component for guiding the movement of the second conveying assembly 4. This means that the second conveying assembly 4 and the gate 1 share the same guide structure, thereby simplifying the system design and improving space utilization efficiency.

[0145] Similarly, the drive device used to drive the gate 1 can also serve as a switching component to drive the second conveying assembly 4. This design allows the second conveying assembly 4 and the gate 1 to share the same drive device, further reducing the complexity of the system while ensuring coordinated and consistent operation.

[0146] This integrated design not only improves the system's automation level and operational efficiency, but also enhances system reliability and ease of maintenance. Furthermore, the shared guide structure and drive device design reduces production costs, making the entire system more economical and efficient.

[0147] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the embodiments of the present invention rather than to limit them. Although the embodiments of the present invention are described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the embodiments of the present invention can still be modified or replaced by equivalents, and these modifications or equivalent replacements cannot cause the modified technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A gate control method, applied to chemical vapor deposition of silicon carbide material, characterized in that: include: In response to a first signal generated when the atmosphere environment of the first cavity and / or the second cavity in the housing is established, the gate is driven to move from the first position to the second position to expose the opening on the housing between the first cavity and the second cavity; In response to a second signal generated after the reaction container moves from the first cavity to a designated position in the second cavity, the gate is driven to move from the second position to the first position to close the opening of the cover between the first cavity and the second cavity; When the gate is in the first position, detecting the air pressure of the first cavity and / or the second cavity and generating corresponding air pressure data; Generate air pressure feedback information based on the comparison result of the air pressure data and the corresponding target air pressure data; In response to the air pressure feedback information, the gate is driven to continue moving a set distance in a direction toward the second position pointing to the first position; The current position of the driving gate is set as a new first position.

2. The gate control method according to claim 1, characterized in that: The first signal includes: a first preparation signal, which is generated when the atmosphere environments in the first cavity and the second cavity are established and the atmosphere environments in the first cavity and the second cavity are the same; A first completion signal is generated after the reaction in the reaction container is completed and the atmosphere environment in the second chamber is completed.

3. The gate control method according to claim 1, characterized in that: The control method further includes: In response to the first signal, driving the second conveying assembly to move from the fourth position to the third position so that the second conveying assembly is mated with the first conveying assembly in the housing; In response to the second signal, the second conveying assembly is driven to move from the third position to the fourth position, thereby releasing the cooperation between the second conveying assembly and the first conveying assembly.

4. The gate control method according to claim 2, characterized in that: Along the direction of movement of the reaction container, the cover is formed with a preparation chamber, a reaction chamber and a heat treatment chamber connected in sequence; When the gate is disposed between the preparation chamber and the reaction chamber, the first chamber is the preparation chamber, and the second chamber is the reaction chamber. In response to the first preparation signal, the gate is driven to move to connect the preparation chamber and the reaction chamber. When the gate is disposed between a reaction chamber and a heat treatment chamber, the first chamber is the reaction chamber, and the second chamber is the heat treatment chamber. In response to the first completion signal, the gate is driven to move to connect the reaction chamber and the heat treatment chamber.

5. A gate switch device, used in silicon carbide material manufacturing equipment, characterized in that: include: a gate capable of resting on a cover of the manufacturing device and used to seal an opening of the cover to isolate the first cavity and the second cavity of the manufacturing device from each other; a driving assembly connected to the gate and configured to drive the gate to move between a first position and a second position; An atmosphere detection component, disposed in the housing, for detecting the atmosphere in the first cavity and the second cavity; a position detection component for detecting the position of a reaction vessel of the manufacturing equipment; a control component, electrically connected to the drive component, the position detection component and the atmosphere detection component respectively; When the gate is in the first position, the opening of the cover is closed to isolate the first cavity and the second cavity; When the gate is in the second position, the opening of the cover is exposed to connect the first cavity and the second cavity; An air pressure detection component is arranged in the housing (2) and is used to detect the air pressure in the first cavity (A) and the second cavity (B), and the air pressure detection component is electrically connected to the control component; The control component is further configured to: when the gate (1) is located at the first position, generate air pressure feedback information based on a comparison result between the air pressure data obtained from the air pressure detection component and the corresponding target air pressure data; and in response to the air pressure feedback information, control the drive component to drive the gate (1) to continue moving a set distance in the direction of the first position toward the second position, and set the current position after the movement as the new first position.

6. The gate switch device according to claim 5, characterized in that: The drive assembly includes: a guide member connected to the gate and used to guide the gate to move; A housing, the housing being connected to the cover to form a relatively closed moving cavity, and the gate moving in the moving cavity; A driving device is connected to the gate and is used to drive the gate to move.

7. The gate switch device according to claim 5, characterized in that: The gate comprises: an abutting surface, used for abutting against the cover shell, wherein the abutting surface and an opposite surface of the cover shell are parallel to each other; Along the direction from the second position toward the first position, the abutting surface is inclined toward the side where the gate is located.

8. The gate switch device according to claim 7, characterized in that: A line connecting the first position and the second position is parallel to a horizontal plane.

9. The gate switch device according to claim 5, characterized in that: Also includes: An air pressure detection component is arranged in the cover shell and is used to detect the air pressure in the first cavity and the second cavity. The air pressure detection component is electrically connected to the control component.

10. The gate switch device according to claim 7, characterized in that: The cover forms an enclosed structure to constitute the first cavity and the second cavity; The four sides of the abutting surface abut against the cover shell.

11. The gate switch device according to claim 10, characterized in that: Also includes: a second conveying assembly, configured to cooperate with the first conveying assembly disposed in the housing, wherein the second conveying assembly is capable of moving back and forth between a third position and a second position; When the second conveying assembly is located at the third position, the second conveying assembly is connected and matched with the first conveying assembly; When the second conveying assembly is located at the fourth position, the second conveying assembly is disengaged from the first conveying assembly.

12. The gate switch device according to claim 11, characterized in that: Also includes: a guide assembly connected to the second conveying assembly and configured to guide the movement of the second conveying assembly; The switching component is connected to the second conveying component and is used to drive the second conveying component to move.

Citation Information

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