SF6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma

Abstract

The invention discloses an SF6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma. The device comprises a gas inlet control module, a dielectric barrier discharge reaction module, an alkaline solution tank and an alkaline solution supply module, the gas inlet control module comprises a gas distributing and mixing unit, an SF6 gas cylinder and an inert gas cylinder, wherein the SF6 gas cylinder and the inert gas cylinder are connected with the gas distributing and mixing unit. The dielectric barrier discharge reaction module comprises a dielectric barrier reactor and a plasma power supply externally connected to the dielectric barrier reactor, and the dielectric barrier reactor is used for exciting inert gas in the mixed gas into plasma by using an electric field and degrading SF6 gas in the mixed gas based on the electric field and the plasma to obtain low-fluorine sulfide. The plasma is utilized to excite the alkaline solution to generate hydroxyl ions, the low-fluorine sulfide is degraded based on the hydroxyl ions, and degraded tail gas is obtained; and the alkaline solution tank is connected with a gas outlet of the dielectric barrier reactor. According to the invention, efficient harmless degradation of SF6 can be realized.

Description

Technical Field

[0001] The invention relates to the technical field of sulfur hexafluoride degradation, and in particular to a SF6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma. Background Art

[0002] Sulfur hexafluoride (SF6) is often used in the power industry because of its excellent electrical insulation and arc extinguishing properties. Since SF6 is a strong greenhouse gas, its greenhouse effect potential is much higher than CO2, so the degradation of SF6 can greatly reduce the harm of SF6 to the atmospheric environment, which is of great significance.

[0003] In recent years, emission reduction methods such as SF6 waste adsorption purification, SF6 alternative gas, and SF6 waste degradation and conversion have emerged. Among them, discharge degradation technology can achieve high degradation rate and low energy consumption, and has received widespread attention. Specifically, SF6 is mainly degraded in the form of dielectric barrier discharge. For example, the SF6 waste gas is diluted and passed into the dielectric barrier reactor for degradation, but at this time the SF6 degradation rate is limited and the product selectivity is poor; and by changing the input voltage, frequency, medium type, background gas, added gas and other conditions, the effects of various factors on SF6 degradation are explored, and it is found that when an appropriate amount of water participates in the reaction, the degradation rate and energy efficiency will be improved, but at this time the SF6 degradation rate is limited, and the degradation effect is poor. At the same time, there are many toxic substances in the product, such as SO2F2, SOF2, etc. Summary of the invention

[0004] The purpose of the present invention is to achieve efficient and harmless degradation of SF6. In order to achieve the above purpose, the present invention provides a SF6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma.

[0005] In a first aspect, an embodiment of the present invention provides a SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma, comprising: an air intake control module, a dielectric barrier discharge reaction module, an alkaline solution pool and an alkaline solution supply module; The air intake control module includes a gas distribution and mixing unit, and an SF6 gas cylinder and an inert gas cylinder connected to the gas distribution and mixing unit, wherein the SF6 gas cylinder and the inert gas cylinder are used to supply SF6 gas and inert gas to the gas distribution and mixing unit respectively, and the gas distribution and mixing unit is used to dilute the SF6 gas with the inert gas, and distribute the SF6 gas and the inert gas according to a preset ratio to obtain a mixed gas; The dielectric barrier discharge reaction module includes a dielectric barrier reactor and a plasma power supply externally connected to the dielectric barrier reactor, wherein the plasma power supply is used to apply a voltage to the dielectric barrier reactor to form an electric field inside the dielectric barrier reactor, the gas inlet of the dielectric barrier reactor is connected to the gas distribution and mixing unit, and the dielectric barrier reactor is used to use the electric field to excite the inert gas in the mixed gas into plasma, and based on the electric field and the plasma, the SF6 gas in the mixed gas is degraded to obtain low-fluorine sulfide; The alkali solution supply module is connected to the alkali solution pool and the dielectric barrier reactor respectively, and the alkali solution supply module is used to supply the alkali solution in the alkali solution pool to the dielectric barrier reactor; The dielectric barrier reactor is also used to utilize the plasma to excite the alkaline solution to generate hydroxide ions, and degrade the low-fluorine sulfide based on the hydroxide ions to obtain degraded tail gas; The alkaline solution pool is connected to the gas outlet of the dielectric barrier reactor, and the alkaline solution pool is used to absorb the degradation tail gas.

[0006] Preferably, it also includes: An alkali liquid gas washing pool is connected to the alkaline solution pool, and the alkali liquid gas washing pool is used to absorb the degradation tail gas that is not absorbed in the alkaline solution pool.

[0007] Preferably, the inert gas in the inert gas cylinder includes Ar gas.

[0008] Preferably, the gas distribution and mixing unit comprises a mass flow meter, and the mass flow meter is used to control the supply concentration and supply flow rate of SF6 gas and inert gas in real time.

[0009] Preferably, the dielectric barrier reactor is a coaxial dielectric barrier reactor.

[0010] Preferably, the dielectric barrier reactor comprises a high-voltage electrode and a low-voltage electrode which are coaxially connected, wherein the high-voltage electrode is wrapped by a barrier medium, and the plasma power supply is externally connected to the high-voltage electrode and the low-voltage electrode.

[0011] Preferably, the alkali solution supply module includes a pumping unit and an atomizing unit, wherein one end of the pumping unit is connected to the alkaline solution pool, and the other end of the pumping unit is connected to the atomizing unit, and the pumping unit is used to pump the alkaline solution in the alkaline solution pool into the atomizing unit, and the atomizing unit is arranged on the air inlet side of the medium barrier reactor, and the atomizing unit is used to supply uniformly atomized alkaline solution to the medium barrier reactor.

[0012] Preferably, the pumping unit is a peristaltic pump.

[0013] Preferably, the atomization unit is an atomization spray head.

[0014] Preferably, the alkaline solution in the alkaline solution tank comprises a NaOH solution.

[0015] In a second aspect, an embodiment of the present invention provides a SF6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma, and the SF6 degradation method is applied to the SF6 degradation device as described above, comprising: The SF6 gas cylinder and the inert gas cylinder supply SF6 gas and inert gas to the gas distribution and mixing unit respectively; The gas distribution and mixing unit dilutes the SF6 gas with the inert gas, and distributes the SF6 gas and the inert gas according to a preset ratio to obtain a mixed gas; The plasma power supply applies a voltage to the dielectric barrier reactor so as to form an electric field inside the dielectric barrier reactor; The dielectric barrier reactor utilizes the electric field to excite the inert gas in the mixed gas into plasma, and degrades the SF6 gas in the mixed gas based on the electric field and the plasma to obtain low-fluorine sulfide; The alkaline solution supply module supplies the alkaline solution in the alkaline solution pool to the dielectric barrier reactor; The dielectric barrier reactor utilizes the plasma to excite the alkaline solution to generate hydroxide ions, and degrades the low-fluorine sulfide based on the hydroxide ions to obtain degraded tail gas; The alkaline solution pool absorbs the degradation tail gas.

[0016] Preferably, after the dielectric barrier reactor uses the plasma to excite the alkaline solution to generate hydroxide ions, and degrades the low-fluorine sulfide based on the hydroxide ions to obtain the degraded tail gas, the method further comprises: The components of the degraded tail gas are detected to obtain the SF6 degradation rate and SF6 energy efficiency, wherein the SF6 energy efficiency is the degradation mass of SF6 gas under unit input energy.

[0017] Compared with the prior art, the SF6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma in the embodiment of the present invention has the following beneficial effects: by introducing the SF6 / inert gas mixture into the dielectric barrier reactor, SF6 is activated and decomposed under the action of plasma; at the same time, an alkaline solution is introduced into the dielectric barrier reactor, and the alkaline solution is excited and activated under the action of plasma to produce a large amount of hydroxide ions, which react with the primary decomposition products of SF6 to promote the decomposition of SF6; the degraded gas is treated in an alkaline solution washing pool to achieve harmless emission of SF6. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural schematic diagram of an SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma according to an embodiment of the present invention; Figure 2 It is another structural schematic diagram of an SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma according to an embodiment of the present invention; Figure 3 It is a schematic flow chart of a SF6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma according to an embodiment of the present invention; Figure 1 , 2 Among them, 11, gas distribution and mixing unit; 12, SF6 gas cylinder; 13, inert gas cylinder; 21, dielectric barrier reactor; 22, plasma power supply; 211, high voltage electrode; 212, low voltage electrode; 213, barrier medium; 31, alkaline solution pool; 41, pumping unit; 42, atomization unit; Figure 2 In, 51, alkaline scrubbing pool. DETAILED DESCRIPTION

[0019] The specific implementation of the present invention is further described in detail below in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0020] like Figure 1 As shown, an embodiment of the present invention provides a SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma, including: an air intake control module, a dielectric barrier discharge reaction module, an alkaline solution pool and an alkaline solution supply module.

[0021] The air intake control module includes a gas distribution and mixing unit 11 , and an SF6 gas cylinder 12 and an inert gas gas cylinder 13 connected to the gas distribution and mixing unit 11 .

[0022] Specifically, the SF6 gas cylinder 12 and the inert gas cylinder 13 are respectively used to supply SF6 gas and inert gas to the gas mixing unit 11. The gas mixing unit 11 is used to dilute the SF6 gas with the inert gas, and mix the SF6 gas and the inert gas according to a preset ratio to obtain a mixed gas.

[0023] Furthermore, the inert gas in the inert gas cylinder includes Ar gas. In this embodiment, the inert gas is Ar, and the preset ratio is 2% SF6 / 98% Ar. That is to say, the gas distribution and mixing unit of this embodiment uses Ar gas to dilute the SF6 gas, and distributes the gas in a ratio of 2% SF6 / 98% Ar to obtain a mixed gas. The gas distribution and mixing unit includes a mass flow meter, which is used to control the supply concentration and supply flow rate of SF6 gas and inert gas in real time. By setting the mass flow meter, the gas distribution and mixing unit can accurately control the concentration and flow rate of the incoming gas, and display the concentration and flow rate in real time. The gas distribution and mixing unit of this embodiment controls the supply flow rate of SF6 gas and inert gas to 200mL / min. At this flow rate, the gas distribution and mixing unit can better realize the gas distribution and mixing function.

[0024] The dielectric barrier discharge reaction module includes a dielectric barrier reactor 21 and a plasma power source 22 externally connected to the dielectric barrier reactor 21 .

[0025] Specifically, the plasma power supply 22 is used to apply a voltage to the dielectric barrier reactor 21 to form an electric field inside the dielectric barrier reactor 21. Further, the dielectric barrier reactor 21 is a coaxial dielectric barrier reactor. The dielectric barrier reactor 21 includes a high-voltage electrode 211 and a low-voltage electrode 212 that are coaxially connected, the high-voltage electrode 211 is wrapped by a barrier medium 213, and the plasma power supply 22 is externally connected to the high-voltage electrode 211 and the low-voltage electrode 212.

[0026] The process of forming an electric field inside a dielectric barrier reactor is described in detail below: The input power is adjusted to a preset power (the preset power in this embodiment is 100W) by the plasma power supply, and an AC electric field is generated in the gap between the high-voltage electrode and the low-voltage electrode. In a single discharge cycle, as the input voltage increases, the positive charge inside the discharge gap transfers toward the low-voltage electrode, and the negative charge transfers toward the high-voltage electrode. The positive and negative charges adhere to the inner surface of the blocking medium, forming an electric field in the discharge gap.

[0027] Specifically, the gas inlet of the dielectric barrier reactor 21 is connected to the gas distribution and mixing unit 11, so that the dielectric barrier reactor 21 receives the mixed gas output by the gas distribution and mixing unit 11. The dielectric barrier reactor 21 is used to excite the inert gas in the mixed gas into plasma by using an electric field, and degrade the SF6 gas in the mixed gas based on the electric field and plasma to obtain low-fluorine sulfide.

[0028] The following is a detailed description of the process of degrading SF6 gas to obtain low-fluorine sulfides in a dielectric barrier reactor: Ar particles are excited into plasma under the action of the electric field, and SF6 gas is activated and decomposed by bond breaking under the action of the electric field and Ar plasma to produce low-fluorine sulfides such as SF5 and SF4.

[0029] The alkali solution supply module is connected to the alkali solution pool 31 and the dielectric barrier reactor 21 respectively. The alkali solution supply module is used to supply the alkali solution in the alkali solution pool 31 to the dielectric barrier reactor 21.

[0030] Specifically, the alkaline solution supply module includes a pumping unit 41 and an atomizing unit 42. One end of the pumping unit 41 is connected to the alkaline solution pool 31, and the other end of the pumping unit 41 is connected to the atomizing unit 42. The pumping unit 41 is used to pump the alkaline solution in the alkaline solution pool 31 into the atomizing unit 42, and the atomizing unit 42 is arranged on the air inlet side of the medium barrier reactor 21. The atomizing unit 42 is used to supply the alkaline solution after uniform atomization to the medium barrier reactor 21. Further, the pumping unit 41 is a peristaltic pump, and the atomizing unit 42 is an atomizing spray head.

[0031] The dielectric barrier reactor 21 is also used to utilize plasma to excite the alkaline solution to generate hydroxide ions, and to degrade low-fluorine sulfides based on the hydroxide ions to obtain degraded tail gas.

[0032] The following is a detailed description of the process of using a dielectric barrier reactor to degrade low-fluorinated sulfides to obtain degraded tail gas: The alkaline solution is circulated and pumped to the top of the dielectric barrier reactor by a peristaltic pump, and the alkaline solution is uniformly atomized into the dielectric barrier reactor through an atomizing spray head. The alkaline solution is activated by the plasma to produce a large number of hydroxide ions, which react with low-fluorine sulfides such as SF5 and SF4 to make the SF6 degradation reaction proceed in a positive direction, promote the decomposition of SF6, and obtain degradation tail gases such as SO2 and SOF2.

[0033] The alkaline solution pool 31 is connected to the gas outlet of the dielectric barrier reactor 21 , and the alkaline solution pool 31 is used to absorb the degradation tail gas.

[0034] Specifically, the alkaline solution in the alkaline solution pool includes a NaOH solution. In this embodiment, the alkaline solution is a NaOH solution. It should be noted that in the process of degrading low-fluorinated sulfides in the dielectric barrier reactor to obtain degraded tail gas, the low-fluorinated sulfides react with the hydroxide ions in the NaOH solution to generate SO2 and SO3. 2- 、SO4 2- and SOF2, which combine with sodium ions in NaOH solution to form stable Na2SO4.

[0035] In order to ensure the harmless emission of SF6, Figure 2 As shown, an SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma according to an embodiment of the present invention also includes: an alkali solution washing pool 51. The alkali solution washing pool 51 is connected to the alkaline solution pool 31, and the alkali solution washing pool 51 is used to absorb the degradation tail gas that is not absorbed in the alkaline solution pool 31. There will still be unabsorbed acid gases such as SO2 and SOF2 in the degradation tail gas. The degradation tail gas is subjected to secondary treatment by the alkali solution washing pool 51, so that the harmful substances in the degradation tail gas are fully absorbed, thereby achieving harmless emission of SF6.

[0036] In a specific embodiment, the process of applying the above SF6 degradation device is as follows: 1) Preparation: First connect the gas lines of each module, and connect the corresponding power supply and grounding electrode. Regularly check the air tightness of the dielectric barrier reactor, regularly check the alkali in the alkali washing pool, regularly treat the sediment in the alkali washing pool, and regularly replace the alkali to prevent insufficient treatment of toxic exhaust gases; 2) During degradation: turn on the plasma power supply, introduce SF6 gas and Ar gas into the dielectric barrier reactor through the gas distribution and mixing unit at a certain concentration and flow rate; at the same time, turn on the peristaltic pump to pump the NaOH solution above the dielectric barrier reactor, and evenly atomize the NaOH solution into the dielectric barrier reactor through the atomizing spray head, and the degradation reaction begins. After a few minutes, the temperature of the dielectric barrier reactor tends to stabilize, and the discharge degradation reaction proceeds stably; 3) Stop degradation: first close the SF6 gas input valve and peristaltic pump to maintain stable operation of the dielectric barrier reactor. After ten minutes, turn off the plasma power supply and continue to introduce Ar to allow the gas in the dielectric barrier reactor to pass into the alkaline solution pool. After ten minutes, raise the air inlet pipe in the alkaline solution pool from the bottom of the liquid to the surface of the liquid to prevent backflow and stop inputting Ar.

[0037] The embodiment of the present invention is an SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma. By introducing a SF6 / inert gas mixture into a dielectric barrier reactor, SF6 is activated and decomposed under the action of plasma; at the same time, an alkaline solution is introduced into the dielectric barrier reactor, and the alkaline solution is excited and activated under the action of plasma to produce a large amount of hydroxide ions, which react with SF6 primary decomposition products to promote the decomposition of SF6; the degraded gas is treated in an alkaline solution washing pool to achieve harmless emission of SF6.

[0038] like Figure 3 As shown, an embodiment of the present invention provides a SF6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma, which is applied to the SF6 degradation device as described above, comprising the steps of: S1, SF6 gas cylinder and inert gas cylinder supply SF6 gas and inert gas to the gas distribution and mixing unit respectively; S2, the gas distribution and mixing unit dilutes the SF6 gas with the inert gas, and distributes the SF6 gas and the inert gas according to a preset ratio to obtain a mixed gas; S3, the plasma power supply applies a voltage to the dielectric barrier reactor to form an electric field inside the dielectric barrier reactor; S4, the dielectric barrier reactor uses an electric field to excite the inert gas in the mixed gas into plasma, and degrades the SF6 gas in the mixed gas based on the electric field and plasma to obtain low-fluorine sulfide; S5, the alkaline solution supply module supplies the alkaline solution in the alkaline solution pool to the dielectric barrier reactor; S6, a dielectric barrier reactor utilizes plasma to excite an alkaline solution to generate hydroxide ions, and degrades low-fluorine sulfides based on the hydroxide ions to obtain degraded tail gas; S7. Alkaline solution pool absorbs and degrades tail gas.

[0039] In order to verify the effectiveness of the SF6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma in the embodiment of the present invention, after step S6, it also includes: detecting the components of the degraded tail gas to obtain the SF6 degradation rate and SF6 energy efficiency. By calculating the two evaluation indicators of SF6 degradation rate and SF6 energy efficiency, the effectiveness of the SF6 degradation method can be quantitatively evaluated.

[0040] Specifically, SF6 energy efficiency is the degradation mass of SF6 gas per unit input energy. Further, the SF6 degradation rate is calculated using the following formula: Wherein, DRE represents the degradation rate of SF6, the unit is %, Indicates the SF6 concentration before degradation, Indicates the SF6 concentration after degradation.

[0041] The SF6 energy efficiency is calculated using the following formula: Where, EY represents SF6 energy efficiency, the unit is g / kWh, It represents the mass of SF6 gas degraded in time t, in g, P represents the discharge power, and t represents the time required to degrade SF6 gas, in h.

[0042] It should be noted that for the specific definition of an SF6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma, please refer to the above definition of an SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma. The two have the same functions and effects and will not be repeated here.

[0043] In summary, the embodiment of the present invention is a SF6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma. By introducing a SF6 / inert gas mixture into a dielectric barrier reactor, SF6 is activated and decomposed under the action of plasma; at the same time, an alkaline solution is introduced into the dielectric barrier reactor, and the alkaline solution is excited and activated under the action of plasma to produce a large amount of hydroxide ions, which react with the primary decomposition products of SF6 to promote the decomposition of SF6; the degraded gas is treated in an alkaline solution washing pool to achieve harmless emission of SF6.

[0044] Each embodiment in this specification is described in a progressive manner, and the same or similar parts of each embodiment can be directly referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the method embodiment, since it is basically similar to the device embodiment, the description is relatively simple, and the relevant parts can be referred to the partial description of the method embodiment. It should be noted that the technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0045] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and substitutions can be made without departing from the technical principles of the present invention. These improvements and substitutions should also be regarded as the scope of protection of the present invention.

Claims

1. A SF6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma, characterized in that: include: An air intake control module, a dielectric barrier discharge reaction module, an alkaline solution tank and an alkaline solution supply module; The air intake control module includes a gas distribution and mixing unit, and an SF6 gas cylinder and an inert gas cylinder connected to the gas distribution and mixing unit, wherein the SF6 gas cylinder and the inert gas cylinder are used to supply SF6 gas and inert gas to the gas distribution and mixing unit respectively, and the gas distribution and mixing unit is used to dilute the SF6 gas with the inert gas, and distribute the SF6 gas and the inert gas according to a preset ratio to obtain a mixed gas; The dielectric barrier discharge reaction module includes a dielectric barrier reactor and a plasma power supply externally connected to the dielectric barrier reactor, wherein the plasma power supply is used to apply a voltage to the dielectric barrier reactor to form an electric field inside the dielectric barrier reactor, the gas inlet of the dielectric barrier reactor is connected to the gas distribution and mixing unit, and the dielectric barrier reactor is used to use the electric field to excite the inert gas in the mixed gas into plasma, and based on the electric field and the plasma, the SF6 gas in the mixed gas is degraded to obtain low-fluorine sulfide; The alkali solution supply module is connected to the alkali solution pool and the dielectric barrier reactor respectively, and the alkali solution supply module is used to supply the alkali solution in the alkali solution pool to the dielectric barrier reactor; The dielectric barrier reactor is also used to utilize the plasma to excite the alkaline solution to generate hydroxide ions, and degrade the low-fluorine sulfide based on the hydroxide ions to obtain degraded tail gas; The alkaline solution pool is connected to the gas outlet of the dielectric barrier reactor, and the alkaline solution pool is used to absorb the degradation tail gas.

2. The SF6 degradation device according to claim 1, characterized in that: Also includes: An alkali liquid gas washing pool is connected to the alkaline solution pool and is used to absorb the degradation tail gas that is not absorbed in the alkaline solution pool.

3. The SF6 degradation device according to claim 1, characterized in that: The inert gas in the inert gas cylinder includes Ar gas.

4. The SF6 degradation device according to claim 1, characterized in that: The gas distribution and mixing unit comprises a mass flow meter, which is used to control the supply concentration and supply flow rate of SF6 gas and inert gas in real time.

5. The SF6 degradation device according to claim 1, characterized in that: The dielectric barrier reactor is a coaxial dielectric barrier reactor.

6. The SF6 degradation device according to claim 5, characterized in that: The dielectric barrier reactor comprises a high-voltage electrode and a low-voltage electrode which are coaxially connected, wherein the high-voltage electrode is wrapped by a barrier medium, and the plasma power supply is externally connected to the high-voltage electrode and the low-voltage electrode.

7. The SF6 degradation device according to claim 1, characterized in that: The alkaline solution supply module includes a pumping unit and an atomizing unit, wherein one end of the pumping unit is connected to the alkaline solution pool, and the other end of the pumping unit is connected to the atomizing unit. The pumping unit is used to pump the alkaline solution in the alkaline solution pool into the atomizing unit. The atomizing unit is arranged on the air inlet side of the medium barrier reactor, and the atomizing unit is used to supply uniformly atomized alkaline solution to the medium barrier reactor.

8. The SF6 degradation device according to claim 7, characterized in that: The pumping unit is a peristaltic pump.

9. The SF6 degradation device according to claim 7, characterized in that: The atomization unit is an atomization spray head.

10. The SF6 degradation device according to claim 1, characterized in that: The alkaline solution in the alkaline solution tank includes a NaOH solution.

11. A SF6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma, characterized in that: The SF6 degradation method is applied to the SF6 degradation device according to any one of claims 1 to 10, comprising: The SF6 gas cylinder and the inert gas cylinder supply SF6 gas and inert gas to the gas distribution and mixing unit respectively; The gas distribution and mixing unit dilutes the SF6 gas with the inert gas, and distributes the SF6 gas and the inert gas according to a preset ratio to obtain a mixed gas; The plasma power supply applies a voltage to the dielectric barrier reactor so as to form an electric field inside the dielectric barrier reactor; The dielectric barrier reactor utilizes the electric field to excite the inert gas in the mixed gas into plasma, and degrades the SF6 gas in the mixed gas based on the electric field and the plasma to obtain low-fluorine sulfide; The alkaline solution supply module supplies the alkaline solution in the alkaline solution pool to the dielectric barrier reactor; The dielectric barrier reactor utilizes the plasma to excite the alkaline solution to generate hydroxide ions, and degrades the low-fluorine sulfide based on the hydroxide ions to obtain degraded tail gas; The alkaline solution pool absorbs the degradation tail gas.

12. The SF6 degradation method according to claim 11, characterized in that: After the dielectric barrier reactor uses the plasma to excite the alkaline solution to generate hydroxide ions, and degrades the low-fluorine sulfide based on the hydroxide ions to obtain the degraded tail gas, the method further includes: The components of the degraded tail gas are detected to obtain the SF6 degradation rate and SF6 energy efficiency, wherein the SF6 energy efficiency is the degradation mass of SF6 gas under unit input energy.

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