Grafting reaction device and method for improving cold resistance of thin film capacitor
By designing a graft reaction device that combines a flip-type stirring assembly and a lifting valve, the low efficiency and reactant adsorption problems caused by fixed stirring are solved, efficient stirring and energy utilization are achieved, and the cold resistance of the film capacitor is improved.
Patent Information
- Application Number
- CN202411547409.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-01
- Publication Date
- 2025-01-07
AI Technical Summary
In the prior art, the fixed stirring components lead to low graft reaction efficiency, unstable stirring rods, long processing time, and reactants are easily adsorbed on the inner wall of the reaction tank, affecting the reaction integrity.
A graft reaction device including a mounting frame, a reaction tank, a flip-type stirring assembly and a lifting valve is designed to achieve multi-directional agitation of the stirring rod by combining the mounting shaft, connecting rod and telescopic rod, and use piston plates and waterproof and breathable. The membrane is used to discharge the exhaust gas, and the piston plate is raised and compressed exhaust gas is used for heat utilization.
The stirring efficiency is improved, processing time is reduced, the reactants are fully reacted, and the energy utilization rate is improved through exhaust gas compression and material heat exchange, avoiding the adsorption of reactants on the tank wall.
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Figure CN119258957A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of grafting reaction, and in particular to a grafting reaction device for improving the cold resistance of a film capacitor. Background Art
[0002] The chemical grafting method is to place the substrate in a reaction container, add an initiator, a monomer, and a solvent, and then carry out a grafting reaction after replacing oxygen with an inert gas.
[0003] In the process of graft polymerization, it is necessary to repeatedly add chemical raw materials such as solvents, and use a stirring component to stir the solution and the monomer. However, most of the current stirring components are fixed. During the stirring reaction, the rapid operation of the stirring rod will increase the resistance to the stirring rod, causing the stirring rod to be unstable. However, reducing the rotation speed of the stirring rod will make the processing time lengthy and time-consuming. At the same time, it may lead to incomplete reaction, affecting the final graft polymerization reaction. Moreover, the reactants will be adsorbed on the inner wall of the reaction tank after the reaction is completed and discharged. For this reason, a graft reaction device for improving the cold resistance of film capacitors is proposed. Summary of the invention
[0004] The present invention aims to solve the problem of low grafting reaction efficiency caused by fixed stirring in the prior art, and proposes a grafting reaction device for improving the cold resistance of film capacitors.
[0005] In order to achieve the above object, the present invention adopts the following technical solutions:
[0006] A grafting reaction device for improving the cold resistance of a film capacitor comprises a mounting frame and a reaction tank arranged at the center of the mounting frame, wherein a mounting cavity is arranged in the reaction tank, wherein an electric heater is arranged in the mounting cavity, and further comprises: a mounting shaft, which is rotatably arranged in the reaction tank; a piston plate, which is slidably arranged in the reaction tank and slidably arranged with the mounting shaft; a telescopic rod, which is fixedly arranged on the mounting shaft, and a stirring rod is rotatably installed on the output end of the telescopic rod; a lifting valve, which is slidably arranged on the mounting shaft, and blocks a discharge port at the bottom of the reaction tank after the lifting valve is lowered, and opens the discharge port at the bottom of the reaction tank after the lifting valve is raised; a flip-type stirring component, wherein the upper and lower ends are respectively connected to the piston plate and the lifting valve, and the middle is connected to the telescopic rod; when the lifting valve rises and the piston plate falls, the outer wall of the flip-type stirring component is in contact with the inner wall of the reaction tank; when the lifting valve falls and the piston plate rises and falls back and forth, the flip-type stirring component is separated from the inner wall of the reaction tank and flips back and forth left and right with the connection point with the telescopic rod as the axis.
[0007] As a preferred embodiment of the present invention: the telescopic rod comprises a sleeve rod fixedly mounted on the mounting shaft, the sleeve rod is slidably connected with a slide rod, and the slide rod is rotationally connected to the flip-type stirring assembly.
[0008] As a preferred embodiment of the present invention: the flip-type stirring assembly includes: a stirring rod, the middle part of which is rotatably connected to the sliding rod; a first connecting rod, the two ends of which are respectively rotatably connected to the bottom wall of the piston plate and the top of the stirring rod; a second connecting rod, the two ends of which are respectively rotatably connected to the lifting valve and the bottom of the stirring rod.
[0009] As a preferred embodiment of the present invention: the lifting valve includes a lifting rod slidably mounted on the mounting shaft, a connecting seat is rotatably mounted on the bottom of the lifting rod, the second connecting rod is rotatably connected to the connecting seat, and a sealing valve core is rotatably mounted on the connecting seat.
[0010] As a preferred embodiment of the present invention: an electric telescopic rod is fixedly installed on the top of the reaction tank, a first connecting plate is fixedly installed on the top of the electric telescopic rod, and the first connecting plate is fixedly connected to the lifting rod.
[0011] As a preferred embodiment of the present invention: a mounting seat is fixedly installed on the top of the reaction tank, a reduction motor is fixedly installed on the top of the mounting seat, and the output shaft of the reduction motor is transmission-connected to the mounting shaft via a first bevel gear set.
[0012] As a preferred embodiment of the present invention: a connecting rod is slidably installed on the top of the reaction tank, and a second connecting plate is fixedly installed on the connecting rod; a mounting cylinder is rotatably installed on the mounting seat, a reciprocating screw is threadedly connected to the mounting cylinder, and the top of the reciprocating screw is fixedly connected to the second connecting plate; a support plate is fixedly installed on the mounting seat, and a transmission shaft is rotatably installed on the support plate, one end of the transmission shaft is transmission-connected to the output shaft of the reduction motor through a pulley group, and the other end of the transmission shaft is transmission-connected to the mounting cylinder through a second bevel gear group; a ratchet mechanism is arranged between the pulley group and the transmission shaft.
[0013] As a preferred embodiment of the present invention: it also includes: a feed tank, which is fixedly mounted on the mounting frame, and a plurality of groups of feed tanks are arranged around the reaction tank; a discharge pipe is fixedly mounted on the bottom of the feed tank, the piston plate divides the reaction tank into a reaction chamber and a compression chamber, the flip-type stirring assembly is arranged in the reaction chamber, the discharge pipe is connected to the reaction chamber, and a solenoid valve is arranged on the discharge pipe; a mounting pipe is threadedly connected to the piston plate, the upper and lower ends of the mounting pipe are respectively connected to the reaction chamber and the compression chamber, a waterproof and breathable membrane is fixedly mounted on the bottom of the mounting pipe, a one-way valve for exhausting air into the compression chamber is fixedly mounted in the mounting pipe, and the bottom of the one-way valve is against the waterproof and breathable membrane; a heat exchange component connected to the exhaust end of the compression chamber is arranged in the feed tank.
[0014] As a preferred embodiment of the present invention: the heat exchange component includes a heat pipe fixedly installed in the feed tank, the heat pipe is connected to the compression chamber through an exhaust pipe, and a pressure control valve is arranged on the exhaust pipe; a heat sink is fixedly installed on the side wall of the heat pipe, and heat storage ceramics and a filter block are arranged in the heat pipe, and the filter block is arranged above the heat storage ceramics.
[0015] A grafting method comprises the following steps:
[0016] Step 1, placing polypropylene into the solution in the reaction chamber and starting the electric heater to heat the solution;
[0017] Step 2: During the heating process, the polypropylene is stirred by using a flip stirring assembly to allow the polypropylene to be heated evenly;
[0018] Step 3, adding the initiator into the solution and mixing during the heating of the polypropylene;
[0019] Step 4: During the process of mixed graft copolymerization, the piston plate is driven to move up and down to change the stirring trajectory of the flip stirring assembly, and the exhaust gas in the reaction chamber is absorbed and compressed by the cooperation of the piston plate and the waterproof breathable membrane;
[0020] Step 5: The compressed exhaust gas is discharged into the heat transfer pipe to exchange heat with the material in the feed tank, and then filtered and discharged through the filter block.
[0021] Compared with the prior art, the present invention provides a grafting reaction device for improving the cold resistance of film capacitors, which has the following beneficial effects:
[0022] 1. The grafting reaction device for improving the cold resistance of film capacitors realizes multi-directional stirring of the stirring rod inside the reaction tank through the cooperation of the mounting shaft, the first connecting rod, the second connecting rod and the telescopic rod, which not only improves the stirring efficiency but also reduces the processing time;
[0023] 2. The grafting reaction device for improving the cold resistance of film capacitors can discharge the waste gas inside the reaction chamber while achieving multi-directional stirring by cooperating with the flip-type stirring rod, piston plate, one-way valve and waterproof breathable membrane;
[0024] 3. The grafting reaction device for improving the cold resistance of film capacitors can compress the exhaust gas by the rising of the piston plate under the action of the one-way valve and the pressure control valve, thereby increasing the heat of the exhaust gas by compression, and then allowing the exhaust gas to pass through the feed tank to exchange heat with the material to be added, thereby improving the energy utilization rate. BRIEF DESCRIPTION OF THE DRAWINGS
[0025] Figure 1 A schematic diagram of the three-dimensional structure of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention;
[0026] Figure 2 A schematic diagram of the structure of a reaction tank of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention Figure 1 ;
[0027] Figure 3 A cross-sectional view of a reaction tank of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention;
[0028] Figure 4 A schematic diagram of the structure of a reaction tank of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention Figure 2 ;
[0029] Figure 5 A grafting reaction device for improving the cold resistance of film capacitors proposed by the present invention Figure 4 The structural diagram of part A in the figure;
[0030] Figure 6 A cross-sectional view of a feed tank of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention;
[0031] Figure 7 A schematic diagram of the structure of a flip stirring assembly of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention Figure 1 ;
[0032] Figure 8 A schematic diagram of the structure of a flip stirring assembly of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention Figure 2 ;
[0033] Fig. 9 A cross-sectional view of a mounting tube for a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention;
[0034] Fig.10 The cross-sectional view of a heat conducting tube of a grafting reaction device for improving the cold resistance of a film capacitor proposed by the present invention.
[0035] In the figure: 1, mounting frame; 2, reaction tank; 3, feed tank; 4, discharge pipe; 5, reaction chamber; 6, mounting chamber; 7, electric heater; 8, piston plate; 9, compression chamber; 10, one-way valve; 11, mounting shaft; 12, sleeve rod; 13, slide rod; 14, stirring rod; 15, first connecting rod; 16, second connecting rod; 17, sealing valve core; 18, connecting seat; 19, lifting rod; 20, first connecting plate; 21, mounting seat; 22 , reduction motor; 23, first bevel gear set; 24, electric telescopic rod; 25, connecting rod; 26, second connecting plate; 27, support plate; 28, transmission shaft; 29, waterproof breathable membrane; 30, pulley set; 31, mounting tube; 32, second bevel gear set; 33, reciprocating screw; 34, heat pipe; 35, heat sink; 36, filter block; 37, exhaust pipe; 38, pressure control valve; 39, mounting tube; 40, thermal storage ceramics. DETAILED DESCRIPTION
[0036] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.
[0037] In the description of the present invention, it is necessary to understand that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.
[0038] Example: Refer to Figure 1-Figure 10A grafting reaction device for improving the cold resistance of a film capacitor comprises a mounting frame 1 and a reaction tank 2 arranged at the center of the mounting frame 1, a mounting cavity 6 is arranged in the reaction tank 2, an electric heater 7 is arranged in the mounting cavity 6, and further comprises: a mounting shaft 11, which is rotatably arranged in the reaction tank 2; a piston plate 8, which is slidably arranged in the reaction tank 2 and slidably arranged with the mounting shaft 11; a telescopic rod, which is fixedly mounted on the mounting shaft 11, and a stirring rod 14 is rotatably mounted on the output end of the telescopic rod; a lifting valve, which is slidably arranged on the mounting shaft 11, and blocks the discharge port at the bottom of the reaction tank 2 after the lifting valve is lowered, and opens the discharge port at the bottom of the reaction tank 2 after the lifting valve is raised; a flip stirring component, the upper and lower ends of which are respectively connected to the piston plate 8 and the lifting valve The telescopic rod comprises a sleeve rod 12 fixedly mounted on the mounting shaft 11, a sliding rod 13 is slidably connected to the sleeve rod 12, and the sliding rod 13 is rotationally connected to the flip-type stirring assembly; the flip-type stirring assembly comprises: a stirring rod 14, a middle part of which is rotationally connected to the sliding rod 13; a first connecting rod 15, both ends of which are rotationally connected to the bottom wall of the piston plate 8 and the top of the stirring rod 14 respectively; a second connecting rod 16, both ends of which are rotationally connected to the lifting valve and the bottom of the stirring rod 14 respectively; the lifting valve comprises a lifting rod 19 slidably mounted on the mounting shaft 11, a connecting seat 18 is rotatably mounted at the bottom of the lifting rod 19, the second connecting rod 16 is rotationally connected to the connecting seat 18, and a sealing valve core 17 is rotatably mounted on the connecting seat 18.
[0039] When in use, the mounting shaft 11 drives the stirring rod 14 to rotate around the mounting shaft 11 through the first connecting rod 15, the second connecting rod 16 and the telescopic rod. During the rotation, the sealing valve core 17 slides in the discharge port of the reaction tank 2 under the action of the lifting rod 19. At the same time, the piston plate 8 reciprocates and lifts. The piston plate 8 drives the stirring rod 14 through the first connecting rod 15 to flip back and forth left and right around the connection point between the stirring rod 14 and the telescopic rod, thereby increasing the stirring range of the stirring rod 14 inside the reaction tank 2, improving the stirring efficiency without increasing the speed, and reducing the processing time.
[0040] When discharging, the sealing valve core 17 is retracted into the interior of the reaction tank 2 through the lifting rod 19, and then the piston plate 8 is driven to descend. During this process, the connecting seat 18 drives the second connecting rod 16 to rise, and the piston plate 8 drives the first connecting rod 15 to descend. Under the action of the first connecting rod 15 and the second connecting rod 16, the stirring rod 14 moves toward the inner wall of the reaction tank 2, and finally makes the stirring rod 14 stick to the inner wall of the reaction tank 2, and then drives the installation shaft 11 to rotate. The installation shaft 11 drives the stirring rod 14 to rotate with the installation shaft 11 as the axis to scrape the inner wall of the reaction tank 2 to prevent the reactants from being adsorbed on the tank wall.
[0041] Reference Figure 2-Figure 5 , Figure 8 and Fig. 9An electric telescopic rod 24 is fixedly installed on the top of the reaction tank 2 , and a first connecting plate 20 is fixedly installed on the top of the electric telescopic rod 24 . The first connecting plate 20 is fixedly connected to the lifting rod 19 .
[0042] In this embodiment, the first connecting plate 20 is driven to rise by the electric telescopic rod 24 , and the first connecting plate 20 drives the sealing valve core 17 to rise through the lifting rod 19 and the connecting seat 18 , thereby opening the discharge port at the bottom of the reaction tank 2 .
[0043] Reference Figure 2-Figure 5 A mounting seat 21 is fixedly installed on the top of the reaction tank 2 , a reduction motor 22 is fixedly installed on the top of the mounting seat 21 , and an output shaft of the reduction motor 22 is transmission-connected to the mounting shaft 11 through a first bevel gear set 23 .
[0044] In this embodiment, the reduction motor 22 drives the first bevel gear set 23 to rotate, the first bevel gear set 23 drives the installation shaft 11 to rotate, and further drives the stirring rod 14 to rotate to stir the reactants.
[0045] Reference Figure 2-Figure 5 , Figure 8 and Fig. 9 A connecting rod 25 is slidably installed on the top of the reaction tank 2, and a second connecting plate 26 is fixedly installed on the connecting rod 25; a mounting cylinder 31 is rotatably installed on the mounting seat 21, and a reciprocating screw 33 is threadedly connected to the mounting cylinder 31, and the top of the reciprocating screw 33 is fixedly connected to the second connecting plate 26; a support plate 27 is fixedly installed on the mounting seat 21, and a transmission shaft 28 is rotatably installed on the support plate 27, one end of the transmission shaft 28 is transmission-connected to the output shaft of the reduction motor 22 through a pulley group 30, and the other end of the transmission shaft 28 is transmission-connected to the mounting cylinder 31 through a second bevel gear group 32; a ratchet mechanism is arranged between the pulley group 30 and the transmission shaft 28.
[0046] In this embodiment, the reduction motor 22 drives the mounting cylinder 31 to rotate through the pulley group 30, and the mounting cylinder 31 drives the reciprocating screw rod 33 to move up and down. During this process, the reciprocating screw rod 33 drives the connecting rod 25 to move up and down through the second connecting plate 26, thereby driving the piston plate 8 to move up and down.
[0047] Under the action of the ratchet mechanism, when the reactants react, the output shaft of the reduction motor 22 rotates in a first direction (the first direction is clockwise or counterclockwise). During this process, the pulley assembly 30 drives the mounting cylinder 31 to rotate through the ratchet mechanism.
[0048] During the discharging process, the output shaft of the reduction motor 22 rotates in the second direction (the second direction is opposite to the first direction). Under the action of the ratchet mechanism, the pulley group 30 no longer drives the mounting cylinder 31 to rotate, thereby fixing the position of the piston plate 8, which facilitates the cleaning of the inner wall of the reaction tank 2.
[0049] Reference Figure 1-Figure 10 , and further includes: a feed tank 3, which is fixedly mounted on the mounting frame 1, and a plurality of feed tanks 3 are arranged around the reaction tank 2; a discharge pipe 4 is fixedly mounted on the bottom of the feed tank 3, a piston plate 8 divides the reaction tank 2 into a reaction chamber 5 and a compression chamber 9, a flip stirring assembly is arranged in the reaction chamber 5, the discharge pipe 4 is connected to the reaction chamber 5, and a solenoid valve is arranged on the discharge pipe 4; a mounting pipe 39 is threadedly connected to the piston plate 8, and the upper and lower ends of the mounting pipe 39 are respectively connected to the reaction chamber 5 and the compression chamber 9, a waterproof and breathable membrane 29 is fixedly mounted on the bottom of the mounting pipe 39, and a fixed mounting is arranged in the mounting pipe 39 A one-way valve 10 is provided for exhausting air into the compression chamber 9, and the bottom of the one-way valve 10 is against the waterproof breathable membrane 29; a heat exchange component connected to the exhaust end of the compression chamber 9 is provided in the feed tank 3; the heat exchange component includes a heat pipe 34 fixedly installed in the feed tank 3, the heat pipe 34 is connected to the compression chamber 9 through an exhaust pipe 37, and a pressure control valve 38 is provided on the exhaust pipe 37; a heat sink 35 is fixedly installed on the side wall of the heat pipe 34, and a heat storage ceramic 40 and a filter block 36 (activated carbon or zeolite molecular sieve) are provided in the heat pipe 34, and the filter block 36 is arranged above the heat storage ceramic 40.
[0050] During the reaction, the piston plate 8 reciprocates and rises and falls. With the cooperation of the waterproof and breathable membrane 29 and the one-way valve 10, when the piston plate 8 descends, the pressure in the reaction chamber 5 is greater than the pressure in the compression chamber 9. Therefore, the gas in the reaction chamber 5 enters the compression chamber 9, and then the piston plate 8 rises. During the rising process of the piston plate 8, under the regulation of the pressure control valve 38, the pressure of the ejected gas is increased, thereby increasing the temperature of the ejected gas. Then, the ejected gas enters the heat conducting pipe 34, passes through the heat storage ceramic 40, absorbs the heat energy through the heat storage ceramic 40, and then passes through the filter block 36 to adsorb impurities in the exhaust gas and then discharges it.
[0051] Among them, after the heat storage ceramic 40 absorbs the heat of the discharged exhaust gas, the temperature of the discharged exhaust gas is reduced to avoid polluting the environment. At the same time, the heat absorbed by the heat storage ceramic 40 is dissipated to the feed tank 3 through the heat dissipation plate 35, and the solvent in the feed tank 3 needs to be repeatedly added to the reaction tank 2 for preheating, thereby reducing the temperature difference between the subsequently added solvent and the reactants, and facilitating the preheating of the subsequently added polypropylene, thereby reducing the reaction heating time.
[0052] A grafting method comprises the following steps:
[0053] Step 1: Put polypropylene into the solution in the reaction chamber 5 and start the electric heater 7 to heat the solution;
[0054] Step 2: During the heating process, the polypropylene is stirred by using a flip stirring assembly to allow the polypropylene to be heated evenly;
[0055] Step 3, adding the initiator into the solution and mixing during the heating of the polypropylene;
[0056] Step 4: During the process of mixed graft copolymerization, the piston plate 8 is driven to rise and fall back and forth, the stirring trajectory of the flip stirring assembly is changed, and the piston plate 8 and the waterproof breathable membrane 29 are used to absorb the waste gas in the reaction chamber 5 and compress the waste gas;
[0057] Step 5: The compressed exhaust gas is discharged into the heat conducting pipe 34 to exchange heat with the material in the feed tank 3, and then filtered through the filter block 36 and discharged.
[0058] In order to facilitate the verification of the use of the film capacitors finally produced by the above-mentioned blending device and process in a low-temperature environment, the finally manufactured capacitors are moved to a low-temperature environment for power-on operation; the adjustment of the capacitor low-temperature detection operation is: the temperature is -40°C, and the power-on operation time is 24 hours, and the voltage level the capacitor withstands is 1.3Un; after the test operation, the shell, epoxy resin, and insulating film are checked for cracks; at the same time, the copper bus, nuts and other metal parts are checked for ablation; the change in the capacitance of the capacitor is checked, and the capacitance change rate is ≤2%, and it is considered unqualified if it exceeds 2%; the loss tangent value is checked to see if it is ≤l.ltanδ+0.0001; the equivalent series resistor ESR: 10kHz; △ESR / ESR0≤50%.
[0059] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.
Claims
1. A grafting reaction device for improving the cold resistance of a film capacitor, comprising a mounting frame (1) and a reaction tank (2) arranged at the center of the mounting frame (1), wherein the reaction tank (2) is provided with a mounting cavity (6), and an electric heater (7) is provided in the mounting cavity (6), characterized in that: Also includes: A mounting shaft (11) is rotatably disposed in the reaction tank (2); A piston plate (8) is slidably disposed in the reaction tank (2) and is slidably disposed with the mounting shaft (11); A telescopic rod is fixedly mounted on the mounting shaft (11), and a stirring rod (14) is rotatably mounted on the output end of the telescopic rod; A lifting valve is slidably arranged on the mounting shaft (11), the lifting valve blocks the discharge port at the bottom of the reaction tank (2) when it descends, and opens the discharge port at the bottom of the reaction tank (2) when it rises; The flip stirring assembly has upper and lower ends connected to the piston plate (8) and the lifting valve respectively, and the middle is connected to the telescopic rod; When the lifting valve rises and the piston plate (8) descends, the outer wall of the flip-type stirring assembly abuts against the inner wall of the reaction tank (2); When the lifting valve descends and the piston plate (8) rises and falls back and forth, the flip-type stirring assembly separates from the inner wall of the reaction tank (2) and flips back and forth left and right with the connection point with the telescopic rod as the axis.
2. A grafting reaction device for improving the cold resistance of film capacitors according to claim 1, characterized in that: The telescopic rod comprises a sleeve rod (12) fixedly mounted on the mounting shaft (11), a slide rod (13) being slidably connected to the sleeve rod (12), and the slide rod (13) being rotationally connected to the flip-type stirring assembly.
3. A grafting reaction device for improving the cold resistance of film capacitors according to claim 2, characterized in that: The flip stirring assembly comprises: A stirring rod (14), the middle portion of which is rotatably connected to the sliding rod (13); A first connecting rod (15), both ends of which are rotatably connected to the bottom wall of the piston plate (8) and the top of the stirring rod (14); The second connecting rod (16) has two ends rotatably connected to the lifting valve and the bottom of the stirring rod (14) respectively.
4. A grafting reaction device for improving the cold resistance of film capacitors according to claim 3, characterized in that: The lifting valve comprises a lifting rod (19) slidably mounted on the mounting shaft (11); a connecting seat (18) is rotatably mounted on the bottom of the lifting rod (19); the second connecting rod (16) is rotatably connected to the connecting seat (18); and a sealing valve core (17) is rotatably mounted on the connecting seat (18).
5. The grafting reaction device for improving the cold resistance of film capacitors according to claim 4, characterized in that: An electric telescopic rod (24) is fixedly mounted on the top of the reaction tank (2), a first connecting plate (20) is fixedly mounted on the top of the electric telescopic rod (24), and the first connecting plate (20) is fixedly connected to the lifting rod (19).
6. The grafting reaction device for improving the cold resistance of film capacitors according to claim 1, characterized in that: A mounting seat (21) is fixedly mounted on the top of the reaction tank (2), a reduction motor (22) is fixedly mounted on the top of the mounting seat (21), and an output shaft of the reduction motor (22) is transmission-connected to the mounting shaft (11) via a first bevel gear set (23).
7. The grafting reaction device for improving the cold resistance of film capacitors according to claim 6, characterized in that: A connecting rod (25) is slidably mounted on the top of the reaction tank (2), and a second connecting plate (26) is fixedly mounted on the connecting rod (25); A mounting cylinder (31) is rotatably mounted on the mounting seat (21), a reciprocating screw rod (33) is threadedly connected to the mounting cylinder (31), and the top of the reciprocating screw rod (33) is fixedly connected to the second connecting plate (26); A support plate (27) is fixedly mounted on the mounting seat (21), a transmission shaft (28) is rotatably mounted on the support plate (27), one end of the transmission shaft (28) is transmission-connected to the output shaft of the reduction motor (22) via a pulley set (30), and the other end of the transmission shaft (28) is transmission-connected to the mounting cylinder (31) via a second bevel gear set (32); A ratchet mechanism is arranged between the pulley group (30) and the transmission shaft (28).
8. The grafting reaction device for improving the cold resistance of film capacitors according to claim 1, characterized in that: Also includes: A feed tank (3), wherein the feed tank (3) is fixedly mounted on the mounting frame (1), and a plurality of groups of the feed tanks (3) are arranged around the reaction tank (2); A discharge pipe (4) is fixedly mounted at the bottom of the feed tank (3); the piston plate (8) divides the interior of the reaction tank (2) into a reaction chamber (5) and a compression chamber (9); the flip-type stirring assembly is arranged in the reaction chamber (5); the discharge pipe (4) is in communication with the reaction chamber (5), and a solenoid valve is arranged on the discharge pipe (4); The piston plate (8) is threadedly connected with a mounting tube (39), the upper and lower ends of the mounting tube (39) are respectively connected with the reaction chamber (5) and the compression chamber (9), a waterproof breathable membrane (29) is fixedly mounted on the bottom of the mounting tube (39), a one-way valve (10) for exhausting air into the compression chamber (9) is fixedly mounted inside the mounting tube (39), and the bottom of the one-way valve (10) abuts against the waterproof breathable membrane (29); The feed tank (3) is provided with a heat exchange component connected to the exhaust end of the compression chamber (9).
9. The grafting reaction device for improving the cold resistance of film capacitors according to claim 8, characterized in that: The heat exchange assembly comprises a heat conducting pipe (34) fixedly installed in the feed tank (3), the heat conducting pipe (34) being connected to the compression chamber (9) via an exhaust pipe (37), and a pressure control valve (38) being arranged on the exhaust pipe (37); A heat dissipation plate (35) is fixedly mounted on the side wall of the heat-conducting pipe (34). A heat storage ceramic (40) and a filter block (36) are arranged in the heat-conducting pipe (34). The filter block (36) is arranged above the heat storage ceramic (40).
10. A grafting method, using a grafting reaction device for improving the cold resistance of a film capacitor according to any one of claims 1 to 9, characterized in that: The following steps are involved: Step 1: placing polypropylene into the solution in the reaction chamber (5) and starting the electric heater (7) to heat the solution; Step 2: During the heating process, the polypropylene is stirred by using a flip stirring assembly to allow the polypropylene to be heated evenly; Step 3, adding the initiator into the solution and mixing during the heating of the polypropylene; Step 4: During the process of mixed graft copolymerization, the piston plate (8) is driven to rise and fall back and forth, the stirring trajectory of the flip stirring assembly is changed, and the piston plate (8) and the waterproof breathable membrane (29) are used to absorb the waste gas in the reaction chamber (5) and compress the waste gas; Step 5: The compressed waste gas is discharged into the heat conducting pipe (34) to exchange heat with the material in the feed tank (3), and then filtered and discharged through the filter block (36).