Continuous multi-chamber laser pulse deposition apparatus based on electromagnetic cradle

Abstract

The application discloses a continuous multi-chamber laser pulse deposition device based on an electromagnetic support, which is suitable for the field of vacuum film deposition, and in particular, is suitable for substrate transfer and sealing systems in a laser pulse deposition (PLD) process. The device is composed of five chambers connected in sequence, including a normal-pressure feeding chamber, a pre-vacuum chamber, a deposition chamber, a pressurizing chamber and a material taking chamber. The chambers are sealed through flanges and double eccentric butterfly valves, and fluorine rubber or polytetrafluoroethylene sealing rings are used to ensure efficient isolation between the chambers. The transfer of materials is realized by an electromagnetic support system. The system controls a magnetic adsorption tray through electromagnets, realizes high-precision transfer of materials without contact, and greatly improves the continuity and production efficiency of film preparation. The extension and retraction of the electromagnetic support are controlled by a pneumatic device, the system can accurately operate in an ultrahigh vacuum environment, and the problems of traditional mechanical wear and vacuum leakage are avoided. The application has the advantages of modular design, rapid substrate transfer, reduced maintenance cost, improved production efficiency and equipment life.

Description

Technical Field

[0001] This invention relates to a multi-chamber substrate transfer and sealing system for pulsed laser deposition (PLD) processes in the field of vacuum thin film deposition equipment. The focus of this invention is to optimize contactless substrate transfer in ultra-high vacuum environments, improve the sealing performance between chambers, and ensure that the equipment can transfer materials under different pressure conditions, thereby improving the continuity and quality of thin film deposition. Background Technology

[0002] Laser pulse deposition is a deposition technique used to prepare thin film materials, especially offering unique advantages in preparing functional thin films with complex structures or compositions. However, with increasingly stringent requirements for thin film uniformity, precision, and mass production, existing laser pulse deposition equipment has revealed some shortcomings in practical applications.

[0003] Existing laser pulse deposition equipment typically has only one deposition chamber. When preparing thin films, the substrate and tray need to be installed before vacuum treatment. After the preparation of a thin film is completed, vacuum treatment and substrate installation need to be repeated, which reduces the efficiency of the equipment in industrial production.

[0004] Maintaining a stable vacuum environment during substrate movement is a major challenge due to the need for sealing between chambers. Current technologies offer limited sealing performance of guide rail systems, resulting in a high risk of vacuum leakage, which can potentially lead to the failure of the entire thin film fabrication process. Summary of the Invention

[0005] The present invention aims to provide an improved laser pulse deposition apparatus that achieves frictionless, contamination-free, high-precision positioning and efficient transfer of substrates between multiple chambers through the combination of electromagnetic supports and electromagnetic forces, thereby improving the continuity, uniformity and production efficiency of thin film preparation.

[0006] To achieve the above objectives, the present invention provides the following design scheme:

[0007] A laser pulse deposition apparatus is characterized by comprising five chambers connected in sequence: an atmospheric pressure discharge chamber, a pre-vacuum chamber, a deposition chamber, a pressurization chamber, and a material collection chamber. The chambers are sealed to each other using valves and sealing rings. Furthermore, the transfer of material trays between chambers is achieved by the rotation of an electromagnetic support, driven by an electromagnetic support motor. The extension and retraction of the electromagnetic support are pneumatically controlled. Each end of the electromagnetic support has a tray with a magnetically attached bottom. When the electromagnetic support rotates, the electromagnets are energized, attracting the tray. When the tray rotates to a designated position, a pneumatic device pushes a rod to move, causing the material tray to enter the next chamber. When the material tray rotates to the next chamber, the electromagnet in the next chamber is energized, and the electromagnet in the previous chamber is de-energized, thus completing the transfer between the two chambers.

[0008] As a preferred option, double eccentric butterfly valves are selected for the valves between the chambers.

[0009] As a preferred option, the sealing ring is made of vacuum-resistant fluororubber or polytetrafluoroethylene.

[0010] As a preferred option, the raising and lowering of the pallet motor shaft is achieved through a lead screw.

[0011] As a preferred embodiment, each chamber should contain a monitoring system, which should include at least a thermometer, a vacuum gauge, a pressure sensor, and at least one observation window.

[0012] As a preferred option, in addition to the monitoring system mentioned above, the deposition chamber should also include equipment that a traditional laser pulse deposition equipment deposition chamber should contain, such as electromagnetic sensors, Raman sensors, camera windows, lasers, and substrates.

[0013] As a preferred embodiment, the material tray should be equipped with a heater for heating the material.

[0014] As a preferred embodiment, the drive motor shaft is a splined shaft, and the various holes are designed with internal splines.

[0015] As a preferred embodiment, each chamber should include a vacuum system, which should include a mechanical pump and a molecular pump. The mechanical pump is used for primary vacuuming between chambers, and the inlet of the mechanical pump is connected to the outlet of the molecular pump for secondary vacuuming.

[0016] As a preferred embodiment, the present invention also includes a precision control system for synchronously controlling the on / off operation of the electromagnets between the chambers, ensuring accurate positioning of the substrate during the transfer process and preventing the substrate from shaking or shifting during the transfer process.

[0017] The continuous laser pulse system design provided by this invention has the following significant advantages compared with the prior art:

[0018] First, compared to traditional laser pulse deposition equipment, electromagnetic support systems can achieve rapid substrate transfer, thereby shortening the preparation cycle and improving overall production efficiency.

[0019] Secondly, the non-contact movement of the electromagnetic support reduces mechanical wear, thereby lowering the frequency and cost of equipment maintenance and extending the service life of the equipment.

[0020] Third, the use of double eccentric butterfly valves and sealing rings at the connections between the chambers effectively enhances the system's sealing performance and reliability.

[0021] Fourth, the equipment adopts a modular design, with each chamber being an independent module that can be replaced or adjusted according to process requirements. This design not only improves the flexibility of the equipment but also facilitates maintenance and upgrades. Users can adjust the arrangement of the chambers or add new chamber modules according to the deposition requirements of different materials. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the overall connection.

[0023] Figure 2 This is a schematic diagram of the deposition cavity.

[0024] Figure 3 Schematic diagram of electromagnetic support

[0025] Figure 4 Adsorption tray Detailed Implementation

[0026] The design will be further explained below with reference to the accompanying drawings:

[0027] The device consists of 1 atmospheric pressure discharge chamber, 2 flange, 3 pre-vacuum chamber, 4 deposition chamber, 5 double eccentric butterfly valve, 6 pressurization chamber, 7 material handling chamber, 8(2) material tray motor hole, 8(1) substrate tray motor hole, 9(2) lower electromagnetic support rotating hole, 9(1) upper electromagnetic support hole, 10 external cavity pneumatic device connection port, 11 electromagnetic support, 111 tray motor hole, 12 adsorption tray, 113 electromagnet, 114 support pneumatic device interface, 115 support motor hole, 116 main rod, 117 auxiliary rod, 121 material (substrate) tray, 122 material (substrate) tray connecting shaft, 123 laser entrance port, 21 RHEED gun, 22 temperature gauge hole, 23 laser entrance hole, 24 observation window, and 25 pressure gauge hole.

[0028] like Figure 1The laser pulse deposition apparatus of this invention comprises five chambers connected sequentially: a 1 atmospheric pressure discharge chamber, a 3 pre-vacuum chamber, a 4 deposition chamber, a 6 pressurization chamber, and a 7 unloading chamber. Each chamber is connected to a 5-valve double eccentric butterfly valve via 2 flanges. Sealing rings are installed between the flanges for sealing; these sealing rings are made of vacuum-resistant fluororubber (FKM) or polytetrafluoroethylene (PTFE). Each chamber is equipped with an independent vacuum pump and pressure sensor to achieve precise control of the pressure within the chamber.

[0029] like Figure 2 As shown, the deposition chamber includes openings for measuring and observation instruments used in conventional laser pulse deposition equipment, such as 123 laser entrance port, 21 RHEED gun, 22 thermometer hole, 23 laser entrance aperture, 24 observation window, and 25 pressure gauge hole. Other unmarked openings can be used to install equipment such as spectrometers, gas analyzers, or optical interferometers. The design of these openings can be adjusted and configured according to user needs. Each chamber has two electromagnetic supports for material tray and substrate transfer, respectively. The upper electromagnetic support hole 9(1) and the lower electromagnetic support rotating hole 9(2) are used to install these two supports. The first and second drive motor shafts are connected to the material tray motor hole 8(2) and the substrate tray motor hole 8(1), and pass through the tray motor hole 111 to complete the overall fit. The tray motor hole 111, the material (substrate) tray connecting shaft 122, and the material (substrate) tray 121 are designed as a single unit. When the motor shaft rotates in the tray motor hole 111, it drives the material tray 121 to rotate, thereby realizing the material (substrate) transfer. In addition, the first and second drive motors are equipped with lifting devices on the outside. When the material tray needs to be transferred to the next chamber, the lifting device drives the motor downward, causing the drive motor shaft to disengage from the 111 tray motor hole, ensuring smooth rotation of the electromagnetic support. The third and fourth drive motor shafts are connected to the 115 support motor hole through the 9(1) upper electromagnetic support hole and the 9(2) lower electromagnetic support rotating hole, driving the 11 electromagnetic support to rotate. The external gas cylinder and mechanical pump pipeline are connected to the 114 support pneumatic device interface through the 10 external cavity pneumatic device connection port.

[0030] Figure 3 The electromagnetic support section 11 rotates via a second drive motor. The main rod 116 has a hollow interior. When an external gas cylinder supplies air to the main rod 116 through the pneumatic interface of the support 114, it pushes the auxiliary rod 117 forward. When the auxiliary rod 117 needs to retract, the gas supply is shut off, and a mechanical pump extracts the gas from the main rod 116, completing the retraction. Electromagnet 113 controls the detachment or connection of the suction tray 12 to the electromagnetic support 11.

[0031] Figure 4 This is a schematic diagram of the interior of the adsorption tray. The laser inlet 123 irradiates the material in the material tray 121, causing it to generate plasma plumes, which are used for substrate coating.

[0032] like Figure 3 The electromagnetic supports are fixed in each chamber, and the adsorption and release of the trays are controlled by electromagnet 113. The adsorption tray 12 is connected to the electromagnetic support 11 via electromagnet 113, at which point the electromagnetic support is in a retracted state. When the substrate moves from the atmospheric pressure discharge chamber 1 to the pre-vacuum chamber 3, the electromagnetic support 11 extends the auxiliary rod 117 via a pneumatic device. Electromagnet 113 in the pre-vacuum chamber 3 is energized, fixing the adsorption tray 12 in place. Simultaneously, electromagnet 113 in the atmospheric pressure discharge chamber 1 is de-energized, releasing the adsorption tray 12. This process is performed in a sealed state, avoiding substrate vibration or damage caused by pressure differences.

[0033] Each chamber's pressure control system operates independently. The atmospheric pressure unloading chamber (1) maintains atmospheric pressure and is used to load new substrates or the 12 adsorption trays, undergoing a first-stage vacuum treatment before entering the 3 pre-vacuum chamber. The 3 pre-vacuum chamber further vacuums the chamber, bringing its pressure to equilibrium with that of the 4 deposition chamber. The 4 deposition chamber maintains an ultra-high vacuum environment for laser pulse deposition. The 6 pressurization chamber gradually increases the pressure, gradually restoring the substrate from ultra-high vacuum to near-atmospheric pressure before finally placing it into the atmospheric pressure 7 unloading chamber. Throughout the process, the chambers are isolated by 5 double eccentric butterfly valves to ensure stable pressure within each chamber, preventing interference from other chambers.

[0034] Five double-eccentric butterfly valves are installed at the chamber connections to isolate the pressure environment of adjacent chambers. When a substrate needs to be transferred, the five double-eccentric butterfly valves are opened to connect the adjacent chambers. After the substrate transfer is completed, the five double-eccentric butterfly valves are closed to restore the independent pressure environment of each chamber. Because the five double-eccentric butterfly valves adopt a double-eccentric structure, they can provide reliable sealing performance under high vacuum conditions and achieve rapid opening and closing operation through electric or pneumatic actuators.

Claims

1. A laser pulse deposition apparatus, characterized in that, The device includes an atmospheric pressure discharge chamber, a pre-vacuum chamber, a deposition chamber, a pressurization chamber, and a take-up chamber connected sequentially along the material conveying direction. Each chamber is sealed and connected by a flange and a double eccentric butterfly valve. The sealing ring between the chambers is made of vacuum-resistant fluororubber or polytetrafluoroethylene. Each chamber is equipped with an independent vacuum pump and pressure sensor to control the pressure inside the chamber. The device includes an electromagnetic support system. The electromagnetic support is controlled to rotate by a drive motor and to extend and retract by a pneumatic device. The end of the electromagnetic support is equipped with a magnetic adsorption tray for transferring material trays between multiple chambers. The electromagnetic support system includes a main rod and a secondary rod. The main rod has a hollow structure, and the secondary rod moves back and forth via a pneumatic device. When the gas cylinder supplies gas into the main rod, the secondary rod extends; when the gas inside the main rod is extracted, the secondary rod retracts. The adsorption tray is connected to the electromagnetic support via an electromagnet. When the electromagnet is energized, it adsorbs the tray, and when the power is off, it releases the tray, which is used to transfer materials without contact. The pre-vacuum chamber is used to reduce the pressure inside the chamber to balance the ultra-high vacuum environment in the deposition chamber; the pressurization chamber is used to gradually increase the pressure inside the chamber to restore the material tray from the ultra-high vacuum state to the normal pressure state.

2. The laser pulse deposition apparatus according to claim 1, characterized in that, The deposition chamber includes a laser inlet, a RHEED gun, a temperature gauge orifice, an observation window, a pressure gauge orifice, and other openings for measurement and observation, which are configured according to user requirements.

3. The laser pulse deposition apparatus according to claim 1, characterized in that, The double eccentric butterfly valve is used to isolate the pressure environment of adjacent chambers. When materials need to be transferred, the double eccentric butterfly valve opens to connect the adjacent chambers. After the transfer is completed, the valve closes to restore the independent pressure environment of the chambers.

4. The laser pulse deposition apparatus according to claim 3, characterized in that, The double eccentric butterfly valve is controlled by an electric or pneumatic actuator to achieve rapid opening and closing, ensuring reliable sealing performance in high vacuum environments.

5. The laser pulse deposition apparatus according to claim 1, characterized in that, Each chamber operates independently, ensuring that pressure differences between chambers do not affect the transfer of the material tray.

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