Automatic residual liquid cleaning mechanism for chemical centrifugal pump

CN119308893AInactive Publication Date: 2025-01-14东营科技职业学院
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Patent Information

Application Number
CN202411442892.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-10-16
Publication Date
2025-01-14
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses an automatic residual liquid cleaning mechanism for a chemical centrifugal pump, and relates to the technical field of centrifugal pump related equipment, the automatic residual liquid cleaning mechanism comprises a cleaning backflow assembly, the cleaning backflow assembly comprises a cleaning cover box, and a storage box used for storing chemical residual liquid is arranged in the cleaning cover box; the centrifugal pump comprises a centrifugal pump shell, the bottom of the centrifugal pump shell is fixedly connected with a base, one side of the base is fixedly connected with a residual liquid leading-out pipe, the other side of the centrifugal pump shell is fixedly connected with a cleaning pipe, and one end of the cleaning pipe is provided with a cleaning backflow assembly. The storage box is arranged to collect the chemical residual liquid, when water injection is needed, the chemical residual liquid in the storage box is supplemented into the centrifugal pump through the cleaning pipe by starting the water delivery pump, closing the clear water pipe through the drainage reversing valve and communicating the clear water pipe with the drainage pipe, so that the trouble of additional water supplementing operation is avoided, recycling of the chemical residual liquid is achieved, and the water injection efficiency is improved. And resource waste is reduced.
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