Automatic residual liquid cleaning mechanism for chemical centrifugal pump
CN119308893AInactive Publication Date: 2025-01-14东营科技职业学院
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Patent Information
- Application Number
- CN202411442892.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-16
- Publication Date
- 2025-01-14
- Estimated Expiration
- Not applicable · inactive patent
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Figure CN119308893A_ABST
Abstract
The invention discloses an automatic residual liquid cleaning mechanism for a chemical centrifugal pump, and relates to the technical field of centrifugal pump related equipment, the automatic residual liquid cleaning mechanism comprises a cleaning backflow assembly, the cleaning backflow assembly comprises a cleaning cover box, and a storage box used for storing chemical residual liquid is arranged in the cleaning cover box; the centrifugal pump comprises a centrifugal pump shell, the bottom of the centrifugal pump shell is fixedly connected with a base, one side of the base is fixedly connected with a residual liquid leading-out pipe, the other side of the centrifugal pump shell is fixedly connected with a cleaning pipe, and one end of the cleaning pipe is provided with a cleaning backflow assembly. The storage box is arranged to collect the chemical residual liquid, when water injection is needed, the chemical residual liquid in the storage box is supplemented into the centrifugal pump through the cleaning pipe by starting the water delivery pump, closing the clear water pipe through the drainage reversing valve and communicating the clear water pipe with the drainage pipe, so that the trouble of additional water supplementing operation is avoided, recycling of the chemical residual liquid is achieved, and the water injection efficiency is improved. And resource waste is reduced.
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