Covering layer manufacturing method and covering layer manufacturing apparatus therefor

Abstract

The present invention relates to a cover layer manufacturing method and a cover layer manufacturing apparatus therefor. The cover layer manufacturing method includes: forming a cover layer on a back surface of a first display panel by using a first mask in a coating unit; a first cleaning step of cleaning the second mask in the cleaning unit; a rotation step of changing the position of the first mask and the position of the second mask by a rotation drive unit; a second coating step of forming a cover layer on a back surface of a second display panel using the second mask in the coating unit; and a second cleaning step of cleaning the first mask in the cleaning unit. In addition, the first coating step and the first cleaning step are performed at the same time, and the second coating step and the second cleaning step are performed at the same time.

Description

Technical Field

[0001] The present invention relates to a covering layer manufacturing method and a covering layer manufacturing device used therefor. Background Art

[0002] Organic light emitting diode displays (OLEDs), which have excellent brightness and viewing angle characteristics and do not require a separate light source unit, unlike liquid crystal display devices, have attracted attention as the next generation of flat panel display devices. Organic light emitting diode displays do not require a separate light source, so they can be manufactured to be lightweight and thin. In addition, organic light emitting diode displays have the characteristics of low power consumption, high brightness, and high response speed.

[0003] The organic light-emitting display device includes a display panel. When manufacturing the display panel, various layers such as a light-emitting layer, an electrode layer, and an encapsulation layer are formed. Therefore, masks having open areas and closed areas are also used to manufacture various display panels.

[0004] However, there are cases where organic matter such as resin used in the coating process using the mask remains in the bridging portion of the mask. In the case where the resin remaining on the back of the mask interferes with the contact between the mask and the mother substrate or a part of the resin falls onto the mother substrate, the reliability of the display device may be reduced. Therefore, between the coating step and the next coating step, the mask that has passed the coating step is also washed to remove the resin remaining in the bridging portion of the mask. However, after the coating step and the cleaning step, there is a problem that each coating step cannot be performed continuously. Summary of the invention

[0005] An object of the present invention is to provide a cover layer manufacturing apparatus capable of simultaneously performing a coating process and a cleaning process using masks different from each other.

[0006] In addition, another object of the present invention is to provide a method for manufacturing a cover layer, which can improve the process rate and reduce the process time by manufacturing a display panel through the cover layer manufacturing apparatus.

[0007] It may be that the covering layer manufacturing method according to one embodiment includes: a first coating step, forming a covering layer on the back side of a first display panel by using a first mask in a coating unit; a first cleaning step, washing a second mask in a cleaning unit; a rotating step, changing the position of the first mask and the position of the second mask by a rotating driving unit; a second coating step, forming a covering layer on the back side of a second display panel by using the second mask in the coating unit; and a second cleaning step, washing the first mask in the cleaning unit.

[0008] It may be that the first coating step and the first cleaning step are performed simultaneously, and the second coating step and the second cleaning step are performed simultaneously.

[0009] The coating unit may include: a panel workbench; a mask workbench arranged on the panel workbench; an extruder arranged on one side of the mask workbench; and a resin workbench arranged on the mask workbench.

[0010] The first mask may define a first opening portion that exposes the back surface of the first display panel.

[0011] The first coating step may include: a step of configuring the first mask on the mask workbench; a step of coating resin on one side of the first mask; and a first extrusion step of moving the extruder from the one side of the first mask toward the resin workbench to configure the resin at the first opening.

[0012] It may be that, after the first extrusion step, the covering layer manufacturing method further includes: a residual resin removal step, wherein the extruder moves from the one side of the first mask toward the resin workbench to remove the residual resin arranged on the top of the first mask.

[0013] It may be that, after the first extrusion step, the covering layer manufacturing method further includes: an additional extrusion step of moving the extruder from the resin workbench toward the side toward the first mask, thereby reconfiguring the workbench resin gathered on the resin workbench at the first opening.

[0014] The second mask may define a second opening portion that exposes the back surface of the second display panel.

[0015] The second coating step may include: a step of configuring the second mask on the mask workbench; a step of coating resin on one side of the second mask; and a second extrusion step of moving the extruder from the one side of the second mask toward the resin workbench to configure the resin at the second opening.

[0016] The cleaning unit may include: a molten pool for storing a cleaning solution; and an ultrasonic generator disposed in the molten pool and generating ultrasonic waves inside the molten pool.

[0017] The first cleaning step may further include: a first immersion step, immersing the second mask in the cleaning liquid; a first ultrasonic cleaning step, cleaning the second mask by the ultrasonic wave; and a first liquid removal step, removing the second mask from the cleaning liquid.

[0018] The second cleaning step may further include: a second immersion step of immersing the first mask in the cleaning liquid; a second ultrasonic cleaning step of cleaning the first mask with the ultrasonic wave; and a second liquid removal step of removing the first mask from the cleaning liquid.

[0019] It can be that the cleaning unit also includes: at least one brush, which is arranged inside the molten pool and rotates in a predetermined direction, the first cleaning step also includes the step of washing the second mask by rotating the brush, and the second cleaning step also includes the step of washing the first mask by rotating the brush.

[0020] It may be that, in the first cleaning step, the brush is arranged to be separated from the second mask in the opening portion defined by the second mask, and the second mask is washed by the vortex of the cleaning liquid generated by the rotation of the brush, and in the second cleaning step, the brush is arranged to be separated from the first mask in the opening portion defined by the first mask, and the first mask is washed by the vortex of the cleaning liquid generated by the rotation of the brush.

[0021] It may be that the covering layer manufacturing method according to another embodiment includes: a first coating step, forming a covering layer on the back side of a first display panel using a first mask in a coating unit; a first standby step, before the first coating step, making the second mask used in the coating unit standby in a first standby unit; a first cleaning step, washing the third mask in the cleaning unit; a second standby step, before the first cleaning step, making the fourth mask cleaned in the cleaning unit standby in a second standby unit; and a rotating step, changing the position of the first mask, the position of the second mask, the position of the third mask and the position of the fourth mask by a rotating drive unit.

[0022] It may be that the first coating step and the first cleaning step are performed simultaneously.

[0023] It may be that after the rotating step, the first mask is arranged in the first standby unit, and the third mask is arranged in the second standby unit.

[0024] Alternatively, the method for manufacturing a covering layer further includes: a second coating step of forming a covering layer on the back side of the second display panel using the fourth mask in the coating unit; and a second cleaning step of washing the first mask in the cleaning unit.

[0025] Alternatively, the second coating step and the second cleaning step may be performed simultaneously.

[0026] It may be that according to another embodiment, the covering layer manufacturing device includes: a coating unit, including a panel workbench configured in front of a first display panel and a mask workbench configured on the panel workbench; a cleaning unit, including a molten pool filled with a cleaning liquid and an ultrasonic generator for generating ultrasonic waves in the cleaning liquid; a first mask, configured on the mask workbench; a second mask, configured inside the molten pool; and a rotating drive unit.

[0027] It may be that a covering layer is formed on the back side of the first display panel by the first mask in the coating unit, and while the covering layer is being formed, the second mask is cleaned in the cleaning unit, and the first mask and the second mask define an opening portion internally.

[0028] The covering layer manufacturing apparatus may further include a standby unit configured to store the mask used in the coating unit or the mask cleaned in the cleaning unit.

[0029] The total number of the masks may be the same as the sum of the number of the coating units, the cleaning units, and the standby units.

[0030] Alternatively, the coating unit may further include a resin workbench and an extruder.

[0031] The cover layer may contain a light absorbing substance.

[0032] The bath may include at least one brush, wherein the brush is rotatable to generate a vortex in the cleaning liquid.

[0033] The brush may be spaced apart from a side surface of the mask defining the opening.

[0034] The rotation driving unit may be connected to the first mask and the second mask respectively through connecting parts.

[0035] It is possible that, according to an embodiment of the present invention, while using various masks to coat resin on a display panel, a process of cleaning the mask to be used for the next resin coating is performed, so that various coating steps can be performed continuously in a time series and the mass production of the covering layer manufacturing can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 is a perspective view of a display device according to an embodiment.

[0037] Figure 2 is with Figure 1 Line II' corresponds to a cross-sectional view of a portion of the display device.

[0038] Figure 3a FIG. 1 is a diagram schematically showing a covering layer manufacturing apparatus according to an embodiment.

[0039] Figure 3b is a perspective view of a coating unit according to an embodiment.

[0040] Figure 3c is a perspective view of a cleaning unit according to an embodiment.

[0041] Figure 4a and Figure 4b is a cross-sectional view showing a step of disposing a first mask on a mask stage according to an embodiment.

[0042] Figure 5a to Figure 5c is a perspective view showing a first extrusion step according to an embodiment.

[0043] Figures 6a to 6d is a perspective view illustrating a residual resin removing step according to an embodiment.

[0044] Figure 7a to Figure 7b : is a cross-sectional view showing a process of separating the first mask having finished the first coating step from the coating unit.

[0045] Figures 8a to 8c is a cross-sectional view illustrating a first cleaning step according to an embodiment.

[0046] Figure 9a to Figure 9b FIG. 1 is a diagram schematically showing a rotation step according to an embodiment.

[0047] Fig.10a FIG. 1 is a diagram schematically showing a cover layer manufacturing apparatus including four masks according to an embodiment.

[0048] Fig.10b FIG. 1 is a diagram schematically showing a cover layer manufacturing apparatus including eight masks according to an embodiment.

[0049] (Explanation of Reference Numerals)

[0050] DD: Display device DP: Display panel

[0051] DA: Display Area NDA: Surrounding Area

[0052] IM: Image CL: Overlay

[0053] AU: coating unit MK1, MK2: first mask, second mask

[0054] DR: Rotation drive unit LK: Connection unit

[0055] MS: Mask stage MS_OP: Mask stage opening

[0056] PS: Panel workbench RS: Resin workbench

[0057] SQ: Extruder CU: Cleaning Unit

[0058] BR: brush BT: melting pool

[0059] SL: cleaning liquid VB: ultrasonic generator

[0060] MK_OP1, MK_OP2: first mask opening, second mask opening

[0061] RG: Resin

[0062] RG_1: Filling resin RG_2: Residual resin

[0063] RG_R: Residual resin RG_S: Workbench resin DETAILED DESCRIPTION

[0064] The present invention may be subjected to various changes and may have various forms, and specific embodiments are illustrated in the drawings and described in detail herein. However, it is not intended to limit the present invention to a specific disclosed form, and it should be understood that it includes all changes, equivalents and even substitutes included in the concept and technical scope of the present invention.

[0065] In this specification, when it is mentioned that any constituent element (or region, layer, part, etc.) is "on" other constituent elements, "connected to" or "combined to" other constituent elements, it means that any constituent element can be directly configured / connected / combined to other constituent elements or a third constituent element can be configured between them.

[0066] The same reference numerals refer to the same components. In addition, in the drawings, the thickness, proportion and size of the components are exaggerated for the effective description of the technical content. "And / or" includes all combinations that can be defined by the associated components.

[0067] The terms first, second, etc. may be used to describe various constituent elements, but the constituent elements are not limited by the terms. The terms are only used to distinguish one constituent element from other constituent elements. For example, without departing from the scope of the present invention, the first constituent element may be named as the second constituent element, and similarly, the second constituent element may be named as the first constituent element. Singular expressions include plural expressions unless otherwise expressly indicated in the context.

[0068] In addition, terms such as “below”, “lower side”, “above”, and “upper side” are used to explain the relationship between components shown in the drawings. These terms are relative concepts and are explained based on the directions shown in the drawings.

[0069] The terms "including" or "having" should be understood as being used to specify the existence of the features, numbers, steps, tasks, constituent elements, parts or their combinations recorded in the specification, and do not preclude the existence or additional possibilities of one or more other features or numbers, steps, tasks, constituent elements, parts or their combinations.

[0070] Unless otherwise defined, all terms (including technical terms and scientific terms) used in this specification have the same meanings as those generally understood by those skilled in the art to which the present invention belongs. In addition, terms such as terms defined in commonly used dictionaries should be interpreted as having the same meanings as those in the context of the relevant technology, and should not be interpreted as too idealistic or too formalistic unless explicitly defined herein.

[0071] Hereinafter, a method for manufacturing a covering layer and an apparatus for manufacturing a covering layer according to an embodiment of the present invention will be described with reference to the accompanying drawings.

[0072] Figure 1 is a perspective view of a display device DD according to an embodiment. Figure 2 is with Figure 1 A cross-sectional view of a portion of the display device DD corresponding to line II'.

[0073] The display device DD may be a device activated by an electrical signal. The display device DD may include various embodiments. For example, the display device DD may include a large device such as a television set or an outdoor billboard, or may include a small or medium-sized device such as a mobile phone, a tablet computer, a navigation device, or a game console. On the other hand, the aforementioned embodiments of the display device DD are illustrative and are not limited to any of the above as long as they do not depart from the concept of the present invention.

[0074] In one embodiment, the display device DD may be flexible. "Flexibility" means a property that can be bent, and includes everything from a completely folded structure to a structure that can be bent at a few nanometers level. For example, the flexible display device DD may include a curved display device or a foldable display device. On the other hand, without limitation thereto, the display device DD may be rigid.

[0075] The display device DD may include a display surface that displays an image IM in front. The display device DD may display an image IM in a third direction DR3 through a display surface that is parallel to a surface defined by the first direction DR1 and the second direction DR2. The third direction DR3 may intersect each of the first direction DR1 and the second direction DR2 and be parallel to the normal direction of the display surface. The image IM displayed through the display surface includes a dynamic image, and of course may also include a still image.

[0076] According to an embodiment of the present invention, while using various masks to apply resin to a display panel, a process of cleaning the mask to be used for the next resin coating is performed, so that various coating steps can be performed continuously in a time series and the mass productivity of the substrate can be improved.

[0077] In this embodiment, the front (or top) and back (or bottom) of each structure are defined based on the direction in which the image IM is displayed. The front and back are opposite to each other in the third direction DR3. On the other hand, the directions indicated by the first to third directions DR1, DR2, and DR3 are relative concepts and can be converted into another direction.

[0078] Reference Figure 2 , a display device DD according to an embodiment of the present invention may include a display panel DP and a cover layer CL.

[0079] The display panel DP may be disposed on the cover layer CL. The display panel DP may display an image IM according to an electrical signal. The display panel DP according to an embodiment may be a light-emitting display panel, but is not particularly limited. For example, the display panel DP may be an organic light-emitting display panel, an inorganic light-emitting display panel, or a quantum dot light-emitting display panel.

[0080] The display panel DP according to the present invention may be a panel, comprising: a substrate layer; a circuit element layer, comprising at least one transistor disposed on the substrate layer; a display element layer, comprising a light-emitting element connected to the transistor; and an encapsulation layer, covering the display element layer. In addition, a panel protection layer may also be included disposed under the substrate layer, but is not limited to any one of them.

[0081] The display panel DP may be divided into a display area DA and a peripheral area NDA. The display panel DP may configure pixels (not shown) in the display area DA, and the pixels (not shown) emit light in response to electrical signals, thereby displaying an image IM in the display area DA.

[0082] The peripheral area NDA may be disposed adjacent to the display area DA. For example, the peripheral area NDA may surround the display area DA in a plane. A driving circuit or driving wiring for driving pixels (not shown) disposed in the display area DA may be disposed in the peripheral area NDA.

[0083] The cover layer CL may be disposed on the back of the display panel DP. The cover layer CL may shield light from the direction opposite to the third direction DR3 toward the direction where the cover layer CL is located.

[0084] The cover layer CL according to the present invention may include a resin containing a light absorbing substance. For example, the resin includes a synthetic resin and a filler. The filler may include a light absorbing substance such as carbon fiber or graphite. When the resin includes the filler, the resin may have high thixotropy.

[0085] Thixotropy refers to the phenomenon that a non-fluid gel becomes a fluid sol when stirred or shaken in a static state, and becomes non-fluid when left static.

[0086] As will be described later, according to the present invention, a coating process can be performed using a resin RG containing a large amount of filler and having high thixotropy, so a thick film can be formed. In addition, various masks can be frequently cleaned, which is also advantageous from the perspective of maintenance.

[0087] The display panel DP according to the present invention can shield light from a direction opposite to the third direction DR3 toward a direction where the cover layer CL is located as the cover layer CL is formed on the back side of the display panel DP.

[0088] Below, refer to Figure 3a to Figure 3c The cover layer manufacturing apparatus CMA for forming the cover layer CL will be described.

[0089] Figure 3a FIG. 1 is a diagram schematically showing a cover manufacturing apparatus CMA according to an embodiment. Figure 3b is a perspective view of a coating unit AU according to an embodiment. Figure 3c is a perspective view of a cleaning unit CU according to an embodiment.

[0090] Reference Figure 3a According to an embodiment, the cover layer manufacturing apparatus CMA includes a coating unit AU, a first mask MK1, a rotation driving unit DR, a second mask MK2, and a cleaning unit CU. The rotation driving unit DR may include a connection part LK connected to the corresponding masks MK1 and MK2.

[0091] The coating unit AU is used to form a cover layer CL on the back side of the mother substrate M-DP using a first mask MK1. The mother substrate M-DP can be defined as Figure 2 Detailed description of the state of the display panel DP before being cut.

[0092] The cleaning unit CU is used to clean the second mask MK2 used to form the cover layer CL in the coating unit AU.

[0093] The rotary drive unit DR is used to change the positions of the first mask MK1 and the second mask MK2. For example, the first mask MK1 used in the coating unit AU and the second mask MK2 that completes the cleaning process in the cleaning unit CU can be combined with the connection part LK to change the position. Thus, the second mask MK2 can be configured in the coating unit AU, and the first mask MK1 can be configured in the cleaning unit CU.

[0094] The rotation driving unit DR may further include a motor that can provide power to the connection unit LK. If the connection unit LK uses a robot arm to change the positions of the first mask MK1 and the second mask MK2, it is not limited to any one embodiment.

[0095] Reference Figure 3b The coating unit AU includes a mask workstation MS, a panel workstation PS, an extruder SQ and a resin workstation RS.

[0096] The panel stage PS may have a flat plate shape. The panel stage PS may provide a plate capable of configuring the remaining structures included in the coating unit AU.

[0097] The mask stage MS may be disposed on the panel stage PS. The first mask MK1 may be stably disposed on the mask stage MS, and a mask stage opening MS_OP where the mother substrate M-DP may be disposed may be defined on the mask stage MS.

[0098] If the mother substrate M-DP is inserted into the mask workbench opening MS_OP, the movement of the mother substrate M-DP in the first direction DR1 and the second direction DR2 can be minimized. Therefore, the movement of the mother substrate M-DP can be minimized in the coating process described later. In addition, the first mask MK1 can be arranged on the mask workbench MS. The mask workbench MS can be equivalent to a flat surface so that the first mask MK1 can be arranged on it.

[0099] The first mask MK1 may be used to form Figure 2 The first mask MK1 may define a first mask opening MK_OP1 that is formed by penetrating the first mask MK1.

[0100] exist Figure 3bSix first mask openings MK_OP1 having a 2×3 arrangement are exemplarily shown, but the arrangement of the first mask openings MK_OP1 may be n×m (n and m are natural numbers) and is not limited to any one embodiment.

[0101] The mother substrate M-DP may include display panels corresponding to the number of the first mask openings MK_OP1. Figure 3b The mother substrate M-DP shown can form 6 display panels DP.

[0102] The resin stage RS may be disposed on one side of the mask stage MS. The extruder SQ may be disposed on the first mask MK1. The extruder SQ may be reciprocated along the second direction DR2 on the first mask MK1 by a motor or the like.

[0103] The extruder SQ can fill the resin used when forming the covering layer CL into the first mask opening MK_OP1. For example, the extruder SQ can move the resin applied to one side of the first mask MK1 along the second direction DR2 while gradually filling the resin into the corresponding first mask opening MK_OP1. The resin pushed to the other side of the first mask MK1 along the second direction DR2 can be stored on the resin workbench RS, and the resin stored on the resin workbench RS can be reused by the extruder SQ. The description thereof will be described later. Refer to Figure 3c The cleaning unit CU includes a bath BT, a cleaning liquid SL, an ultrasonic generator VB and a brush BR.

[0104] The cleaning unit CU is used to clean the residual resin left on the mask. The residual resin may be formed when the cover layer CL (refer to Figure 2 ) The resin used in the coating process remains in the mask. Figure 3b For example, the residual resin may remain on at least one of the inner side surface of the first mask MK1 defining the first mask opening MK_OP1, the upper side surface and the lower side surface of the first mask MK1 adjacent to the side surface.

[0105] The molten pool BT may provide an internal space for accommodating the cleaning liquid SL. The molten pool BT may have an open shape on the top so that the mask used in the coating process can be moved in / out. For example, the molten pool BT may include a bottom surface parallel to the first direction DR1 and the second direction DR2 and a side surface extending from the bottom surface to the third direction DR3. The portion opposite to the bottom surface in the third direction DR3 may have an open structure. Thus, the cleaning liquid SL can be accommodated inside the molten pool BT.

[0106] However, this is an example, and the configuration is not limited to any one as long as the first mask MK1 has an open region so that it can be immersed in the cleaning liquid SL and can contain the cleaning liquid SL without the cleaning liquid SL flowing out to the outside.

[0107] The cleaning liquid SL is a cleaning solution that can clean the residual resin left on the mask used in the coating process. The cleaning liquid SL is arranged inside the bath BT, and the mask used in the coating process can be immersed in the cleaning liquid SL. The cleaning liquid SL can be made of a coating layer CL (see Figure 2 ) is composed of a substance that dissolves the resin. For example, the cleaning liquid SL may include any one of NMP (N-Methyl-2-pyrrolidone) and an acidic substance that dissolves organic matter.

[0108] An ultrasonic generator VB and a brush BR may be arranged inside the melting tank BT.

[0109] The ultrasonic generator VB may be disposed on one side of the molten pool BT. The ultrasonic generator VB may be a device that generates ultrasonic waves by vibration. When the ultrasonic generator VB receives power, it transmits vibration to the cleaning liquid SL. The cleaning liquid SL vibrates and exerts an impact on the resin RG remaining in the second mask MK2. Figure 3c The case where the ultrasonic generator VB is disposed on the bottom surface of the molten pool BT is described as an example, but the invention is not limited thereto, and the ultrasonic generator VB may be disposed on the side surface of the molten pool BT.

[0110] The brush BR can be arranged in the molten pool BT and rotate to generate a vortex of the nearby cleaning liquid SL. For example, the brush BR can be a roller-shaped brush. The brush BR can be fixed to the molten pool BT via an axis extending in the third direction DR3, and the rotational movement can be controlled by a separate motor or the like.

[0111] When the brush BR is rotated, the cleaning liquid SL swirls and impacts the resin RG remaining on the mask. The resin RG falls off the mask due to such impact or cracks in the resin RG are cracked, allowing the cleaning liquid SL to penetrate well. Therefore, the resin RG remaining on the mask immersed in the cleaning liquid SL can be effectively cleaned.

[0112] The cleaning unit CU according to the present invention cleans the mask used in the coating process once by ultrasonic waves generated by the ultrasonic generator VB and cleans the mask used in the coating process twice by eddy currents of the cleaning liquid SL generated by the brush BR, so that the mask used in the coating process can be reused.

[0113] According to the present invention, during the coating process performed by the coating unit AU using one mask, a process of cleaning another mask used in the coating process can be performed in the cleaning unit CU. The description related to this will be described later.

[0114] The method for manufacturing a covering layer according to the present invention comprises a first coating step, a first cleaning step, a spinning step, a second coating step and a second cleaning step. The first coating step and the second coating step may be performed in the coating unit AU, and the first cleaning step and the second cleaning step may be performed in the cleaning unit CU.

[0115] According to the present invention, in the cover manufacturing apparatus CMA, the first coating step and the first cleaning step can be performed simultaneously.

[0116] It can be that the first coating step is carried out in the coating unit AU through the first mask MK1 (refer to Figure 3a ) forms a cover layer CL (refer to Figure 2 ), the first cleaning step is to clean the second mask MK2 in the cleaning unit CU (refer to Figure 3a ). Reference Figures 4a to 7b The first coating step is described.

[0117] Figure 4a and Figure 4b 1 is a cross-sectional view showing a step of placing the first mask MK1 on the mask stage MS according to one embodiment. Figure 4a and Figure 4b A procedure for placing the first mask MK1 on the mask stage MS will be described.

[0118] In a state where the mother substrate M-DP is disposed inside the mask stage MS, the first mask MK1 may be placed on the mask stage MS. At this time, the display panel DP (refer to Figure 2 ) and the first mask opening MK_OP1 defined in the first mask MK1. The mother substrate M-DP may be disposed on the panel stage PS with its back side facing the first mask MK1.

[0119] Figure 5a to Figure 5c is a perspective view showing a first extrusion step according to an embodiment.

[0120] Reference Figure 5a The step of applying the resin RG on one side of the first mask MK1 is described below. Figure 5b and Figure 5c The first extrusion step is described.

[0121] Reference Figure 5a The extruder SQ may be disposed on one side of the upper surface of the first mask MK1. The resin RG may be applied on the upper surface of the first mask MK1 and gathered on one side of the first mask MK1 by the extruder SQ.

[0122] The resin workstation RS may be disposed on the other side of the first mask MK1. In the early stage of the first extrusion step, the resin workstation RS may be disposed apart from the first mask MK1 in the second direction DR2 via the first mask opening MK_OP1. The resin workstation RS may provide a space where a portion of the resin RS pushed out by the extruder SQ can stay.

[0123] For example, the resin workbench RS may have a structure in which the surface facing the first mask MK1 and the surface facing the third direction DR3 are open, and the other surfaces are closed. However, this is exemplary, and various structures may be provided if a space for a portion of the resin RS pushed out by the extruder SQ to stay is provided. The inner upper surface IUS of the resin workbench RS may be parallel to the upper surface of the first mask MK1 without a step.

[0124] Reference Figure 5b In the first extrusion step, the resin RG may be pushed in the second direction DR2 by the extruder SQ while being arranged in the corresponding first mask opening MK_OP1.

[0125] The extruder SQ moves from one side of the first mask MK1 toward the resin stage RS, and can sequentially arrange the resin RG in the first mask opening MK_OP1. Figure 5c , if the first extrusion step is performed, the extruder SQ can reach the resin workbench RS. At this time, the resin RG gathered on the resin workbench RS after the first extrusion step can be defined as the workbench resin RG_S in this specification. On the first mask MK1, there is not only the filling resin RG_1 filled in the first mask opening MK_OP1, but also the residual resin RG_2 on the first mask MK1 but not filled in the first mask opening MK_OP1.

[0126] Figures 6a to 6d is a perspective view showing a residual resin removal step according to an embodiment. Figures 6a to 6d Describe the residual resin removal steps.

[0127] Figure 6a is a cross-sectional view showing the filling resin RG_1 and the residual resin RG_2 formed after the first extrusion step.

[0128] When the first mask MK1 is separated from the mother substrate M-DP in the state where the residual resin RG_2 is generated, the residual resin RG_2 formed on the first mask MK1 and the residual resin RG_2 formed on the filling resin RG_1 are separated to generate a cover layer CL (see Figure 2 ) cannot be formed uniformly. Therefore, it is necessary to remove the residual resin RG_2.

[0129] Figure 6b to Figure 6d 3 is a perspective view showing a step of removing the residual resin RG_2 formed on the upper surface of the first mask MK1.

[0130] The removal of the residual resin RG_2 enables the extruder SQ to be reconfigured on one side of the first mask MK1, and the same working state as that of moving the extruder SQ can be repeated in the first extrusion step.

[0131] Therefore, the residual resin RG_2 formed on the first mask MK1 can be pushed in the second direction DR2 by the squeezer SQ while being gathered to the resin stage RS. At this time, the filling resin RG_1 already exists inside the first mask opening MK_OP1 and therefore cannot be removed by the squeezer SQ.

[0132] The residual resin removal step may be repeated a plurality of times until the residual resin RG_2 is removed from the first mask MK1. At this time, the amount of the stage resin RG_S collected on the resin stage RS may increase.

[0133] The table resin RG_S collected on the resin table RS can be used in the subsequent additional extrusion step.

[0134] According to one embodiment, an additional extrusion step may be performed when the filling resin RG_1 is not sufficiently formed in the first extrusion step. The additional extrusion step is a step of moving the extruder SQ from the resin worktable RS to the second direction DR2 toward one side of the first mask MK1. At this time, the worktable resin RG_S gathered on the resin worktable RS can be re-arranged in the first mask opening MK_OP1.

[0135] Figure 7a to Figure 7b 2 is a cross-sectional view showing a process of separating the first mask MK1 , which has finished the first coating step, from the coating unit AU.

[0136] Reference Figure 7a After the filling resin RG_1 is hardened, it can be formed into Figure 2 The covering layer CL described in .

[0137] Reference Figure 7b After the filling resin RG_1 is hardened, the step of separating the first mask MK1 from the mother substrate M-DP may be included.

[0138] When the first mask MK1 is separated from the mother substrate M-DP, residual resin RG_R may be attached to the first mask MK1.

[0139] The residual resin RG_R may adhere to the side surface of the first mask MK1 defining the first mask opening MK_OP1 in the first mask MK1 and the back surface of the first mask MK1 adjacent to the side surface. The residual resin RG_R may be defined as a resin that is partially attached to the first mask MK1 by a bonding force with the first mask MK1.

[0140] If the cover layer CL is formed again through the first mask MK1 to which the residual resin RG_R is attached (refer to Figure 2 ) process, the residual resin RG_R may hinder the coating process. For example, the residual resin RG_R may interfere between the first mask MK1 and the display panel DP. In addition, the residual resin RG_R may fall onto the display panel DP and induce the resin RS (refer to Figure 5b Therefore, a process for cleaning the residual resin RG_R is required.

[0141] Figures 8a to 8c is a cross-sectional view illustrating a first cleaning step according to an embodiment.

[0142] Reference Figure 8a The first impregnation step is described.

[0143] In this specification, the second mask MK2 can be defined as Figures 4a to 7b After the process described above, a mask with residual resin RG_R is attached to the inner side and back of the second mask MK2. Figures 8a to 8c The second mask MK2 described in the above may be formed in the coating unit AU (refer to Figure 3b ) is a mask used in the coating process performed in .

[0144] The second mask MK2 after the coating process has been completed has residual resin RG_R. The second mask MK2 can be rotated by the driving unit DR (refer to Figure 3a ) is arranged on the melting pool BT and can be connected through the connection part LK (refer to Figure 3a ) is moved to the inside of the molten pool BT. Thus, the second mask MK2 can be immersed in the cleaning liquid SL.

[0145] Reference Figure 8b The first ultrasonic cleaning step is described.

[0146] In a state where the second mask MK2 is immersed in the cleaning liquid SL, the second mask MK2 may be cleaned once in the ultrasonic generator VB, and may be cleaned secondarily by the brush BR.

[0147] The cleaning liquid SL may include a substance that dissolves the residual resin RG_R. The cleaning liquid SL may include at least one of NMP (N-Methyl-2-pyrrolidone) and an acidic substance that dissolves organic matter.

[0148] The vibration generated in the ultrasonic generator VB transmits vibration to the cleaning liquid SL. The cleaning liquid SL vibrates and applies impact to the residual resin RG_R existing on the second mask MK2. By such impact, the residual resin RG_R falls off from the second mask MK2, or the gap of the residual resin RG_R is cracked and the cleaning liquid SL can penetrate well. Therefore, the residual resin RG_R can be effectively removed.

[0149] The cleaning unit CU may include at least one brush BR disposed inside the bath BT and rotating in a predetermined direction. The first cleaning step may further include the step of rotating the brush BR to wash the second mask MK2. The brush BR may form a vortex in the cleaning liquid SL as it rotates inside the bath BT.

[0150] In the first cleaning step, the brush BR may be disposed within the second mask opening MK_OP2 defined in the second mask MK2.

[0151] According to an embodiment, the brush BR may be spaced apart from the inner side of the second mask MK2 defining the second mask opening MK_OP2 , so that the residual resin RG_R attached to the second mask MK2 may be effectively removed by the vortex of the cleaning liquid SL formed by the rotation of the brush BR.

[0152] During the cleaning process, when the brush BR is in direct contact with the second mask MK2, the second mask MK2 may be contaminated or deformed. Therefore, it is preferred that the brush BR rotates and moves near the second mask MK2 without directly contacting the second mask MK2. However, depending on the material of the second mask MK2, if the second mask MK2 has sufficient rigidity to the extent that the second mask MK2 does not deform even if the brush BR contacts the second mask MK2, or if the brush BR is soft to the extent that it does not damage the second mask MK2, the brush BR can directly contact the second mask MK2 to clean the surface of the second mask MK2.

[0153] Reference Figure 8c The first liquid discharging step is described.

[0154] The second mask MK2 from which the residual resin RG_R is removed by the cleaning process can be rotated by the driving unit DR (refer to Figure 3a ) is moved to the outside of the bath BT. The second mask MK2 which has completed the cleaning process can be rotated by the driving unit DR (refer to Figure 3a) moves to the coating unit AU and performs a new coating process on a new mother substrate.

[0155] According to the present invention, the first coating step and the first washing step are performed simultaneously. However, in this specification, "simultaneously" means that at least a part of the steps overlap in time, and is not limited to that the respective periods and end periods are completely consistent.

[0156] Figure 9a to Figure 9b FIG. 2 is a diagram schematically showing a rotation step according to an embodiment. Figure 9a and Figure 9b Describe the rotation steps.

[0157] Reference Figure 9a The rotation driving part DR provides the connection part LK with power to rotate, so that the first mask MK1 and the second mask MK2 connected to the connection part LK can rotate.

[0158] When the first coating step in the coating unit AU and the first cleaning step in the cleaning unit CU are all completed, the rotation drive unit DR is operated.

[0159] The first mask MK1 and the second mask MK2 are connected to the connection part LK of the rotation driving part DR. When the rotation driving part DR rotates the connection part LK by power, the first mask MK1 and the second mask MK2 connected to the connection part LK also rotate. By such rotation, the position of the first mask MK1 and the position of the second mask MK2 are changed. Figure 9b If the rotation step is completed, the positions of the first mask MK1 and the second mask MK2 can be changed.

[0160] It can be that, if the rotating step is completed, the second mask MK2 that has completed the cleaning process is configured on the coating unit AU, and the first mask MK1 that has completed the coating process is configured on the cleaning unit CU.

[0161] In the coating unit AU, a second coating step of forming a cover layer CL on the back surface of the second mother substrate M-DP may be performed in the coating unit AU using a second mask MK2.

[0162] In this specification, the "second coating step" may be referred to as Figures 3a to 7b The same process as the first coating step described in the above is performed. Therefore, the coating unit AU (refer to Figure 3b )'s new mother substrate M-DP (refer to Figure 3b ) forms a cover layer CL (refer to Figure 2 ) process.

[0163] A second cleaning step of washing the first mask MK1 may be performed in the cleaning unit CU.

[0164] In this specification, the "second cleaning step" can be performed by Figures 8a to 8c The same process as the first cleaning step described in the above is performed. Therefore, the cleaning can be performed in the cleaning unit CU (refer to Figure 8a )’s first mask MK1 process.

[0165] According to the present invention, the second coating step and the second washing step may be performed simultaneously.

[0166] Therefore, it is possible to provide that the second coating step and the second cleaning step can be performed continuously in time, thereby forming the cover layer CL (refer to Figure 2 ) can improve the process rate, and as the time used in the coating process and the cleaning process alone is reduced, a method for manufacturing a covering layer with reduced process time.

[0167] Fig.10a FIG. 1 is a diagram schematically showing a cover manufacturing apparatus CMA-1 according to an embodiment.

[0168] The capping layer manufacturing apparatus CMA-1 according to an embodiment of the present invention may include a plurality of masks. For example, the total number of masks may be equal to four.

[0169] The cover layer manufacturing apparatus CMA-1 may include a coating unit AU, a first standby unit SU1, a cleaning unit CU, and a second standby unit SU2.

[0170] A first mask MK1 is arranged on the coating unit AU, a second mask MK2 is arranged on the first standby unit SU1, a third mask MK3 is arranged on the second standby unit SU2, and a fourth mask MK4 is arranged on the cleaning unit CU.

[0171] In this embodiment, the first mask MK1 is a mask to be used for the first coating step, the second mask MK2 is a mask for a standby cleaning process after the coating process, the third mask MK3 is a mask for the first cleaning step, and the fourth mask MK4 is defined as a mask for a standby coating process after the cleaning process.

[0172] If the first coating step and the first cleaning step are completed, a rotation step of changing the position of the first mask MK1, the position of the second mask MK2, the position of the third mask MK3, and the position of the fourth mask MK4 by the rotation drive unit DR can be performed. If the rotation step is completed, the third mask MK3 can be arranged in the coating unit AU, the first mask MK1 can be arranged in the first standby unit SU1, the fourth mask MK4 can be arranged in the second standby unit SU2, and the second mask MK2 can be arranged in the cleaning unit CU.

[0173] In the coating unit AU, a second coating step of forming a cover layer CL on the back of the display panel DP using a third mask MK3 can be performed. Therefore, it can be known that when the total number of coating units AU and cleaning units CU is less than the total number of masks, a standby unit can also be included so that the first coating step and the second coating step are performed continuously in time.

[0174] Fig.10b FIG. 1 is a diagram schematically showing a cover layer manufacturing apparatus CMA-2 having eight masks according to an embodiment.

[0175] Reference Fig.10b It can be known that the first coating unit AU1, the first standby unit SU1, the first cleaning unit CU1, the second standby unit SU2, the second coating unit AU2, the third standby unit SU3, the second cleaning unit CU2, and the fourth standby unit SU4 are arranged in a counterclockwise direction.

[0176] The process in each unit is finished and the mask arranged in each unit can be rotated counterclockwise. At this time, the coating unit AU and the cleaning unit CU are arranged alternately, so the mask that has passed the coating step also has to pass the cleaning step, and the mask that has passed the cleaning step also has to pass the coating step. The subsequent steps are substantially the same as the case where the number of masks is 2 or 4, so repeated descriptions are omitted.

[0177] The above description is made with reference to the preferred embodiments of the present invention, but a skilled person in the art or a person with general knowledge in the art will understand that various modifications and changes may be made to the present invention without departing from the concept of the present invention and the technical field as described in the attached claims.

[0178] Therefore, the technical scope of the present invention is not limited by the contents described in the detailed description of the specification but should be determined by the claims.

Claims

1. A method for manufacturing a covering layer, wherein: include: A first coating step, forming a covering layer on the back side of the first display panel using a first mask in a coating unit; a first cleaning step of washing the second mask in a cleaning unit; A rotating step of changing the position of the first mask and the position of the second mask by a rotation driving unit; a second coating step, forming a covering layer on the back side of the second display panel using the second mask in the coating unit; as well as a second cleaning step of washing the first mask in the cleaning unit, The first coating step and the first cleaning step are performed simultaneously, and the second coating step and the second cleaning step are performed simultaneously.

2. The method for manufacturing a covering layer according to claim 1, wherein: The coating unit includes: a panel workbench; a mask workbench, which is arranged on the panel workbench; an extruder, which is arranged on one side of the mask workbench; and a resin workbench, which is arranged on the mask workbench. The first mask defines a first opening portion that exposes the back surface of the first display panel. The first coating step comprises: The step of disposing the first mask on the mask working table; a step of applying a resin on one side of the first mask; and A first extrusion step is performed in which the extruder is moved from the one side of the first mask toward the resin stage to arrange the resin in the first opening.

3. The method for manufacturing a covering layer according to claim 2, wherein: After the first extrusion step, the covering layer manufacturing method further comprises: In the residual resin removing step, the extruder is moved from the one side of the first mask toward the resin stage to remove the residual resin disposed on the upper surface of the first mask.

4. The method for manufacturing a covering layer according to claim 2, wherein: After the first extrusion step, the covering layer manufacturing method further comprises: An additional extrusion step is performed in which the extruder is moved from the resin stage toward the one side of the first mask to reallocate the stage resin collected on the resin stage to the first opening.

5. The method for manufacturing a covering layer according to claim 4, wherein: The second mask defines a second opening portion that exposes the back surface of the second display panel. The second coating step comprises: The step of disposing the second mask on the mask working table; a step of applying a resin on one side of the second mask; and A second extrusion step is performed in which the extruder is moved from the one side of the second mask toward the resin stage to arrange the resin in the second opening.

6. The method for manufacturing a covering layer according to claim 1, wherein: The cleaning unit includes: a molten pool for storing cleaning liquid; and an ultrasonic generator, which is arranged in the molten pool and generates ultrasonic waves inside the molten pool.

7. The method for manufacturing a covering layer according to claim 6, wherein: The first cleaning step also includes: a first immersion step, wherein the second mask is immersed in the cleaning liquid; a first ultrasonic cleaning step of cleaning the second mask with the ultrasonic waves; and In a first liquid discharging step, the second mask is separated from the cleaning liquid. The second cleaning step further comprises: a second immersion step, immersing the first mask in the cleaning solution; a second ultrasonic cleaning step of cleaning the first mask with the ultrasonic wave; and In a second liquid removal step, the first mask is separated from the cleaning liquid.

8. The method for manufacturing a covering layer according to claim 7, wherein: The cleaning unit further comprises: at least one brush, which is arranged inside the molten pool and rotates in a predetermined direction. The first cleaning step further comprises the step of washing the second mask by rotating the brush. The second cleaning step further includes a step in which the brush rotates to wash the first mask.

9. The method for manufacturing a covering layer according to claim 8, wherein: In the first cleaning step, the brush is arranged in an opening defined in the second mask so as to be separated from the second mask, and the second mask is cleaned by a vortex of the cleaning liquid generated by the rotation of the brush. In the second cleaning step, the brush is disposed in an opening defined in the first mask so as to be separated from the first mask, and the first mask is cleaned by a vortex of the cleaning liquid generated by rotation of the brush.

10. A method for manufacturing a covering layer, wherein: include: A first coating step, forming a covering layer on the back side of the first display panel using a first mask in a coating unit; a first standby step of placing the second mask used in the coating unit on standby in a first standby unit before the first coating step; a first cleaning step of washing the third mask in a cleaning unit; a second standby step, before the first cleaning step, allowing the fourth mask cleaned in the cleaning unit to stand by in a second standby unit; as well as a rotating step of changing the position of the first mask, the position of the second mask, the position of the third mask, and the position of the fourth mask by a rotation driving unit, The first coating step and the first cleaning step are performed simultaneously.

11. The method for manufacturing a covering layer according to claim 10, wherein: After the rotating step, the first mask is disposed in the first standby unit, The third mask is disposed in the second standby unit.

12. The method for manufacturing a covering layer according to claim 11, wherein: The covering layer manufacturing method further comprises: a second coating step of forming a covering layer on the back side of the second display panel using the fourth mask in the coating unit; and a second cleaning step of washing the first mask in the cleaning unit, The second coating step and the second cleaning step are performed simultaneously.

13. A covering layer manufacturing device, wherein: include: A coating unit, comprising a panel workbench configured in front of a first display panel and a mask workbench configured on the panel workbench; A cleaning unit, comprising a bath filled with cleaning liquid and an ultrasonic generator for generating ultrasonic waves in the cleaning liquid; A first mask is arranged on the mask workbench; A second mask is disposed inside the molten pool; as well as Rotary drive unit, forming a covering layer on the back side of the first display panel through the first mask in the coating unit, while forming the cover layer, cleaning the second mask in the cleaning unit, The first mask and the second mask define an opening therein.

14. The covering layer manufacturing device according to claim 13, wherein: The cover layer manufacturing apparatus further includes a standby unit configured with the mask used in the coating unit or the mask cleaned in the cleaning unit.

15. The covering layer manufacturing device according to claim 14, wherein: The total number of the masks is the same as the sum of the number of the coating units, the cleaning units, and the standby units.

16. The covering layer manufacturing device according to claim 13, wherein: The coating unit further comprises a resin workbench and an extruder.

17. The covering layer manufacturing device according to claim 13, wherein: The cover layer contains a light absorbing substance.

18. The covering layer manufacturing device according to claim 13, wherein: At least one brush is provided inside the bath, and the brush is rotatable to generate a vortex in the cleaning liquid.

19. The covering layer manufacturing device according to claim 18, wherein: The brush is spaced apart from a side surface of the mask defining the opening.

20. The covering layer manufacturing device according to claim 13, wherein: The rotation driving unit is connected to the first mask and the second mask through connecting parts.

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