Liquid supply arm, chemical mechanical polishing apparatus and equipment

By introducing a positioning mechanism and an automatic calibration mechanism into the liquid supply arm, the problem of unstable landing point of the polishing liquid is solved, and the precise placement of the polishing liquid and the improvement of the surface quality of the workpiece is achieved.

CN119319533BActive Publication Date: 2025-06-13HWATSING TECHNOLOGY CO LTD
View PDF 2 Cites 0 Cited by

Patent Information

Application Number
CN202411873994.8
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-12-19
Publication Date
2025-06-13
Estimated Expiration
2044-12-19

AI Technical Summary

Technical Problem

In semiconductor processing, during the process of chemical mechanical polishing (CMP), the landing point of the polishing liquid is unstable, resulting in uneven chemical and mechanical forces, affecting the stability and consistency of the surface quality of the workpiece.

Method used

A liquid supply arm is designed, including a swing arm, a rotating shaft and a positioning mechanism. The positioning mechanism automatically corrects the position of the swing arm to ensure that the polishing liquid supply arm maintains consistency and accuracy during the delivery process.

Benefits of technology

Through the automatic positioning and calibration mechanism, the polishing liquid is ensured to be accurately placed, which solves the problems of dispersed and inaccurate position of the polishing liquid, and improves the polishing effect of the workpiece.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119319533B_ABST
    Figure CN119319533B_ABST
Patent Text Reader

Abstract

The present application provides a liquid supply arm, a chemical mechanical polishing device and equipment. The liquid supply arm includes a swing arm, which is used to deliver polishing liquid to the polishing pad; a rotating shaft, the swing arm is in contact with the rotating shaft and can rotate relative to the rotating shaft; a positioning mechanism, which is arranged on the swing arm and the rotating shaft, and is used to control the swing arm to reposition to the working position when the swing arm deviates from the working position; the working position is the position of the swing arm relative to the rotating shaft when the swing arm delivers polishing liquid to the polishing pad; a reset assembly, which is connected to the swing arm, and the reset assembly is formed with a contact end; a positioning member, which is arranged between the rotating shaft and the swing arm and connected to the rotating shaft, and the contact end of the reset assembly can slide relative to the positioning member, and the positioning member is provided with a positioning groove, and when the contact end is placed in the positioning groove, the swing arm is placed in the working position, and the reset assembly is used to control the contact end to slide back into the positioning groove when the contact end is separated from the positioning groove. The present application ensures that the position of the polishing liquid supply arm can maintain consistency and accuracy, and ensures that the polishing liquid is accurately delivered and drips accurately at the target position.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] Embodiments of the present application relate to the field of semiconductor processing technologies, and in particular, to a liquid supply arm, a chemical mechanical polishing device, and equipment. Background Art

[0002] In semiconductor processing technologies, chemical mechanical polishing (CMP) is a key process. Among them, the landing point of the polishing liquid has a serious impact on the quality of the polished surface. If the landing point of the polishing liquid is unstable, it will cause the chemical and mechanical forces to be strong and weak during the polishing process, which will make it difficult to ensure the stability and consistency of the surface quality of the workpiece (such as a wafer). Therefore, it is crucial to precisely control the landing point of the polishing liquid.

[0003] Currently, in the related art, the polishing liquid supply arm is prone to causing the dispersion of the dripping position of the polishing liquid under the influence of external environmental changes or machine vibrations, thereby affecting the accuracy of the landing point of the polishing liquid, and further having an adverse impact on the polishing effect of the workpiece. Summary of the Invention

[0004] In view of this, embodiments of the present application provide a liquid supply arm and a chemical mechanical polishing device to at least partially solve the above problems.

[0005] According to a first aspect of embodiments of the present application, a liquid supply arm is provided. The device includes: a swing arm for delivering polishing liquid to a polishing pad; a rotating shaft, the swing arm is in contact connection with the rotating shaft and can rotate relative to the rotating shaft; a positioning mechanism arranged on the swing arm and the rotating shaft for controlling the swing arm to reposition to the working position when the swing arm deviates from the working position; the working position is the position of the swing arm relative to the rotating shaft when the swing arm delivers polishing liquid to the polishing pad; a reset assembly connected to the swing arm, the reset assembly forms a contact end; a positioning member arranged between the rotating shaft and the swing arm and connected to the rotating shaft, the contact end of the reset assembly can slide relative to the positioning member, the positioning member is provided with a positioning groove, when the contact end is placed in the positioning groove, the swing arm is in the working position, and the reset assembly is used for controlling the contact end to slide back into the positioning groove when the contact end disengages from the positioning groove.

[0006] Further, in the above liquid supply arm, the reset assembly includes: a columnar body, an embedding hole is formed in the swing arm, and the columnar body is arranged in the embedding hole; an elastic member arranged in the embedding hole; a reset body, part of which is placed in the embedding hole, the elastic member is placed between the columnar body and the reset body, the part of the reset body outside the connection hole forms the contact end, and when the contact end disengages from the positioning groove, the elastic member is in a compressed state.

[0007] Further, in the above liquid supply arm, the reset body is a sphere.

[0008] Further, in the above-mentioned liquid supply arm, the reset assembly includes: a columnar body, an embedding hole is formed in the swing arm, the columnar body is arranged in the embedding hole, and a columnar hole is axially formed in the columnar body; a sphere, a part of the sphere is embedded in the columnar hole and can rotate relative to the columnar hole; an elastic member, the elastic member is arranged in the columnar hole and one end abuts against the part of the sphere so that the part of the sphere axially moves under the action of the spring force.

[0009] Further, in the above-mentioned liquid supply arm, a columnar hole is axially formed in the columnar body, and the elastic member is arranged in the columnar hole; a part of the sphere is embedded in the columnar hole and can rotate relative to the columnar hole.

[0010] Further, in the above-mentioned liquid supply arm, the reset assembly is a ball head plunger provided with a spring, and the ball head of the ball head plunger is rotatably arranged in the positioning groove.

[0011] Further, in the above-mentioned liquid supply arm, there is one positioning groove; or, there are multiple positioning grooves and they are distributed along the circumferential direction of the positioning member.

[0012] Further, in the above-mentioned liquid supply arm, the swing arm includes: a rotating body rotatably arranged on the rotating shaft, and the reset assembly is arranged on the rotating body; a flange connected to one side of the rotating body facing the positioning member and in slidable contact connection with the positioning member; a cantilever, one end of which is connected to the rotating body and the other end is a free end.

[0013] Further, in the above-mentioned liquid supply arm, a damping area and a non-damping area are formed along the circumferential direction on the surface of the positioning member for contacting the flange; when the flange is in contact connection with the damping area, a damping connection is formed between the positioning member and the flange; when the flange is in contact connection with the non-damping area, a non-damping connection is formed between the positioning member and the flange.

[0014] Further, in the above-mentioned liquid supply arm, a groove and a first boss are formed on the surface of the positioning member for contacting the flange; a second boss is formed on the surface of the flange for contacting the positioning member; when the second boss is in contact connection with the groove, a non-damping connection is formed between the positioning member and the flange; when the second boss is in contact connection with the first boss, a damping connection is formed between the positioning member and the flange.

[0015] Further, in the above-mentioned liquid supply arm, the groove is an arc-shaped groove coaxial with the positioning member, and the first boss is an arc-shaped platform coaxial with the positioning member; the second boss is an arc-shaped platform coaxial with the flange, and the second boss is adapted to the arc-shaped groove and the first boss in shape.

[0016] Further, in the above-mentioned liquid supply arm, the positioning groove is disposed on one side of the groove and / or the first boss away from the axis of the positioning member.

[0017] Further, in the above-mentioned liquid supply arm, the circumferential length of the groove is greater than the circumferential length of the first boss.

[0018] Further, in the above-mentioned liquid supply arm, the swing arm further includes: an adjusting piece, which is disposed between the rotating body and the flange and is connected to the rotating body through a tightening screw, and is used to adjust the damping force between the flange and the positioning member.

[0019] Further, in the above-mentioned liquid supply arm, it further includes: a base, which is provided with a base hole, the rotating shaft is rotatably disposed in the base hole, and a locking hole communicating with the base hole is provided on the side wall of the base; an arc nut, which is disposed in the base hole and is attached to the rotating shaft along the circumferential direction of the rotating shaft, and a connection hole is provided on the surface of the arc nut facing the base; a locking member, which passes through the locking hole and is connected to the connection hole to lock the rotating shaft and the base.

[0020] Further, in the above-mentioned liquid supply arm, an arc boss is formed on the surface of the arc nut close to the base. Correspondingly, an arc groove is provided on the side wall of the base hole, and the arc boss is embedded in the arc groove.

[0021] Further, in the above-mentioned liquid supply arm, a grid structure is formed on the outer side surface of the arc nut facing the base to increase the friction force between the arc nut and the side wall of the base hole.

[0022] Further, in the above-mentioned liquid supply arm, a notch is provided on the inner side surface of the arc nut facing the rotating shaft, and is used for the arc nut to deform when being tightly connected to increase the friction force between the arc nut and the rotating shaft.

[0023] Further, in the above-mentioned liquid supply arm, there is one connection hole; or, the connection holes are multiple and are arranged along the radian direction of the arc nut; correspondingly, the base is provided with multiple locking holes corresponding to the connection holes one by one.

[0024] Further, in the above-mentioned liquid supply arm, there is one arc nut; or, there are multiple arc nuts and they are evenly distributed along the circumferential direction of the rotating shaft; correspondingly, the base is provided with locking holes corresponding to each of the arc nuts.

[0025] According to the second aspect of the embodiments of the present application, a chemical mechanical polishing device is provided, including a polishing head, a loading table, a polishing pad disposed on the loading table, and any one of the above-mentioned liquid supply arms.

[0026] According to a third aspect of the embodiments of the present application, there is provided an apparatus for wafer processing, which includes the chemical mechanical polishing device described in the foregoing aspect.

[0027] In this embodiment, during the process of the swing arm delivering polishing liquid to the polishing pad, if the swing arm deviates from its working position due to factors such as changes in the external environment or vibrations of the machine, the positioning mechanism will automatically correct the swing arm and reposition it to the working position, ensuring that the position of the polishing liquid supply arm can maintain consistency and accuracy throughout the delivery process, ensuring the precise delivery of the polishing liquid and accurately dripping it onto the target position, solving the problem of scattered and inaccurate dripping positions of the polishing liquid caused by the shaking of the supply arm in the related art, and improving the polishing effect of the workpiece.

[0028] It should be understood that the above general description and the following detailed description are only exemplary and explanatory, and cannot limit the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] By describing the exemplary embodiments of the present application in more detail in conjunction with the accompanying drawings, the above and other objects, features, and advantages of the present application will become more obvious. Among them, in the exemplary embodiments of the present application, the same reference numerals generally represent the same components.

[0030] Figure 1 Schematic structural diagram of the liquid supply arm proposed in the embodiment of the present application;

[0031] Figure 2 Another schematic structural diagram of the liquid supply arm proposed in the embodiment of the present application;

[0032] Figure 3 Another schematic structural diagram of the liquid supply arm proposed in the embodiment of the present application;

[0033] Figure 4 Circumferential expansion schematic structural diagram of the reset component in the liquid supply arm proposed in the embodiment of the present application;

[0034] Figure 5 Another schematic structural diagram of the liquid supply arm proposed in the embodiment of the present application;

[0035] Figure 6 Schematic structural diagram of the connection between the flange and the positioning member in the liquid supply arm proposed in the embodiment of the present application;

[0036] Figure 7 Another schematic structural diagram of the connection between the flange and the positioning member in the liquid supply arm proposed in the embodiment of the present application;

[0037] Figure 8 Another schematic structural diagram of the liquid supply arm proposed in the embodiment of the present application;

[0038] Figure 9 The structural schematic diagram of the arc nut in the liquid supply arm proposed in the embodiment of the present application.

[0039] Reference numerals:

[0040] Swing arm 100; Embedding hole 110; Rotating body 120; Flange 130; Second boss 131; Cantilever 140; Adjusting piece 150; Tightening screw 160; Positioning pin 170; Rotating shaft 200; Positioning mechanism 300; Reset assembly 310; Columnar body 311; Elastic member 312; Reset body 313; Positioning member 320; Positioning groove 321; Groove 322; First boss 323; Base 400; Base hole 410; Locking hole 420; Locking member 430; Arc nut 440; Connecting hole 441; Arc boss 442; Grid structure 443; Notch 444; Nozzle seat 500; Nozzle 510; Polishing liquid supply pipe 600; Protective cover 700; Locking mechanism 800; Sleeve 900. Detailed implementation manners

[0041] The preferred embodiments of the present application will be described in more detail below with reference to the accompanying drawings. Although the preferred embodiments of the present application are shown in the drawings, it should be understood that the present application can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided to make the present application more thorough and complete, and to fully convey the scope of the present application to those skilled in the art.

[0042] The terms used in the present application are only for the purpose of describing specific embodiments and are not intended to limit the present application. The singular forms "a", "the" and "said" used in the present application and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term "and / or" used herein refers to and includes any or all possible combinations of one or more of the associated listed items.

[0043] It should be understood that although the terms "first", "second", "third", etc. may be used in the present application to describe various components, these components should not be limited to these terms. These terms are only used to distinguish components of the same type from each other. For example, without departing from the scope of the present application, the first component may also be referred to as the second component, and similarly, the second component may also be referred to as the first component. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of such features. In the description of the present application, "a plurality" means two or more unless otherwise specifically defined.

[0044] In the description of the present application, it should be understood that the orientation or positional relationship indicated by the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present application.

[0045] Unless otherwise clearly specified and defined, the terms "installed", "connected", "connected", "fixed", etc. should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific circumstances.

[0046] When polishing a workpiece, the workpiece is usually fixed on the polishing head of a polishing machine so that the workpiece maintains the correct position and pressure during the polishing process. The liquid supply arm will deliver the polishing liquid to the rotating polishing pad. As the polishing head moves, the workpiece contacts the polishing pad and is ground and polished under the combined action of the polishing liquid and the abrasive. However, in the related art, when the polishing liquid supply arm is affected by external environmental changes or machine vibrations, it is easy to cause the dispersion of the dripping position of the polishing liquid, thereby affecting the accuracy of the landing point of the polishing liquid, and further having an adverse impact on the polishing effect of the workpiece.

[0047] In view of the above problems, the embodiment of the present application provides a liquid supply arm to solve the problem of the dispersion of the dripping points of the polishing liquid.

[0048] The technical solutions of the embodiments of the present application will be described in detail below with reference to the drawings.

[0049] See Figures 1 to 3 、 Figure 8 , according to an embodiment of the present application, the liquid supply arm includes: a swing arm 100, a rotating shaft 200, and a positioning mechanism 300. Among them, the swing arm 100 is used to deliver the polishing liquid to the polishing pad, and the swing arm 100 is in contact connection with the rotating shaft 200 and can rotate relative to the rotating shaft 200. The positioning mechanism 300 is arranged on the swing arm 100 and the rotating shaft 200 and is used to control the swing arm 100 to reposition to the working position when the swing arm 100 deviates from the working position. Among them, the working position is the position of the swing arm 100 relative to the rotating shaft 200 when the swing arm 100 delivers the polishing liquid to the polishing pad.

[0050] It can be understood that in some embodiments, the liquid supply arm may further include a base 400, a nozzle seat 500, a polishing liquid supply pipe 600, a protective cover 700, a locking mechanism 800, a sleeve 900, etc. Among them, the base 400 is provided with a base hole 410, and the rotating shaft 200 is rotatably arranged in the base hole 410. A locking hole 420 penetrating the base 400 is provided on the side wall of the base hole 410 corresponding to the rotating shaft 200. The locking hole 420 is communicated with the base hole 410, and a locking member 430 is inserted through the locking hole 420 to lock the rotating shaft 200 and the base 400. When the locking member 430 is in the locked state, the rotating shaft 200 cannot rotate relative to the base 400; when the locking member 430 is in the unlocked state, the rotating shaft 200 can rotate relative to the base 400.

[0051] The nozzle seat 500, the polishing liquid supply pipe 600, and the protective cover 700 are all arranged on the swing arm 100. The nozzle seat 500 is installed with a nozzle 510, the polishing liquid supply pipe 600 is communicated with the nozzle 510, and the nozzle 510 is used to convey the polishing liquid in the polishing liquid supply pipe 600 to the polishing pad. The protective cover 700 is adapted to the shape of the swing arm 100 and covers the upper part of the swing arm 100 (relative to Figure 1 the state shown). In a specific implementation, the rotating shaft 200 is an annular body, and the polishing liquid supply pipe 600 is inserted through the annular body and extends into the swing arm 100 to communicate with the nozzle 510 provided on the nozzle seat 500.

[0052] The sleeve 900 is rotatably arranged outside the rotating shaft 200. The locking mechanism 800 is arranged between the swing arm 100 and the sleeve 900. The locking mechanism 800 can fixedly connect the swing arm 100 and the sleeve 900, and the swing arm 100 and the sleeve 900 can integrally rotate relative to the rotating shaft 200 to adjust the position of the swing arm 100. Specifically, the locking mechanism 800 can be a positioning pin, etc. The swing arm 100 and the sleeve 900 are both provided with positioning holes, and the positioning pin passes through the positioning holes on the swing arm 100 and the sleeve 900 to lock the swing arm 100 and the sleeve 900.

[0053] When it is necessary to adjust the position of the swing arm 100, the sleeve 900 can be operated to rotate relative to the rotating shaft 200, and then drive the swing arm 100 to rotate relative to the rotating shaft 200, which is easy to operate.

[0054] The swing arm 100 is in contact connection with the rotating shaft 200 and can rotate relative to the rotating shaft 200. When the swing arm 100 conveys the polishing liquid to the polishing pad at the working position, it does not rotate or swing relative to the rotating shaft 200, but may deviate from the working position when subjected to an external force, that is, the swing arm 100 rotates relative to the rotating shaft 200. At this time, the positioning mechanism 300 in this embodiment can control the swing arm 100 to re-position and return to the working position.

[0055] In this embodiment, the locking member 430 is placed in an unlocked state. At this time, the rotating shaft 200 can drive the swing arm 100 to rotate relative to the base 400, thereby adjusting the position of the swing arm 100. After the swing arm 100 is adjusted to the preset position, the locking member 430 is locked. At this time, the rotating shaft 200 is fixed relative to the base 400.

[0056] When the swing arm 100 delivers polishing liquid to the polishing pad, the position of the swing arm 100 relative to the rotating shaft 200 remains unchanged. At this time, the position of the swing arm 100 relative to the rotating shaft 200 is the working position of the swing arm 100.

[0057] In this embodiment, during the process of the swing arm 100 conveying polishing liquid to the polishing pad, if the swing arm 100 deviates from its working position due to factors such as changes in the external environment or vibration of the machine, the positioning mechanism 300 will automatically correct the swing arm 100 and reposition it to the working position, thereby ensuring that the position of the polishing liquid supply arm can maintain consistency and accuracy throughout the entire conveying process, ensuring the precise delivery of the polishing liquid and accurately dripping it at the target position, solving the problem of scattered and inaccurate polishing liquid dripping position caused by the shaking of the supply arm in related technologies, and improving the polishing effect of the workpiece.

[0058] In some embodiments, see Figure 2 and Figure 4 The positioning mechanism 300 includes: a reset assembly 310 and a positioning member 320. The reset assembly 310 is connected to the swing arm 100, and the reset assembly 310 can rotate with the swing arm 100. The reset assembly 310 is formed with a contact end. The positioning member 320 is arranged between the rotating shaft 200 and the swing arm 100 and is connected to the rotating shaft 200. The positioning member 320 can rotate with the rotating shaft 200. The contact end of the reset assembly 310 can slide relative to the positioning member 320. The positioning member 320 is provided with a positioning groove 321. When the contact end of the reset assembly 310 is placed in the positioning groove 321, the swing arm 100 is placed in the working position. When the contact end of the reset assembly 310 is out of the positioning groove 321, the reset assembly 310 can control the contact end to slide back into the positioning groove 321.

[0059] In this embodiment, the swing arm 100 is positioned by the positioning groove 321. When the contact end of the reset component 310 is in the positioning groove 321, the swing arm 100 is in the working position. At this time, the swing arm 100 delivers polishing liquid to the polishing pad. When the contact end of the swing arm 100 is separated from the positioning groove 321 due to factors such as machine vibration, the swing arm 100 will swing near its working position. At this time, the reset component 310 can guide the contact end to slide back into the positioning groove 321. Through this reset process, the swing arm 100 can return to its correct working position, ensuring the accurate supply of polishing liquid and the normal polishing of the workpiece.

[0060] In some embodiments, see Figure 4, the reset component 310 includes: a columnar body 311, an elastic member 312, and a reset body 313. Among them, the swing arm 100 is provided with an embedding hole 110. The columnar body 311 and the elastic member 312 are both arranged in the embedding hole 110. A part of the reset body 313 is placed in the embedding hole 110. The elastic member 312 is placed between the columnar body 311 and the reset body 313. A contact end is formed on the part of the reset body 313 placed outside the embedding hole 110. The contact end is slidably arranged in the positioning groove 321. When the contact end disengages from the positioning groove 321, the elastic member 312 is in a compressed state. When the contact end is placed in the positioning groove 321, the elastic member 312 can be in a compressed state or in a free state (the elastic member 312 is in a state of not being stressed, maintaining its original length and shape).

[0061] In specific implementation, the elastic member 312 can be a spring, an elastic sheet, etc. One end of the elastic member 312 can be connected to the columnar body 311 or not. The other end of the elastic member 312 is connected to the reset body 313 or not. The cross-sectional shape of the columnar body 311 can be circular, elliptical, etc. This embodiment does not make any limitation on the cross-sectional shape of the columnar body. The shape of the positioning groove 321 can be adapted to the shape of the contact end or can be a relatively common shape such as a V-shaped groove.

[0062] In order to reduce the friction force with the positioning member 320 and avoid damaging the positioning member 320, in specific implementation, the contact end of the reset body 313 can have a smooth surface, such as an arc surface, a spherical surface, etc.

[0063] In this embodiment, when the reset body 313 disengages from the positioning groove 321 and swings near the positioning groove 321 due to reasons such as the vibration of the machine table, since the elastic member 312 is in a compressed state at this time, when it swings to the position of the positioning groove 321, the resilience of the elastic member 312 can bounce the reset body 313 back into the positioning groove 321, so that the swing arm 100 can be quickly reset to the working position.

[0064] Furthermore, in some embodiments, the reset body 313 is a sphere. The reset body 313 rolls on the surface of the positioning member 320 to reduce the friction force with the positioning member 320 and avoid damaging the positioning member 320 during the sliding process.

[0065] In some embodiments, refer to Figure 4 , the reset component 310 includes: a columnar body 311, an elastic member 312, and a sphere; among them, the swing arm 100 is provided with an embedding hole 110. The columnar body 311 is arranged in the embedding hole 110. The columnar body is axially provided with a columnar hole. The elastic member 312 is arranged in the columnar hole. A part of the sphere is embedded in the columnar hole and can rotate relative to the columnar hole; one end of the elastic member 312 abuts against the part of the sphere so that the part of the sphere can axially move under the action of the spring force. The elastic member 312 is not connected to the sphere.

[0066] In this embodiment, the reset member 313 is a sphere, and thus a rolling connection is formed with the positioning member 320 to further reduce the frictional force between the reset member and the positioning member 320.

[0067] In some embodiments, the reset assembly 310 may be a ball plunger provided with a spring. The ball of the ball plunger is rotatably disposed in the positioning groove 321. When the ball disengages from the positioning groove 321, the ball can be resiliently popped back into the positioning groove 321 by the resilience of the spring, thereby completing the reset action of the swing arm 100.

[0068] In some embodiments, there is one positioning groove 321, that is, the swing arm 100 has only one fixed working position. This enables the swing arm 100 to not need to switch between multiple positions, but rather always remain in the same working position. This design of a single working position not only reduces mechanical complexity but also improves the stability of the system and the reliability of operation.

[0069] In other embodiments, there are multiple positioning grooves 321 (for example, two or more) and they are distributed along the circumferential direction of the positioning member 320.

[0070] For example, Figure 6 and Figure 7 the positioning member 320 shown in has three positioning grooves 321. When the swing arm 100 drives the reset assembly 310 to rotate so that the contact end enters the positioning groove 321, the polishing liquid supply arm is in the working position at this time.

[0071] In this embodiment, the swing arm 100 can be switched between multiple preset working positions according to different working requirements, increasing the flexibility of the system to meet the polishing requirements of workpieces of different sizes or shapes. In addition, the uniformly distributed positioning grooves 321 ensure the stability of the swing arm 100 in each working position, further improving the precision and efficiency of the polishing process.

[0072] It can be understood that referring to Figure 3 and Figure 5 in some embodiments, the swing arm 100 may further include: a rotating body 120, a flange 130, and a cantilever 140. Among them, the rotating body 120 can rotate relative to the rotating shaft 200, the reset assembly 310 is disposed on the rotating body 120, the flange 130 is connected to the side of the rotating body 120 facing the positioning member and can rotate synchronously with the rotating body 120. The flange 130 is in slidable contact connection with the positioning member 320, and the rotating body 120 can drive the flange 130 to rotate relative to the positioning member 320. One end of the cantilever 140 is connected to the rotating body 120, and the other end of the cantilever 140 is a free end. The rotating body 120 can drive the cantilever 140 to rotate relative to the rotating shaft 200, and the nozzle seat 500, the polishing liquid supply pipe 600, and the cover 700 are all disposed on the cantilever 140.

[0073] In a specific implementation, the reset component 310 can be disposed outside the flange 130. The flange 130 can be a wear-resistant flange made of wear-resistant materials, such as carbon steel, stainless steel, ductile iron, gray iron, etc.

[0074] In some embodiments, the surface of the positioning member 320 that contacts the flange 130 is formed with a damping area and a non-damping area in the circumferential direction. When the flange 130 is in contact connection with the damping area, a damping connection is formed between the positioning member 320 and the flange 130; when the flange 130 is in contact connection with the non-damping area, a non-damping connection is formed between the positioning member 320 and the flange 130. When a non-damping connection is formed between the positioning member 320 and the flange 130, the contact end of the reset component 310 is placed in the positioning groove 321.

[0075] It should be noted that in this embodiment, the damping area and the non-damping area refer to different areas of the surface of the positioning member 320 that contacts the flange 130, and they have different functions.

[0076] When the flange 130 contacts the damping area of the positioning member 320, a damping connection will be formed between the two. This connection has a certain frictional force or resistance between the flange 130 and the positioning member 320 to slow down or control the movement of the flange 130, preventing the flange 130 from accidentally moving due to vibration or other external forces during operation. The damping connection helps to maintain the stable position of the flange 130.

[0077] Relative to the damping area, the non-damping area is another area on the positioning member 320. When the flange 130 contacts the non-damping area, the non-damping connection formed between them. The non-damping connection can have no frictional force at all, for example, when the non-damping area is set as a hollow structure, there is no frictional force at all; it can also have a relatively small frictional force, for example, when the non-damping area is set as a relatively smooth surface area. The non-damping area in this embodiment is an area used to reduce the frictional force between the flange 130 and the positioning member 320, so that the flange 130 can rotate freely within a certain range and can be reset smoothly after being subjected to external forces.

[0078] In a specific implementation, both the positioning member 320 and the flange 130 can be annular bodies, and the diameter of the positioning member 320 can be larger than the diameter of the flange 130. The flange 130 is in contact connection with the annular area of the positioning member 320 close to the axis, and the positioning groove 321 is disposed in the area of the positioning member 320 away from the axis and close to the edge.

[0079] When the polishing liquid supply arm is in the working position, the flange 130 is in contact connection with the non-damping area of the positioning member 320. At this time, the swing arm 100 is fixed in position. When the swing arm 100 moves left and right near the positioning groove 321 due to factors such as machine vibration, under the action of the reset assembly 310, the contact end can automatically rebound into the positioning groove 321, that is, the swing arm 100 can automatically rebound to the working position, ensuring that the landing point of the polishing liquid will not shift. The setting of the non-damping area contact enables the swing arm 100 to be smoothly reset.

[0080] When the staff repairs or maintains the swing arm 100, the staff can push the swing arm 100 to swing into the damping area, and the flange 130 is in contact connection with the damping area of the positioning member 320. At this time, due to the existence of the damping force, the swing arm 100 can stay at any position that does not affect the operator, avoiding the free swing of the polishing liquid supply arm and affecting the normal operation of the operator.

[0081] Further, referring to Figure 6 and Figure 7 , in some embodiments, the surface of the positioning member 320 for contact connection with the flange 130 is formed with a groove 322 and a first boss 323; the surface of the flange 130 for contact connection with the positioning member 320 is formed with a second boss 131. When the second boss 131 is in contact connection with the groove 322, a non-damping connection is formed between the positioning member 320 and the flange 130, as shown in Figure 6 ; when the second boss 131 is in contact connection with the first boss 323, a damping connection is formed between the positioning member 320 and the flange 130, as shown in Figure 7 .

[0082] In a specific implementation, the groove 322 can be an arc-shaped groove coaxial with the positioning member 320, and the first boss 323 can be an arc-shaped platform coaxial with the positioning member 320; the second boss 131 can be an arc-shaped platform coaxial with the flange 130, and the second boss 131 is adapted to the shapes of the arc-shaped groove and the first boss 323. The positioning groove 321 is disposed on the side of the groove 322 and / or the first boss 323 away from the axis of the positioning member 320. When the second boss 131 is in contact connection with the groove 322, the contact end of the reset body 313 is placed in the positioning groove 321.

[0083] In specific implementation, the number of the groove 322 and the first boss 323 can be determined according to the actual situation. For example, both can be two and are alternately arranged. Of course, more than two can also be set, and the present embodiment does not make any limitation on this. The number of the second bosses 131 should be adapted to the number of the groove 322 and the first boss 323.

[0084] In this embodiment, the positioning member 320 is formed with the groove 322 and the first boss 323, which are intermittently overlapped with the flange 130 to control the area where the damping force is formed between the flange 130 and the positioning member 320.

[0085] Further, in some embodiments, the circumferential length of the groove 322 is greater than the circumferential length of the first boss 323, so that when the swing arm 100 is working, when the swing arm 100 swings and resets under an external force, the second boss 131 is always within the range of the groove 322 (non-damping contact) and will not swing into the range of the first boss 323 (damping contact), so as to prevent the reset assembly 310 from being blocked from resetting back to the working position due to the existence of the damping force after the second boss 131 reaches the first boss 323.

[0086] See Figure 5 and Figure 8 , in some embodiments, the swing arm 100 further includes: an adjusting piece 150. The adjusting piece 150 is arranged between the rotating body 120 and the flange 130 and is connected to the rotating body 120 through a tightening screw 160, and is used to adjust the damping force between the flange 130 and the positioning member 320.

[0087] When specifically implemented, see Figure 8 , the flange 130 and the adjusting piece 150 can be kept relatively fixed in the radial position with respect to the swing arm 100 through a positioning pin 170, and the swing arm 100 can drive the flange 130 and the adjusting piece 150 to rotate.

[0088] In this embodiment, the positioning member 320 is fixedly connected to the rotating shaft 200, the flange 130 is fixedly connected to the rotating body 120, and the damping force between the flange 130 and the positioning member 320 can be adjusted by adjusting the screwing depth of the tightening screw 160 to move the adjusting piece 150 along the axial direction of the flange 130, so as to adjust the contact pressure between the flange 130 and the positioning member 320, and further change the damping force between the two.

[0089] In some embodiments, see Figure 2 , Figure 3 and Figure 9 , further includes: an arc nut 440. Wherein, the arc nut 440 is arranged in the base hole 410 and is attached to the rotating shaft 200 along the circumferential direction of the rotating shaft 200, and the arc nut 440 is provided with a connection hole 441 facing the surface of the base 400. The locking member 430 passes through the locking hole 420 and is connected to the connection hole 441 on the arc nut 440 to lock the rotating shaft 200 and the base 400.

[0090] In specific implementation, the arc nut 440 can be coaxially arranged with the rotating shaft 200; the locking member 430 can be a screw or the like. In this embodiment, the locking member 430 can pass through the locking hole 420 and be connected to the connection hole 441 on the arc nut 440, so as to realize the locking and unlocking functions of the base 400 and the rotating shaft 200, facilitating multi-angle adjustment of the landing point. Since the arc nut 440 is arc-shaped and the contact with the rotating shaft 200 is surface contact, compared with the point contact in the related art, the friction force is increased in this embodiment, the locking force is large, ensuring that the base 400 and the positioned rotating shaft 200 are firmly fixed, and will not shift to cause inaccurate landing point position, effectively avoiding the misalignment phenomenon of the rotating shaft 200 relative to the base 400 that may occur during the locking process, and further affecting the problem of the landing point.

[0091] In some embodiments, a connection hole 441 is provided on the arc nut 440; correspondingly, a locking hole 420 corresponding to the arc nut 440 is provided on the base 400.

[0092] In other embodiments, a plurality of (for example, two or more) connection holes 441 are provided on each arc nut 440, and the plurality of connection holes 441 are evenly distributed along the radian direction of the arc nut 440; correspondingly, referring to Figure 3 , the base 400 is provided with a plurality of locking holes 420 corresponding one-to-one to the connection holes 441, and the base 400 and the rotating shaft 200 can be locked and fixed through a plurality of locking members 430.

[0093] In this embodiment, the evenly distributed connection holes 441 provide multiple locking points, increasing the connection stability between the arc nut 440 and the base 400, effectively dispersing the stress of the connection points, and reducing the burden on a single connection point. The evenly distributed connection holes 441 also help to balance the load. Especially when the arc nut 440 bears rotational or vibration loads, this connection method can reduce deformation or wear caused by uneven loads. In addition, the plurality of connection holes 441 are also convenient for maintenance and replacement. When a certain connection hole 441 is worn or damaged, it can also be fixed through other connection holes 441 without completely replacing the entire arc nut 440, thereby reducing the maintenance cost and downtime.

[0094] In some embodiments, a plurality of (for example, two or more) arc nuts 440 can also be provided, and the arc nuts 440 are evenly distributed along the circumferential direction of the rotating shaft 200; correspondingly, the base 400 is provided with locking holes 420 corresponding to the arc nuts 440, and the evenly distributed multiple locking points can effectively prevent the rotation of the rotating shaft 200 relative to the base 400, ensuring the position accuracy of the rotating shaft 200 during operation.

[0095] Further, in some embodiments, an arc-shaped boss 442 is formed on the surface of the arc-shaped nut 440 close to the base 400. Correspondingly, an arc-shaped groove is formed in the side wall of the base hole 410, and the arc-shaped boss 442 is embedded in the arc-shaped groove to fix the arc-shaped nut 440.

[0096] In some embodiments, a grid structure 443 is formed on the outer side surface of the arc-shaped nut 440 facing the base 400, that is, the outer side surface of the arc-shaped nut 440 is subjected to grid knurling treatment to further increase the friction force between the arc-shaped nut 440 and the side wall of the base hole 410.

[0097] In some embodiments, a notch 444 is formed on the inner side surface of the arc-shaped nut 440 facing the rotating shaft 200, which is used to deform the arc-shaped nut 440 when it is locked and connected to increase the friction force between the arc-shaped nut 440 and the rotating shaft 200.

[0098] Specifically, the notch 444 can be one or more than one. When there are more than one notch 444, they can be distributed along the arc direction of the arc-shaped nut 440.

[0099] When the locking member 430 (such as a screw) tightens the arc-shaped nut 440, the arc-shaped nut 440 is deformed to better fit the rotating shaft 200, increasing the friction force.

[0100] The embodiment of the present application also provides a chemical mechanical polishing device, which includes a polishing head, a loading table, a polishing pad arranged on the loading table, and any one of the above-mentioned liquid supply arms.

[0101] For the specific implementation process of the liquid supply arm, please refer to the above description, and the present application will not elaborate here.

[0102] The embodiment of the present application also provides a device for wafer processing, which includes the aforementioned chemical mechanical polishing device. For example, the device is a thinning and polishing integrated device for wafer processing, which may include the aforementioned chemical mechanical polishing device and a wafer thinning device. In the processing process, the wafer can first be thinned on the back surface by the thinning device, and then polished on the surface by the chemical mechanical polishing device to remove the surface stress.

[0103] In this embodiment, during the process of the swing arm 100 delivering the polishing liquid to the polishing pad, if the swing arm 100 deviates from its working position due to factors such as external environmental changes or machine vibration, the positioning mechanism 300 will automatically correct the swing arm 100 and reposition it to the working position, ensuring that the position of the polishing liquid supply arm can maintain consistency and accuracy during the entire delivery process, ensuring the precise delivery of the polishing liquid, accurately dropping on the target position, solving the problem of scattered and inaccurate dropping positions of the polishing liquid caused by the shaking of the supply arm in the related art, and improving the polishing effect of the workpiece.

[0104] Obviously, those skilled in the art can make various modifications and variations to this application without departing from the spirit and scope of this application. Thus, if these modifications and variations of this application fall within the scope of the claims of this application and their equivalent technologies, this application is also intended to cover these modifications and variations.

Claims

1. A liquid supply arm, characterized in that: include: A swing arm for delivering polishing liquid to the polishing pad; A rotating shaft, wherein the swing arm is in contact with and connected to the rotating shaft and can rotate relative to the rotating shaft; A positioning mechanism, provided on the swing arm and the rotating shaft, for controlling the swing arm to be repositioned to the working position when the swing arm deviates from the working position during the process of the swing arm conveying the polishing liquid to the polishing pad so as to concentrate the landing points of the polishing liquid on the polishing pad; The working position is the position of the swing arm relative to the rotating shaft when the swing arm delivers polishing liquid to the polishing pad; the positioning mechanism includes: a reset assembly connected to the swing arm and partially embedded in the swing arm, the reset assembly being formed with a contact end exposed from the swing arm; The positioning member is constructed as an annular plate, which is arranged between the rotating shaft and the swing arm and connected to the rotating shaft. The contact end of the reset assembly can slide relative to the positioning member. The positioning member is provided with a positioning groove. When the contact end is placed in the positioning groove, the swing arm is placed in the working position. The reset assembly is used to control the contact end to slide back into the positioning groove when the contact end disengages from the positioning groove.

2. The liquid supply arm according to claim 1, characterized in that: The reset component comprises: A columnar body, wherein the swing arm is provided with an embedding hole, and the columnar body is disposed in the embedding hole; An elastic member, arranged in the embedding hole; The reset body is partially placed in the embedding hole, the elastic member is placed between the columnar body and the reset body, the part of the reset body placed outside the embedding hole is formed with the contact end, and when the contact end is separated from the positioning groove, the elastic member is in a compressed state.

3. The liquid supply arm according to claim 2, characterized in that: The resetting body is a sphere.

4. The liquid supply arm according to claim 1, characterized in that: The reset component comprises: A columnar body, the swing arm is provided with an embedding hole, the columnar body is arranged in the embedding hole, and the columnar body is provided with a columnar hole along the axial direction; A sphere, wherein the sphere is partially embedded in the cylindrical hole and can rotate relative to the cylindrical hole; An elastic member is arranged in the columnar hole and one end of the elastic member abuts against the spherical part so that the spherical part moves axially under the action of the spring force.

5. The liquid supply arm according to claim 1, characterized in that: The reset assembly is a ball plunger provided with a spring, and the ball head of the ball plunger can be rotatably arranged in the positioning groove.

6. The liquid supply arm according to claim 1, characterized in that: There is one positioning groove; or, There are multiple positioning grooves distributed along the circumference of the positioning member.

7. The liquid supply arm according to claim 1, characterized in that: The swing arm comprises: A rotating body, rotatably disposed on the rotating shaft, and the reset assembly is disposed on the rotating body; A flange connected to a side of the rotating body facing the positioning member and slidably contacting and connected with the positioning member; The cantilever has one end connected to the rotating body and the other end is a free end.

8. The liquid supply arm according to claim 7, characterized in that: The surface of the positioning member in contact with the flange is formed with a damping area and a non-damping area along the circumferential direction; When the flange is in contact with the damping area, a damping connection is formed between the positioning member and the flange; When the flange is in contact with the non-damping area, a non-damping connection is formed between the positioning member and the flange.

9. The liquid supply arm according to claim 8, characterized in that: The surface of the positioning member used for contacting and connecting with the flange is formed with a groove and a first boss; A second boss is formed on the surface of the flange used for contacting and connecting with the positioning member; When the second boss is in contact with the groove, a non-damping connection is formed between the positioning member and the flange; When the second boss is in contact with and connected to the first boss, a damping connection is formed between the positioning member and the flange.

10. The liquid supply arm according to claim 9, characterized in that: The groove is an arc-shaped groove coaxial with the positioning member, and the first boss is an arc-shaped boss coaxial with the positioning member; The second boss is an arc-shaped boss coaxial with the flange, and the second boss is matched with the arc-shaped groove and the first boss in shape.

11. The liquid supply arm according to claim 9, characterized in that: The positioning groove is disposed on a side of the groove and / or the first boss away from the axis of the positioning member.

12. The liquid supply arm according to claim 9, characterized in that: The circumferential length of the groove is greater than the circumferential length of the first boss.

13. The liquid supply arm according to claim 7, characterized in that: The swing arm also includes: An adjusting plate is arranged between the rotating body and the flange and connected to the rotating body through a tightening screw, and is used for adjusting the damping force between the flange and the positioning member.

14. The liquid supply arm according to any one of claims 1 to 13, characterized in that: Also includes: A base having a base hole, the rotating shaft being rotatably arranged in the base hole, and a locking hole communicating with the base hole being arranged on a side wall of the base; An arc-shaped nut is arranged in the base hole and is attached to the rotating shaft along the circumference of the rotating shaft, and a connecting hole is opened on the surface of the arc-shaped nut facing the base; A locking member is inserted into the locking hole and connected to the connecting hole to lock the rotating shaft and the base.

15. The liquid supply arm according to claim 14, characterized in that: An arc-shaped boss is formed on the surface of the arc-shaped nut close to the base, and correspondingly, an arc-shaped groove is opened on the side wall of the base hole, and the arc-shaped boss is embedded in the arc-shaped groove.

16. The liquid supply arm according to claim 14, characterized in that: The arc-shaped nut is formed with a grid structure on the outer side facing the base to increase the friction between the arc-shaped nut and the side wall of the base hole.

17. The liquid supply arm according to claim 14, characterized in that: The arc-shaped nut is provided with a cutout on the inner side surface of the rotating shaft, so as to deform the arc-shaped nut during the locking connection to increase the friction between the arc-shaped nut and the rotating shaft.

18. The liquid supply arm according to claim 14, characterized in that: There is one connecting hole; or The connecting holes are multiple and are arranged along the arc direction of the arc nut; accordingly, the base is provided with multiple locking holes corresponding to the connecting holes one by one.

19. The liquid supply arm according to claim 14, characterized in that: There is one arc-shaped nut; or, There are multiple arc-shaped nuts evenly distributed along the circumference of the rotating shaft; accordingly, the base is provided with locking holes corresponding to each of the arc-shaped nuts.

20. A chemical mechanical polishing device, characterized in that: The invention comprises a polishing head, a loading platform, a polishing pad arranged on the loading platform, and a liquid supply arm as claimed in any one of claims 1 to 19.

21. A device for wafer processing, characterized in that: The apparatus comprises the chemical mechanical polishing device as claimed in claim 20.

Citation Information

Patent Citations

  • Polishing solution conveying device

    CN108326748A

  • A turn to centering mechanism for harvester

    CN205971451U