Multi-band multi-light-source hybrid lighting system

Abstract

The invention provides a multi-band multi-light-source hybrid lighting system. The multi-band multi-light-source hybrid lighting system comprises a light source group, a light beam synthesis module and a control system, wherein the light source group comprises a plurality of light sources with different wavelengths; the light beam combining module comprises a light beam shaping mechanism, a light beam combining mechanism and a power balancing mechanism; and the control system is used for adjusting the output power, exposure time and light beam shape parameters of the light source. According to the invention, ultraviolet laser beams with different wavelengths are synthesized, so that wider spectrum coverage and higher energy output are realized; accurate control and real-time monitoring of the combined light beam are realized through the control system, so that the stability and the reliability of the system are improved, and the operation difficulty and the maintenance cost are reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography, and in particular to a multi-band and multi-light source hybrid illumination system. Background Art

[0002] As a crucial part of the semiconductor manufacturing process, the accuracy and efficiency of photolithography directly affect the performance and cost of chips. Traditional photolithography systems mostly use single-band light sources, which are difficult to meet the increasingly complex needs of micro-nano processing. Therefore, it is particularly important to design a multi-band illumination system for photolithography.

[0003] This system integrates light sources of multiple bands to achieve a higher precision and higher efficiency lithography process, providing strong support for the development of the semiconductor industry. Summary of the invention

[0004] The purpose of the present invention is to overcome the shortcomings of the prior art and provide a hybrid lighting system with multiple bands and multiple light sources, which is specifically achieved through the following technical solutions:

[0005] A multi-band multi-light source hybrid lighting system, including a light source group, a beam synthesis module, and a control system:

[0006] The light source group includes a plurality of light sources with different wavelengths;

[0007] The beam synthesis module includes a beam shaping mechanism, a beam combining mechanism and a power balancing mechanism;

[0008] The beam shaping mechanism is used to adjust the shape and divergence angle of the light beam to meet the synthesis requirements;

[0009] The beam combining mechanism is used to combine laser beams of different wavelengths into a coaxial beam;

[0010] The power balancing mechanism is used to perform power balancing on light beams from different light sources during the beam combining process to ensure that the overall power distribution of the combined light beam is uniform;

[0011] The control system is used to adjust the output power, exposure time and beam shape parameters of the light source.

[0012] Optionally or preferably, the light source group includes an ultraviolet light source, a deep ultraviolet light source and an extreme ultraviolet light source.

[0013] Optionally or preferably, the beam shaping mechanism includes an array-type diffraction unit and a phase compensation diffraction unit; the array-type diffraction unit is a plurality of sub-diffraction units arranged in an array; the array-type diffraction unit is used to shape the light beam, wherein each sub-diffraction unit can independently shape the light beam; the phase compensation diffraction unit compensates for the phase difference when constructing the sub-diffraction unit by introducing an additional phase transformation, thereby maintaining the consistency of the beam shaping effect.

[0014] Optionally or preferably, the beam combining mechanism includes a lens group consisting of a fast-axis collimator and a slow-axis collimator and a digital fiber combiner; the fast-axis collimator is used to reduce the divergence angle of the light beam in the fast-axis direction, and the slow-axis collimator is used to further collimate the light beam in the slow-axis direction.

[0015] Optionally or preferably, the digital fiber combiner includes a plurality of fiber combiners, an optical on-off mechanism and an optical packaging protection mechanism.

[0016] Optionally or preferably, the control system also includes a real-time monitoring and feedback function. Through the real-time monitoring and feedback mechanism, deviations and errors in the lithography process can be discovered and corrected in a timely manner to ensure accurate control of the lithography process.

[0017] Optionally or preferably, a protection system is also included; the protection system includes a UV detector, a light shield and an emergency stop button; the UV detector is used to monitor the UV intensity in the environment in real time; the light shield is used for UV protection; the emergency stop button is used to immediately stop the operation of the equipment when an abnormally high UV intensity is detected.

[0018] Based on the above technical solution, a multi-band multi-light source hybrid lighting system provided by the present invention can produce the following technical effects:

[0019] (1) The present invention can achieve wider spectrum coverage and higher energy output by synthesizing ultraviolet laser beams of different wavelengths;

[0020] (2) The present invention realizes precise control and real-time monitoring of the synthetic light beam through the control system, thereby improving the stability and reliability of the system and reducing the difficulty of operation and maintenance cost;

[0021] (3) The present invention adopts an efficient beam combining mechanism and power balancing technology to ensure the energy and quality of the synthesized light beam. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0023] Figure 1 Schematic diagram of the system architecture of the present invention. DETAILED DESCRIPTION

[0024] It should be understood that the specific embodiments described herein are only used to explain the present invention, and are not used to limit the present invention.

[0025] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] Embodiment 1:

[0027] like Figure 1 As shown:

[0028] This embodiment provides a multi-band multi-light source hybrid lighting system, including a light source group, a beam synthesis module, and a control system:

[0029] The light source group includes a plurality of light sources with different wavelengths;

[0030] The beam synthesis module includes a beam shaping mechanism, a beam combining mechanism and a power balancing mechanism;

[0031] The beam shaping mechanism is used to adjust the shape and divergence angle of the light beam to meet the synthesis requirements;

[0032] The beam combining mechanism is used to combine laser beams of different wavelengths into a coaxial beam;

[0033] The power balancing mechanism is used to perform power balancing on light beams from different light sources during the beam combining process to ensure that the overall power distribution of the combined light beam is uniform;

[0034] The control system is used to adjust the output power, exposure time and beam shape parameters of the light source.

[0035] In this embodiment, the light source group includes an ultraviolet light source, a deep ultraviolet light source and an extreme ultraviolet light source. These light sources have the characteristics of high stability, long life and high efficiency to ensure the accuracy and reliability of the photolithography process.

[0036] In this embodiment, the beam shaping mechanism includes an array-type diffraction unit and a phase compensation diffraction unit; the array-type diffraction unit is a plurality of sub-diffraction units arranged in an array; the array-type diffraction unit is used to shape the beam, wherein each sub-diffraction unit can independently shape the beam; the phase compensation diffraction unit compensates for the phase difference when constructing the sub-diffraction unit by introducing an additional phase transformation, thereby maintaining the consistency of the beam shaping effect. Furthermore, during the layout, the position and angle of each diffraction unit are optimized and iterated by the GS algorithm, and the phase distribution of each diffraction unit is adjusted by the required light intensity distribution.

[0037] In this embodiment, the beam combining mechanism includes a lens group consisting of a fast-axis collimator and a slow-axis collimator and a digital fiber combiner; the fast-axis collimator is used to reduce the divergence angle of the light beam in the fast-axis direction, and the slow-axis collimator is used to further collimate the light beam in the slow-axis direction.

[0038] In this embodiment, the digital fiber combiner includes a plurality of fiber combiners, an optical on-off mechanism, and an optical packaging protection mechanism.

[0039] In this embodiment, the control system also includes real-time monitoring and feedback functions. Through the real-time monitoring and feedback mechanism, deviations and errors in the lithography process can be discovered and corrected in a timely manner, thereby ensuring accurate control of the lithography process.

[0040] In this embodiment, a protection system is also included; the protection system includes an ultraviolet light detector, a light shield and an emergency stop button; the ultraviolet light detector is used to monitor the ultraviolet light intensity in the environment in real time; the light shield is used for ultraviolet protection; the emergency stop button is used to immediately stop the operation of the equipment when an abnormally high ultraviolet light intensity is detected.

[0041] The structures, functions and connection forms disclosed in this article can be implemented in other ways. For example, the embodiments described above are only illustrative, and there may be other installation methods, such as multiple components can be combined or integrated into another component; in addition, each functional component in each embodiment of this article can be integrated into one functional component, or each functional component can exist physically separately, or two or more functional components can be integrated into one functional component.

[0042] The above is only a preferred embodiment of the present invention. It should be understood that the present invention is not limited to the form disclosed herein, and should not be regarded as excluding other embodiments, but can be used in various other combinations, modifications and environments, and can be modified within the scope of the concept described herein through the above teachings or the technology or knowledge of the relevant field. The changes and modifications made by those skilled in the art shall not deviate from the spirit and scope of the present invention, and shall be within the scope of protection of the claims attached to the present invention.

Claims

1. A multi-band multi-light source hybrid lighting system, characterized in that: Including light source group, beam synthesis module, control system: The light source group includes a plurality of light sources with different wavelengths; The beam combining module includes a beam shaping mechanism, a beam combining mechanism and a power balancing mechanism; The beam shaping mechanism is used to adjust the shape and divergence angle of the light beam to meet the synthesis requirements; The beam combining mechanism is used to combine laser beams of different wavelengths into a coaxial beam; The power balancing mechanism is used to perform power balancing on light beams from different light sources during the beam combining process to ensure that the overall power distribution of the combined light beam is uniform; The control system is used to adjust the output power, exposure time and beam shape parameters of the light source.

2. The multi-band multi-light source hybrid lighting system according to claim 1, characterized in that: The light source group includes ultraviolet light source, deep ultraviolet light source and extreme ultraviolet light source. These light sources have the characteristics of high stability, long life and high efficiency to ensure the accuracy and reliability of the photolithography process.

3. The multi-band multi-light source hybrid lighting system according to claim 1, characterized in that: The beam shaping mechanism includes an array-type diffraction unit and a phase compensation diffraction unit; the array-type diffraction unit is a plurality of sub-diffraction units arranged in an array; the array-type diffraction unit is used to shape the beam, wherein each sub-diffraction unit can independently shape the beam; the phase compensation diffraction unit compensates for the phase difference when constructing the sub-diffraction unit by introducing an additional phase transformation, thereby maintaining the consistency of the beam shaping effect. Furthermore, during the layout, the position and angle of each diffraction unit are optimized and iterated by the GS algorithm, and the phase distribution of each diffraction unit is adjusted by the required light intensity distribution.

4. The multi-band multi-light source hybrid lighting system according to claim 1, characterized in that: The beam combining mechanism comprises a lens group consisting of a fast axis collimator and a slow axis collimator and a digital fiber combiner; the fast axis collimator is used to reduce the divergence angle of the light beam in the fast axis direction, and the slow axis collimator is used to further collimate the light beam in the slow axis direction.

5. The multi-band multi-light source hybrid lighting system according to claim 4, characterized in that: The digital optical fiber combiner comprises a plurality of optical fiber combiners, an optical on-off mechanism and an optical packaging protection mechanism.

6. The multi-band multi-light source hybrid lighting system according to claim 1, characterized in that: The control system also includes real-time monitoring and feedback functions. Through the real-time monitoring and feedback mechanism, deviations and errors in the lithography process can be discovered and corrected in a timely manner, ensuring accurate control of the lithography process.

7. The multi-band multi-light source hybrid lighting system according to claim 1, characterized in that: It also includes a protection system; the protection system includes an ultraviolet light detector, a light shield and an emergency stop button; the ultraviolet light detector is used to monitor the ultraviolet light intensity in the environment in real time; the light shield is used for ultraviolet protection; the emergency stop button is used to immediately stop the operation of the equipment when an abnormally high ultraviolet light intensity is detected.

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