Exposure equipment, exposure method and device thereof and readable storage medium

By dividing the exposure area into sub-regions and adjusting the light source according to the target light intensity value, and real-time adjustments are made in combination with the sensor, the problem of exposure unevenness of the exposure machine is solved, and the exposure uniformity and product quality are improved.

CN119322431APending Publication Date: 2025-01-17SHENZHEN DEMINGLI OPTOELECTRONICS CO LTD

Patent Information

Application Number
CN202411728532.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-28
Publication Date
2025-01-17

AI Technical Summary

Technical Problem

The existing exposure machines have problems with exposure unevenness in the exposure process of vertical cavity surface emission lasers, resulting in a decrease in product quality and a decrease in yield.

Method used

By dividing the exposure area into multiple sub-regions, the target light intensity value of each sub-region is obtained separately, and the theoretical light intensity value of the light source is calculated based on these values. The control unit is used to control multiple light sources for exposure, combining the light intensity sensor and the distance sensor Perform real-time adjustments to ensure exposure uniformity.

Benefits of technology

A uniform illumination of the exposure area is achieved, and the uniformity of exposure is improved, thereby improving product quality and yield.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119322431A_ABST
    Figure CN119322431A_ABST
Patent Text Reader

Abstract

The invention discloses exposure equipment, an exposure method and device thereof and a readable storage medium, and relates to the technical field of semiconductors, the exposure method is applied to a control unit in the exposure equipment, the exposure equipment further comprises a plurality of light sources, and the control unit is connected with the light sources; the exposure method comprises the following steps: dividing an exposure region into a plurality of sub-regions; respectively acquiring a target light intensity value of each sub-region; calculating a theoretical light intensity value of the light source corresponding to the target light intensity value of each sub-region according to the target light intensity value of each sub-region; and starting the plurality of light sources to expose the exposure area according to the theoretical light intensity values corresponding to the light sources. According to the exposure method, the uniformity of the exposure process can be effectively improved, so that the problem of poor exposure uniformity of an exposure machine is solved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular, to an exposure device and an exposure method, apparatus, and readable storage medium thereof. Background Art

[0002] In the exposure process of vertical cavity surface emitting lasers, the exposure machine plays a vital role. However, the existing exposure machines often have the problem of uneven exposure in practical applications, which will lead to reduced product quality, lower yield rate and limited production efficiency. Therefore, it is necessary to improve and enhance the exposure process of the exposure machine in view of the uniformity problem of the exposure machine. Summary of the invention

[0003] The purpose of the present application is to provide an exposure device and its exposure method, apparatus, and readable storage medium to address the deficiencies in the above-mentioned prior art, which can effectively improve the uniformity of the exposure process, thereby solving the problem of poor exposure uniformity of the exposure machine in the prior art.

[0004] To achieve the above purpose, the embodiments of the present application are implemented as follows:

[0005] In a first aspect of an embodiment of the present application, an exposure method of an exposure device is provided, which is applied to a control unit in the exposure device, wherein the exposure device further comprises: a plurality of light sources, and the control unit is connected to the plurality of light sources; the exposure method comprises:

[0006] Dividing the exposure area into a plurality of sub-areas;

[0007] respectively obtaining a target light intensity value of each of the sub-areas;

[0008] Calculating the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value of the sub-area;

[0009] The plurality of light sources are started to expose the exposure area according to the corresponding theoretical light intensity values.

[0010] As an implementable method, dividing the exposure area into a plurality of sub-areas includes:

[0011] The exposure area is divided into multiple sub-areas according to a grid shape.

[0012] As an implementable method, respectively obtaining the target light intensity value of each sub-area includes:

[0013] The target light intensity value of each sub-area is obtained respectively according to the exposure degree of the exposure area.

[0014] As an implementable method, calculating the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value thereof includes:

[0015] According to the target light intensity value of each sub-area and the position and wavelength of the light source corresponding thereto, the theoretical light intensity value of the light source corresponding thereto is calculated.

[0016] As an implementable embodiment, the exposure device further includes: a plurality of light intensity sensors and a plurality of optical elements, the control unit is connected to the plurality of light intensity sensors and the plurality of optical elements, the plurality of light intensity sensors are arranged one-to-one in the plurality of sub-areas, the plurality of optical elements are arranged one-to-one in the exposure light paths of the plurality of light sources, and after the plurality of light sources are started to expose the exposure area according to the corresponding theoretical light intensity values, the exposure method further includes:

[0017] Start a plurality of the light intensity sensors to obtain actual light intensity values ​​of the corresponding sub-areas;

[0018] If the actual light intensity value is less than the target light intensity value, the optical parameters of the optical element corresponding to the sub-region are adjusted to perform exposure compensation.

[0019] As an implementable method, starting the plurality of light intensity sensors to obtain actual light intensity values ​​of the corresponding sub-areas includes:

[0020] According to a preset cycle, a plurality of light intensity sensors are started to obtain actual light intensity values ​​of the corresponding sub-areas.

[0021] As an implementation method, the exposure device further includes: a distance sensor and a driving unit, the distance sensor is arranged on the mask or the substrate to be exposed, the driving unit is connected to the mask or the substrate to be exposed, and after the plurality of light sources are started to expose the exposure area according to the corresponding theoretical light intensity values, the exposure method further includes:

[0022] Activating the distance sensor to obtain the actual distance between the mask and the substrate to be exposed;

[0023] If the actual spacing is greater than or less than the preset spacing, the driving unit is controlled to drive the substrate to be exposed or the mask to move so that the actual spacing is equal to the preset spacing.

[0024] According to a second aspect of the embodiment of the present application, an exposure device of an exposure device is provided, which is applied to a control unit in the exposure device, wherein the exposure device further comprises: a plurality of light sources, wherein the control unit is connected to the plurality of light sources; and the exposure device comprises:

[0025] A first determination module, used for dividing the exposure area into a plurality of sub-areas;

[0026] An acquisition module, used for respectively acquiring a target light intensity value of each sub-area;

[0027] A second determination module is used to calculate the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value of each sub-area;

[0028] A start module is used to start the multiple light sources to expose the exposure area according to the corresponding theoretical light intensity values.

[0029] According to a third aspect of an embodiment of the present application, an exposure device is provided, comprising: a control unit and a plurality of light sources, wherein the control unit is connected to the plurality of light sources, and the control unit is used to execute an exposure method of the exposure device as described above.

[0030] According to a fourth aspect of an embodiment of the present application, a readable storage medium is provided, wherein the readable storage medium stores a computer program, and when the computer program is executed by a processor, an exposure method of the exposure device as described above is implemented.

[0031] The beneficial effects of the embodiments of the present application include:

[0032] The present application provides an exposure method based on an exposure device including a control unit and multiple light sources connected to the control unit, and applies the exposure method to the control unit of the exposure device. First, by dividing the exposure area into multiple sub-areas, the exposure degree of the multiple sub-areas can be controlled by the zoning. Then, by respectively obtaining the target light intensity value of each sub-area, the actual value of the target light intensity value required for the exposure program of each sub-area can be obtained in advance. Then, based on the target light intensity value of each sub-area obtained in advance, the theoretical light intensity value of at least one light source corresponding to it is calculated. Finally, the control unit controls the multiple light sources separately to meet the different exposure requirements of each sub-area, thereby achieving uniform illumination of the exposure area and improving the uniformity of exposure. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0034] Figure 1 One of the flow charts of the exposure method of the exposure device provided in the embodiment of the present application;

[0035] Figure 2 Flow chart 2 of the exposure method of the exposure device provided in the embodiment of the present application;

[0036] Figure 3 Flow chart three of the exposure method of the exposure device provided in the embodiment of the present application;

[0037] Figure 4 A schematic diagram of the structure of an exposure device of an exposure equipment provided in an embodiment of the present application.

[0038] Icons: 100 - exposure device; 101 - first determination module; 102 - acquisition module; 103 - second determination module; 104 - start module. DETAILED DESCRIPTION

[0039] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments.

[0040] The components of the embodiments of the present application generally described and shown in the drawings herein may be arranged and designed in various configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0041] In addition, the flowchart used in this application shows the operations implemented according to some embodiments of the present application. It should be understood that the operations of the flowchart can be implemented out of order, and the steps without logical context can be reversed in order or implemented simultaneously. In addition, those skilled in the art can add one or more other operations to the flowchart under the guidance of the content of this application, and can also remove one or more operations from the flowchart.

[0042] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0043] Please refer to Figures 1 to 4In the first aspect of the present application, an exposure method of an exposure device is provided, which is applied to a control unit in the exposure device. The exposure device also includes: multiple light sources. The control unit is electrically connected to the multiple light sources to control the working states of the multiple light sources through the control unit. For example, the control unit can control the multiple light sources to perform operations including starting, shutting down, adjusting the light intensity value, etc., thereby correspondingly changing the working states of the multiple light sources.

[0044] Figure 1 This is one of the flow charts of the exposure method of the exposure device provided in the embodiment of the present application. Figure 1 As shown, the exposure method includes:

[0045] S10, dividing the exposure area into a plurality of sub-areas;

[0046] S20, respectively obtaining the target light intensity value of each sub-area;

[0047] S30, calculating the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value thereof;

[0048] S40, starting multiple light sources to expose the exposure area according to their corresponding theoretical light intensity values.

[0049] It should be noted that, firstly, the exposure area can be divided into multiple sub-areas according to actual needs, so as to facilitate more precise zoning control of the exposure degrees of the multiple sub-areas; secondly, the target light intensity value of each sub-area can be obtained in advance through repeated experiments, that is, through repeated experiments, it can be obtained that when the actual value of the target light intensity value of each sub-area is a certain value, the required exposure degree of each sub-area can be achieved; thirdly, according to the target light intensity value of each sub-area obtained in the experiment, the theoretical light intensity value of the light source corresponding to it is calculated. For example, the target light intensity value of a sub-area is 100 lux, and the number of light sources corresponding to it is two. According to the different corresponding relationships between the sub-area and the above two light sources, the theoretical light intensity value of one of the light sources is calculated to be 30 lux, and the theoretical light intensity value of the other light source is 70 lux; finally, the multiple light sources are controlled to start by the control unit, and the exposure area is exposed according to their corresponding theoretical light intensity values.

[0050] Compared with the exposure machine in the prior art, the present application is based on an exposure device including a control unit and multiple light sources connected to the control unit. The exposure method provided in the present application is applied to the control unit of the exposure device. By dividing the exposure area into multiple sub-areas, the exposure degree of the multiple sub-areas can be controlled by the zoning. Then, by respectively obtaining the target light intensity value of each sub-area, the actual value of the target light intensity value required for the exposure program of each sub-area can be obtained in advance. Then, based on the target light intensity value of each sub-area obtained in advance, the theoretical light intensity value of at least one light source corresponding to it is calculated. Finally, the control unit controls the multiple light sources separately to meet the different exposure requirements of each sub-area, thereby achieving uniform illumination of the exposure area and improving the uniformity of exposure.

[0051] As an implementable method, S10, dividing the exposure area into a plurality of sub-areas includes:

[0052] S11, dividing the exposure area into a plurality of sub-areas according to a grid shape.

[0053] It should be noted that when the exposure area is divided into multiple sub-areas, the exposure area can be divided according to a grid shape. For example, the spacing between two adjacent horizontal lines and two adjacent vertical lines in the grid shape is 1 mm, 5 mm, 10 mm, 15 mm or 20 mm, etc. Those skilled in the art should be able to make reasonable selections and designs according to actual conditions, and no specific restrictions are made here. Alternatively, in other embodiments, according to the actual positions of the sub-areas and the exposure requirements, multiple areas with adjacent actual positions and close exposure requirements (within a certain range) can be regarded as one sub-area.

[0054] As an implementable method, S20, obtaining the target light intensity value of each sub-area respectively includes:

[0055] S21. Obtain a target light intensity value for each sub-area according to the exposure degree of the exposure area.

[0056] It should be noted that when obtaining the target light intensity value for each sub-area separately, experimental verification can be carried out in a laboratory environment in advance. For example, based on the common sense and experience of the technology in this field and repeated experiments in the laboratory stage, the target light intensity value for each sub-area can be obtained separately according to the different exposure degrees of the exposure area. Then, these data obtained from the experiment are applied in the actual production process, thereby improving the uniformity of the exposure process in the actual production process and thus improving the yield of the product.

[0057] As an implementable method, S30, calculating the theoretical light intensity value of the light source corresponding to each sub-region according to the target light intensity value thereof, includes:

[0058] S31. Calculate the theoretical light intensity value of the corresponding light source according to the target light intensity value of each sub-region and the position and wavelength of the corresponding light source.

[0059] It should be noted that when calculating the theoretical light intensity value of the corresponding light source based on the target light intensity value of each sub-area, in addition to the target light intensity value of each sub-area obtained in the above step S20 or S21, the actual position and wavelength characteristics of the light source corresponding to each sub-area can also be considered, so as to calculate the theoretical light intensity value of each light source having different corresponding relationships with it. For example, the target light intensity value of a sub-area is 500 lux, and the number of light sources corresponding to it is two, one of which is closer and has a shorter wavelength, so the penetrating power of this light source is stronger during exposure, and its theoretical light intensity value is 150 lux. The other light source is farther and has a longer wavelength, so the penetrating power of this light source is weaker during exposure, and its theoretical light intensity value is 350 lux.

[0060] As an implementable embodiment, the exposure device also includes: multiple light intensity sensors and multiple optical elements, the control unit is electrically connected to the multiple light intensity sensors and the multiple optical elements, the multiple light intensity sensors are arranged in a one-to-one correspondence in the multiple sub-areas, and the actual light intensity values ​​of the corresponding sub-areas can be obtained through the multiple light intensity sensors, and the multiple optical elements are arranged in a one-to-one correspondence in the exposure light paths of the multiple light sources, and the theoretical light intensity values ​​of the corresponding light sources can be compensated respectively by the multiple optical elements.

[0061] Figure 2 This is a second flow chart of an exposure method of an exposure device provided in an embodiment of the present application. Figure 2 As shown, based on the above-mentioned exposure device including a control unit, multiple light sources, multiple light intensity sensors and multiple optical elements, after the above-mentioned step S40, starting the multiple light sources to expose the exposure area according to their corresponding theoretical light intensity values, the exposure method also includes:

[0062] S50, starting multiple light intensity sensors to obtain actual light intensity values ​​of their corresponding sub-areas;

[0063] S60: If the actual light intensity value is less than the target light intensity value, adjust the optical parameters of the optical element corresponding to the sub-region to perform exposure compensation.

[0064] It should be noted that the control unit can be used to control the start-up of multiple light intensity sensors, monitor the actual light intensity value of the sub-area corresponding to each light intensity sensor in real time, and compare the monitoring results (i.e., the actual light intensity value) respectively obtained by the multiple light intensity sensors with the preset light intensity data (i.e., the target light intensity value). When the control unit determines that the actual light intensity value is less than the target light intensity value, the optical parameters of the optical elements (such as lenses, reflectors, etc.) corresponding to the sub-area are adjusted to perform exposure compensation, so that the actual light intensity value is equal to the target light intensity value, thereby achieving the purpose of effectively compensating for the unmet exposure demand of the sub-area caused by changes in the light intensity of multiple light sources during the actual exposure process.

[0065] As an implementable method, S50, starting multiple light intensity sensors to obtain actual light intensity values ​​of their corresponding sub-areas includes:

[0066] S51. According to a preset cycle, a plurality of light intensity sensors are started to obtain actual light intensity values ​​of the corresponding sub-areas.

[0067] It should be noted that in order to effectively save energy and extend the service life of the light intensity sensor, the control unit can control multiple light intensity sensors to start working according to a preset cycle, such as 5min, 10min, 15min, 20min or 30min, without having to keep them turned on all the time, causing energy waste.

[0068] As an implementable embodiment, the exposure device also includes: a distance sensor and a driving unit, the distance sensor is arranged on the mask or the substrate to be exposed, so as to obtain the actual distance between the mask and the substrate to be exposed through the distance sensor, and the driving unit is electrically connected to the mask or the substrate to be exposed, so as to drive the mask or the substrate to be exposed to move through the driving unit, thereby adjusting the actual distance between the mask and the substrate to be exposed.

[0069] Figure 3 Flow chart 3 of the exposure method of the exposure device provided in the embodiment of the present application. Figure 3 As shown, based on the above-mentioned exposure device including a control unit, multiple light sources, a distance sensor and a driving unit, after the above-mentioned step S40, starting the multiple light sources to expose the exposure area according to their corresponding theoretical light intensity values, the exposure method also includes:

[0070] S70, starting the distance sensor to obtain the actual distance between the mask and the substrate to be exposed;

[0071] S80, if the actual spacing is greater than or less than the preset spacing, control the driving unit to drive the substrate to be exposed or the mask to move so that the actual spacing is equal to the preset spacing.

[0072] It should be noted that the distance sensor can be started by controlling the control unit to measure the actual distance between the mask and the substrate to be exposed in real time, and the measurement result (i.e., the actual distance) obtained by the distance sensor is compared with the preset distance data (i.e., the preset distance). When the control unit determines that the actual distance is greater than or less than the preset distance, the driving unit is controlled to move the substrate to be exposed or the mask, so that the actual distance is equal to the preset distance, thereby achieving the purpose of keeping the distance between the mask and the substrate to be exposed constant, thereby reducing uneven exposure caused by changes in the distance.

[0073] For example, when the control unit determines that the actual spacing is greater than the preset spacing, the control unit controls the driving unit to drive the substrate to be exposed or the mask to move so that the two are close to each other; when the control unit determines that the actual spacing is less than the preset spacing, the control unit controls the driving unit to drive the substrate to be exposed or the mask to move so that the two are away from each other. In this way, the stability and reliability of the exposure process can be ensured.

[0074] like Figure 4 As shown, in a second aspect of the present application, an exposure device 100 of an exposure device is provided, which is applied to a control unit in the exposure device, and the exposure device further includes: a plurality of light sources, and the control unit is connected to the plurality of light sources; the exposure device 100 includes:

[0075] A first determination module 101 is used to divide the exposure area into a plurality of sub-areas;

[0076] An acquisition module 102 is used to respectively acquire a target light intensity value of each sub-area;

[0077] A second determination module 103 is used to calculate the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value of the sub-area;

[0078] The start module 104 is used to start multiple light sources to expose the exposure area according to their corresponding theoretical light intensity values.

[0079] The above-mentioned device is used to execute the method provided by the aforementioned embodiment, and its implementation principle and technical effect are similar, which will not be repeated here.

[0080] The above modules may be one or more integrated circuits configured to implement the above methods, such as one or more application specific integrated circuits (ASICs), or one or more microprocessors, or one or more field programmable gate arrays (FPGAs). For another example, when a module is implemented in the form of a processing element scheduling program code, the processing element may be a general-purpose processor, such as a central processing unit (CPU) or other processor that can call program code. For another example, these modules may be integrated together and implemented in the form of a system-on-a-chip (SOC).

[0081] In a third aspect of the present application, an exposure device is provided, the exposure device comprising: a control unit and a plurality of light sources, the control unit being connected to the plurality of light sources, and the control unit being used to execute the exposure method of the exposure device as described above. The specific implementation method and technical effect are similar and will not be repeated here.

[0082] In a fourth aspect of the present application, a readable storage medium is provided, wherein the readable storage medium stores a computer program, and when the computer program is executed by a processor, an exposure method of the exposure device as described above is implemented. The specific implementation method and technical effect are similar and will not be repeated here.

[0083] In the several embodiments provided in the present application, it should be understood that the disclosed devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of the units is only a logical function division. There may be other division methods in actual implementation, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or units, which can be electrical, mechanical or other forms.

[0084] The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0085] In addition, each functional unit in each embodiment of the present application may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of hardware plus software functional units.

[0086] The above-mentioned integrated unit implemented in the form of a software functional unit can be stored in a computer-readable storage medium. The above-mentioned software functional unit is stored in a storage medium, including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) or a processor (English: processor) to perform some steps of the method described in each embodiment of the present application. The aforementioned storage medium includes: a USB flash drive, a mobile hard disk, a read-only memory (English: Read-Only Memory, referred to as: ROM), a random access memory (English: Random Access Memory, referred to as: RAM), a disk or an optical disk, and other media that can store program codes. It should be noted that, in this article, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is any such actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variation thereof are intended to encompass non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0087] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. An exposure method of an exposure device, characterized in that: A control unit applied to the exposure device, wherein the exposure device further comprises: a plurality of light sources, and the control unit is connected to the plurality of light sources; and the exposure method comprises: Dividing the exposure area into a plurality of sub-areas; respectively obtaining a target light intensity value of each of the sub-areas; Calculating the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value of the sub-area; The plurality of light sources are started to expose the exposure area according to the corresponding theoretical light intensity values.

2. The exposure method according to claim 1, characterized in that: The step of dividing the exposure area into a plurality of sub-areas comprises: The exposure area is divided into multiple sub-areas according to a grid shape.

3. The exposure method according to claim 1, characterized in that: The step of respectively obtaining the target light intensity value of each sub-area comprises: The target light intensity value of each sub-area is obtained respectively according to the exposure degree of the exposure area.

4. The exposure method according to claim 1, characterized in that: Calculating the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value thereof comprises: According to the target light intensity value of each sub-area and the position and wavelength of the light source corresponding thereto, the theoretical light intensity value of the light source corresponding thereto is calculated.

5. The exposure method according to claim 1, characterized in that: The exposure device further comprises: a plurality of light intensity sensors and a plurality of optical elements, the control unit is connected to the plurality of light intensity sensors and the plurality of optical elements, the plurality of light intensity sensors are arranged one-to-one in the plurality of sub-areas, the plurality of optical elements are arranged one-to-one in the exposure light paths of the plurality of light sources, after the plurality of light sources are started to expose the exposure area according to the corresponding theoretical light intensity values, the exposure method further comprises: Start a plurality of the light intensity sensors to obtain actual light intensity values ​​of the corresponding sub-areas; If the actual light intensity value is less than the target light intensity value, the optical parameters of the optical element corresponding to the sub-region are adjusted to perform exposure compensation.

6. The exposure method according to claim 5, characterized in that: The step of starting the plurality of light intensity sensors to obtain actual light intensity values ​​of the corresponding sub-areas comprises: According to a preset cycle, a plurality of light intensity sensors are started to obtain actual light intensity values ​​of the corresponding sub-areas.

7. The exposure method according to claim 1, characterized in that: The exposure device further includes: a distance sensor and a driving unit, wherein the distance sensor is disposed on a mask or a substrate to be exposed, and the driving unit is connected to the mask or the substrate to be exposed. After the plurality of light sources are started to expose the exposure area according to the corresponding theoretical light intensity values, the exposure method further includes: Activating the distance sensor to obtain the actual distance between the mask and the substrate to be exposed; If the actual spacing is greater than or less than the preset spacing, the driving unit is controlled to drive the substrate to be exposed or the mask to move so that the actual spacing is equal to the preset spacing.

8. An exposure device of an exposure equipment, characterized in that: A control unit applied to the exposure device, wherein the exposure device further comprises: a plurality of light sources, wherein the control unit is connected to the plurality of light sources; and the exposure device comprises: A first determination module, used for dividing the exposure area into a plurality of sub-areas; An acquisition module, used for respectively acquiring a target light intensity value of each sub-area; A second determination module is used to calculate the theoretical light intensity value of the light source corresponding to each sub-area according to the target light intensity value of each sub-area; A start module is used to start the multiple light sources to expose the exposure area according to the corresponding theoretical light intensity values.

9. An exposure device, characterized in that: The exposure device comprises: a control unit and a plurality of light sources, wherein the control unit is connected to the plurality of light sources, and the control unit is used to execute the exposure method of the exposure device according to any one of claims 1 to 7.

10. A readable storage medium, characterized in that: The readable storage medium stores a computer program, and when the computer program is executed by a processor, the exposure method of the exposure device according to any one of claims 1 to 7 is implemented.

Citation Information

Patent Citations

  • Energy-saving environment-friendly type UVLED exposure machine uniformity automatic detecting method and equipment

    CN103913956A

  • Exposure device

    CN113934114A

  • Break system of hydraulic motor by controlling hydraulic pressure

    KR102061642B1

Cited By

  • Roll-to-roll mask exposure energy balancing method for flexible reinforcement member

    CN122018254A

  • Roll-to-roll mask exposure energy equalization method for flexible reinforcements

    CN122018254B