Impact magnet system and double-bunch separation system

Abstract

The invention relates to an impact magnet system and a double-beam-cluster separation system, the impact magnet system comprises a vacuum chamber and an impact magnet fixed in the vacuum chamber, the impact magnet comprises a magnetic core, a coil and an outer frame, the magnetic core is fixed in the outer frame, the magnetic core is provided with a window, and the coil is arranged in the window; a first end of the coil is connected with a first joint, a second end of the coil is provided with a second joint, and the first joint and the second joint extend out of the outer frame; the vacuum chamber is provided with a vacuum through-wall piece electrode interface, and the first connector and the second connector are electrically connected with the vacuum through-wall piece electrode interface. The vacuum chamber is further provided with a beam outlet and a beam inlet, and the beam inlet, the window and the beam outlet are sequentially communicated.

Description

Technical Field

[0001] The present invention relates to the technical field of beam distribution, and more specifically to an impact magnet system and a double-bunch separation system. Background Art

[0002] As a representative of contemporary advanced light sources, free-electron laser (FEL) devices have shown great potential and value in many fields such as scientific research, material science, biomedicine, and industrial applications. In order to improve the utilization efficiency of FEL devices and expand their application scenarios, researchers continue to explore and innovate, among which the dual-bunch operation mode of linear accelerators is an important technical approach.

[0003] In the dual-bunch operation mode, the linear accelerator can generate two independent electron bunches at the same time, and through a specific beam distribution mechanism, the two bunches are respectively delivered to different undulator lines to achieve multifunctional and efficient laser output. In this process, the impact magnet, as a key component, undertakes the important task of effectively separating the two bunches.

[0004] At present, there have been some successful attempts in the international FEL device double bunch separation. For example, the Swiss free electron laser device used a solution of a shaker-type impact magnet and a solid-state excitation power source to successfully achieve double bunch separation with a time interval of 28ns. However, this solution may have certain limitations for double bunch separation with shorter or longer time intervals, and technical details and cost considerations may also limit its widespread application.

[0005] In this context, the Shanghai Soft X-ray Free Electron Laser Facility Linear Accelerator has put forward more advanced and adaptable requirements. The device works in a double-bunch mode with a double-bunch time interval of 100ns, which poses a higher challenge to the performance of the impact magnet. Summary of the invention

[0006] The object of the present invention is to provide an impact magnet system and a dual-bunch separation system to solve the technical problem that the existing impact magnet cannot achieve dual-bunch separation with a time interval of 100ns.

[0007] Based on the above-mentioned purpose, on one hand, the present invention provides an impact magnet system, including a vacuum chamber and an impact magnet fixed in the vacuum chamber, the impact magnet including a magnetic core, a coil and an outer frame, the magnetic core is fixed in the outer frame, the magnetic core has a window, and the coil is arranged in the window; a first joint is connected to the first end of the coil, and a second joint is provided on the second end of the coil, and the first joint and the second joint extend out of the outer frame; a vacuum through-wall component electrode interface is provided on the vacuum chamber, and the first joint and the second joint are electrically connected to the vacuum through-wall component electrode interface respectively; a beam outlet and a beam inlet are also provided on the vacuum chamber, and the beam inlet, the window and the beam outlet are connected in sequence.

[0008] Furthermore, the vacuum chamber is also provided with an observation window and a vacuum gauge.

[0009] Furthermore, the impact magnet system also includes a supporting mechanism, and the vacuum chamber is arranged on the supporting mechanism; the supporting mechanism is used to support the vacuum chamber and adjust the position of the vacuum chamber.

[0010] Furthermore, an ion pump is provided on the supporting mechanism, and the ion pump is communicated with the interior of the vacuum chamber to evacuate the vacuum chamber.

[0011] Further, the coil includes a first wire, a second wire, a third wire, a first connecting plate and a second connecting plate, the first wire, the second wire and the third wire all extend along the beam transmission direction, the first wire is located on a first side, the second wire and the second wire are located on a second side opposite to the first side, one end of the second wire forms the first end of the coil, one end of the third wire forms the second end of the coil, the first end and the second end are arranged opposite to each other, the other end of the second wire is connected to the first connecting plate, the other end of the third wire is connected to the second connecting plate, and the two ends of the first wire are respectively connected to the first connecting plate and the second connecting plate.

[0012] Furthermore, an insulating plate is provided between the first joint and the second joint.

[0013] Further, the magnetic core includes a first magnetic core, a second magnetic core and a third magnetic core, all of which extend along the beam transmission direction, the first magnetic core and the second magnetic core are arranged at intervals along the beam transmission direction, the third magnetic core is located between the first magnetic core and the second magnetic core, the first magnetic core, the third magnetic core and the second magnetic core have windows that are connected in sequence, and the first joint and the second joint extend from the gap between the first magnetic core and the second magnetic core to outside the window.

[0014] Furthermore, the outer frame includes a first frame, a second frame and a third frame, the first frame, the second frame and the third frame all extend along the beam transmission direction, the first frame is located on the first side, the second frame and the third frame are located on the second side, the first frame is fixedly connected to the second frame and the third frame respectively, the magnetic core is clamped between the first frame and the second frame and the third frame; there is a gap between the second frame and the third frame for the first joint and the second joint to extend out.

[0015] Furthermore, heat dissipation holes are provided on the first wire, the second wire, the third wire, the first connecting plate, the second connecting plate, the first frame, the second frame and the third frame.

[0016] Furthermore, at least one cooling belt is provided on the outer frame, and the cooling belt is connected to the inner wall of the vacuum chamber.

[0017] On the other hand, the present invention provides a dual-bunch separation system, including a controller, a charging power supply, an auxiliary power supply, a trigger, a pulse power source, a timer and the impact magnet system as described above, wherein the controller is electrically connected to the charging power supply, the auxiliary power supply and the pulse power source respectively, the charging power supply is electrically connected to the pulse power source, the auxiliary power supply is electrically connected to the pulse power source, and the pulse power source is electrically connected to the impact magnet system.

[0018] Further, the pulse power source includes a first resistor, a first diode, a second diode, a thyristor, a pulse forming line, a third diode, a second resistor and a capacitor; one end of the charging power source is grounded, the other end of the charging power source is connected to one end of the first resistor, the other end of the first resistor is connected to the positive electrode of the first diode, the cathode of the first diode is respectively connected to the cathode of the second diode, the cathode end of the thyristor, the first end of the pulse forming line, and one end of the capacitor; the anode of the second diode is connected to the anode end of the thyristor, and the other end of the capacitor is respectively connected to the impact magnetic The first terminal of the impact magnet of the iron system is connected to the second end of the pulse forming line, the second terminal of the impact magnet is grounded, the third end of the pulse forming line is grounded, the fourth end of the pulse forming line is connected to the cathode of the third diode, the anode of the third diode is connected to one end of the second resistor, and the other end of the second resistor is grounded; the positive terminal of the trigger is connected to the positive terminal of the trigger input of the thyristor, the negative terminal of the trigger is connected to the negative terminal of the trigger input of the thyristor, the positive terminal of the auxiliary power supply is connected to the positive terminal of the auxiliary power supply of the thyristor, and the negative terminal of the auxiliary power supply is connected to the negative terminal of the auxiliary power supply of the thyristor.

[0019] The single-inductance impact magnet of the present invention can reduce the restriction of the magnet inductance on the front and rear edges of the pulse as much as possible, and based on the energy storage of the pulse forming line PFL, the pulse power supply of the fast-turning on thyristor S1 discharges to generate a pulse current, which can achieve the separation of double bunches with a minimum time interval of 100ns; the pulse current has a flat-top width, so it has good compatibility with the separation of double bunches with a time interval of 100ns-300ns; and by adding a capacitor C in the pulse discharge circuit, the leading edge of the excitation pulse can be further improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A schematic structural diagram of an impact magnet system according to an embodiment of the present invention;

[0021] Figure 2 It is a schematic structural diagram of an impact magnet system according to an embodiment of the present invention after removing the top plate of the vacuum chamber;

[0022] Figure 3 A schematic diagram of the structure of an impact magnet of an impact magnet system according to an embodiment of the present invention;

[0023] Figure 4 It is a schematic structural diagram of an impact magnet system according to an embodiment of the present invention after removing the outer frame;

[0024] Figure 5 A schematic structural diagram of a coil of an impact magnet of an impact magnet system according to an embodiment of the present invention;

[0025] Figure 6 A schematic structural diagram of a magnetic core of an impact magnet of an impact magnet system according to an embodiment of the present invention;

[0026] Figure 7 for Figure 4 A cross-sectional view of

[0027] Figure 8 is a structural block diagram of a dual-bunch separation system according to an embodiment of the present invention;

[0028] Fig. 9 is a circuit diagram of a dual bunch separation system according to an embodiment of the present invention;

[0029] Fig.10 4 is a pulse current simulation waveform diagram according to an embodiment of the present invention. DETAILED DESCRIPTION

[0030] The preferred embodiments of the present invention are given below in conjunction with the accompanying drawings and described in detail.

[0031] like Figure 1 and Figure 2As shown, an embodiment of the present invention provides an impact magnet system 1000, including a vacuum chamber 100 and an impact magnet 200 fixed in the vacuum chamber 100, as shown in FIG. Figure 3 , Figure 4 As shown, the impact magnet 200 includes a magnetic core 210 with a window 211, a coil 220 and an outer frame 230, the magnetic core 210 is located in the outer frame 230 and is fixedly connected to the outer frame 230, the outer frame 230 is fixedly connected to the vacuum chamber 100, the coil 220 is arranged in the window 211 of the magnetic core 210, the first end of the coil 220 is connected to a first joint 221, the second end of the coil 220 is connected to a second joint 222, the first joint 221 and the second joint 222 extend outside the outer frame 230; the vacuum chamber 100 is provided with a vacuum through-wall component electrode interface 110, the first joint 221 and the second joint 222 are respectively electrically connected to the vacuum through-wall component electrode interface 110, so that the first end of the coil 220 is connected to the vacuum through-wall component electrode interface 110. The vacuum chamber 100 is also provided with a beam inlet 120 and a beam outlet 130, and the beam can enter the vacuum chamber 100 from the beam inlet 120, then pass through the magnetic core 210 through the window 211, and leave the vacuum chamber 100 from the beam outlet 130; the vacuum through-wall motor interface 110 is used to be electrically connected to the excitation pulse power source, so as to input pulse power to the coil 220 through the excitation pulse power source, and make the impact magnet 200 generate a pulse magnetic field, thereby changing the trajectory of the beam and making it deviate from the original path, so that when the pulse current is not connected, the beam will be transmitted along the first trajectory (for example, along the central axis of the magnetic core 210), and when the pulse current is connected, the beam will be offset and transmitted along the second trajectory, thereby realizing the separation of the two beams.

[0032] In some embodiments, the vacuum chamber 100 may further be provided with an observation window 140 and a vacuum gauge 150 . The observation window 140 is used to observe the interior of the vacuum chamber 100 , and the vacuum gauge 150 is used to measure the vacuum degree in the vacuum chamber 100 .

[0033] In some embodiments, the impact magnet system 1000 may further include a support mechanism 300, on which the vacuum chamber 100 is disposed, and the support mechanism 300 is used to support the vacuum chamber 100. The support mechanism 300 may also be used to adjust the position of the vacuum chamber 100 so that the beam can pass through the center of the impact magnet 200.

[0034] The support mechanism 300 may also be provided with an ion pump 400 which is in communication with the interior of the vacuum chamber 100 and is used to remove gas molecules in the vacuum chamber 100 so as to maintain the vacuum degree in the vacuum chamber 100 below a preset value (eg, 1E-5 Pascal).

[0035] like Figure 5As shown, in some embodiments, the coil 220 includes a first wire 223, a second wire 224, a third wire 225, a first connecting plate 226 and a second connecting plate 227. The first wire 223, the second wire 224 and the third wire 225 all extend along the beam transmission direction. The first wire 223 is located on the first side, and the second wire 224 and the third wire 225 are located on the second side opposite to the first side. One end of the second wire 224 forms the first end of the coil 220, and one end of the third wire 225 forms the second end of the coil 220. The first end and the second end are arranged oppositely. The other end of the second wire 224 is connected to the first connecting plate 226, and the other end of the third wire 225 is connected to the second connecting plate 227. The two ends of the first wire 223 are connected to the first connecting plate 226 and the second connecting plate 227, respectively, so that the coil 220 can be formed into a ring shape. An insulating plate 228 may be provided between the first joint 221 and the second joint 222, and the insulating plate 228 is used to insulate the first joint 221 and the second joint 222.

[0036] like Figure 6 As shown, in some embodiments, the magnetic core 210 includes a first magnetic core 212, a second magnetic core 213 and a third magnetic core 214. The first magnetic core 212 and the second magnetic core 213 are spaced apart along the beam transmission direction, and there is a gap between them. The third magnetic core 214 is located between the first magnetic core 212 and the second magnetic core 213, and fills part of the gap. The first magnetic core 212, the third magnetic core 214 and the second magnetic core 213 all have windows, and the windows of the three are connected in sequence. The first joint 221 and the second joint 222 can extend from the rest of the gap to the outside of the window 211.

[0037] In some embodiments, the first magnetic core 212 and the second magnetic core 213 may be formed by splicing a plurality of magnets, for example, by splicing two C-shaped magnets.

[0038] like Figure 7As shown, the first wire 223 and the second wire 224 (and the third wire 225) are arranged opposite to each other in the window 211, and the gap between the two is the transmission channel of the beam. The first wire 223, the second wire 224, the third wire 225, the first connecting plate 226 and the second connecting plate 227 can be provided with heat dissipation holes for heat dissipation to prevent the coil 220 from overheating. Exemplarily, the spacing between the first wire 223 and the second wire 224 and the spacing between the first wire 223 and the third wire 225 are both Hap=10mm, the width of the window 211 is Vap=12mm, the first wire 223, the second wire 224 and the third wire 225 are all rectangular copper wires, the width is Vap=12mm, the height is H1=5mm, the length of the first wire 223 along the beam transmission direction (i.e., the direction perpendicular to the paper) is 500mm, the width of the magnetic core 210 is V1=32mm, the height is H2=40mm, and the length is 500mm.

[0039] Continue to refer to Figure 3 The outer frame 230 may include a first frame 231, a second frame 232 and a third frame 233. The first frame 231, the second frame 232 and the third frame 233 all extend along the beam transmission direction. The first frame 231 is located on the first side, the second frame 232 and the third frame 233 are located on the second side opposite to the first side, the second frame 232 and the third frame 233 are spaced apart on the second side, the first frame 231 is fixedly connected to the second frame 232 and the third frame 233 respectively, and the magnetic core 210 is sandwiched between the first frame 231 and the second frame 232 and the third frame 233. There is a gap between the second frame 232 and the third frame 233, and the gap is used for the first joint 221 and the second joint 222 to pass through, so that the first joint 221 and the second joint 222 extend out of the outer frame 230. The first frame 231, the second frame 232 and the third frame 233 may be provided with heat dissipation holes for heat dissipation.

[0040] At least one (eg, two) cooling belts 240 may be provided on the outer frame 230 . The cooling belts 240 are connected to the inner wall of the vacuum chamber 100 and are used to transfer the heat of the outer frame 230 to the vacuum chamber 100 , and dissipate the heat outward from the vacuum chamber 100 .

[0041] The coil 220 is a single turn and uses oxygen-free copper (oxygen content <0.05%), with a cross-sectional area of ​​12*5mm2. The coil 220 is equivalent to an inductive load, and its inductance calculation formula is:

[0042]

[0043] Where L is the inductance, μ0 is the vacuum magnetic permeability, N is the number of coil turns, H ap(eff) Determined by formula (2), D is the effective length of the magnet.

[0044]

[0045] Based on formulas (1) and (2), it can be calculated that the inductance of the coil 220 is L=0.8 μH.

[0046] The excitation current (i.e. pulse current) can be calculated by formula (3):

[0047]

[0048] Where B is the magnetic induction intensity, I is the excitation current, and B can be calculated by formula (4):

[0049]

[0050] Where θ is the deflection angle, E is the particle beam energy, L is the effective length of the magnet, and v is the particle beam velocity. According to formulas (3) and (4), it can be calculated that the magnetic induction intensity B is 200 Gauss and the required excitation current is 191A.

[0051] In an exemplary embodiment, the material of the magnetic core 210 is TN12B nickel-zinc ferrite material.

[0052] The power consumption of the impact magnet mainly consists of two parts, namely, the power consumption caused by the skin effect of the coil 220 under high frequency and the power consumption of the magnetic core. The frequency of the pulse current is 50Hz, and the duty cycle is less than 1E-5, so the resistance power consumption of the coil 220 is very small. The power consumption of the magnetic core is mainly hysteresis loss. The hysteresis loss in the iron core is proportional to the area of ​​the hysteresis loop per unit volume of the magnetic core after one cycle, and this energy is converted into heat energy. The hysteresis loss W per unit volume per cycle can be expressed as:

[0053]

[0054] Where K1 is a constant depending on the material; η is the Steinmetz coefficient. The η of the magnetic core material used in the present invention is 1.6, f is the operating frequency; B m It is the maximum value of magnetic induction intensity on the hysteresis loop. The core volume of the single inductor impact magnet is very small, and the magnetic induction intensity is also very small, so the calculated core loss is also very small.

[0055] like Figure 8As shown, an embodiment of the present invention further provides a dual-bunch separation system, which includes a controller 2000, a charging power supply 3000, an auxiliary power supply 4000, a trigger 5000, a pulse power source 6000, a timer 7000 and the impact magnet system 1000 of the above embodiment, the controller 2000 is electrically connected to the charging power supply 3000, the auxiliary power supply 4000 and the pulse power source 6000 respectively, the charging power supply 3000 is electrically connected to the pulse power source 6000, the auxiliary power supply 4000 is electrically connected to the pulse power source 6000, the timer 7000 is electrically connected to the trigger 5000, the trigger 5000 is electrically connected to the pulse power source 6000, and the pulse power source 6000 is electrically connected to the impact magnet system 1000. The controller 2000 is used to control the charging power supply 3000, the auxiliary power supply 4000 and the pulse power source 6000 and monitor their working conditions. The charging power supply 3000 is used to charge the pulse power source 6000. The auxiliary power supply 4000 is used to power the pulse power source 6000. The timer 7000 is used to send a timing signal to the trigger 5000. The trigger 5000 sends a trigger signal to the pulse power source 6000 according to the received timing signal to control the discharge of the pulse power source 6000 to form a pulse current. The pulse current is input to the coil 220 of the impact magnet 200 of the impact magnet system 1000, so that the impact magnet 200 changes the transmission path of the beam.

[0056] like Fig. 9As shown, in some embodiments, the pulse power source 2000 includes a first resistor R1, a first diode D1, a second diode D2, a thyristor S1, a pulse forming line PFL, a third diode D3, a second resistor R2 and a capacitor C, the thyristor S1 has a trigger input positive terminal, a trigger input negative terminal, an auxiliary heating power supply positive terminal, an auxiliary heating power supply negative terminal, a thyristor anode terminal and a thyristor cathode terminal, one end of the charging power supply 2000 is grounded, the other end of the charging power supply 2000 is connected to one end of the first resistor R1, the other end of the first resistor R1 is connected to the positive electrode of the first diode D1, the cathode of the first diode D1 is respectively connected to the negative electrode of the second diode D2, the thyristor cathode terminal of the thyristor S1, the first end of the pulse forming line PFL, and one end of the capacitor C, the positive electrode of the second diode D2 is connected to the thyristor The anode terminal of the thyristor S1 is connected, the other end of the capacitor C is respectively connected to the first connector 221 of the impact magnet 200 of the impact magnet system 1000 and the second end of the pulse forming line PFL, the second connector 222 of the impact magnet 200 is grounded, the third end of the pulse forming line PFL is grounded, the fourth end of the pulse forming line PFL is connected to the cathode of the third diode D3, the anode of the third diode D3 is connected to one end of the second resistor R2, and the other end of the second resistor R2 is grounded; the positive electrode of the trigger 5000 is connected to the trigger input positive terminal of the thyristor S1, the negative electrode of the trigger 5000 is connected to the trigger input negative terminal of the thyristor S1, the positive electrode of the auxiliary power supply 4000 is connected to the auxiliary heating power supply positive terminal of the thyristor S1, and the negative electrode of the auxiliary power supply 4000 is connected to the auxiliary heating power supply negative terminal of the thyristor S1. By adding a capacitor C between the pulse forming line PFL and the impact magnet system 1000, the rise and fall times of the current can be greatly accelerated. The third diode D3 and the second resistor R2 can reduce the charging voltage of the pulse forming line PFL by half, thereby reducing the withstand voltage index and process requirements of the components. In particular, since the voltage value of the charging power supply 3000 is reduced by half, the cost of the charging power supply is greatly reduced.

[0057] The theoretical value of the acceleration capacitor C is: C = L M / 4Z0 2 , where L M is the sum of the magnet inductance and stray inductance, and Z0 is the characteristic impedance of the loop. Through PSpice program simulation, it is found that appropriately increasing the capacitance value can cause the discharge current to have an overshoot, while reducing the current fall time. The overshoot is selected to be less than 0.5% to determine the capacity of the acceleration capacitor. The simulation result shows that the capacitance value is 130pF. Fig.10 Shown is a pulse current simulation waveform diagram, which shows the corresponding pulse current waveform diagrams when the capacitance is 100pF, 130pF and 160pF ​​respectively.

[0058] Theoretically, the rise time of the current is inversely proportional to the characteristic impedance of the loop, while the charging voltage is proportional to the characteristic impedance. Therefore, it is necessary to select a suitable characteristic impedance that can meet the index requirements of the fall time and make the charging voltage relatively low. Therefore, the characteristic impedance of the pulse forming line PFL is selected to be 50Ω, the rise time of the current is 70-80ns, which meets the index requirements, and the charging voltage value is 10kV. Considering the design margin of the peak current, if it is increased by 20%, the charging voltage is 12kV. The propagation time of the current in the cable is about 5ns per meter, and the length of the pulse forming line PFL cable is 15m.

[0059] In order to obtain a satisfactory fast pulse trapezoidal current waveform and achieve the required edge time, a distributed parameter high-voltage low-loss coaxial cable is used as the pulse forming line, and the discharge switch uses a hydrogen thyratron to achieve very small trigger jitter. In terms of layout, considering the convenience of maintenance, the charging power supply 3000 and the auxiliary power supply 4000 are placed outside the tunnel, and the pulse power source 6000 is placed in the beam tunnel and installed near the impact magnet system 1000, so that the cable of the discharge circuit can be shortened as much as possible and the electromagnetic interference caused by the pulse current can be reduced.

[0060] The thyristor selected is the CX1154C from TeledyneE2V (TeledyneE2V Technology), with a maximum forward peak voltage of 35kV, a maximum peak current of 3kA, an average current of 2A, a current rise rate of 100kA / μs, and a trigger jitter of less than 3ns, which can meet the power supply index requirements. The cooling method is air cooling, and the trigger of the thyristor is the MA2709A that matches the CX1154C.

[0061] The first resistor R1 and the first diode D1 can absorb reverse peak surge current, and the second diode D2 can absorb reverse voltage.

[0062] The charging power supply is required to be a constant current charging switching power supply with a maximum working voltage of 20kV, which has local control and remote control functions. The charging power supply index requirements are as follows:

[0063] Maximum voltage: 20kV

[0064] Charging current: 10mA

[0065] Repeatability: <0.01%

[0066] The auxiliary power supply 4000 is mainly the AC heating power supply for the thyratron filament and hydrogen generator, and the long-term stability is required to be better than 0.5%. The heating power supply for the thyratron hydrogen generator is required to be 5V, 7.0A, and the filament heating power supply is required to be 6.3V, 22.5A. The power supply is turned on and off by the controller. The two power supplies are independently adjustable, with output powers of 200W and 50W respectively. The voltage and current of each power supply can be displayed, and it has heating completion and power failure output signals. In addition, there is a power supply working time accumulation function to count the service life of the thyratron.

[0067] Since the rise and fall time is proportional to the magnet inductance and inversely proportional to the characteristic impedance of the pulse forming line PFL, in order to reduce the rise and fall time, the magnet inductance value should be minimized when designing the magnet, and the lead inductance and stray inductance of the discharge circuit should be minimized when designing the pulse power source; the pulse forming line PFL uses a single cable to increase the characteristic impedance of the pulse forming line PFL. However, these two parameters are also subject to other conditions (such as charging voltage) and cannot be increased or decreased blindly.

[0068] Since the circuit scheme of direct charging with high-voltage power supply is adopted, the long-term stability of the magnet power supply depends on the long-term stability of the charging power supply. A high-voltage charging power supply with long-term stability better than 0.01% is selected to ensure that the design index of long-term stability is achieved.

[0069] Since the pulse power source is placed on one side of the impact magnet in the tunnel, it will be affected by the electromagnetic radiation of the beam, so it is necessary to avoid the direction of the beam during installation. When selecting components, its radiation resistance must be considered to increase the service life of the power supply.

[0070] The pulse power source is an interference source. When the switch is turned on, it will generate strong electromagnetic interference, which will affect the operation of surrounding electronic equipment through the ground loop and space radiation. Therefore, some measures should be taken to suppress electromagnetic interference. Enclosing the entire pulse power source in a well-grounded shielded chassis can suppress electromagnetic radiation interference in space; design the main discharge loop so that the pulse current returns to the ground flange to avoid the impact of the discharge current on the ground wire; try to shorten the cable length of the discharge loop to reduce the electromagnetic radiation of the pulse current; due to the skin effect of high-frequency current, the pulse current cable and ground wire are both made of wide copper or multi-strand copper core wire to increase the surface area of ​​the wire; the grounding of the components in the pulse power source adopts a multi-point grounding scheme, and is connected to the ground copper nearby. Strengthen the filtering of the input power line on the high-voltage charging power supply to suppress conducted interference. The ground wire of the weak current low-frequency circuit is designed according to the power ground, signal ground, and shielding area, and finally lumped to one point for grounding. The switch control line and signal line are all isolated by optical fiber (the trigger pulse loop is designed separately), and the analog control and signal lines use shielded wires and low-pass filtering.

[0071] In terms of structural design, two factors are mainly considered: one is the control of parasitic parameters, and the other is the suppression of electromagnetic emission. Parasitic inductance will directly increase the operating voltage. Parasitic inductance and parasitic capacitance may also bring ripple to the output current and increase electromagnetic emission. Parasitic parameters also have a negative impact on the reliability of the equipment and the repeatability of the waveform. The measures taken include: (1) using low leakage inductance devices, such as low-inductance coaxial capacitors and flat-plate press-fit switching devices; (2) using low leakage inductance connection structures, such as optimizing the layout to reduce the length of the connection, using wide copper plates for connection, etc.; (3) paying attention to the design of the boundary conditions of all discharge circuits, and trying to use a cavity-type closed structure to improve the distribution of the electromagnetic field when the equipment is working, thereby reducing the loop inductance and electromagnetic emission.

[0072] The impact magnet system and dual-beam separation system of the present invention are such that when the impact magnet system is not powered on, the beam will be transmitted along a first path, and when the impact magnet system is powered on, the beam transmission path will change and be transmitted along a second path; the single-inductance impact magnet of the present invention can reduce the restriction of the magnet inductance on the leading and trailing edges of the pulse as much as possible, and based on the energy storage of the pulse forming line PFL, a pulse power supply that quickly turns on the thyristor S1 to discharge is used to generate a pulse current, which can achieve dual-beam separation with a minimum time interval of 100ns; the pulse current has a flat-top width, and therefore has good compatibility with dual-beam separation with a time interval of 100ns-300ns; and the leading edge of the excitation pulse can be further improved by adding a capacitor C in the pulse discharge circuit.

[0073] It should be noted that the present invention (e.g., the inventive concept, etc.) has been described in the specification of this patent document and / or illustrated in the drawings according to the exemplary embodiments; the embodiments of the present invention are presented only by way of example and are not intended to limit the scope of the present invention. The structure and / or arrangement of the elements of the inventive concept embodied in the present invention as described in the specification and / or illustrated in the drawings is merely illustrative. Although the exemplary embodiments of the present invention have been described in detail in this patent document, it is readily understood by those of ordinary skill in the art that equivalents, modifications, variations, etc. of the subject matter of the exemplary embodiments and alternative embodiments are possible and are considered to be within the scope of the present invention; all of these subject matters (e.g., modifications, variations, embodiments, combinations, equivalents, etc.) are intended to be included within the scope of the present invention. It should also be noted that various / other modifications, changes, substitutions, equivalents, alterations, omissions, etc. may be made in the configuration and / or arrangement of the exemplary embodiments (e.g., in terms of concepts, designs, structures, devices, forms, assemblies, constructions, means, functions, systems, processes / methods, steps, the order of process / method steps, operations, operating conditions, performances, materials, compositions, combinations, etc.) without departing from the scope of the present invention; all of these subjects (e.g., modifications, changes, embodiments, combinations, equivalents, etc.) are intended to be included within the scope of the present invention. The scope of the present invention is not intended to be limited to the subject matter (e.g., details, structures, functions, materials, behaviors, steps, sequences, systems, results, etc.) described in the specification and / or drawings of this patent document. Considering that the claims of this patent document will be appropriately interpreted as covering the full scope of the subject matter of the present invention (e.g., including any and all such modifications, changes, embodiments, combinations, equivalents, etc.); it should be understood that the terms used in this patent document are intended to provide a description of the subject matter of the exemplary embodiments, rather than as a limitation on the scope of the present invention.

[0074] It should also be noted that, depending on the exemplary embodiment, the present invention may include conventional technologies (such as technologies implemented and / or integrated in the exemplary embodiment, modifications, changes, combinations, equivalents), or may include any other applicable technologies (now and / or in the future) with the ability to perform the functions and processes / operations described in the specification and / or illustrated in the figures. All of these technologies (such as technologies implemented in embodiments, modifications, changes, combinations, equivalents, etc.) are considered to be within the scope of the present invention of this patent document.

Claims

1. An impact magnet system, characterized in that: It includes a vacuum chamber and an impact magnet fixed in the vacuum chamber, the impact magnet includes a magnetic core, a coil and an outer frame, the magnetic core is fixed in the outer frame, the magnetic core has a window, and the coil is arranged in the window; a first joint is connected to the first end of the coil, and a second joint is arranged on the second end of the coil, and the first joint and the second joint extend out of the outer frame; a vacuum through-wall component electrode interface is provided on the vacuum chamber, and the first joint and the second joint are electrically connected to the vacuum through-wall component electrode interface respectively; a beam outlet and a beam inlet are also provided on the vacuum chamber, and the beam inlet, the window and the beam outlet are connected in sequence.

2. The impact magnet system according to claim 1, characterized in that The vacuum chamber is also provided with an observation window and a vacuum gauge.

3. The impact magnet system according to claim 1, characterized in that The impact magnet system further comprises a supporting mechanism, and the vacuum chamber is arranged on the supporting mechanism; the supporting mechanism is used to support the vacuum chamber and adjust the position of the vacuum chamber.

4. The impact magnet system according to claim 3, characterized in that An ion pump is provided on the supporting mechanism, and the ion pump is communicated with the interior of the vacuum chamber to evacuate the vacuum chamber.

5. The impact magnet system according to claim 1, characterized in that The coil includes a first wire, a second wire, a third wire, a first connecting plate and a second connecting plate. The first wire, the second wire and the third wire all extend along the beam transmission direction. The first wire is located on a first side, and the second wire and the second wire are located on a second side opposite to the first side. One end of the second wire forms the first end of the coil, and one end of the third wire forms the second end of the coil. The first end and the second end are arranged opposite to each other, and the other end of the second wire is connected to the first connecting plate, and the other end of the third wire is connected to the second connecting plate. Both ends of the first wire are connected to the first connecting plate and the second connecting plate, respectively.

6. The impact magnet system according to claim 5, characterized in that An insulating plate is provided between the first joint and the second joint.

7. The impact magnet system according to claim 5, characterized in that The magnetic core includes a first magnetic core, a second magnetic core and a third magnetic core, all of which extend along the beam transmission direction. The first magnetic core and the second magnetic core are arranged at intervals along the beam transmission direction. The third magnetic core is located between the first magnetic core and the second magnetic core. The first magnetic core, the third magnetic core and the second magnetic core have windows that are connected in sequence. The first joint and the second joint extend from the gap between the first magnetic core and the second magnetic core to outside the window.

8. The impact magnet system according to claim 5, characterized in that The outer frame includes a first frame, a second frame and a third frame, the first frame, the second frame and the third frame all extend along the beam transmission direction, the first frame is located on the first side, the second frame and the third frame are located on the second side, the first frame is fixedly connected to the second frame and the third frame respectively, the magnetic core is clamped between the first frame and the second frame and the third frame; there is a gap between the second frame and the third frame for the first joint and the second joint to extend out.

9. The impact magnet system according to claim 8, characterized in that The first wire, the second wire, the third wire, the first connecting plate, the second connecting plate, the first frame, the second frame and the third frame are all provided with heat dissipation holes.

10. The impact magnet system according to claim 1, characterized in that At least one cooling belt is disposed on the outer frame, and the cooling belt is connected to the inner wall of the vacuum chamber.

11. A double bunch separation system, characterized in that: It includes a controller, a charging power supply, an auxiliary power supply, a trigger, a pulse power source, a timer and an impact magnet system as described in any one of claims 1 to 10, wherein the controller is electrically connected to the charging power supply, the auxiliary power supply and the pulse power source respectively, the charging power supply is electrically connected to the pulse power source, the auxiliary power supply is electrically connected to the pulse power source, and the pulse power source is electrically connected to the impact magnet system.

12. The dual-bunch separation system according to claim 11, characterized in that: The pulse power source includes a first resistor, a first diode, a second diode, a thyristor, a pulse forming line, a third diode, a second resistor and a capacitor. One end of the charging power source is grounded, the other end of the charging power source is connected to one end of the first resistor, the other end of the first resistor is connected to the positive electrode of the first diode, the cathode of the first diode is respectively connected to the cathode of the second diode, the cathode end of the thyristor, the first end of the pulse forming line and one end of the capacitor; the anode of the second diode is connected to the anode end of the thyristor, the other end of the capacitor is respectively connected to the impact magnet system The first terminal of the impact magnet of the system is connected to the second end of the pulse forming line, the second terminal of the impact magnet is grounded, the third end of the pulse forming line is grounded, the fourth end of the pulse forming line is connected to the cathode of the third diode, the anode of the third diode is connected to one end of the second resistor, and the other end of the second resistor is grounded; the positive terminal of the trigger is connected to the positive terminal of the trigger input of the thyristor, the negative terminal of the trigger is connected to the negative terminal of the trigger input of the thyristor, the positive terminal of the auxiliary power supply is connected to the positive terminal of the auxiliary power supply of the thyristor, and the negative terminal of the auxiliary power supply is connected to the negative terminal of the auxiliary power supply of the thyristor.

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