Semiconductor chemical solution suction equipment

Abstract

The invention belongs to the technical field of semiconductor manufacturing, and discloses semiconductor chemical solution suction equipment which comprises a reaction cabinet, a reaction frame is fixedly connected to the interior of the reaction cabinet, a first flow blocking film is fixedly connected to one side of the interior of the reaction frame, and a supporting base is fixedly connected to one side of the reaction cabinet. A suction box is arranged at the top of the supporting base, one side of the suction box is fixedly connected with a suction pipeline, and an oil inlet is formed in one side of the top of the suction box. Protective oil is injected into the oil storage cavity through the oil inlet, the oil in the oil storage cavity is broken through a second flow blocking thin film through the pressure piston by means of the atmospheric pressure and sprayed out through the oil spraying head, the protective oil adheres to the inner wall to form a protective film, contact of cleaning liquid to the inner wall of the pipeline is greatly reduced, and therefore the inner wall of the pipeline is prevented from being oxidized; and meanwhile, the situation that the pipeline is blocked due to falling of the oxide layer, the temperature of the heated surface is overheated, and the risk of pipe explosion is avoided.

Description

Technical Field

[0001] The invention belongs to the technical field of semiconductor manufacturing, and in particular relates to a semiconductor chemical solution absorbing device. Background Art

[0002] Semiconductor technology refers to various semiconductor processing technologies, including wafer growth technology, thin film deposition, photolithography, etching, doping technology and process integration. Many chemical solvents are used in the semiconductor processing process. For example, semiconductors need to be cleaned during the semiconductor processing process. During the cleaning process, the wafers with contaminated particles need to be exposed to ammonia and hydrogen peroxide in the cleaning agent. An oxide film will be formed on the surface of the particles, and then a hydrofluoric acid aqueous solution is used to remove this film, thereby separating and removing the contaminants from the wafer, thereby completing the cleaning of the semiconductor; after cleaning, when wet etching is used, specific chemical solvents are required to undergo chemical reactions to remove the oxide film, etc.

[0003] However, the existing semiconductor chemical solution absorption equipment often has some problems during actual use: after the semiconductor is cleaned, it is usually necessary to suck it out to prevent it from remaining inside the equipment and causing oxidation of the mechanical equipment, thereby reducing the service life of the equipment. During the operation of the existing absorption equipment, the cleaning agent is usually directly sucked out of the cleaning frame. However, due to the chemical properties of the cleaning agent itself, it will come into contact with the absorption pipe during the absorption process. Its rapid flow and contact with the inner wall of the absorption pipe will accelerate the oxidation of the inner wall of the pipe, thereby thinning the wall thickness of the inner wall of the pipe and reducing the corrosion resistance. The shedding of the oxide layer may also block the pipe and cause the heating surface to overheat, posing the risk of pipe bursting. Secondly, during the cleaning reaction of the semiconductor, the cleaning agent may be heated to increase its reaction rate. After the heating reaction is completed, the cleaning agent is sucked out at this time. The cleaning agent temperature is too high. After being sucked out, its own temperature may cause harm to relevant personnel, and the high temperature is not conducive to subsequent processing and transportation. Summary of the invention

[0004] The object of the present invention is to provide a semiconductor chemical solution suction device to solve the problems raised in the above background technology.

[0005] In order to achieve the above-mentioned purpose, the present invention provides the following technical solutions: a semiconductor chemical solution absorption device, comprising a reaction cabinet, a reaction frame is fixedly connected inside the reaction cabinet, a first flow-blocking film is fixedly connected to one side of the reaction frame, a support base is fixedly connected to one side of the reaction cabinet, a suction box is arranged on the top of the support base, a suction pipe is fixedly connected to one side of the suction box, an oil inlet is provided on one side of the top of the suction box, an oil storage chamber is provided inside the suction pipe, the oil inlet passes through the suction box and the suction pipe and is connected to the oil storage chamber, and a plurality of connecting A connecting block, a plurality of oil spray heads are fixedly connected inside the suction pipe, and the plurality of oil spray heads are communicated with the oil storage chamber, a second flow-blocking film is fixedly connected inside one end of the plurality of oil spray heads, a fixed round block is fixedly connected outside the plurality of oil spray heads, a plurality of connecting frames are fixedly connected on both sides of the plurality of fixed round blocks, a fixed block is fixedly connected on one side of the plurality of connecting frames, a limiting column is threadedly connected to the middle part of one end of the plurality of fixed blocks, an annular baffle is movably sleeved on one side of the plurality of reaction cabinets, a suction component is provided on one side of the suction box, and a cooling component is provided on one side of the suction box.

[0006] Preferably, the suction assembly includes an outer mounting ring, the outer mounting ring is fixedly connected to the outside of the suction pipe, a hydraulic rod is fixedly connected to one side of the suction box, a piston head is fixedly connected to one end of the hydraulic rod, a sliding groove is provided at the top of the interior of the suction box, the piston head is slidably connected to the interior of the sliding groove, a guide port is provided at one end of the sliding groove, and a liquid storage chamber is provided on the lower side of the interior of the suction box.

[0007] Preferably, the guide port and the inside of the mounting outer ring are both fixedly connected with a one-way valve, the diameters of the suction pipe and the narrow opening of the guide port are the same, the diameter of the blocking valve head at the top of the one-way valve is larger than the diameter of the narrow opening of the guide port and the suction pipe, and the guide port connects the sliding groove with the liquid storage chamber.

[0008] Preferably, the cooling component includes a supporting base plate, the supporting base plate is fixedly connected to one side of the suction box, a refrigerant tank is fixedly connected to the top of the supporting base plate, refrigerant pipes are fixedly connected to both ends of the refrigerant tank, the refrigerant pipes are fixedly connected to the suction box, an installation groove is opened on one side of the suction box, and a fan is fixedly connected inside the installation groove.

[0009] Preferably, the cooling component further comprises two air ducts, the two air ducts are opened on both sides of the interior of the suction box, and an air outlet is opened on one side of the interior of the suction box.

[0010] Preferably, the installation groove is connected with the air duct and the air outlet, the width of the air duct from the liquid storage chamber is 5 mm, a placement groove is opened inside the suction box at the position corresponding to the refrigerant pipe, and the fan is located in the middle of the refrigerant pipe.

[0011] Preferably, the guide port is arranged at the bottom of the sliding groove, a certain distance is left between one side of the guide port and one side of the sliding groove, a baffle is arranged on one side of the liquid storage chamber, and the baffle is slidably connected to the inside of the suction box.

[0012] Preferably, the annular baffle is eccentrically arranged outside the limiting column, and the annular baffle is in contact with the fixing block.

[0013] The beneficial effects of the present invention are as follows:

[0014] 1. The present invention injects protective oil into the oil storage chamber through the oil inlet, and the protective oil will gradually fill the oil storage chamber and the oil inlet. When the oil gradually fills the oil inlet, the pressure piston is used to utilize atmospheric pressure to break through the second flow-blocking film of the oil in the oil storage chamber and spray out through the oil spray head. The protective oil will be atomized after being sprayed from the oil spray head and hitting the annular baffle plate. The impact force of the protective oil spraying will drive the annular baffle plate to rotate. The annular baffle plate rotates and the protective oil is sprayed in an inverted semicircle on the inner wall of the suction pipe. The protective oil adheres to the inner wall to form a protective film, thereby avoiding oxidation of the inner wall of the pipe, and preventing the wall thickness of the inner wall of the pipe from becoming thinner due to contact oxidation of the cleaning liquid, thereby reducing its corrosion resistance, and at the same time, it can avoid the clogging of the pipe caused by the shedding of the oxide layer, resulting in overheating of the heating surface, and avoiding the risk of pipe bursting. At the same time, the formation of protective oil atomization can better cover the inner wall of the pipe, thereby improving the protection effect.

[0015] 2. The present invention starts the hydraulic rod, which drives the piston head to move. The piston head moves backward and drives the cleaning liquid inside the reaction frame through the atmospheric pressure to flush the one-way valve inside the suction pipe and flow into the sliding groove. After the piston head moves to a certain position, it is pushed forward. At this time, the one-way valve inside the suction pipe is closed, and the one-way valve inside the guide port is opened by the downward pressure. The cleaning liquid is extracted through the reciprocating movement of the piston head and flows into the liquid storage chamber to complete the absorption. During absorption, the two one-way valves cooperate with each other to ensure that the cleaning liquid can only flow in one direction, thereby preventing the cleaning liquid from flowing back after the extraction stops, which can reduce damage to the equipment and extend its service life.

[0016] 3. The present invention starts the fan after the cleaning liquid is extracted and the cleaning liquid is inside the liquid storage chamber. The fan starts to blow out wind, and the wind passes through the refrigerant pipe along the air duct. After the wind passes through the refrigerant pipe, it carries the cold air of the refrigerant pipe and moves along the air duct on the surface of the liquid storage chamber, thereby taking away the temperature of the cleaning liquid inside the liquid storage chamber, avoiding harm to relevant personnel due to the excessively high temperature of the cleaning liquid itself. At the same time, the reduction in temperature is conducive to subsequent processing and transportation.

[0017] 4. The protective oil sprayed by the oil spray head of the present invention will slowly fall to the bottom of the suction pipe due to gravity. At this time, the movement of the piston head drives the cleaning liquid to move in the sliding groove, the guide port and the liquid storage chamber. At this time, since the density of the protective oil is lower than that of the cleaning liquid, it will float on the water surface of the cleaning liquid. The movement of the cleaning liquid will drive the protective oil to move. During the movement of the protective oil, the protective oil will adhere to the sliding groove, the guide port and the inside of the liquid storage chamber, thereby reducing the oxidation of the sliding groove, the guide port and the liquid storage chamber by the cleaning liquid, thereby increasing the life of the equipment and improving the protective effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural schematic diagram of the reaction cabinet of the present invention;

[0019] Figure 2 It is a side structural schematic diagram of the reaction cabinet of the present invention;

[0020] Figure 3 is a cross-sectional view of a reaction cabinet of the present invention;

[0021] Figure 4 It is a structural schematic diagram of the reaction frame of the present invention;

[0022] Figure 5 It is a structural schematic diagram of the suction box of the present invention;

[0023] Figure 6 It is a cross-sectional view of the suction box of the present invention;

[0024] Figure 7 A cross-sectional view of the suction pipeline of the present invention;

[0025] Figure 8 It is a structural schematic diagram of the fuel injection head of the present invention;

[0026] Fig. 9 A side cross-sectional view of the suction pipe of the present invention;

[0027] Fig.10 It is a structural schematic diagram of the air duct of the present invention.

[0028] In the figure: 1. reaction cabinet; 2. reaction frame; 3. first baffle film; 4. support base; 5. suction box; 6. suction pipe; 7. oil inlet; 8. oil storage chamber; 9. connecting block; 10. oil spray head; 11. second baffle film; 12. fixed round block; 13. connecting frame; 14. fixing block; 15. limiting column; 16. annular baffle plate; 17. mounting outer ring; 18. one-way valve; 19. hydraulic rod; 20. piston head; 21. guide port; 22. liquid storage chamber; 23. support bottom plate; 24. refrigerant tank; 25. refrigerant pipe; 26. fan; 27. air duct; 28. air outlet; 29. ​​baffle. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0030] like Figures 1 to 10 As shown, an embodiment of the present invention provides a semiconductor chemical solution absorption device, including a reaction cabinet 1, a reaction frame 2 is fixedly connected inside the reaction cabinet 1, a first flow-blocking film 3 is fixedly connected to one side of the reaction frame 2, a support base 4 is fixedly connected to one side of the reaction cabinet 1, a suction box 5 is arranged on the top of the support base 4, a suction pipe 6 is fixedly connected to one side of the suction box 5, and an oil inlet 7 is provided on one side of the top of the suction box 5, characterized in that: an oil storage chamber 8 is provided inside the suction pipe 6, the oil inlet 7 runs through the suction box 5 and the suction pipe 6 and is connected to the oil storage chamber 8, a plurality of connecting blocks 9 are fixedly connected inside the oil storage chamber 8, a plurality of oil spray heads 10 are fixedly connected inside the suction pipe 6, the plurality of oil spray heads 10 are all connected to the oil storage chamber 8, a second flow-blocking film 11 is fixedly connected to one end of the plurality of oil spray heads 10, a fixed round block 12 is fixedly connected to the outside of the plurality of oil spray heads 10, a plurality of connecting frames 13 are fixedly connected to both sides of the plurality of fixed round blocks 12, a plurality of connecting frames 13 are fixedly connected to one side of the plurality of connecting frames 13, a fixed block 14 is fixedly connected to one end of the plurality of fixed blocks 14, and a plurality of fixed blocks 14 are fixedly connected to one side of the plurality of fixed blocks 14. A threaded limit column 15 is connected, and an annular baffle plate 16 is movably sleeved on one side of the multiple reaction cabinets 1. A suction component is provided on one side of the suction box 5, and a cooling component is provided on one side of the suction box 5. Protective oil is injected into the oil storage chamber 8 through the oil inlet 7. The protective oil will gradually fill the oil storage chamber 8 and the oil inlet 7. When the oil gradually fills the oil inlet 7, the pressure piston is used to use atmospheric pressure to break the oil inside the oil storage chamber 8 through the second flow-blocking film 11 and spray it through the oil spray head 10. The protective oil is sprayed from the oil spray head 10 and hits the annular baffle plate. 16 will be atomized, and the impact force of the protective oil sprayed will drive the annular baffle plate 16 to rotate. The annular baffle plate 16 rotates and the protective oil is sprayed in an inverted semicircle on the inner wall of the suction pipe 6. The protective oil adheres to the inner wall to form a protective film, thereby avoiding oxidation of the inner wall of the pipe, preventing the wall thickness of the inner wall of the pipe from being reduced due to oxidation, reducing the corrosion resistance, avoiding the clogging of the pipe due to the shedding of the oxide layer, causing the heating surface to overheat, and avoiding the risk of pipe bursting. At the same time, the formation of protective oil atomization can better cover the inner wall of the pipe, thereby improving the protection effect.

[0031] Among them, the suction component includes an installation outer ring 17, which is fixedly connected to the outside of the suction pipe 6, a hydraulic rod 19 is fixedly connected to one side of the suction box 5, and a piston head 20 is fixedly connected to one end of the hydraulic rod 19. A sliding groove is provided at the top of the suction box 5, and the piston head 20 is slidably connected to the inside of the sliding groove. A guide port 21 is provided at one end of the sliding groove, and a liquid storage chamber 22 is provided at the lower side of the suction box 5. The guide port 21 and the inside of the installation outer ring 17 are fixedly connected with a one-way valve 18. The diameters of the narrow openings of the suction pipe 6 and the guide port 21 are the same, and the diameter of the blocking valve head at the top of the one-way valve 18 is larger than the diameter of the narrow opening of the guide port 21 and the suction pipe 6. The guide port 21 connects the sliding groove with the liquid storage chamber 22, and by starting the hydraulic rod 19. The hydraulic rod 19 is started to drive the piston head 20 to move. The piston head 20 moves backward and drives the cleaning liquid inside the reaction frame 2 through the atmospheric pressure to flush the one-way valve 18 inside the suction pipe 6 and flow into the sliding groove. After the piston head 20 moves to a certain position, it is pushed forward. At this time, the one-way valve 18 inside the suction pipe 6 is closed, and the one-way valve 18 inside the guide port 21 is opened by the downward pressure. The cleaning liquid is extracted by the reciprocating movement of the piston head 20 and flows into the liquid storage chamber 22 to complete the absorption. During the absorption, the two one-way valves 18 cooperate with each other to ensure that the cleaning liquid can only flow in one direction, thereby preventing the cleaning liquid from flowing back when the extraction stops, which can reduce the damage to the equipment and extend its service life.

[0032] Among them, the cooling component includes a supporting base plate 23, which is fixedly connected to one side of the suction box 5, a refrigerant tank 24 is fixedly connected to the top of the supporting base plate 23, and refrigerant pipes 25 are fixedly connected to both ends of the refrigerant tank 24. The refrigerant pipe 25 is fixedly connected to the suction box 5, and a mounting groove is opened in the middle of one side of the suction box 5. A fan 26 is fixedly connected inside the mounting groove. The cooling component also includes two air ducts 27, which are opened on both sides of the suction box 5. An air outlet 28 is opened on one side of the suction box 5. After the cleaning liquid is extracted, the cleaning liquid is inside the liquid storage chamber 22. At this time, the fan 26 is started, and the fan 26 starts to blow out wind. The wind passes through the refrigerant pipe 25 along the air duct 27. After the wind passes through the refrigerant pipe 25, it will carry the cold air of the refrigerant pipe 25 and move along the air duct 27 on the surface of the liquid storage chamber 22, thereby taking away the temperature of the cleaning liquid in the liquid storage chamber 22, avoiding damage to relevant personnel due to its own high temperature. At the same time, the temperature reduction is conducive to subsequent processing and transportation.

[0033] Among them, the installation groove is connected with the air duct 27 and the air outlet 28. The width of the air duct 27 from the liquid storage chamber 22 is 5 mm. A placement groove is opened inside the suction box 5 corresponding to the position of the refrigerant pipe 25. The fan 26 is located in the middle of the refrigerant pipe 25. The distance between the air duct 27 and the liquid storage chamber 22 is close, which can effectively cool the cleaning liquid inside the liquid storage chamber 22, making it convenient for subsequent processing and transportation.

[0034] Among them, the guide port 21 is arranged at the bottom of the sliding groove, and a certain distance is left on one side of the guide port 21 and one side of the sliding groove. A baffle 29 is arranged on one side of the liquid storage chamber 22, and the baffle 29 is slidably connected to the inside of the suction box 5. The annular baffle 16 is eccentrically arranged on the outside of the limit column 15, and the annular baffle 16 is in contact with the fixed block 14. The eccentric distance of the annular baffle 16 is 2mm, and a distance of 2mm is left on the guide port 21. The guide port 21 is arranged on the front side of the sliding groove, so that the piston head 20 can better fall into the liquid storage chamber 22 during the process of pushing the cleaning liquid to move.

[0035] Working principle:

[0036] Before absorbing the cleaning liquid inside the reaction frame 2, protective oil is injected into the oil storage chamber 8 through the oil inlet 7, and the protective oil will gradually fill the oil storage chamber 8 and the oil inlet 7. When the oil gradually fills the oil inlet 7, the pressure piston is used to use atmospheric pressure to break the oil inside the oil storage chamber 8 through the second flow-blocking film 11, and the protective oil is sprayed out through the oil spray head 10. After the protective oil is sprayed out from the oil spray head 10 and hits the annular baffle 16, it will be atomized, and due to the eccentric design of the annular baffle 16, the impact force of the protective oil spraying will drive the annular baffle 16 to rotate. The annular baffle 16 rotates and the protective oil is sprayed in an inverted semicircle on the inner wall of the suction pipe 6. The protective oil adheres to the inner wall to form a protective film, thereby avoiding oxidation of the inner wall of the pipe, preventing the wall thickness of the inner wall of the pipe caused by oxidation, reducing the corrosion resistance, avoiding the detachment of the oxide layer to cause the pipe to be blocked, causing the heating surface to overheat, and avoiding the risk of pipe bursting. At the same time, the formation of protective oil atomization can better cover the inner wall of the pipe, thereby improving the protection effect;

[0037] When it is necessary to absorb the cleaning agent, the hydraulic rod 19 is started, and the hydraulic rod 19 is started to drive the piston head 20 to move. The piston head 20 moves backward and drives the cleaning liquid inside the reaction frame 2 through the atmospheric pressure to open the one-way valve 18 inside the suction pipe 6 and flow into the sliding groove. After the piston head 20 moves to a certain position, it is pushed forward. At this time, the one-way valve 18 inside the suction pipe 6 is closed, and the one-way valve 18 inside the guide port 21 is opened by the downward pressure. The cleaning liquid is extracted by the reciprocating movement of the piston head 20 and flows into the liquid storage chamber 22 to complete the absorption. During the absorption, the two one-way valves 18 cooperate with each other to ensure that the cleaning liquid can only flow in one direction, thereby preventing the cleaning liquid from flowing back after the extraction stops, which can reduce damage to the equipment and extend its service life.

[0038] After the cleaning liquid is extracted, the cleaning liquid is now inside the liquid storage chamber 22. At this time, the fan 26 is started, and the fan 26 starts to blow out wind. The wind passes through the refrigerant pipe 25 along the air duct 27. After the wind passes through the refrigerant pipe 25, it will carry the cold air of the refrigerant pipe 25 and move along the air duct 27 on the surface of the liquid storage chamber 22, thereby taking away the temperature of the cleaning liquid inside the liquid storage chamber 22, avoiding harm to relevant personnel due to its own high temperature. At the same time, the temperature reduction is conducive to subsequent processing and transportation.

[0039] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0040] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A semiconductor chemical solution suction device, comprising a reaction cabinet (1), wherein a reaction frame (2) is fixedly connected inside the reaction cabinet (1), a first flow-blocking film (3) is fixedly connected to one side of the reaction frame (2), a support base (4) is fixedly connected to one side of the reaction cabinet (1), a suction box (5) is arranged on the top of the support base (4), one side of the suction box (5) is fixedly connected to a suction pipeline (6), and an oil inlet (7) is opened on one side of the top of the suction box (5), characterized in that: An oil storage chamber (8) is provided inside the suction pipe (6); the oil inlet (7) penetrates the suction box (5) and the suction pipe (6) and is connected to the oil storage chamber (8); a plurality of connection blocks (9) are fixedly connected inside the oil storage chamber (8); a plurality of oil spray heads (10) are fixedly connected inside the suction pipe (6); the plurality of oil spray heads (10) are all connected to the oil storage chamber (8); a second flow-blocking film (11) is fixedly connected inside one end of the plurality of oil spray heads (10); 10) are fixedly connected to the outside with a fixed round block (12), multiple connecting frames (13) are fixedly connected to both sides of the multiple fixed round blocks (12), multiple connecting frames (13) are fixedly connected to one side with a fixed block (14), the middle part of one end of multiple fixing blocks (14) are threadedly connected to a limiting column (15), one side of multiple reaction cabinets (1) are movably sleeved with an annular baffle plate (16), one side of the suction box (5) is provided with a suction component, and one side of the suction box (5) is provided with a cooling component.

2. The semiconductor chemical solution suction device according to claim 1, characterized in that: The suction assembly comprises an outer mounting ring (17), the outer mounting ring (17) being fixedly connected to the outer side of the suction pipe (6), a hydraulic rod (19) being fixedly connected to one side of the suction box (5), a piston head (20) being fixedly connected to one end of the hydraulic rod (19), a sliding groove being provided at the top end of the suction box (5), the piston head (20) being slidably connected to the inside of the sliding groove, a flow guide port (21) being provided at one end of the sliding groove, and a liquid storage chamber (22) being provided at the lower side of the inside of the suction box (5).

3. The semiconductor chemical solution suction device according to claim 2, characterized in that: The guide port (21) and the mounting outer ring (17) are both fixedly connected with a one-way valve (18); the diameters of the narrow openings of the suction pipe (6) and the guide port (21) are the same; the diameter of the blocking valve head at the top of the one-way valve (18) is larger than the diameters of the narrow opening of the guide port (21) and the suction pipe (6); the guide port (21) connects the sliding groove with the liquid storage chamber (22).

4. The semiconductor chemical solution suction device according to claim 3, characterized in that: The cooling component includes a supporting base plate (23), the supporting base plate (23) is fixedly connected to one side of the suction box (5), a refrigerant tank (24) is fixedly connected to the top of the supporting base plate (23), both ends of the refrigerant tank (24) are fixedly connected to refrigerant pipes (25), the refrigerant pipes (25) are fixedly connected to the suction box (5), and a mounting groove is opened on one side of the suction box (5), and a fan (26) is fixedly connected inside the mounting groove.

5. The semiconductor chemical solution suction device according to claim 4, characterized in that: The cooling component further comprises two air ducts (27), the two air ducts (27) being opened on both sides of the interior of the suction box (5), and an air outlet (28) being opened on one side of the interior of the suction box (5).

6. The semiconductor chemical solution suction device according to claim 5, characterized in that: The installation groove is connected to the air duct (27) and the air outlet (28); the width of the air duct (27) from the liquid storage chamber (22) is 5 mm; a placement groove is provided inside the suction box (5) at the location of the corresponding refrigerant pipe (25); and the fan (26) is located in the middle of the refrigerant pipe (25).

7. The semiconductor chemical solution suction device according to claim 6, characterized in that: The guide port (21) is arranged at the bottom of the sliding groove, and a certain distance is left between one side of the guide port (21) and one side of the sliding groove. A baffle (29) is arranged on one side of the liquid storage chamber (22), and the baffle (29) is slidably connected to the inside of the suction box (5).

8. The semiconductor chemical solution suction device according to claim 7, characterized in that: The annular baffle plate (16) is eccentrically arranged outside the limiting column (15), and the annular baffle plate (16) is in contact with the fixing block (14).

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