A semiconductor chemical solution suction device

Abstract

The present invention belongs to the technical field of semiconductor manufacturing, and discloses a semiconductor chemical solution suction device, including a reaction cabinet. Inside the reaction cabinet, a reaction frame is fixedly connected. On one side inside the reaction frame, a first flow-blocking film is fixedly connected. On one side of the reaction cabinet, a support base is fixedly connected. On the top of the support base, a suction box is provided. On one side of the suction box, a suction pipe is fixedly connected. On one side of the top of the suction box, an oil inlet is opened. In the present invention, protective oil is injected into the oil storage chamber through the oil inlet. The piston is pressed to break through the second flow-blocking film with the atmospheric pressure of the oil inside the oil storage chamber and spray it out through the oil spray head. The protective oil adheres to the inner wall to form a protective film, greatly reducing the contact of the cleaning liquid with the inner wall of the pipeline, thereby avoiding the oxidation of the inner wall of the pipeline, resulting in a decrease in corrosion resistance, and at the same time avoiding the blockage of the pipeline caused by the shedding of the oxide layer, leading to overheating of the heating surface and avoiding the risk of pipe explosion.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor manufacturing, and specifically relates to a semiconductor chemical solution suction device. Background Art

[0002] Semiconductor technology refers to various technologies for semiconductor processing, including wafer growth technology, thin film deposition, lithography, etching, doping technology, and process integration, etc. Many chemical solvents are used in the process of semiconductor processing. For example, during semiconductor processing, it is necessary to clean the semiconductor. During the cleaning process, after the wafer contaminated with particulate matter comes into contact with ammonia and hydrogen peroxide in the cleaning agent, an oxide film will be formed on its surface with the particles. Then, an aqueous solution of hydrofluoric acid is used to remove this film, so as to separate and remove the contaminants from the wafer, thus completing the cleaning of the semiconductor; when wet etching is used after cleaning, specific chemical solvents are required for chemical reactions to remove the oxide film, etc.

[0003] However, there are often some problems in the actual use of existing semiconductor chemical solution suction devices: after the semiconductor is cleaned, it usually needs to be sucked out to prevent it from remaining inside the device all the time, which may cause oxidation of mechanical equipment and reduce the service life of the device. In the working process of existing suction devices, the cleaning agent is usually directly sucked out from the cleaning frame. However, during the suction process, due to the chemical properties of the cleaning agent itself, it will come into contact with the suction pipeline during the suction process. Its rapid flow and contact with the inner wall of the suction pipeline will accelerate the oxidation of the pipeline inner wall, thereby thinning the wall thickness of the pipeline inner wall, reducing the corrosion resistance, and the peeling of the oxide layer may also block the pipeline, resulting in overheating of the heating surface and posing a risk of pipe explosion; secondly, during the cleaning reaction of the semiconductor, the cleaning agent may be heated to increase its reaction rate. After the temperature-raising reaction is completed, when the cleaning agent is sucked out, the temperature of the cleaning agent is too high, and its own temperature may cause harm to relevant staff after being sucked out, and the high temperature is also not conducive to subsequent processing and handling. Summary of the Invention

[0004] The purpose of the present invention is to provide a semiconductor chemical solution suction device to solve the problems raised in the above background art.

[0005] To achieve the above object, the present invention provides the following technical solution: A semiconductor chemical solution suction device, including a reaction cabinet, a reaction frame is fixedly connected inside the reaction cabinet, a first flow-blocking film is fixedly connected to one side inside the reaction frame, a support base is fixedly connected to one side of the reaction cabinet, a suction box is arranged on the top of the support base, a suction pipe is fixedly connected to one side of the suction box, an oil inlet is opened on one side of the top of the suction box, an oil storage chamber is opened inside the suction pipe, the oil inlet penetrates through the suction box and the suction pipe and is communicated with the oil storage chamber, a plurality of connecting blocks are fixedly connected inside the oil storage chamber, a plurality of oil spray nozzles are fixedly connected inside the suction pipe, a plurality of the oil spray nozzles are all communicated with the oil storage chamber, a second flow-blocking film is fixedly connected inside one end of each of the plurality of oil spray nozzles, a fixed round block is fixedly connected to the outside of each of the plurality of oil spray nozzles, a plurality of connecting frames are respectively fixedly connected to both sides of each of the plurality of fixed round blocks, a fixed block is fixedly connected to one side of each of the plurality of connecting frames, a limiting column is threadedly connected to the middle of one end of each of the plurality of fixed blocks, an annular baffle is movably sleeved on one side of each of the plurality of reaction cabinets, a suction component is arranged on one side inside the suction box, and a cooling component is arranged on one side inside the suction box.

[0006] Preferably, the suction component includes an installation outer ring, the installation outer ring is fixedly connected to the outside of the suction pipe, a hydraulic rod is fixedly connected to one side of the suction box, a piston head is fixedly connected to one end of the hydraulic rod, a sliding groove is opened at the top end inside the suction box, the piston head is slidably connected inside the sliding groove, a diversion port is opened at one end of the sliding groove, and a liquid storage chamber is opened at the lower side inside the suction box.

[0007] Preferably, one-way valves are fixedly connected inside both the diversion port and the installation outer ring, the narrow diameters of the suction pipe and the diversion port are the same, the diameter of the flow-blocking valve head at the top of the one-way valve is larger than the narrow diameters of the diversion port and the suction pipe, and the diversion port communicates the sliding groove with the liquid storage chamber.

[0008] Preferably, the cooling component includes a support bottom plate, the support bottom plate is fixedly connected to one side of the suction box, a refrigerant tank is fixedly connected to the top of the support bottom plate, refrigerant pipes are fixedly connected to both ends of the refrigerant tank, the refrigerant pipes are fixedly connected to the suction box, an installation groove is opened on one side of the suction box, and a fan is fixedly connected inside the installation groove.

[0009] Preferably, the cooling component further includes two air ducts, the two air ducts are opened on both sides inside the suction box, and an air outlet is opened on one side inside the suction box.

[0010] Preferably, the installation groove is communicated with the air ducts and the air outlet, the width of the air duct from the liquid storage chamber is 5 mm, a placement groove is opened inside the suction box at the position corresponding to the refrigerant pipe, and the fan is located in the middle of the refrigerant pipe.

[0011] Preferably, the diversion port is arranged at the bottom of the sliding groove, and there is a certain distance between one side of the diversion port and one side of the sliding groove. A baffle is arranged on one side of the liquid storage cavity, and the baffle is slidably connected to the inside of the suction box.

[0012] Preferably, the annular baffle is eccentrically arranged outside the limit post, and the annular baffle is in contact with the fixed block.

[0013] The beneficial effects of the present invention are as follows:

[0014] 1. The present invention injects protective oil into the oil storage chamber through the oil inlet. The protective oil will gradually fill the oil storage chamber and the oil inlet. When the oil gradually fills the oil inlet, the piston is pressed to use atmospheric pressure to break through the second baffle film inside the oil storage chamber and spray out through the spray head. The protective oil sprays out from the spray head and atomizes after hitting the annular baffle. The impact force of the sprayed protective oil will drive the annular baffle to rotate. The rotation of the annular baffle makes the protective oil spray in an inverted semicircle on the inner wall of the suction pipe. The protective oil adheres to the inner wall to form a protective film, thereby avoiding the oxidation of the inner wall of the pipe, preventing the wall thickness of the inner wall of the pipe from thinning due to the contact oxidation of the cleaning liquid, reducing its corrosion resistance, and at the same time being able to avoid the blockage of the pipe caused by the shedding of the oxide layer, resulting in overheating of the heating surface and avoiding the risk of pipe explosion. At the same time, the formation of the atomized protective oil can better cover the inner wall of the pipe, thereby improving the protection effect.

[0015] 2. The present invention starts the hydraulic rod. The start of the hydraulic rod drives the piston head to move. The piston head moves backward and drives the cleaning liquid inside the reaction frame through the suction pipe to open the one-way valve inside the suction pipe and flow into the sliding groove by atmospheric pressure. After the piston head moves to a certain position and is pushed forward, the one-way valve inside the suction pipe closes at this time, and the one-way valve inside the diversion port is opened by the downward pressure. The cleaning liquid is withdrawn through the reciprocating movement of the piston head and flows into the inside of the liquid storage cavity to complete the suction. During suction, the mutual cooperation of the two one-way valves ensures that the cleaning liquid can only flow in one direction, thereby preventing the cleaning liquid from flowing back after the extraction stops, reducing the damage to the equipment, and prolonging its service life.

[0016] 3. After the cleaning liquid is withdrawn in the present invention, at this time, the cleaning liquid is inside the liquid storage cavity, and the fan is started. The fan starts to blow air. The air moves along the air duct through the refrigerant pipe. After the air passes through the refrigerant pipe, it will carry the cold air of the refrigerant pipe and move along the air duct on the surface of the liquid storage cavity, thereby taking away the temperature of the cleaning liquid inside the liquid storage cavity, avoiding harm to relevant staff due to its too high temperature, and at the same time, the reduction of temperature is beneficial to subsequent processing and handling.

[0017] 4. The protective oil sprayed by the fuel injector of the present invention will slowly fall to the bottom of the suction pipe due to gravity. At this time, the piston head moves to drive the cleaning liquid to move inside the sliding groove, the diversion port and the liquid storage cavity. At this time, since the density of the protective oil is lower than that of the cleaning liquid, it will float on the water surface of the cleaning liquid. The movement of the cleaning liquid will drive the protective oil to move. During the movement of the protective oil, the protective oil will adhere to the inside of the sliding groove, the diversion port and the liquid storage cavity, thereby reducing the oxidation of the cleaning liquid to the sliding groove, the diversion port and the liquid storage cavity, improving the service life of the equipment and enhancing the protection effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a schematic structural diagram of the reaction cabinet of the present invention;

[0019] Figure 2 is a schematic side structural diagram of the reaction cabinet of the present invention;

[0020] Figure 3 is a sectional view of the reaction cabinet of the present invention;

[0021] Figure 4 is a schematic structural diagram of the reaction frame of the present invention;

[0022] Figure 5 is a schematic structural diagram of the suction box of the present invention;

[0023] Figure 6 is a sectional view of the suction box of the present invention;

[0024] Figure 7 is a sectional view of the suction pipe of the present invention;

[0025] Figure 8 is a schematic structural diagram of the fuel injector of the present invention;

[0026] Figure 9 is a side sectional view of the suction pipe of the present invention;

[0027] Figure 10 is a schematic structural diagram of the air duct of the present invention.

[0028] In the figure: 1. Reaction cabinet; 2. Reaction frame; 3. First flow blocking film; 4. Support base; 5. Suction box; 6. Suction pipe; 7. Oil inlet; 8. Oil storage chamber; 9. Connecting block; 10. Fuel injector; 11. Second flow blocking film; 12. Fixed round block; 13. Connecting frame; 14. Fixed block; 15. Limit column; 16. Annular baffle; 17. Installation outer ring; 18. Check valve; 19. Hydraulic rod; 20. Piston head; 21. Diversion port; 22. Liquid storage cavity; 23. Support bottom plate; 24. Refrigerant tank; 25. Refrigerant pipe; 26. Fan; 27. Air duct; 28. Air outlet; 29. Flow blocking plate. DETAILED DESCRIPTION OF THE INVENTION

[0029] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0030] As Figures 1 to 10 shown, an embodiment of the present invention provides a semiconductor chemical solution suction device, including a reaction cabinet 1, a reaction frame 2 fixedly connected inside the reaction cabinet 1, a first flow-blocking film 3 fixedly connected to one side inside the reaction frame 2, a support base 4 fixedly connected to one side of the reaction cabinet 1, a suction box 5 arranged on the top of the support base 4, a suction pipe 6 fixedly connected to one side of the suction box 5, an oil inlet 7 opened on one side of the top of the suction box 5, and characterized in that: an oil storage chamber 8 is opened inside the suction pipe 6, the oil inlet 7 penetrates through the suction box 5 and the suction pipe 6 and is communicated with the oil storage chamber 8, a plurality of connecting blocks 9 are fixedly connected inside the oil storage chamber 8, a plurality of oil spray nozzles 10 are fixedly connected inside the suction pipe 6, the plurality of oil spray nozzles 10 are all communicated with the oil storage chamber 8, a second flow-blocking film 11 is fixedly connected inside one end of each of the plurality of oil spray nozzles 10, a fixed circular block 12 is fixedly connected to the outside of each of the plurality of oil spray nozzles 10, a plurality of connecting frames 13 are respectively fixedly connected to both sides of the plurality of fixed circular blocks 12, a fixed block 14 is fixedly connected to one side of each of the plurality of connecting frames 13, a limiting column 15 is threadedly connected to the middle of one end of each of the plurality of fixed blocks 14, an annular baffle 16 is movably sleeved on one side of each of the plurality of reaction cabinets 1, a suction component is arranged on one side inside the suction box 5, and a cooling component is arranged on one side inside the suction box 5. By injecting protective oil into the oil storage chamber 8 through the oil inlet 7, the protective oil will gradually fill the oil storage chamber 8 and the oil inlet 7. When the oil gradually fills the oil inlet 7, press the piston to use the atmospheric pressure to break the oil inside the oil storage chamber 8 through the second flow-blocking film 11 and spray it out through the oil spray nozzles 10. After the protective oil sprayed out from the oil spray nozzles 10 impacts the annular baffle 16, it will be atomized. The impact force of the sprayed protective oil will drive the annular baffle 16 to rotate. The rotation of the annular baffle 16 drives the protective oil to be sprayed in a reverse semicircle on the inner wall of the suction pipe 6. The protective oil adheres to the inner wall to form a protective film, thereby avoiding the oxidation of the inner wall of the pipe, preventing the reduction of the wall thickness of the inner wall of the pipe caused by oxidation, the decline of the corrosion resistance, avoiding the blockage of the pipe caused by the peeling off of the oxide layer, resulting in the overheating of the heating surface, and avoiding the risk of pipe explosion. At the same time, the formation of the atomized protective oil can better cover the inner wall of the pipe, thereby improving the protection effect.

[0031] Among them, the suction component includes an installation outer ring 17, which is fixedly connected to the outside of the suction pipe 6. One side of the suction box 5 is fixedly connected with a hydraulic rod 19. One end of the hydraulic rod 19 is fixedly connected with a piston head 20. A sliding groove is opened at the top inside the suction box 5. The piston head 20 is slidably connected inside the sliding groove. A diversion port 21 is opened at one end of the sliding groove. A liquid storage cavity 22 is opened at the lower side inside the suction box 5. One-way valves 18 are fixedly connected inside both the diversion port 21 and the installation outer ring 17. The diameters of the narrow openings of the suction pipe 6 and the diversion port 21 are the same. The diameter of the blocking valve head at the top of the one-way valve 18 is larger than the diameters of the narrow opening of the diversion port 21 and the suction pipe 6. The diversion port 21 connects the sliding groove with the liquid storage cavity 22. By starting the hydraulic rod 19, the hydraulic rod 19 drives the piston head 20 to move. When the piston head 20 moves backward, it drives the cleaning liquid inside the reaction frame 2 through the suction pipe 6 by atmospheric pressure to flush open the one-way valve 18 inside the suction pipe 6 and flow into the sliding groove. After the piston head 20 moves to a certain position and is pushed forward, at this time, the one-way valve 18 inside the suction pipe 6 closes, and the one-way valve 18 inside the diversion port 21 is opened under the downward pressure. The cleaning liquid is drawn out through the reciprocating movement of the piston head 20 and flows into the interior of the liquid storage cavity 22 to complete the suction. During suction, the mutual cooperation of the two one-way valves 18 ensures that the cleaning liquid can only flow in one direction, thereby preventing the cleaning liquid from flowing back when the extraction stops, reducing equipment damage, and extending its service life.

[0032] Among them, the cooling component includes a support bottom plate 23, which is fixedly connected to one side of the suction box 5. A refrigerant tank 24 is fixedly connected to the top of the support bottom plate 23. Refrigerant pipes 25 are fixedly connected to both ends of the refrigerant tank 24. The refrigerant pipes 25 are fixedly connected to the suction box 5. An installation slot is opened in the middle of one side of the suction box 5, and a fan 26 is fixedly connected inside the installation slot. The cooling component also includes two air ducts 27, which are opened on both sides inside the suction box 5. An air outlet 28 is opened on one side inside the suction box 5. After the cleaning liquid is drawn out, at this time, the cleaning liquid is inside the liquid storage cavity 22. At this time, the fan 26 is started, and the fan 26 blows out air. The air flows along the air duct 27 through the refrigerant pipe 25. After the air passes through the refrigerant pipe 25, it will carry the cold air of the refrigerant pipe 25 and move along the air duct 27 on the surface of the liquid storage cavity 22, thereby taking away the temperature of the cleaning liquid inside the liquid storage cavity 22, avoiding harm to relevant staff due to its too high temperature, and at the same time, the reduction of temperature is beneficial to subsequent processing and handling.

[0033] Among them, the installation slot is interconnected with the air duct 27 and the air outlet 28. The width of the air duct 27 from the liquid storage cavity 22 is 5 mm. A placement slot is opened inside the suction box 5 corresponding to the position of the refrigerant pipe 25. The fan 26 is located in the middle of the refrigerant pipe 25. The distance between the air duct 27 and the liquid storage cavity 22 is close, which can effectively cool the cleaning liquid inside the liquid storage cavity 22 and make it convenient for subsequent processing and handling.

[0034] Among them, the diversion port 21 is arranged at the bottom of the sliding groove. There is a certain distance between one side of the diversion port 21 and one side of the sliding groove. A flow blocking plate 29 is arranged on one side of the liquid storage cavity 22. The flow blocking plate 29 is slidably connected inside the suction box 5. The annular blocking plate 16 is eccentrically arranged outside the limiting column 15. The annular blocking plate 16 is in contact with the fixed block 14. The eccentric distance of the annular blocking plate 16 is 2 mm, and the diversion port 21 has a distance of 2 mm. The diversion port 21 is arranged at the front side of the sliding groove, which can enable the piston head 20 to better fall into the liquid storage cavity 22 during the process of pushing the cleaning liquid to move.

[0035] Working principle:

[0036] Before sucking the cleaning liquid inside the reaction box 2, protective oil is injected into the oil storage chamber 8 through the oil inlet 7. The protective oil will gradually fill the oil storage chamber 8 and the oil inlet 7. When the oil gradually fills the oil inlet 7, the piston is pressed to break through the second flow blocking film 11 of the oil inside the oil storage chamber 8 by atmospheric pressure and is sprayed out through the spray head 10. After the protective oil is sprayed out from the spray head 10 and impacts the annular blocking plate 16, it will atomize. And due to the eccentric design of the annular blocking plate 16, the impact force of the sprayed protective oil will drive the annular blocking plate 16 to rotate. The rotation of the annular blocking plate 16 drives the protective oil to be sprayed in a reverse semi-circle on the inner wall of the suction pipe 6. The protective oil adheres to the inner wall to form a protective film, thereby avoiding the oxidation of the inner wall of the pipe, preventing the reduction of the wall thickness of the inner wall of the pipe caused by oxidation, the decline of the corrosion resistance, avoiding the blockage of the pipe caused by the shedding of the oxide layer, resulting in overheating of the heating surface, and avoiding the risk of pipe explosion. At the same time, the formation of the atomized protective oil can better cover the inner wall of the pipe, thereby improving the protection effect;

[0037] When it is necessary to suck the cleaning agent, the hydraulic rod 19 is started. The start of the hydraulic rod 19 drives the piston head 20 to move. The piston head 20 moves backward and drives the cleaning liquid inside the reaction box 2 to flow into the sliding groove through the suction pipe 6 by breaking through the one-way valve 18 inside the suction pipe 6 by atmospheric pressure. After the piston head 20 moves to a certain position and is pushed forward, at this time, the one-way valve 18 inside the suction pipe 6 closes, and the one-way valve 18 inside the diversion port 21 is opened under the downward pressure. The cleaning liquid is withdrawn through the reciprocating movement of the piston head 20 and flows into the inside of the liquid storage cavity 22 to complete the suction. During suction, the mutual cooperation of the two one-way valves 18 ensures that the cleaning liquid can only flow in one direction, thereby preventing the cleaning liquid from flowing back after the extraction stops, reducing the damage to the equipment, and prolonging its service life;

[0038] After the cleaning liquid is completely drained, the cleaning liquid is then inside the liquid storage chamber 22. At this time, the fan 26 is started. The fan 26 starts to blow air, and the air passes along the air duct 27 through the refrigerant pipe 25. After the air passes through the refrigerant pipe 25, it will carry the cold air of the refrigerant pipe 25 and move along the air duct 27 on the surface of the liquid storage chamber 22, thereby taking away the temperature of the cleaning liquid inside the liquid storage chamber 22, avoiding harm to relevant staff due to its too high temperature. At the same time, the reduction of temperature is beneficial to subsequent processing and handling.

[0039] It should be noted that in this text, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article or device.

[0040] Although the embodiments of the present invention have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A semiconductor chemical solution suction device, comprising a reaction cabinet (1), a reaction frame (2) fixedly connected inside the reaction cabinet (1), a first flow-blocking film (3) fixedly connected to one side inside the reaction frame (2), a support base (4) fixedly connected to one side of the reaction cabinet (1), a suction box (5) arranged on the top of the support base (4), a suction pipe (6) fixedly connected to one side of the suction box (5), and an oil inlet (7) opened on one side of the top of the suction box (5), characterized in that: An oil storage chamber (8) is provided inside the suction pipe (6). The oil inlet (7) penetrates through the suction box (5) and the suction pipe (6) and is connected to the oil storage chamber (8). A plurality of connecting blocks (9) are fixedly connected inside the oil storage chamber (8). A plurality of spray nozzles (10) are fixedly connected inside the suction pipe (6). A plurality of the spray nozzles (10) are all connected to the oil storage chamber (8). A second flow-blocking film (11) is fixedly connected inside one end of each of the plurality of spray nozzles (10). A fixing round block (12) is fixedly connected to the outside of each of the plurality of spray nozzles (10). A plurality of connecting frames (13) are respectively fixedly connected to both sides of the plurality of fixing round blocks (12). A fixing block (14) is fixedly connected to one side of each of the plurality of connecting frames (13). A limiting column (15) is threadedly connected to the middle of one end of each of the plurality of fixing blocks (14). An annular baffle (16) is movably sleeved on one side of each of the plurality of reaction cabinets (1). A suction assembly is arranged on one side inside the suction box (5), and a temperature reduction assembly is arranged on one side inside the suction box (5).

2. The semiconductor chemical solution suction device according to claim 1, characterized in that: The suction assembly includes an installation outer ring (17). The installation outer ring (17) is fixedly connected to the outside of the suction pipe (6). A hydraulic rod (19) is fixedly connected to one side of the suction box (5). A piston head (20) is fixedly connected to one end of the hydraulic rod (19). A sliding groove is opened at the top inside the suction box (5). The piston head (20) is slidably connected inside the sliding groove. A diversion port (21) is opened at one end of the sliding groove. A liquid storage chamber (22) is opened at the lower side inside the suction box (5).

3. The semiconductor chemical solution suction device according to claim 2, characterized in that: One-way valves (18) are fixedly connected inside both the diversion port (21) and the installation outer ring (17). The diameters of the narrow openings of the suction pipe (6) and the diversion port (21) are the same. The diameter of the flow-blocking valve head at the top of the one-way valve (18) is larger than the diameters of the narrow opening of the diversion port (21) and the suction pipe (6). The diversion port (21) connects the sliding groove with the liquid storage chamber (22).

4. The semiconductor chemical solution suction device according to claim 3, characterized in that: The temperature reduction assembly includes a support bottom plate (23). The support bottom plate (23) is fixedly connected to one side of the suction box (5). A refrigerant tank (24) is fixedly connected to the top of the support bottom plate (23). Refrigerant pipes (25) are fixedly connected to both ends of the refrigerant tank (24). The refrigerant pipes (25) are fixedly connected to the suction box (5). An installation groove is opened on one side of the suction box (5). A fan (26) is fixedly connected inside the installation groove.

5. The semiconductor chemical solution suction device according to claim 4, wherein: The temperature reduction assembly further includes two air ducts (27). The two air ducts (27) are opened on both sides inside the suction box (5). An air outlet (28) is opened on one side inside the suction box (5).

6. The semiconductor chemical solution suction device according to claim 5, characterized in that: The installation groove is communicated with the air ducts (27) and the air outlet (28). The width of the air duct (27) from the liquid storage chamber (22) is 5 mm. A placement groove is opened inside the suction box (5) corresponding to the position where the refrigerant pipe (25) is located. The fan (26) is located in the middle of the refrigerant pipe (25).

7. The semiconductor chemical solution suction device according to claim 6, wherein: The diversion port (21) is arranged at the bottom of the sliding groove. There is a certain distance between one side of the diversion port (21) and one side of the sliding groove. A baffle plate (29) is arranged on one side of the liquid storage cavity (22). The baffle plate (29) is slidably connected to the inside of the suction box (5).

8. A semiconductor chemical solution suction device according to claim 7, characterized in that: The annular baffle (16) is eccentrically arranged outside the limit post (15). The annular baffle (16) is in contact with the fixed block (14).

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