Precursor transport container, precursor transport system, and precursor deposition apparatus

Abstract

A vapor phase precursor delivery system for delivering a vapor phase precursor to deposit a layer in a vapor deposition apparatus is disclosed. The precursor delivery vessel is constructed and arranged to store a solid precursor and to deliver a gas phase precursor at the vessel outlet. The system is provided with a plate provided with holes to allow gas to be transmitted between the chamber and the container portion storing the solid precursor.

Description

Technical Field

[0001] The present disclosure generally relates to a precursor delivery system for providing a gaseous precursor from a container, the system being provided with a holder, the holder being constructed and arranged to hold the container, and being constructed and arranged to deliver the gaseous precursor at a gaseous outlet. The present disclosure may also relate to a precursor delivery container, which is constructed and arranged to store a solid precursor and deliver the gaseous precursor at a container outlet.

[0002] The present disclosure also relates to a precursor deposition apparatus, such as a vertical furnace including a precursor delivery system for depositing a layer on a substrate. Background Art

[0003] A vapor phase precursor delivery system for delivering a vapor phase precursor to deposit a layer on a substrate in a reactor of a vapor phase deposition apparatus may present certain challenges. One of these challenges may be that the precursor delivery system may deliver less vapor and the precursor delivery may actually become a bottleneck for the productivity of the deposition apparatus.

[0004] The precursor delivery system can deliver less precursor because the vapor pressure of the solid precursor may be very low. The delivery of the precursor may depend on the level of the top surface of the solid precursor in the container. Because the level of the solid precursor in the container may drop during the use of the system, the solid precursor sublimated in the system may become less. The top surface of the solid precursor may also be cut by the gas flow, so that the gas flow contacts less solid precursor, and the amount of solid precursor sublimated in the system will become less. Summary of the invention

[0005] One object is to provide a precursor delivery container that is constructed and arranged to store solid precursors and deliver gaseous precursors.

[0006] Thus, a precursor delivery container may be provided that is constructed and arranged to store a solid precursor and deliver a gaseous precursor at a container outlet. The container outlet may be constructed and arranged to be in fluid communication with the container inlet via a chamber defined by a top plate and a bottom plate. The bottom plate may be constructed and arranged to be supported on the top surface of the solid precursor and to move with the top surface of the solid precursor in the container. The bottom plate may be provided with holes to allow gas to be transmitted between the chamber and the container portion storing the solid precursor, and to allow sublimated precursor to enter the chamber from the solid precursor.

[0007] According to further embodiments, a precursor delivery system for providing a gaseous precursor from a solid precursor can be provided. The system can include a container, which is constructed and arranged for storing solid precursors and is provided with a container inlet and a container outlet. The container outlet can be constructed and arranged to be in fluid communication with the container inlet via a chamber, and the chamber is constructed and arranged to be supported on the top of the solid precursor and move horizontally with the solid precursor in the container. The system can also include a retainer constructed and arranged to hold the container, an inert gas source constructed and arranged to be connected to the container inlet to deliver an inert gas to the container, and a gaseous outlet constructed and arranged to be connected to the container outlet to deliver a gaseous precursor. The chamber can be defined by a top plate and a bottom plate, and the top plate and the bottom plate are constructed and arranged to be supported on the surface of the solid precursor. The bottom plate can be provided with holes to allow gas to be transmitted between the container portion storing the solid precursor and the chamber, thereby allowing the sublimated precursor to enter the chamber from the solid precursor.

[0008] According to yet another embodiment, a delivery system for providing a gaseous precursor from a solid precursor may be provided. The system may include: a holder, which is constructed and arranged to hold a container, the container is constructed and arranged to store the solid precursor and is provided with a container inlet and a container outlet; an inert gas source, which is constructed and arranged to be connected to the container inlet to deliver the inert gas to the container; and a gas phase outlet, which is constructed and arranged to be connected to the container outlet for delivering the gaseous precursor. The holder may be constructed and arranged to allow the container to move.

[0009] According to yet another embodiment, a vapor deposition apparatus may be provided. The apparatus may include a vapor precursor delivery system for delivering vapor precursors to deposit layers on a substrate. The apparatus may be a vertical furnace including a reactor that is constructed and arranged to load a boat with a plurality of substrates. The vapor precursor delivery system may be constructed and arranged to deliver vapor precursors to deposit layers on a plurality of substrates in the reactor.

[0010] This summary is provided to introduce some concepts in a simplified form. These concepts are further described in detail in the detailed description of the example embodiments disclosed below. This summary is not intended to identify the key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Figure 1A and Figure 1B A precursor delivery system according to the prior art is disclosed.

[0012] Figure 2 A precursor delivery system according to one embodiment is disclosed.

[0013] Figure 3 Public Figure 2 Top view of the base plate of the conveyor system.

[0014] Figure 4 A precursor delivery system disposed in a holder constructed and arranged to hold a container is disclosed.

[0015] Figure 5 It is disclosed how to move a container to a holder constructed and arranged to hold the container.

[0016] Figure 6 A precursor delivery system according to another embodiment is disclosed.

[0017] It should be understood that the elements in the drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the size of some elements in the drawings may be exaggerated relative to other elements to help improve the understanding of the illustrated embodiments of the present disclosure. DETAILED DESCRIPTION

[0018] Although certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention and their obvious modifications and equivalents. Therefore, it is intended that the scope of the disclosed invention should not be limited by the specifically disclosed embodiments described below.

[0019] As used herein, the term "substrate" may refer to any one or more underlying materials, including any one or more underlying materials that may be modified or on which a device, circuit, or film may be formed. A "substrate" may be continuous or non-continuous; rigid or flexible; solid or porous; and combinations thereof. A substrate may be in any form, such as a powder, a plate, or a workpiece. A plate-like substrate may include wafers of various shapes and sizes. A substrate may be made of semiconductor materials, including, for example, silicon, silicon germanium, silicon oxide, gallium arsenide, gallium nitride, and silicon carbide.

[0020] For example, a substrate in powder form can be used in drug manufacturing. The porous substrate can include a polymer. Examples of workpieces can include medical devices (such as stents and syringes), jewelry, tool equipment, components for battery manufacturing (such as anodes, cathodes, or separators), or components of photovoltaic cells, etc.

[0021] The continuous substrate may extend beyond the boundaries of the processing chamber in which the deposition process occurs. In some processes, the continuous substrate may be moved through the processing chamber so that the process continues until the end of the substrate is reached. The continuous substrate may be provided from a continuous substrate feed system to allow the continuous substrate to be manufactured and output in any suitable form.

[0022] Non-limiting examples of continuous substrates may include sheets, nonwoven films, rolls, foils, meshes, flexible materials, bundles of continuous filaments or fibers (eg, ceramic fibers or polymer fibers). A continuous substrate may also include a carrier or sheet on which a discontinuous substrate is mounted.

[0023] Figure 1A and Figure 1B A gas phase precursor delivery system 1 is disclosed, comprising: a container inlet 3 and a container outlet 5 according to the prior art. The gas phase precursor delivery system 1 may include a container 7, which is constructed and arranged for storing a precursor 9. A gas flow 11 may be generated between the gas inlet 3 and the gas outlet 5, for example with an inert gas such as nitrogen through a head space 15 above the level of the precursor 9 in the container 7. The gas flow 11 may pick up some of the precursor 9 that sublimates 17 into the gas flow 11, which may be transported out of the container 7 via the container outlet 5.

[0024] The sublimation of the precursor 9 may depend on the level of the precursor 9 in the container 7. Since the level of the precursor 9 in the container 7 may vary from Figure 1A The relatively full container 7 in Figure 1B 7 in the relatively empty container 7, the amount of precursor 9 that sublimates 17 in the system 1 may also become lower. This may be caused by the head space 15 becoming larger, creating a larger vertical concentration gradient in the head space 15, reducing the sublimation of the precursor 9. The gas flow 11 may be further away from the precursor 9, so when the gas flow 11 reaches the container outlet 5, the gas flow 11 may have a lower precursor concentration. A precursor deposition apparatus that includes a vapor-phase precursor delivery system and receives a lower concentration of precursor may have a lower productivity.

[0025] Figure 2 A precursor delivery system 1 according to an embodiment is disclosed. The precursor delivery container 7 may be constructed and arranged to store and sublimate a solid precursor 9 and deliver a gaseous precursor at a container outlet 5. The container outlet 5 may be configured to be in fluid communication with a chamber 19 provided with a top plate 21 and a bottom plate 23. The bottom plate 23 may be constructed and arranged to be supported on the top surface of the solid precursor 9. The chamber 19 may move with the top surface of the solid precursor 9 in the container 7.

[0026] Figure 3 Public Figure 2 The bottom plate 23 may be provided with holes to allow gas to be transferred between the chamber 19 and the portion of the container 7 storing the solid precursor 9. These holes need to be adapted to the particle size of the solid precursor so that the bottom plate remains supported on the solid precursor 9.

[0027] Sublimated precursor from the solid precursor 9 may enter the chamber 19 through holes in the bottom plate 23. The bottom plate 23 may be a mesh structure to allow uniform sublimation of the solid precursor.

[0028] The chamber 19 may be provided with a wall 25 connected to the top plate 21 and the bottom plate 23 to define the chamber 19. The wall 25 may be circular. Alternatively, the wall may be omitted so that the container inner surface of the container 7 defines the chamber 19.

[0029] The container may be provided with a spring 27, for example between the inner surface of the container 7 and the top plate 21. The spring 27 may press the bottom plate 23 against the top surface of the solid precursor 9 in the container 7. When the solid precursor 9 sublimates, the spring 27 may release while continuing to press the bottom plate against the solid precursor 9.

[0030] The container 7 may be provided with a linear guide surface in the interior of the container to linearly guide the chamber 19. This guidance may be necessary for the chamber 19 to avoid it getting stuck in the container during its movement through the interior of the container 7. The guide surface may be provided on the outer surface of a guide post 29, which may be centrally located in the container 7. The guide post 29 may match a guide hole 31 in the bottom plate 23 and / or the top plate 21.

[0031] Alternatively, the guide surface may be provided by an inner surface of the container 7. The inner surface may cooperate with the top plate 21, the bottom plate 23 or the wall 25 for guiding the chamber 19.

[0032] If the solid precursor 9 does not sublime uniformly, the chamber 19 may become stuck in the container 7. This may occur if the flow to the container outlet 5 cuts an optimal path through the solid precursor 9, minimizing its resistance to flow. If the precursor sublimates, the walls of this cut path may prevent the bottom plate 23 from moving further downward. Ultimately, this may result in reduced sublimation of the precursor 9 and no sublimation of the precursor remaining in the container 7, both of which are undesirable.

[0033] The container 7 may include an actuator 33 constructed and arranged to move the solid precursor 9 in the container. The solid precursor may be in the form of particles, and by moving the container 7 and the particles, the particles may redistribute themselves in the container 7. The top surface of the solid precursor 9 may thus become / remain flat. The bottom plate 23 may start / remain moving again. Sublimation 17 may also be enhanced.

[0034] The actuator 33 may be constructed and arranged to provide linear motion. The actuator 33 may be constructed and arranged to provide reciprocating motion. The frequency of the reciprocating motion may be between 0.1 and 10000 Hz.

[0035] The actuator 33 may be provided with a controller 35 to switch the movement on and off between 1 and 0.01 Hz. This may save energy or reduce harmonic vibrations in the tool. The actuator may be constructed and arranged to move the container to move the solid particles in the container 7.

[0036] To provide linear reciprocating motion, the actuator 33 may be a linear motor. The linear motor may include a coil and a magnet. The coil may be powered with alternating current to provide reciprocating motion. The linear motor may exert a force on a weight simply to produce a vibrating motion of the container 7. The container may be supported by a flexible spring or rubber to allow vibrations without transmitting them to other components.

[0037] The container 7 may be provided with a container inlet 3 configured to be in fluid communication with the container outlet 5 via the chamber 19 and via at least one flexible tube to provide a pick-up gas flow through the chamber 19 to transport the gaseous precursor out of the chamber 19 while allowing movement of the chamber in the container. The container 7 may be provided with a heater 37. The heater 37 may be constructed and arranged to sublime the solid precursor 9.

[0038] The solid precursor 9 may be a metal chloride, such as hafnium tetrachloride (HfCl4), tantalum pentachloride (TaCl5), molybdenum pentachloride (MoCl5), zirconium tetrachloride (ZrCl4) or molybdenum dioxide dichloride (MoO2Cl2) to deposit transition metals. Molybdenum dioxide dichloride (MoO2Cl2) may have a relatively high vapor pressure and therefore may behave differently.

[0039] The container may be provided with a level measuring device to measure the level of the precursor 9. When the level of the precursor 9 becomes too low, the container 7 may be refilled.

[0040] The container 7 may be provided with a lifting device constructed and arranged to move the chamber 19 upwards when the solid precursor is substantially exhausted and may need to be refilled. The lifting device may reload the spring 27. The lifting device may have a linear drive for moving the chamber 19 upwards. The linear drive may be, for example, a motor and a spindle cooperating with a moving nut provided on the chamber 19. A controller may be provided to control the movement of the chamber 19 by the lifting device.

[0041] The container 7 may be provided with a filling port 39 for filling the container 7 with new precursor 9 when the chamber 19 is moved to the top position by the lifting device, and a cover 38 is provided to cover the filling port 39. New precursor may be provided in the container 7 below the chamber 19. The chamber 19 may be lowered onto the top surface of the solid precursor 9 and normal operation may be assumed.

[0042] The chamber 19 may be constructed and arranged to produce a constant gas flow in the chamber 19 at a substantially constant level from the surface of the precursor 9 in the container 7. During use of the system 1, the level of precursor 9 in the container 7 may decrease from a relatively full container 7 to a relatively empty container 7. However, the amount 17 of precursor 9 vaporized in the system may remain constant because the gas flow remains at a constant distance from the surface of the precursor 9 as the chamber 19 moves with the precursor level. This is advantageous because the amount of precursor in the gas flowing out of the gas outlet 5 also remains constant.

[0043] The connecting tube of the container outlet 5 may be flexible and constructed and arranged to allow the movement of the chamber 19 relative to the container 7 and to allow the movement of the container 7 caused by the actuator 33. The connecting tube of the container inlet 3 may also be flexible and constructed and arranged to allow the movement of the container 7 caused by the actuator 33. For example, the connecting tube may be made of a flexible material, such as rubber or polytetrafluoroethylene (PTFE).

[0044] The container 7 can be mounted in a frame using a flexible material such as rubber or polytetrafluoroethylene (PTFE). This allows the container 7 to be moved by the actuator 33 and allows the solid precursor 9 to rearrange itself in the container 7.

[0045] Figure 4 A precursor delivery system 1 is disclosed, which is provided with a holder 41 constructed and arranged to hold a container 7. The holder 41 may be movably suspended on a support frame 40 by a flexible cord 42 or with a hinge.

[0046] The container 7 may be constructed and arranged to store a solid precursor 9 and be provided with a container outlet 5. The container outlet 5 may be constructed and arranged to be in fluid communication with a chamber 19, which is constructed and arranged to be supported on top of the solid precursor 9 and to move horizontally with the solid precursor in the container 7. The chamber 19 may be defined by a top plate 21 and a bottom plate 23, which is constructed and arranged to be supported on the surface of the solid precursor 9. The bottom plate 23 may be provided with holes to allow gas to be transmitted between the portion of the container 7 storing the solid precursor 9 and the chamber 19, thereby allowing the sublimated precursor to enter the chamber from the solid precursor.

[0047] The support frame 40 may be provided with a gas phase outlet 43 constructed and arranged to be connectable to the container outlet 5 for delivering a gas phase precursor. This allows easy replacement of the container 7 from the holder 41 if the container 7 is empty and can be replaced with a new full container 7.

[0048] The system 1 may be provided with a rotary actuator 49 to move the container 7 and the precursor 9, the rotary actuator 49 being constructed and arranged to move the solid precursor 9 in the container 7 by applying a force between the support frame 40 and the holder 41. The rotary actuator 49 may be a motor connected to the container 7 with a pair of hinges 53 to convert the rotary motor into a linear reciprocating motion.

[0049] The support frame 40, the actuator 49 and the holder 41 are constructed and arranged to move the container 7 by a rotational or tilting motion so as to evenly spread the precursor 9 in the container 7. The actuator 49 may be constructed and arranged to rotate between 1 and 100 RPM. The actuator 49 may be provided with a controller 47 to turn the motion on and off between 1 and 0.01 Hz. This may save energy or reduce harmonic vibrations in the tool.

[0050] The support frame 40 may be provided with an inert gas source 45, which is constructed and arranged to be connectable to the container inlet 3 to deliver the inert gas to the container 7. The inert gas source 45 may be connected to the chamber 19 with a flexible tube, or the gas phase holder outlet 43 may be connected to the chamber 19 with a flexible tube to allow the container 7 to move.

[0051] Figure 5 It is disclosed how to move the container 7 to the holder 41, which is constructed and arranged to hold the container 7 to form Figure 4 The support frame 40 may be provided with a gas phase outlet 43, which is constructed and arranged to be connectable to the container outlet 5 of the container 7, for delivering the gas phase precursor 9. The support frame 40 may be provided with an inert gas source 45, which is constructed and arranged to be connectable to the container inlet 3 of the container 7 to deliver the inert gas to the container 7. This allows easy replacement of the container 7 from the holder 41 if the container 7 is empty and can be replaced with a new full container 7.

[0052] Figure 6 A precursor delivery system according to another embodiment is disclosed. The precursor delivery container 7 may be constructed and arranged to store and sublimate a solid precursor 9 and deliver a gaseous precursor at a container outlet 5. The container 7 may be provided with a container inlet 3, which is configured to be in fluid communication with the chamber 19 via at least one tube to provide a pick-up gas flow to the solid precursor 9 via holes in the bottom plate 23 and the chamber 19. The container outlet 5 may be configured to be in fluid communication with the chamber 19 through holes in the solid precursor 9 and the bottom plate 23. These holes need to accommodate the particle size of the solid precursor so that the solid precursor 9 remains supported on the bottom plate 23. The bottom plate 23 may be a mesh structure to allow uniform sublimation of the solid precursor.

[0053] The container 7 may be provided with a heater. The heater may be constructed and arranged to sublime the solid precursor 9.

[0054] The container 7 may be moved into a holder 41 constructed and arranged to hold the container 7. The support frame 40 may be provided with a gas phase outlet 43 constructed and arranged to be connectable to the container outlet 5 of the container 7 for delivering the gas phase precursor 9. The support frame 40 may be provided with an inert gas source 45 constructed and arranged to be connectable to the container inlet 3 of the container 7 to deliver the inert gas to the container 7. This allows the container 7 to be easily replaced from the holder 41 if the container 7 is empty and can be replaced with a new full container 7.

[0055] The holder 41 may be movably suspended on the support frame 40 by a flexible rope 42 or with a hinge. A rotary actuator 49 may be provided to move the container 7 and the precursor 9, the rotary actuator 49 being constructed and arranged to move the solid precursor 9 in the container 7 by applying a force between the support frame 40 and the holder 41. The rotary actuator 49 may be a motor connected to the container 7 with a pair of hinges 53 to convert the rotary motor into a linear reciprocating motion. The support frame 40, the actuator 49 and the holder 41 may be constructed and arranged to move the container 7 by a rotational or tilting motion so as to evenly spread the precursor 9 in the container 7.

[0056] The vapor phase precursor delivery system 1 can be used in a vapor deposition apparatus for delivering vapor phase precursors to deposit layers on a substrate. The vapor deposition apparatus can be a vertical furnace including a reactor that is constructed and arranged to load a boat with a plurality of substrates, and the vapor phase precursor delivery system is constructed and arranged to deliver vapor phase precursors to deposit layers on substrates in the reactor. A vertical furnace suitable for using the vapor phase precursor delivery system 1 can be described in U.S. Pat. No. 7,732,350 B2, which is incorporated herein by reference, for example.

[0057] The illustrations presented herein are not meant to be actual views of any particular material, structure, or device but are merely idealized representations used to describe embodiments of the present disclosure.

[0058] The embodiments shown and described are illustrations of the present invention and its best mode and are not intended to limit the scope of these aspects and embodiments in any way. In fact, for the sake of brevity, the traditional manufacturing, connection, preparation and other functional aspects of the system may not be described in detail. In addition, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and / or physical connections between various elements. Many alternative or additional functional relationships or physical connections may exist in actual systems, and / or may not exist in some embodiments.

[0059] It should be understood that the configuration and / or method described herein are exemplary in nature, and these specific embodiments or examples should not be considered restrictive, because many variations are possible. The specific routine or method described herein can represent one or more of any number of processing strategies. Therefore, the various actions shown can be performed in the order shown, in other orders, or omitted in some cases.

[0060] The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various processes, systems and configurations, and other features, functions, acts, and / or properties disclosed herein, as well as any and all equivalents thereof.

Claims

1. A precursor delivery container, which is constructed and arranged to store a solid precursor and deliver a gaseous precursor at a container outlet, the container outlet being constructed to be in fluid communication with a chamber defined by a top plate and a bottom plate, the bottom plate being constructed and arranged to be supported on a top surface of the solid precursor and movable with the top surface of the solid precursor in the container, wherein the bottom plate is provided with holes to allow gas to be transmitted between the chamber and a portion of the container storing the solid precursor, and to allow sublimated precursor to enter the chamber from the solid precursor.

2. The container according to claim 1, wherein The bottom plate is a mesh structure to allow uniform sublimation of the solid precursor.

3. The container according to claim 1, wherein The chamber is also defined by walls connected to the top and bottom plates.

4. The container according to claim 1, wherein The container is provided with a spring between the inner surface of the container and the chamber to press the bottom plate against the top surface of the solid precursor in the container.

5. The container according to claim 1, wherein The container is provided with a linear guide surface in the interior of the container to linearly guide the chamber during movement of the chamber through the interior of the container.

6. The container according to claim 1, wherein The container includes an actuator constructed and arranged to move a solid precursor in the container.

7. The container according to claim 6, wherein: The actuator is constructed and arranged to provide linear motion.

8. The container according to claim 6, wherein: The actuator is constructed and arranged to provide reciprocating motion.

9. The container according to claim 6, wherein: The actuator is constructed and arranged to provide a reciprocating motion at a frequency between 0.1 and 10,000 Hz.

10. The container according to claim 6, wherein The actuator is provided with a controller to switch the movement on and off between 1 and 0.01 Hz.

11. The container according to claim 1, wherein The container is provided with a container inlet, which is configured to be in fluid communication with the container outlet via the chamber and via at least one flexible tube to provide a pick-up gas flow through the chamber to transport the gas phase precursor out of the chamber while allowing the chamber to move in the container, and the container is provided with a heater, which is configured and arranged to hold and sublime metal chlorides, such as hafnium tetrachloride (HfCl4), tantalum pentachloride (TaCl5), molybdenum pentachloride (MoCl5), zirconium tetrachloride (ZrCl4) or molybdenum dioxide dichloride (MoO2Cl2) to deposit transition metals.

12. The container according to claim 1, wherein The container comprises: a lifting device constructed and arranged to lift the chamber when the solid precursor is substantially exhausted; a fill port for refilling the container with solid precursor when the chamber is raised; and Cap to cover the fill port.

13. A precursor delivery system for providing a gaseous precursor from a solid precursor, the system comprising: a container constructed and arranged to store a solid precursor and provided with a container outlet constructed and arranged to be in fluid communication with a chamber constructed and arranged to be supported on top of the solid precursor and to move horizontally with the solid precursor in the container, a holder constructed and arranged to hold the container; as well as a gas phase outlet constructed and arranged to be connected to the container outlet for delivering the gas phase precursor, wherein the chamber is defined by a top plate and a bottom plate, the bottom plate being constructed and arranged to be supported on the top surface of the solid precursor, and the bottom plate being provided with holes to allow gas to be transmitted between the container portion storing the solid precursor and the chamber, thereby allowing the sublimated precursor to enter the chamber from the solid precursor.

14. The system according to claim 13, wherein: The system includes an actuator constructed and arranged to move a solid precursor in the container.

15. The system of claim 14, wherein: The system is provided with a support frame supporting an actuator and a holder, and the actuator is constructed and arranged to apply a force between the support frame and the holder to move the container and the solid precursor.

16. The system of claim 15, wherein: The support frame, actuator and holder are constructed and arranged to move the container by a rotational or tilting movement.

17. A precursor delivery system for providing a gaseous precursor from a solid precursor, the system comprising: a holder constructed and arranged to hold a container for storing and sublimating a solid precursor; an inert gas source constructed and arranged to be connected to the container to deliver the inert gas to the container; as well as A gas phase outlet is constructed and arranged to be connected to the container to deliver a gas phase precursor, wherein the holder is constructed and arranged to allow movement of the container.

18. The system of claim 17, wherein: The system includes an actuator constructed and arranged to apply a force to the container to move the container.

19. A precursor deposition apparatus comprising the vapor phase precursor delivery system according to claim 13 for delivering a vapor phase precursor to deposit a layer on a substrate.

20. The apparatus of claim 19, wherein: The apparatus is a vertical furnace including a reactor constructed and arranged to load a boat with a plurality of substrates, and the vapor precursor delivery system is constructed and arranged to deliver a vapor precursor to deposit a layer on the plurality of substrates in the reactor.

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