Wide-range vacuum measurement composite gauge tube

Abstract

The invention relates to the technical field of vacuum measurement, in particular to a wide-range vacuum measurement composite gauge tube, which comprises an ultrahigh vacuum sensing assembly, a middle vacuum sensing assembly, a low vacuum sensing assembly and a shielding assembly, and is characterized in that the shielding assembly comprises a shielding plate, a shielding cylinder and an outer shielding flange cylinder; the shielding plate is arranged in the middle inside the outer shielding flange cylinder, one end of the shielding cylinder is connected with the shielding plate, and the other end of the shielding cylinder is fixed to the bottom face of the outer shielding flange cylinder in a sealed penetrating mode. The ultra-vacuum sensing assembly is fixedly arranged above the shielding plate; the middle vacuum sensing assembly is fixedly arranged below the shielding plate and located on one side of the shielding cylinder. The low-vacuum sensing assembly is fixedly arranged below the shielding plate and located on the other side of the shielding cylinder. According to the invention, the medium-low vacuum sensing assembly and the ultrahigh vacuum assembly are mutually compounded, so that wide-range accurate measurement from the atmospheric pressure to the ultrahigh vacuum range can be realized, and in-situ calibration of the gauge tube can be carried out.

Description

Technical Field

[0001] The present application relates to the field of vacuum measurement technology, and in particular to a wide-range vacuum measurement compound gauge. Background Art

[0002] Vacuum is a rarefied gas state below 1 standard atmospheric pressure. It is widely used in major projects such as semiconductors and accelerators. It is an important special environment in the field of scientific research and high-end manufacturing. In the integrated circuit manufacturing process, the dynamic range of vacuum pressure is 10 -9 Pa-10 5 Pa; accelerator vacuum pressure is lower than 10 -8 Pa, to ensure beam lifetime; high-end precision instruments and equipment, such as mass spectrometers and electron microscopes, also work under 10 -9 pa-10 5 Pa, 10 is required for each of the above fields -9 Pa-10 5 High-precision wide-range vacuum measuring instrument in the Pa range.

[0003] It is difficult for a vacuum gauge based on a single principle to achieve wide-range vacuum pressure measurement. Domestic and foreign countries usually select sensors based on 2-3 principles to achieve wide-range measurement. For example, Pirani gauges, piezoelectric vacuum sensors, or hot and cold cathode ionization vacuum gauges, etc. The most common method is to combine Pirani and ionization vacuum gauges. However, neither Pirani vacuum gauges nor ionization vacuum gauges are absolute vacuum measuring instruments. Their sensitivity to different gases varies greatly and cannot be evaluated. They can only be calibrated in a vacuum environment that simulates the conditions of the application site, which brings great resistance to high-precision, low-cost, and efficient vacuum measurement.

[0004] Paul C. Arnold et al. invented a wide-range vacuum measuring instrument (wide-range composite vacuum gauge, 2008, US7418869) that combines an ionization vacuum gauge, a Pirani vacuum gauge, a differential pressure film vacuum gauge and a pressure gauge. The vacuum gauge includes a hot cathode ionization vacuum estimation device that realizes 10 -7 Vacuum measurement in the range of Pa-2Pa, Pirani vacuum gauge measures 0.2Pa-6.5×10 3 Pa, differential pressure film vacuum gauge and pressure gauge can achieve 5×10 2 Pa-10 5 The vacuum gauge uses three sensors to measure the pressure from ultra-high vacuum to atmospheric pressure. However, the hot cathode outgassing and thermal radiation, the pressure difference introduced by the partition structure, and the temperature error make it impossible for each sensor to accurately measure the pressure in the same measurement area. On the one hand, it causes inconsistent measurement linearity in different measuring ranges. On the other hand, the design cannot achieve self-calibration and calibration during long-term operation. Summary of the invention

[0005] This application provides a wide range vacuum measurement compound gauge that can achieve 10 -9 Pa-10 5 Wide range vacuum measurement in the Pa range, and can ensure that the measurement range of each sensor component is effectively connected.

[0006] In order to achieve the above-mentioned purpose, the present application provides a wide-range vacuum measurement compound gauge, including an ultra-high vacuum sensing component, a medium vacuum sensing component, a low vacuum sensing component and a shielding component, wherein: the shielding component includes a shielding plate, a shielding cylinder and an outer shielding flange cylinder, the shielding plate is arranged in the middle position inside the outer shielding flange cylinder, the shielding cylinder is arranged directly below the shielding plate, one end of the shielding cylinder is connected to the shielding plate, and the other end is fixed to the bottom surface of the outer shielding flange cylinder in the form of a sealed penetration; the ultra-vacuum sensing component is an ionization type vacuum component, which is fixedly arranged above the shielding plate; the medium vacuum sensing component is a medium vacuum MEMS capacitor film type vacuum component, which is fixedly arranged below the shielding plate and located on one side of the shielding cylinder; the low vacuum sensing component is a low vacuum MEMS capacitor film type vacuum component, which is fixedly arranged below the shielding plate and located on the other side of the shielding cylinder.

[0007] Furthermore, the outer shielding flange cylinder comprises a knife-edge flange, a metal cylinder and a kovar bottom plate, wherein: the knife-edge flange is arranged on both sides outside the top end of the metal cylinder; and the kovar bottom plate is arranged at the bottom of the metal cylinder.

[0008] Furthermore, the ultra-vacuum sensing component includes a cathode, an anode grid and an ion collector, wherein: the cathode is a carbon nanotube field emission electron source, which is arranged on the side of the anode grid; the anode grid is a metal grid, which is fixed above the shielding plate by insulation; the ion collector is a long metal filament, which is arranged inside the anode grid and fixed on the shielding plate.

[0009] Furthermore, the medium vacuum sensing assembly includes a first shielding cover, a first MEMS diaphragm, a first temperature sensor and a first terminal, wherein: the first shielding cover is arranged on one side of the shielding tube and is connected to the shielding plate by screws; the first MEMS diaphragm is arranged inside the first shielding cover, and its opening is exposed to the vacuum; the first temperature sensor is arranged on the inner wall of the first shielding cover; and the first terminal is respectively arranged below the first MEMS diaphragm and the first temperature sensor.

[0010] Furthermore, the measurement range of the first MEMS membrane is 0.1Pa-10 2 Pa.

[0011] Furthermore, the low vacuum sensing assembly includes a second shielding cover, a second MEMS diaphragm, a second temperature sensor and a second terminal, wherein: the second shielding cover is arranged on the other side of the shielding tube and is connected to the shielding plate by screws; the second MEMS diaphragm is arranged inside the second shielding cover, and its opening is exposed to the vacuum; the second temperature sensor is arranged on the inner wall of the second shielding cover; and the second terminal is respectively arranged below the second MEMS diaphragm and the second temperature sensor.

[0012] Furthermore, the measurement range of the second MEMS membrane is 10 2 pa-10 5 Pa.

[0013] Furthermore, it also includes a terminal, which passes through the Kovar bottom plate in a vacuum-sealed manner and is connected to the first terminal and the second terminal respectively.

[0014] Furthermore, the first MEMS membrane and the second MEMS membrane are both formed by etching single crystal silicon and glass.

[0015] Furthermore, the first temperature sensor and the second temperature sensor can achieve accurate measurement of the temperature within the range of 0-100°C.

[0016] The wide-range vacuum measurement compound gauge provided in the present application has the following beneficial effects:

[0017] The present application realizes wide-range precise measurement from atmospheric pressure to ultra-high vacuum by combining medium and low vacuum sensing components with ultra-high vacuum components; medium vacuum sensing components and low vacuum sensing components can complete absolute vacuum pressure measurement from 0.1Pa to atmospheric pressure, and can carry out regulation in-situ calibration; the structure of the shielding plate and the shielding tube can ensure accurate and reliable ion flow measurement of the ultra-high vacuum component, and in addition, the shielding plate also ensures that the electron motion trajectory is strictly constrained in the ionization area, ensuring stable sensitivity; the setting of the shielding cover can protect the MEMS diaphragm from interference from the surrounding electromagnetic fields and thermal radiation, ensuring stable diaphragm performance and reliable and true measurement results; the integration of the temperature sensor can perform precise calibration and correction during the pressure data inversion process, effectively solving the technical problems of difficult measurement range expansion, low sensitivity and lack of in-situ calibration in the field of vacuum measurement. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The drawings constituting a part of this application are used to provide a further understanding of this application, so that other features, purposes and advantages of this application become more obvious. The schematic embodiment drawings and their descriptions of this application are used to explain this application and do not constitute an improper limitation on this application. In the drawings:

[0019] Figure 1It is a structural schematic diagram of a wide-range vacuum measurement compound gauge provided according to an embodiment of the present application;

[0020] Figure 2 is a schematic diagram of the structure of a medium vacuum sensor assembly provided according to an embodiment of the present application;

[0021] Figure 3 is a schematic structural diagram of a low vacuum sensor assembly provided according to an embodiment of the present application;

[0022] Figure 4 is a curve chart of the calibration results of the ultra-high vacuum sensor assembly provided in an embodiment of the present application;

[0023] Figure 5 is a curve chart of the calibration results of the medium vacuum sensor assembly provided in an embodiment of the present application;

[0024] Figure 6 is a curve chart of the calibration results of the low vacuum sensor assembly provided in an embodiment of the present application;

[0025] In the figure: 1-ultra-high vacuum sensing component, 11-cathode, 12-anode grid, 13-ion collector, 2-medium vacuum sensing component, 21-first shielding cover, 22-first MEMS diaphragm, 23-first temperature sensor, 24-first terminal, 3-low vacuum sensing component, 31-second shielding cover, 32-second MEMS diaphragm, 33-second temperature sensor, 34-second terminal, 4-shielding plate, 5-shielding cylinder, 6-external shielding flange cylinder, 61-knife-edge flange, 62-metal cylinder, 63-kovar base plate, 7-terminal. DETAILED DESCRIPTION

[0026] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present application.

[0027] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present application described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0028] In the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0029] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0030] In addition, the term "plurality" shall mean two or more.

[0031] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0032] like Figure 1As shown, the present application provides a wide-range vacuum measurement compound gauge, including an ultra-high vacuum sensing component 1, a medium vacuum sensing component 2, a low vacuum sensing component 3 and a shielding component, wherein: the shielding component includes a shielding plate 4, a shielding tube 5 and an outer shielding flange tube 6, the shielding plate 4 is arranged in the middle position inside the outer shielding flange tube 6, the shielding tube 5 is arranged directly below the shielding plate 4, one end of the shielding tube 5 is connected to the shielding plate 4, and the other end is fixed to the bottom surface of the outer shielding flange tube 6 in a sealed through-form; the ultra-vacuum sensing component is an ionization type vacuum component, which is fixedly arranged above the shielding plate 4; the medium vacuum sensing component 2 is a medium vacuum MEMS capacitor film type vacuum component, which is fixedly arranged below the shielding plate 4 and located on one side of the shielding tube 5; the low vacuum sensing component 3 is a low vacuum MEMS capacitor film type vacuum component, which is fixedly arranged below the shielding plate 4 and located on the other side of the shielding tube 5.

[0033] Specifically, the wide range vacuum measurement compound gauge provided in the embodiment of the present application can achieve a range from atmospheric pressure to ultra-high vacuum (10 -9 Pa-10 5 Pa) vacuum pressure measurement, according to different measurement requirements, can be used with different vacuum gauge control systems, has good electromagnetic shielding and thermal shielding effects, and high measurement accuracy. Among them, the ultra-high vacuum sensor component 1 adopts an ionization vacuum component, which can invert 10 -9 The vacuum pressure in the range of Pa-1Pa reaches 10 -10 Pa level, realizing oscillatory control of motion trajectory, ensuring high sensitivity better than 0.1Pa -1 ; Medium vacuum sensor component 2 adopts medium vacuum MEMS capacitive thin film vacuum component, which can achieve 0.1Pa-10 2 The low vacuum sensor component 3 uses a low vacuum MEMS capacitive film vacuum component, which can achieve 10 2 Pa-10 5 Measurement of vacuum pressure within the range of Pa; in addition to the role of fixed support, the shielding component mainly plays a shielding role, which can effectively reduce the electromagnetic field interference, thermal radiation interference and gas flow disturbance generated by the charged electrodes in each vacuum sensing component; the electrostatic field composed of the shielding tube 5 and the shielding plate 4 can ensure that the gas phase ions are effectively collected by the ion collecting electrode 13, and effectively suppress the influence of electromagnetic interference.

[0034] Furthermore, the outer shielding flange cylinder 6 includes a knife-edge flange 61, a metal cylinder 62 and a kovar bottom plate 63, wherein: the knife-edge flange 61 is arranged on both sides of the outer top of the metal cylinder 62; the kovar bottom plate 63 is arranged at the bottom of the metal cylinder 62. The outer shielding flange cylinder 6 as a whole adopts a stainless steel knife-edge sealing structure of stainless steel-kovar-ceramic transition sealing, which mainly plays a role of protection and shielding. The flange is not nickel-plated to maintain the original metal properties of stainless steel, and the outgassing rate is less than 10 -11 Pam 3 / s, achieving low outgassing.

[0035] Furthermore, the ultra-vacuum sensor assembly includes a cathode 11, an anode grid 12 and an ion collector 13, wherein: the cathode 11 is a carbon nanotube field emission electron source, which is arranged on the side of the anode grid 12; the anode grid 12 is a metal grid, which is fixedly arranged above the shielding plate 4 in an insulating manner; the ion collector 13 is a long metal filament, which is arranged inside the anode grid 12 and fixed on the shielding plate 4. Figure 4 The following is the actual calibration result of the ultra-vacuum sensor component calibrated on the vacuum standard device. -9 Pa to 1Pa, the ionization vacuum gauge shows good measurement linearity.

[0036] Specifically, the cathode 11 can be a thermal electron emission cathode, the operating temperature is usually higher than 1000K, the material can be selected from iridium wire coated with yttrium oxide, iridium wire coated with thorium oxide, etc., and the structure can be selected from a single straight wire, a V-shaped filament or a spiral filament; the cathode 11 can also be an emission array cathode, the macroscopic operating temperature is room temperature, and a carbon nanotube array or a metal cone tip array can be selected, and the structure is usually planar or approximately point-shaped. In the embodiment of the present application, the cathode 11 is preferably a carbon nanotube field emission electron source, located on the side of the anode grid 12, and the anode grid 12 is a metal grid, which is fixedly supported above the shielding plate 4 by an insulating method; the ion collector 13 is a long metal filament. The cathode 11 draws out electrons under the action of a high-intensity electric field, effectively suppressing the interference of macroscopic thermal radiation and light irradiation effects. The emitted electrons enter the inside of the grid through the anode grid 12. Under the electric field formed by the anode grid 12, the shielding plate 4, the ion collector 13 and the outer shielding flange tube 6, the electron beam emitted by the cathode 11 oscillates back and forth inside the anode grid 12. During the oscillation of the electrons, they collide with gas molecules to be ionized. The ions are received by the ion collector 13 under the action of the electric field, and the inversion 10 is performed. -9 Vacuum pressure in the range of Pa-1Pa.

[0037] More specifically, in the embodiment of the present application, the cathode 11 uses a carbon nanotube electron source, which has the advantages of no thermal effect and fast response, and is installed on the outside of the anode grid 12, with a spacing of 1.5mm, and the top of the cathode 11 is 5mm away from the top of the anode grid 12. The anode is a cage grid, made of platinum-iridium alloy, with a diameter of 22mm, a height of 50mm, and a pitch of 3mm. The anode grid 12 is connected to the conductive core column by resistance welding, the shielding plate 4 has a diameter of 30mm, and a 2mm conical hole in the center. The ion collector 13 is a 0.05mm tungsten wire, located on the central axis of the cage grid, and has good ion collection efficiency. A grounded shielding tube 5 is set on the outside of the ion collector 13, and the shielding plate 4 is fixed on the top of the shielding tube 5, which can effectively suppress the interference of the electromagnetic field of the ionization space on the gas phase ions, and also based on the unique electromagnetic field structure, it also ensures the effective movement path of the electrons.

[0038] Further, such as Figure 2 As shown, the medium vacuum sensing assembly 2 includes a first shielding cover 21, a first MEMS diaphragm 22, a first temperature sensor 23 and a first terminal 24, wherein: the first shielding cover 21 is arranged on one side of the shielding tube 5 and is connected to the shielding plate 4 by screws; the first MEMS diaphragm 22 is arranged inside the first shielding cover 21, and its opening is exposed to the vacuum; the first temperature sensor 23 is arranged on the inner wall of the first shielding cover 21; the first terminal 24 is respectively arranged below the first MEMS diaphragm 22 and the first temperature sensor 23.

[0039] Furthermore, the measurement range of the first MEMS membrane 22 is 0.1Pa-10 2 Pa.

[0040] Further, such as Figure 3 As shown, the low vacuum sensing component 3 includes a second shielding cover 31, a second MEMS diaphragm 32, a second temperature sensor 33 and a second terminal 34, wherein: the second shielding cover 31 is arranged on the other side of the shielding tube 5, and is connected to the shielding plate 4 by screws; the second MEMS diaphragm 32 is arranged inside the second shielding cover 31, and its opening is exposed to the vacuum; the second temperature sensor 33 is arranged on the inner wall of the second shielding cover 31; the second terminal 34 is respectively arranged below the second MEMS diaphragm 32 and the second temperature sensor 33.

[0041] Furthermore, the measurement range of the second MEMS membrane 32 is 10 2 Pa-10 5 Pa.

[0042] Specifically, the medium vacuum sensor component 2 and the low vacuum sensor component 3 both adopt a MEMS capacitor thin film vacuum structure, and both include a shielding cover, a MEMS diaphragm, a temperature sensor, and a terminal block; two MEMS capacitor thin film vacuum components of different ranges are symmetrically arranged below the shielding plate 4, and the MEMS diaphragm made of silicon-based materials is fixed on the ceramic base and fixedly connected to the terminal 7 below through the terminal block. The surface-mounted temperature sensor is fixed on the upper surface of the shielding cover, and the dual-capacitance differential measurement mode design can suppress the measurement error introduced by temperature changes. Among them, the shielding cover is connected to the shielding plate 4 by screws to achieve equipotential and mechanical fixation. The outer surface of the shielding cover is high-gloss polished and has high emissivity characteristics of thermal radiation, which effectively suppresses the thermal effect from the ionization vacuum component; the opening of the MEMS diaphragm is exposed to the vacuum, and the gas molecules generate macroscopic pressure in the MEMS diaphragm, and the vacuum pressure is reflected by the deformation of the diaphragm; the measurement range of the first MEMS diaphragm 22 is 0.1Pa-10 2 Pa, such as Figure 5 The figure shows the actual calibration result of the medium vacuum sensor component 2 on the vacuum standard device, completing the 0.1Pa-10 2 The pressure in the range of Pa is accurately measured, showing good linearity; the second MEMS diaphragm 32 measures the range of 10 2 Pa-10 5 Pa, such as Figure 6 The figure shows the actual calibration result of the low vacuum sensor component 3 on the vacuum standard device. 2 Pa-10 5 The pressure within the Pa range is accurately measured, showing good linearity; the temperature sensor is attached to the inner wall of the shielding cover to achieve accurate measurement of the rarefied gas temperature in the local space, and is used to correct the heat runaway effect caused by the temperature difference of the MEMS capacitor film component.

[0043] Furthermore, it also includes a terminal 7, which passes through the Kovar base plate 63 in a vacuum-sealed manner, and is respectively connected to the first terminal 24 and the second terminal 34. The terminal 7 is entirely passed through the Kovar base plate 63 at the bottom of the metal cylinder 62, and is connected to the terminal, providing electrical and mechanical connections for the MEMS diaphragm, the shielding cylinder 5, and the temperature sensor.

[0044] Furthermore, the first MEMS diaphragm 22 and the second MEMS diaphragm 32 are both formed by etching single crystal silicon and glass. MEMS diaphragms are mainly used for pressure sensing in the medium and low vacuum range.

[0045] Furthermore, the first temperature sensor 23 and the second temperature sensor 33 can achieve accurate measurement of the temperature in the range of 0-100° C. The temperature sensor is used for direct measurement of the local temperature of the medium and low vacuum sensing components, with a measurement range of 0-100° C., for accurate correction in the pressure inversion process.

[0046] Specifically, the wide range vacuum measurement compound gauge provided in the embodiment of the present application covers a measurement range of 10 -9 Pa-10 5 Pa, realizing the full range from atmospheric pressure to ultra-high vacuum, and being able to use the MEMS capacitor thin film vacuum structure to complete the in-situ calibration of the ionization vacuum component, solving the problem that the measurement data of different sensors of wide-range vacuum measuring instruments cannot be connected and integrated; at the same time, the temperature measurement function is implanted, effectively overcoming the influence of the heat runaway effect induced by the thermal effect of the ionization vacuum gauge for a long time, and realizing accurate temperature correction in the process of pressure data inversion.

[0047] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A wide range vacuum measurement compound gauge, characterized in that: It includes ultra-high vacuum sensing components, medium vacuum sensing components, low vacuum sensing components and shielding components, among which: The shielding assembly comprises a shielding plate, a shielding cylinder and an outer shielding flange cylinder, wherein the shielding plate is arranged at a middle position inside the outer shielding flange cylinder, the shielding cylinder is arranged directly below the shielding plate, one end of the shielding cylinder is connected to the shielding plate, and the other end is fixed to the bottom surface of the outer shielding flange cylinder in a sealed penetration form; The ultra-vacuum sensing component is an ionization type vacuum component, which is fixedly arranged above the shielding plate; The medium vacuum sensor component is a medium vacuum MEMS capacitive film vacuum component, which is fixedly arranged below the shielding plate and located on one side of the shielding cylinder; The low vacuum sensor component is a low vacuum MEMS capacitor film vacuum component, which is fixedly arranged below the shielding plate and located on the other side of the shielding cylinder.

2. The wide range vacuum measurement compound gauge according to claim 1, characterized in that: The outer shielding flange cylinder comprises a knife-edge flange, a metal cylinder and a Kovar bottom plate, wherein: The knife-edge flanges are arranged on both sides of the outside of the top end of the metal cylinder; The kovar bottom plate is arranged at the bottom of the metal cylinder.

3. The wide range vacuum measurement compound gauge according to claim 2, characterized in that: The ultra-vacuum sensor assembly includes a cathode, an anode grid and an ion collector, wherein: The cathode is a carbon nanotube field emission electron source, which is arranged on the side of the anode grid; The anode grid is a metal grid, which is fixedly arranged above the shielding plate in an insulating manner; The ion collector is a long metal filament, which is arranged inside the anode grid and fixed on the shielding plate.

4. The wide range vacuum measurement compound gauge according to claim 3, characterized in that: The medium vacuum sensor assembly includes a first shielding cover, a first MEMS diaphragm, a first temperature sensor and a first terminal, wherein: The first shielding cover is arranged on one side of the shielding cylinder and connected to the shielding plate by screws; The first MEMS diaphragm is arranged inside the first shielding cover, and an opening thereof is exposed to vacuum; The first temperature sensor is arranged on the inner wall of the first shielding cover; The first connecting terminals are respectively arranged below the first MEMS diaphragm and the first temperature sensor.

5. The wide range vacuum measurement compound gauge according to claim 4, characterized in that: The measurement range of the first MEMS membrane is 0.1Pa-10 2 Pa.

6. The wide range vacuum measurement compound gauge according to claim 5, characterized in that: The low vacuum sensor assembly includes a second shielding cover, a second MEMS diaphragm, a second temperature sensor and a second terminal, wherein: The second shielding cover is arranged on the other side of the shielding cylinder and connected to the shielding plate by screws; The second MEMS membrane is arranged inside the second shielding cover, and an opening thereof is exposed to vacuum; The second temperature sensor is arranged on the inner wall of the second shielding cover; The second connecting terminals are respectively arranged below the second MEMS diaphragm and the second temperature sensor.

7. The wide range vacuum measurement compound gauge according to claim 6, characterized in that: The measurement range of the second MEMS membrane is 10 2 Pa-10 5 Pa.

8. The wide range vacuum measurement compound gauge according to claim 7, characterized in that: It also includes a terminal, which passes through the Kovar base plate in a vacuum-sealed manner and is connected to the first terminal and the second terminal respectively.

9. The wide range vacuum measurement compound gauge according to claim 8, characterized in that: The first MEMS membrane and the second MEMS membrane are both formed by etching single crystal silicon and glass.

10. The wide range vacuum measurement compound gauge according to claim 9, characterized in that: The first temperature sensor and the second temperature sensor achieve accurate measurement of temperature within the range of 0-100°C.

Images