Multifunctional film, preparation method and application thereof, and light-transmitting panel

Abstract

The invention discloses a multifunctional film, a preparation method and application thereof and a light-transmitting panel. The multifunctional film comprises a multi-layer film and a hydrophobic film layer which are connected in an overlapped mode, the multi-layer film comprises a plurality of high-refractive-index film layers and a plurality of low-refractive-index film layers, and the high-refractive-index film layers and the low-refractive-index film layers are sequentially and alternately arranged in an overlapped mode. One side, connected with the hydrophobic film layer, of the multilayer film is the high-refractive-index film layer, and the hydrophobic film layer comprises an element Si, an element C and an element O. The multifunctional film disclosed by the invention can realize multiple effects of surface hydrophobicity, aging resistance, wear resistance, antireflection and the like of a product.

Description

Technical Field

[0001] The present application relates to the fields of materials and display technology, and in particular to a multifunctional film and a preparation method thereof, and a light-transmitting panel. Background Art

[0002] Low reflectivity materials are widely used in display panels, lens imaging systems, solar cells and other fields. Anti-reflective materials can eliminate stray light in devices and improve the light transmittance of components. In the prior art, the preparation of anti-reflective coatings includes multiple stacked layers of high and low refractive index materials using physical vapor deposition or chemical vapor deposition. The film layer prepared by the above method has a low reflectivity, but it cannot meet the self-cleaning effect of the anti-reflective coating surface, and it is difficult to use it outdoors and in harsh environments. For example, when display panels, lens devices, solar cells, etc. are used outdoors, a large amount of moisture and dust will accumulate on the surface, thereby affecting the display effect and reducing the transmission efficiency. Therefore, materials with anti-reflection and surface self-cleaning functions are increasingly attracting attention. At present, a relatively novel approach is to prepare a submicron film layer structure on the surface of the sample, which can achieve the effects of anti-reflection and hydrophobicity at the same time, but the submicron film layer structure itself has low strength and poor mechanical properties, and cannot achieve the purpose of anti-wear. In addition, the preparation process of the submicron film layer structure is cumbersome and costly, and it is difficult to directly apply it to the outermost layer of the device. Summary of the invention

[0003] Based on this, it is necessary to provide a multifunctional film. The multifunctional film of the present invention can be used on the surface of light-transmitting products to achieve multiple effects such as hydrophobicity, anti-aging, wear resistance, and anti-reflection on the surface of the light-transmitting products.

[0004] An embodiment of the present application provides a multifunctional film.

[0005] A multifunctional film comprises a multilayer film and a hydrophobic film layer which are overlapped and connected. The multilayer film comprises a plurality of high refractive index film layers and a plurality of low refractive index film layers. The plurality of high refractive index film layers and the plurality of low refractive index film layers are alternately overlapped in sequence. The side of the multilayer film which is connected to the hydrophobic film layer is the high refractive index film layer. The hydrophobic film layer comprises element Si, element C and element O.

[0006] In some of the embodiments, the carbon-oxygen ratio of the bottom of the hydrophobic membrane layer in contact with the multilayer membrane is (0.2-2.5):(0.7-2.3).

[0007] In some of the embodiments, the carbon-oxygen ratio of the surface layer of the hydrophobic film layer away from the multilayer film is (1.6-2.7):(0.5-1).

[0008] In some of the embodiments, the carbon-oxygen ratio in the hydrophobic film layer changes continuously or in stages from a side in contact with the multilayer film to a side away from the multilayer film.

[0009] In some embodiments, the hydrophobic film layer includes a siloxane film layer.

[0010] In some embodiments, the side of the multilayer film away from the hydrophobic film layer is the high refractive index film layer.

[0011] In some embodiments, in the multi-layer film, the number of the high refractive index film layers is not less than two.

[0012] In some embodiments, the high refractive index film layer has a thickness of 1 nm to 150 nm.

[0013] In some embodiments, the low refractive index film layer has a thickness of 1 nm to 200 nm.

[0014] In some embodiments, the thicknesses of different low refractive index film layers are different.

[0015] In some of the embodiments, the thickness of the hydrophobic film layer is 1 nm to 200 nm.

[0016] In some embodiments, the thickness of the hydrophobic film layer is no greater than 100 nm.

[0017] In some embodiments, TiO 2 、 2 O 5 , HfO 2 , Nb 2 O 5 、ZrO 2 、Al 2 O 3 One or more of the .

[0018] In some embodiments, the low refractive index film layer is made of a material comprising SiO 2 MgF 2 One or both of the following.

[0019] An embodiment of the present application also provides a method for preparing a multifunctional membrane.

[0020] A method for preparing a multifunctional membrane comprises the following steps:

[0021] A multilayer film is prepared on a substrate, which is composed of a plurality of high-refractive index film layers and a plurality of low-refractive index film layers alternately overlapped in sequence;

[0022] And, a hydrophobic film layer is prepared on the high refractive index film layer on the outermost side of the multilayer film.

[0023] In some of the embodiments, when preparing a multilayer film consisting of a plurality of high refractive index film layers and a plurality of low refractive index film layers alternately overlapped in sequence on a substrate, one or more of atomic layer deposition, magnetron sputtering, ion beam sputtering, and evaporative deposition methods are used.

[0024] In some of the embodiments, when preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: introducing a monomer source and a protective gas into a reaction chamber for deposition.

[0025] In some embodiments, the monomer source is selected from one or more of hexamethyldisiloxane, octamethylcyclotetrasiloxane, hexamethyldisiloxane, tetramethyldisiloxane and tetraethylsiloxane.

[0026] In some of the embodiments, when preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: a monomer source and a protective gas are introduced into a reaction chamber, and plasma is introduced at the same time to perform an ionization reaction to prepare the hydrophobic film layer.

[0027] In some embodiments, the protective gas includes argon. The carrier gas flow rate of the monomer source is 50 sccm-2000 sccm, the power of the plasma source is 100 W-8000 W, and the argon flow rate is 100 sccm-5000 sccm.

[0028] In some of the embodiments, when preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: a monomer source and a reactive plasma gas are sequentially introduced into a reaction chamber, and an atomic layer deposition method is used to perform a plasma reaction to prepare the hydrophobic film layer.

[0029] In some embodiments, the reactive plasma gas includes argon or hydrogen. The carrier gas flow rate of the monomer source is 50 sccm-2000 sccm, the power of the plasma source is 100 W-8000 W, and the flow rate of the argon or hydrogen is 100 sccm-5000 sccm.

[0030] In some of the embodiments, when preparing the hydrophobic film layer, the concentration of the monomer source in the reaction chamber is controlled to be changed and / or the discharge power of the plasma source is controlled to be changed to adjust the carbon-oxygen ratio of the hydrophobic film layer.

[0031] An embodiment of the present application also provides an application of a multifunctional film.

[0032] A multifunctional film according to any one of the above or a multifunctional film prepared by any one of the above preparation methods is used at least in a display device, a lens, and a solar cell.

[0033] An embodiment of the present application further provides a light-transmitting panel.

[0034] A light-transmitting panel comprises any one of the multifunctional films described above or a multifunctional film prepared by any one of the preparation methods described above.

[0035] The multifunctional film of the present invention comprises a multilayer film and a hydrophobic film layer connected in an overlapping manner. The side of the multilayer film connected to the hydrophobic film layer is the high refractive index film layer. The high refractive index film layer is used as the outermost film layer of the multilayer anti-reflection film to replace the low refractive index material SiO2 on the surface of the product in the traditional technology. 2 The layer can not only achieve lower reflectivity and surface self-cleaning effect, but also has anti-aging and wear-resistant effects. The deposition method of the hydrophobic film layer can be carried out at room temperature, which increases the application scenarios of the hydrophobic anti-reflection film layer.

[0036] In summary, compared with the traditional technology, the multifunctional membrane of the present application has the following technical effects:

[0037] (1) After the high refractive index film layer and the low refractive index film layer are alternately stacked, the outermost high refractive index film layer is then connected by a hydrophobic film layer. The hydrophobic film layer realizes the low reflectivity and hydrophobic function of the product surface, and has the advantages of anti-aging and wear resistance.

[0038] (2) The present application can reduce the reflectivity of the entire multifunctional film by increasing the number of high refractive index film layers and the number of low refractive index film layers in the multilayer film.

[0039] (3) The carbon-oxygen ratio of the side of the hydrophobic film layer in contact with the multilayer film is (0.2-2.5):(0.7-2.3), and the carbon-oxygen ratio of the side of the hydrophobic film layer away from the multilayer film is (1.6-2.7):(0.5-1). The hydrophobic film layer can be grown by regulating the carbon-oxygen ratio to further regulate the hydrophobicity of the hydrophobic film layer and the bonding force of the multilayer film. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application, and those skilled in the art can obtain other drawings based on these drawings without creative work.

[0041] In order to more completely understand the present application and its beneficial effects, the following description will be made in conjunction with the accompanying drawings. In the following description, the same reference numerals represent the same parts.

[0042] FIG1 is a schematic diagram of a multifunctional membrane according to an embodiment of the present invention;

[0043] FIG2 is a reflectivity curve diagram of the multifunctional film prepared in Example 1 of the present invention, wherein the abscissa is the wavelength and the ordinate is the reflectivity;

[0044] FIG3 is a schematic diagram of the contact angle of the multifunctional film prepared in Example 1 of the present invention;

[0045] FIG4 is a reflectivity curve diagram of a multifunctional film prepared according to another embodiment of the present invention, wherein the abscissa is wavelength and the ordinate is reflectivity;

[0046] FIG5 is a reflectivity curve diagram of the multifunctional film prepared in Comparative Example 1, wherein the abscissa is the wavelength and the ordinate is the reflectivity;

[0047] FIG6 is a schematic diagram of the contact angle of the multifunctional film prepared in Comparative Example 1.

[0048] Description of Reference Numerals

[0049] 10. Multifunctional film; 100. Multilayer film; 101. High refractive index film layer; 102. Low refractive index film layer; 200. Hydrophobic film layer. DETAILED DESCRIPTION

[0050] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.

[0051] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0052] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0053] In the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0054] In the description of the present invention, "several" means more than one, "many" means more than two, "greater than", "less than", "exceed", etc. are understood to exclude the number itself, and "above", "below", "within", etc. are understood to include the number itself. If there is a description of "first" or "second", it is only used for the purpose of distinguishing the technical features, and cannot be understood as indicating or implying the relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0055] In this article, "optionally", "optional", "optional" means optional, that is, it means to be selected from any of the two parallel solutions of "yes" or "no". If there are multiple "optional" in a technical solution, unless otherwise specified and there is no contradiction or mutual restriction, each "optional" is independent. In this application, the descriptions such as "optionally contain" and "optionally include" mean "contain or not contain".

[0056] In the present application, when it comes to a numerical interval (i.e., a numerical range), unless otherwise specified, the distribution of the optional numerical values ​​in the numerical interval is considered to be continuous, and includes the two numerical endpoints (i.e., the minimum and maximum values) of the numerical interval, and each numerical value between the two numerical endpoints. Unless otherwise specified, when the numerical interval only refers to an integer in the numerical interval, it includes the two endpoint integers of the numerical range, and each integer between the two endpoints, which is equivalent to directly listing each integer. When multiple numerical ranges are provided to describe features or characteristics, these numerical ranges can be combined. In other words, unless otherwise specified, the numerical range disclosed in the present application should be understood to include any and all sub-ranges included therein. The "numerical value" in the numerical interval can be any quantitative value, such as a number, a percentage, a ratio, etc. "Numerical interval" allows for a broad range of quantitative intervals such as percentage intervals, ratio intervals, and ratio intervals.

[0057] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which the present invention belongs. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0058] The embodiment of the present application provides a multifunctional film to solve the problems in the prior art of preparing a submicron-level film layer with both anti-reflection and surface self-cleaning functions, that is, the submicron-level film layer structure has low strength, poor mechanical properties, and cannot achieve wear resistance; and the submicron-level film layer structure has a complicated preparation process, high cost, and is difficult to be directly applied to the outermost layer of the device. The multifunctional film will be described below in conjunction with the accompanying drawings.

[0059] The multifunctional film provided in the embodiment of the present application is exemplified in Figure 1, which is a schematic diagram of the structure of the multifunctional film provided in the embodiment of the present application. The multifunctional film of the present application can be used for anti-reflection purposes of light-transmitting products.

[0060] In order to more clearly illustrate the structure of the multifunctional membrane, the multifunctional membrane will be introduced below with reference to the accompanying drawings.

[0061] For example, please refer to FIG1 , a multifunctional film 10 includes a multilayer film 100 and a hydrophobic film layer 200 that are overlapped and connected. The multilayer film 100 includes a plurality of high refractive index film layers 101 and a plurality of low refractive index film layers 102. Please refer to FIG1 , the plurality of high refractive index film layers 101 and the plurality of low refractive index film layers 102 are alternately overlapped in sequence. The side of the multilayer film 100 connected to the hydrophobic film layer 200 is the high refractive index film layer 101. The hydrophobic film layer 200 includes element Si, element C and element O.

[0062] The multifunctional film 10 of the present invention includes an overlapping multilayer film 100 and a hydrophobic film layer 200. The side of the multilayer film 100 connected to the hydrophobic film layer 200 is a high refractive index film layer 101. The hydrophobic film layer 200 is used as the outermost film layer, which can not only achieve lower reflectivity and surface self-cleaning effects, but also have anti-aging and wear-resistant effects. The deposition method of the hydrophobic film layer 200 can be carried out at room temperature, wherein the room temperature can be 15°C~38°C, preferably 20°C~28°C, which can increase the application scenarios of the multifunctional film 10.

[0063] In some embodiments, the carbon-oxygen ratio of the bottom of the hydrophobic film 200 in contact with the multilayer film 100 is (0.2-2.5):(0.7-2.3). Preferably, the carbon-oxygen ratio of the bottom of the hydrophobic film 200 in contact with the multilayer film 100 is preferably (0.7-2.2):(0.9-2.2).

[0064] In some embodiments, the carbon-oxygen ratio of the surface of the hydrophobic film 200 away from the multilayer film 100 is (1.6-2.7):(0.5-1). Preferably, the carbon-oxygen ratio of the surface of the hydrophobic film 200 away from the multilayer film 100 is preferably (1.7-2.4):(0.6-0.95).

[0065] In some of the embodiments, the carbon-oxygen ratio in the hydrophobic film layer changes continuously or in stages from a side in contact with the multilayer film to a side away from the multilayer film.

[0066] The continuous change of the carbon-oxygen ratio of the hydrophobic film layer can achieve good adhesion and bonding force on the side in contact with the multilayer film, and good hydrophobicity and self-cleaning effect on the side away from the multilayer film.

[0067] In some embodiments, the hydrophobic film layer 200 includes a siloxane film layer.

[0068] In some embodiments, as shown in FIG. 1 , a side of the multilayer film 100 away from the hydrophobic film layer 200 is a high refractive index film layer 101 .

[0069] In some embodiments, in the multi-layer film 100 , the number of the high refractive index film layer 101 is not less than two.

[0070] In some embodiments, in the multilayer film 100, the number of high refractive index film layers 101 is greater than or equal to three layers. For example, refer to FIG. 1 , which shows that the number of high refractive index film layers 101 is three layers. It is not difficult to understand that in other examples, the number of high refractive index film layers 101 can also be four layers, five layers, six layers, etc. The present application can reduce the reflectivity of the entire multifunctional film 10 by appropriately increasing the number of high refractive index film layers 101 and the number of low refractive index film layers 102 in the multilayer film 100.

[0071] In some embodiments, the thickness of the high refractive index film layer 101 is 1nm~150nm. Preferably, the thickness of the high refractive index film layer 101 is 10nm~120nm. More preferably, the thickness of the high refractive index film layer 101 is 20nm~100nm. In one specific example, the thickness of the high refractive index film layer 101 is 1nm; in another specific example, the thickness of the high refractive index film layer 101 is 150nm; it is not difficult to understand that in other examples, the thickness of the high refractive index film layer 101 can also be 5nm, 15nm, 20nm, 25nm, 30nm, 35nm, 40nm, 45nm, 50nm, 55nm, 60nm, 65nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm, 110nm, 120nm, 130nm, 140nm or other values ​​and ranges.

[0072] In some embodiments, different high refractive index film layers 101 have different thicknesses. The thickness of the high refractive index film layers 101 at different locations can be adaptively selected according to actual application scenarios.

[0073] In some embodiments, the thickness of the low refractive index film layer 102 is 1nm~200nm. Preferably, the thickness of the low refractive index film layer 102 is 10nm~150nm. More preferably, the thickness of the low refractive index film layer 102 is 20nm~100nm. In one specific example, the thickness of the low refractive index film layer 102 is 1nm; in another specific example, the thickness of the low refractive index film layer 102 is 200nm; it is not difficult to understand that in other examples, the thickness of the low refractive index film layer 102 can also be 5nm, 10nm, 15nm, 20nm, 25nm, 30nm, 35nm, 40nm, 45nm, 55nm, 60nm, 65nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm, 110nm, 120nm, 130nm, 140nm, 160nm, 170nm, 190nm or other values ​​and ranges.

[0074] In some of the embodiments, different low refractive index film layers 102 have different thicknesses, and the thicknesses of the low refractive index film layers 102 at different positions can be adaptively selected according to actual application scenarios.

[0075] In some embodiments, the thickness of the hydrophobic film layer 200 is 1nm~200nm. Preferably, the thickness of the hydrophobic film layer 200 is not greater than 100nm. In one specific example, the thickness of the hydrophobic film layer 200 is 50nm; in another specific example, the thickness of the hydrophobic film layer 200 is 200nm; it is not difficult to understand that in other examples, the thickness of the hydrophobic film layer 200 can also be 5nm, 15nm, 20nm, 25nm, 30nm, 35nm, 40nm, 45nm, 55nm, 60nm, 65nm, 70nm, 75nm, 80nm, 85nm, 90nm, 95nm, 100nm, 120nm, 130nm, 135nm, 140nm, 150nm, 155nm, 165nm, 180nm, 190nm, 195nm or other values ​​and ranges.

[0076] For example, in a specific example, the number of layers of the high refractive index film layer 101 is equal to three layers, and correspondingly, the number of layers of the low refractive index film layer 102 is two layers. The film system structure in the multilayer film 100 is a first high refractive index film layer 101, a first low refractive index film layer 102, a second high refractive index film layer 101, a second low refractive index film layer 102, and a third high refractive index film layer 101, wherein the thickness of the first high refractive index film layer 101 is 10nm~18nm; the thickness of the first low refractive index film layer 102 is 33nm~35nm; the thickness of the second high refractive index film layer 101 is 65nm~70nm; the thickness of the second low refractive index film layer 102 is 1.5nm~3nm; the thickness of the third high refractive index film layer 101 is 42nm~45nm.

[0077] For another example, in a specific example, the number of layers of the high refractive index film layer 101 is equal to four layers, and correspondingly, the number of layers of the low refractive index film layer 102 is three layers. The film system structure in the multilayer film 100 is a first high refractive index film layer 101, a first low refractive index film layer 102, a second high refractive index film layer 101, a second low refractive index film layer 102, a third high refractive index film layer 101, a third low refractive index film layer 102, and a fourth high refractive index film layer 101, wherein the thickness of the first high refractive index film layer 101 is 10nm~18nm; the thickness of the first low refractive index film layer 102 is 33nm~35nm; the thickness of the second high refractive index film layer 101 is 65nm~70nm; the thickness of the second low refractive index film layer 102 is 1.5nm~3nm; the thickness of the third high refractive index film layer 101 is 42nm~45nm; the thickness of the third low refractive index film layer 102 is 0.5nm~5nm; the thickness of the fourth high refractive index film layer 101 is 40nm~60nm.

[0078] In some embodiments, the material of the high refractive index film layer 101 includes TiO 2 、 2 O 5 , HfO 2 , Nb 2 O 5 、ZrO 2 、Al 2 O 3 One or more of the .

[0079] In some embodiments, the low refractive index film layer 102 is made of a material including SiO 2 MgF 2 One or both of the following.

[0080] An embodiment of the present application also provides a method for preparing the multifunctional film 10 .

[0081] It should be noted that, in this article, unless otherwise specified, each reaction step can be carried out in the order described herein, or can be carried out in a non-sequential manner. For example, other steps may be included between each reaction step, and the order of the reaction steps may also be appropriately swapped. This can be determined by the technician based on conventional knowledge and experience. Preferably, the reaction method herein is carried out sequentially.

[0082] A method for preparing a multifunctional film 10 comprises the following steps:

[0083] A multilayer film 100 is prepared on a substrate, wherein a plurality of high refractive index film layers 101 and a plurality of low refractive index film layers 102 are alternately overlapped in sequence.

[0084] And, a hydrophobic film layer 200 is prepared on the outermost high refractive index film layer 101 of the multi-layer film 100. The structure of the prepared multi-functional film 10 is shown in FIG1 .

[0085] In some of the embodiments, when preparing a multilayer film 100 consisting of multiple high refractive index film layers 101 and multiple low refractive index film layers 102 alternately overlapped in sequence on a substrate, one or more of atomic layer deposition, magnetron sputtering, ion beam sputtering, and evaporation deposition methods are used.

[0086] In some embodiments, when the high refractive index film layer 101 and the low refractive index film layer 102 are prepared by atomic layer deposition, the process includes: using an inert gas such as Ar and / or N with a flow rate of 100 sccm to 5000 sccm. 2 Carry the source into the chamber, and after the purge is complete, use an inert gas such as Ar and / or N with a flow rate of 100 sccm~5000 sccm 2 The source is brought into the chamber to participate in the reaction and purge, and the process is repeated to deposit each high refractive index film layer 101; the source is brought into the chamber to participate in the reaction and purge using the same method as above, and the process is repeated to deposit each low refractive index film layer 102, and the required thickness can be controlled.

[0087] In some of the embodiments, when a magnetron sputtering method is used to prepare a high refractive index film layer 101 and a low refractive index film layer 102, the process includes: using a radio frequency power supply to ionize an inert gas such as Ar, the power of the power supply is 200W~8000W, and the flow rate of Ar is 50sccm~1000sccm, and the generated argon ions bombard the surface of the target material so that its atoms are sputtered and deposited on the substrate, and the high refractive index film layer 101 and the low refractive index film layer 102 are alternately deposited by changing the target material, and the required thickness can be controlled.

[0088] In some of the embodiments, when the high refractive index film layer 101 and the low refractive index film layer 102 are prepared by an ion beam sputtering method, the process includes: using an ion source to ionize an inert gas such as Ar, the ion source power is 200W~8000W, and the Ar flow rate is 100sccm~2000sccm, bombarding the target material with the generated ion beam flow so that its atoms are sputtered and deposited on the substrate, and the high refractive index film layer 101 and the low refractive index film layer 102 are alternately deposited by changing the target material, and the required thickness can be controlled.

[0089] In some embodiments, when the high refractive index film layer 101 and the low refractive index film layer 102 are prepared by evaporation deposition, the process includes: placing the high refractive index material and the low refractive index material to be evaporated in an evaporation crucible respectively, controlling the evaporation current to 10A~15A, and the vacuum degree of the cavity to be less than 10 -4Pa, the high refractive index film layer 101 and the low refractive index film layer 102 are alternately deposited and the required thickness is controlled.

[0090] In some of the embodiments, when preparing the hydrophobic film layer 200 on the outermost high refractive index film layer 101 of the multilayer film 100, the following steps are included: introducing a monomer source and a protective gas into a reaction chamber for deposition.

[0091] In some embodiments, the monomer source is selected from one or more of hexamethyldisiloxane, octamethylcyclotetrasiloxane, hexamethyldisiloxane, tetramethyldisiloxane and tetraethylsiloxane.

[0092] In some embodiments, when preparing the hydrophobic film layer 200 on the outermost high refractive index film layer 101 of the multilayer film 100, the following steps are included:

[0093] A precursor monomer source and a protective gas are introduced into the reaction chamber, and a PECVD (Plasma-Enhanced Chemical Vapor Deposition) method is used to perform an ionization reaction to prepare the hydrophobic film layer 200 .

[0094] In some embodiments, when the hydrophobic film layer 200 is prepared by the PECVD method, the protective gas includes argon (Ar).

[0095] In some embodiments, when the hydrophobic film layer 200 is prepared by the PECVD method, the carrier gas flow rate of the precursor monomer source is 50 sccm~2000 sccm, the ion source power is 100W~8000W, and the protective gas flow rate is 100 sccm~5000 sccm. Preferably, the carrier gas flow rate of the precursor monomer source is 10 sccm~500 sccm. Preferably, the ion source power is 1000W~5000W. Preferably, the protective gas flow rate is 500 sccm~3000 sccm.

[0096] In some embodiments, when preparing the hydrophobic film layer 200 on the outermost high refractive index film layer 101 of the multilayer film 100, the following steps are included:

[0097] A precursor monomer source and a reactive plasma gas are introduced into the reaction chamber, and a plasma reaction is performed by a PEALD (Plasma-Enhanced Atomic Layer Deposition) method to prepare the hydrophobic film layer 200 .

[0098] In some embodiments, when the hydrophobic film layer 200 is prepared by the PEALD method, the reactive plasma gas includes argon (Ar) or hydrogen (H 2 ).

[0099] In some embodiments, when the hydrophobic film layer 200 is prepared by the PEALD method, the carrier gas flow rate of the monomer source during the reaction is 50 sccm~2000 sccm, the ion source power is 100 W~8000 W, and the flow rate of argon or hydrogen is 100 sccm~5000 sccm. Preferably, the carrier gas flow rate of the precursor monomer source during the reaction is 10 sccm~500 sccm, and the ion source power is 500 W~5000 W. Preferably, the flow rate of argon or hydrogen is 500 sccm~3000 sccm.

[0100] In some embodiments, when preparing the hydrophobic film layer 200, the concentration of the monomer source in the reaction chamber is controlled to change and / or the discharge power of the plasma source is controlled to change to adjust the carbon-oxygen ratio of the hydrophobic film layer. By adjusting the concentration of the monomer source in the reaction chamber to change or adjusting the power of the plasma discharge to change, the deposition ratio of carbon atoms and oxygen atoms in the deposited hydrophobic film can be adjusted, and then the carbon-oxygen ratio of the growing hydrophobic film can be adjusted. For example, the carbon-oxygen ratio of the side where the hydrophobic film layer 200 contacts the multilayer film 100 is controlled to be (0.2-2.5): (0.7-2.3). Preferably, the carbon-oxygen ratio of the bottom where the hydrophobic film layer 200 contacts the multilayer film 100 is controlled to be (0.7-2.2): (0.9-2.2). Further preferably, the carbon-oxygen ratio of the bottom where the hydrophobic film layer 200 contacts the multilayer film 100 is controlled to be (1-2): (1-2). It should be noted that the side of the hydrophobic film layer 200 in contact with the multi-layer film 100 may be a region of 1 / 4 to 1 / 2 of the thickness of the hydrophobic film layer 200 in contact with the multi-layer film 100 in the thickness direction.

[0101] In some of the embodiments, when preparing the hydrophobic film layer 200, the carbon-oxygen ratio of the side of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to be (1.6-2.7): (0.5-1). Preferably, the carbon-oxygen ratio of the surface layer of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to be (1.7-2.4): (0.6-0.95). Further preferably, the carbon-oxygen ratio of the surface layer of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to be (2-2.4): (0.75-0.9). It should be noted that the side of the hydrophobic film layer 200 away from the multilayer film 100 can be a region of 1 / 4 to 1 / 2 thickness away from the multilayer film 100 in the thickness direction of the hydrophobic film layer 200.

[0102] In some of the embodiments, the carbon-oxygen ratio in the hydrophobic film layer 200 changes continuously or in stages from the side in contact with the multilayer film 100 to the side away from the multilayer film 100. The continuous change makes the hydrophobic film layer 200 itself have higher wear resistance.

[0103] In some embodiments, the above-mentioned continuous change includes one or more of linear continuous increase, linear continuous decrease, nonlinear continuous increase, and nonlinear continuous decrease. The above-mentioned staged change includes one or more of staged increase, staged decrease, staged increase followed by decrease, staged decrease followed by increase, staged increase or decrease alternating regularly, and staged increase or decrease alternating irregularly.

[0104] Preferably, in the present application, the side of the hydrophobic film layer 200 in contact with the multilayer film 100 is controlled to have a lower carbon-oxygen ratio, which can achieve a high bonding force between the hydrophobic film layer 200 and the multilayer film 100, and the side of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to have a higher carbon-oxygen ratio and higher hydrophobicity, thereby making the hydrophobic film layer 200 have higher hydrophobicity on the basis of good bonding with the multilayer film 100.

[0105] An embodiment of the present application also provides an application of a multifunctional film.

[0106] Any of the above multifunctional films or the multifunctional films prepared by any of the above preparation methods can be applied to display devices, lenses, and solar cells.

[0107] An embodiment of the present application further provides a light-transmitting panel.

[0108] A light-transmitting panel comprises any one of the multifunctional films 10 described above or a multifunctional film 10 prepared by any one of the preparation methods described above.

[0109] In some of the embodiments, the substrate of the light-transmitting panel may be a glass plate, such as K9 glass.

[0110] In some of the embodiments, the light-transmitting panel can be applied to products such as a display device panel, a lens of a lens imaging system, or a glass panel of a solar cell.

[0111] Example 1

[0112] This embodiment provides a multifunctional film 10 .

[0113] The method for preparing the multifunctional film 10 of this embodiment comprises the following steps:

[0114] The high refractive index film layer 101 and the low refractive index film layer 102 are alternately prepared on a K9 glass substrate by an atomic layer deposition method. The high refractive index film layer 101 is TiO 2 Material Preparation TiO 2 The low refractive index film layer 102 is SiO 2 Material Preparation SiO 2The number of high refractive index film layers 101 is three, and the number of low refractive index film layers 102 is two, forming a multilayer film 100 with high refractive index film layers 101 on both sides.

[0115] A hydrophobic film layer 200 is prepared on the high refractive index film layer 101 on one side of the multilayer film 100. The precursor hexamethyldisiloxane (HMDSO) and the protective gas argon (Ar) are introduced into the reaction chamber, and the hydrophobic film layer 200 is prepared by ionization reaction using the PECVD method. The hydrophobic film layer 200 is a siloxane film layer. During the reaction, the carrier gas flow rate of the precursor HMDSO monomer source is 50sccm, the ion source power is 500W, the argon gas flow rate is 750sccm, the chamber pressure is 25Pa, and the reaction chamber temperature is room temperature. The carbon-oxygen ratio of the bottom of the hydrophobic film layer 200 in contact with the multilayer film 100 is controlled to be 0.8:1, and the carbon-oxygen ratio of the surface of the hydrophobic film layer 200 away from the multilayer film 100 is 2:0.8.

[0116] The film structure formed is TiO 2 Film / SiO 2 Film / TiO 2 Film / SiO 2 Film / TiO 2 Membrane layer / hydrophobic membrane layer 200, the thickness of each layer of the membrane structure is 15nm±2nm, 35nm±2nm, 70nm±2nm, 2nm±2nm, 42nm±2nm, and 90nm±2nm respectively.

[0117] As shown in Figure 2, Figure 2 is a reflectivity curve of the multifunctional film 10 prepared in Example 1, R<0.5%@420nm-708nm, in the wavelength range of 420nm to 708nm, the reflectivity (R) of the surface of the multifunctional film 10 is less than 0.5%, which shows that the multifunctional film 10 of this embodiment has a lower reflectivity in a wider wavelength range (420nm to 708nm). Referring to Figure 3, Figure 3 is a schematic diagram of the contact angle of the multifunctional film 10 prepared in Example 1 of the present invention, and the contact angle measurement value is about 102°, which shows that the multifunctional film 10 of Example 1 has good hydrophobicity. Wipe the surface of the K9 glass back and forth 50 times with an alcohol dust-free cloth loaded with a 100g weight. The contact angle of the multifunctional film 10 is almost unchanged before and after wiping, and the multifunctional film 10 has good wear resistance. The K9 glass was placed in a constant temperature and humidity chamber at 85% humidity and 85°C for aging. After 200 hours, the reflectivity remained unchanged and the contact angle of the multifunctional film 10 was about 100°. It can be seen that the multifunctional film 10 of this embodiment has good anti-aging performance.

[0118] Example 2

[0119] This embodiment provides a multifunctional film 10 .

[0120] The method for preparing the multifunctional film 10 of this embodiment comprises the following steps:

[0121] The high refractive index film layer 101 and the low refractive index film layer 102 are alternately prepared on a K9 glass substrate by an atomic layer deposition method. The high refractive index film layer 101 is TiO 2 Material Preparation TiO 2 The low refractive index film layer 102 is SiO 2 Material Preparation SiO 2 The number of high refractive index film layers 101 is four, and the number of low refractive index film layers 102 is three, forming a multilayer film 100 with high refractive index film layers 101 on both sides.

[0122] A hydrophobic film layer 200 is prepared on the high refractive index film layer 101 on one side of the multilayer film 100. The precursor octamethylcyclotetrasiloxane (OMCTS) and the protective gas argon (Ar) are introduced into the reaction chamber, and the hydrophobic film layer 200 is prepared by ionization reaction using the PEALD method, wherein during the reaction process, the carrier gas flow rate of the precursor OMCTS monomer source is 50sccm, the ion source power is 500W, the argon flow rate is 750sccm, the chamber pressure is 25Pa, and the reaction chamber temperature is room temperature. The carbon-oxygen ratio of the bottom of the hydrophobic film layer 200 in contact with the multilayer film 100 is controlled to be 0.8:1, and the carbon-oxygen ratio of the surface of the hydrophobic film layer 200 away from the multilayer film 100 is 2:0.8.

[0123] The film structure formed is TiO 2 Film / SiO 2 Film / TiO 2 Film / SiO 2 Film / TiO 2 Film / SiO 2 Film / TiO 2 Membrane layer / hydrophobic membrane layer 200, the thickness of each layer of the membrane structure is 5nm±2nm, 55nm±2nm, 20nm±2nm, 28nm±2nm, 72nm±2nm, 7nm±2nm, 35nm±2nm, and 90nm±2nm respectively.

[0124] As shown in FIG. 4 , FIG. 4 is a reflectivity curve of a multifunctional film 10 prepared in another embodiment of the present invention. It can be seen from FIG. 4 that R<0.38%@416nm-708nm. In the wavelength range of 416nm to 708nm, the reflectivity (R) on the surface of the multifunctional film 10 is lower than 0.38%. It can be seen that the multifunctional film 10 of this embodiment has a lower reflectivity in a wider wavelength range (416nm to 708nm). Moreover, compared with Example 1, it can be seen that the 8-layer film structure in Example 2 has a larger reflectivity width than the 6-layer film structure in Example 1, the average tolerance of the reflectivity becomes smaller, and the uniformity is better. It can be seen that when the TiO 2 Film, SiO 2 The reflectivity can be reduced by increasing the number of film layers.

[0125] Example 3

[0126] This embodiment provides a multifunctional film 10 .

[0127] The multifunctional film 10 of this embodiment is prepared by a preparation method substantially the same as that of embodiment 1, except that in embodiment 3, the precursor is hexamethyldisiloxane (HMDSO). The carbon-oxygen ratio of the bottom of the hydrophobic film layer 200 in contact with the multilayer film 100 is controlled to be 1.5:1, and the carbon-oxygen ratio of the surface of the hydrophobic film layer 200 away from the multilayer film 100 is 2.2:0.7.

[0128] The reflectivity of the multifunctional film 10 prepared in Example 3 is: R<0.5%@420nm-710nm. In the wavelength range of 420nm to 710nm, the reflectivity (R) of the surface of the multifunctional film 10 is lower than 0.5%. It can be seen that the multifunctional film 10 of this Example 3 has a lower reflectivity in a wider wavelength range (420nm to 710nm).

[0129] Example 4

[0130] This embodiment provides a multifunctional film 10 .

[0131] The multifunctional film 10 of this embodiment is prepared by a preparation method substantially the same as that of embodiment 2, except that in embodiment 4, the precursor is octamethylcyclotetrasiloxane (OMCTS). The carbon-oxygen ratio of the bottom of the hydrophobic film layer 200 in contact with the multilayer film 100 is controlled to be 0.5:2, and the carbon-oxygen ratio of the surface of the hydrophobic film layer 200 away from the multilayer film 100 is 2.5:0.5.

[0132] The reflectivity of the multifunctional film 10 prepared in Example 4 is: R<0.5%@420nm-710nm. In the wavelength range of 420nm to 710nm, the reflectivity (R) of the surface of the multifunctional film 10 is lower than 0.5%. It can be seen that the multifunctional film 10 of this Example 4 has a lower reflectivity in a wider wavelength range (420nm to 710nm).

[0133] Example 5

[0134] This embodiment provides a multifunctional film 10 .

[0135] The multifunctional film 10 of this embodiment is prepared by using a preparation method substantially the same as that of embodiment 1, except that in embodiment 5, the material of the high refractive index film layer 101 is Al 2 O 3 The material of the low refractive index film layer 102 is MgF 2 .

[0136] The reflectivity of the multifunctional film 10 prepared in Example 5 is: R<0.5%@420nm-680nm. In the wavelength range of 420nm to 680nm, the reflectivity (R) of the surface of the multifunctional film 10 is lower than 0.5%. It can be seen that the multifunctional film 10 of this Example 5 has a lower reflectivity in a wider wavelength range (420nm to 680nm).

[0137] Example 6

[0138] This embodiment provides a multifunctional film 10 .

[0139] The multifunctional film 10 of this embodiment is prepared by using a preparation method substantially the same as that of embodiment 2, except that in embodiment 6, the material of the high refractive index film layer 101 is Ta 2 O 5 The material of the low refractive index film layer 102 is SiO 2 .

[0140] The reflectivity of the multifunctional film 10 prepared in Example 6 is: R<0.5%@420nm-700nm. In the wavelength range of 420nm to 700nm, the reflectivity (R) of the surface of the multifunctional film 10 is lower than 0.5%. It can be seen that the multifunctional film 10 of this Example 6 has a lower reflectivity in a wider wavelength range (420nm to 700nm).

[0141] Example 7

[0142] This embodiment provides a multifunctional film 10 .

[0143] The multifunctional membrane 10 of this embodiment is prepared by using a preparation method substantially the same as that of Embodiment 1, except that in Embodiment 7, the thickness of the hydrophobic membrane layer 200 is 200 nm.

[0144] The reflectivity of the multifunctional film 10 prepared in Example 7 is: R<0.5%@420nm-705nm. In the wavelength range of 420nm to 705nm, the reflectivity (R) of the surface of the multifunctional film 10 is lower than 0.5%. It can be seen that the multifunctional film 10 of this Example 7 has a lower reflectivity in a wider wavelength range (420nm to 705nm).

[0145] Example 8

[0146] This embodiment provides a multifunctional film 10 .

[0147] The multifunctional membrane 10 of this embodiment is prepared by using a preparation method substantially the same as that of Embodiment 1, except that in Embodiment 8, the preparation process of the hydrophobic membrane layer 200 adopts the PEALD method in Embodiment 2.

[0148] The reflectivity of the multifunctional film 10 prepared in Example 8 is: R<0.5%@420nm-708nm. In the wavelength range of 420nm to 708nm, the reflectivity (R) of the surface of the multifunctional film 10 is lower than 0.5%. It can be seen that the multifunctional film 10 of this Example 8 has a lower reflectivity in a wider wavelength range (420nm to 708nm).

[0149] Comparative Example 1

[0150] This comparative example provides an anti-reflection film.

[0151] The method for preparing the anti-reflection film of this comparative example is basically the same as that of Example 1 in the steps of preparing the high refractive index film layer 101 and the low refractive index film layer 102, but the comparative example 1 does not contain the hydrophobic film layer 200, and specifically includes the following steps:

[0152] The high refractive index film layer 101 and the low refractive index film layer 102 are alternately prepared on a K9 glass substrate by an atomic layer deposition method. The high refractive index film layer 101 is TiO 2 Material Preparation TiO 2 The low refractive index film layer 102 is SiO 2 Material Preparation SiO 2 The number of layers of the high refractive index film layer 101 is three, and the number of layers of the low refractive index film layer 102 is three, forming a multilayer film 100.

[0153] The film structure formed is TiO 2 Film / SiO 2 Film / TiO2 Film / SiO 2 Film / TiO 2 Film / TiO 2 The thickness of each layer of the film layer and the film structure are 15nm±2nm, 35nm±2nm, 70nm±2nm, 2nm±2nm, 42nm±2nm, and 90nm±2nm respectively.

[0154] As shown in FIG5 , FIG5 is a reflectivity curve of the multifunctional film 10 prepared in Comparative Example 1. The reflectivity R of the multilayer film 100 is less than 0.5%@426nm-700nm. In the wavelength range of 426nm to 700nm, the reflectivity (R) of the surface of the anti-reflection film is less than 0.5%. It can be seen that the reflectivity width of the anti-reflection film of the comparative example is smaller. Compared with Example 1, the reflection bandwidth of Comparative Example 1 is reduced. As shown in FIG6 , FIG6 is a schematic diagram of the contact angle of the multifunctional film 10 prepared in Example 1 of the present invention. The contact angle of the multilayer film 100 is about 77°. It can be seen that Comparative Example 1 does not contain the hydrophobic film layer 200, and the anti-reflection film prepared in Comparative Example 1 is not hydrophobic.

[0155] Comparative Example 2

[0156] This comparative example provides an anti-reflection film.

[0157] The preparation method of the anti-reflection film of this comparative example is basically the same as that of Example 1, except that, in the preparation of the multilayer film 100 in Comparative Example 2, the number of layers of the high refractive index film layer 101 is two, and the number of layers of the low refractive index film layer 102 is three, so as to form a multilayer film 100 with low refractive index film layers 102 on both sides. The film system structure formed is SiO 2 Film / TiO 2 Film / SiO 2 Film / TiO 2 Membrane layer / hydrophobic membrane layer 200, the thickness of each layer of the membrane structure is 150nm±2nm, 11nm±2nm, 35nm±2nm, 110nm±2nm, 90nm±2nm

[0158] The reflectivity of the multifunctional film prepared in this comparative example is: R<0.5%@424nm-705nm. In the wavelength range of 424nm to 705nm, the reflectivity (R) of the surface of the multifunctional film is lower than 0.5%. It can be seen that the multifunctional film of this comparative example 2 has a lower reflectivity in a wider wavelength range (424nm to 705nm).

[0159] Comparative Example 3

[0160] This comparative example provides an anti-reflection film.

[0161] The preparation method of the anti-reflection film of this comparative example is basically the same as that of Example 2, except that, in the preparation of the multilayer film 100 in Comparative Example 3, the number of layers of the high refractive index film layer 101 is three, and the number of layers of the low refractive index film layer 102 is four, so as to form a multilayer film 100 with low refractive index film layers 102 on both sides. The film system structure formed is SiO 2 Film / TiO 2 Film / SiO 2 Film / TiO 2 Film / SiO 2 Film / TiO 2 Film / SiO 2 Membrane layer / hydrophobic membrane layer 200, the thickness of each layer of the membrane structure is 55nm±2nm, 20nm±2nm, 28nm±2nm, 72nm±2nm, 7nm±2nm, 35nm±2nm, 5nm±2nm, and 90nm±2nm respectively.

[0162] The multifunctional film prepared in this comparative example cannot achieve the anti-reflection effect.

[0163] Comparative Example 4

[0164] This comparative example provides a multifunctional film.

[0165] The multifunctional membrane of this comparative example is prepared by using a preparation method substantially the same as that of Example 1, except that in this comparative example, the thickness of the hydrophobic membrane layer is 300 nm.

[0166] The multifunctional film prepared in this comparative example cannot achieve the anti-reflection effect.

[0167] In summary, compared with the conventional technology, the multifunctional film 10 of the present application has the following technical effects:

[0168] (1) After the high refractive index film layer 101 and the low refractive index film layer 102 are alternately stacked, the outermost high refractive index film layer 101 is further stacked and connected to the hydrophobic film layer 200, so as to achieve low reflectivity and hydrophobic function on the surface of the product, and have the advantages of anti-aging and wear resistance.

[0169] (2) When the hydrophobic film layer 200 is used to replace the traditional silicon oxide film, the reflectivity will increase to a certain extent. Therefore, the present application can reduce the reflectivity of the entire multifunctional film 10 by increasing the number of high refractive index film layers 101 and the number of low refractive index film layers 102 in the multilayer film 100.

[0170] (3) The carbon-oxygen ratio of the bottom of the hydrophobic film layer 200 in contact with the multilayer film 100 is (0.2-2.5):(0.7-2.3), and the carbon-oxygen ratio of the surface of the hydrophobic film layer 200 away from the multilayer film 100 is (1.6-2.7):(0.5-1). The hydrophobic film layer 200 can be grown by regulating the carbon-oxygen ratio to further regulate the hydrophobicity of the hydrophobic film layer 200 and the bonding force of the multilayer film 100.

[0171] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0172] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0173] The above-mentioned embodiments only express several implementation methods of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the patent of the present invention. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A multifunctional membrane, characterized in that: It includes overlappingly connected multilayer films and hydrophobic film layers, wherein the multilayer film includes multiple high refractive index film layers and multiple low refractive index film layers, and the multiple high refractive index film layers and the multiple low refractive index film layers are alternately overlapped in sequence, wherein the side of the multilayer film connected to the hydrophobic film layer is the high refractive index film layer, and wherein the hydrophobic film layer includes element Si, element C and element O.

2. The multifunctional film according to claim 1, characterized in that The carbon-oxygen ratio of the bottom of the hydrophobic film layer in contact with the multilayer film is (0.2-2.5):(0.7-2.3); And / or, the carbon-oxygen ratio of the surface layer of the hydrophobic film layer away from the multilayer film is (1.6-2.7):(0.5-1); And / or, the carbon-oxygen ratio in the hydrophobic film layer changes continuously or in stages from a side in contact with the multilayer film to a side away from the multilayer film.

3. The multifunctional film according to claim 1, characterized in that The hydrophobic film layer includes a siloxane film layer.

4. The multifunctional film according to any one of claims 1 to 3, characterized in that: The side of the multilayer film far away from the hydrophobic film layer is the high refractive index film layer.

5. The multifunctional film according to any one of claims 1 to 3, characterized in that: In the multi-layer film, the number of the high refractive index film layers is not less than two.

6. The multifunctional film according to any one of claims 1 to 3, characterized in that: The thickness of the high refractive index film layer is 1nm~150nm.

7. The multifunctional film according to any one of claims 1 to 3, characterized in that: The thickness of the low refractive index film layer is 1nm~200nm.

8. The multifunctional film according to any one of claims 1 to 3, characterized in that: The thickness of the hydrophobic film layer is 1nm~200nm; Preferably, the thickness of the hydrophobic film layer is not greater than 100 nm.

9. The multifunctional film according to any one of claims 1 to 3, characterized in that: The preparation material of the high refractive index film layer includes one or more of TiO2, Ta2O5, HfO2, Nb2O5, ZrO2, and Al2O3.

10. The multifunctional film according to any one of claims 1 to 3, characterized in that: The low refractive index film layer is prepared from materials including one or both of SiO2 and MgF2.

11. A method for preparing a multifunctional membrane, characterized in that: The steps include: A multilayer film is prepared on a substrate, which is composed of a plurality of high-refractive index film layers and a plurality of low-refractive index film layers alternately overlapped in sequence; And, a hydrophobic film layer is prepared on the high refractive index film layer on the outermost side of the multilayer film.

12. The method for preparing a multifunctional membrane according to claim 11, characterized in that: When preparing a multilayer film consisting of a plurality of high refractive index film layers and a plurality of low refractive index film layers alternately overlapped in sequence on a substrate, one or more of atomic layer deposition, magnetron sputtering, ion beam sputtering, and evaporation deposition methods are used.

13. The method for preparing a multifunctional membrane according to claim 12, characterized in that: When preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: a monomer source and a protective gas are introduced into a reaction chamber for deposition; the monomer source is selected from one or more of hexamethyldisiloxane, octamethylcyclotetrasiloxane, hexamethyldisiloxane, tetramethyldisiloxane and tetraethylsiloxane.

14. The method for preparing a multifunctional membrane according to claim 13, characterized in that: When preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: introducing a monomer source and a protective gas into a reaction chamber, and simultaneously introducing plasma to perform an ionization reaction to prepare the hydrophobic film layer.

15. The method for preparing a multifunctional membrane according to claim 14, characterized in that: The protective gas includes argon; the carrier gas flow rate of the monomer source is 50 sccm-2000 sccm, the power of the plasma source is 100 W-8000 W, and the argon flow rate is 100 sccm-5000 sccm.

16. The method for preparing a multifunctional membrane according to claim 13, characterized in that: When preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: a monomer source and a reactive plasma gas are sequentially introduced into a reaction chamber, and an atomic layer deposition method is used to perform a plasma reaction to prepare the hydrophobic film layer.

17. The method for preparing a multifunctional membrane according to claim 16, characterized in that: The reactive plasma gas includes argon or hydrogen; the carrier gas flow rate of the monomer source is 50 sccm~2000 sccm, the power of the plasma source is 100W~8000W, and the flow rate of argon or hydrogen is 100 sccm~5000 sccm.

18. The method for preparing a multifunctional membrane according to any one of claims 14 to 17, characterized in that: When preparing the hydrophobic film layer, the concentration of the monomer source in the reaction chamber is controlled to be changed and / or the discharge power of the plasma source is controlled to be changed to adjust the carbon-oxygen ratio of the hydrophobic film layer.

19. Use of the multifunctional film according to any one of claims 1 to 10 or the multifunctional film prepared by the preparation method according to any one of claims 11 to 18 at least in display devices, lenses, and solar cells.

20. A light-transmitting panel, characterized in that: The invention comprises the multifunctional film according to any one of claims 1 to 10 or the multifunctional film prepared by the preparation method according to any one of claims 11 to 18.

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