Layout construction methods, apparatus, equipment, computer storage media and program products

Abstract

The application discloses a layout construction method and device, equipment, computer storage medium and program product, and relates to the technical field of semiconductors. The method comprises the following steps: determining N parameter variables matched with a target test pattern type based on the target test pattern type meeting layout construction requirements; drawing M test pattern groups corresponding to M parameter variable combinations, and constructing an initial layout containing the M test pattern groups based on the M parameter variable combinations; the M parameter variable combinations are determined based on N parameter variables under different values; based on an attribute limitation rule matched with the target test pattern type, marking test pattern groups in which the values of the parameter variables in the initial layout do not meet the attribute limitation rule, and obtaining an intermediate layout; performing a Boolean operation on the initial layout and the intermediate layout, and obtaining a target layout meeting layout manufacturing standards. According to the embodiment of the application, the layout construction can be more efficient and accurate.

Description

Technical Field

[0001] This application belongs to the field of semiconductor technology, and in particular relates to a layout construction method, apparatus, device, computer storage medium and program product. Background Technology

[0002] In semiconductor integrated circuit manufacturing, photomasks play a crucial role in the photolithography process. As the master template for complex chip patterns, they are formed by creating a mask pattern structure on a transparent substrate using an opaque light-blocking film. The pattern information is then transferred to the silicon wafer through exposure using a corresponding ratio. However, when constructing the layout corresponding to the test mask, some phenomena may occur that do not conform to actual production process specifications. Therefore, before fabricating the layout, it is necessary to ensure that the attribute parameters of multiple test patterns in the layout conform to actual production process specifications to avoid undesirable test patterns during actual production. However, existing layout construction methods suffer from cumbersome parameter settings for test patterns, low layout construction efficiency, and low user satisfaction.

[0003] Therefore, the industry still urgently needs a new user map construction scheme to effectively improve map construction efficiency while ensuring map accuracy, thereby achieving the goal of fully improving user map construction satisfaction. Summary of the Invention

[0004] This application provides a layout construction method, apparatus, device, computer storage medium, and program product, which can realize layout construction more efficiently and accurately, thereby effectively improving the overall layout construction efficiency and increasing user satisfaction.

[0005] In a first aspect, embodiments of this application provide a layout construction method, the layout construction method comprising:

[0006] Based on the target test pattern type that meets the layout construction requirements, determine N parameter variables that match the target test pattern type, where N is a positive integer;

[0007] Based on M combinations of parameter variables, M test pattern groups corresponding to the M combinations of parameter variables are drawn, and an initial layout containing M test pattern groups is constructed. The M combinations of parameter variables are determined based on N parameter variables with different values, where M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern.

[0008] Based on the attribute constraint rules for matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain intermediate layouts;

[0009] Boolean operations are performed on the initial and intermediate layouts to obtain the target layout that conforms to the layout production standards.

[0010] In some possible implementations, before drawing M test pattern groups corresponding one-to-one with the M parameter variable combinations and constructing an initial layout containing the M test pattern groups, the layout construction method further includes:

[0011] It receives configuration input for the values ​​of N parameter variables, including the custom value range and custom step size for each of the N parameter variables;

[0012] In response to the configuration input, based on the custom value range and custom step size of each of the N parameter variables, determine M combinations of parameter variables.

[0013] In some possible implementations, before marking test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules based on the target test pattern type matching, and obtaining the intermediate layout, the layout construction method further includes:

[0014] Based on the pre-defined correspondence between multiple test pattern types and multiple manufacturing rules, the target MRC script corresponding to the target test pattern type is determined. The target MRC script includes attribute restriction rules.

[0015] Based on the attribute constraint rules for matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain intermediate layouts, including:

[0016] By running the target MRC script, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules are marked, thus obtaining the intermediate layout.

[0017] In some possible implementations, the N parameter variables include a target parameter variable, and the attribute constraint rules include the minimum and / or maximum standard values ​​corresponding to the target parameter variable; based on the attribute constraint rules matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain an intermediate layout, including:

[0018] The values ​​of the target parameter variables in each of the M test pattern groups are compared with the minimum and maximum standard values ​​to determine the comparison results.

[0019] Based on the comparison results, target test pattern groups whose target parameter variables in the initial layout do not conform to the attribute restriction rules are marked;

[0020] An intermediate layout is obtained based on the initial layout after marking the target test pattern group.

[0021] In some possible implementations, based on the comparison results, target test pattern groups whose values ​​of target parameter variables in the initial layout do not conform to the attribute constraint rules are marked, including:

[0022] Based on the comparison results, target test pattern groups with target parameter variables whose values ​​are less than the minimum standard value or greater than the maximum standard value are determined from the initial layout.

[0023] Mark the target test pattern group in the initial layout.

[0024] In some possible implementations, the N parameter variables include a first parameter variable and a second parameter variable, and the attribute constraint rules include a first attribute constraint sub-rule corresponding to the first parameter variable and a second attribute constraint sub-rule corresponding to the second parameter variable; based on the attribute constraint rules matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain an intermediate layout, including:

[0025] Based on the first attribute restriction sub-rule, test pattern groups in M ​​test pattern groups whose values ​​of the first parameter variable do not conform to the first attribute restriction sub-rule are marked, and K test pattern groups in M ​​test pattern groups whose values ​​of the first parameter variable conform to the first attribute restriction sub-rule are determined, where K is a non-negative integer;

[0026] Based on the second attribute constraint sub-rule, test pattern groups in K test pattern groups whose values ​​of the second parameter variable do not conform to the second attribute constraint sub-rule are marked, and L test pattern groups in K test pattern groups whose values ​​of the second parameter variable conform to the second attribute constraint sub-rule are determined, where L is a non-negative integer;

[0027] Based on the attribute constraint rules other than the first and second attribute constraint sub-rules, test patterns whose parameter variable values ​​do not conform to the attribute constraint rules in the L test pattern groups are marked to obtain intermediate patterns.

[0028] In some possible implementations, based on M combinations of parameter variables, M test pattern groups corresponding one-to-one with the M combinations of parameter variables are drawn, and an initial layout containing the M test pattern groups is constructed, including:

[0029] Based on M combinations of parameter variables, M test pattern groups are drawn in M ​​preset division regions of the blank layout to obtain the initial layout; the M preset division regions correspond one-to-one with the M test pattern groups.

[0030] Based on the attribute constraint rules for matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain intermediate layouts, including:

[0031] Based on attribute constraint rules, the preset division areas corresponding to the test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain the intermediate layout.

[0032] In some possible implementations, Boolean operations are performed on the initial layout and intermediate layout to obtain a target layout that conforms to the layout creation standards, including:

[0033] Perform Boolean operations on the initial and intermediate layouts to determine at least one unmarked predefined region contained in both the initial and intermediate layouts;

[0034] The target map is obtained based on at least one unmarked predefined region and its corresponding test pattern set.

[0035] In some possible implementations, before determining the N parameter variables that match the target test pattern type based on the target test pattern type that meets the layout construction requirements, the layout construction method further includes:

[0036] Receives user input selecting the target test pattern type from multiple test pattern types;

[0037] In response to the selected input, the test pattern type that meets the layout construction requirements is determined as the target test pattern type.

[0038] In some possible implementations, the N parameter variables include at least one of the line width parameter variable, the spacing parameter variable, and the diagonal spacing parameter variable.

[0039] Based on the same inventive concept, in a second aspect, embodiments of this application provide a layout construction apparatus, which includes:

[0040] The first determining module is used to determine N parameter variables that match the target test pattern type based on the target test pattern type that meets the layout construction requirements, where N is a positive integer;

[0041] The first drawing module is used to draw M test pattern groups corresponding to M parameter variable combinations, and construct an initial layout containing M test pattern groups. The M parameter variable combinations are determined based on N parameter variables with different values, where M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern.

[0042] The first marking module is used to mark test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules based on the attribute restriction rules of the target test pattern type matching, so as to obtain the intermediate layout.

[0043] The first acquisition module is used to perform Boolean operations on the initial layout and intermediate layout to obtain the target layout that conforms to the layout production standard.

[0044] Thirdly, embodiments of this application provide a layout construction apparatus, the layout construction apparatus comprising:

[0045] Processor and memory storing computer program instructions;

[0046] When the processor executes the computer program instructions, it implements the layout construction method provided in any of the embodiments of this application described above.

[0047] Fourthly, embodiments of this application provide a computer storage medium storing computer program instructions, which, when executed by a processor, implement the layout construction method provided in any of the embodiments of this application described above.

[0048] Fifthly, embodiments of this application provide a computer program product in which instructions, when executed by a processor of an electronic device, cause the electronic device to perform a layout construction method as provided in any of the embodiments of this application described above.

[0049] This application provides a layout construction method, apparatus, device, computer storage medium, and program product. It determines N corresponding parameter variables based on a pre-acquired target test pattern type that meets layout construction requirements. Then, based on the N parameter variables with different values, it draws M corresponding test pattern groups, constructing an initial layout containing M test pattern groups. Next, based on attribute restriction rules matching the target test pattern type, test pattern groups in the initial layout whose parameter variable values ​​do not conform to the attribute restriction rules are marked, resulting in an intermediate layout. Finally, by performing Boolean operations on the initial and intermediate layouts, the marked test pattern groups are filtered and removed, thereby obtaining a target layout that meets layout production standards.

[0050] As described above, the layout construction method, apparatus, device, computer storage medium, and program product of this application embodiment can directly draw test pattern groups under various value scenarios by pre-obtaining different combinations of parameter variables corresponding to the test image type. Then, based on attribute restriction rules, it efficiently marks test pattern groups in the initial layout that do not conform to the actual situation. Through Boolean operations between layouts, it efficiently filters out test pattern groups that meet the actual process requirements, obtaining the final target layout. Thus, by adopting this application embodiment, it is possible to efficiently and automatically utilize attribute restriction rules to filter and eliminate unreasonable data. Users do not need to manually judge the rationality of each setting parameter during specific layout construction, which greatly reduces the complexity of parameter value filtering settings for users, thereby effectively improving the efficiency and accuracy of layout construction, and ultimately significantly enhancing the user's layout construction experience and convenience. Attached Figure Description

[0051] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments of this application will be briefly introduced below. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0052] Figure 1 This is a schematic flowchart of a layout construction method provided in an embodiment of this application;

[0053] Figure 2 This is a schematic diagram showing the state comparison of some layouts before and after processing, provided in one embodiment of this application;

[0054] Figure 3 This is a schematic diagram showing the state comparison of a portion of the layout before and after processing, provided in another embodiment of this application;

[0055] Figure 4 This is a schematic diagram showing the state comparison of a portion of the layout before and after processing, provided in another embodiment of this application;

[0056] Figure 5 This is a schematic diagram of the layout construction apparatus provided in one embodiment of this application;

[0057] Figure 6 This is a schematic diagram of the layout construction device provided in one embodiment of this application. Detailed Implementation

[0058] The features and exemplary embodiments of various aspects of this application will be described in detail below. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain this application and not to limit it. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples.

[0059] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.

[0060] It should be noted that the acquisition, storage, use, and processing of data in this application's technical solution all comply with the relevant provisions of national laws and regulations.

[0061] It should be noted that in the embodiments of this application, certain software, components, models and other existing solutions in the industry may be mentioned. These should be regarded as exemplary and are only intended to illustrate the feasibility of implementing the technical solution of this application. However, it does not mean that the applicant has used or necessarily used the solution.

[0062] As described in the background section, existing layout construction methods suffer from problems such as cumbersome parameter settings for test patterns, low layout construction efficiency, and low user satisfaction. Specifically, in current technologies, the process of drawing test patterns for mask templates mainly involves personalized parameter settings for each type of test pattern used by the user. Different types of test patterns are selected according to the user's needs, and the parameter range for each type of test pattern is specifically set. This is equivalent to eliminating data that does not conform to actual production processes when setting parameters such as line width, line spacing, or corner-to-corner spacing, thereby avoiding the occurrence of test patterns that do not meet expectations.

[0063] However, in practical applications, when there are many types of test graphics involved, the rationality of the parameter settings for each test graphic needs to be considered before drawing. This means that each graphic needs to be customized according to the user's needs. When there are many types of test graphics and many parameter settings for each type, this method becomes quite complex for the user. The user needs to manually judge the rationality of each parameter setting during layout construction, resulting in cumbersome parameter settings, low layout construction efficiency, and limited ease of operation.

[0064] In view of the above, in order to solve the problems of the prior art, embodiments of this application provide a layout construction method, apparatus, device, computer storage medium, and program product. It should be noted that the embodiments provided in this application are not intended to limit the scope of this application.

[0065] The layout construction method provided in the embodiments of this application will be introduced first below.

[0066] Figure 1 A schematic flowchart of a layout construction method according to an embodiment of this application is shown. This layout construction method is applied to an electronic device, which may include a server or a user terminal, etc. Figure 1 As shown, the layout construction method includes the following steps:

[0067] S110, based on the target test pattern type that meets the layout construction requirements, determine N parameter variables that match the target test pattern type, where N is a positive integer;

[0068] S120, based on M combinations of parameter variables, draw M test pattern groups corresponding to the M combinations of parameter variables, and construct an initial layout containing M test pattern groups; the M combinations of parameter variables are determined based on N parameter variables with different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern.

[0069] S130, based on the attribute constraint rules for matching the target test pattern type, mark the test pattern group whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules, and obtain the intermediate layout;

[0070] S140 performs Boolean operations on the initial and intermediate layouts to obtain the target layout that conforms to the layout production standards.

[0071] This application provides a layout construction method that, based on a pre-acquired target test pattern type that meets the layout construction requirements, determines N corresponding parameter variables. Then, based on the N parameter variables with different values, it determines M combinations of parameter variables to draw corresponding M test pattern groups, constructing an initial layout containing M test pattern groups. Next, based on attribute constraint rules matching the target test pattern type, test pattern groups in the initial layout whose parameter variable values ​​do not conform to the attribute constraint rules are marked, resulting in an intermediate layout. Finally, by performing Boolean operations on the initial and intermediate layouts, the marked test pattern groups are filtered and removed, thereby obtaining a target layout that meets the layout production standards.

[0072] As described above, the layout construction method of this application embodiment can directly draw multiple test pattern groups by pre-obtaining different combinations of parameter variables corresponding to the test image type. Then, based on attribute constraint rules, it efficiently marks test pattern groups in the initial layout that do not conform to the actual situation. Through Boolean operations between layouts, it efficiently filters out test pattern groups that meet the actual process requirements, obtaining the final target layout. Thus, by adopting this application embodiment, it is possible to efficiently and automatically utilize attribute constraint rules to filter and eliminate unreasonable data. Users do not need to manually judge the rationality of each setting parameter during specific layout construction, which greatly reduces the complexity of parameter value filtering settings for users. This effectively improves the efficiency and accuracy of layout construction, thereby significantly enhancing the user's layout construction experience and convenience.

[0073] The specific implementation methods of steps 110 to 140 above are described in detail below.

[0074] In S110, specifically, based on the target test pattern type that meets the layout construction requirements, N parameter variables matching the target test pattern type are determined, where N is a positive integer. According to some embodiments of this application, optionally, the N parameter variables may include at least one of line width parameter variables, spacing parameter variables, and diagonal spacing parameter variables.

[0075] The target test pattern type mentioned above can be, for example, the Basic Line Space test pattern, the Multi Line Space test pattern, or the RegularCH test pattern, etc., and there are no strict restrictions here.

[0076] To facilitate understanding of the N parameter variables matching the target test pattern type in this application, the following description uses the aforementioned target test pattern type as the basic line spacing test pattern as an example. Specifically, this basic line spacing test pattern type is mainly used to detect the width and spacing of lines; therefore, the N parameter variables matching the aforementioned target test pattern type can include parameters such as line width and line spacing.

[0077] Furthermore, considering the need for periodic arrangement of test patterns in some situations, the arrangement direction of the test patterns on the layout and the number of periodic graphic cycles can also be set to facilitate the drawing of a series of periodic test patterns. This embodiment does not impose strict limitations on these settings.

[0078] It should be noted that the target test pattern type that meets the layout construction requirements can be given by the user in advance, or obtained by the algorithm based on the layout construction requirements. This application does not impose strict restrictions on the method of obtaining the target test pattern type.

[0079] Optionally, according to some embodiments of this application, in order to quickly, efficiently, and reasonably obtain the target test pattern type that meets the layout construction requirements, so as to fully improve the user's experience and convenience in constructing the layout, before determining the N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, the layout construction method may further include:

[0080] Receives user input selecting the target test pattern type from multiple test pattern types;

[0081] In response to the selected input, the test pattern type that meets the layout construction requirements is determined as the target test pattern type.

[0082] For example, the aforementioned test pattern types may include the basic line spacing test pattern type, the multi-line spacing test pattern type, or the regular test pattern type, etc.

[0083] When a user selects and inputs the target test pattern type, for example, by displaying the multiple test pattern types on the interface, the user can select and input the target test pattern type that meets the requirements by performing simple touch or character input operations on the interface.

[0084] Thus, after receiving the user's selection input, the test pattern type that meets the layout construction requirements is determined as the target test pattern type, and the test pattern is drawn accordingly in the subsequent test pattern drawing.

[0085] In S120, in specific implementation, based on the M combinations of parameter variables, M test pattern groups corresponding to the M combinations of parameter variables are drawn, and an initial layout containing the M test pattern groups is constructed; the M combinations of parameter variables are determined based on N parameter variables with different values, where M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern.

[0086] In this embodiment, after determining the N parameter variables that match the target test pattern type, the specific values ​​of different parameter variables among the N parameter variables can be customized or randomly input.

[0087] In this way, M combinations of parameter variables are determined based on N parameter variables with different values. Then, based on the specific values ​​of the N parameter variables in different combinations, M test pattern groups are drawn, thereby constructing an initial layout containing these M test pattern groups.

[0088] For example, the N parameter variables include parameter variable A (e.g., line width), parameter variable B (e.g., line spacing), and parameter variable C (e.g., number of graphic cycle cycles). There are a total of 8 different combinations of parameter variables A, B, and C under different value combinations. In this way, 8 test pattern groups are drawn according to the 8 parameter variable combinations.

[0089] It should be added that, considering the periodic requirements during pattern drawing, a test pattern group often includes multiple test patterns that are periodically drawn according to parameters such as fixed line spacing. Therefore, in this embodiment, any of the above M test pattern groups includes at least one test pattern.

[0090] The initial layout can be in GDS (Graphic Design System) or OASIS (Open Artwork System Interchange Standard) format. The specific format can be set according to the actual layout construction requirements and conditions, and no strict limitation is made here.

[0091] Additionally, it should be noted that the above test patterns can be drawn using a GUI (Graphical User Interface), allowing users to interact with the computer through a visual and operational interface to draw the test patterns.

[0092] Alternatively, in some embodiments, in order to further enhance the user's operational convenience in constructing the overall layout, the drawing rules and other elements can be pre-programmed to generate a programming script. In this way, by running the programming script, the above-mentioned test pattern group can be drawn more efficiently and quickly.

[0093] Optionally, according to some embodiments of this application, in order to further improve the convenience and user experience of layout construction and to significantly reduce the complexity of parameter settings for users, before the above-mentioned drawing M test pattern groups corresponding one-to-one with the M parameter variable combinations and constructing an initial layout containing the M test pattern groups, the layout construction method may further include:

[0094] It receives configuration input for the values ​​of N parameter variables. The variable values ​​can include the custom value range and custom step size for each of the N parameter variables.

[0095] In response to the configuration input, based on the custom value range and custom step size of each of the N parameter variables, determine M combinations of parameter variables.

[0096] In practice, users can configure the values ​​of N parameter variables by clicking or touching the interface. There are no strict restrictions on the input methods for the configuration input.

[0097] The configuration input for the aforementioned variable values ​​can specifically include the custom value range and custom step size for each of the N parameter variables. For example, parameter variable A is one of the N parameter variables. The custom value range of parameter variable A can be determined through random selection or other methods. This custom value range is not specifically limited and can be arbitrarily set by the user. The user does not need to judge the rationality of the set parameters, thus fully realizing the convenience and versatility of drawing test pattern groups and constructing the overall layout.

[0098] The aforementioned custom split can be a specific step size set within a certain range of values. By setting this split, the corresponding custom value range can be divided according to the split, thereby obtaining a series of multiple values ​​of the parameter variable separated by the custom split. The specific split can be flexibly set according to the user's needs and actual parameter setting experience, and is not strictly limited here.

[0099] In this embodiment, users only need to set a custom value range and custom step size for each of the above N parameter variables to quickly determine the different values ​​of each parameter variable, thereby determining the above M parameter variable combinations. This significantly improves the user experience in layout construction and greatly reduces the complexity of parameter settings, facilitating the convenience and versatility of drawing test pattern groups and constructing the overall layout.

[0100] In S130, during the specific implementation, based on the attribute restriction rules for matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules are marked to obtain the intermediate layout.

[0101] The aforementioned attribute restriction rules can be pre-set specifically for different test pattern types, taking into account actual semiconductor manufacturing process limitations in the layout construction scenario, thereby effectively ensuring the accuracy of data screening and rejection. In one example, the attribute restriction rules may include the restricted value ranges of some or all of the aforementioned N parameter variables, etc., but this embodiment does not impose strict restrictions here.

[0102] The attribute restrictions of test pattern groups of different test pattern types are not entirely the same. For example, some test pattern groups of test pattern types have restrictions on corner-to-corner spacing, while others do not.

[0103] In practice, the parameter variables of each test pattern in the initial layout can be programmatically judged according to the above attribute restriction rules. Test pattern groups that do not conform to the actual process can be selected from the M test pattern groups and marked, thereby obtaining the intermediate layout with markings.

[0104] Optionally, considering actual layout construction scenarios, in order to more reasonably achieve the above-mentioned attribute parameter filtering, before marking test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules based on the target test pattern type matching to obtain the intermediate layout, the layout construction method may further include:

[0105] Based on the pre-defined correspondence between multiple test pattern types and multiple manufacturing rules, the target MRC script corresponding to the target test pattern type is determined. The target MRC script may include attribute restriction rules.

[0106] Based on the attribute constraint rules for matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain intermediate layouts, which may include:

[0107] By running the target MRC script, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules are marked, thus obtaining the intermediate layout.

[0108] In practice, different MRC scripts can be set up according to the manufacturing constraints corresponding to different test pattern types, and the correspondence between multiple test pattern types and multiple MRC scripts can be stored. To reduce storage pressure, a key-value pair approach can be used to implement the correspondence between multiple test pattern types and multiple MRC scripts. Corresponding attribute restriction rules can be programmed into different MRC scripts.

[0109] After determining the target test pattern type that meets the current map construction requirements, the target MRC script corresponding to the target test pattern type is determined by querying the correspondence between multiple test pattern types and multiple MRC scripts.

[0110] Thus, after drawing the above M test patterns and constructing the above initial layout, the corresponding target MRC script can be run to efficiently mark the test pattern groups in the M test pattern groups in the initial layout whose parameter variable values ​​do not conform to the attribute restriction rules, thereby quickly and conveniently obtaining the intermediate layout.

[0111] In this embodiment, by running the MRC script to filter and remove unreasonable data from the initial layout, the complexity of parameter settings for users is greatly reduced. Furthermore, the MRC script is used to remove test patterns from test pattern groups that do not conform to actual conditions. The operation and settings of the MRC script are relatively flexible, and it is easy to maintain and modify.

[0112] Optionally, according to some embodiments of this application, in order to more reasonably mark test patterns whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules, the aforementioned N parameter variables may include target parameter variables, and the aforementioned attribute constraint rules may include the minimum standard value and / or maximum standard value corresponding to the target parameter variable. Marking test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules based on the attribute constraint rules to obtain an intermediate layout may include:

[0113] The values ​​of the target parameter variables in each of the M test pattern groups are compared with the minimum and maximum standard values ​​to determine the comparison results.

[0114] Based on the comparison results, target test pattern groups whose target parameter variables in the initial layout do not conform to the attribute restriction rules are marked;

[0115] An intermediate layout is obtained based on the initial layout after marking the target test pattern group.

[0116] More specifically, the above-mentioned marking of target test pattern groups whose target parameter variables in the initial layout do not conform to the attribute restriction rules based on the comparison results may include:

[0117] Based on the comparison results, the target test pattern is determined from the initial layout if the value of the target parameter variable is less than the minimum standard value or greater than the maximum standard value.

[0118] Mark the target test graphic in the initial layout.

[0119] In this embodiment, taking the example that the attribute restriction rule includes both the minimum standard value and the maximum standard value corresponding to the target parameter variable, the target parameter variable corresponding to different test pattern groups is compared with its corresponding minimum standard value and maximum standard value.

[0120] Thus, if the value of the target parameter variable corresponding to a certain test pattern group is greater than the maximum standard value, it is determined that the test patterns in that test pattern group do not meet the manufacturing requirements, and that test pattern group is marked as the target test pattern group. Alternatively, if the value of the target parameter variable corresponding to a certain test pattern group is less than the minimum standard value, it is determined that the test patterns in that test pattern group also do not meet the manufacturing requirements, and that test pattern group is marked as the target test pattern group.

[0121] This process continues until the target parameter variables of all M test patterns in the initial layout are compared with the maximum and minimum standard values, thereby achieving the marking and filtering of test pattern groups in the initial layout under the target parameter variables.

[0122] In this case, based on the initial layout after marking the target test pattern group, the maximum and / or minimum standard values ​​corresponding to other parameter variables in the switching attribute constraint rules are compared in the next round until the above attribute constraint rules are traversed, and finally the above intermediate layout is determined.

[0123] It should be added that, in some embodiments, the above attribute restriction rules may include only the minimum standard value corresponding to the target parameter variable, or only the maximum standard value corresponding to the target parameter variable, and are not strictly limited here.

[0124] Optionally, according to some embodiments of this application, in order to effectively improve the data filtering efficiency of multiple test pattern groups in the initial layout, the above-mentioned N parameter variables may include a first parameter variable and a second parameter variable, and the attribute restriction rules may include a first attribute restriction sub-rule corresponding to the first parameter variable and a second attribute restriction sub-rule corresponding to the second parameter variable; based on the attribute restriction rules matching the target test pattern type, marking test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules to obtain an intermediate layout may include:

[0125] Based on the first attribute restriction sub-rule, test pattern groups in M ​​test pattern groups whose values ​​of the first parameter variable do not conform to the first attribute restriction sub-rule are marked, and K test pattern groups in M ​​test pattern groups whose values ​​of the first parameter variable conform to the first attribute restriction sub-rule are determined, where K is a non-negative integer;

[0126] Based on the second attribute constraint sub-rule, test pattern groups in K test pattern groups whose values ​​of the second parameter variable do not conform to the second attribute constraint sub-rule are marked, and L test pattern groups in K test pattern groups whose values ​​of the second parameter variable conform to the second attribute constraint sub-rule are determined, where L is a non-negative integer;

[0127] Based on the attribute constraint rules other than the first and second attribute constraint sub-rules, test pattern groups whose parameter variable values ​​do not conform to the attribute constraint rules are marked to obtain intermediate patterns.

[0128] In this embodiment, considering that if a marked test pattern group will be eliminated later, multiple test pattern groups can be filtered by the first parameter variable, and test pattern groups whose first parameter variable does not meet the first attribute restriction sub-rule can be marked to determine several test pattern groups that have not yet been marked.

[0129] In this way, when filtering the second parameter variable, the attribute parameter comparison and filtering can be performed on the aforementioned determined group of unmarked test patterns, and then the test pattern group whose second parameter variable does not meet the second attribute restriction rule can be marked.

[0130] Similarly, each time a new parameter variable is filtered and removed from the test pattern group, the test pattern groups involved in determining whether the new parameter variable is reasonable are all test patterns that were not previously marked, thus effectively reducing the amount of computation involved in the attribute parameter filtering process.

[0131] Optionally, considering actual layout testing scenarios, in order to more conveniently mark different test pattern groups and improve the efficiency of subsequent Boolean operations between layouts, the above-mentioned method of drawing M test pattern groups corresponding one-to-one with the M parameter variable combinations and constructing an initial layout containing M test pattern groups may include:

[0132] Based on M combinations of parameter variables, M test pattern groups are drawn in M ​​preset division regions of the blank layout to obtain the initial layout; the M preset division regions correspond one-to-one with the M test pattern groups.

[0133] Based on the attribute constraint rules for matching the target test pattern type, test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain intermediate layouts, which may include:

[0134] Based on attribute constraint rules, the preset division areas corresponding to the test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute constraint rules are marked to obtain the intermediate layout.

[0135] In this embodiment, the aforementioned preset division area (block) is a region within a layout, where test pattern sets corresponding to the parameter variables are drawn. A single preset division area can contain test pattern sets corresponding to any of the aforementioned M parameter variable combinations. Multiple parameter variable combinations result in multiple preset division areas for drawing multiple test pattern sets, thus forming the aforementioned initial layout.

[0136] When marking test pattern groups whose parameter variable values ​​do not conform to the attribute restriction rules in the initial layout based on the above attribute restriction rules for matching target test pattern types, an intermediate layout can be obtained by marking the preset division area corresponding to the corresponding test pattern group.

[0137] Therefore, by setting preset division blocks for drawing test pattern groups and processing filtering marks, it is easier to mark different test pattern groups and significantly improve the efficiency of subsequent Boolean operations between layouts.

[0138] In S140, in specific implementation, at least one of the logical operations such as 'AND', 'OR', 'NOT', 'XOR', and 'NAND' in Boolean operations can be used to perform Boolean operations on the initial layout and intermediate layout to obtain the target layout that conforms to the layout production standard. This application does not impose strict restrictions here.

[0139] In one example, more specifically, to more reasonably calculate the target layout that conforms to the layout creation standards, a logical 'AND' operation can be used to perform Boolean operations on the initial and intermediate layouts. This quickly identifies the overlapping test pattern groups (i.e., unmarked test pattern groups) in the initial and intermediate layouts, thereby indirectly eliminating these test pattern groups. Based on the overlapping test pattern groups identified in the initial and intermediate layouts, the final target layout is generated. The test pattern groups in this target layout are all test patterns whose parameter variable values ​​conform to the aforementioned attribute restriction rules.

[0140] For example, the initial layout includes test pattern group 1, test pattern group 2, and test pattern group 3. None of the three test pattern groups are marked, so their Boolean values ​​are all true. The intermediate layout contains test pattern group 1, test pattern group 2, and a marked test pattern group 3. Test pattern group 1 and test pattern group 2 are unmarked, and their Boolean values ​​are both true. The marked test pattern group 3 has a false Boolean value.

[0141] In this scenario, by performing a Boolean AND operation on the initial and intermediate layouts, it is determined that the AND operation result of test pattern group 1 and test pattern group 2 between the two layouts is true, while the AND operation result of test pattern group 3 is false. Thus, based on the determined true AND operation results of test pattern group 1 and test pattern group 2, the target layout that conforms to the layout production standard can be finally generated.

[0142] According to some embodiments of this application, optionally, in conjunction with the aforementioned embodiments of drawing and marking test patterns in a test pattern group by setting preset division regions (blocks), the above-mentioned Boolean operation on the initial layout and intermediate layout to obtain a target layout that conforms to the layout production standard specifically includes:

[0143] Perform Boolean operations on the initial and intermediate layouts to determine at least one unmarked predefined region contained in both the initial and intermediate layouts;

[0144] The target map is obtained based on at least one unmarked predefined region and its corresponding test pattern set.

[0145] In this embodiment, after obtaining the intermediate layout, Boolean operations are performed on the initial layout and the intermediate layout to compare whether there are markers in the corresponding preset division areas between the different layouts, so as to quickly determine the overlapping preset division areas in the two layouts and return the shared part of the initial layout and the intermediate layout.

[0146] Since the predefined division regions marked in the intermediate layout are not marked in the initial layout, these predefined division regions marked in the intermediate layout will be determined as non-overlapping parts between layouts in the Boolean operation. This achieves the removal and filtering of the predefined division regions marked and their corresponding test patterns that do not conform to the attribute restriction rules.

[0147] After performing Boolean operations between the initial layout and the intermediate layout, the overlapping portion between the initial layout and the intermediate layout can be obtained. The overlapping portion is at least one unmarked predefined division area contained in both the initial layout and the intermediate layout.

[0148] In this way, based on the at least one unmarked predefined division region and its corresponding test pattern group, the final target layout is constructed, thereby effectively ensuring that the test pattern groups in the target layout are all test pattern groups whose parameter variable values ​​conform to the attribute restriction rules.

[0149] To facilitate understanding of the layout construction method provided in the above embodiments, the following describes the method using a specific scenario embodiment. Figure 2 This is a schematic diagram showing the state comparison of some layouts before and after processing, provided in one embodiment of this application; Figure 3 This is a schematic diagram showing the state comparison of a portion of the layout before and after processing, provided in another embodiment of this application; Figure 4 This is a schematic diagram showing the state comparison before and after partial layout processing provided in another embodiment of this application.

[0150] The application scenario of this example can be as follows: the test patterns in the aforementioned generated initial layout may have the following three situations: among the various parameter variables, there may be parameter variables such as line width, line spacing, or corner to corner spacing. The above parameter variables may be smaller than the actual production process. It is necessary to use the rules in the MRC script to filter out the test pattern group in the initial layout that does not meet the attribute parameter conditions. The following examples illustrate the operation processing in each case.

[0151] 1. Process test pattern groups where the space value is less than a specific value:

[0152] Please see Figure 2 In the initial layout, there are cases where the space corresponding to the test pattern group is smaller than a certain value (e.g., 30nm). Figure 2Selecting a subset of test pattern groups as examples, test pattern groups with a space value smaller than a specific value cannot be exposed due to process limitations. Therefore, test pattern groups exhibiting this condition need to be removed from the initial layout. This is achieved by setting a `min space` parameter in the MRC script to filter out test pattern groups with a space value smaller than the specified minimum space. Figure 2 The test pattern groups (with spaces of 25nm and 15nm) are marked with their blocks (corresponding to the aforementioned preset division areas) to form an intermediate layout. Then, a Boolean operation is performed between this intermediate layout and the initial layout to obtain the final target layout.

[0153] 2. Process test pattern groups whose width is less than a specific value:

[0154] Similarly, please see Figure 3 For cases where the width of a test pattern group in the initial layout is less than a certain value (e.g., 60nm), a similar method as described above is used to filter and mark test pattern groups that do not meet the conditions. Figure 3 The test pattern groups with widths of 50nm and 55nm are used to form an intermediate layout. Then, a Boolean operation is performed between this intermediate layout and the initial layout to obtain the final target layout.

[0155] 3. Process test pattern groups where the corner to corner ratio is less than a specific value:

[0156] Please see Figure 4 This corresponds to a situation in the initial layout where the corner-to-corner ratio of the test pattern group is less than a certain value (e.g., 20nm). Figure 4 Taking a subset of test pattern groups as an example, test pattern groups with a corner-to-corner ratio less than a specific value often cannot be exposed in actual production due to the influence of mask manufacturing processes. Therefore, these test pattern groups with abnormal corner-to-corner ratios need to be removed in the early stages. Thus, the `mincorner-to-corner` parameter is set in the MRC script to filter out test pattern groups in the initial layout that are smaller than the `mincorner-to-corner` value. Figure 4 The test pattern groups (corner to corner, 10nm and 14nm) are marked with their blocks (corresponding to the aforementioned preset division areas) to form an intermediate layout. Then, a Boolean operation is performed between this intermediate layout and the initial layout to obtain the final target layout.

[0157] Based on the layout construction method provided in the above embodiments, and with the same inventive concept, this application also provides a layout construction apparatus corresponding to the above layout construction method. The following describes... Figure 5 A detailed introduction to the map-building apparatus is provided.

[0158] Figure 5 A schematic diagram of the layout construction apparatus provided in one embodiment of this application is shown. Figure 5 The layout construction apparatus 500 shown includes:

[0159] The first determining module 510 is used to determine N parameter variables that match the target test pattern type based on the target test pattern type that meets the layout construction requirements, where N is a positive integer;

[0160] The first drawing module 520 is used to draw M test pattern groups corresponding to the M parameter variable combinations based on the M parameter variable combinations, and to construct an initial layout containing the M test pattern groups; the M parameter variable combinations are determined based on N parameter variables with different values, M is a positive integer, and any test pattern group of the M test pattern groups includes at least one test pattern.

[0161] The first marking module 530 is used to mark test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules based on the attribute restriction rules of the target test pattern type matching, so as to obtain the intermediate layout.

[0162] The first acquisition module 540 is used to perform Boolean operations on the initial layout and intermediate layout to obtain the target layout that conforms to the layout production standard.

[0163] This application provides a layout construction apparatus that, by setting corresponding functional modules, pre-acquires target test pattern types that meet the layout construction requirements, determines the corresponding N parameter variables, and then draws M sets of corresponding test patterns based on M parameter variable combinations under different values, thus constructing an initial layout containing M test pattern sets. Next, based on attribute constraint rules matching the target test pattern type, test pattern sets in the initial layout whose parameter variable values ​​do not conform to the attribute constraint rules are marked, resulting in an intermediate layout. Finally, by performing Boolean operations on the initial and intermediate layouts, the marked test patterns are filtered and removed, thereby obtaining a target layout that meets the layout production standards.

[0164] As described above, a layout construction apparatus according to an embodiment of this application can directly draw multiple test pattern groups by pre-obtaining different combinations of parameter variables corresponding to test image types. Then, based on attribute constraint rules, it efficiently marks test pattern groups in the initial layout that do not conform to the actual situation. Through Boolean operations between layouts, it efficiently filters out test pattern groups that meet the actual process requirements, obtaining the final target layout. Thus, by adopting this embodiment, attribute constraint rules can be used efficiently and automatically to filter and eliminate unreasonable data. Users do not need to manually judge the rationality of each setting parameter during specific layout construction, greatly reducing the complexity of parameter value filtering and setting for users. This effectively improves the efficiency and accuracy of layout construction, thereby significantly enhancing the user's layout construction experience and convenience.

[0165] According to some embodiments of this application, optionally, before drawing M test pattern groups corresponding one-to-one with the M parameter variable combinations and constructing an initial layout containing the M test pattern groups, the layout construction apparatus may further include:

[0166] The first receiving module can be used to receive configuration input for the variable values ​​of N parameter variables. The variable values ​​can include the custom value range and custom step size corresponding to each of the N parameter variables.

[0167] The first response module can be used to respond to configuration input and determine M combinations of parameter variables based on the custom value range and custom step size of each parameter variable among N parameter variables.

[0168] Optionally, according to some embodiments of this application, before marking test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules based on the target test pattern type matching attribute restriction rules to obtain an intermediate layout, the layout construction apparatus may further include:

[0169] The second determining module can be used to check the correspondence between multiple pre-set test pattern types and multiple manufacturing rules to determine the target MRC script corresponding to the target test pattern type. The target MRC script may include attribute restriction rules.

[0170] The first marking module 530 mentioned above can be used to: mark test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules by running the target MRC script, and obtain an intermediate layout.

[0171] According to some embodiments of this application, optionally, the above-mentioned N parameter variables may include target parameter variables, and the attribute restriction rules may include the minimum standard value and / or maximum standard value corresponding to the target parameter variables; the above-mentioned first marking module 530 may include:

[0172] The first determining submodule can be used to compare the values ​​of the target parameter variables of each of the M test pattern groups with the minimum standard value and the maximum standard value respectively, and determine the comparison result;

[0173] The first marking submodule can be used to mark target test pattern groups whose target parameter variables in the initial layout do not conform to the attribute restriction rules based on the comparison results;

[0174] The first submodule can be used to obtain an intermediate layout based on the initial layout after marking the target test pattern group.

[0175] Optionally, according to some embodiments of this application, the first marker submodule described above may include:

[0176] The first determining unit can be used to determine, based on the comparison results, a target test pattern group whose target parameter variable value is less than the minimum standard value or greater than the maximum standard value from the initial layout.

[0177] The first marking unit can be used to mark the target test pattern group in the initial layout.

[0178] According to some embodiments of this application, optionally, the N parameter variables may include a first parameter variable and a second parameter variable, and the attribute restriction rules may include a first attribute restriction sub-rule corresponding to the first parameter variable and a second attribute restriction sub-rule corresponding to the second parameter variable; based on the attribute restriction rules matching the target test pattern type, marking test pattern groups whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules to obtain an intermediate layout may include:

[0179] The second marking submodule can be used to mark test pattern groups in M ​​test pattern groups whose values ​​of the first parameter variable do not conform to the first attribute restriction sub-rule based on the first attribute restriction sub-rule, and to determine K test pattern groups in M ​​test pattern groups whose values ​​of the first parameter variable conform to the first attribute restriction sub-rule, where K is a non-negative integer;

[0180] The third marking submodule can be used to mark test pattern groups in K test pattern groups whose values ​​of the second parameter variable do not conform to the second attribute restriction sub-rule based on the second attribute restriction sub-rule, and determine L test pattern groups in K test pattern groups whose values ​​of the second parameter variable conform to the second attribute restriction sub-rule, where L is a non-negative integer;

[0181] The fourth marking submodule can be used to mark test patterns in L test pattern groups whose parameter variable values ​​do not conform to the attribute restriction rules, based on the rules other than the first and second attribute restriction sub-rules, to obtain intermediate patterns.

[0182] According to some embodiments of this application, optionally, the first drawing module 520 described above can be used to: draw M test pattern groups in M ​​preset division areas of a blank layout based on M combinations of parameter variables to obtain an initial layout; the M preset division areas correspond one-to-one with the M test pattern groups;

[0183] The first marking module 530 mentioned above can be used to: mark the preset division area corresponding to the test pattern group whose parameter variable values ​​in the initial layout do not conform to the attribute restriction rules based on attribute restriction rules, so as to obtain the intermediate layout.

[0184] In some possible implementations, the first obtaining module 540 described above may include:

[0185] The Boolean operation submodule can be used to perform Boolean operations on the initial layout and intermediate layout to determine at least one pre-defined division region that is not marked and is contained in both the initial layout and the intermediate layout.

[0186] The submodule can be used to obtain the target layout based on at least one unmarked predefined partitioned region and its corresponding test pattern group.

[0187] According to some embodiments of this application, optionally, before determining N parameter variables matching the target test pattern type based on the target test pattern type that meets the layout construction requirements, the layout construction apparatus may further include:

[0188] The second receiving module can be used to receive the user's selection input for the target test pattern type among multiple test pattern types;

[0189] The second response module can be used to respond to the selection input and determine the test pattern type that meets the layout construction requirements as the target test pattern type.

[0190] According to some embodiments of this application, optionally, the N parameter variables may include at least one of the line width parameter variable, the spacing parameter variable, and the diagonal spacing parameter variable.

[0191] Based on the layout construction method provided in the above embodiments, and with the same inventive concept, this application also provides a layout construction apparatus corresponding to the above layout construction method. The following describes... Figure 6 A detailed introduction to the map-building equipment is provided.

[0192] Please see below. Figure 6 , Figure 6 This is a schematic diagram of the layout construction device provided in one embodiment of this application.

[0193] The layout construction device may include a processor 601 and a memory 602 storing computer program instructions.

[0194] Specifically, the processor 601 may include a central processing unit (CPU), an application-specific integrated circuit (ASIC), or one or more integrated circuits that can be configured to implement the embodiments of this application.

[0195] Memory 602 may include mass storage for data or instructions. For example, and not limitingly, memory 602 may include a hard disk drive (HDD), floppy disk drive, flash memory, optical disk, magneto-optical disk, magnetic tape, or Universal Serial Bus (USB) drive, or a combination of two or more of these. Where appropriate, memory 602 may include removable or non-removable (or fixed) media. Where appropriate, memory 602 may be internal or external to the integrated gateway disaster recovery device. In a particular embodiment, memory 602 is non-volatile solid-state memory.

[0196] Memory may include read-only memory (ROM), random access memory (RAM), disk storage media devices, optical storage media devices, flash memory devices, and electrical, optical, or other physical / tangible memory storage devices. Therefore, typically, memory includes one or more tangible (non-transitory) computer-readable storage media (e.g., memory devices) encoded with software including computer-executable instructions, and when the software is executed (e.g., by one or more processors), it is operable to perform the operations described with reference to the methods according to one aspect of this disclosure.

[0197] The processor 601 implements any of the layout construction methods in the above embodiments by reading and executing computer program instructions stored in the memory 602.

[0198] In one example, the data layout construction device may further include a communication interface 603 and a bus 610. Wherein, as Figure 6 As shown, the processor 601, memory 602, and communication interface 603 are connected through bus 610 and complete communication with each other.

[0199] The communication interface 603 is mainly used to realize communication between various modules, devices, units and / or equipment in the embodiments of this application.

[0200] Bus 610 includes hardware, software, or both, that couples components of a layout-constructing device together. For example, and not limitingly, the bus may include an Accelerated Graphics Port (AGP) or other graphics bus, an Enhanced Industry Standard Architecture (EISA) bus, a Front Side Bus (FSB), HyperTransport (HT) interconnect, an Industry Standard Architecture (ISA) bus, an Infinite Bandwidth Interconnect, a Low Pin Count (LPC) bus, a memory bus, a Microchannel Architecture (MCA) bus, a Peripheral Component Interconnect (PCI) bus, a PCI-Express (PCI-X) bus, a Serial Advanced Technology Attachment (SATA) bus, a Video Electronics Standards Association Local (VLB) bus, or other suitable buses, or combinations of two or more of these. Where appropriate, bus 610 may include one or more buses. Although specific buses are described and illustrated in embodiments of this application, any suitable bus or interconnect is contemplated herein.

[0201] The layout construction device executes the layout construction method in the embodiments of this application, thereby realizing the layout construction method described in the embodiments of this application.

[0202] Furthermore, in conjunction with the layout construction methods in the above embodiments, this application embodiment can provide a computer storage medium for implementation. The computer storage medium stores computer program instructions; when these computer program instructions are executed by a processor, they implement any of the layout construction methods in the above embodiments.

[0203] Based on the layout construction method in the above embodiments, this application provides a computer program product. When the instructions in the computer program product are executed by the processor of an electronic device, the electronic device performs the layout construction method provided in any one of the above embodiments of this application.

[0204] It should be clarified that this application is not limited to the specific configurations and processes described above and shown in the figures. For the sake of brevity, detailed descriptions of known methods are omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of this application is not limited to the specific steps described and shown. Those skilled in the art can make various changes, modifications, and additions, or change the order of steps, after understanding the spirit of this application.

[0205] The functional blocks shown in the above-described structural diagram can be implemented as hardware, software, firmware, or a combination thereof. When implemented in hardware, they can be, for example, electronic circuits, application-specific integrated circuits (ASICs), appropriate firmware, plug-ins, function cards, etc. When implemented in software, the elements of this application are programs or code segments used to perform the required tasks. Programs or code segments can be stored on a machine-readable medium or transmitted over a transmission medium or communication link via data signals carried on a carrier wave. "Machine-readable medium" can include any medium capable of storing or transmitting information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, fiber optic media, radio frequency (RF) links, etc. Code segments can be downloaded via computer networks such as the Internet, intranets, etc.

[0206] It should also be noted that the exemplary embodiments mentioned in this application describe methods or systems based on a series of steps or apparatus. However, this application is not limited to the order of the above steps; that is, the steps can be performed in the order mentioned in the embodiments, or in a different order, or several steps can be performed simultaneously.

[0207] The aspects of this disclosure have been described above with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of this disclosure. It should be understood that each block in the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, or other programmable data processing apparatus to produce a machine such that these instructions, executable via the processor of the computer or other programmable data processing apparatus, enable the implementation of the functions / actions specified in one or more blocks of the flowchart illustrations and / or block diagrams. Such a processor can be, but is not limited to, a general-purpose processor, a special-purpose processor, a special application processor, or a field-programmable logic circuit. It is also understood that each block in the block diagrams and / or flowcharts, and combinations of blocks in the block diagrams and / or flowcharts, can also be implemented by special-purpose hardware performing the specified functions or actions, or can be implemented by a combination of special-purpose hardware and computer instructions.

[0208] The above description is merely a specific implementation of this application. Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working processes of the systems, modules, and units described above can be referred to the corresponding processes in the foregoing method embodiments, and will not be repeated here. It should be understood that the protection scope of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the protection scope of this application.

Claims

1. A layout construction method, characterized by, The method comprises: determining N parameter variables matched with the target test pattern type based on the target test pattern type meeting the layout construction requirement, N being a positive integer; drawing M test pattern groups corresponding to M parameter variable combinations respectively and constructing an initial layout containing the M test pattern groups based on the M parameter variable combinations, the M parameter variable combinations being determined based on the N parameter variables under different values, M being a positive integer, and at least one test pattern being included in any test pattern group of the M test pattern groups; labeling test pattern groups in which the values of parameter variables in the initial layout do not meet the attribute limitation rule corresponding to the target test pattern type based on the attribute limitation rule, to obtain an intermediate layout; performing Boolean operation on the initial layout and the intermediate layout to obtain a target layout meeting the layout manufacturing standard; the drawing of the M test pattern groups corresponding to the M parameter variable combinations respectively and the construction of the initial layout containing the M test pattern groups based on the M parameter variable combinations comprises: drawing the M test pattern groups in M preset division regions in a blank layout based on the M parameter variable combinations to obtain the initial layout, the M preset division regions corresponding to the M test pattern groups respectively; the labeling of test pattern groups in which the values of parameter variables in the initial layout do not meet the attribute limitation rule based on the attribute limitation rule to obtain an intermediate layout comprises: labeling preset division regions corresponding to test pattern groups in which the values of parameter variables in the initial layout do not meet the attribute limitation rule based on the attribute limitation rule to obtain the intermediate layout; the performing of Boolean operation on the initial layout and the intermediate layout to obtain a target layout meeting the layout manufacturing standard comprises: performing Boolean operation on the initial layout and the intermediate layout to determine at least one unlabelled preset division region included in both the initial layout and the intermediate layout; obtaining the target layout based on the at least one unlabelled preset division region and the test pattern group corresponding thereto, the N parameter variables including at least one of a line width parameter variable, a pitch parameter variable and an angle-to-angle pitch parameter variable.

2. The method of claim 1, wherein, Before the drawing of the M test pattern groups corresponding to the M parameter variable combinations respectively and the construction of the initial layout containing the M test pattern groups based on the M parameter variable combinations, the method further comprises: receiving configuration input of variable values of the N parameter variables, the variable values including custom value ranges and custom steps corresponding to each parameter variable in the N parameter variables; determining the M parameter variable combinations based on the custom value ranges and custom steps corresponding to each parameter variable in the N parameter variables in response to the configuration input.

3. The method of claim 1, wherein, Before the step of marking the test pattern groups in the initial layout whose parameter variable values do not conform to the attribute limitation rule matched with the target test pattern type to obtain an intermediate layout, the method further comprises: determining a target MRC script corresponding to the target test pattern type based on a preset correspondence between a plurality of test pattern types and a plurality of MRC scripts, wherein the target MRC script comprises the attribute limitation rule; the step of marking the test pattern groups in the initial layout whose parameter variable values do not conform to the attribute limitation rule matched with the target test pattern type to obtain an intermediate layout comprises: marking the test pattern groups in the initial layout whose parameter variable values do not conform to the attribute limitation rule by running the target MRC script to obtain the intermediate layout.

4. The method of claim 1, wherein, The N parameter variables comprise a target parameter variable, and the attribute limitation rule comprises a minimum standard value and / or a maximum standard value corresponding to the target parameter variable; the step of marking the test pattern groups in the initial layout whose parameter variable values do not conform to the attribute limitation rule matched with the target test pattern type to obtain an intermediate layout comprises: comparing the target parameter variable values of each test pattern group in the M test pattern groups with the minimum standard value and the maximum standard value respectively to determine comparison results; based on the comparison results, marking target test pattern groups in the initial layout whose target parameter variable values do not conform to the attribute limitation rule; based on the initial layout after the target test pattern groups are marked, obtaining the intermediate layout.

5. The method of claim 4, wherein, The step of marking the target test pattern groups in the initial layout whose target parameter variable values do not conform to the attribute limitation rule based on the comparison results comprises: based on the comparison results, determining, from the initial layout, the target test pattern groups whose target parameter variable values are less than the minimum standard value or greater than the maximum standard value; marking the target test pattern groups in the initial layout.

6. The method of claim 1, wherein, The N parameter variables comprise a first parameter variable and a second parameter variable, and the attribute limitation rule comprises a first attribute limitation sub-rule corresponding to the first parameter variable and a second attribute limitation sub-rule corresponding to the second parameter variable; the step of marking the test pattern groups in the initial layout whose parameter variable values do not conform to the attribute limitation rule matched with the target test pattern type to obtain an intermediate layout comprises: based on the first attribute limitation sub-rule, marking test pattern groups in the M test pattern groups whose first parameter variable values do not conform to the first attribute limitation sub-rule, and determining K test pattern groups in the M test pattern groups whose first parameter variable values conform to the first attribute limitation sub-rule, wherein K is a non-negative integer; based on the second attribute restriction sub-rule, marking test pattern groups in the K test pattern groups in which the second parameter variable does not meet the second attribute restriction sub-rule, and determining L test pattern groups in the K test pattern groups in which the second parameter variable meets the second attribute restriction sub-rule, L being a non-negative integer; based on rules other than the first attribute restriction sub-rule and the second attribute restriction sub-rule in the attribute restriction rules, marking test pattern groups in the L test pattern groups in which parameter variables do not meet the attribute restriction rules, to obtain the intermediate layout.

7. The method according to any one of claims 1 to 6, characterized in that, Before the determining the N parameter variables matched with the target test pattern type based on the target test pattern type meeting the layout construction requirement, the method further comprises: receiving a selection input of a user on the target test pattern type in a plurality of test pattern types; in response to the selection input, determining that the test pattern type meeting the layout construction requirement is the target test pattern type.

8. A layout construction apparatus characterized by comprising: The apparatus comprises: a first determining module configured to determine N parameter variables matched with a target test pattern type based on the target test pattern type meeting a layout construction requirement, N being a positive integer; a first drawing module configured to draw M test pattern groups corresponding to M parameter variable combinations based on the M parameter variable combinations, and to construct an initial layout containing the M test pattern groups, the M parameter variable combinations being determined based on the N parameter variables under different values, M being a positive integer, and any test pattern group in the M test pattern groups comprising at least one test pattern; a first marking module configured to mark test pattern groups in the initial layout in which parameter variables do not meet attribute restriction rules matched with the target test pattern type, to obtain an intermediate layout; a first obtaining module configured to perform a Boolean operation on the initial layout and the intermediate layout, to obtain a target layout meeting a layout manufacturing standard; the drawing the M test pattern groups corresponding to the M parameter variable combinations based on the M parameter variable combinations, and the constructing the initial layout containing the M test pattern groups, comprises: drawing the M test pattern groups in M preset division regions in a blank layout based on the M parameter variable combinations, to obtain the initial layout, the M preset division regions corresponding to the M test pattern groups one by one; the marking the test pattern groups in the initial layout in which parameter variables do not meet the attribute restriction rules matched with the target test pattern type, to obtain the intermediate layout, comprises: based on the attribute restriction rules, marking preset division regions corresponding to test pattern groups in the initial layout in which parameter variables do not meet the attribute restriction rules, to obtain the intermediate layout; the performing the Boolean operation on the initial layout and the intermediate layout, to obtain the target layout meeting the layout manufacturing standard, comprises: performing a Boolean operation on the initial layout and the intermediate layout to determine at least one preset division region which is not marked and is contained in both the initial layout and the intermediate layout; obtaining the target layout based on the at least one preset division region which is not marked and a corresponding test pattern group of the at least one preset division region; the N parameter variables include at least one of a line width parameter variable, a pitch parameter variable, and an angle-to-angle pitch parameter variable.

9. A layout construction apparatus characterized by comprising: The device comprises a processor and a memory storing computer program instructions; The processor executes the computer program instructions to implement the layout construction method according to any one of claims 1-7.

10. A computer-readable storage medium, characterized in that, The computer readable storage medium stores computer program instructions, and the computer program instructions are executed by the processor to implement the layout construction method according to any one of claims 1-7.

11. A computer program product, characterised in that, The instructions in the computer program product are executed by the processor of the electronic device, and the electronic device executes the layout construction method according to any one of claims 1-7.

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