Micro-environmental control architecture for a lithography machine

Abstract

Provided is a micro-environment control architecture of a photoetching machine. The micro-environment control architecture of the photoetching machine comprises: a main controller; a temperature control sub-closed loop architecture for realizing temperature control by the main controller based on the state of a temperature controller; a basic equipment control sub-closed loop architecture for connecting the main controller with basic equipment and corresponding sensors to control the operation of the basic equipment and monitor the operation state of the basic equipment in real time; and a safety control sub-closed loop architecture for realizing double safety protection of equipment by the main controller through a safety controller based on safety-related sensors. In this way, micro-environment control is realized through the main controller and multiple sub-closed loop control architectures related to sub-equipment, thereby improving the closed loop control performance of the whole machine.

Description

Technical Field

[0001] This application relates to the field of lithography machine technology, and more specifically, to a microenvironment control architecture for a lithography machine. Background Technology

[0002] Photolithography machines are essential equipment in the semiconductor manufacturing process. Their function is to precisely transfer circuit patterns from a photomask (also known as a mask) to a silicon wafer or other substrate according to predetermined dimensions and positions through an exposure process.

[0003] Existing lithography machines primarily rely on independent control for micro-environment control (including start-up and stop functions). This means they depend on a single PLC (Programmable Logic Controller) for I / O (input / output) signal processing to handle alarm information and control related equipment. Consequently, when an anomaly occurs during startup, the machine cannot automatically process error messages and remains in a paused state, requiring manual intervention. Furthermore, the shutdown process does not consider the sequence of individual devices, and the program does not determine completion after shutdown; instead, manual judgment is required, resulting in a semi-automatic control system. Additionally, malfunctions can directly disconnect related equipment, easily causing damage.

[0004] In other words, existing micro-environment control schemes for lithography machines, while achieving simple control of the micro-environment, do not fully consider the safety of the equipment itself. Furthermore, the PLC has no communication with other control devices and cannot obtain the status of each sub-device in real time, thus failing to achieve closed-loop precise control.

[0005] Therefore, it is desirable to provide an improved microenvironment control scheme for lithography machines. Summary of the Invention

[0006] This application provides a micro-environment control architecture for a lithography machine, which achieves micro-environment control through a main controller and multiple sub-closed-loop control architectures related to sub-devices, thereby improving the overall closed-loop control performance of the machine.

[0007] According to one aspect of this application, a microenvironment control architecture for a lithography machine is provided, comprising: a main controller; a temperature control sub-closed-loop architecture for implementing temperature control by the main controller based on the state of a temperature controller; a basic equipment control sub-closed-loop architecture for connecting the main controller with basic equipment and corresponding sensors to control the operation of the basic equipment and monitor the operating status of the basic equipment in real time; and a safety control sub-closed-loop architecture for the main controller to perform dual protection of equipment safety based on safety-related sensors through a safety controller.

[0008] In the microenvironment control architecture of the lithography machine described above, the main controller is further connected to the host computer and reports the operating status of each sub-closed-loop control architecture of the microenvironment control architecture to the host computer.

[0009] In the microenvironment control architecture of the lithography machine described above, the main controller receives temperature data and alarm information autonomously reported by the temperature controller, and receives safety operation status autonomously reported by the safety controller.

[0010] In the microenvironment control architecture of the aforementioned lithography machine, before the lithography machine system is started, the main controller detects gas and cooling water pressure through the pressure sensor of the basic equipment control sub-closed-loop architecture.

[0011] In the microenvironment control architecture of the lithography machine described above, after the lithography machine system is started, the main controller detects the cooling water flow rate through the flow detector of the basic equipment control sub-closed-loop architecture, and in response to the cooling water flow rate being less than a predetermined threshold, executes stop logic for a predetermined time to stop the start-up process and closes the cooling water valve in the basic equipment.

[0012] In the aforementioned microenvironment control architecture of the lithography machine, in response to normal cooling water flow, the main controller starts the air conditioning system in the basic equipment via the basic equipment control sub-closed-loop architecture. This includes: when the main blower of the air conditioning system is started, the main controller detects the start-up of the main blower via the wind speed sensor of the basic equipment control sub-closed-loop architecture; after detecting that the main blower is starting normally, the compressor of the air conditioning system is started after a predetermined compressor start-up time delay, and the main controller detects the start-up of the compressor via the pressure sensor of the basic equipment control sub-closed-loop architecture; when the main controller detects that the air inlet temperature of the air conditioning system is lower than a predetermined low temperature threshold via the temperature control sub-closed-loop architecture, the main heater of the air conditioning system is started; and after the main heater is operating normally, the main controller performs temperature control operations via the temperature control sub-closed-loop architecture.

[0013] In the microenvironment control architecture of the aforementioned lithography machine, the main controller's activation of the air conditioning system in the basic equipment via the basic equipment control sub-closed-loop architecture further includes: cutting off the power supply when the real-time temperature value detected by the temperature detection sensor of the safety control sub-closed-loop architecture is higher than a predetermined high-temperature threshold; and, when the ambient temperature of the air conditioning system still fails to reach the target temperature after a predetermined air conditioning temperature control time is detected by the temperature sensor of the temperature control sub-closed-loop architecture, an alarm is triggered by the main controller and / or the safety control sub-closed-loop architecture.

[0014] In the microenvironment control architecture of the aforementioned lithography machine, the main controller starts the objective liquid cooling temperature control system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: after opening the coolant solenoid valve of the objective liquid cooling temperature control system, delaying the magnetic pump start-up time to start the electronic cooling plate and the magnetic pump; and, in response to the main controller detecting magnetic pump overload through the liquid level sensor of the basic equipment control sub-closed-loop architecture or detecting circulating liquid flow rate below a predetermined threshold through the flow sensor, shutting down the magnetic pump and the objective liquid cooling temperature control system.

[0015] In the microenvironment control architecture of the aforementioned lithography machine, the main controller's activation of the objective liquid cooling temperature control system in the basic equipment via the basic equipment control sub-closed-loop architecture further includes: when the ambient temperature of the objective liquid cooling temperature control system still fails to reach the target temperature after the temperature sensor of the temperature control sub-closed-loop architecture detects a predetermined objective liquid cooling temperature control time, the main controller and / or the safety control sub-closed-loop architecture issue an alarm.

[0016] In the microenvironment control architecture of the aforementioned lithography machine, the main controller starts the mercury lamp exhaust system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: after starting the exhaust fan of the mercury lamp exhaust system, the main controller detects the exhaust fan wind speed through the wind speed sensor of the basic equipment control sub-closed-loop.

[0017] In the microenvironment control architecture of the aforementioned lithography machine, the main controller starts the objective lens heat dissipation system in the basic equipment through the control sub-closed-loop architecture of the basic equipment, including: after starting the air blowing solenoid valve of the objective lens heat dissipation system, the main controller detects the flow of the air blowing solenoid valve through the flow sensor of the control sub-closed-loop of the basic equipment.

[0018] In the microenvironment control architecture of the aforementioned lithography machine, in response to the normal temperature control of the temperature controller through the temperature controller of the temperature control sub-closed-loop architecture, the main controller starts the mercury lamp power supply in the basic equipment and opens the lamp chamber blowing solenoid valve in the basic equipment; and, in response to the main controller detecting that the blowing pressure is normal through the pressure sensor of the control sub-closed-loop architecture of the basic equipment, the main controller lights up the mercury lamp through the control sub-closed-loop architecture of the basic equipment.

[0019] In the microenvironment control architecture of the aforementioned lithography machine, in the stop logic: the main controller controls the heater of the air conditioning system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the ambient temperature is lower than the target temperature, it stops the compressor and main blower of the air conditioning system, and detects whether the wind speed is zero through the wind speed sensor; the main controller controls the heating rod of the objective liquid cooling temperature control system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the temperature is lower than the target temperature plus a margin, it shuts down the magnetic pump and electronic cooling plate of the objective liquid cooling temperature control system, and detects whether the pipeline flow rate is lower than the flow threshold through the wind speed sensor, and closes the solenoid valve in response to the pipeline flow rate being lower than the flow threshold; and the main controller delays the shutdown of the objective system and the cooling water valve.

[0020] The micro-environment control architecture of the lithography machine provided in this application embodiment can realize micro-environment control through multiple sub-closed-loop control architectures related to the main controller and sub-devices, thereby improving the overall closed-loop control performance of the machine. Attached Figure Description

[0021] Various other advantages and benefits of this application will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiments below. The accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this application. It is obvious that the drawings described below are merely some embodiments of this application, and those skilled in the art can obtain other drawings based on these drawings without any inventive effort. Furthermore, the same reference numerals denote the same parts throughout the drawings.

[0022] Figure 1 The illustration shows a schematic flowchart of the microenvironment control architecture of a lithography machine according to an embodiment of this application.

[0023] Figure 2 The illustration shows an example of a large closed-loop control architecture for a lithography machine's microenvironment control architecture according to an embodiment of this application.

[0024] Figure 3 The figure illustrates the startup control principle of the microenvironment control architecture of a lithography machine according to an embodiment of this application.

[0025] Figure 4 The figure illustrates a schematic diagram of the stop control principle of the microenvironment control architecture of a lithography machine according to an embodiment of this application. Detailed Implementation

[0026] Hereinafter, exemplary embodiments according to this application will be described in detail with reference to the accompanying drawings. Obviously, the described embodiments are merely some embodiments of this application, and not all embodiments of this application. It should be understood that this application is not limited to the exemplary embodiments described herein.

[0027] Figure 1 The illustration shows a schematic flowchart of the microenvironment control architecture of a lithography machine according to an embodiment of this application.

[0028] like Figure 1 As shown, the microenvironment control architecture of the lithography machine according to an embodiment of this application includes multiple sub-closed-loop control architectures related to the main controller, namely, a temperature control sub-closed-loop architecture, a basic equipment control sub-closed-loop architecture, and a safety control sub-closed-loop architecture. In an embodiment of this application, the main controller can be implemented as a programmable logic circuit (PLC), for example.

[0029] Specifically, the temperature control sub-closed-loop architecture is used by the main controller to achieve temperature control based on the state of the temperature controller. Here, the main controller obtains the temperature controller's state, including its own hardware state and temperature control state, by communicating with the temperature controller, in order to perform temperature control. The temperature controller can further connect to a temperature sensor to achieve real-time reading of the controlled temperature and connect to the temperature control equipment to obtain the operating status of each temperature control channel.

[0030] The basic equipment control sub-closed-loop architecture is used to connect the main controller with the basic equipment and corresponding sensors to control the operation of the basic equipment and monitor its operating status in real time. Here, the basic equipment includes, for example, blowers, compressors, and heaters; correspondingly, the sensors include wind speed sensors, pressure sensors, and flow sensors. Thus, when one or more basic equipment malfunctions, the basic equipment control sub-closed-loop architecture can perform hierarchical sub-closed-loop processing.

[0031] The safety control sub-closed-loop architecture is used by the main controller to provide dual safety protection for the equipment based on safety-related sensors via a safety controller. For example, these safety-related sensors may include leakage detection sensors, temperature detection sensors, and door lock detection sensors. This allows the safety controller to shut down corresponding equipment or cut off dangerous power supplies to the entire machine based on alarms at different locations and alarm levels, ensuring equipment safety. In other words, while the temperature control sub-closed-loop architecture acquires the temperature status of the entire equipment for temperature control, it can further acquire alarms such as over-temperature or leakage for safety protection.

[0032] Therefore, the microenvironment control architecture of the lithography machine according to the embodiments of this application includes: a main controller; a temperature control sub-closed-loop architecture, used by the main controller to achieve temperature control based on the state of the temperature controller; a basic equipment control sub-closed-loop architecture, used by the main controller to connect with the basic equipment and corresponding sensors to control the operation of the basic equipment and monitor the operating status of the basic equipment in real time; and a safety control sub-closed-loop architecture, used by the main controller to perform double protection of equipment safety based on safety-related sensors through a safety controller.

[0033] Furthermore, the main controller and the safety controller can be further connected to a host computer, thereby reporting the operating status of the main controller and the microenvironment through active communication with the host computer, realizing the entire closed-loop control, that is, the overall safe operation of the controlled equipment during the equipment start-up or shutdown process. Here, in the microenvironment control architecture of the lithography machine according to the embodiment of this application, the main controller can act as the master station and the host computer as the server, effectively reducing the communication load of the host computer. After configuring the communication parameters, the host computer only needs to read the status information reported by the main controller at the agreed address, changing from one-to-many polling by the host computer to one-to-one reporting by the main controller, significantly reducing communication time and significantly improving business efficiency. Otherwise, when the host computer actively polls the main controller, the polling time may be too long due to too many downstream sub-devices, failing to obtain the status of the downstream sub-devices in a timely manner and affecting business efficiency.

[0034] Therefore, by actively establishing communication with the host computer, such as Modbus TCP communication, the PLC can reduce the communication load caused by the host computer polling the slave computer, and can report the operating status of the micro-environment sub-closed-loop architecture to the host computer in a timely manner, so that the host computer can synchronously obtain the operating status of the micro-environment. In addition, through TCP communication, a heartbeat signal can be added to the operating status, so that the host computer can more directly determine whether the communication has been established.

[0035] Furthermore, in this embodiment, the main controller receives temperature data and alarm information autonomously reported by the temperature controller, and receives operating status autonomously reported by the safety controller, which can reduce the communication load of the PLC itself and improve communication efficiency.

[0036] In addition, the safety controller can also proactively report the safety operation status to the host computer, thereby improving the overall closed-loop control capability of the microenvironment control architecture of the lithography machine.

[0037] Therefore, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, the main controller is further connected to the host computer and reports the operating status of each sub-closed-loop control architecture of the microenvironment control architecture to the host computer.

[0038] Furthermore, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, the main controller receives temperature data and alarm information autonomously reported by the temperature controller, and receives the safety operation status autonomously reported by the safety controller.

[0039] Furthermore, the host computer can communicate with the uninterruptible power supply (UPS) in real time to obtain the power supply status of the entire unit and perform corresponding control. For example, after detecting that the UPS has entered battery mode, the current equipment status can be saved so that maintenance personnel can access the current log during maintenance, thereby quickly finding and resolving problems.

[0040] In addition, the main controller can be further connected to an alarm device, such as a human-machine interface (HMI) for providing alarms to operators.

[0041] Therefore, the micro-environment control architecture of the lithography machine according to the embodiments of this application can realize a large closed-loop control composed of multiple sub-closed-loop controls, such as... Figure 2 As shown. Here, Figure 2 The illustration shows an example of a large closed-loop control architecture for a lithography machine's microenvironment control architecture according to an embodiment of this application.

[0042] That is, the closed-loop control architecture of the microenvironment control architecture of the lithography machine may include: host computer 1, main controller (PLC) 2, safety controller 3, leakage detection sensor 4, temperature detection sensor 5, door lock detection sensor 6, UPS 7, basic equipment 8, temperature controller 9, temperature sensor 10, temperature control equipment 11, sensor 12 (including sensors for wind speed, flow rate, pressure, liquid level, etc.), HMI 13, audible and visual alarm 14, and other components.

[0043] The host computer 1 is connected to the safety controller 3, UPS 7 and main controller (PLC) 2. The safety controller 3 is connected to the leakage detection sensor 4, temperature detection sensor 5, door lock detection sensor 6 and audible and visual alarm 14. The temperature controller 9 is connected to the temperature sensor 10 and temperature control device 11. The main controller (PLC) is connected to the host computer 1, safety controller 3, basic equipment 8, temperature controller 9, sensor 12 and HMI 13 to realize the entire large closed-loop control.

[0044] Figure 3 The illustration shows a schematic diagram of the startup control principle of the microenvironment control architecture of a lithography machine according to an embodiment of this application. Figure 3 As shown, the startup logic and security detection of the microenvironment control architecture of the lithography machine according to an embodiment of this application include:

[0045] 1. Before system startup, the main controller (PLC) 2 detects the positive and negative pressure of gas and the pressure of plant cooling water through pressure sensors. If an abnormality occurs, the alarm information is displayed on HMI 13 and simultaneously reported to the host computer 1. Here, the main controller 2 or the host computer 1 can simultaneously control the safety controller 3 to issue an audible and visual alarm to remind the operator to intervene and check. After normal operation, proceed to the next step.

[0046] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, before the lithography machine system is started, the main controller detects the gas and cooling water pressure through the pressure sensor of the basic equipment control sub-closed-loop architecture.

[0047] 2. After the system starts, the plant cooling water valve (belonging to basic equipment 8) opens. The system detects whether the flow is abnormal through the flow sensor. If an abnormality is detected, an alarm signal is triggered. If the flow is too high, the operator can be reminded to pay attention to the plant water supply through the HMI 13 interface without affecting the startup process. If the flow is too low, the startup process is stopped after a certain delay, the plant cooling water valve is closed, the stop logic is executed, and the operator is reminded to check the main plant water supply valve. After confirming that the flow has returned to normal, the equipment is restarted.

[0048] Here, compared to traditional cooling water flow detection which only alarms for high or low flow rates without providing specific numerical values, resulting in alarms and equipment shutdowns even when the flow rate is only 0.1 liters / minute higher or lower, this embodiment directly obtains the specific flow rate value. Flow rate thresholds and alarm delays can be set and displayed in real time, improving controllability and operability. Furthermore, data setting permissions can be enhanced by establishing secure accounts, preventing accidental operation by on-site personnel.

[0049] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, after the lithography machine system is started, the main controller detects the cooling water flow through the flow detector of the basic equipment control sub-closed-loop architecture, and in response to the cooling water flow being less than a predetermined threshold, executes stop logic for a predetermined time to stop the start-up process and closes the cooling water valve in the basic equipment.

[0050] 3. Once the cooling water flow is normal, the air conditioning system, LLCT system, mercury lamp exhaust system, and objective lens cooling system will start simultaneously:

[0051] 3.1 When the main blower of the air conditioning system (belonging to basic equipment 8) starts, the main controller (PLC) 2 performs wind speed detection and hardware fault detection at each air outlet. If an abnormality occurs, the main controller (PLC) 2 actively shuts down the corresponding equipment, executes the stop logic, and issues an audible and visual alarm through the HMI 13 interface and the host computer 1 controlling the safety controller 3 to remind the operator to intervene and check. After the main blower starts normally, for example, after a 5-second delay, the compressor (belonging to basic equipment 8) starts. The main controller (PLC) 2 performs high and low pressure detection and hardware fault detection on the compressor (belonging to basic equipment 8). If an abnormality occurs, the main controller (PLC) 2 actively shuts down the corresponding equipment, executes the stop logic, and issues an audible and visual alarm through the HMI 13 interface and the host computer 1 controlling the safety controller 3 to remind the operator to intervene and check.

[0052] When the temperature sensor detects that the air inlet temperature of the entire unit is lower than the target temperature, for example, 21℃, the main heater (belonging to basic equipment 8) is activated. In case of an anomaly, the main controller (PLC) 2 actively shuts down the main heater and notifies the host computer 1. At the same time, it executes the stop logic and displays the alarm on the HMI 13 interface and the host computer 1 controls the safety controller 3 to issue an audible and visual alarm, reminding the operator to intervene and check. During this period, the safety controller 3 continuously acquires real-time temperature values ​​to determine whether the area around the equipment is overheated. If the temperature exceeds 80℃, it assumes a fire possibility and will cut off the dangerous power supply to the entire unit. After the main heater is running normally, the main controller (PLC) 2 begins temperature control. For example, if the temperature sensor detects that the ambient temperature of the equipment still does not reach the target temperature after 40 minutes, the main controller (PLC) 2 displays the alarm on the HMI 13 interface and the host computer 1 controls the safety controller 3 to issue an audible and visual alarm, reminding the operator to intervene and check. After the ambient temperature returns to normal, the air conditioning system is fully activated. At this time, the main controller (PLC) 2 will still monitor the status of each sub-equipment.

[0053] Here, without actual output wind speed feedback and only overload detection, the equipment's operational performance cannot be guaranteed. Therefore, in this embodiment, by directly acquiring the specific wind speed values ​​of each air outlet, the wind speed thresholds and alarm delays at different locations can be set and displayed in real time, improving controllability and operability. Furthermore, data setting permissions can be enhanced by setting a security account, preventing accidental operation by on-site personnel.

[0054] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, in response to normal cooling water flow, the main controller starts the air conditioning system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: when the main blower of the air conditioning system is started, the main controller detects the start of the main blower through the wind speed sensor of the basic equipment control sub-closed-loop architecture; after detecting that the main blower is starting normally, the compressor of the air conditioning system is started after a predetermined compressor start time delay, and the main controller detects the start of the compressor through the pressure sensor of the basic equipment control sub-closed-loop architecture; when the main controller detects that the air inlet temperature of the air conditioning system is lower than a predetermined low temperature threshold through the temperature control sub-closed-loop architecture, the main heater of the air conditioning system is started; and after the main heater is operating normally, the main controller performs temperature control operation through the temperature control sub-closed-loop architecture.

[0055] Furthermore, in the microenvironment control architecture of the aforementioned lithography machine, the main controller's activation of the air conditioning system in the basic equipment via the basic equipment control sub-closed-loop architecture further includes: cutting off the power supply when the real-time temperature value detected by the temperature detection sensor of the safety control sub-closed-loop architecture is higher than a predetermined high-temperature threshold; and, when the ambient temperature of the air conditioning system still fails to reach the target temperature after a predetermined air conditioning temperature control time is detected by the temperature sensor of the temperature control sub-closed-loop architecture, an alarm is triggered by the main controller and / or the safety control sub-closed-loop architecture.

[0056] 3.2 When the coolant solenoid valve (part of basic equipment 8) of the Lens Liquid Temperature Control (LLTC) system is opened, the electronic cooling plate (part of basic equipment 8) and the magnetic pump (part of basic equipment 8) are started after a 1-second delay. If the magnetic pump is detected to be overloaded by the level sensor, the magnetic pump is shut down and the LLTC system is shut down. If the circulating fluid flow rate is detected to be too high by the flow sensor, personnel are alerted. If the flow rate is too low, it indicates an abnormality in the LLTC pipeline or the magnetic pump. The magnetic pump is shut down and the LLTC system is shut down. If the coolant level in the tank is detected to be below 40% by the level sensor, the operator is reminded to add coolant after the end of the day's work.

[0057] After the equipment in the LLTC system starts up normally, it continues to perform temperature control. For example, if the overall temperature still does not reach the target temperature after 30 minutes, the system will issue an audible and visual alarm through the HMI 13 interface and the host computer 1 controls the safety controller 3 to remind the operator to intervene and check. Furthermore, after the temperature of the LLTC system returns to normal, the LLTC system starts up completely, and the main controller (PLC) 2 will continue to monitor the status of each sub-device.

[0058] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, the main controller starts the LLTC system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: after opening the coolant solenoid valve of the LLTC system, delaying the magnetic pump start-up time to start the electronic cooling plate and the magnetic pump; in response to the main controller detecting that the magnetic pump is overloaded through the liquid level sensor of the basic equipment control sub-closed-loop architecture or detecting that the circulating liquid flow rate is lower than a predetermined threshold through the flow sensor, shutting down the magnetic pump and the LLTC system.

[0059] Furthermore, in the microenvironment control architecture of the aforementioned lithography machine, the main controller's activation of the LLTC system in the basic equipment via the basic equipment control sub-closed-loop architecture further includes: when the ambient temperature of the LLTC system still fails to reach the target temperature after the temperature sensor of the temperature control sub-closed-loop architecture detects a predetermined LLTC temperature control time, the main controller and / or the safety control sub-closed-loop architecture issue an alarm.

[0060] 3.3 Mercury lamp exhaust system starts. After the exhaust fan (belonging to basic equipment 8) starts, the main controller (PLC) 2 performs wind speed and fault detection. If there is an abnormality, it will be displayed on the HMI 13 interface and the host computer 1 will control the safety controller 3 to issue an audible and visual alarm. If there is no abnormality, the mercury lamp exhaust system starts up.

[0061] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, the main controller starts the mercury lamp exhaust system in the basic equipment through the basic equipment control sub-closed-loop architecture, including: after starting the exhaust fan of the mercury lamp exhaust system, the main controller detects the exhaust fan wind speed through the wind speed sensor of the basic equipment control sub-closed-loop.

[0062] 3.4 When the objective lens cooling system is started, the air blowing solenoid valve (part of basic equipment 8) is opened. If the flow rate is abnormal, if it is too high, the personnel should be reminded to pay attention to the exposure effect and the temperature near the objective lens; if it is too low, the personnel should be reminded to check whether the solenoid valve (part of basic equipment 8) is damaged.

[0063] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, the main controller starts the objective lens heat dissipation system in the basic device through the basic device control sub-closed-loop architecture, including: after starting the air blowing solenoid valve of the objective lens heat dissipation system, the main controller detects the flow of the air blowing solenoid valve through the flow sensor of the basic device control sub-closed-loop.

[0064] 4. After the main controller (PLC) 2 achieves normal temperature control, HMI 13 prompts to start the mercury lamp power supply. At the same time, the lamp chamber air blowing solenoid valve (belonging to basic equipment 8) opens. If the air blowing pressure is abnormal, the main controller (PLC) 2 will cut off the mercury lamp power supply (belonging to basic equipment 8), and remind personnel not to perform the lighting operation, and check whether the air blowing solenoid valve (belonging to basic equipment 8) is damaged. After the pressure detection is normal, the mercury lamp (belonging to basic equipment 8) can be lit. The mercury lamp starts timing and synchronously feeds back to the host computer. At this time, the system startup is complete.

[0065] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, in response to the normal temperature control of the temperature controller through the temperature controller of the temperature control sub-closed-loop architecture, the main controller starts the mercury lamp power supply in the basic equipment and opens the lamp chamber blowing solenoid valve in the basic equipment; and in response to the main controller detecting that the blowing pressure is normal through the pressure sensor of the basic equipment control sub-closed-loop architecture, the main controller lights up the mercury lamp through the basic equipment control sub-closed-loop architecture.

[0066] Therefore, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, during the microenvironment startup process, the status of each sub-device can be continuously acquired to ensure that each sub-device starts up gradually according to the preset program based on feedback. Moreover, during normal operation, the wind temperature, wind speed, and air volume can be adjusted in real time according to the temperature and wind speed at different locations to maximize the guarantee of the temperature control requirements at the corresponding locations.

[0067] Figure 4 The illustration shows a schematic diagram of the stop control principle of the microenvironment control architecture of a lithography machine according to an embodiment of this application. Figure 4 As shown, the stop logic of the microenvironment control architecture of the lithography machine is as follows:

[0068] 1. Upon receiving a stop command, such as detecting that the stop button has been pressed, the main controller (PLC) 2 controls the heater of the air conditioning system to stop. When the ambient temperature is lower than the target temperature, such as 21°C, the main controller (PLC) 2 controls the compressor and main blower to stop, and checks if the fan speed is 0. If the temperature repeatedly rises within a predetermined time, such as 10 minutes, the cooling system can be restarted until it is completely cooled down.

[0069] 2. When the LLTC system stops, the heating rod stops. When the main controller (PLC)2 detects that the circulating fluid temperature is lower than the target temperature plus a margin, such as 22℃, the main controller (PLC)2 shuts down the magnetic pump and electronic cooling fins, and checks whether the pipeline flow rate is lower than the flow threshold, such as 0.2 liters / minute. If so, the solenoid valve is closed.

[0070] 3. The objective lens system and the plant cooling water valve are both closed by the main controller (PLC2) with a delay to ensure heat dissipation.

[0071] That is, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, in the stop logic: the main controller controls the heater of the air conditioning system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the ambient temperature is lower than the target temperature, it stops the compressor and main blower of the air conditioning system, and detects whether the wind speed is zero through the wind speed sensor; the main controller controls the heating rod of the LLTC system to stop, and when the temperature sensor of the environmental control sub-closed-loop architecture detects that the temperature is lower than the target temperature plus a margin, it shuts down the magnetic pump and electronic cooling plate of the LLTC system, and detects whether the pipeline flow rate is lower than the flow threshold through the wind speed sensor, and closes the solenoid valve in response to the pipeline flow rate being lower than the flow threshold; and the main controller delays the closing of the objective lens system and the plant cooling water valve.

[0072] Therefore, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, when the service execution is completed and there is no temperature control requirement, each sub-device can be gradually stopped according to safety requirements.

[0073] Furthermore, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, an alarm handling program can be automatically entered when there is an abnormality, and different handling methods can be implemented according to different alarm types to ensure that the problem is not over-processed and affects business efficiency.

[0074] In summary, in the microenvironment control architecture of the lithography machine according to the embodiments of this application, closed-loop control for stable and safe operation of the microenvironment is achieved through the connection of the main controller with the sub-devices and the main controller's own digital input / output (DIO) signals; the main controller actively establishes communication with the host computer, reducing the communication load on the host computer and improving the overall business efficiency; the temperature controller and safety controller actively communicate with the main controller to obtain real-time temperature values ​​and realize different handling methods for different temperature alarms, reducing the number of times the system is directly shut down; during the system shutdown process, the power supply to the equipment is not arbitrarily cut off, but is stopped gradually according to a preset program to reduce damage to the equipment hardware, etc.

[0075] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0076] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0077] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.

[0078] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.

[0079] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A micro-environment control architecture of a lithography machine, comprising: a main controller; a temperature control sub-loop architecture for temperature control by the main controller based on a state of a temperature controller; a basic equipment control sub-loop architecture for connection by the main controller with basic equipment and corresponding sensors to control operation of the basic equipment and monitor a running state of the basic equipment in real time; and, a safety control sub-loop architecture for device safety double protection by the main controller based on safety-related sensors through a safety controller.

2. The micro-environmental control architecture for a lithography machine of claim 1, wherein, The main controller is further connected with a host computer and reports to the host computer a running state of each sub-loop control architecture of the micro-environment control architecture.

3. The micro-environmental control architecture for a lithography machine of claim 1, wherein, The main controller receives temperature data and alarm information autonomously reported by the temperature controller and receives safety running states autonomously reported by the safety controller.

4. The micro-environmental control architecture for a lithography machine of claim 1, wherein, Before the lithography machine system starts, the main controller performs gas and cooling water pressure detection through a pressure sensor of the basic equipment control sub-loop architecture.

5. The micro-environmental control architecture for a lithography machine of claim 4, wherein, After the lithography machine system starts, the main controller detects cooling water flow through a flow detector of the basic equipment control sub-loop architecture, and in response to the cooling water flow being less than a predetermined threshold, delays for a predetermined time to execute a stop logic to stop the start process and close a cooling water valve in the basic equipment.

6. The micro-environmental control architecture for a lithography machine of claim 5, wherein, In response to the cooling water flow being normal, the main controller starts an air conditioning system in the basic equipment through the basic equipment control sub-loop architecture, comprising: In the case of starting a main air blower of the air conditioning system, the main controller performs main air blower start detection through an air speed sensor of the basic equipment control sub-loop architecture; After detecting that the main air blower starts normally, the main controller starts a compressor of the air conditioning system after a predetermined compressor start time, and performs compressor start detection through a pressure sensor of the basic equipment control sub-loop architecture; When the main controller detects that an air inlet temperature of the air conditioning system is lower than a predetermined low temperature threshold through the temperature control sub-loop architecture, the main controller starts a main heater of the air conditioning system; and, After the main heater operates normally, the main controller performs temperature control operation through the temperature control sub-loop architecture.

7. The micro-environmental control architecture for a lithography machine of claim 6, wherein, The main controller starts the air conditioning system in the basic equipment through the basic equipment control sub-loop architecture further comprising: When a real-time temperature value detected by a temperature detection sensor of the safety control sub-loop architecture is higher than a predetermined high temperature threshold, the power is cut off; and, When a device environment temperature of the air conditioning system still fails to reach a target temperature after a predetermined air conditioning temperature control time is detected by a temperature sensor of the temperature control sub-loop architecture, the main controller and / or the safety control sub-loop architecture alarms.

8. The micro-environmental control architecture for a lithography machine of claim 7, wherein, The main controller starts an objective lens liquid cooling temperature control system in the basic equipment through the basic equipment control sub-loop architecture, comprising: After starting a cooling liquid electromagnetic valve of the objective lens liquid cooling temperature control system, the main controller starts an electronic cooling fin and a magnetic drive pump after a magnetic drive pump start time; and In response to the main controller detecting that the magnetic force pump is overloaded by the liquid level sensor of the basic equipment control sub-closed loop architecture or detecting that the circulating liquid flow is lower than a predetermined threshold by the flow sensor, the magnetic force pump and the objective lens liquid cooling temperature control system are turned off.

9. The micro-environmental control architecture for a lithography machine of claim 8, wherein, The main controller starting the objective lens liquid cooling temperature control system in the basic equipment through the basic equipment control sub-closed loop architecture further comprises: When the device ambient temperature of the objective lens liquid cooling temperature control system still fails to reach the target temperature after a predetermined objective lens liquid cooling temperature control temperature control time is detected by the temperature sensor of the temperature control sub-closed loop architecture, the main controller and / or the safety control sub-closed loop architecture alarms.

10. The micro-environmental control architecture for a lithography machine of claim 9, wherein, The main controller starting the mercury lamp exhaust system in the basic equipment through the basic equipment control sub-closed loop architecture comprises: After starting the exhaust fan of the mercury lamp exhaust system, the main controller detects the exhaust fan wind speed through the wind speed sensor of the basic equipment control sub-closed loop.

11. The micro-environmental control architecture for a lithography machine of claim 10, wherein, The main controller starting the objective lens heat dissipation system in the basic equipment through the basic equipment control sub-closed loop architecture comprises: After starting the blowing electromagnetic valve of the objective lens heat dissipation system, the main controller detects the blowing electromagnetic valve flow through the flow sensor of the basic equipment control sub-closed loop.

12. The micro-environment control architecture of the photoetching machine according to claim 11, wherein, In response to the main controller detecting that the temperature control is normal through the temperature controller of the temperature control sub-closed loop architecture, the main controller starts the mercury lamp power supply in the basic equipment and opens the lamp chamber blowing electromagnetic valve in the basic equipment; and, In response to the main controller detecting that the blowing pressure is normal through the pressure sensor of the basic equipment control sub-closed loop architecture, the main controller turns on the mercury lamp through the basic equipment control sub-closed loop architecture.

13. The micro-environmental control architecture for lithography machines as claimed in claim 1, wherein, In the stop logic: The main controller controls the heater of the air conditioning system to stop, and when the ambient temperature is lower than the target temperature detected by the temperature sensor of the environment control sub-closed loop architecture, the main controller stops the compressor and the main air blower of the air conditioning system and detects whether the wind speed is zero through the wind speed sensor; The main controller controls the heating rod of the objective lens liquid cooling temperature control system to stop, and when the temperature detected by the temperature sensor of the environment control sub-closed loop architecture is lower than the target temperature plus a margin, the main controller turns off the magnetic force pump and the electronic cooling fin of the objective lens liquid cooling temperature control system, detects whether the pipeline flow is lower than the flow threshold through the wind speed sensor, and turns off the electromagnetic valve in response to the pipeline flow being lower than the flow threshold; and The main controller delays turning off the objective lens system and the cooling water valve.

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