Cleaning assembly with self-cleaning function and electrical equipment
By designing cleaning components with self-cleaning function, using flowing liquid to flush the drum, curved baffle and abutment section, the problem of difficulty in sufficient wetting of the drum surface of existing cleaning equipment and insufficient self-cleaning capacity is solved, and more effective self-cleaning effect.
Patent Information
- Application Number
- CN202311011108.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-08-11
- Publication Date
- 2025-02-18
AI Technical Summary
The drum surface of existing cleaning equipment has a very short duration of soaking with clean water, which is difficult to be fully wet, and has insufficient self-cleaning ability and lacks effective self-cleaning function.
A cleaning component with a self-cleaning function is designed, including a cylindrical rotating part, an arcuate baffle and an abutment part. By forming a channel, the flowing liquid can flow with the high-speed rotation of the cylindrical rotating part, and flush the inside of the channel. The roller, curved baffle and abutment portion are used to achieve self-cleaning.
The contact time between the liquid and the surface of the cylindrical rotating part is extended, the wetting performance is improved, the more effective self-cleaning effect is achieved, the need for manual maintenance is reduced, and the user experience is improved.
Smart Images
Figure CN119453839A_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to cleaning electrical equipment, and more particularly, to a cleaning assembly and electrical equipment with a self-cleaning function. Background Art
[0002] Support surface cleaning devices such as mopping robots, sweeping and mopping robots, floor scrubbers, or handheld electric mops for cleaning floors, desktops, or other support surfaces have a real-time self-cleaning function. However, whether the existing cleaning devices rotate the drum at a high speed to throw out the dirty water by centrifugal force, or rotate the drum at a low speed to squeeze out the dirty water through the abutment portion, the general process is that when the drum cleans the support surface, clean water is fed to the drum, and then the abutment portion abuts the drum to separate the dirty water.
[0003] Some conventionally designed sewage separation processes are short and hasty. For example, the duration of the separation process is related to the drum rotation speed. When the drum rotates at a speed of 400 rpm, for example, the duration is less than 0.1 second. Although the above process can achieve real-time self-cleaning of the drum, due to the very short separation duration, the drum surface cannot be fully wetted by clean water, so the self-cleaning effect is unsatisfactory. In addition, the abutment of the existing cleaning equipment will gradually absorb dirt during the sewage separation process and lack effective abutment self-cleaning ability. Summary of the invention
[0004] The purpose of the present disclosure is to provide a cleaning assembly and an electrical device with a self-cleaning function to solve the above problems existing in the prior art. For example, the drum surface of the prior cleaning device is soaked by clean water for a very short time, so it is difficult to be fully wetted; and the prior cleaning device has insufficient self-cleaning ability and lacks an effective self-cleaning function.
[0005] One aspect of the present disclosure provides a cleaning assembly with a self-cleaning function, comprising: a cylindrical rotating portion, an arc-shaped baffle and an abutment portion. The cylindrical rotating portion can be used to clean a support surface and has a cylindrical surface. The arc-shaped baffle faces the cylindrical surface of the cylindrical rotating portion and can be positioned above the cylindrical rotating portion at a distance from the cylindrical surface. The abutment portion can have a first end and a second end, the first end of the abutment portion can be coupled to the arc-shaped baffle, and the second end of the abutment portion abuts against the cylindrical surface of the cylindrical rotating portion, wherein a portion of the cylindrical surface of the cylindrical rotating portion, the arc-shaped baffle and the abutment portion together form a channel. The channel can be configured to utilize a flowing liquid to clean the interior of the channel in an operating state.
[0006] By using the embodiments of the present disclosure, the high-speed rotation of the cylindrical rotating part in the normal operation state of the cleaning assembly with a self-cleaning function enables the liquid gathered in the channel to flow at high speed along with the cylindrical rotating part. Thus, the liquid flowing in the channel of the self-cleaning device is advantageously allowed to be used from the roller, the arc-shaped baffle and the abutment part inside the main flushing channel, thereby reducing the need for manual maintenance and improving the user experience.
[0007] According to one or more embodiments, the channel has an opening, and the abutment portion and the opening are respectively positioned on both sides of the highest point of the cylindrical rotating portion and are lower than the highest point. With this arrangement, when the liquid flows from the opening on one side of the highest point of the cylindrical rotating portion to the abutment portion on the other side, due to the height difference between the abutment portion and the highest point of the cylindrical rotating portion, the liquid flowing through the highest point of the cylindrical rotating portion can use gravity to accelerate the flow to the abutment portion and thereby strengthen the force of flushing the abutment portion, thereby achieving a better self-cleaning effect.
[0008] According to one or more embodiments, the cylindrical rotating part rotates in the direction of the opening of the channel toward the abutment part in the operating state, so that the liquid can be fed from the opening of the channel to the abutment part by the cylindrical rotating part.
[0009] According to one or more embodiments, in response to the rotation of the cylindrical rotating part, the liquid flows along the rotation direction and washes a portion of the cylindrical surface of the cylindrical rotating part inside the channel, the inner surface of the arc-shaped baffle, and the inner surface of the abutment. In this way, the liquid gathered in the channel can flow to the abutment as the cylindrical rotating part rotates and thereby wash the inside of the channel and the inside of the abutment, thereby achieving a better self-cleaning effect.
[0010] According to one or more embodiments, the shape of the arc-shaped baffle plate is adapted to the shape of the cylindrical surface of the cylindrical rotating part. In this way, the turbulence formed by the liquid flowing in the channel between the arc-shaped baffle plate and the cylindrical rotating part can be reduced, thereby maintaining the kinetic energy carried by the liquid as much as possible, thereby achieving a better self-cleaning effect.
[0011] According to one or more embodiments, the first end of the abutment portion is detachably coupled to the arc-shaped baffle. In this way, the abutment portion can be removed from the arc-shaped baffle for maintenance as needed, or replaced with a new abutment portion.
[0012] According to one or more embodiments, the abutment portion and the arc-shaped baffle are integrally formed, thereby achieving a firm connection between the abutment portion and the arc-shaped baffle, and this integrated structure can withstand a greater flushing force than a detachable abutment portion, thereby improving the self-cleaning effect.
[0013] According to one or more embodiments, the arc-shaped baffle further comprises a drainage port. The drainage port is coupled to the surface of the arc-shaped baffle facing the cylindrical rotating portion and is configured to provide liquid to the channel. In this way, the embodiments of the present disclosure can feed clean liquid (e.g., clean water) directly into the channel from the drainage port for flushing the interior of the channel and the interior of the abutment portion.
[0014] According to one or more embodiments, the abutment portion further comprises a drain port, which is disposed between the first end and the second end of the scraper strip to allow liquid to flow out of the channel in an operating state. In this way, embodiments of the present disclosure can discharge dirty liquid (e.g., sewage) directly from the channel through the drain port to achieve a better self-cleaning effect.
[0015] According to one or more embodiments, the self-cleaning device further comprises: a first vacuum source coupled to the discharge port, wherein the first vacuum source is in fluid communication with the channel through the discharge port. In this way, the first vacuum source in fluid communication with the discharge port is used to apply negative pressure at the discharge port, thereby accelerating the discharge of liquid flowing to the discharge port of the abutment portion, thereby achieving a better self-cleaning effect.
[0016] According to one or more embodiments, the self-cleaning device further comprises: a second vacuum source having a vacuum opening, the vacuum opening being disposed on the arc-shaped baffle and adjacent to the abutment, wherein the second vacuum source is fluidically connected to the channel through the vacuum opening. By positioning the vacuum opening at a position adjacent to the abutment on the arc-shaped baffle, the velocity of the liquid in the channel can be effectively controlled by controlling the strength of the vacuum source, thereby flexibly controlling the volume flow rate of the liquid discharged from the channel.
[0017] According to one or more embodiments, the length of the distance is between 2 mm and 8 mm. Compared with a larger spacing distance, this distance can make the flow rate of the liquid in the channel faster, thereby obtaining a stronger flushing force on the inner surface of the channel and the abutment, thereby achieving a better self-cleaning effect.
[0018] According to one or more embodiments, the second end of the abutment portion has a scraper bar for squeezing and scraping the cylindrical surface of the cylindrical rotating portion. Through this arrangement, the sewage and dirt on and adsorbed by the cylindrical surface of the cylindrical rotating portion can be effectively cleaned.
[0019] Another aspect of the present disclosure provides an electrical device, comprising: a main body; a cleaning component with a self-cleaning function according to one or more of the above-mentioned embodiments, the cleaning component with a self-cleaning function being coupled to the main body; and a sewage trough, the sewage trough being coupled to the main body and configured to receive sewage from the cleaning component with a self-cleaning function.
[0020] According to one or more embodiments, the electrical device includes any one of the following: a sweeping robot, a mopping robot, a floor scrubber, a sweeping and mopping robot, or a handheld electric mop.
[0021] The various aspects and advantages described above for the self-cleaning device are also applicable to the electrical equipment according to the present disclosure, so the present disclosure will not elaborate on them here. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] Other advantages and designs of the present disclosure are described in detail below with reference to the accompanying drawings, wherein:
[0023] Figure 1 An electrical device according to an embodiment of the present disclosure is shown;
[0024] Figure 2 A cleaning component with a self-cleaning function according to an embodiment of the present disclosure is shown;
[0025] Figure 3 A cross-sectional view of a cleaning assembly with a self-cleaning function according to an embodiment of the present disclosure is shown;
[0026] Figure 4 A cross-sectional view showing a cleaning assembly with a self-cleaning function according to an embodiment of the present disclosure; and
[0027] Figure 5A and Figure 5B A cross-sectional view of a self-cleaning device having a vacuum source and a vacuum opening according to an embodiment of the present disclosure is shown. DETAILED DESCRIPTION
[0028] Unless otherwise indicated, corresponding numbers and symbols in different figures generally refer to corresponding regions. The accompanying drawings are drawn to clearly illustrate the relevant aspects of the embodiments and are not necessarily drawn to scale. The edges of features drawn in the drawings do not necessarily represent the end of the feature range.
[0029] In the following description, various specific details are shown to provide a deeper understanding of various examples of embodiments according to the description. Embodiments may be obtained without one or more of the specific details, or with other methods, components, materials, etc. In other cases, well-known structures, materials, or operations are not shown or described in detail so as not to obscure aspects of the embodiments.
[0030] References to "one embodiment" or "an implementation" in the framework of this specification are intended to indicate that a particular configuration, structure, or characteristic described with respect to the embodiment is included in at least one embodiment. Therefore, phrases such as "in an embodiment," "in one embodiment," etc., which may appear in various aspects of this specification, do not necessarily refer to exactly the same embodiment. Furthermore, particular configurations, structures, or characteristics may be combined in any appropriate manner in one or more embodiments.
[0031] Unless otherwise stated, when referring to two elements being connected together, it means there is no direct connection without any intermediate elements, and when referring to two elements being coupled together, it means the two elements may be connected or they may be coupled via one or more other elements.
[0032] The titles / reference numerals used herein are provided only for ease of reading and therefore do not limit the scope of protection or the scope of the embodiments. The same or similar elements are identified using the same reference numerals.
[0033] In order to perform floor cleaning operations, the cleaning electrical equipment uses a roller to scrub the floor to remove dirt on the floor. After the dirt on the floor is wiped off by the roller and adhered to the surface of the roller, as the roller rotates further, the dirt adhering to the surface of the roller is usually removed by squeezing and scraping the abutment of the roller. However, as the roller continues to scrub the floor, more and more dirt adheres to the surface of the roller, and as the abutment continues to squeeze and scrape the surface of the roller, a part of the dirt adheres to the surface of the abutment and is difficult to remove. Therefore, after being used, the known cleaning electrical equipment still needs to be frequently maintained manually in order to remove the dirt adhering to the surface of the abutment.
[0034] As mentioned above, the self-cleaning ability of known cleaning electrical equipment is not satisfactory, so there is a need to improve the known cleaning electrical equipment. The present disclosure provides a self-cleaning device, which cleans the cylindrical rotating part and the arc-shaped baffle and abutment part matched therewith in real time during the normal operation of the cleaning electrical equipment, thereby improving the self-cleaning ability of the cleaning electrical equipment and reducing the frequency and time of manual maintenance.
[0035] The embodiments of the present disclosure extend the contact time between the liquid and the surface of the cylindrical rotating part by utilizing the surface of the cylindrical rotating part, the arc-shaped baffle plate, and the abutment portion to form a channel that can temporarily gather and guide the flowing liquid (such as clean water or cleaning liquid), thereby improving the wetting performance of the cylindrical rotating part. In addition, the liquid flowing in the channel can continuously rinse the surface of the cylindrical rotating part, the arc-shaped baffle plate, and the abutment portion in the channel in the operating state, thereby effectively realizing the self-cleaning function of cleaning electrical equipment. In addition, the embodiments of the present disclosure do not need to change the structure and position layout of the original cylindrical rotating part and the cylindrical rotating part bracket.
[0036] Figure 1 A schematic diagram of an electrical device E according to an embodiment of the present disclosure is shown. The electrical device E includes a main body 91, a self-cleaning device R, and a sewage tank 92. The self-cleaning device R and the sewage tank 92 are coupled to the main body 91, and the sewage tank 92 is configured to receive sewage from the self-cleaning device in a cleaning operation state. In the cleaning operation state, as the main body 91 moves on the support surface, the self-cleaning device R can also perform a self-cleaning function in real time while cleaning the support surface. After the cleaning operation, the sewage in the sewage tank 92 can be discharged by the electrical device E autonomously or manually.
[0037] Figure 1 The example of the electrical device E being a sweeping robot is shown in FIG. 1 , but the scope of the present disclosure is not limited thereto. For example, the electrical device E according to the present disclosure includes any of the following: a sweeping robot, a mopping robot, a floor scrubber, a sweeping and mopping robot, a handheld electric mop, or any device having a cylindrical rotating portion for cleaning a support surface. The advantages of the electrical device E according to the present disclosure will be specifically referred to in Figures 2 to 5B The self-cleaning device R will be described in detail.
[0038] Figures 2 to 5B 1 shows a self-cleaning device R according to various embodiments of the present disclosure. For example, in Figure 2 The self-cleaning device R shown in the figure includes a cylindrical rotating part 1, an arc-shaped baffle 2 and an abutment portion 3. In the cleaning operation state, the cylindrical rotating part 1 can rotate and scrub the supporting surface in contact with it. The arc-shaped baffle 2 can be configured to prevent the dirt (or sewage) adhered to the surface of the cylindrical rotating part 1 from being thrown out during the scrubbing of the supporting surface when the cylindrical rotating part 1 rotates at a high speed (for example, 400 rpm). The abutment portion 3 can abut against the surface of the cylindrical rotating part 1, and can scrape the surface of the cylindrical rotating part 1 as the cylindrical rotating part 1 rotates, thereby removing the dirt adhered to the surface of the cylindrical rotating part 1.
[0039] In some embodiments, the abutment portion 3 may have a discharge port 33. The discharge port 33 may be disposed at a middle position of the abutment portion 3 in a direction extending along the rotation axis of the cylindrical rotating portion 1. After the dirt is removed from the surface of the cylindrical rotating portion 1, the dirt may be discharged from the self-cleaning device R through the discharge port 33. In some embodiments, a sewage tank may be provided that cooperates with the discharge port 33 to collect the dirt from the discharge port 33.
[0040] Figure 3 The example shows that in the operating state Figure 2 A cross section of the self-cleaning device R taken from the WW plane in FIG. Figure 3The dirt 9 (or sewage) located on the support surface 8 is shown. The cylindrical rotating part 1 of the self-cleaning device R can be used to wipe the dirt 9 on the support surface 8 by rotating. In some embodiments, the cylindrical rotating part 1 can have a cylindrical surface 11, wherein the cylindrical surface 11 can have a rough but soft surface. For example, the cylindrical surface 11 can be provided with a cleaning cloth to scrub the support surface 8 as the cylindrical rotating part 1 rotates. In addition, although the present disclosure shows the dirt 9, the scope of the present disclosure is not limited thereto, for example, the dirt 9 can also be clean water, or other cleaning liquids, etc.
[0041] like Figure 3 As shown in the figure, the arc-shaped baffle 2 can face the cylindrical surface 11 of the cylindrical rotating part 1, and can be positioned above the cylindrical rotating part 1 and separated from the cylindrical surface 11 by a first distance d1. According to an embodiment of the present disclosure, the value of the first distance d1 will significantly affect the flow rate of the liquid in the channel 4. For example, a smaller first distance d1 relative to a larger first distance d1 makes the flow rate of the liquid in the channel 4 faster, thereby obtaining a stronger flushing force on the inner surface of the channel 4 and the abutment 3. According to some embodiments of the present disclosure, the first distance d1 can be less than 8 mm, for example, 6 to 7 mm. In some other cases, the first distance d1 can be less than 2 mm. For example, when the cylindrical surface 11 is provided with a cleaning cloth, there can be interference contact between the arc-shaped baffle 2 and the cylindrical surface 11 with the cleaning cloth in a dry state. Thus, even when the cleaning cloth of the cylindrical surface 11 is wetted and the volume is reduced, the first distance d1 between the cylindrical surface 11 and the arc-shaped baffle 2 remains no more than 8 mm, for example, 6 to 7 mm.
[0042] In addition, the arc-shaped baffle 2 is provided with a low side end 25 and a high side end 26. For example, in some embodiments, the low side end 25 of the arc-shaped baffle 2 can extend downward to a height lower than the rotation axis 121 of the cylindrical rotating part 1. Thus, as the cylindrical rotating part 1 rotates at a speed of, for example, about 400 rpm, the dirt 9 (or sewage) that is not successfully adsorbed to the cylindrical rotating part 1 but splashed as it rotates can be effectively blocked by the low side end 25 of the arc-shaped baffle 2, thereby preventing the spread of the dirt 9. The high side end 26 of the arc-shaped baffle 2 is coupled with the first end 31 of the abutment part 3. The second end 32 of the abutment part 3 that is not coupled with the arc-shaped baffle 2 abuts against the cylindrical surface 11 of the cylindrical rotating part 1. As the cleaning operation proceeds, the dirt 9 adsorbed by the cylindrical surface 11 of the cylindrical rotating part 1 causes the clean water that previously wetted the cylindrical surface 11 to become sewage. In some embodiments, the second end 32 of the abutment part 3 interferes with and squeezes the cylindrical surface 11 at a position abutting against the cylindrical surface 11. For example, when the cylindrical surface 11 is provided with a cleaning cloth, the dirty water in the cleaning cloth is discharged by squeezing the second end 32 of the abutment portion 3 so as to re-wet and absorb clean water. In addition, the second end 32 of the abutment portion 3 is also configured to scrape the cylindrical surface 11 when the cylindrical rotating portion 1 rotates so as to remove the dirt 9 adsorbed by the cylindrical surface 11 from the cylindrical surface 11.
[0043] like Figure 3 As shown in the embodiment of FIG. 1 , the cylindrical surface 11, the arc-shaped baffle plate 2 and the abutment portion 3 form a channel 4. Figure 4 As shown, in some embodiments, the channel 4 may have an opening 41, and the channel 4 may be configured to gather and guide the flowing liquid 93 in the operating state. For example, when the self-cleaning device R moves along the direction 82 on the support surface 8, the cylindrical rotating part 1 may rotate from the opening 41 to the abutment part 3 along the rotation direction 81. In some embodiments, the liquid 93 may come from the cleaning liquid 93 provided on the support surface 8. The liquid 93 wets the cylindrical surface 11 as it contacts the cylindrical surface 11 of the cylindrical rotating part 1 and is adsorbed by the cylindrical surface 11, and then enters the channel 4 as the cylindrical rotating part 1 rotates. In other embodiments, as will be referred to below Figure 4 Specifically described, the liquid 93 may also be a cleaning liquid 93 directly fed into the channel 4 , for example, clean water.
[0044] The flowing liquid 93 in the channel 4 is configured to flow as the cylindrical rotating part 1 rotates, thereby flushing the cylindrical surface 11 of the cylindrical rotating part, the arc-shaped baffle plate 2, and the surface of the abutment part 3 located in the channel 4. In this way, the self-cleaning device R according to the embodiment of the present disclosure realizes a self-cleaning function and prolongs the service life.
[0045] Continue to refer Figure 3 , the lower side end 25 of the arc-shaped baffle 2 and the cylindrical surface 11 of the cylindrical rotating part 1 form an opening 41 of the channel 4. In some embodiments, since the lower side end 25 of the arc-shaped baffle 2 is positioned at a height lower than the rotation axis 121 of the cylindrical rotating part 1, the opening 41 is also positioned at a height lower than the rotation axis 121. For example, in Figure 3 In the illustrated embodiment, the height difference between the opening 41 or the low side end 25 and the rotation axis 121 is a distance d2. In this way, the opening 41 can receive as much dirt (or sewage) splashed by the rotation of the cylindrical rotating part 1 as early as possible and as soon as possible. In addition, the high side end 26 of the arc-shaped baffle 2 can be positioned on the other side opposite to one side of the opening 41 and below the highest point 111 of the cylindrical rotating part 1. In other words, the abutment portion 3 is coupled to a position lower than the highest point 111 of the cylindrical rotating part 1 and higher than the rotation axis 121, and is located on both sides of the highest point 111 with the opening 41. For example, in Figure 3In the illustrated embodiment, the abutment portion 3 is coupled so that the height difference between its second end 32 and the highest point 111 of the cylindrical rotating portion 1 is a distance d3. Thus, when the cylindrical rotating portion rotates along the direction 81 from the opening 41 to the abutment portion 3, when the liquid 93 flows in the channel 4 and flows from the opening 41 on one side of the highest point 111 of the cylindrical rotating portion 1 to the abutment portion 3 on the other side, due to the height difference between the abutment portion 3 and the highest point 111 of the cylindrical rotating portion 1, the liquid 93 flowing through the highest point 111 of the cylindrical rotating portion 1 can use gravity to accelerate the flow to the abutment portion 3 and thereby strengthen the force of flushing the abutment portion 3, thereby achieving a better self-cleaning effect. Although the present disclosure shows that the high side end 26 is higher than the rotation axis 121, the scope of the present disclosure is not limited thereto. For example, the high side end 26 may also be lower than the rotation axis 121.
[0046] In some embodiments, the high side end 26 and the first end 31 can be coupled together in a detachable manner. In this way, the abutment portion 3 can be easily removed from the self-cleaning device R and maintained, or replaced with a spare abutment portion 3. For example, the second end 32 of the abutment portion 3 can have a scraper strip of different materials. For example, according to different cleaning needs, the user of the self-cleaning device R can flexibly choose an abutment portion 3 with a metal scraper strip, a hard rubber scraper strip, a plastic scraper strip or a scraper strip of any other suitable material to be installed to the self-cleaning device R. This allows the embodiments of the present disclosure to flexibly select the material of the abutment portion according to needs.
[0047] In some other embodiments, the arc-shaped baffle plate 2 and the abutment portion 3 may be formed in one piece, thereby obtaining a firm connection between the abutment portion 3 and the arc-shaped baffle plate 2. Such an integrated structure can withstand a greater flushing force than a detachable abutment portion 3, thereby improving the self-cleaning effect.
[0048] In some embodiments, the shape of the arc-shaped baffle 2 can be configured to be compatible with the shape of the cylindrical surface 11 of the cylindrical rotating part 1. For example, by configuring the shape of the surface of the arc-shaped baffle 2 in the channel 4, the flow performance of the liquid 93 in the channel 4 can be improved. By adapting the shape of the arc-shaped baffle 2 to the shape of the cylindrical surface 11, the velocity difference in the cross section of the liquid 93 flowing in the channel 4 can be reduced, thereby reducing the pressure difference, and thereby reducing the local turbulence in the liquid 93 flowing in the channel 4. In this way, the kinetic energy carried by the liquid is maintained as much as possible, thereby achieving a better self-cleaning effect.
[0049] Figure 4 2 shows a cross-sectional view of a self-cleaning device R according to another embodiment of the present disclosure. Figure 3 The same components of the illustrated embodiment will be identified with the same reference numerals and will not be described again herein.
[0050] exist Figure 4 The arc-shaped baffle 2 shown in the figure may also include a drainage port 23. The drainage port 23 is coupled to the surface of the arc-shaped baffle 2 in the channel 4 and is configured to provide liquid 93 to the channel 4. For example, the liquid 93 may be clean water, or a cleaning liquid with a detergent. When the liquid 93 is provided to the channel 4, it flows from the cylindrical surface 11 toward the second end 32 of the abutment 3 as the cylindrical rotating part 1 rotates. According to some embodiments of the present disclosure, the amount of liquid 93 provided by the drainage port 23 can be adjusted in real time. For example, the drainage port 23 may be configured to increase the amount of liquid 93 provided by the drainage port 23 when the dirt on the surface of the arc-shaped baffle 2 and the abutment 3 in the channel 4 is not removed with a small amount of liquid 93 by the self-cleaning device R. In other embodiments, the drainage port 23 may be configured to increase the amount of liquid 93 provided by the drainage port 23 when the self-cleaning device R detects that the cylindrical surface 11 is dry and needs to be moistened. It is to be understood that the drainage port 23 may also reduce the amount of liquid 93 provided by it according to the conditions detected by the self-cleaning device R. According to some other embodiments, the drainage port 23 may be configured to selectively provide a variety of different liquids 93 according to set conditions. For example, the drainage port 23 may be configured to provide clean water, cleaning liquid, support surface care liquid, or a mixture of the above liquids to assist the self-cleaning device R in completing various cleaning tasks. In addition, it is to be understood that although Figure 4 The drainage port 23 is shown to be positioned directly above the cylindrical rotating part 1, but the scope of the present disclosure is not limited thereto. For example, the drainage port 23 may also be disposed at the lower side end 25 of the arc-shaped baffle plate 2 in the channel 4, so that the liquid 93 obtains a longer contact and wetting time with the cylindrical surface 11 of the cylindrical rotating part 1 before reaching the abutment portion 3. In other embodiments not shown, the drainage port 23 may also be disposed on the surface of the arc-shaped baffle plate 2 on the side opposite to the side facing the inside of the channel 4 (i.e., disposed on the outside of the arc-shaped baffle plate 2) so as to directly provide the liquid 93 to the support surface 8. Figure 4 What is shown is only a cross section of an exemplary embodiment of the present disclosure. It should be understood that the self-cleaning device R according to the present disclosure may have a plurality of drainage ports 23, and the plurality of drainage ports 23 may be arranged on the surface of the arc-shaped baffle plate 2 along the entire extended length of the arc-shaped baffle plate 2 in the direction of the rotation axis 121 of the cylindrical rotating part 1.
[0051] Figure 5A and Figure 5B The present invention shows the Figure 2 The cross section of the self-cleaning device R is shown taken at the plane ZZ. Figure 3 The same components of the illustrated embodiment will be identified with the same reference numerals and will not be described again herein.
[0052] exist Figure 5AIn the illustrated embodiment, after the liquid 93 has flushed the interior of the channel 4 and abutted the portion 3, it can be discharged from the discharge port 33. Figure 2 As described, the discharge port 33 can be located in the middle of the abutment portion 3 in the direction extending along the rotation axis 121 of the cylindrical rotating portion 1. By setting the discharge port 33 in the middle of the abutment portion 3, the liquid 93 reaching both sides of the abutment portion 3 and the liquid 93 seeping out through the abutment portion squeezing the cylindrical surface 11 will also flow from the parts on both sides of the abutment portion 3 toward the discharge port 33 located in the middle along the direction extending along the rotation axis 121 of the cylindrical rotating portion 1, and then be discharged from the discharge port 33. In some embodiments, the first vacuum source 22 can be coupled to the discharge port 33, thereby obtaining fluid communication between the first vacuum source 22 and the channel 4. The negative pressure generated by the first vacuum source 22 can further accelerate the flow of the liquid 93 toward the abutment portion 3, and the flow speed of the liquid 93 from the parts on both sides of the abutment portion 3 toward the discharge port 33 in the direction extending along the rotation axis 121 of the cylindrical rotating portion 1.
[0053] exist Figure 5B In the embodiment shown, the abutment portion 3 does not have a discharge opening 33. Figure 5B The self-cleaning device R shown may have a second vacuum source 24, and a vacuum opening 221 positioned on the arc-shaped baffle 2 in the channel 4 and adjacent to the abutment 3. For example, the vacuum opening 221 may be configured so that the second vacuum source 24 is in fluid communication with the channel 4. In this case, the discharge of the liquid 93 in the channel 4 mainly depends on the negative pressure generated by the second vacuum source 24. Therefore, it is advantageous to be able to effectively control the speed of the liquid 93 flowing in the channel 4 by controlling the strength of the second vacuum source 24, thereby being able to effectively control the strength of flushing the surface of the abutment 3 of the arc-shaped baffle 2 inside the channel 4 and the cylindrical surface 11 of the cylindrical rotating portion 1. In addition, in this way, the second vacuum source 24 can also be configured to flexibly control the volume flow rate of the liquid 93 discharged from the channel 4.
[0054] Through the teachings given in the above description and the related drawings, many modifications and other embodiments of the present disclosure given here will be recognized by those skilled in the art of the present disclosure. Therefore, it is to be understood that the embodiments of the present disclosure are not limited to the specific embodiments disclosed, and modifications and other embodiments are intended to be included in the scope of the present disclosure. In addition, although the above description and the related drawings describe the example embodiments in the context of some example combinations of parts and / or functions, it should be appreciated that different combinations of parts and / or functions can be provided by alternative embodiments without departing from the scope of the present disclosure. In this regard, for example, other combinations of parts and / or functions that are different from those clearly described above are also expected to be within the scope of the present disclosure. Although specific terms are used here, they are only used in a general and descriptive sense and are not intended to be limited.
Claims
1. A cleaning component (R) with a self-cleaning function, comprising: A cylindrical rotating part (1) for cleaning a supporting surface (8) and having a cylindrical surface (11); An arc-shaped baffle (2) faces the cylindrical surface (11) of the cylindrical rotating part (1) and is positioned above the cylindrical rotating part (1) and separated from the cylindrical surface (11) by a distance (d1); as well as An abutment portion (3) has a first end (31) and a second end (32), wherein the first end (31) of the abutment portion (3) is coupled to the arc-shaped baffle plate (2), and the second end (32) of the abutment portion (3) abuts against the cylindrical surface (11) of the cylindrical rotating portion (1), wherein a portion of the cylindrical surface (11) of the cylindrical rotating portion (1), the arc-shaped baffle plate (2) and the abutment portion (3) together form a channel (4), and the channel (4) is configured to clean the interior of the channel (4) using a flowing liquid (93) in an operating state.
2. A cleaning component (R) with a self-cleaning function according to claim 1, wherein the channel (4) has an opening (41), and the abutment portion (3) and the opening (41) are respectively positioned on both sides of the highest point (111) of the cylindrical rotating portion (1) and below the highest point (111).
3. The cleaning assembly (R) with a self-cleaning function according to claim 2, wherein the cylindrical rotating portion (1) rotates in the direction (81) of the opening (41) of the channel (4) toward the abutment portion (3) in the operating state.
4. A cleaning component (R) with a self-cleaning function according to claim 3, wherein in response to the rotation of the cylindrical rotating portion (1), the liquid (93) flows along the rotation direction (81) and flushes a portion of the cylindrical surface of the cylindrical rotating portion inside the channel (4), the inner surface of the arc-shaped baffle (2), and the inner surface of the abutment portion (3).
5. A cleaning component (R) with a self-cleaning function according to any one of claims 1 to 4, wherein the shape of the arc-shaped baffle (2) is adapted to the shape of the cylindrical surface (11) of the cylindrical rotating part (1).
6. The cleaning component (R) with self-cleaning function according to any one of claims 1 to 4, wherein the first end (31) of the abutment portion (3) is detachably coupled to the arc-shaped baffle (2).
7. The cleaning component (R) with self-cleaning function according to any one of claims 1 to 4, wherein the abutment portion (3) and the arc-shaped baffle (2) are integrally formed.
8. A cleaning component (R) with a self-cleaning function according to any one of claims 1 to 4, wherein the arc-shaped baffle (2) further includes a drainage port (23), the drainage port (23) being coupled to the surface of the arc-shaped baffle (2) facing the cylindrical rotating portion (1), and being configured to provide the liquid (93) to the channel (4).
9. A cleaning component (R) with a self-cleaning function according to any one of claims 1 to 4, wherein the abutment portion (3) further comprises a discharge port (33), and the discharge port (33) is arranged between the first end (31) and the second end (32) to allow the liquid (93) to flow out of the channel (4) in the operating state.
10. The cleaning component (R) with self-cleaning function according to claim 9, further comprising: A first vacuum source (22) is coupled to the exhaust port (33), wherein the first vacuum source (22) is in fluid communication with the passage (4) through the exhaust port (33).
11. The cleaning component (R) with self-cleaning function according to any one of claims 1 to 4, further comprising: A second vacuum source (24) has a vacuum opening (221), wherein the vacuum opening (221) is positioned on the arc-shaped baffle (2) and adjacent to the abutment portion (3), wherein the second vacuum source (24) is fluidically connected to the channel (4) through the vacuum opening (221).
12. The cleaning component (R) with self-cleaning function according to any one of claims 1 to 4, wherein the length of the distance (d1) is between 2 mm and 8 mm.
13. A cleaning assembly (R) with a self-cleaning function according to any one of claims 1 to 4, wherein the second end (32) of the abutment portion (3) has a scraper bar for pressing and scraping the cylindrical surface (11) of the cylindrical rotating portion (1).
14. An electrical device (E), comprising: Subject (91); A self-cleaning device (R) according to any one of claims 1 to 13, coupled to the body (91); as well as The sewage tank (92) is coupled to the main body (91) and is configured to receive sewage from the cleaning component with self-cleaning function.
15. The electrical device (E) according to claim 14, wherein the electrical device (E) comprises any one of the following: a sweeping robot, a mopping robot, a floor scrubber, a sweeping and mopping robot, or a handheld electric mop.