Polishing machine for rubber sealing element

Abstract

The polishing machine comprises a machine body, a fixing unit and a polishing unit, the fixing unit and the polishing unit are installed on the machine body, the fixing unit comprises a first rotating shaft, the first rotating shaft is sleeved with the rubber sealing element and drives the rubber sealing element to rotate along with rotation of the first rotating shaft, and the polishing unit comprises a flexible polishing belt. The flexible polishing belt is provided with a polishing face facing the first rotating shaft, the polishing unit further comprises a tensioning mechanism abutting against the flexible polishing belt, and the flexible polishing belt is tensioned under the action of the tensioning mechanism. Due to the fact that the flexible polishing belt is of an easy-to-deform flexible structure, the portion, making contact with the rubber sealing piece, of the flexible polishing belt can deform due to the abutting effect of the flexible polishing belt and the rubber sealing piece, the situation that some protrusions difficult to polish outside the rubber sealing piece cannot be polished in place possibly exists, and the tensioning mechanism can achieve tensioning on the flexible polishing belt. And the abutting degree of the flexible polishing surface and the outer surface of the rubber sealing element is increased, and the polishing precision of the rubber sealing element is improved.

Description

Technical Field

[0001] The present application belongs to the technical field of polishing equipment, and in particular relates to a polishing machine for rubber seals. Background Art

[0002] As people's pursuit of offshore oil and gas development and ocean exploration continues to move towards the deep sea, a large amount of underwater operations are required in the field of marine engineering, and different working modules need to use optoelectronic hybrid connectors to transmit power and optical signals. The optoelectronic hybrid connector includes a plug and a socket, and a rubber seal structure is required to isolate the insulating oil in the rubber balance membrane cavity on both sides of the plug and the socket from the seawater. The rubber seal is a hollow column, which is the core part to ensure that the wet-plug optoelectronic hybrid connector isolates the insulating oil from the seawater during operation. Therefore, in order to ensure the surface roughness, cylindricity and coaxiality of the rubber seal, the surface of the rubber seal needs to be polished to meet the corresponding process requirements.

[0003] The polishing head of a traditional polishing machine usually includes a rigid polishing mechanism and a flexible polishing mechanism, which are respectively for rigid and flexible parts to be polished. Due to the high requirements on the outer surface roughness and axiality of rubber seals, traditional polishing machines with flexible polishing mechanisms cannot achieve uniform polishing of all parts of the outer surface of rubber seals. As the polishing work proceeds, the rubber seals are prone to a certain axial deviation, thereby affecting the sealing accuracy of the rubber seals. Summary of the invention

[0004] The present application provides a polishing machine for rubber seals to solve the technical problems that a conventional polishing machine has poor polishing accuracy when polishing rubber seals and easily causes deformation of the rubber seals.

[0005] The technical solution adopted in this application is:

[0006] A polishing machine for rubber seals, comprising a machine body, a fixing unit mounted on the machine body and a polishing unit, wherein the fixing unit comprises a first rotating shaft, on which the rubber seal is sleeved and drives the rubber seal to rotate as the first rotating shaft rotates, the polishing unit comprises a flexible polishing belt, the flexible polishing belt has a polishing surface facing the first rotating shaft, the polishing unit also comprises a tensioning mechanism abutting against the flexible polishing belt, the tensioning mechanism comprises a tensioning part, and the tensioning mechanism can adjust the abutting force between the tensioning part and the flexible polishing belt, thereby adjusting the tensioning degree of the flexible polishing belt.

[0007] The polishing machine for rubber seals described in the present application also includes the following additional technical features:

[0008] The tensioning mechanism includes a rotating plate and a force-applying part, wherein the force-applying part and the tensioning part are respectively located on both sides of the rotating plate. A rotating part located between the force-applying part and the tensioning part is also provided on the rotating plate. The force-applying part applies pressure to the rotating part to press the tensioning part against the flexible polishing belt, thereby tensioning the flexible polishing belt.

[0009] The force-applying part includes a first boss fixedly connected to the polishing unit and a torsion spring sleeved on the first boss, the rotating plate is rotatably connected to the first boss, the first boss is provided with a force-applying protrusion, the torsion spring has a first force-applying end and a second force-applying end, the first force-applying end abuts against the force-applying protrusion, and the second force-applying end abuts against the rotating member, the force-applying protrusion applies pressure to the first force-applying end, thereby causing the second force-applying end to apply pressure to the rotating member.

[0010] The flexible polishing belt can rotate cyclically. The tensioning part includes a second convex column connected to the rotating plate and a rotating wheel sleeved on the second convex column. The rotating wheel rotates around the second convex column as the flexible polishing belt moves.

[0011] The flexible polishing belt can rotate cyclically and has a rotation direction, and a plane where the rotation direction is located is perpendicular to an extension direction of the first rotation axis.

[0012] The polishing unit comprises a mounting plate, a driving wheel and at least one driven wheel mounted on the mounting plate, the flexible polishing belt is sleeved on the driving wheel and the driven wheel and connected end to end, and the rotation direction is parallel to the mounting plate.

[0013] It also includes a fine-tuning unit, the polishing unit has a first movement direction and a second movement direction that reciprocate along an axial extension direction parallel to the first rotation axis, and the fine-tuning unit can drive the polishing unit to reciprocate along the first movement direction and the second movement direction.

[0014] The fine-tuning unit includes a second rotating shaft and an eccentric wheel installed on the end of the second rotating shaft, and also includes an eccentric wheel seat and an elastic reset member installed on the polishing unit. The eccentric wheel drives the polishing unit to move along the first movement direction by pressing the eccentric wheel seat, and the elastic reset member presses the polishing unit to move along the second movement direction.

[0015] It also includes a clamping unit, which includes a third rotating shaft, whose axis extension line coincides with the axis extension line of the first rotating shaft and whose rotation frequency is the same as that of the first rotating shaft, and the third rotating shaft presses the rubber seal against the first rotating shaft.

[0016] The fixing unit comprises a driving motor, a driving wheel and a driven wheel. The driving wheel is mounted on the output shaft of the driving motor. The driving wheel and the driven wheel are connected via a transmission belt. The first rotating shaft is located at the axis of the driven wheel and rotates driven by the driven wheel.

[0017] Due to the adoption of the above technical solution, the beneficial effects achieved by this application are as follows:

[0018] 1. The polishing machine for rubber seals of the present application comprises a fixing unit including a first rotating shaft, a polishing unit including a flexible polishing belt and a tensioning mechanism. When polishing the rubber seal, the rubber seal is sleeved on the first rotating shaft, and the first rotating shaft can support the inner wall of the rubber seal. When the rubber seal is polished, it can maintain an outwardly expanded and tensioned state under the support of the first rotating shaft, thereby preventing the rubber seal from sinking inward under the polishing action of the flexible polishing belt, so that the outer surface of the flexible polishing belt and the flexible polishing belt are always in a state of balanced force, thereby improving the polishing uniformity of the outer surface of the rubber seal by the flexible polishing belt and avoiding the rubber seal from being damaged by polishing. The occurrence of axis deviation caused by continuous uneven light intensity helps to maintain the dimensional accuracy of the rubber seal after polishing; the first rotating shaft, in addition to supporting the rubber seal, can also drive the rubber seal to rotate synchronously with its rotation, thereby realizing the relative movement between the flexible polishing belt and the rubber seal, and polishing the rubber seal through the friction between the flexible polishing belt and the rubber seal, that is, the first rotating shaft integrates the function of supporting the rubber seal and driving the rubber seal to rotate to cooperate with the flexible polishing belt to realize the polishing and grinding of the rubber seal. The functions are further integrated, and the structural design of the polishing machine is optimized; moreover, since the flexible polishing belt itself is a flexible structure that is easy to deform, it will be in contact with the rubber seal. Due to the influence of the abutment between the two, the rubber seal is deformed, and some difficult-to-polish protrusions on the outside of the rubber seal may not be polished properly. The tensioning mechanism of the present application is provided with a tensioning part, which can adjust the tension of the flexible polishing belt by the abutment degree between the tensioning part and the flexible polishing belt, thereby adjusting the polishing force of the flexible polishing belt on the rubber seal to achieve different strengths of polishing on the rubber seal. The tighter the flexible polishing belt, the greater the polishing force on the rubber seal, and the polishing and removal efficiency is better for the protrusions that are difficult to polish. In addition, since the rubber seals to be processed are of different sizes, their sizes and thicknesses are not the same, different requirements are put forward for the polishing force of the flexible polishing belt and the degree of abutment with the rubber seal. By setting the tensioning part, it can By adjusting the tension of the flexible polishing belt, the polishing requirements of different rubber seals can be met, thereby improving the adaptability of the polishing machine to different rubber seals; furthermore, since the rubber seal mainly undertakes the isolation and sealing function of the optoelectronic hybrid connector underwater, higher requirements are placed on its sealing performance, and therefore it is often necessary to perform secondary or even tertiary polishing to improve the flatness of its outer surface. Since the protrusions on the outer surface of the rubber seal have been basically removed during the first polishing, it is usually necessary to adjust the tension of the flexible polishing belt during the secondary polishing to increase its polishing force on the rubber seal. The present application provides a tensioning mechanism to adjust the tension of the flexible polishing belt in real time, and a single polishing machine can meet the needs of multiple polishing of rubber seals.

[0019] 2. As a preferred embodiment of the present application, the force-applying part can apply force to the tensioning part at the end of the rotating plate with the rotating part as a fulcrum, thereby achieving tensioning of the flexible polishing belt by the tensioning part and the flexible polishing belt being pressed against each other. The tensioning part, the rotating part and the force-applying part form a lever structure with the rotating plate as a lever, so that the force-applying part can apply force to the tensioning part with a relatively small torque, thereby optimizing the structural design of the tensioning mechanism and contributing to the miniaturization of the tensioning mechanism.

[0020] 3. As a preferred embodiment of the present application, the force-applying part includes a first boss fixedly connected to the polishing unit and a torsion spring sleeved on the first boss, the rotating plate is rotatably connected to the first boss, the first boss is provided with a force-applying protrusion, the torsion spring has a first force-applying end and a second force-applying end, the first force-applying end abuts against the force-applying protrusion, the second force-applying end abuts against the rotating member, the force-applying protrusion applies pressure to the first force-applying end, thereby causing the second force-applying end to apply pressure to the rotating member. The force-applying part is configured to include a first convex column and a torsion spring, and the torsion force of the torsion spring is used as a power source for providing a rotational force to the rotating part. When the size and structure of the rubber seal are different and the polishing force requirements for the flexible polishing belt are different, the rotational force on the rotating part can be adjusted by changing the torsion force of the torsion spring, and then the force applied to the tensioning part can be changed, so as to achieve the adjustment of the tensioning force of the flexible polishing belt by the tensioning part. When the rubber seal has a high demand for polishing force, the torsion force of the torsion spring can be increased to increase the tension of the flexible polishing belt by the tensioning part, so that the flexible polishing belt is in a relatively tight state, which can provide a greater friction force to the rubber seal to increase The polishing force of the rubber seal; similarly, when the rubber seal has a low demand for polishing force, the torsion spring torsion force can be reduced to reduce the degree of tension of the flexible polishing belt by the tensioning part, so that the flexible polishing belt is in a relatively relaxed state, which can provide a relatively small friction force to the rubber seal to reduce the polishing force of the rubber seal; in addition, in addition to providing a mounting position for the torsion spring, the first boss in this embodiment also integrates the function of providing a sleeve position for the rotating plate, that is, it has the function of providing a mounting position for the rotating plate and the torsion spring at the same time, and the functions are further integrated, which optimizes the structural design of the tensioning mechanism and contributes to the miniaturization of the tensioning mechanism.

[0021] 4. As a preferred embodiment of the present application, the flexible polishing belt can rotate in a circular motion, and the tensioning portion includes a second boss connected to the rotating plate and a rotating wheel sleeved on the second boss, and the rotating wheel rotates around the second boss as the flexible polishing belt moves. The flexible polishing belt is configured to be rotatable, which improves the relative friction rate between the flexible polishing belt and the rubber seal, and increases the polishing rate of the rubber seal by the flexible polishing belt; and the tensioning part is configured to include a second boss and a rotating wheel that can rotate around the second boss, so that when the tensioning part abuts and tightens the flexible polishing belt, the rotating wheel can rotate with the rotation of the flexible polishing belt, and the sliding friction between the flexible polishing belt and the tensioning part is converted into rolling friction, which greatly reduces the friction force between the tensioning part and the flexible polishing belt, reduces the loss of the flexible polishing belt caused by the friction of the tensioning part, helps to improve the service life of the flexible polishing belt, and at the same time reduces the size of the power source required at a unit rotation rate of the flexible polishing belt, and reduces the power demand for maintaining the rotation of the flexible polishing belt; furthermore, there is rolling friction between the rotating wheel and the flexible polishing belt, and the vibration impact between the rotating wheel and the flexible polishing belt is small, which reduces the transmission of vibration kinetic energy of the rotating wheel to the rotating plate through the second boss, and helps to improve the stability of the tensioning mechanism.

[0022] 5. As a preferred embodiment of the present application, by setting a fine-tuning unit, the polishing unit can be driven to reciprocate along the first movement direction and the second movement direction. When the polishing unit reciprocates, the flexible polishing belt is driven to move synchronously along the first movement direction and the second movement direction to achieve regional polishing of the rubber seal. On the one hand, the polishing speed of the rubber seal by the polishing unit is increased, and the polishing area of ​​the polishing unit per unit time is increased, thereby improving the working efficiency of the polishing machine; on the other hand, for the protrusions on the outside of the rubber seal that are uneven and difficult to be polished and cleaned, when the first rotating shaft drives the rubber seal to rotate, the protrusion only rubs with the flexible polishing belt in a single direction, and the reciprocating movement of the polishing unit along the first movement direction and the second movement direction will drive the flexible polishing belt to generate a friction component with the protrusion along the rotation direction perpendicular to the first rotating shaft. The protrusions that are difficult to be polished and cleaned are more easily removed under the combined friction of the first rotating shaft driving the rubber seal to rotate and the flexible polishing belt along the first movement direction and the second movement direction, which greatly improves the polishing effect of the flexible polishing belt on the rubber seal and helps to improve the polishing accuracy of the rubber seal. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:

[0024] Figure 1This is a schematic structural diagram of a polishing machine for rubber seals according to one embodiment of the present application;

[0025] Figure 2 for Figure 1 A magnified view of part A;

[0026] Figure 3 This is a schematic structural diagram of a polishing unit in one embodiment of the present application;

[0027] Figure 4 This is a schematic diagram of the structure of a tensioning mechanism in one implementation mode of the present application;

[0028] Figure 5 This is a schematic structural diagram of a polishing unit and a fine-tuning unit according to an embodiment of the present application.

[0029] in:

[0030] 1 body;

[0031] 2 first rotation axis;

[0032] 3 flexible polishing belt, 31 polishing surface;

[0033] 4 Rotate the plate;

[0034] 5 force applying part, 51 first protruding column, 511 force applying protrusion, 52 torsion spring, 521 first force applying end, 522 second force applying end;

[0035] 6 tensioning part, 61 second protruding column, 62 rotating wheel;

[0036] 7 rotating parts;

[0037] 8 mounting plate;

[0038] 9 driving wheels;

[0039] 10 driven wheel;

[0040] 110 second rotation axis;

[0041] 120 eccentric wheel;

[0042] 130 eccentric wheel seat;

[0043] 140 elastic reset member;

[0044] 150 third rotation axis;

[0045] 160 driving motor;

[0046] 170 active rotor;

[0047] 180 driven wheel;

[0048] 190 transmission belt;

[0049] 200 propulsion cylinders. DETAILED DESCRIPTION

[0050] In order to more clearly illustrate the overall concept of the present application, a detailed description is given below in an illustrative manner in conjunction with the accompanying drawings.

[0051] In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application may also be implemented in other ways different from those described herein. Therefore, the protection scope of the present application is not limited by the specific embodiments disclosed below. It should be noted that the embodiments of the present application and the features in each embodiment may be combined with each other without conflict.

[0052] In addition, in the description of the present application, it should be understood that the orientations or positional relationships indicated by the terms "top", "bottom", "inside", "outside", "axial", "radial", "circumferential", etc. are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0053] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0054] In the present application, unless otherwise clearly specified and limited, a first feature "above" or "below" a second feature may be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in an appropriate manner in any one or more embodiments or examples.

[0055] like Figures 1 to 5As shown, a polishing machine for rubber seals comprises a machine body 1, a fixing unit mounted on the machine body 1 and a polishing unit, wherein the fixing unit comprises a first rotating shaft 2, on which the rubber seal is sleeved and drives the rubber seal to rotate with its own rotation, the polishing unit comprises a flexible polishing belt 3, wherein the flexible polishing belt 3 has a polishing surface 31 facing the first rotating shaft 2, and the polishing unit further comprises a tensioning mechanism abutting against the flexible polishing belt 3, wherein the tensioning mechanism comprises a tensioning portion 6, and the tensioning mechanism can adjust the abutting force between the tensioning portion 6 and the flexible polishing belt 3, thereby adjusting the tensioning degree of the flexible polishing belt 3.

[0056] The polishing machine for rubber seals of the present application comprises a fixing unit including a first rotating shaft 2, a polishing unit including a flexible polishing belt 3 and a tensioning mechanism. When the rubber seal is polished, the rubber seal is sleeved on the first rotating shaft 2, and the first rotating shaft 2 can support the inner wall of the rubber seal. When the rubber seal is polished, it can maintain an outwardly expanded and tightened state under the support of the first rotating shaft 2, preventing the rubber seal from sinking inward under the polishing action of the flexible polishing belt 3, so that the outer surface of the flexible polishing belt 3 and the flexible polishing belt 3 are always in contact with each other. The flexible polishing belt 3 is in a state of balanced force, which improves the polishing uniformity of the outer surface of the rubber seal by the flexible polishing belt 3 and avoids the occurrence of the axial deviation of the rubber seal due to the continuous uneven polishing force, thereby helping to maintain the dimensional accuracy of the rubber seal after polishing; the first rotating shaft 2, in addition to supporting the rubber seal, can also drive the rubber seal to rotate synchronously with its rotation, thereby realizing the relative movement between the flexible polishing belt 3 and the rubber seal, and the polishing of the rubber seal is achieved through the friction between the flexible polishing belt 3 and the rubber seal, that is, the first rotating shaft 2 is integrated The functions of supporting the rubber seal and driving the rubber seal to rotate to cooperate with the flexible polishing belt 3 to realize the polishing and grinding of the rubber seal are further integrated, and the structural design of the polishing machine is optimized; moreover, since the flexible polishing belt 3 itself is a flexible structure that is easy to deform, it will be deformed at the contact part with the rubber seal due to the influence of the abutment between the two, and some protrusions on the outside of the rubber seal that are difficult to grind may not be polished in place. The tensioning mechanism of the present application is provided with a tensioning part 6, which can adjust the tension of the flexible polishing belt 3 by the abutment degree of the tensioning part 6 and the flexible polishing belt 3, thereby adjusting the flexible polishing The polishing force of the flexible polishing belt 3 on the rubber seal can achieve different polishing forces on the rubber seal. The tighter the flexible polishing belt 3 is, the greater the polishing force on the rubber seal is, and the polishing removal efficiency is better for the protrusions that are difficult to polish. In addition, due to the different sizes of rubber seals to be processed, their sizes and thicknesses are not the same, so different requirements are put forward for the polishing force of the flexible polishing belt 3 and the degree of tightness between the flexible polishing belt 3 and the rubber seal. By setting the tensioning part 6, the polishing requirements of different rubber seals can be achieved by adjusting the tension of the flexible polishing belt 3, thereby improving the adaptability of the polishing machine to different rubber seals.Furthermore, since the rubber seal is mainly used to isolate and seal the optoelectronic hybrid connector underwater, a high requirement is placed on its sealing performance. Therefore, it is often necessary to perform secondary or even tertiary polishing to improve the flatness of its outer surface. Since the outer surface protrusions of the rubber seal have been basically removed during the first polishing, it is usually necessary to adjust the tension of the flexible polishing belt 3 during the secondary polishing to increase the polishing force of the rubber seal. The present application can adjust the tension of the flexible polishing belt 3 in real time by setting a tensioning mechanism, and a single polishing machine can meet the needs of multiple polishing of the rubber seal. ;

[0057] As a preferred implementation of the present application, Figure 3 , Figure 4 As shown, the tensioning mechanism includes a rotating plate 4 and a force-applying portion 515, wherein the force-applying portion 515 and the tensioning portion 6 are respectively located on both sides of the rotating plate 4, and the rotating plate 4 is also provided with a rotating member 7 located between the force-applying portion 515 and the tensioning portion 6. The force-applying portion 515 applies pressure to the rotating member 7 to press the tensioning portion 6 against the flexible polishing belt 3, thereby tensioning the flexible polishing belt 3.

[0058] The force-applying part 515 can apply force to the tensioning part 6 at the end of the rotating plate 4 with the rotating part 7 as a fulcrum, thereby achieving tensioning of the flexible polishing belt 3 through the tensioning part 6 and the flexible polishing belt 3 being pressed against each other. The tensioning part 6, the rotating part 7 and the force-applying part 515 form a lever structure with the rotating plate 4 as a lever, so that the force-applying part 515 can apply force to the tensioning part 6 with a relatively small torque, thereby optimizing the structural design of the tensioning mechanism and contributing to the miniaturization of the tensioning mechanism.

[0059] As a preferred embodiment of this implementation, Figure 4 As shown, the force-applying portion 515 includes a first boss 51 fixedly connected to the polishing unit and a torsion spring 52 sleeved on the first boss 51, the rotating plate 4 is rotatably connected to the first boss 51, the first boss 51 is provided with a force-applying protrusion 511, the torsion spring 52 has a first force-applying end 521 and a second force-applying end 522, the first force-applying end 521 abuts against the force-applying protrusion 511, and the second force-applying end 522 abuts against the rotating member 7, the force-applying protrusion 511 applies pressure to the first force-applying end 521, thereby causing the second force-applying end 522 to apply pressure to the rotating member 7.

[0060] The force-applying portion 515 is configured to include a first convex column 51 and a torsion spring 52, and the torsion force of the torsion spring 52 is used as a power source for providing a rotational force to the rotating member 7. When the size and structure of the rubber seal are different and the polishing force requirements for the flexible polishing belt 3 are different, the rotational force for the rotating member 7 can be adjusted by changing the torsion force of the torsion spring 52, and then the force applied to the tensioning portion 6 can be changed, so as to achieve the adjustment of the tensioning force of the tensioning portion 6 on the flexible polishing belt 3. When the rubber seal has a high demand for polishing force, the torsion force of the torsion spring 52 can be increased to increase the tension of the tensioning portion 6 on the flexible polishing belt 3, so that the flexible polishing belt 3 is in a relatively tight state, which can provide greater friction to the rubber seal. friction to increase the polishing force of the rubber seal; similarly, when the rubber seal has a low demand for polishing force, the torsion force of the torsion spring 52 can be reduced to reduce the degree of tension of the tensioning part 6 on the flexible polishing belt 3, so that the flexible polishing belt 3 is in a relatively relaxed state, which can provide a relatively small friction force to the rubber seal to reduce the polishing force of the rubber seal; in addition, in this embodiment, in addition to providing a mounting position for the torsion spring 52, the first boss 51 also integrates the function of providing a sleeve position for the rotating plate 4, that is, it simultaneously provides a mounting position for the rotating plate 4 and the torsion spring 52, and the functions are further integrated, which optimizes the structural design of the tensioning mechanism and contributes to the miniaturization of the tensioning mechanism.

[0061] Preferably, if Figure 4 As shown, there is a misalignment between the projection of the rotating member 7 toward the first convex column 51 and the projection of the force-applying protrusion 511 toward the first convex column 51. Specifically, the misalignment length between the two is the distance between the first force-applying end 521 and the second force-applying end 522 of the torsion spring 52. There is a misalignment between the first force-applying end 521 and the second force-applying end 522, so that there is a force offset at the force points between the torsion spring 52 and the rotating member 7 and the first convex column 51, respectively, which avoids the possibility of stress concentration in the torsion spring 52 and helps to increase the service life of the torsion spring 52.

[0062] As another preferred embodiment of this embodiment, Figure 3 , Figure 4As shown, the flexible polishing belt 3 can rotate cyclically, and the tensioning portion 6 includes a second boss 61 connected to the rotating plate 4 and a rotating wheel 62 sleeved on the second boss 61 , and the rotating wheel 62 rotates around the second boss 61 as the flexible polishing belt 3 moves. The flexible polishing belt 3 is configured to be cyclically rotatable, which improves the relative friction rate between the flexible polishing belt 3 and the rubber seal, and increases the polishing rate of the flexible polishing belt 3 on the rubber seal; and the tensioning part 6 is configured to include a second boss 61 and a rotating wheel 62 that can rotate around the second boss 61, so that when the tensioning part 6 abuts and tightens the flexible polishing belt 3, the rotating wheel 62 can rotate with the rotation of the flexible polishing belt 3, and the sliding friction between the flexible polishing belt 3 and the tensioning part 6 is converted into rolling friction, which greatly reduces the friction between the tensioning part 6 and the flexible polishing belt 3, reduces the loss of the flexible polishing belt 3 caused by the friction of the tensioning part 6, helps to improve the service life of the flexible polishing belt 3, and at the same time reduces the size of the power source required at the unit rotation rate of the flexible polishing belt 3, and reduces the power demand for maintaining the rotation of the flexible polishing belt 3; furthermore, there is rolling friction between the rotating wheel 62 and the flexible polishing belt 3, and the vibration impact between the rotating wheel 62 and the flexible polishing belt 3 is small, which reduces the transmission of vibration kinetic energy of the rotating wheel 62 to the rotating plate 4 through the second boss 61, and helps to improve the stability of the tensioning mechanism.

[0063] As a preferred implementation of the present application, Figure 1 , Figure 3 As shown, the flexible polishing belt 3 can rotate cyclically and has a rotation direction, and the plane where the rotation direction is located is perpendicular to the extension direction of the first rotating shaft 2. Specifically, the rotation direction of the flexible polishing belt 3 is perpendicular to the rotation direction of the first rotating shaft 2. In this way, the relative friction speed between the flexible polishing belt 3 and the rubber seal sleeved on the first rotating shaft 2 is the sum of the rotation speed of the flexible polishing belt 3 and the rotation speed of the first rotating shaft 2, which increases the polishing speed of the flexible polishing belt 3 on the rubber seal, thereby improving the polishing speed of the polishing machine and the polishing area of ​​the rubber seal by the polishing machine per unit time.

[0064] As a preferred embodiment of this implementation, Figure 3 As shown, the polishing unit includes a mounting plate 8, a driving wheel 9 and at least one driven wheel 10 mounted on the mounting plate 8, and the flexible polishing belt 3 is sleeved on the driving wheel 9 and the driven wheel 10 and connected end to end, and the rotation direction is parallel to the mounting plate 8. By providing the mounting plate 8 and the driving wheel 9 and the driven wheel 10, on the one hand, the mounting plate 8 provides a mounting position for the driving wheel 9 and the driven wheel 10, which helps to maintain the axes of the driving wheel 9 and the driven wheel 10 in the same plane, so that the flexible polishing belt 3 can smoothly realize cyclic rotation under the driving action of the driving wheel 9 and the driven wheel 10.

[0065] As a preferred implementation of the present application, Figures 1 to 3 As shown, it also includes a fine-tuning unit, the polishing unit has a first movement direction and a second movement direction for reciprocating along an axial extension direction parallel to the first rotating shaft 2, and the fine-tuning unit can drive the polishing unit to reciprocate along the first movement direction and the second movement direction.

[0066] Figure 1 The first movement direction and the second movement direction are schematically drawn in FIG. 1 , wherein the arrow X indicates the first movement direction, and the arrow Y indicates the second movement direction.

[0067] By setting a fine-tuning unit, the polishing unit can be driven to reciprocate along the first movement direction and the second movement direction. While the polishing unit reciprocates, it drives the flexible polishing belt 3 to move synchronously along the first movement direction and the second movement direction, so as to realize regional polishing of the rubber seal. On the one hand, the polishing speed of the polishing unit for the rubber seal is increased, and the polishing area of ​​the polishing unit per unit time is increased, thereby improving the working efficiency of the polishing machine; on the other hand, for the protrusions on the outside of the rubber seal that are uneven and difficult to be polished and cleaned, when the first rotating shaft 2 drives the rubber seal to rotate, the protrusion only rubs with the flexible polishing belt 3 in a single direction, and the reciprocating movement of the polishing unit along the first movement direction and the second movement direction will drive the flexible polishing belt 3 to generate a friction component with the protrusion along the rotation direction perpendicular to the first rotating shaft 2. The protrusions that are difficult to be polished and cleaned are more easily removed under the combined friction of the first rotating shaft 2 driving the rubber seal to rotate and the flexible polishing belt 3 along the first movement direction and the second movement direction, which greatly improves the polishing effect of the flexible polishing belt 3 on the rubber seal, and helps to improve the polishing accuracy of the rubber seal.

[0068] As a preferred embodiment of this implementation, Figure 5As shown, the fine-tuning unit includes a second rotating shaft 110 and an eccentric wheel 120 installed on the end of the second rotating shaft 110, and also includes an eccentric wheel seat 130 and an elastic reset member 140 installed on the polishing unit. The eccentric wheel 120 drives the polishing unit to move along the first movement direction by pushing against the eccentric wheel seat 130, and the elastic reset member 140 pushes against the polishing unit to move along the second movement direction. Specifically, the second rotating shaft 110 drives the eccentric wheel 120 to rotate. Since the axis center of the eccentric wheel 120 is at a different distance from the wheel edge, it has a long axis end and a short axis end. As the eccentric wheel 120 rotates, when the contact point between the eccentric wheel seat 130 and the eccentric wheel 120 switches from the short axis end to the long axis end, the eccentric wheel seat 130 moves away from the eccentric wheel 120. When the contact point between the eccentric wheel seat 130 and the eccentric wheel 120 switches from the long axis end to the short axis end, the eccentric wheel seat 130 moves toward the eccentric wheel 120 under the action of the elastic reset member 140. In this way, as the eccentric wheel 120 rotates, the eccentric wheel seat 130 is cyclically abutted against the long axis end and the short axis end of the eccentric wheel 120, and then the polishing unit is reciprocated along the first movement direction and the second movement direction under the action of the elastic reset member 140.

[0069] Preferably, the elastic return member 140 is a spring.

[0070] As a preferred implementation of the present application, Figure 1 , Figure 2 As shown, it also includes a clamping unit, which includes a third rotating shaft 150. The extended axis line of the third rotating shaft 150 coincides with the extended axis line of the first rotating shaft 2 and the rotation frequency of the third rotating shaft 150 is the same as the rotation frequency of the first rotating shaft 2. The third rotating shaft 150 presses the rubber seal against the first rotating shaft 2. Since the rubber seal will vibrate due to the friction of the flexible polishing belt 3 during the polishing process, it is easy to cause vibration displacement between the rubber seal and the first rotating shaft 2, thereby causing the relative position between the rubber seal and the flexible polishing belt 3 to shift, and even causing the rubber seal to fall off the third rotating shaft 150, affecting the polishing effect; by providing a clamping unit and making the third rotating shaft 150 abut the end of the rubber seal, it can be stably sleeved on the first rotating shaft 2, reducing the occurrence of displacement of the rubber seal due to friction and vibration, which helps to improve the polishing effect; in addition, the rotation frequency of the third rotating shaft 150 is the same as that of the first rotating shaft 2, so that the end of the third rotating shaft 150 and the rubber seal can remain relatively still, preventing the end of the third rotating shaft 150 from abutting against the rubber seal and causing the rubber seal to be worn or even damaged, which helps to maintain the structural integrity of the rubber seal.

[0071] Preferably, as shown in the figure, the clamping unit further includes a propulsion cylinder 200 and a driving shaft, and the propulsion cylinder 200 can push the clamping unit to approach or move away from the first rotating shaft 2 through the driving shaft. For rubber seals of different sizes and thicknesses, the third rotating shaft 150 is required to apply different abutment forces to the rubber seals, and by providing the propulsion cylinder 200, the third rotating shaft 150 can be moved closer to or away from the first rotating shaft 2 under the propulsion of the propulsion cylinder 200, so that for rubber seals of different sizes and thicknesses, appropriate abutment forces can be applied to them by changing the position of the third rotating shaft 150.

[0072] As a preferred implementation of the present application, Figure 2 As shown, the fixing unit includes a driving motor 160, a driving wheel 170, and a driven wheel 180. The driving wheel 170 is installed on the output shaft of the driving motor 160. The driving wheel 170 and the driven wheel 180 are connected by a transmission belt 190. The first rotating shaft 2 is located at the axis of the driven wheel 180 and rotates under the drive of the driven wheel 180. The output shaft of the driving motor 160 is connected to the driving wheel 170. The driving wheel 170 rotates under the drive of the output shaft of the driving motor 160, and drives the driven wheel 180 to rotate through the transmission belt 190, thereby driving the first rotating shaft 2 to rotate. By setting the driving motor 160, the driving wheel 170 and the driven wheel 180, the restrictions on the installation position of the driving motor 160 are reduced, and the density of the components at the first rotating shaft 2 is reduced, which helps to reasonably arrange the position of the driving motor 160 according to the structural design of the polishing machine, and optimizes the structural design of the polishing machine.

[0073] Anything not described in this application can be achieved by adopting or drawing on existing technologies.

[0074] The various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referenced to each other, and each embodiment focuses on the differences from other embodiments.

[0075] The above is only an embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the scope of the claims of the present application.

Claims

1. A polishing machine for rubber seals, characterized in that: It includes a body, a fixed unit installed on the body, and a polishing unit. The fixed unit includes a first rotating shaft, on which a rubber seal is sleeved and drives the rubber seal to rotate with its own rotation. The polishing unit includes a flexible polishing belt, and the flexible polishing belt has a polishing surface facing the first rotating shaft. The polishing unit also includes a tensioning mechanism abutting against the flexible polishing belt, and the tensioning mechanism includes a tensioning part. The tensioning mechanism can adjust the abutting force between the tensioning part and the flexible polishing belt, thereby adjusting the tensioning degree of the flexible polishing belt.

2. The polishing machine for rubber seals according to claim 1, characterized in that: The tensioning mechanism includes a rotating plate and a force-applying part, wherein the force-applying part and the tensioning part are respectively located on both sides of the rotating plate. A rotating part located between the force-applying part and the tensioning part is also provided on the rotating plate. The force-applying part applies pressure to the rotating part to press the tensioning part against the flexible polishing belt, thereby tensioning the flexible polishing belt.

3. The polishing machine for rubber seals according to claim 2, characterized in that: The force-applying part includes a first boss fixedly connected to the polishing unit and a torsion spring sleeved on the first boss, the rotating plate is rotatably connected to the first boss, the first boss is provided with a force-applying protrusion, the torsion spring has a first force-applying end and a second force-applying end, the first force-applying end abuts against the force-applying protrusion, and the second force-applying end abuts against the rotating member, the force-applying protrusion applies pressure to the first force-applying end, thereby causing the second force-applying end to apply pressure to the rotating member.

4. The polishing machine for rubber seals according to claim 2, characterized in that: The flexible polishing belt can rotate cyclically. The tensioning part includes a second convex column connected to the rotating plate and a rotating wheel sleeved on the second convex column. The rotating wheel rotates around the second convex column as the flexible polishing belt moves.

5. The polishing machine for rubber seals according to claim 1, characterized in that: The flexible polishing belt can rotate cyclically and has a rotation direction, and a plane where the rotation direction is located is perpendicular to an extension direction of the first rotation axis.

6. The polishing machine for rubber seals according to claim 5, characterized in that: The polishing unit comprises a mounting plate, a driving wheel and at least one driven wheel mounted on the mounting plate, the flexible polishing belt is sleeved on the driving wheel and the driven wheel and connected end to end, and the rotation direction is parallel to the mounting plate.

7. The polishing machine for rubber seals according to claim 1, characterized in that: It also includes a fine-tuning unit, the polishing unit has a first movement direction and a second movement direction that reciprocate along an axial extension direction parallel to the first rotation axis, and the fine-tuning unit can drive the polishing unit to reciprocate along the first movement direction and the second movement direction.

8. The polishing machine for rubber seals according to claim 7, characterized in that: The fine-tuning unit includes a second rotating shaft and an eccentric wheel installed on the end of the second rotating shaft, and also includes an eccentric wheel seat and an elastic reset member installed on the polishing unit. The eccentric wheel drives the polishing unit to move along the first movement direction by pressing the eccentric wheel seat, and the elastic reset member presses the polishing unit to move along the second movement direction.

9. The polishing machine for rubber seals according to claim 1, characterized in that: It also includes a clamping unit, which includes a third rotating shaft, whose axis extension line coincides with the axis extension line of the first rotating shaft and whose rotation frequency is the same as that of the first rotating shaft, and the third rotating shaft presses the rubber seal against the first rotating shaft.

10. The polishing machine for rubber seals according to claim 1, characterized in that: The fixing unit comprises a driving motor, a driving wheel and a driven wheel. The driving wheel is mounted on the output shaft of the driving motor. The driving wheel and the driven wheel are connected via a transmission belt. The first rotating shaft is located at the axis of the driven wheel and rotates driven by the driven wheel.

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