Supporting glass substrate

Abstract

The present invention achieves the suppression of deflection and light weight. The ratio of the Young's modulus (GPa) to the density (g / cm < 3 >) of the support glass substrate (10) is 37.0 (GPa * cm < 3 > / g) or more and is greater than a ratio calculated value, which is the ratio of the Young's modulus (GPa) to the density (g / cm < 3 >) calculated from the composition. The ratio calculated value is represented by the following formula. Alpha = 2 * sigma {(Vi. Gi) / Mi. Xi}. Here, Vi is the filling parameter of the metal oxide contained in the support glass substrate (10), Gi is the dissociation energy of the metal oxide contained in the support glass substrate (10), Mi is the molecular weight of the metal oxide contained in the support glass substrate (10), and Xi is the molar ratio of the metal oxide contained in the support glass substrate (10).

Description

[0001] This application is a divisional application of the invention patent application with Chinese application number 202080054588.2 (the invention name of the original application is "Supporting Glass Substrate", and the application date of the original application is June 5, 2020) Technical Field

[0002] The present invention relates to a supporting glass substrate. Background Art

[0003] As electronic devices become smaller, there is a growing demand for technologies that can mount semiconductor devices used in these electronic devices at high density. In recent years, as technologies for mounting semiconductor devices at high density, for example, fan-out wafer level packaging (FOWLP) or fan-out panel level packaging (FOPLP) have been proposed. Hereinafter, FOWLP and FOPLP are collectively referred to as FOWLP, etc.

[0004] In FOWLP and the like, in order to suppress the deflection of a processing substrate on which semiconductor devices are stacked, a supporting glass substrate that supports the processing substrate may be used (for example, see Patent Document 1).

[0005] Prior art literature

[0006] Patent Literature

[0007] Patent Document 1: Japanese Patent No. 6443668 Summary of the invention

[0008] The supporting glass substrate used for supporting components such as the supporting glass substrate for FOWLP is required to suppress deflection and also to be lightweight. If the thickness of the supporting glass substrate is increased to suppress deflection, the mass increases, and if the thickness is reduced to reduce weight, deflection is likely to occur. Therefore, it is difficult to achieve both suppression of deflection and lightweight.

[0009] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a supporting glass substrate capable of suppressing warpage and reducing weight.

[0010] In order to solve the above problems and achieve the purpose, the Young's modulus ε (GPa) of the supporting glass substrate of the present invention is relative to the density d (g / cm 3 ) ratio ε / d(GPa·cm 3 / g) is 37.0 (GPa·cm 3 / g) and greater than the ratio calculated value α (GPa·cm 3 / g), and the ratio calculated value α is the value of Young's modulus (GPa) relative to density (g / cm 3 ) ratio. Ratio calculation value α (GPa·cm 3 / g) is represented by the following formula.

[0011] α=2·Σ{(V i ·G i ) / M i )·X i}

[0012] Here, V i is the filling parameter of the metal oxide contained in the supporting glass substrate, G i is the dissociation energy of the metal oxide contained in the supporting glass substrate, M i is the molecular weight of the metal oxide contained in the supporting glass substrate, and X i It is the molar ratio of the metal oxide contained in the said supporting glass substrate.

[0013] According to the present invention, it is possible to suppress deflection and reduce weight. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic diagram of the supporting glass substrate of this embodiment.

[0015] Figure 2 This is a graph for explaining the performance of the supporting glass substrate of this embodiment.

[0016] Figure 3 It is a schematic diagram which shows the measuring method of the deflection of an Example and a comparative example.

[0017] Figure 4 It is a graph which shows the characteristics of the supporting glass substrate of an Example and a comparative example. DETAILED DESCRIPTION

[0018] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be noted that the present invention is not limited to the embodiments, and when there are a plurality of embodiments, a configuration in which the embodiments are combined is also included.

[0019] Figure 1 Schematic diagram of the supporting glass substrate of this embodiment. Figure 1As shown, the supporting glass substrate 10 of this embodiment is used as a glass substrate for manufacturing a semiconductor package, more specifically, a supporting glass substrate for manufacturing FOWLP, etc. However, the use of the supporting glass substrate 10 is arbitrary and is not limited to the manufacturing of FOWLP, etc., and can also be a glass substrate for supporting a member. It should be noted that, as mentioned above, FOWLP, etc. include FOWLP and FOPLP.

[0020] The supporting glass substrate 10 can achieve both suppression of deflection and weight reduction by increasing the ratio ε / d of the Young's modulus ε to the density d. Specifically, the ratio ε / d of the supporting glass substrate 10 is 32.0 (GPa·cm 3 / g) or more, and satisfies the following formula (1). The ratio calculated value α of the formula (1) is a calculated value of the ratio of the Young's modulus to the density of the supporting glass substrate 10 calculated based on the composition of the supporting glass substrate 10, and the details will be described later.

[0021] ε / d>α…(1)

[0022] The ratio ε / d is a value calculated using the measured value of the Young's modulus ε of the supporting glass substrate 10 and the measured value of the density d of the supporting glass substrate 10 .

[0023] In the present embodiment, the Young's modulus ε of the supporting glass substrate 10 is a value measured based on the transmission of ultrasonic waves using 38DLPLUS manufactured by OLYMPUS. In addition, in the present embodiment, the density d of the supporting glass substrate 10 is a value measured using the Archimedean method. The ratio ε / d is calculated by dividing the Young's modulus ε measured in this way by the density d measured. It should be noted that the unit of Young's modulus ε is GPa, and the unit of density d is g / cm 3 , the unit of the ratio ε / d is GPa·cm 3 / g.

[0024] The ratio ε / d is a value using a measured value, whereas the ratio calculated value α is a value calculated based on the composition of the supporting glass substrate 10, and does not use the measured values ​​of the Young's modulus ε and the density d. It is known that the Young's modulus can be calculated based on the composition of glass, so the ratio calculated value α of the Young's modulus to the density of the supporting glass substrate 10 can be calculated based on the composition of the supporting glass substrate 10. The composition of the supporting glass substrate 10 here refers to the composition when the composition contained in the supporting glass substrate 10 is converted as a metal oxide.

[0025] More specifically, the ratio calculated value α corresponds to a value obtained by dividing the value obtained by multiplying the ion size of the metal oxide by the bonding force by the ion weight for each metal oxide, adding the obtained values, and multiplying by 2. Specifically, the ratio calculated value α is calculated by the following formula (2).

[0026] α=2·Σ(P i ·X i )=2·Σ{(V i ·G i ) / M i )·X i}···(2)

[0027] Here, P i is (V i ·G i / M i ). i (cm 3 / mol) is the filling parameter of the metal oxide contained in the supporting glass substrate 10, G i (kJ / cm 3 ) is the dissociation energy of the metal oxide contained in the supporting glass substrate 10, M i (g / mol) is the molecular weight of the metal oxide contained in the supporting glass substrate 10, and X i X is the molar ratio of the metal oxide contained in the supporting glass substrate 10 to the entire supporting glass substrate 10. i The unit is dimensionless. As shown in formula (2), the ratio calculated value α is a value obtained by dividing the value {(V i ·G i ) / M i )·X i} and then multiplied by 2. It should be noted that the unit of the ratio calculated value α is GPa·cm 3 / g.

[0028] In addition, V i Calculated by the following formula (3), G i It is calculated by the following formula (4).

[0029] V i =6.02·10 23 ·(4 / 3)·π·(x·r 3 M +y·r 3 O )···(3)

[0030] G i =d i / M i ·{x·ΔHf(M gas )+y·ΔHf(O gas )-ΔHf(M x O ycrystal)-(x+y)

[0031] ·RT}···(4)

[0032] Here, the metal oxide contained in the supporting glass substrate 10 is referred to as M x O y .

[0033] M is a metal element, O is an oxygen element, x is the valence number of the metal element M, and y is the valence number of the oxygen element O.

[0034] r M Metal oxide M x O y Shannon ionic radius of the metal element M, r O Metal oxide M x O y The Shannon ionic radius of oxygen element O. In addition, d i Metal oxide M x O y density.

[0035] ΔHf(M gas ) is the standard formation enthalpy of the metal element M in the gaseous state, ΔHf(O gas ) is the standard formation enthalpy of oxygen element O in gaseous state, ΔHf(M x O ycrystal ) is a metal oxide M x O y In addition, R is the gas constant and T is the absolute temperature.

[0036] The ratio ε / d of the supporting glass substrate 10 is 32.0 (GPa·cm 3 / g) or more, and is a value larger than the ratio calculated value α calculated based on the composition.

[0037] That is, the supporting glass substrate 10 can be said to be a member in which the ratio ε / d of the Young's modulus and the density obtained by actual measurement is larger than the ratio calculated value α which is the ratio of the Young's modulus and the density calculated based on the composition.

[0038] By setting the ratio ε / d of the supporting glass substrate 10 to 32.0 (GPa·cm 3 / g) or more, even if the supporting glass substrate 10 is thinned and lightened, it is still highly rigid, so that both the suppression of deflection and the thinning and lightening of the supporting glass substrate can be achieved. Furthermore, the ratio ε / d of the supporting glass substrate 10 is a value greater than the ratio calculated value α calculated based on the composition, in other words, the Young's modulus per unit density is greater than the value expected based on the composition.

[0039] Therefore, the supporting glass substrate 10 can suppress the deflection and reduce the weight to a degree greater than expected.

[0040] Figure 2 This is a graph for explaining the performance of the supporting glass substrate of this embodiment. Figure 2 The range of the ratio ε / d described above is shown in a graph, with the horizontal axis being the ratio calculated value α and the vertical axis being the ratio ε / d. Line segment L1a is the ratio ε / d=32.0 (GPa·cm 3 / g), and line segment L2a is the boundary line where the ratio ε / d=the ratio calculated value α. Figure 2 In the figure, it can be said that the ratio ε / d of the supporting glass substrate 10 is drawn on the upper side of the line segment L1a and the line segment L2a in the vertical axis direction. In other words, it can be said that the ratio ε / d is drawn on Figure 2 within the area of ​​the diagonal lines.

[0041] It should be noted that the ratio ε / d of the supporting glass substrate 10 is more preferably 37.0 (GPa·cm 3 / g) or more, more preferably 40.0 (GPa·cm 3 / g) or more. The passing ratio ε / d is 37.0 (GPa·cm 3 / g) or more, the deflection can be suppressed and the weight can be reduced more appropriately. When the ratio ε / d is 40.0 (GPa·cm 3 / g) or more, the deflection can be suppressed and the weight can be reduced further appropriately.

[0042] exist Figure 2 In the figure, line segment L1b is the ratio ε / d=37.0 (GPa·cm 3 / g) boundary line, line segment L1c is the ratio ε / d = 40.0 (GPa·cm 3 / g) boundary line.

[0043] In addition, the ratio ε / d of the supporting glass substrate 10 more preferably satisfies the following formula (5), and further preferably satisfies the formula (6). By satisfying the formula (5), the suppression of deflection and weight reduction can be more appropriately achieved, and by satisfying the formula (6), the suppression of deflection and weight reduction can be further appropriately achieved.

[0044] ε / d>α+2.0(GPa·cm 3 / g)···(5)

[0045] ε / d>α+4.0(GPa·cm 3 / g)···(6)

[0046] exist Figure 2 In the figure, line segment L2b is ε / d=α+2.0(GPa·cm 3 / g) boundary line, line segment L2c is ε / d=α+4.0(GPa·cm 3 / g) boundary line.

[0047] In addition, the packing density Vt of the supporting glass substrate 10 is preferably less than 13.8 (cm 3 / mol), more preferably less than 13.6 (cm 3 / mol), and more preferably less than 13.3 (cm 3 / mol). By setting the packing density Vt to this range, the molecules can be densely packed to appropriately achieve the suppression of deflection and lightness. Here, the packing density Vt refers to the packing degree of the molecules, and in this embodiment, it refers to the packing degree of the metal oxide contained in the supporting glass substrate 10. The packing density Vt is a value calculated based on the composition of the supporting glass substrate 10. The packing density Vt is calculated by the following formula (7).

[0048] Vt=Σ(V i ·X i )···(7)

[0049] As mentioned above, V in formula (7) i is the filling parameter of the metal oxide contained in the supporting glass substrate 10. As described above, X in formula (7) i It is the molar ratio of the metal oxide contained in the supporting glass substrate 10 to the entire supporting glass substrate 10. That is, the packing density Vt is a value obtained by adding the packing parameters calculated for each metal oxide to all the metal oxides contained in the supporting glass substrate 10 and multiplying the molar ratio.

[0050] The supporting glass substrate 10 preferably has a ratio calculated value α of 31.6 (GPa·cm 3 / g) and the packing density Vt is less than 13.8 (cm 3 / mol). In addition, the supporting glass substrate 10 preferably has a ratio calculated value α of 32.8 (GPa·cm 3 / g) or more and the packing density Vt is less than 13.8, and the ratio calculated value α is more preferably 33.1 (GPa·cm 3 / g) and the packing density Vt is less than 13.6 (cm 3 / mol), and the more preferred ratio calculated value α is 33.5 (GPa·cm 3 / g) and the packing density Vt is less than 13.3 (cm 3 / mol). By using the supporting glass substrate 10 in which the ratio calculated value α and the packing density Vt have such a relationship, it is possible to appropriately achieve suppression of warpage and weight reduction.

[0051] In addition, the ratio of the ratio ε / d to the ratio calculated value α, that is, the ratio ε / d divided by the ratio calculated value α, is set as the structure factor M. That is, the structure factor M refers to the ratio of the measured value of the specific elastic modulus to the specific elastic modulus calculated based on the composition. At this time, it can be said that the structure factor M of the supporting glass substrate 10 is preferably greater than 1, more preferably greater than 1.1, and further preferably greater than 1.12. By setting the structure factor M in this range, it is possible to appropriately achieve suppression of deflection and weight reduction.

[0052] The ratio of the average molecular weight V of the supporting glass substrate 10 to the density d, that is, the value obtained by dividing the average molecular weight V by the density d, is defined as the molecular volume Vm (cm 3 / mol). The average molecular weight V is a calculated value of the average molecular weight of the supporting glass substrate 10, which is calculated based on the composition of the supporting glass substrate 10. For example, the average molecular weight V of a supporting glass substrate containing 50% Al2O3 by mole and 50% SiO2 by mole is (101.96×0.5)+(60.08×0.5). It can be said that the molecular volume Vm is the ratio of the average molecular weight calculated based on the composition to the measured value of the density d. The molecular volume Vm of the supporting glass substrate 10 is preferably less than 24.1 (cm 3 / mol), more preferably less than 23.2 (cm 3 / mol), and more preferably less than 22.7 (cm 3 When the molecular volume Vm is within this range, the molecules are densely packed and the deflection can be appropriately suppressed.

[0053] Next, the composition of the supporting glass substrate 10 will be described. In the present embodiment, the supporting glass substrate 10 is constituted by the composition described below, whereby the ratio ε / d can be 32.0 (GPa·cm 3 / g) or more and greater than the ratio calculated value α, but the composition described below is an example. The supporting glass substrate 10 has a ratio ε / d of 32.0 (GPa·cm 3 / g) and greater than the ratio calculated value α, any composition may be adopted.

[0054] The supporting glass substrate 10 includes a mother material and an additive material. The supporting glass substrate 10 preferably includes SiO2 and Al2O3 as mother materials. The total content of SiO2 and Al2O3 in the supporting glass substrate 10 is preferably 50% to 85%, more preferably 60% to 75%, expressed as mole % based on oxides. It should be noted that 50% to 85% here means that when the mole % of the total amount of the supporting glass substrate 10 is set to 100%, it is 50% or more and 85% or less, and the same applies to the following.

[0055] In addition, the supporting glass substrate 10 may also contain B2O3 as a parent material in addition to SiO2 and Al2O3. The content of B2O3 is preferably 1% to 30%, more preferably 3% to 10%, expressed as a molar percentage based on the oxide. By making the content of the parent material within such a range, the ratio ε / d can be increased, and the suppression of deflection and weight reduction can be appropriately achieved. In addition, the supporting glass substrate 10 may also contain at least one of P2O5, Ga2O3, AlN and Si3N4 as a parent material.

[0056] The additive material is a metal oxide. The supporting glass substrate 10 contains at least one of MgO, CaO and Y2O3 as an additive material. The content of the additive material of the supporting glass substrate 10, in other words, the total content of one or more components selected from MgO, CaO and Y2O3, is preferably in the range of 15% to 50%, more preferably 20% to 45%, expressed as mol% based on the oxide.

[0057] The supporting glass substrate 10 preferably contains only MgO among MgO, CaO and Y2O3 as an additive material, contains only MgO and CaO as additive materials, contains all of MgO, CaO and Y2O3 as additive materials, or contains only Y2O3 as an additive material. The supporting glass substrate 10 preferably contains 11% to 35% of MgO expressed in mole % based on oxides, and more preferably contains 20% to 30% of MgO. In addition, the supporting glass substrate 10 preferably contains 7% to 32% of CaO expressed in mole % based on oxides, and more preferably contains 8% to 15% of CaO. In addition, the supporting glass substrate 10 preferably contains 2.8% to 20% of Y2O3 expressed in mole % based on oxides. By making the content of the additive material within these ranges, the ratio ε / d can be increased, and the suppression of deflection and weight reduction can be appropriately achieved. Furthermore, the supporting glass substrate 10 may contain at least one selected from the group consisting of ZrO 2 , TiO 2 , Li 2 O, and ZnO as an additive material in addition to at least one selected from the group consisting of MgO, CaO, and Y 2 O 3 .

[0058] Furthermore, the supporting glass substrate 10 preferably has a SiO2 content of 40% to 60%, an Al2O3 content of 20% to 30%, and a MgO content of 20% to 30% expressed in terms of mole % based on oxides. In this case, the supporting glass substrate 10 preferably does not contain any component other than SiO2, Al2O3, and MgO except for unavoidable impurities.

[0059] The preferred composition of the supporting glass substrate 10 will be described in more detail. It should be noted that the supporting glass substrate 10 preferably has parameters such as the ratio ε / d, the structure factor M, and the molecular volume Vm within the above-specified ranges, and the composition is not particularly limited. That is, as long as various supporting glass substrates are manufactured with arbitrary compositions, the parameters such as the ratio ε / d, the structure factor M, and the molecular volume Vm are measured and calculated for the manufactured supporting glass substrates, and a glass substrate whose calculated parameters are within the above-specified ranges is used as the supporting glass substrate 10.

[0060] The supporting glass substrate 10 preferably has a SiO2 content of 20% to 66%, an Al2O3 content of 6% to 30%, and a MgO content of 25% to 30%, expressed in terms of mole % based on oxides. Alternatively, the supporting glass substrate 10 preferably has a SiO2 content of 20% to 66%, an Al2O3 content of 6% to 30%, and a total MgO and CaO content of 19% to 46%, expressed in terms of mole % based on oxides. Alternatively, the supporting glass substrate 10 preferably has a SiO2 content of 20% to 66%, an Al2O3 content of 6% to 30%, and a total B2O3 and Y2O3 content of 5.8% to 50%, more preferably a total B2O3 and Y2O3 content of 25% to 50%.

[0061] (1st component)

[0062] An example of a preferred composition of the supporting glass substrate 10 is set as a first composition. The supporting glass substrate 10 of the first composition preferably has a SiO2 content of 48% to 52%, an Al2O3 content of 20% to 25%, and a MgO content of 25% to 30%, and does not contain any component other than SiO2, Al2O3, and MgO except for unavoidable impurities.

[0063] (Second Composition)

[0064] An example of a preferred composition of the supporting glass substrate 10 is set as the second composition. The supporting glass substrate 10 of the second composition preferably has a SiO2 content of 43% to 58%, an Al2O3 content of 12% to 17%, a MgO content of 14% to 27%, and a CaO content of 7% to 32%, and does not contain any component other than SiO2, Al2O3, MgO, and CaO except for unavoidable impurities.

[0065] (3rd composition)

[0066] An example of a preferred composition of the supporting glass substrate 10 is set as the third composition. The supporting glass substrate 10 of the third composition preferably has a SiO2 content of 64% to 68%, an Al2O3 content of 10% to 14%, a MgO content of 9% to 13%, a CaO content of 6% to 10%, and a B2O3 content of 1% to 5%, and does not contain any component other than SiO2, Al2O3, MgO, CaO, and B2O3 except for unavoidable impurities.

[0067] (4th composition)

[0068] An example of a preferred composition of the supporting glass substrate 10 is set as the fourth composition. The supporting glass substrate 10 of the fourth composition preferably has a SiO2 content of 55.7% to 59.7%, an Al2O3 content of 15% to 19%, a MgO content of 13% to 17%, a CaO content of 7% to 11%, and a SrO content of 0.1% to 1%, and does not contain any components other than SiO2, Al2O3, MgO, CaO, and SrO except for unavoidable impurities.

[0069] (Fifth composition)

[0070] An example of a preferred composition of the supporting glass substrate 10 is set as the fifth composition. The supporting glass substrate 10 of the fifth composition preferably has a SiO2 content of 58% to 59%, an Al2O3 content of 13% to 14%, a MgO content of 17% to 19%, a CaO content of 7% to 8%, and a TiO2 content of 2% to 4%, and does not contain any component other than SiO2, Al2O3, MgO, CaO, and TiO2 except for unavoidable impurities.

[0071] (Composition 6)

[0072] An example of a preferred composition of the supporting glass substrate 10 is set as the sixth composition. The supporting glass substrate 10 of the sixth composition preferably has a SiO2 content of 58% to 62%, an Al2O3 content of 11% to 15%, a MgO content of 15% to 19%, a CaO content of 6% to 10%, and a ZrO2 content of 0.5% to 2%, and does not contain any component other than SiO2, Al2O3, MgO, CaO, and ZrO2 except for unavoidable impurities.

[0073] (7th composition)

[0074] An example of a preferred composition of the supporting glass substrate 10 is set as the seventh composition. The supporting glass substrate 10 of the seventh composition preferably has a SiO2 content of 48% to 50%, an Al2O3 content of 6% to 10%, a MgO content of 12% to 16%, a CaO content of 7% to 11%, a Y2O3 content of 0.8% to 4.8%, a TiO2 content of 0% to 4%, a ZrO2 content of 0% to 3%, a LiO2 content of 2% to 6%, and a ZnO content of 4% to 8%, and does not contain any component other than SiO2, Al2O3, MgO, CaO, Y2O3, TiO2, ZrO2, LiO2, and ZnO except for unavoidable impurities.

[0075] (Composition 8)

[0076] An example of a preferred composition of the supporting glass substrate 10 is set as the eighth composition. The supporting glass substrate 10 of the eighth composition preferably has a SiO2 content of 20% to 50%, an Al2O3 content of 20% to 30%, a B2O3 content of 5% to 30%, and a Y2O3 content of 19% to 20%, and does not contain any component other than SiO2, Al2O3, B2O3, and Y2O3 except for unavoidable impurities.

[0077] (9th composition)

[0078] An example of a preferred composition of the supporting glass substrate 10 is set as a 9th composition. The supporting glass substrate 10 of the 9th composition preferably has a SiO2 content of 38% to 42%, an Al2O3 content of 18% to 22%, a B2O3 content of 16% to 20%, a Y2O3 content of 18% to 22%, and a P2O5 content of 0% to 4%, and does not contain any components other than SiO2, Al2O3, B2O3, Y2O3, and P2O5 except for unavoidable impurities.

[0079] (10th composition)

[0080] An example of a preferred composition of the supporting glass substrate 10 is set as the tenth composition. The supporting glass substrate 10 of the tenth composition preferably has a SiO2 content of 38% to 42%, an Al2O3 content of 13% to 15%, a B2O3 content of 18% to 22%, a Y2O3 content of 18% to 22%, and a Ga2O5 content of 3% to 7%, and does not contain any component other than SiO2, Al2O3, B2O3, Y2O3, and Ga2O5 except for unavoidable impurities.

[0081] It should be noted that the supporting glass substrate 10 does not include a sintered body. That is, the supporting glass substrate 10 is a glass that is not a sintered body. The sintered body here refers to a component formed by heating a plurality of particles at a temperature lower than the melting point so that the particles are bonded to each other. Since the sintered body contains pores, the porosity becomes higher to a certain extent, but since the supporting glass substrate 10 is not a sintered body, the porosity is low, usually 0%. However, it is allowed to contain inevitable trace amounts of pores. The porosity here is the so-called true porosity, which refers to the value obtained by dividing the sum of the volumes of the pores (voids) connected to the outside and the pores (voids) not connected to the outside by the total volume (apparent volume). The porosity can be measured, for example, according to JIS R 1634.

[0082] In addition, the glass used in the supporting glass substrate 10 is usually amorphous glass, that is, an amorphous solid. In addition, the glass may also be a crystallized glass containing crystals on the surface or inside, but from the viewpoint of density, amorphous glass is preferred. Sintered bodies (ceramics) cannot be used because of their low transmittance and high density.

[0083] Next, the shape of the supporting glass substrate 10 will be described. Figure 1 As shown, the supporting glass substrate 10 is a plate-shaped glass substrate, including a first surface 12 as a surface on one side, a second surface 14 as a surface on the other side, and a side surface 16. The second surface 14 is a surface on the side opposite to the first surface 12, for example, parallel to the first surface 12. The side surface 16 is a side surface of the supporting glass substrate 10, and can also be said to be an end surface connecting the first surface 12 and the second surface 14.

[0084] The supporting glass substrate 10 is in a circular disk shape when viewed from above, that is, when viewed from a direction perpendicular to the first surface 12. However, the supporting glass substrate 10 is not limited to a disk shape but may be in any shape, for example, a polygonal plate such as a rectangle.

[0085] In addition, the thickness D2 of the supporting glass substrate 10, that is, the length between the first surface 12 and the second surface 14, is preferably 0.1 mm to 2.0 mm, and more preferably 0.1 mm to 0.5 mm. By making the thickness D2 greater than 0.1 mm, the supporting glass substrate 10 can be prevented from becoming too thin, and damage due to bending or impact can be prevented. By making the thickness D2 less than 2.0 mm, the weight can be prevented, and by making the thickness D2 less than 0.5 mm, the weight can be further appropriately prevented.

[0086] The manufacturing method of the supporting glass substrate 10 is arbitrary and not particularly limited. For example, the supporting glass substrate 10 can be manufactured by the following operation: various raw materials such as silica sand or soda ash, which are raw materials of the compound contained in the supporting glass substrate 10, are put into a continuous melting furnace, heated and melted at 1500°C to 1600°C, and after clarification, they are supplied to a forming device, and the supplied molten glass is formed into a plate shape and slowly cooled. It should be noted that the manufacturing of the supporting glass substrate 10 can be carried out by various methods, for example, melt casting method, down-drawing method (for example, overflow down-drawing method, flow hole down-drawing method and re-drawing method, etc.), float method, flattening method and pressing method, etc. can be cited.

[0087] Next, an example of a manufacturing process when the supporting glass substrate 10 is used in the manufacture of FOWLP is described. In the manufacture of FOWLP, a plurality of semiconductor chips are bonded to the supporting glass substrate 10, and the semiconductor chips are covered with a sealing material to form an element substrate. Then, the supporting glass substrate 10 is separated from the element substrate, and the side of the element substrate opposite to the semiconductor chip is bonded to, for example, another supporting glass substrate 10. Next, wiring or solder bumps are formed on the semiconductor chip, and the element substrate and the supporting glass substrate 10 are separated again. Then, the element substrate is cut into individual pieces by semiconductor chip, thereby obtaining a semiconductor device.

[0088] As described above, the ratio ε / d of the supporting glass substrate 10 of the present embodiment is 32.0 (GPa·cm 3 / g) or more, and is a value greater than the ratio calculated value α. The ratio ε / d is the ratio of the Young's modulus ε of the supporting glass substrate 10 to the density d. The ratio calculated value α is the ratio of the Young's modulus to the density calculated based on the composition of the supporting glass substrate 10, and is represented by the above formula (2).

[0089] Sometimes, it is required that the glass substrate has both the suppression of deflection and the weight reduction. However, in general, the thickness needs to be increased to suppress deflection, but the thickness needs to be decreased to reduce weight, so it is difficult to achieve both the suppression of deflection and the weight reduction. In contrast, the supporting glass substrate 10 of the present embodiment has a ratio ε / d of 32.0 (GPa·cm 3 / g) or more, even if the supporting glass substrate 10 is made thinner for weight reduction, the high Young's modulus can suppress deflection, and both deflection suppression and weight reduction can be achieved.

[0090] Furthermore, the ratio ε / d of the supporting glass substrate 10 is greater than the ratio calculated value α calculated based on the composition, in other words, the Young's modulus per unit density is greater than the expected value based on the composition. Therefore, the supporting glass substrate 10 can suppress deflection and reduce weight to a greater extent than expected.

[0091] In addition, the supporting glass substrate 10 preferably has a ratio ε / d of 37.0 (GPa·cm 3 / g) or more, the structure factor M is greater than 1.1, and the packing density Vt is less than 13.8 (cm 3 The supporting glass substrate 10 satisfying such conditions can suppress the deflection and reduce the weight to a degree higher than expected.

[0092] In addition, the supporting glass substrate 10 preferably has a ratio calculated value α of 31.6 (GPa·cm 3 / g) and the packing density Vt is less than 13.8 (cm 3 By setting the ratio calculated value α and the packing density Vt within this range, it is possible to achieve suppression of deflection and weight reduction to a degree greater than expected.

[0093] In addition, the supporting glass substrate 10 preferably satisfies the ratio ε / d> the ratio calculated value α+2.0 (GPa·cm 3 / g), it is more preferable to satisfy the ratio ε / d>ratio calculated value α+4.0 (GPa·cm 3 By satisfying these relationships, it is possible to more appropriately suppress the deflection and reduce the weight.

[0094] In addition, the supporting glass substrate 10 preferably has a ratio ε / d of 37.0 (GPa·cm 3 / g) or more, and more preferably the ratio ε / d is 40.0 (GPa·cm 3 When the ratio ε / d is this value, the suppression of deflection and weight reduction can be more appropriately achieved.

[0095] In addition, the supporting glass substrate 10 preferably contains one or more components selected from MgO, CaO and Y2O3 in a total content of 15% to 50% in mol% relative to the total amount of the supporting glass substrate 10. By including such materials in such an amount, the supporting glass substrate 10 can make the Young's modulus ε higher than assumed, and more appropriately achieve the suppression of deflection and weight reduction.

[0096] In addition, the supporting glass substrate 10 preferably has a total content of SiO2 and Al2O3 in the range of 50% to 85% by mole % relative to the total amount of the supporting glass substrate 10. By having such a composition, the supporting glass substrate 10 can have a Young's modulus ε higher than assumed, and can more appropriately achieve suppression of deflection and weight reduction.

[0097] The thickness D2 of the supporting glass substrate 10 is preferably in the range of 0.1 mm to 0.5 mm. By setting the thickness D2 in this range, it is possible to suppress damage due to bending or impact and achieve weight reduction.

[0098] The supporting glass substrate 10 is glass that is not a sintered body. Since the supporting glass substrate 10 is not a sintered body, it is possible to suppress the density from becoming too high and achieve weight reduction. In addition, since there is no pores such as those in a sintered body that scatter light, it is possible to ensure light transmittance.

[0099] In addition, the supporting glass substrate 10 is preferably amorphous glass. Since the supporting glass substrate 10 is amorphous glass, it is possible to suppress the density from becoming too high and achieve weight reduction.

[0100] The supporting glass substrate 10 is preferably a supporting glass substrate for manufacturing at least one of FOWLP, in other words, fan-out wafer-level packaging and fan-out panel-level packaging. By using the supporting glass substrate 10 in at least one of fan-out wafer-level packaging manufacturing and fan-out panel-level packaging manufacturing, semiconductor packaging can be appropriately manufactured.

[0101] (Example)

[0102] Next, examples will be described. It should be noted that the embodiments may be modified within the scope of achieving the effects of the invention.

[0103] In the examples and comparative examples, supporting glass substrates with different compositions were prepared. Then, the ratio calculation value α was calculated for each supporting glass substrate, and the Young's modulus ε and the density d were measured to calculate the ratio ε / d. In addition, the deflection amount and mass of each supporting glass substrate were measured, and evaluation was performed based on the deflection amount and mass. The following is a more detailed description.

[0104] Table 1 is a table showing materials used in supporting glass substrates of Examples and Comparative Examples. Table 1 shows the contents of materials used in the preparation of supporting glass substrates of Examples 1 to 17 and Comparative Examples 1 to 11, expressed in mol % based on oxides. Table 2 shows the contents of materials used in the preparation of supporting glass substrates of Examples 18 to 26, expressed in mol % based on oxides.

[0105] In the examples and comparative examples, a blank plate having a diameter of 320 mm and a thickness of 6 mm was produced by melt casting with the compositions described in Table 1 and Table 2, respectively. Then, a plurality of plates having a diameter of 300 mm and a thickness of 3 mm were cut out from the center of the blank plate. Both sides of these plates were double-sided polished using cerium oxide as an abrasive material, and the thicknesses were adjusted to 0.4 mm, 0.7 mm, 1.3 mm, and 2.0 mm, respectively, to produce supporting glass substrates.

[0106] The supporting glass substrate produced in this manner was used as a sample and evaluated.

[0107] [Table 1]

[0108] [Table 2]

[0109]

[0110] In the examples and comparative examples, for each supporting glass substrate prepared as a sample, the ratio calculated value α was calculated based on the material composition shown in Table 1. Then, for each supporting glass substrate prepared as a sample, the Young's modulus ε was measured using 38DL PLUS manufactured by OLYMPUS, and the density d was measured by the Archimedean method, and the ratio ε / d was calculated based on the measured Young's modulus ε and the density d.

[0111] Figure 3 Schematic diagram showing the method of measuring the deflection of the embodiment and the comparative example. In the embodiment and the comparative example, the deflection due to the dead weight of each supporting glass substrate made into a sample is measured. Specifically, Figure 3 As shown, when the second surface 14 of the supporting glass substrate as a sample is supported at three points by the support portion B, the central portion ( Figure 3 The support portion B has a diameter of 1.6 mm and is arranged so that its center overlaps with a portion 5.0 mm radially inward from the outer periphery of the supporting glass substrate. The mass of each supporting glass substrate produced as a sample was measured.

[0112] Table 3 is a table showing the evaluation results of Examples and Comparative Examples. Figure 4 Table 3 shows the calculated value α of the ratio of each supporting glass substrate as a sample, Young's modulus ε, density d, ratio ε / d, deflection amount of each thickness D2, mass of a sample with a thickness of 2.0 mm, determination results of deflection and mass, and comprehensive determination results.

[0113] As shown in Table 3, in Examples 1 to 17, the ratio ε / d is 32.0 (GPa·cm 3 / g) or more and the ratio ε / d is greater than the ratio calculated value α. On the other hand, in Comparative Examples 1 to 11, the ratio ε / d of 32.0 (GPa·cm 3 / g) or more and the ratio ε / d being greater than the ratio calculated value α.

[0114] Figure 4 This is a graph plotting the relationship between the ratio ε / d and the ratio calculated value α of the supporting glass substrate as a sample. Figure 4The black circles are the supporting glass substrates of Examples 1 to 17, and the crosses are the supporting glass substrates of Comparative Examples 1 to 11. Figure 4 It can also be seen that the ratio ε / d of the supporting glass substrates of Examples 1 to 17 is 32.0 (GPa·cm 3 / g) or more, and the ratio ε / d is greater than the ratio calculated value α, and the supporting glass substrates of Comparative Examples 1 to 11 do not satisfy at least one of these conditions. Figure 4 It can be seen that in this embodiment, the ratio ε / d deviates from the ratio calculated value α as the calculated value, but in the comparative example, especially the ratio ε / d of the sample with a higher ratio ε / d does not deviate from the ratio calculated value α as the calculated value.

[0115] [Table 3]

[0116]

[0117] In addition, in the determination of the deflection amount in Table 3,

[0118] The case where the deflection amount is less than 0.8 mm is defined as a double loop, and the case where the deflection amount is greater than 0.8 mm and less than 0.9 mm is defined as a loop.

[0119] The case where the deflection amount is greater than 0.9 mm and less than 1.0 mm is set as a triangle.

[0120] A cross is indicated when the deflection amount is 1.0 mm or more.

[0121] Double circles, circles, and triangles are judged as qualified.

[0122] In addition, in the quality judgment of Table 3,

[0123] The case where the mass is less than 400g is set as a double loop.

[0124] The mass is 400g or more and less than 430g as a circle.

[0125] The case where the mass is greater than 430g and less than 500g is set as triangle,

[0126] The case where the mass is 500 g or more is indicated by a cross.

[0127] Double circles, circles, and triangles are judged as qualified.

[0128] Furthermore, when both the deflection amount and the mass are double-circle, the comprehensive judgment is set to double-circle.

[0129] When both the deflection amount and the mass are more than one circle and at least one of them is a circle, the comprehensive judgment is set to a circle.

[0130] When both the deflection amount and the mass are triangular or more and at least one of them is triangular, the comprehensive judgment is triangular.

[0131] When at least one of the deflection amount and the mass is a cross, the comprehensive determination is made a cross.

[0132] In the comprehensive assessment, double circles, circles, and triangles are also judged as qualified.

[0133] As shown in Table 3, the bending amount and quality of the supporting glass substrates of Examples 1 to 17 were judged to be acceptable. On the other hand, at least one of the bending amount and quality of the supporting glass substrates of Comparative Examples 1 to 11 was judged to be unacceptable. That is, it is known that the ratio ε / d is 32.0 (GPa·cm 3 / g) or more and the ratio ε / d being larger than the ratio calculated value α, the supporting glass substrate of the present embodiment can achieve both suppression of deflection and weight reduction.

[0134] Table 4 shows the ratio calculated value α and the measurement results of the ratio ε / d of Examples 18 to 27. As shown in Table 4, in Examples 18 to 27, the ratio ε / d is also 32.0 (GPa·cm 3 / g) or more, and the ratio ε / d is larger than the ratio calculated value α.

[0135] [Table 4]

[0136]

[0137] Table 5 shows the ratio ε / d, structure factor M, molecular volume Vm, ratio calculated value α, and packing density Vt of the supporting glass substrates of the examples and comparative examples. As shown in Table 5, it can be seen that in Examples 1, 3-4, 6-9, and 20-26, the ratio ε / d is 37.0 (GPa·cm 3 / g) or more, and is greater than the ratio calculated value α, the structure factor M is greater than 1.1, and the molecular volume Vm is less than 24.1. In addition, as shown in Table 5, it can be seen that in Examples 2, 4, 6-9, and 20-27, the ratio calculated value α is 31.6 (GPa·cm 3 / g) or more, and the packing density Vt is less than 13.8 (cm 3 / mol).

[0138] [Table 5]

[0139]

[0140] Above, the embodiments of the present invention have been described, but the embodiments are not limited by the contents of the embodiments. In addition, the above-mentioned constituent elements include elements that can be easily thought of by those skilled in the art, substantially the same elements, and elements of the so-called equivalent scope. Furthermore, the above-mentioned constituent elements can be appropriately combined. Furthermore, various omissions, substitutions or changes can be made to the constituent elements within the scope of the gist of the above-mentioned embodiments.

[0141] Explanation of symbols

[0142] 10Supporting glass substrate

[0143] dDensity

[0144] α ratio calculated value

[0145] ε Young's modulus

[0146] ε / d ratio

Claims

1. A supporting glass substrate, wherein the ratio ε / d of the Young's modulus ε to the density d is 32.0 GPa·cm 3 / g or above, The ratio of the ratio ε / d to the ratio calculated value α, i.e., the structure factor M, is 1.1 or more. The ratio calculated value α is the ratio of the Young's modulus calculated from the composition to the density. The unit of the Young's modulus ε is GPa, and the unit of the density d is g / cm 3 The units of the ratio ε / d and the ratio calculated value α are GPa·cm 3 / g, Expressed as mol % based on oxide, The total content of SiO2 and Al2O3 is in the range of 50% to 85%. The content of B2O3 is 1% to 30%, The content of Y2O3 is 2.8% to 20%, The ratio calculated value α is expressed by the following formula: α=2·Σ{(V i ·G i ) / M i )·X i }, Here, V i is the filling parameter of the metal oxide contained in the supporting glass substrate, G i is the dissociation energy of the metal oxide contained in the supporting glass substrate, M i is the molecular weight of the metal oxide contained in the supporting glass substrate, and X i is the molar ratio of the metal oxide contained in the supporting glass substrate.

2. The supporting glass substrate according to claim 1, wherein Satisfy the ratio ε / d>the calculated ratio α+2.0GPa·cm 3 / g, the ratio ε / d and the ratio calculated value α are in units of GPa·cm 3 / g.

3. The supporting glass substrate according to claim 2, wherein: Satisfy the ratio ε / d>the calculated ratio α+4.0GPa·cm 3 / g, the ratio ε / d and the ratio calculated value α are in units of GPa·cm 3 / g.

4. The supporting glass substrate according to claim 1, wherein The ratio ε / d is 37.0 GPa·cm 3 / g or more, the unit of the ratio ε / d is GPa·cm 3 / g.

5. The supporting glass substrate according to claim 1, wherein The packing density Vt calculated based on the composition is less than 13.8, and the unit of the packing density Vt is cm 3 / mol, The packing density Vt is expressed by the following formula, Vt=Σ(V i ·X i )。 6 . The supporting glass substrate according to claim 1 , wherein the thickness thereof is in the range of 0.1 mm to 0.5 mm. The supporting glass substrate according to claim 1 , which is amorphous glass. 8 . The supporting glass substrate according to claim 1 , which is a supporting glass substrate for manufacturing at least one of a fan-out wafer-level package and a fan-out panel-level package.

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