Deposition film forming equipment, plasma enhancement process equipment and supporting assembly

Abstract

The invention discloses deposition film forming equipment, plasma enhancement process equipment and a supporting assembly.The supporting assembly is applied to the deposition film forming equipment or the plasma enhancement process equipment and comprises a supporting pipe, an electrode stem and an electrode connecting part, and at least part of the electrode stem is assembled in the supporting pipe in an inserted mode; an inserting hole is formed in the tube wall of the supporting tube, the electrode connecting part is assembled in the inserting hole in an inserting mode, and the electrode connecting part is connected with the electrode rod. The supporting assembly is integrated with the electrode stem and the electrode connecting part, the structure is compact, the integration degree is high, the mounting occupied space can be reduced, the mounting structure can be simplified, mounting or dismounting can be conveniently carried out, and the surface of the electrode stem can be prevented from being coated with a film.

Description

Technical Field

[0001] The present invention relates to the field of deposition film forming technology, and in particular to a deposition film forming device, a plasma enhanced process device and a supporting component. Background Art

[0002] The deposition film forming equipment or plasma enhanced process equipment using the plasma enhanced (PE) process includes a radio frequency power supply, a reactor and an electrode component. The interior of the reactor forms a reaction chamber, and a carrier carrying a silicon wafer can be transported to the reaction chamber. The radio frequency power supply can be connected to the carrier through the electrode component so as to power the carrier through the electrode component.

[0003] In the related art, the electrode components are generally independently arranged in the reaction chamber, which will take up extra space in the reaction chamber. Moreover, under this structural design, during the installation of the electrode components, it is also necessary to consider whether there will be interference between the electrode components and other components such as the carrier, which makes the design and installation of the electrode components complicated.

[0004] Therefore, how to provide a solution to overcome or alleviate the above-mentioned defects is still a technical problem that needs to be solved urgently by those skilled in the art. Summary of the invention

[0005] The object of the present invention is to provide a deposition film forming device, a plasma enhanced process equipment and a support assembly, wherein the support assembly integrates an electrode rod and an electrode connecting part, has a compact structure, a high degree of integration, can reduce the installation space, and can simplify the installation structure for easy installation or removal.

[0006] In order to solve the above technical problems, the present invention provides a support assembly, which is applied to deposition film forming equipment or plasma enhanced process equipment, including a support tube, an electrode rod and an electrode connecting part. At least part of the electrode rod is plugged and assembled in the support tube. The tube wall of the support tube is provided with a plug hole. The electrode connecting part is plugged and assembled in the plug hole. The electrode connecting part is connected to the electrode rod.

[0007] In an embodiment of the present invention, the electrode rod and the electrode connecting portion can be combined to form an electrode component. The electrode rod is inserted into the support tube and can be installed using the existing space inside the support tube. The electrode connecting portion connected to the electrode rod is inserted into the plug hole of the tube wall of the support tube and can be installed using the space occupied by the tube wall of the support tube. In this way, the occupation of the internal space of the reaction chamber of the reactor of the deposition film forming equipment or plasma enhanced process equipment can be effectively reduced, and the compactness and integration of the structure can be improved; under the condition that the size of the reactor remains unchanged, there can be more spare space inside the reaction chamber, so that the reaction chamber can accommodate larger types of carriers, so as to realize the centralized processing of more substrates. At the same time, the increase in spare space is also conducive to the adjustment of the gas flow field inside the reaction chamber, which has a positive significance for ensuring the efficiency and effect of deposition film forming; under the condition that the volume of the spare space inside the reactor remains unchanged, the size of the reactor can be made small, which is also conducive to the miniaturized design of the reactor.

[0008] Furthermore, when the electrode rod and the electrode connection part are both installed on the support tube, the electrode component no longer needs to be equipped with a separate installation structure. It only needs to use the existing installation structure configured for the support tube to synchronously complete the installation in the reaction chamber, which can reduce the number of installation structures, thereby simplifying the structure of the deposition film forming equipment or plasma enhanced process equipment as a whole and facilitating disassembly and assembly. At the same time, there is basically no need to consider the installation interference problem between the electrode component and other components such as the carrier during the installation process, making the design and installation of the electrode component simple.

[0009] In addition, the support tube can also protect the electrode rod and the electrode connection part, which can reduce the interference of the outside world on the electrode rod and the electrode connection part during installation and use, and is also conducive to ensuring the service life of the electrode component formed by the electrode rod and the electrode connection part. At the same time, the electrode rod is plugged into the support tube, which is equivalent to providing internal support for the support tube, which is also of positive significance for improving the structural strength and support performance of the support assembly.

[0010] Optionally, the support assembly further includes a first insulating component and a second insulating component, wherein the first insulating component is used for insulating the electrode rod and the support tube, and the second insulating component is used for insulating the electrode connecting portion and the support tube.

[0011] Optionally, the first insulating component includes an insulating connector, the insulating connector is provided with a first plug-in portion and a second plug-in portion that are connected, one axial end of the electrode rod is plugged into the first plug-in portion, and the electrode connecting portion is plugged into the second plug-in portion.

[0012] Optionally, the first plug-in portion is a through hole extending along the axial direction of the electrode rod, including a first hole segment and a second hole segment, the cross-sectional area of ​​the first hole segment is larger than that of the second hole segment, and the insulating connector forms a first step surface between the first hole segment and the second hole segment; the electrode rod includes a rod body and an end portion, the rod body is inserted into the second hole segment and extends into the first hole segment, the end portion is connected to the rod body, and the end portion is configured to be able to abut against the first step surface.

[0013] Optionally, the second plug-in portion is communicated with the first hole section, and the electrode connecting portion is connected with the end portion.

[0014] Optionally, the first plug-in portion also includes a third hole segment, the third hole segment is located on the side of the second hole segment away from the first hole segment, the cross-sectional area of ​​the third hole segment is also larger than the second hole segment, and the insulating connector forms a second step surface between the second hole segment and the third hole segment; the first insulating component also includes a first insulating tube, the first insulating tube sleeve is assembled on the rod body, the first insulating tube is inserted into the third hole segment, and abuts against the second step surface.

[0015] Optionally, the first plug-in portion also includes a fourth hole segment, the fourth hole segment is located on the side of the third hole segment away from the second hole segment, the fourth hole segment is gradually expanded in a direction away from the third hole segment, the fourth hole segment includes a small neck end and a large neck end, and the small neck end is connected to the third hole segment.

[0016] Optionally, the first insulating component further includes an insulating tube, which is sleeved between the electrode rod and the support tube, and the insulating tube and the insulating connector are in contact with each other; there is one insulating tube; or, there are multiple insulating tubes, which are sleeved in sequence.

[0017] Optionally, the second plug-in portion is a stepped hole, including a thick neck hole section and a thin neck hole section, the thick neck hole section is connected to the first plug-in portion through the thin neck hole section, the insulating connector forms a third step surface between the thick neck hole section and the thin neck hole section, and a portion of the second insulating component extends into the thick neck hole section.

[0018] Optionally, the electrode connecting portion includes a head portion and a rod portion connected to each other, and the second insulating component includes a sleeve portion and a wing portion, the wing portion is located on the outer wall surface of the sleeve portion, and the wing portion is located at one axial end of the sleeve portion; the sleeve portion is inserted into the plug-in hole, the wing portion is located on the outside of the support tube, and the wing portion and the outer wall surface of the support tube are abutted, the rod portion is inserted into the sleeve portion, and the head portion and the wing portion are abutted.

[0019] Optionally, a support seat is further included, which is installed on the outer wall surface of the support tube and is used to support a carrier of the deposition film forming equipment or the plasma enhanced process equipment.

[0020] Optionally, the support seat is provided with an avoidance hole, and a part of the electrode connecting part is located in the avoidance hole.

[0021] Optionally, the support seat includes a seat plate portion and two side plate portions, the two side plate portions are connected to the seat plate portion, the seat plate portion and the two side plate portions can fit with the outer wall surface of the support tube, and the seat plate portion is provided with the avoidance hole.

[0022] Optionally, a limiting component is further included, and the limiting component is installed on the support tube. In the axial direction of the support tube, the limiting component is arranged on both sides of the support seat.

[0023] Optionally, the limiting component is configured to be able to adjust the installation position in the axial direction of the support tube.

[0024] Optionally, it also includes a tension adjustment component, and the limiting component is installed on the support tube through the tension adjustment component, and the tension adjustment component has a loose state and a tight state; in the loose state, the limiting component is adjustable in the axial installation position of the support tube; in the tight state, the limiting component is fixed to the support tube.

[0025] Optionally, among the limiting components on both sides of the support seat, there is a gap between at least one of the limiting components and the support seat.

[0026] Optionally, the cross-section of the outer wall of the support tube is non-circular.

[0027] Optionally, at least a partial area of ​​the outer wall surface of the support tube is a plane portion, and the axial end of the plug hole on the outer wall surface of the support tube is located on the plane portion.

[0028] Optionally, the support tube is a square tube.

[0029] The present invention also provides a deposition film forming device, including a reactor, a support assembly and a radio frequency power supply, wherein the support assembly is installed in the reactor, the support assembly is the above-mentioned support assembly, and the electrode rod of the support assembly is electrically connected to the radio frequency power supply.

[0030] Optionally, the reactor has a front furnace opening and a rear furnace opening, and the electrode rod extends from the rear furnace opening.

[0031] Optionally, there are two support assemblies, the electrode rods of the two support assemblies are respectively connected to the positive electrode and the negative electrode of the RF power supply, and the electrode connecting parts of the two support assemblies are respectively the positive electrode connecting part and the negative electrode connecting part; the positive electrode connecting part and the negative electrode connecting part connected to the same carrier are staggered in the axial direction of the support assembly.

[0032] The present invention also provides a plasma enhanced process equipment, including a reactor, a support assembly and a radio frequency power supply, wherein the support assembly is installed in the reactor, the support assembly is the above-mentioned support assembly, and the electrode rod of the support assembly is electrically connected to the radio frequency power supply.

[0033] Optionally, the reactor has a front furnace opening and a rear furnace opening, and the electrode rod extends from the rear furnace opening.

[0034] Optionally, there are two support assemblies, the electrode rods of the two support assemblies are respectively connected to the positive electrode and the negative electrode of the RF power supply, and the electrode connecting parts of the two support assemblies are respectively the positive electrode connecting part and the negative electrode connecting part; the positive electrode connecting part and the negative electrode connecting part connected to the same carrier are staggered in the axial direction of the support assembly. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 A simplified structural diagram of a deposition film forming device or a plasma enhanced process device provided in an embodiment of the present invention;

[0036] Figure 2 A connection structure diagram of a support assembly and a connection flange provided in an embodiment of the present invention;

[0037] Figure 3 for Figure 2 A partial enlarged view of the connection between the middle support assembly and the connecting flange;

[0038] Figure 4 for Figure 2 A partial enlarged view of the connection between the support tube, the electrode connection part and the support seat of the middle support assembly;

[0039] Figure 5 for Figure 4 sectional view of;

[0040] Figure 6 for Figure 5 A diagram of the connection structure between the middle electrode rod and the first insulating component;

[0041] Figure 7 for Figure 5 Connection structure diagram of the middle electrode connecting part, support seat, support tube and end head.

[0042] The following are the descriptions of the reference numerals:

[0043] 1000-support assembly; 1100-support tube; 1110-plug hole; 1120-plane portion; 1200-electrode rod; 1210-rod body; 1220-end head; 1221-connection hole; 1300-electrode connection portion; 1310-head; 1320-rod portion; 1300A-positive electrode portion; 1300B-negative electrode portion; 1400-first insulating component; 1410-insulating connector; 1411-first plug-in portion; 1411A-first hole section; 1411B-second hole section; 1411C-first step surface; 1411D-first Three hole sections; 1411E-fourth hole section; 1411F-second step surface; 1412-second plug-in portion; 1412A-thick neck hole section; 1412B-thin neck hole section; 1412C-third step surface; 1420-first insulating tube; 1430-second insulating tube; 1500-second insulating component; 1510-sleeve section; 1520-wing plate section; 1600-support seat; 1610-seat plate section; 1611-avoidance hole; 1620-side plate section; 1700-limiting component; 1710-limiting groove section; 1800-elastic adjustment component; 1810-hoop;

[0044] 2000-reactor; 2000A-reaction chamber; 2100-front furnace opening; 2200-rear furnace opening; 2300-connecting flange; 2310-supporting seat;

[0045] 3000-RF power supply;

[0046] 4000-Vehicles. DETAILED DESCRIPTION

[0047] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0048] In the embodiments of the present invention, the terms "first", "second", "third", and "fourth" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first", "second", "third", and "fourth" may explicitly or implicitly include one or more of the features.

[0049] In the description of the embodiments of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense. For example, "connection" can be a detachable connection or a non-detachable connection; it can be a direct connection or an indirect connection through an intermediate medium.

[0050] The directional terms mentioned in the embodiments of the present invention, such as "inside", "outside", etc., are only references to the directions of the drawings. Therefore, the directional terms used are for better and clearer explanation and understanding of the embodiments of the present invention, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present invention.

[0051] In the description of the embodiments of the present invention, the terms "comprises", "includes" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also includes other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the sentence "comprises a ..." does not exclude the presence of other identical elements in the process, method, article or device including the element.

[0052] Please refer to Figure 1-Figure 7 , Figure 1 A simplified structural diagram of a deposition film forming device or a plasma enhanced process device provided in an embodiment of the present invention; Figure 2 A connection structure diagram of a support assembly and a connection flange provided in an embodiment of the present invention; Figure 3 for Figure 2 A partial enlarged view of the connection between the middle support assembly and the connecting flange; Figure 4 for Figure 2 A partial enlarged view of the connection between the support tube, the electrode connection part and the support seat of the middle support assembly; Figure 5 for Figure 4 sectional view of; Figure 6 for Figure 5 A diagram of the connection structure between the middle electrode rod and the first insulating component; Figure 7 for Figure 5 Connection structure diagram of the middle electrode connecting part, support seat, support tube and end head.

[0053] The embodiment of the present invention provides a deposition film forming device, which can specifically use a plasma enhanced (PE) process such as a plasma enhanced chemical vapor deposition (PECVD) process and a plasma enhanced atomic layer deposition (PEALD) process to deposit a film on the surface of a substrate such as a silicon wafer. At the same time, the embodiment of the present invention also provides a plasma enhanced process device, which can also use the above-mentioned plasma enhanced (PE) process to perform operations such as etching, sputtering, and cleaning on the surface of a substrate such as a silicon wafer.

[0054] like Figure 1 As shown, the deposition film forming equipment or plasma enhanced process equipment may include a support assembly 1000 , a reactor 2000 , a radio frequency power supply 3000 and a carrier 4000 .

[0055] The reactor 2000 may specifically be a tubular structure, etc. The reactor 2000 may have a reaction chamber 2000A, and the reaction chamber 2000A may be used to provide a reaction place for processing substrates. The support assembly 1000 is located inside the reaction chamber 2000A, and is used to support the carrier 4000, which can improve the stability of the carrier 4000 in the reaction chamber 2000A. The carrier 4000 may specifically be a graphite boat, a silicon carbide boat, a carrier plate or a carrier disc, etc. The graphite boat may be provided with a boat sheet thereon, which is used to carry and fix the substrate, and the substrate can enter and exit the reaction chamber 2000A together with the carrier 4000, so as to conveniently realize batch processing of the substrate. In some implementations, only one carrier 4000 may be accommodated in one reaction chamber 2000A. In other implementations, a plurality of carriers 4000 may also be accommodated in one reaction chamber 2000A at the same time, such as two carriers 4000 (see Figure 1 ) in order to improve the production efficiency of deposition film.

[0056] The RF power supply 3000 is a power supply component, which is used to be electrically connected to the carrier 4000 to form a power supply circuit. Specifically, the carrier 4000 may be provided with an electrical connection portion, and in some implementations, the electrical connection portion of the carrier 4000 is also referred to as a boat foot, which can be used to be electrically connected to the RF power supply 3000.

[0057] As described in the background technology section, in the related art, the RF power supply is electrically connected through the electrode component and the carrier, and the electrode component is independently arranged in the reaction chamber. In this way, the electrode component needs to occupy additional space in the reaction chamber and requires an independently arranged installation and fixing structure, which will cause the structure of the deposition film forming equipment or plasma enhanced process equipment to become complicated. At the same time, during the installation of the electrode component, it is also necessary to consider whether there will be installation interference between the electrode component and other components such as the carrier, which makes the design and installation of the electrode component complicated.

[0058] In view of this, the embodiment of the present invention no longer provides a separate electrode component, but provides a solution for integrating the electrode component into the support assembly. Figure 2-Figure 7 As shown, an embodiment of the present invention provides a support assembly 1000, including a support tube 1100, an electrode rod 1200 and an electrode connecting portion 1300. At least part of the electrode rod 1200 is plugged and assembled inside the support tube 1100. The tube wall of the support tube 1100 is provided with a plug hole 1110, and the electrode connecting portion 1300 is plugged and assembled in the plug hole 1110. The electrode connecting portion 1300 is connected to the electrode rod 1200, and the electrode connecting portion 1300 is used to connect with the electrical connecting portion of the carrier 4000 to establish an electrical connection relationship between the electrode rod 1200, the electrode connecting portion 1300 and the carrier 4000. Among them, the electrode connecting portion 1300 and the electrode rod 1200 can be combined to form the electrode component in the embodiment of the present invention.

[0059] By adopting this solution, the electrode rod 1200 is inserted into the interior of the support tube 1100, and can be installed using the existing space inside the support tube 1100; the electrode connecting part 1300 connected to the electrode rod 1200 is inserted into the plug hole 1110 of the tube wall of the support tube 1100, and can also be installed using the space inside the tube wall of the support tube 1100. In this way, the occupation of the internal space of the reaction chamber 2000A can be effectively reduced, and the compactness and integration of the structure can be improved; under the condition that the size of the reactor 2000 remains unchanged, there can be more spare space inside the reaction chamber 2000A, so that the reaction chamber 2000A can accommodate a larger type of carrier 4000, so as to realize the centralized processing of more substrates. At the same time, the increase in spare space is also beneficial to the adjustment of the gas flow field inside the reaction chamber 2000A, which is of positive significance for ensuring the efficiency and effect of deposition and film formation; under the condition that the volume of the spare space inside the reactor 2000 remains unchanged, the size of the reactor 2000 can be made smaller, which is also beneficial to the miniaturized design of the reactor 2000.

[0060] Furthermore, when the electrode rod 1200 and the electrode connecting portion 1300 are both installed on the support tube 1100, the electrode component no longer needs to be equipped with a separate installation structure. It only needs to use the existing installation structure configured for the support tube 1100 to synchronously complete the installation in the reaction chamber 2000A, which can reduce the number of installation structures, thereby simplifying the structure of the deposition film forming equipment or plasma enhanced process equipment as a whole, and facilitating disassembly and assembly. At the same time, there is basically no need to consider the installation interference problem between the electrode component and other components such as the carrier 4000 during the installation process, so that the design and installation of the electrode component can also become simple.

[0061] In addition, the support tube 1100 can also protect the electrode rod 1200 and the electrode connecting part 1300, which can reduce the interference of the outside world on the electrode rod 1200 and the electrode connecting part 1300 during installation and use, and is also conducive to ensuring the service life of the electrode component formed by the electrode rod 1200 and the electrode connecting part 1300. At the same time, the electrode rod 1200 is plugged into the support tube 1100, which itself is equivalent to providing internal support for the support tube 1100, which is also of positive significance for improving the structural strength and support performance of the support assembly 1000.

[0062] In addition, by placing the electrode rod 1200 inside the support tube 1100, it is also possible to avoid coating on the surface of the electrode rod 1200 during the deposition film forming process, thereby reducing the impact on the characteristics of the electrode rod 1200. This is also conducive to ensuring the reliability of the electrical connection between the electrode component and the carrier 4000.

[0063] In some implementations, the support tube 1100 may be made of insulating material to facilitate electrical isolation of the electrode rod 1200 and the electrode connecting portion 1300, thereby reducing the transfer of current through the support tube 1100 to other parts such as the shell of the reactor 2000 during use, which is beneficial to ensuring production safety.

[0064] Here, the embodiments of the present invention do not limit the specific types of the above-mentioned insulating materials. In practical applications, those skilled in the art can select them according to specific needs, as long as they can meet the requirements of use. For example, the above-mentioned insulating materials can be glass fiber reinforced materials, polyetheretherketone (PEEK), etc., so as to have better insulation performance while also taking into account the requirements of strength.

[0065] In other implementations, the support tube 1100 may also be a conductive material, such as a metal material, such as steel. Metal materials generally have a higher strength and can better meet the support performance of the support tube 1100. In addition, metal materials can also be easily machined, so that the aforementioned plug hole 1110 and other structures can be relatively easy to manufacture. The following embodiments of the present invention mainly use this as an example to illustrate the structural form of the support assembly 1000 provided by the present invention.

[0066] The supporting assembly 1000 provided in the embodiment of the present invention may further include a first insulating component 1400 and a second insulating component 1500 .

[0067] The first insulating component 1400 can be used for insulating the electrode rod 1200 and the support tube 1100. The second insulating component 1500 can be used for insulating the electrode connecting portion 1300 and the support tube 1100. In this way, the electrical isolation between the electrode rod 1200 and the electrode connecting portion 1300 and the support tube 1100 can be achieved, which can reduce the transmission of the current of the electrode component to the support tube 1100 during use, and the transmission of the current through the support tube 1100 to other parts such as the shell of the reactor 2000, which is conducive to ensuring the safety of production.

[0068] The material selection of the first insulating component 1400 and the second insulating component 1500 can refer to the aforementioned insulating materials. The difference is that the first insulating component 1400 and the second insulating component 1500 may have relatively low requirements for the strength, brittleness and other properties of the material. Therefore, the material selection of the first insulating component 1400 and the second insulating component 1500 can be more diverse, such as ceramics, rubber, etc., which can be determined in combination with actual application requirements.

[0069] Combination Figure 5 and Figure 6 , the first insulating component 1400 may include an insulating connector 1410, and the insulating connector 1410 may be provided with a first plug-in portion 1411 and a second plug-in portion 1412 that are connected. An axial end of the electrode rod 1200 may be plugged into the first plug-in portion 1411. The electrode connecting portion 1300 may be plugged into the second plug-in portion 1412. Then, the electrode rod 1200 and the electrode connecting portion 1300 may be connected. The insulating connector 1410 may realize an insulating setting between the connection between the electrode rod 1200 and the electrode connecting portion 1300 and the support tube 1100, which may further enhance the insulation effect between the electrode rod 1200 and the electrode connecting portion 1300 and the support tube 1100.

[0070] In some optional implementations, the first plug-in portion 1411 may be a through hole extending along the axial direction of the electrode rod 1200. Figure 6As shown, the first plug-in portion 1411 may include a first hole segment 1411A and a second hole segment 1411B, wherein the area of ​​the cross section of the first hole segment 1411A perpendicular to the axial direction may be larger than that of the second hole segment 1411B, so that the insulating connector 1410 may form a first step surface 1411C between the first hole segment 1411A and the second hole segment 1411B.

[0071] The electrode rod 1200 may include a rod body 1210 and an end portion 1220. The rod body 1210 may be inserted into the second hole section 1411B and may extend into the first hole section 1411A, that is, the rod body 1210 may have an extending portion (not marked in the figure) extending into the first hole section 1411A. The end portion 1220 may be connected to the rod body 1210, and may be specifically connected to the extending portion of the rod body 1210. The connection method between the two may be, for example, threaded connection, welding, interference fit, clamping, etc., which is not limited here, as long as it can meet the requirements of use.

[0072] After the end portion 1220 and the rod body 1210 are connected, the end portion 1220 can abut against the first step surface 1411C. Figure 5 and Figure 6 The position and orientation relationship in the electrode rod 1200 is achieved by the abutment between the end portion 1220 and the first step surface 1411C, which can limit the rightward movement of the electrode rod 1200 and is conducive to ensuring the relative position of the insulating connector 1410 and the electrode rod 1200. It should be understood that the electrode rod 1200 is provided with a connection part, and the connection part needs to be aligned with the second plug-in part 1412, so that the electrode connecting part 1300 can be easily connected to the connection part after passing through the second plug-in part 1412; and the abutment between the end portion 1220 and the first step surface 1411C is conducive to ensuring the alignment of the connection part and the second plug-in part 1412, that is, it is convenient to achieve accurate docking between the electrode connecting part 1300 and the connection part.

[0073] The second plug-in portion 1412 may be connected to the first hole section 1411A, and the electrode connecting portion 1300 may be connected to the terminal portion 1220, that is, the connecting portion may be disposed at the terminal portion 1220. Figure 6As shown, the end portion 1220 may be provided with a connection hole 1221 at the connection portion, and the electrode connection portion 1300 may be installed in the connection hole 1221 by means of thread connection, interference fit, etc. Taking thread connection as an example, at least a partial area of ​​the electrode connection portion 1300 may be provided with an external thread, and at least a partial area in the connection hole 1221 may be provided with an internal thread, and the electrode connection portion 1300 may be threadedly assembled in the connection hole 1221; and by adjusting the thread matching dimensions of the electrode connection portion 1300 and the connection hole 1221, the dimension of the portion of the electrode connection portion 1300 extending out of the outer wall of the support tube 1100 may also be adjusted, so as to better meet the electrical connection requirements of the electrode connection portion 1300 and the carrier 4000.

[0074] It should be understood that the electrode connection part 1300 is not limited to being connected to the end part 1220, and it can actually be connected to the rod body 1210. In this case, the second plug part 1412 can be connected to the second hole section 1411B (or other hole sections of the first plug part 1411 that can accommodate the rod body 1210 mentioned in the subsequent embodiments of the present invention). In the implementation mode in which the electrode connection part 1300 is directly connected to the rod body 1210, the end part 1220 may exist or not, which can be determined in combination with actual conditions.

[0075] In some optional implementations, the first plug-in portion 1411 may further include a third hole segment 1411D, and the third hole segment 1411D may be located on a side of the second hole segment 1411B away from the first hole segment 1411A. The area of ​​the cross section perpendicular to the axial direction of the third hole segment 1411D may also be larger than that of the second hole segment 1411B, so that the insulating connector 1410 may form a second step surface 1411F between the second hole segment 1411B and the third hole segment 1411D.

[0076] The first insulating member 1400 may further include a first insulating tube 1420 .

[0077] The first insulating tube 1420 can be mounted on the rod body 1210, that is, the first insulating tube 1420 can be located between the rod body 1210 and the support tube 1100, so as to better realize the insulation setting between the rod body 1210 and the support tube 1100. During the specific installation, the first insulating tube 1420 can be inserted into the third hole section 1411D and can abut against the second step surface 1411F; in this way, the relative position of the first insulating tube 1420 and the rod body 1210 can be better defined, and the installation stability of the first insulating tube 1420 in the support tube 1100 can be improved.

[0078] At the same time, the first insulating tube 1420 is arranged inside the support tube 1100, which can also improve the structural strength of the support assembly 1000, which is beneficial to improving the supporting performance of the support assembly 1000.

[0079] Please continue to refer to Figure 5 and Figure 6 , the first plug-in portion 1411 may further include a fourth hole segment 1411E. The fourth hole segment 1411E may be located on a side of the third hole segment 1411D away from the second hole segment 1411B. The fourth hole segment 1411E is in a direction away from the third hole segment 1411D ( Figure 6 In the fourth hole segment 1411E, the inner wall surface can be gradually expanded in the direction away from the third hole segment 1411D. Specifically, the inner wall surface of the fourth hole segment 1411E can be a prism side surface; or, the inner wall surface of the fourth hole segment 1411E can also be a truncated cone side surface; or, the inner wall surface of the fourth hole segment 1411E can also be a spherical table side surface; in short, as long as the fourth hole segment 1411E is gradually expanded in the direction away from the third hole segment 1411D. The fourth hole segment 1411E can include a small neck end and a large neck end, wherein the small neck end can be connected to the third hole segment 1411D, and the large neck end can be relatively far away from the third hole segment 1411D.

[0080] During specific assembly, the fourth hole segment 1411E can play a guiding role, and can facilitate the plugging and assembly of the first insulating tube 1420 into the third hole segment 1411D.

[0081] It should be understood that in some other implementations of the embodiments of the present invention, the small neck end of the fourth hole segment 1411E may not be directly connected to the third hole segment 1411D. For example, the area of ​​the small neck end may be set to be larger than the area of ​​the cross-section of the third hole segment 1411D perpendicular to the axial direction. In this case, the insulating connector 1410 can form a step surface between the third hole segment 1411D and the fourth hole segment 1411E, which is also feasible.

[0082] In addition, the first plug-in portion 1411 is not limited to Figure 6 The through hole structure shown includes four hole segments. In some other implementations of the embodiments of the present invention, the first plug-in portion 1411 may also adopt other structural forms as long as it can meet the requirements of use. For example, the first plug-in portion 1411 may not include the fourth hole segment 1411E mentioned above. For another example, the first plug-in portion 1411 may not include the third hole segment 1411D and the fourth hole segment 1411E mentioned above. In this case, the first insulating tube 1420 is no longer plugged into the first plug-in portion 1411. For another example, the first plug-in portion 1411 may also be set as a non-through blind hole in the axial direction of the electrode rod 1200. In this case, the electrode rod 1200 may only include the rod body 1210, and the electrode connecting portion 1300 may be directly connected to the rod body 1210. This is also feasible.

[0083] In some optional implementations, the first insulating component 1400 may further include a second insulating tube 1430. The second insulating tube 1430 may be sleeved between the electrode rod 1200 and the support tube 1100, which may better achieve the insulation setting between the rod body 1210 and the support tube 1100, and may further improve the structural strength and support performance of the support assembly 1000. Figure 6 As shown, the second insulating tube 1430 can be axially abutted against the insulating connector 1410, so that the relative position of the second insulating tube 1430 and the rod body 1210 can be better defined.

[0084] In practical applications, the second insulating tube 1430 and the first insulating tube 1420 may cooperate with each other, and the second insulating tube 1430 may be located outside the first insulating tube 1420. In this case, the second insulating tube 1430 may play a role in strengthening insulation, and may reduce insulation failure caused by damage to the first insulating tube 1420.

[0085] It should be understood that the second insulating tube 1430 can also be plugged into the first plug-in portion 1411 in actual applications. For example, the insulating connector 1410 can form a step surface between the third hole segment 1411D and the fourth hole segment 1411E. The second insulating tube 1430 can be plugged into the fourth hole segment 1411E and can abut against the step surface. This is also feasible.

[0086] In addition, the insulating tube between the rod body 1210 and the support tube 1100 is not limited to the first insulating tube 1420 and the second insulating tube 1430 described above. In specific practice, those skilled in the art may also set a greater number of insulating tubes. For example, the first insulating component 1400 may also include a third insulating tube, and the third insulating tube may be set between the second insulating tube 1430 and the support tube 1100 to further strengthen insulation and enhance the strength and support performance of the support assembly 1000.

[0087] In some optional implementations, the second plug-in portion 1412 may be a stepped hole. The second plug-in portion 1412 may include a thick-necked hole section 1412A and a thin-necked hole section 1412B. The area of ​​the cross section perpendicular to the axial direction of the thick-necked hole section 1412A may be larger than that of the thin-necked hole section 1412B; thus, the insulating connector 1410 forms a third stepped surface 1412C between the thick-necked hole section 1412A and the thin-necked hole section 1412B. Figure 6 The thick-necked hole section 1412A may be connected to the first plug-in portion 1411 through the thin-necked hole section 1412B.

[0088] During installation, the second insulating component 1500 can be inserted into the plug hole 1110 and can partially extend into the thick neck hole section 1412A to define the relative position of the insulating connector 1410 and the support tube 1100. In this way, when the electrode connecting part 1300 is installed through the second insulating component 1500, it can be accurately inserted into the second plug-in part 1412, which can facilitate the installation of the electrode connecting part 1300 and the insulating connector 1410, and further facilitate the accurate connection between the electrode connecting part 1300 and the electrode rod 1200.

[0089] Combination Figure 7 The electrode connecting portion 1300 may be T-shaped, including a head portion 1310 and a rod portion 1320 connected to each other, and the area of ​​the cross section of the head portion 1310 perpendicular to the axial direction of the rod portion 1320 is larger than that of the rod portion 1320. The second insulating component 1500 may include a sleeve portion 1510 and a wing portion 1520, and the wing portion 1520 may be located on the outer wall surface of the sleeve portion 1510, and the wing portion 1520 may be located at one axial end of the sleeve portion 1510.

[0090] The sleeve portion 1510 can be plugged into the plug hole 1110 and can partially extend into the aforementioned thick neck hole section 1412A, and the wing plate portion 1520 can be located outside the support tube 1100, and the wing plate portion 1520 abuts against the outer wall surface of the support tube 1100. In this way, the second insulating component 1500 can be mounted on the support tube 1100, the connection structure between the second insulating component 1500 and the support tube 1100 can be relatively simple, and the disassembly and assembly of the second insulating component 1500 can be relatively convenient.

[0091] The rod portion 1320 of the electrode connection portion 1300 can be inserted into the sleeve portion 1510, and the head portion 1310 can be abutted against the wing portion 1520. In this way, on the one hand, the electrode connection portion 1300 can be hooked and assembled to simplify the connection structure, thereby facilitating assembly and disassembly; on the other hand, the wing portion 1520 can also achieve an insulation setting between the head portion 1310 and the support tube 1100.

[0092] In addition, through the abutment between the head 1310 and the wing plate portion 1520, during the actual operation of the deposition film forming equipment or plasma enhanced process equipment provided by the embodiment of the present invention, the gravity of the carrier 4000 and the substrate and other components arranged thereon can be transmitted to the wing plate portion 1520 through the head 1310, and then transmitted to the support tube 1100 through the wing plate portion 1520, so that the support tube 1100 can finally bear the force, which can reduce the transmission of force to the electrode rod 1200 and the possibility of damage to the electrode rod 1200, which is beneficial to ensure the service life of the electrode rod 1200.

[0093] In some optional implementations, the support assembly 1000 provided in the embodiment of the present invention may further include a support seat 1600 .

[0094] The support base 1600 can be installed on the outer wall of the support tube 1100 to support the carrier 4000. In this way, the gravity of the carrier 4000 and the substrate and other components arranged thereon can be shared by the support base 1600, which can reduce the direct transmission of force to the electrode connecting part 1300, thereby reducing the possibility of damage to the electrode connecting part 1300, which is conducive to ensuring the service life of the electrode connecting part 1300.

[0095] Combination Figure 4 and Figure 7 In an embodiment of the present invention, the support seat 1600 may be provided with an avoidance hole 1611 , and the electrode connecting part 1300 may be plugged into the avoidance hole 1611 to avoid installation interference between the support seat 1600 and the electrode connecting part 1300 through the avoidance hole 1611 .

[0096] The support seat 1600 can also be made of insulating material, so that when the support seat 1600 and the electrode connecting part 1300 are in contact, the current transmission from the electrode connecting part 1300 to the support seat 1600 can be avoided to a large extent, and the current can be avoided from the support seat 1600 to the support tube 1100 and other parts that do not want to be energized. It is beneficial to ensure the safety of the deposition film forming equipment or plasma enhanced process equipment provided by the embodiment of the present invention. Of course, the support seat 1600 can also be made of conductive material. In this case, it is necessary to pay attention to the installation position of the support seat 1600 to avoid direct contact between the support seat 1600 and the electrode connecting part 1300.

[0097] The support seat 1600 may be roughly U-shaped, including a seat plate portion 1610 and two side plates 1620, and both side plates 1620 may be connected to the seat plate portion 1610. The side plates 1620 and the seat plate portion 1610 may be an integral structure formed in one piece; or, the side plates 1620 and the seat plate portion 1610 may be manufactured separately and then assembled, and the specific assembly method includes but is not limited to welding, bonding, screw connection, clamping, riveting, etc., as long as the reliability requirements of the connection can be guaranteed.

[0098] During specific installation, the support seat 1600 and the support tube 1100 can be assembled in the up and down directions, and the support seat 1600 can be buckled downward onto the support tube 1100. After the installation is completed, the seat plate portion 1610 and the two side plate portions 1620 can fit the outer wall surface of the support tube 1100, and the two side plate portions 1620 can be snapped into the support tube 1100 in cooperation with the seat plate portion 1610, which can reduce the possibility of the support seat 1600 falling off the support tube 1100. In this implementation method, the connection method between the support seat 1600 and the support tube 1100 is relatively simple, and can be easily disassembled and assembled, so as to facilitate the replacement and maintenance of the support seat 1600 at a later stage. Figure 4 As shown, in this implementation, the avoidance hole 1611 can be specifically arranged on the seat plate portion 1610 .

[0099] It should be understood that the support seat 1600 may not be provided with the above-mentioned avoidance hole 1611. In this case, in the axial direction of the support tube 1100, the support seat 1600 may be integrally arranged on one side of the electrode connecting part 1300 so that the support seat 1600 can avoid the electrode connecting part 1300 as a whole. This is also feasible.

[0100] In some optional implementations, the support assembly 1000 provided in the embodiment of the present invention may further include a limiting component 1700 , and the limiting component 1700 may be installed on the support tube 1100 .

[0101] In the axial direction of the support tube 1100, limiting components 1700 can be set on both sides of the support seat 1600. The limiting components 1700 are used to limit the axial position of the support seat 1600, which is beneficial to ensure the installation position of the support seat 1600 in the axial direction of the support tube 1100, and can reduce the position movement of the support seat 1600 along the axial direction of the support tube 1100 during installation and use, and can increase the installation stability and reliability of the support seat 1600 in the support tube 1100. It can also reduce the possibility of collision between the support seat 1600 and the electrode connecting part 1300 along the axial direction of the support tube 1100, and is also beneficial to ensure the service life of the electrode connecting part 1300.

[0102] The limiting component 1700 may be fixedly disposed on the support tube 1100 , that is, the axial installation position of the limiting component 1700 on the support tube 1100 cannot be adjusted.

[0103] Alternatively, in the embodiment of the present invention, the limiting component 1700 may also be configured to be able to adjust the installation position in the axial direction of the support tube 1100. In this way, the installation position of the limiting component 1700 can be flexibly adjusted according to specific needs, which can better meet the use and disassembly requirements of the support seat 1600, and can also adapt to the installation of the support seat 1600 with different axial sizes, and the distance between the limiting component 1700 and the support seat 1600 can be conveniently adjusted. For example, when the support seat 1600 needs to be disassembled, the spacing between the limiting components 1700 on both sides of the support seat 1600 can be increased to reduce the possibility of interference caused by the limiting components 1700 to the disassembly of the support seat 1600, thereby improving the convenience of disassembly of the support seat 1600; and when the support seat 1600 needs to be fixed, the spacing between the limiting components 1700 on both sides of the support seat 1600 can be reduced to fully exert the limiting function of the limiting component 1700.

[0104] The support assembly 1000 provided in the embodiment of the present invention may further include a tension adjustment component 1800, and the limiting component 1700 may be specifically installed on the support tube 1100 through the tension adjustment component 1800. The tension adjustment component 1800 has a loose state and a tight state. In the loose state, the tension adjustment component 1800 does not fix the limiting component 1700, and the axial installation position of the limiting component 1700 on the support tube 1100 is adjustable. In the tight state, the tension adjustment component 1800 can tighten the limiting component 1700 to fix the limiting component 1700 to the support tube 1100.

[0105] Combination Figure 4 The tension adjustment component 1800 may be a clamp, including a hoop 1810 and a fastener (not shown). The limiting component 1700 may be provided with a limiting groove 1710, and the hoop 1810 may be partially clamped in the limiting groove 1710. The fastener may be, for example, a bolt or a screw, which may tighten or loosen the hoop, so that the tension adjustment component 1800 may be switched between a loose state and a tight state.

[0106] In addition to the clamp, the tension adjustment component 1800 may also be an elastic band or other components capable of adjusting the tightness, which is not explicitly limited here.

[0107] It should be understood that the above-mentioned scheme of setting the tension adjustment component 1800 to adjust the axial installation position of the limiting component 1700 is only an exemplary description of the embodiment of the present invention, and cannot be used as a limitation on the implementation scope of the support assembly 1000 provided by the present invention. Under the condition of satisfying the function, other implementation methods can also be used to adjust the axial installation position of the limiting component 1700. For example, a plurality of mounting holes distributed along the axial direction can be set on the support tube 1100, and the limiting component 1700 can be installed in different mounting holes, so as to achieve the position adjustment of the limiting component 1700. For another example, the limiting component 1700 can also be equipped with a displacement adjustment component in the form of a screw rod, so as to achieve the driving displacement of the limiting component 1700 along the support tube 1100 through the displacement adjustment component.

[0108] Combination Figure 5 Among the limiting components 1700 on both sides of the support seat 1600, there may be a gap P between at least one limiting component 1700 and the support seat 1600, that is, the limiting component 1700 and the support seat 1600 may not be in close contact.

[0109] Such a configuration can, on the one hand, reduce the force exerted by the limiting component 1700 on the support seat 1600, and can reduce the damage to the support seat 1600 caused by the limiting component 1700, which is beneficial to ensuring the service life of the support seat 1600; especially when the support seat 1600 is made of relatively brittle materials such as ceramics, the possibility of damage to the support seat 1600 caused by axial squeezing by the limiting component 1700 can be greatly reduced. On the other hand, during the disassembly and assembly process of the carrier 4000, when the carrier 4000 and the support seat 1600 first come into contact or separate, the carrier 4000 may generate a driving force on the support seat 1600 along the axial direction of the support tube 1100. At this time, the existence of the above-mentioned gap P can well buffer and absorb this part of the driving force, and can avoid the rigid impact of the support seat 1600 and the limiting component 1700 caused by the driving force to a large extent, which is of positive significance for protecting the limiting component 1700 and the support seat 1600. It should be understood that the buffering and absorption effect of this force is also effective for the vibration during the use of the equipment.

[0110] In addition, the presence of the gap P makes the limiting component 1700 limit the support seat 1600 in a "soft" manner, which can facilitate the installation and removal of the support seat 1600 on the support tube 1100, making it easier to replace the support seat 1600. At the same time, it can also adapt to the processing error of the support seat 1600, which is conducive to ensuring the smooth installation of the support seat 1600.

[0111] It should be understood that the installation method of the support base 1600 on the support tube 1100 is not limited to the above-mentioned limited assembly by the limiting component 1700, and it can also be installed in other ways as long as it can meet the installation requirements. For example, the support base 1600 can also be connected to the support tube 1100 by a detachable connection method such as screw connection and clamping, which can also achieve the technical effect of facilitating the replacement of the support base 1600.

[0112] In some optional implementations, the cross-section of the outer wall of the support tube 1100 may be non-circular, such as elliptical, rectangular, hexagonal, etc. In this way, after the support tube 1100 is installed, it is not easy to rotate around its axis, which is conducive to ensuring that the orientation of the electrode connecting part 1300 installed on the support tube 1100 remains unchanged, thereby improving the connection reliability and stability between the electrode connecting part 1300 and the carrier 4000.

[0113] In the embodiment of the present invention, at least a partial area of ​​the outer wall surface of the support tube 1100 may be a plane portion 1120, and the axial port of the plug hole 1110 located on the outer wall surface of the support tube 1100 may be arranged on the plane portion 1120, so that drilling can be convenient. In addition, when the second insulating component 1500 is installed, the wing plate portion 1520 may specifically be in contact with the plane portion 1120, and there may be a relatively large contact surface between the wing plate portion 1520 and the plane portion 1120, which can improve the connection reliability and stability of the second insulating component 1500; and when the wing plate portion 1520 transmits force to the support tube 1100, the stress concentration phenomenon can also be alleviated to a large extent, which can reduce the possibility of damage to the second insulating component 1500 and the support tube 1100.

[0114] Combination Figure 2 and Figure 3 In a specific solution of the embodiment of the present invention, the support tube 1100 may be a square tube. The square tube is an existing pipe fitting, which is easy to obtain and can also conveniently form the above-mentioned plane portion 1120.

[0115] In the embodiment of the present invention, the support assembly 1000 can be installed on the reactor 2000 through the connecting flange 2300. Figure 2 and Figure 3As shown, the number of the connecting flanges 2300 can be two, the two connecting flanges 2300 can be arranged at intervals, the two connecting flanges 2300 can be provided with a supporting seat 2310, and the support assembly 1000 can specifically be a supporting seat 2310 installed on the two connecting flanges 2300. It should be understood that the installation and fixing method of the support assembly 1000 is not limited to the above-mentioned connecting flanges 2300 and the supporting seat 2310. In practical applications, those skilled in the art can also use other installation structures to achieve the installation of the support assembly 1000, as long as it can meet the requirements of use; for example, the support assembly 1000 can also be installed by setting up a mounting bracket in the reaction chamber 2000A.

[0116] After installation, the electrode connection part 1300 of the support assembly 1000 may extend upward from the support tube 1100. In this way, the electrical connection between the carrier 4000 and the electrode connection part 1300 may be made with the help of the gravity of the carrier 4000 and components such as the substrate disposed thereon, and the connection reliability between the carrier 4000 and the electrode connection part 1300 may be high.

[0117] Of course, the electrode connection part 1300 can also be arranged in other directions, which is not clearly limited here, as long as it can meet the use requirements. In addition, when arranged in other directions, the force on the electrode connection part 1300 can be relatively small, which has a positive significance for reducing damage to the electrode connection part 1300 and ensuring the service life of the electrode connection part 1300.

[0118] In a reactor 2000, the number of support assemblies 1000 can be two, and the two electrode rods 1200 in the two support assemblies 1000 can be connected to the positive electrode and the negative electrode of the RF power supply 3000 respectively, so that the electrode connecting parts 1300 respectively connected to the two electrode rods 1200 are the positive electrode part 1300A and the negative electrode part 1300B. The positive electrode part 1300A and the negative electrode part 1300B connected to the same carrier 4000 can be staggered in the axial direction of the support tube 1100, so that the distance between the positive electrode part 1300A and the negative electrode part 1300B can be increased, which can reduce the risk of short circuit.

[0119] Please continue to refer to Figure 1 The reactor 2000 may include a front furnace opening 2100 and a rear furnace opening 2200, and the two connecting flanges 2300 may be respectively arranged near the front furnace opening 2100 and the rear furnace opening 2200.

[0120] During installation, one end of the electrode rod 1200 can be inserted into the support tube 1100, which is the fixed end of the electrode rod 1200, and the other end of the electrode rod 1200 can be extended out of the support tube 1100, which is the free end, and the free end is used to connect to the RF power supply 3000. Figure 1 As shown, the free end of the electrode rod 1200 can be extended from the rear furnace opening 2200; this is because compared with the rear furnace opening 2200, the front furnace opening 2100 needs to be equipped with components such as a furnace door, and the space is relatively limited, while the space of the rear furnace opening 2200 is relatively abundant, which can facilitate the connection between the electrode rod 1200 and the RF power supply 3000, and at the same time, it can also better release the deformation of the electrode rod 1200 caused by thermal expansion.

[0121] Of course, the embodiment of the present invention does not exclude the solution that the free end of the electrode rod 1200 extends from the front furnace opening 2100 , which can also achieve electrical connection between the electrode rod 1200 and the RF power supply 3000 .

[0122] The above are only preferred embodiments of the present invention. It should be pointed out that, for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

Claims

1. A support assembly, used in a deposition film forming device or a plasma enhanced process device, characterized in that: It comprises a support tube, an electrode rod and an electrode connecting part, wherein at least part of the electrode rod is plugged and assembled inside the support tube, a plug hole is provided on the tube wall of the support tube, the electrode connecting part is plugged and assembled in the plug hole, and the electrode connecting part is connected to the electrode rod.

2. The support assembly according to claim 1, characterized in that: The support assembly further includes a first insulating component and a second insulating component, wherein the first insulating component is used for insulating the electrode rod and the support tube, and the second insulating component is used for insulating the electrode connecting portion and the support tube.

3. The support assembly according to claim 2, characterized in that: The first insulating component comprises an insulating connector, wherein the insulating connector is provided with a first plug-in portion and a second plug-in portion which are in communication with each other, an axial end portion of the electrode rod is plugged into the first plug-in portion, and the electrode connecting portion is plugged into the second plug-in portion.

4. The support assembly according to claim 3, characterized in that: The first plug-in portion is a through hole extending along the axial direction of the electrode rod, including a first hole segment and a second hole segment, the cross-sectional area of ​​the first hole segment is larger than that of the second hole segment, and the insulating connector forms a first step surface between the first hole segment and the second hole segment; The electrode rod comprises a rod body and an end portion, wherein the rod body is inserted into the second hole section and extends into the first hole section, the end portion is connected to the rod body, and the end portion is configured to be able to abut against the first step surface.

5. The support assembly according to claim 4, characterized in that: The second plug-in portion is communicated with the first hole section, and the electrode connecting portion is connected with the end portion.

6. The support assembly according to claim 4, characterized in that: The first plug-in portion further includes a third hole segment, the third hole segment is located on a side of the second hole segment away from the first hole segment, the cross-sectional area of ​​the third hole segment is also larger than the second hole segment, and the insulating connector forms a second step surface between the second hole segment and the third hole segment; The first insulating component also includes a first insulating tube. The first insulating tube is assembled on the rod body. The first insulating tube is inserted into the third hole section and abuts against the second step surface.

7. The support assembly according to claim 6, characterized in that: The first plug-in portion also includes a fourth hole segment, which is located on the side of the third hole segment away from the second hole segment, and the fourth hole segment is gradually expanded in a direction away from the third hole segment. The fourth hole segment includes a small neck end and a large neck end, and the small neck end is connected to the third hole segment.

8. The support assembly according to claim 3, characterized in that: The first insulating component further includes an insulating tube, the insulating tube is sleeved between the electrode rod and the support tube, and the insulating tube is in contact with the insulating connector; There is one insulating tube; or, there are multiple insulating tubes, and the insulating tubes are sleeved in sequence.

9. The support assembly according to claim 3, characterized in that: The second plug-in portion is a stepped hole, including a thick neck hole section and a thin neck hole section. The thick neck hole section is connected to the first plug-in portion through the thin neck hole section. The insulating connector forms a third stepped surface between the thick neck hole section and the thin neck hole section, and part of the second insulating component extends into the thick neck hole section.

10. The support assembly according to claim 2, characterized in that: The electrode connecting part includes a head part and a rod part connected to each other, and the second insulating component includes a sleeve part and a wing plate part, wherein the wing plate part is located on the outer wall surface of the sleeve part, and the wing plate part is located at one axial end of the sleeve part; The sleeve portion is inserted into the insertion hole, the wing portion is located outside the support tube, and the wing portion and the outer wall surface of the support tube are in contact with each other, the rod portion is inserted into the sleeve portion, and the head portion and the wing portion are in contact with each other.

11. The support assembly according to any one of claims 1 to 10, characterized in that: It also includes a support seat, which is installed on the outer wall of the support tube and is used to support the carrier of the deposition film forming equipment or the plasma enhanced process equipment.

12. The support assembly according to claim 11, characterized in that: The support seat is provided with an avoidance hole, and a part of the electrode connecting part is located in the avoidance hole.

13. The support assembly according to claim 12, characterized in that: The support seat includes a seat plate portion and two side plate portions, the two side plate portions are connected to the seat plate portion, the seat plate portion and the two side plate portions can fit with the outer wall surface of the support tube, and the seat plate portion is provided with the avoidance hole.

14. The support assembly according to claim 11, characterized in that: It also includes a limiting component, which is installed on the support tube. In the axial direction of the support tube, the limiting components are arranged on both sides of the support seat.

15. The support assembly according to claim 14, characterized in that: The limiting component is configured to be able to adjust the installation position in the axial direction of the support tube.

16. The support assembly according to claim 15, characterized in that: It also includes a tension adjustment component, through which the limiting component is installed on the support tube, and the tension adjustment component has a loose state and a tight state; In the loose state, the axial installation position of the limiting component on the support tube is adjustable; in the tight state, the limiting component is fixed to the support tube.

17. The support assembly according to claim 14, characterized in that: Among the limiting components on both sides of the support seat, there is a gap between at least one of the limiting components and the support seat.

18. The support assembly according to any one of claims 1 to 10, characterized in that: The cross section of the outer wall surface of the support tube is non-circular.

19. The support assembly according to claim 18, characterized in that: At least a partial area of ​​the outer wall surface of the support tube is a plane portion, and the axial end of the insertion hole on the outer wall surface of the support tube is located in the plane portion.

20. The support assembly according to claim 19, characterized in that: The supporting tube is a square tube.

21. A deposition film forming device, characterized in that: It comprises a reactor, a support assembly and a radio frequency power supply, wherein the support assembly is installed in the reactor, the support assembly is the support assembly according to any one of claims 1 to 20, and the electrode rod of the support assembly is electrically connected to the radio frequency power supply.

22. The deposition film forming device according to claim 21, characterized in that: The reactor has a front furnace opening and a rear furnace opening, and the electrode rod extends from the rear furnace opening.

23. The deposition film forming device according to claim 21 or 22, characterized in that: There are two support assemblies, the electrode rods of the two support assemblies are respectively connected to the positive electrode and the negative electrode of the radio frequency power supply, and the electrode connecting parts of the two support assemblies are respectively the positive electrode connecting part and the negative electrode connecting part; The positive electrode connection part and the negative electrode connection part connected to the same carrier are staggered in the axial direction of the support assembly.

24. A plasma enhanced process equipment, characterized in that: It comprises a reactor, a support assembly and a radio frequency power supply, wherein the support assembly is installed in the reactor, the support assembly is the support assembly according to any one of claims 1 to 20, and the electrode rod of the support assembly is electrically connected to the radio frequency power supply.

25. The plasma enhanced process equipment according to claim 24, characterized in that: The reactor has a front furnace opening and a rear furnace opening, and the electrode rod extends from the rear furnace opening.

26. The plasma enhanced process equipment according to claim 24 or 25, characterized in that: There are two support assemblies, the electrode rods of the two support assemblies are respectively connected to the positive electrode and the negative electrode of the radio frequency power supply, and the electrode connecting parts of the two support assemblies are respectively the positive electrode connecting part and the negative electrode connecting part; The positive electrode connection part and the negative electrode connection part connected to the same carrier are staggered in the axial direction of the support assembly.

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