Method for removing a film layer of a waterproof film layer

Abstract

A film layer preparation method for removing a waterproof film layer comprises the following steps: S1, placing a previous product, which needs to remove the waterproof film layer on the outer surface of the film system on a substrate, and a previously coated accompanying coating piece as a lens into a tool clamp; S2, hanging into a cavity of a vacuum coating machine, and setting the temperature of the cavity to 50-70 DEG C; S3, vacuumizing, and bombarding by an ion source, wherein the bombarding process comprises the following sub-steps: S31, bombarding by the ion source with large energy and large flow at the set temperature of the cavity; S32, then, reducing the temperature of the cavity by 5-10 DEG C and keeping constant temperature at the reduced temperature; S33, after keeping constant, bombarding by the ion source with small energy and small flow at the reduced temperature of the cavity; S4, taking out the lens; S5, dropping water on the surface of the side of the lens, where the waterproof film layer is removed, and the water hanging on the surface of the lens indicates that the waterproof film layer is removed completely; S6, cleaning the lens, where the waterproof film layer is removed, which passes the detection in step S5; and S7, re-coating the cleaned lens with a waterproof film layer.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the field of optical coating, and more particularly to a film layer preparation method for removing a waterproof film layer. BACKGROUND

[0002] In the field of optical coating, after a lens surface is coated with a plurality of layers of anti-reflective film (i.e. anti-reflection film), the lens is particularly prone to stains, which can destroy the anti-reflective effect of the anti-reflective film. Under a microscope, it can be found that the anti-reflective film layer has a porous structure, so that oil stains can easily infiltrate into the anti-reflective film layer. The solution is to coat a top film with oil and water resistance on the anti-reflective film layer, which is commonly known as a waterproof film layer. Moreover, this film layer must be very thin so as not to change the optical properties of the anti-reflective film.

[0003] In infrared coating, after the accompanying pieces and product lenses are coated with anti-reflection film, the lenses are removed and coated with a waterproof film layer using a special machine. Sometimes, the product lenses have marks or dust points coated in the waterproof film layer, which cannot be removed. In order to reduce costs and improve efficiency, it is necessary to remove the waterproof film layer and then re-coat the waterproof film layer. SUMMARY

[0004] In view of the problems in the background art, an object of the present disclosure is to provide a film layer preparation method for removing a waterproof film layer, which can enable the previous product with a waterproof film layer to be removed to be re-coated with a waterproof film layer, so that the product re-coated with a waterproof film layer can meet the requirements, thereby reducing costs and improving efficiency.

[0005] Another object of the present disclosure is to provide a film layer preparation method for removing a waterproof film layer, which can improve the efficiency of removing the waterproof film layer and ensure the accuracy of removing the waterproof film layer.

[0006] Thus, a film layer preparation method for removing a waterproof film layer includes the steps of: S1, placing previous products that need to remove the waterproof film layer on the outside of the film system on the substrate together with accompanying pieces coated previously as lenses into a tool clamp; S2, hanging the tool clamp with the lenses into a vacuum coating machine cavity, and setting the temperature of the cavity to 50-70°C; S3, starting vacuum pumping of the vacuum coating machine, and when the vacuum degree reaches 3x10 -3Pa, the ion source of the vacuum coating machine is opened to perform bombardment, and the bombardment process comprises the following sub-steps: S31, at a set temperature of the cavity, the ion source is bombarded at a large energy and a large flow rate to remove a part of the waterproof film layer; S32, after the ion source is bombarded at a large energy and a large flow rate, the temperature of the cavity is reduced by 5-10℃ and is kept constant at the reduced temperature; S33, after the constant temperature standing, the ion source is bombarded at a small energy and a small flow rate at the reduced temperature of the cavity to remove the remaining part of the waterproof film layer; S4, after the ion source bombardment is completed, the door is opened to take out the lens; S5, the removed lens is inspected, and water is dropped on the surface of the side of the lens from which the waterproof film layer is removed, and the water is hung on the surface of the lens to indicate that the waterproof film layer is removed completely; S6, the lens with the removed waterproof film layer that passes the detection of step S5 is cleaned; and S7, the cleaned lens is re-coated with the waterproof film layer.

[0007] The beneficial effects of the present disclosure are as follows.

[0008] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, the waterproof film layer can be removed by ion source bombardment, so that the lens with the completely removed waterproof film layer is re-coated with the waterproof film layer, thereby enabling the previously removed waterproof film layer product to be re-coated with the waterproof film layer, and further enabling the re-coated product to meet the requirements, thus reducing the cost and improving the efficiency.

[0009] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, in the ion source bombardment process, the large energy and large flow rate bombardment is followed by the small energy and small flow rate bombardment, which can improve the efficiency of removing the waterproof film layer and ensure the accuracy of removing the waterproof film layer.

[0010] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, in the ion source bombardment process, the large energy and large flow rate bombardment is followed by the small energy and small flow rate bombardment, which can improve the efficiency of removing the waterproof film layer and ensure the accuracy of removing the waterproof film layer.

[0011] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, in addition to the visual inspection of whether the re-coated product has the background technology-like marks or dust points, the previously coated accompanying coating piece is also placed in the fixture as the lens, and the transmittance of the re-coated product can be detected to determine whether the transmittance meets the requirements. BRIEF DESCRIPTION OF DRAWINGS

[0012] Figure 1 is a structural schematic view of the lens with the film layer in step S1 of Example 1.

[0013] Figure 2 This is the transmittance curve in the 8-12μm infrared band during step S1 of Example 1.

[0014] Figure 3 This is the transmittance curve of the 8-12μm infrared band after step S7 of Example 1 is completed.

[0015] Figure 4 This is the transmittance curve of Comparative Example 1 in the 8-12μm infrared band after the waterproof membrane layer was recoated.

[0016] Figure 5 This is the transmittance curve of Comparative Example 2 in the 8-12μm infrared band after the waterproof membrane layer was recoated. Detailed Implementation

[0017] It will be understood that the disclosed embodiments are merely examples of this disclosure, which can be implemented in various forms. Therefore, the specific details disclosed herein should not be construed as limiting, but are intended only as the basis for the claims and as an illustrative basis to teach those skilled in the art how to implement this disclosure in various ways.

[0018] [Method for preparing a waterproof membrane layer]

[0019] The method for preparing a waterproof membrane according to this disclosure includes the following steps:

[0020] S1, the previous product, along with the previously coated sheet, is placed into the tooling fixture as a lens, along with the waterproof membrane layer on the surface of the film system on the substrate that needs to be removed.

[0021] S2, hang the tooling fixture with the lens installed into the vacuum coating machine cavity, and set the temperature of the cavity to 50-70℃;

[0022] S3, the vacuum coating machine starts drawing a vacuum, reaching a vacuum level of 3×10⁻⁶. -3 At Pa, the ion source of the vacuum coating machine is turned on for bombardment. The bombardment process includes the following sub-steps:

[0023] S31, at the set temperature within the cavity, the ion source bombards with high energy and high flow rate to remove the protective layer.

[0024] Part of the water film layer;

[0025] After high-energy, high-flow-rate bombardment by the S32 ion source, the temperature of the cavity is reduced by 5-10°C and...

[0026] Keep at a constant temperature under reduced temperature;

[0027] S33, after settling, at a reduced cavity temperature, the ion source operates with low energy and low flow rate.

[0028] bombardment to remove the remaining part of the waterproof film layer;

[0029] S4, after the ion source bombardment is completed, the door is opened to take out the lens;

[0030] S5, the removed lens is inspected, and water is dropped on the surface of the side of the lens where the waterproof film layer is removed, and the water is hung on the surface of the lens, which indicates that the waterproof film layer is removed clean;

[0031] S6, the lens with the removed waterproof film layer that passes the detection of step S5 is cleaned;

[0032] S7, the cleaned lens is re-coated with a waterproof film layer.

[0033] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, the waterproof film layer can be removed by ion source bombardment, so that the lens with the removed waterproof film layer is re-coated with a waterproof film layer, thereby enabling the previously removed waterproof film layer product to be re-coated with a waterproof film layer, and further enabling the re-coated waterproof film layer product to meet the requirements, thus reducing the cost and improving the efficiency.

[0034] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, during the ion source bombardment, the large energy and large flow bombardment is followed by the small energy and small flow bombardment, which can improve the efficiency of removing the waterproof film layer and ensure the accuracy of removing the waterproof film layer.

[0035] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, during the ion source bombardment, the large energy and large flow bombardment is followed by the small energy and small flow bombardment, which can improve the efficiency of removing the waterproof film layer and ensure the accuracy of removing the waterproof film layer.

[0036] In the film layer preparation method for removing the waterproof film layer according to the present disclosure, in addition to being able to visually inspect whether the re-coated waterproof film layer product has background technology marks or dust points, the previously coated accompanying film is also placed in the lens fixture as a lens, and the transmittance of the re-coated waterproof film layer product can be detected to detect whether the transmittance meets the requirements.

[0037] In an example, in step S1, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is 80 nm. For example, the SH-HT material is commercially available from Dueng Optics (Changshu) Co., Ltd.

[0038] The temperature setting of the vacuum coating machine in step S2 helps to remove the water-repellent film layer from the lens and reduce the stress formed when the water-repellent film layer is removed by heating the lens through the cavity of the coating machine. For example, the vacuum coating machine is a vacuum coating machine with a neutralizer Hall ion source manufactured and sold by Chengdu Xiwoker Vacuum Technology Co., Ltd., and the neutralizer Hall ion source is commercially available from Borton Laser Technology Co., Ltd.

[0039] In step S3, the ion source is, for example, a Hall ion source.

[0040] In an example, in sub-step S31, the parameters of the ion source large-energy large-flow bombardment are: an anode voltage of 220 V, an anode current of 1.5 A, a neutralization current of 1.5 A, a neutralization gas flow of 10 sccm, an argon gas flow ratio of 100%, and a bombardment time of 2-3 min. For example, in sub-step S31, the part of the water-repellent film layer to be removed is more than half of the film thickness of the water-repellent film layer.

[0041] In an example, in sub-step S32, the cooling rate is 0.5-1 ℃ / min, and the standing time is 10-15 min.

[0042] In an example, in sub-step S33, the parameters of the ion source small-energy small-flow bombardment are: an anode voltage of 110 V, an anode current of 1 A, a neutralization current of 0.5 A, a neutralization gas flow of 6 sccm, an argon gas flow ratio of 100%, and a bombardment time of 3-5 min.

[0043] In an example, in step S6, the cleaning uses pure water ultrasonic cleaning, followed by air drying.

[0044] In an example, in step S7, the film thickness monitoring of the newly plated water-repellent film layer is performed using the crystal oscillator method with the corresponding crystal oscillator piece of the plurality of crystal oscillator pieces of the crystal controller, the crystal controller controls the corresponding operation of the new crystal oscillator piece in the plurality of crystal oscillator pieces, and the crystal oscillator frequency is not less than 5.99 MHz.

[0045] In an example, in step S7, the lens is plated with a water-repellent film layer without using an ion source assisted evaporation, the temperature setting of the cavity is 130 ℃, the vacuum degree reaches and maintains 1.5×10 -3 Pa, the evaporation uses resistance heating evaporation, the water-repellent film layer is SH-HT material, and the film thickness of the water-repellent film layer is controlled to be 80 nm. That is, the process parameters of the lens for plating the water-repellent film layer are the same as those of the previous plating in step S1.

[0046] In step S1, the previous product together with the previously plated accompanying plating piece in the previous plating process is not limited. In an example, in step S1, the previous product together with the previously plated accompanying plating piece in the previous plating process is:

[0047] Sa, the surface of the chalcogenide glass substrate as the lens and the product is cleaned by ultrasonic alcohol, the chalcogenide glass substrate is VIG04 substrate, and the thickness of the chalcogenide glass substrate is 1.0mm;

[0048] Sb, the lens is placed in a tool clamp, the tool clamp is hung in the cavity of the vacuum coating machine, the temperature of the cavity is set to 130℃, the vacuum coating machine is a vacuum coating machine with a neutralizer Hall ion source manufactured and sold by Chengdu Xiwoker Vacuum Technology Co., Ltd., and the Hall ion source with a neutralizer is purchased from Boton Optoelectronics Technology Co., Ltd.;

[0049] Sc, the vacuum coating machine starts to pump, the vacuum degree reaches 1.5×10 -3 Pa, the auxiliary coating ion source of the vacuum coating machine is opened for cleaning, the cleaning time is 6min, the anode voltage of the ion source is 220V, the anode current is 1.2A, the neutralizing current is 1.5A, and argon is used as the working gas;

[0050] Sd, the vacuum degree is maintained, and each film layer is coated on the first surface of the lens according to 20nm Ge / 278nm ZnS / 140nm Ge / 695nm ZnS / 1053nm YbF3 / 148nm ZnS (i.e. forming a antireflection film layer / film system), the number before nm represents the film thickness, Ge is evaporated by electron beam heating, the deposition rate of Ge film layer is 0.4nm / s, the deposition rate of ZnS film layer is 0.6nm / s, the deposition rate of YbF3 film layer is 0.6nm / s, and each film layer is deposited by ion source assisted deposition,

[0051] the ion source is a Hall ion source,

[0052] when coating the ZnS film layer, the ion source parameters are: neutralizing current is 0.5A, neutralizing flow is 8sccm, anode voltage is 120V, anode current is 1.2A, and argon flow ratio is 100%;

[0053] when coating the Ge film layer, the ion source parameters are: neutralizing current is 0.5A, neutralizing flow is 7sccm, anode voltage is 120V, anode current is 1A, and argon flow ratio is 100%;

[0054] when coating the YbF3 film layer, the ion source parameters are: neutralizing current is 0.5A, neutralizing flow is 10sccm, anode voltage is 110V, anode current is 1.2A, argon flow ratio is 30%, and oxygen flow ratio is 70%;

[0055] crystal oscillator method is used to monitor the film thickness by using the corresponding crystal oscillator pieces of the multiple crystal oscillator pieces of the crystal controller, the new crystal oscillator piece in the multiple crystal oscillator pieces is controlled to work by the crystal controller after the ion source is cleaned, the crystal

[0056] The frequency is 5.99 MHz;

[0057] Se, after the first surface of the lens is coated with the film system, the cavity is naturally cooled to 80℃, and the jig is taken out together with the lens;

[0058] Sf, in another vacuum coating machine, a waterproof film layer is evaporated, without using an ion source for auxiliary evaporation, the other vacuum coating machine is the same type as the vacuum coating machine in steps Sa to Se, the temperature of the cavity is set to 130℃, the vacuum degree reaches and maintains 1.5×10 -3 Pa, resistance heating evaporation is used for evaporation, the waterproof film layer is SH-HT material, the film thickness of the waterproof film layer is controlled to 80nm,

[0059] The crystal oscillator method is used to monitor the film thickness by using the corresponding crystal oscillator piece of the multiple crystal oscillator pieces of the crystal controller, the crystal controller controls the corresponding operation of the new crystal oscillator piece in the multiple crystal oscillator pieces, and the crystal oscillator frequency is

[0060] 5.99 MHz;

[0061] The cavity is naturally cooled to 80℃, and the jig is taken out together with the lens;

[0062] Sg, repeating steps Sa to Sf, coating the same film layer on the opposite second surface of the lens.

[0063] [TEST]

[0064] Example 1

[0065] The film layer preparation method for removing the waterproof film layer of Example 1 adopts the following steps:

[0066] S1, the previous product containing dust points on the outer waterproof film layer in the film system on the substrate to be removed (only one side of the waterproof film layer is checked for dust points) is placed in the jig together with the previously coated accompanying coating piece as the lens,

[0067] In step S1, the previous product together with the previously coated accompanying coating piece is in the previous coating process (referring to Figure 1 ):

[0068] Sa, the surface of the accompanying coating piece and the product as the lens of the chalcogenide glass substrate is cleaned with ultrasonic alcohol, the chalcogenide glass substrate is VIG04 substrate, and the thickness of the accompanying coating piece is 1.0mm;

[0069] Sb, the lens after cleaning treatment is placed in the jig, and the jig with the lens is hung in the cavity of the vacuum coating machine, the temperature of the cavity is set to 130℃, the vacuum coating machine is a vacuum coating machine with a neutralizer Hall ion source manufactured and sold by Chengdu Xiwake Vacuum Technology Co., Ltd., and the Hall ion source with a neutralizer is commercially available from Boton Optoelectronics Technology Co., Ltd.;

[0070] Sc, the vacuum coating machine is started to be pumped down, and the vacuum degree reaches 1.5x10 -3 Pa, the auxiliary coating ion source of the vacuum coating machine is opened for cleaning, the cleaning time is 6 min, the anode voltage of the ion source is 220 V, the anode current is 1.2 A, the neutralization current is 1.5 A, and argon is used as the working gas;

[0071] Sd, the vacuum degree is maintained, and each film layer is coated on the first surface of the lens according to 20 nm Ge / 278 nm ZnS / 140 nm Ge / 695 nm ZnS / 1053 nm YbF3 / 148 nm ZnS (i.e., a multi-layer anti-reflection coating is formed), the number before nm represents the film thickness, Ge is evaporated by electron beam heating, the deposition rate of the Ge film layer is 0.4 nm / s, the deposition rate of the ZnS film layer is 0.6 nm / s, the deposition rate of the YbF3 film layer is 0.6 nm / s, and each film layer is deposited by using the ion source assisted deposition,

[0072] The ion source is a Hall ion source,

[0073] When the ZnS film layer is coated, the ion source parameters are as follows: the neutralization current is 0.5 A, the neutralization flow rate is 8 sccm, the anode voltage is 120 V, the anode current is 1.2 A, and the argon flow rate accounts for 100%;

[0074] When the Ge film layer is coated, the ion source parameters are as follows: the neutralization current is 0.5 A, the neutralization flow rate is 7 sccm, the anode voltage is 120 V, the anode current is 1 A, and the argon flow rate accounts for 100%;

[0075] When the YbF3 film layer is coated, the ion source parameters are as follows: the neutralization current is 0.5 A, the neutralization flow rate is 10 sccm, the anode voltage is 110 V, the anode current is 1.2 A, the argon flow rate accounts for 30%, and the oxygen flow rate accounts for 70%;

[0076] The crystal oscillator method is used to monitor the film thickness by using the corresponding crystal oscillator pieces of the crystal controller, the new crystal oscillator piece in the plurality of crystal oscillator pieces is controlled to work after the ion source is cleaned, and the crystal oscillator frequency is 5.99 MHz;

[0077] Se, after the film system is coated on the first surface of the lens, the cavity is naturally cooled to 80℃, and the tool clamp together with the lens is taken out;

[0078] Sf, in another vacuum coating machine, a waterproof film layer is evaporated, the ion source is not used for assisted evaporation, the another vacuum coating machine is of the same type as the vacuum coating machine in steps Sa-Se, the temperature of the cavity is set to 130℃, the vacuum degree reaches and maintains 1.5x10 -3Pa, the evaporation is resistance heating evaporation, the waterproof film layer is SH-HT material, the SH-HT material is commercially available from Du En Optics (Changshu) Co., Ltd., the film thickness of the waterproof film layer is controlled to be 80 nm,

[0079] The crystal oscillator method is used to monitor the film thickness by using the corresponding crystal oscillator piece of the plurality of crystal oscillator pieces of the crystal controller, the crystal controller controls the corresponding operation of the new crystal oscillator piece in the plurality of crystal oscillator pieces, and the crystal oscillator frequency is 5.99 MHz;

[0080] The cavity is naturally cooled to 80°C, and the jig is taken out together with the lens;

[0081] Sg, repeating steps Sa to Sf, coating the same film layer on the opposite second surface of the lens;

[0082] S2, hang the jig with the lens into the cavity of the vacuum coating machine, set the temperature of the cavity to 60°C, the vacuum coating machine is a vacuum coating machine with a neutralizer Hall ion source manufactured and sold by Chengdu Xiwoker Vacuum Technology Co., Ltd., and the neutralizer Hall ion source is commercially available from Boton Optoelectronics Technology Co., Ltd.;

[0083] S3, start vacuumizing the vacuum coating machine, and when the vacuum degree reaches 3×10 -3 Pa, open the ion source of the vacuum coating machine for bombardment, and the bombardment process adopts the following sub-steps:

[0084] S31, at the set temperature of the cavity, the ion source is bombarded with large energy and large flow to remove part of the waterproof film layer, wherein the parameters of the ion source bombarded with large energy and large flow are as follows: anode voltage 220V, anode current 1.5A, neutralizing current 1.5A, neutralizing gas flow 10sccm, argon gas flow ratio 100%, and bombardment time 2.5min;

[0085] S32, after the ion source is bombarded with large energy and large flow, reduce the temperature of the cavity by 10°C and keep it constant at the reduced temperature, wherein the cooling rate is 0.5°C / min, and the keeping time is

[0086] 15min;

[0087] S33, after keeping, at the reduced temperature of the cavity, the ion source is bombarded with small energy and small flow to remove the remaining part of the waterproof film layer, wherein the parameters of the ion source bombarded with small energy and small flow are as follows: anode voltage 110V, anode current 1A, neutralizing current 0.5A, neutralizing gas flow 6sccm, argon gas flow ratio 100%, and bombardment time 3min;

[0088]

[0089] S4, after the ion source bombardment is completed, open the door to take out the lens; ​

[0090] S5, the removed lens is inspected, a drop of water is placed on the surface of the lens (i.e. the product) on the side from which the water-repellent film layer has been removed, and the water clings to the surface of the lens, indicating that the water-repellent film layer has been removed cleanly;

[0091] S6, the lens (i.e. the product and the accompanying lens) whose water-repellent film layer has been removed and which passed the inspection in step S5 is cleaned, and after being cleaned using pure water ultrasonic cleaning, it is allowed to dry;

[0092] S7, the cleaned lens is re-coated with a water-repellent film layer, the vacuum coating machine used is the coating machine of step S2, the cleaned lens (i.e. the product and the accompanying lens) is placed in a jig, the jig with the lens is hung in the cavity of the vacuum coating machine, the lens is re-coated with a water-repellent film layer without using ion source assisted evaporation, the temperature of the cavity is set to 130°C, the vacuum degree reaches and maintains 1.5 x 10 -3 Pa, the evaporation is resistance heating evaporation, the water-repellent film layer is SH-HT material, the thickness of the water-repellent film layer is controlled to be 80 nm, the thickness of the re-coated water-repellent film layer is monitored using the crystal oscillator method using multiple crystal oscillator pieces of a crystal controller, the crystal controller controls the corresponding new crystal oscillator piece in the multiple crystal oscillator pieces to work, the crystal oscillator frequency is not less than 5.99 MHz, after the lens is re-coated with a water-repellent film layer, the cavity is naturally cooled to 80°C, and the jig with the lens is taken out.

[0093] Comparative Example 1

[0094] Except that the sub-step S32 of cooling and standing in step S3 is not performed, the rest is the same as Example 1 (i.e. after high energy and high flow bombardment in step S3, direct low energy and low flow bombardment).

[0095] Comparative Example 2

[0096] Except that the cooling in the sub-step S32 of step S3 is not performed, the rest is the same as Example 1 (i.e. after high energy and high flow bombardment in step S3, standing but not cooling, then low energy and low flow bombardment).

[0097] After visual inspection of the products in the lenses re-coated with a water-repellent film layer in Example 1 and Comparative Examples 1-2, none of them contained dust points.

[0098] Figure 2 is the transmittance curve of the previously coated accompanying lens (i.e. step Sg is completed) in Example 1 in the 8-12 μm infrared wave band, the average transmittance in the 8-12 μm infrared wave band is 96.8%.

[0099] Figure 3 is the transmittance curve of the accompanying lens together with the anti-reflection film layer and the re-coated water-repellent film layer after step S7 in Example 1 in the 8-12 μm infrared wave band, the average transmittance in the 8-12 μm infrared wave band is 96.6%, which is higher than Figure 1The average difference in 8-12 μm infrared band transmittance is 0.2%.

[0100] Figure 4 The transmittance curve of the plated sample of Comparative Example 1 with the antireflection coating and the re-plated water resistant coating in the 8-12 μm infrared band is shown in Figure 2. The average 8-12 μm infrared band transmittance is 96.2%, which is a difference of 0.6% from the average 8-12 μm infrared band transmittance of Figure 1

[0101] Figure 5 The transmittance curve of the plated sample of Comparative Example 2 with the antireflection coating and the re-plated water resistant coating in the 8-12 μm infrared band is shown in Figure 3. The average 8-12 μm infrared band transmittance is 96.4%, which is a difference of 0.4% from the average 8-12 μm infrared band transmittance of Figure 1

[0102] The foregoing detailed description has set forth various exemplary embodiments of the systems and techniques via the use of a number of particular embodiments. However, the description explicitly illustrates only the specific combinations of aspects disclosed. However, other combinations of these aspects are also possible and are intended to be implicitly disclosed. Thus, although the description sets forth various embodiments, it is not intended that the application be limited to the embodiments explicitly set forth. Therefore, unless otherwise specifically recited herein, no single feature is a requisite part of the various embodiments.​​

Claims

1. A method for preparing a film layer for removing a water repellent film layer, characterized by, The method comprises the steps of: S1, placing a previous product requiring removal of a waterproof film layer on the outer surface of a film system on a substrate and a previously coated film-coated piece as a lens into a tool clamp; S2, hanging the tool clamp with the lens into a vacuum coating machine cavity, and setting the temperature of the cavity to 50-70°C; S3, the vacuum coater starts to pump, and the vacuum degree reaches 3x10 -3 Pa, the ion source of the vacuum coater is opened to perform bombardment, and the bombardment process includes the following sub-steps: S31, bombarding with a large energy and large flow of an ion source at the set temperature of the cavity to remove a part of the waterproof film layer; S32, after bombarding with the ion source, reducing the temperature of the cavity by 5-10°C and maintaining a constant temperature at the reduced temperature; S33, after maintaining, bombarding with a small energy and small flow of the ion source at the reduced temperature of the cavity to remove the remaining part of the waterproof film layer; S4, after the ion source bombarding is completed, taking out the lens; S5, checking the removed lens, and placing a water drop on the surface of the side of the lens where the waterproof film layer is removed, and the water is hung on the surface of the lens to indicate that the waterproof film layer is removed clean; S6, cleaning the lens with the removed waterproof film layer that passes the detection of step S5; S7, re-coating the waterproof film layer on the cleaned lens; wherein, in sub-step S31, the parameters of the ion source bombarding with a large energy and a large flow are: an anode voltage of 220V, an anode current of 1.5A, a neutralization current of 1.5A, a neutralization gas flow of 10sccm, an argon gas flow ratio of 100%, and a bombarding time of 2-3min; in sub-step S33, the parameters of the ion source bombarding with a small energy and a small flow are: an anode voltage of 110V, an anode current of 1A, a neutralization current of 0.5A, a neutralization gas flow of 6sccm, an argon gas flow ratio of 100%, and a bombarding time of 3-5min.

2. The method according to claim 1, wherein, in step S1, the waterproof film layer is SH-HT material, and the film thickness of the waterproof film layer is 80nm.

3. The method according to claim 1, wherein, in step S3, the ion source is a Hall ion source.

4. The method according to claim 1, wherein, in sub-step S31, the part of the waterproof film layer removed is more than half of the film thickness of the waterproof film layer.

5. The method according to claim 3, wherein, in sub-step S32, the cooling rate is 0.5-1°C / min, and the maintaining time is 10-15min.

6. The method according to claim 1, wherein, in step S6, after the ultrasonic cleaning with pure water, the lens is dried.

7. The method according to claim 1, wherein, in step S7, the film thickness of the re-coated waterproof film layer is monitored by using a crystal oscillator method with a corresponding crystal oscillator piece of a crystal oscillator controller, the crystal oscillator controller controls a new crystal oscillator piece to work correspondingly, and the frequency of the crystal oscillator is not less than 5.99MHz. In step S7, the lens is re-coated with a water-repellent film layer without ion source assistance, the temperature of the cavity is set to 130°C, and the vacuum degree is reached and maintained at 1.5x10 -3 Pa, the water-repellent film layer is evaporated using resistance heating, the water-repellent film layer is SH-HT material, and the thickness of the water-repellent film layer is controlled to 80 nm.

8. The method according to claim 1, wherein, In step S1, the previous product is plated together with the previous plated chaser in the previous plating process: Sa, the surface of the chaser and the product as the lens are cleaned by ultrasonic alcohol, the chaser is VIG04 substrate, and the thickness of the chaser is 1.0mm; Sb, the lens is placed in the fixture, the fixture with the lens is hung in the cavity of the vacuum plating machine, the temperature of the cavity is set to 130°C, and the vacuum plating machine is a vacuum plating machine with a Hall ion source with a neutralizer; Sc, the vacuum coating machine is started to pump, the vacuum degree reaches 1.5x10 -3 Pa, the auxiliary coating ion source of the vacuum coating machine is opened to clean, the cleaning time is 6 min, the anode voltage of the ion source is 220 V, the anode current is 1.2 A, the neutralization current is 1.5 A, and argon is used as the working gas; Sd, maintain the above vacuum degree, and deposit each film layer on the first surface of the lens according to 20nm Ge / 278nm ZnS / 140nm Ge / 695nm ZnS / 1053nm YbF3 / 148nm ZnS, the number before nm represents the film thickness, Ge is evaporated by electron beam heating, the deposition rate of Ge film layer is 0.4nm / s, the deposition rate of ZnS film layer is 0.6nm / s, the deposition rate of YbF3 film layer is 0.6nm / s, and each film layer is deposited by ion source assisted deposition, The ion source is a Hall ion source, When plating ZnS film layer, the ion source parameters are: neutralizing current is 0.5A, neutralizing flow is 8sccm, anode voltage is 120V, anode current is 1.2A, and argon flow ratio is 100%; When plating Ge film layer, the ion source parameters are: neutralizing current is 0.5A, neutralizing flow is 7sccm, anode voltage is 120V, anode current is 1A, and argon flow ratio is 100%; When plating YbF3 film layer, the ion source parameters are: neutralizing current is 0.5A, neutralizing flow is 10sccm, anode voltage is 110V, anode current is 1.2A, and argon flow ratio is 30%, and oxygen flow ratio is 70%; The crystal oscillator method is used to monitor the film thickness by using the corresponding crystal oscillator pieces of the crystal oscillator, the new crystal oscillator pieces in the multiple crystal oscillator pieces are controlled to work by the crystal oscillator, and the crystal oscillator frequency is 5.99MHz; Se, after the film system is plated on the first surface of the lens, the cavity is naturally cooled to 80°C, and the fixture with the lens is taken out; Sf, in another vacuum coating machine, which is the same type as the vacuum coating machine in steps Sa to Se, a water-proof film layer is evaporated without using ion source assisted evaporation, the temperature of the cavity is set to 130°C, the vacuum degree reaches and maintains 1.5 x 10 -3 Pa, evaporate a water-proof film layer by resistance heating evaporation, the water-proof film layer is SH-HT material, control the film thickness of the water-proof film layer to be 80 nm, The crystal oscillator method is used to monitor the film thickness by using the corresponding crystal oscillator pieces of the crystal oscillator, the new crystal oscillator pieces in the multiple crystal oscillator pieces are controlled to work by the crystal oscillator, and the crystal oscillator frequency is 5.99MHz; The cavity is naturally cooled to 80°C, and the fixture with the lens is taken out; Sg, repeat steps Sa to step Sf, and plate the same film layer on the second surface opposite to the lens.

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