Wafer container wash port assembly

Abstract

A purge port assembly for a wafer container includes a purge module configured to allow inlet flow of purge gas and a transition portion disposed on an intermediate outlet of the purge module. The transition portion includes a receiver configured to receive the purge gas emitted from the purge module, an outlet connector configured to attach with a diffuser, and an intermediate conduit. The intermediate conduit connects the receiver to the outlet connector and extends from the receiver at an acute angle relative to an axis of the inlet opening of the receiver. The intermediate conduit has a length that spaces the outlet connector from the receiver. The wafer container includes a housing and a wash port assembly. The shell includes an interior space. The wash port assembly extends through an opening in the housing into the interior space.

Description

Technical Field

[0001] The present disclosure relates to a cleaning port in a wafer container. More specifically, the present disclosure relates to a cleaning port assembly in a front-opening wafer transport box. Background Art

[0002] Semiconductor devices can be manufactured from wafer substrates. Wafer substrates (or simply substrates) undergo a series of manufacturing steps. For example, the manufacturing steps may include, but are not limited to, material layer deposition, doping, etching, or chemically or physically reacting the materials of the substrate. One or more wafers may be stored and transported in a wafer container such as a front opening unified pod ("FOUP") before, during, or after manufacturing. In some manufacturing steps, the wafers may be processed while still in the wafer container. The wafer container may include one or more cleaning ports for supplying cleaning gas into the interior of the wafer container. For example, the cleaning gas may be a gas that is supplied when the FOUP is open to maintain a positive pressure (e.g., a pressure higher than the external environment, higher than atmospheric pressure) inside the FOUP. Summary of the invention

[0003] In an embodiment, a cleaning port assembly is for a wafer container. The cleaning port assembly includes a cleaning module and a transition portion disposed on a middle outlet of the cleaning module. The cleaning module is configured to allow an inlet flow of a cleaning gas. The transition portion is disposed on a middle outlet of the cleaning module. The transition portion includes a receiver, an outlet connector, and an intermediate conduit. The receiver has an inlet opening configured to receive the cleaning gas emitted from the cleaning module. The outlet connector is configured to be attached to a diffuser. The intermediate conduit connects the receiver to the outlet connector. The intermediate conduit extends from the receiver at an acute angle relative to an axis of the inlet opening of the receiver. The intermediate conduit has a length that separates the outlet connector from the receiver.

[0004] In an embodiment, a wafer container includes a shell and a cleaning port assembly. The shell includes an interior space. The cleaning port assembly extends through an opening in the shell into the interior space. The cleaning port assembly includes a cleaning module and a transition portion. The module disposed in the opening in the shell is configured to allow an inlet flow of a cleaning gas. The transition portion includes a receiver, an outlet connector, and an intermediate conduit. The receiver has an inlet opening configured to receive the cleaning gas emitted from the cleaning module. The outlet connector is configured to be attached to a diffuser. The intermediate conduit connects the receiver to the outlet connector. The intermediate conduit extends from the receiver at an acute angle relative to an axis of the inlet opening of the receiver. The intermediate conduit has a length that separates the outlet connector from the receiver.

[0005] In an embodiment, a cleaning port assembly of a wafer container includes a cleaning module configured to allow an inlet flow of a cleaning gas and a transition portion disposed on an intermediate outlet of the cleaning module. The transition portion includes a receiver having an inlet opening configured to receive the cleaning gas discharged from the cleaning module, an outlet connector configured to be attached to a diffuser, and an intermediate conduit connecting the receiver to the outlet connector. The intermediate conduit has a tube shape extending from the receiver to the outlet connector and a length that spaces the outlet connector from the receiver.

[0006] In an embodiment, the minimum inner cross-sectional area of ​​the intermediate conduit is at least 13 mm 2 .

[0007] In an embodiment, the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.

[0008] In an embodiment, the intermediate conduit extends from the receiver at an acute angle relative to the axis of the inlet opening of the receiver. In an embodiment, the acute angle is 15° to 35°.

[0009] In an embodiment, the intermediate conduit comprises a curve. In an embodiment, the curve is continuous along the length of the intermediate conduit.

[0010] In an embodiment, the intermediate conduit extends such that the outlet connector is completely spaced apart from the receiver when the wash port assembly is viewed in plan.

[0011] In an embodiment, a portion of the intermediate conduit protruding from the upper surface of the receiver has a width that is less than half the diameter of the body of the receiver.

[0012] In an embodiment, the ratio of the area of ​​the inlet opening of the receiver to the minimum cross-sectional area of ​​the intermediate conduit is equal to or greater than 23:1.

[0013] In an embodiment, a portion of the intermediate conduit that protrudes above an upper surface of the receiver is disposed entirely on one side of a centerline of the receiver.

[0014] In an embodiment, the transition portion is integrally formed with the outlet connector.

[0015] In an embodiment, the cleaning module and the transition portion are configured to be disposed in an opening in a shell of the wafer container, the opening extending through a bottom side of the shell of the wafer container and the cleaning port assembly is configured to block the opening in the shell. In an embodiment, the transition portion is configured to extend from the opening into an interior space of the wafer container.

[0016] In an embodiment, a wafer container includes a shell having an interior space, a cleaning port assembly extending through an opening in the shell into the interior space, the cleaning port assembly including: a cleaning module disposed in the opening in the shell, the cleaning module including a check valve configured to allow cleaning gas; and a transition portion disposed on the cleaning module in the opening in the shell. The transition portion includes: a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module; an outlet connector configured to be attached to a diffuser; and an intermediate conduit connecting the receiver to the outlet connector. The intermediate conduit has a tube shape extending from the receiver to the outlet connector and a length that spaces the outlet connector from the receiver.

[0017] In an embodiment, the transition portion extends from the opening in the shell into the interior space of the shell, the receiver of the transition portion is disposed in the opening in the shell, the outlet connector of the transition portion is disposed in the interior space of the shell, and the intermediate conduit extends from the opening in the shell into the interior space of the shell.

[0018] In an embodiment, the intermediate duct extends at an acute angle relative to the axis of the inlet opening of the receptacle. In an embodiment, the acute angle is in the range from 15° to 35°.

[0019] In an embodiment, the wafer container is a front-opening pod, the shell includes a front opening and a door configured to be disposed in the front opening.

[0020] In an embodiment, the wafer container further includes the diffuser having a column shape and including an end matingly connected to the outlet connector. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1A is a front perspective view of an embodiment of a wafer container.

[0022] Figure 1B In the embodiment, when opening Figure 1A A front perspective view of a wafer container in FIG.

[0023] Figure 2 In the embodiment Figure 1B A cross-sectional view of a wafer container in FIG.

[0024] Figure 3 yes Figure 2 Magnified view of the cleaning port assembly of the wafer container in FIG.

[0025] Figure 4 is a cross-sectional view of an embodiment of a cleaning port assembly.

[0026] Figure 5 yes Figure 4 A perspective view of a cross section of a transition portion of a cleaning port assembly.

[0027] 6 is a cross-sectional view of a conventional transition portion of a cleaning port assembly.

[0028] Fig. 7A is a perspective view of a cleaning port assembly according to an embodiment.

[0029] Figure 7B yes Fig. 7A Cross-sectional view of the cleaning port assembly.

[0030] Fig. 8A is a perspective view of a cleaning port assembly according to an embodiment.

[0031] Figure 8B yes Fig. 8A Cross-sectional view of the cleaning port assembly.

[0032] Like reference numerals denote like features. DETAILED DESCRIPTION

[0033] The present disclosure relates to wafer containers and cleaning port assemblies in wafer containers.

[0034] As used herein, a portion of a channel is defined as "curved" when the centerline of the channel (which is at the center of the cross-sectional area and perpendicular to the plane in which the cross-sectional area is taken) follows an arc with a radius during the portion of the channel. A channel is defined as a "curved" channel when it includes one or more portions defined herein as "curved", and the one or more curved portions include at least 1 / 4 of the length of the channel.

[0035] 6 is a cross-sectional view of an example of a conventional transition portion 540 of a cleaning port assembly. The transition portion 540 includes a receiver 542 and an outlet connector 562. The receiver 540 and the outlet connector 562 are formed in the transition portion 540 to be in direct contact with each other. For example, the upper end 542 of the receiver 540 and the bottom end 563 of the outlet connector 562 are in direct contact with each other. In particular, the outlet opening in the upper end 542 of the receiver 540 and the inlet opening in the bottom end 563 of the outlet connector 562 are the same opening 590. For example, the opening 590 is a window formed at the intersection of the receiver 540 and the outlet connector 562. The receiver 540 and the outlet connector 562 are formed in the conventional transition portion 540 so that they are not spaced apart from each other.

[0036] Figure 1A and 1B is a front perspective view of an embodiment of a wafer container 1. In the illustrated embodiment, the wafer container 1 is a front opening wafer transport box ("FOUP"). The container 1 includes a shell 4 and a door 6. The shell 4 includes an opening 8 (e.g., a front opening). The door 6 is coupled to the shell 4 to cover the front opening 8 and form an interior space 10. This interior space 10 may also be referred to as a closed space of the wafer container 1. For example, the door 6 may be coupled to the shell 4 by mechanical latching or suction fitting within a corresponding opening of the shell 4. For example, the door 6 in an embodiment may be coupled to the shell 4 (e.g., via a hinge) on one of the top side, the bottom side, or either side of the opening 8 of the shell 4. The door 6 covers the opening 8 and the container 1 can be accessed by moving (e.g., opening, removing) the door 6. Figure 1A The wafer container 1 is shown when closed (eg, with the door 6 covering the opening 8). Figure 1B The wafer container 1 is shown when open (eg, with the door 6 removed / decoupled).

[0037] Figure 2 According to the embodiment Figure 1B . The wafer container 1 includes a cleaning port assembly 20 that forms a cleaning port in the wafer container 1 to supply cleaning gas into the interior space 10. The cleaning port is formed in the bottom 12 of the shell 4. The cleaning port assembly 20 extends through the shell 4 into the wafer container 1. The container 1 may include one or more cleaning ports. For example, Figure 2The container 1 in the embodiment includes 4 cleaning ports (e.g., Figure 2 In another embodiment, the container 1 may include a different number of cleaning ports (e.g., 1, 2, 3, 5, etc.). Figure 2 , a wash port assembly 20 may be used for a rear wash port of a container 1 that is closer to the rear of the shell 4 than to the front (eg, closer to the rear than to the front opening 8).

[0038] The container 1 is configured to hold one or more semiconductor substrates (not shown) in its internal space 10. In an embodiment, the container 1 is configured to hold a plurality of semiconductor substrates. The cleaning port assembly 20 is used to supply cleaning gas into the internal space 10 of the container 1. For example, the cleaning gas supplied through the cleaning port may generally include but is not limited to an inert gas (e.g., nitrogen), filtered air (e.g., dust-free dry air), etc. Figure 2 Dashed arrows are included to indicate the general flow of purge gas through purge port assembly 20 .

[0039] Figure 3 yes Figure 2 1 is a partially enlarged view of the wafer container 1 in FIG. Figure 3 exhibit Figure 2 An enlarged view of the cleaning port assembly 20 is shown in FIG. Figure 3 , the cleaning port assembly 20 extends through the bottom 12 of the shell 4. The shell 4 includes an opening 14 in its bottom 12 that extends through the bottom 12 to the interior space 10. The cleaning port assembly is disposed in the opening 14 in the shell 4. The cleaning port assembly 20 is configured to block off the opening 14 so that fluid can enter the interior space 10 through the opening 14 only by flowing through the cleaning port assembly 20.

[0040] The cleaning port assembly 20 includes a cleaning module 22, a transition portion 40, and a diffuser 80. The cleaning module 22 is configured to block ambient air and allow a cleaning gas inlet to flow into the cleaning port assembly 20. For example, a cleaning nozzle (not shown) is configured to supply cleaning gas to the cleaning module 22. The cleaning module 22 may include a check valve 24 that opens to allow cleaning gas to flow into the cleaning port assembly 20 and through the cleaning module 22, and in some embodiments, a grommet is configured to interface with the cleaning nozzle. The check valve 24 prevents ambient air from flowing into the cleaning port assembly 20. In an embodiment, the check valve 24 may be configured to be actuated to open by the pressure of the cleaning gas (e.g., higher than the ambient pressure). In an embodiment, the check valve 24 may be configured to be actuated to open by the cleaning nozzle physically contacting and pushing the check valve 24.

[0041] Figure 480. The cleaning gas flows through the cleaning port assembly 20 by entering through the outer inlet 26 in the cleaning module 22 and exiting from the diffuser 80. The cleaning gas flows from the cleaning module 22 to the transition section 40, and from the transition section 40 to the diffuser 80. The cleaning port assembly 20 may also include a filter 38 disposed between the cleaning module 22 and the transition section 40. The filter 38 is configured to remove, for example, solid particles from the cleaning gas as it flows through the cleaning port assembly 20.

[0042] The cleaning module 22 is disposed in the opening 14 in the housing 4. The cleaning module 22 includes an outer inlet 26 and a first intermediate outlet 28. The cleaning gas enters the cleaning module 22 through the outer inlet 26, flows through the cleaning module 22, and then exits the cleaning module 22 through the (first) intermediate outlet 28. The cleaning gas discharged from the cleaning module 22 then flows into the transition portion 40. In an embodiment, as shown in FIG. Figure 3 As shown in , the purge gas may pass through the filter 38 as it flows from the purge module 22 to the transition portion 40 .

[0043] like Figure 3 , the transition portion 40 is disposed on the outlet (e.g., the intermediate outlet 28) of the cleaning module 22. The transition portion 40 includes a receiver 42, an outlet connector 52, and an intermediate conduit 62. The transition portion 40 is disposed in the opening 14 in the shell 4. The transition portion 40 is stacked on the cleaning module 22 within the opening 14 in the shell 4. For example, the transition portion 40 is disposed on the cleaning module 22 within the opening 14. The intermediate conduit 62 extends from the opening 14 in the shell 4 into the interior space 10. The outlet connector 52 is disposed within the shell 4 (e.g., in the interior space 10 of the shell 4).

[0044] like Figure 4 , the transition portion 40 is formed as a single unitary component. For example, the transition portion 40 in the illustrated embodiment is a single unitary component formed by polymer injection molding. The receiver 42 includes an inlet opening 44 configured to receive the cleaning gas emitted from the cleaning module 22. The inlet opening 44 is disposed above the outlet 28 of the cleaning module 22 so that the cleaning gas emitted from the cleaning module 22 flows into the receiver 42 of the transition portion 40 through the inlet opening 44.

[0045] The outlet connector 52 is configured to communicate with the diffuser 80 ( Figure 2 and 380 is attached to the outlet connector 52. The cleaning gas flows through the diffuser and enters the interior space 10 of the wafer container 1. The end of the diffuser 80 can be connected to the outlet connector 52 through a mating connection. In the illustrated embodiment, the outlet connector 52 has a barb configured to connect and retain the diffuser 80 to the outlet connector 52. In another embodiment, the outlet connector 52 can use a different structure and / or configuration to connect the outlet connector 52 and the diffuser 80. The cleaning port assembly 20 discharges the cleaning gas from the diffuser 80 into the interior space 10. In the illustrated embodiment, the diffuser 80 has a column shape (e.g., Figure 2 However, it should be appreciated that in other embodiments, the diffuser 80 may have a different shape (disc shape, cap shape, etc.).

[0046] Figure 5 A perspective view of the transition portion 40 is shown. The intermediate conduit 62 connects the receiver 42 to the outlet connector 52. The purge gas flows from the receiver 42 to the outlet connector through the intermediate conduit 62. The intermediate conduit 62 has a tube shape. In the illustrated embodiment, the tube shape of the intermediate conduit 62 is round (e.g., the cross-section of the tube shape is round). It should be understood that the tube shape of the intermediate conduit 62 can be different shapes. In another embodiment, the tube shape of the intermediate conduit 62 can be oval, rectangular, hexagonal, etc.

[0047] The intermediate conduit 62 has a diameter equal to or greater than 13 mm. 2 The minimum inner cross-sectional area A2 of the intermediate conduit 62 through which the cleaning gas passes (for example, the cross-sectional area belongs to the inner open section of the intermediate conduit 62). In an embodiment, the minimum inner cross-sectional area A2 of the intermediate conduit 62 is equal to or greater than 15 mm 2 In the embodiment, the minimum inner cross-sectional area A2 of the intermediate conduit 62 is equal to or greater than 18 mm 2 .like Figure 5 As shown in FIG. 5 , the minimum inner cross-sectional area A3 of the outlet connector 52 is at least equal to the minimum cross-sectional area A2 of the intermediate conduit 62. For example, the “inner cross-sectional area” refers to the cross-sectional area of ​​the open portion through which the cleaning gas flows (e.g., the cross-sectional area is along a plane perpendicular to the flow direction of the cleaning gas).

[0048] like Figure 4, the intermediate conduit 62 extends from the receiver 42 at an acute angle α relative to the axis 46 of the inlet opening 44 of the receiver 42. The axis 42 of the receiver 42 is offset from the axis 54 of the outlet connector 52. At least a portion of the outlet connector 52 does not overlap vertically with the receiver 42 (e.g., the right outer wall 53 of the outlet connector 52 does not overlap vertically with the receiver 42). For example, vertical can be a direction perpendicular to the bottom of the cleaning module 22 (e.g., perpendicular to the bottom 12 of the shell 4). In an embodiment, the acute angle α at which the intermediate conduit 62 extends from the receiver 42 is 15° to 35° relative to the axis 46 of the inlet opening 44 of the receiver 42. In an embodiment, the acute angle α at which the intermediate conduit 62 extends from the receiver 42 is 20° to 30°. For example, the axis of the opening is an axis extending through the opening (e.g., along the flow direction of the cleaning gas entering the opening, a vertical axis).

[0049] The intermediate conduit 62 has a length L that separates the outlet connector 52 from the receiver 42. The intermediate conduit 62 has a length L that is greater than an inner width W of the conduit 62. The inner width W is a width measured between the inner sides of the conduit (e.g., the minimum inner diameter of a round tubular inner conduit, etc.). For example, the inner width W extends in a direction perpendicular to the length L of the intermediate conduit. In an embodiment, the inner width W is the minimum inner width of the intermediate conduit 62. In an embodiment, the inner width W is the maximum inner width of the intermediate conduit 62.

[0050] The pressure drop across the intermediate conduit is less than 20 kPa at a purge gas flow rate of 100 standard liters per minute (SLPM). For example, the pressure drop may be measured as the drop in pressure of the purge gas in the receiver 42 to the pressure of the purge gas in the outlet connector 52. The purge gas used to measure the pressure drop may be air.

[0051] Figure 5 yes Figure 4 4. A perspective view of a cross section of a transition portion 40 in FIG. 4. The receiver 42 of the transition portion 40 includes a first intermediate inlet 48, a second intermediate outlet 49, a side wall 50, and an end wall 54. The first intermediate inlet 48 forms an inlet opening 44 of the receiver 42. The cleaning gas enters the receiver 42 through the (first) intermediate inlet 48 and leaves the receiver 42 through the (second) intermediate outlet 49. The inlet opening 44 and the (first) intermediate inlet 48 are formed by one or more side walls 50. For example, the left and right side walls 50 of the receiver may be formed by a continuous wall having a tubular shape (e.g., a circular wall). The end wall 51 and the inlet opening 44 are disposed at opposite ends of the receiver 42 (e.g., at the top and bottom of the receiver 42). One of the side walls 50 (e.g., Figure 5 The left side wall 50 in the figure) extends from the end wall 51. The end wall 51 can connect one or more of the side walls 50 to the intermediate conduit 62 (e.g., Figure 5The second intermediate outlet 49 is formed by one of the side walls 50 (e.g., Figure 5 The second intermediate outlet 49 is formed at the end of the right side wall 50 and the end of the end wall 51. The second intermediate outlet 49 faces at an angle (e.g., not facing vertically downward, not facing parallel to the axis 54, not facing parallel to the axis 46). The second intermediate outlet 49 can be at one of the side walls 50 (e.g., Figure 4 The right side wall in the figure) is at an angle relative to the end of the end wall 51 and at an angle relative to the side wall 50 and to the end wall 51 (for example, not parallel to the end wall 51, not parallel to the end wall 51, Figure 4 The right side wall of the ).

[0052] The outlet connector 52 includes a second intermediate inlet 56. The purge gas flows from the intermediate conduit 62 through the (second) intermediate inlet 56 into the outlet connector 52. The intermediate conduit 62 extends from the (second) intermediate outlet 49 of the receiver 42 to the (second) intermediate inlet 56 of the outlet connector 52. The intermediate conduit 62 fluidly connects the outlet 49 of the receiver 42 to the inlet 56 of the outlet connector 52. The (second) intermediate outlet 49 of the receiver 42 is spaced apart from the (second) intermediate inlet 56 of the outlet connector 52 by the length L of the outlet connector 52. The intermediate inlet 56 of the outlet connector 52 extends at an angle (e.g., not facing vertically upward, not facing parallel to the axis 54, not facing parallel to the axis 46). For example, effluent from the intermediate conduit 62 through the intermediate inlet 56 and into the outlet connector 52 at least partially overlaps the side wall 53 of the outlet connector 52.

[0053] The acute angle α may be the angle of the inner side 64 of the intermediate conduit 62 extending from the end wall 51 of the receiver. In an embodiment, the angle β between the end wall 51 of the receiver 42 and the inner side 64 of the intermediate conduit 62 is equal to or approximately 105° to 125°. In an embodiment, the angle β between the end wall 51 of the receiver 42 and the inner side 64 of the intermediate conduit 62 is equal to or approximately 110° to 120°. In an embodiment, the angle of the inner side 64 of the intermediate conduit 62 relative to the bottom of the cleaning module 22 is equal to or approximately 105° to 125°. In an embodiment, the angle of the inner side 64 of the intermediate conduit 62 relative to the bottom of the cleaning module 22 is equal to or approximately 110° to 120°.

[0054] In an embodiment, the ratio of the area A1 of the inlet opening 44 of the receiver 42 to the minimum inner cross-sectional area A2 of the intermediate conduit 62 (area A1: minimum inner cross-sectional area A2) is equal to or greater than 23: 1. In an embodiment, the ratio of the area A1 of the inlet opening 44 of the receiver 42 to the minimum inner cross-sectional area A2 of the intermediate conduit 62 (area A1: minimum inner cross-sectional area A2) is equal to or greater than 19.5: 1.

[0055] In an embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 (minimum internal cross-sectional area A3: minimum cross-sectional area A2) is equal to or less than 2.5:1. In an embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 (minimum internal cross-sectional area A3: minimum cross-sectional area A2) is equal to or less than 2.5:1. In an embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the minimum cross-sectional area A2 of the intermediate conduit 62 (minimum internal cross-sectional area A3: minimum cross-sectional area A2) is equal to or less than 1.5:1. For example, in the illustrated embodiment, the ratio of the minimum internal cross-sectional area A3 of the inlet connector 52 to the cross-sectional area A2 of the intermediate conduit 62 is 1.5:1.

[0056] Fig. 7A 7 is a perspective view of a cleaning port assembly according to an embodiment. The cleaning port assembly 68 includes a transition bracket 70. The transition bracket 70 includes a receiver 72, an intermediate conduit 74, and an outlet connector 76. The receiver 72 and the intermediate conduit 74 are configured to reduce the profile of the portion of the intermediate conduit 74 extending above the upper surface 78 of the receiver 72. The intermediate conduit 74 can be configured so that the portion of the intermediate conduit 74 protruding from the upper surface 78 has a width less than half of the diameter of the body of the receiver 72 outside the interface with the outlet connector 76. The intermediate conduit 74 can be positioned so that the entire portion of the intermediate conduit 74 protruding above the upper surface 78 is disposed on one side of the centerline C of the receiver 72. The reduced profile of the intermediate conduit 74 can reduce or eliminate interference between the transition bracket 70 and the wafers or other substrates stored in the container including the cleaning port assembly 68 and / or interference with the automation for handling such wafers or other substrates. The intermediate conduit 74 can be configured to extend so that the outlet connector 76 is completely staggered with the receiver 72. In this embodiment, when the transition bracket 70 is viewed in plan view, the outlet connector 76 is completely spaced apart from and does not overlap the receiver 72. The outlet connector 76 can be a separate piece attached to the intermediate conduit 74 by any suitable connection, such as a cover. A non-limiting example of such a suitable connection is welding. In an embodiment, a standard cover of a transition bracket can be combined with the receiver 72 and intermediate conduit 74 of an embodiment. In an embodiment, the intermediate conduit 74 can include a portion configured to receive the outlet connector 76. For example, Fig. 7A , a portion of the intermediate conduit 74 may be flared to a suitable size to interface with the outlet connector 76. In another embodiment, the outlet connector 76 may be integrally formed with the receiver 72 and the intermediate conduit 74. The outlet connector 76 may include any suitable features that allow for attachment of a diffuser (not shown) to the outlet connector 76, for example, including barbs 77 that allow for mechanical attachment of the diffuser at the outlet connector 76.

[0057] Figure 7B yes Fig. 7A sectional view of the cleaning port assembly of the present invention. The intermediate conduit 74 is shaped to define a passage 80 and an outlet connector transition 82. The passage 80 may extend straight through the intermediate conduit 74. The passage 80 may be at an acute angle α relative to the central axis A of the receiver 72. In an embodiment, the acute angle α is in the range of from 15° to 35°. In an embodiment, the shape of the passage 80 may be tubular. In an embodiment, the passage 80 may have a circular cross-sectional shape. In an embodiment, the passage 80 may have a non-circular cross-sectional shape, for example, an elliptical shape. In an embodiment, the passage 80 may have a consistent inner diameter D. The passage 80 may be configured to allow cleaning from the receiver 72 to pass through the intermediate conduit 74 to the outlet connector 76 when there is an acceptable pressure difference or even when the width of the intermediate conduit 74 is reduced and the profile is reduced. The passage 80 may be fed into the outlet connector transition 82 also formed in the intermediate conduit 74. The outlet connector transition 82 may be a space configured to receive a flow from the passage 80 and transition to a size such that the outlet connector 76 can interface with the intermediate conduit 74. In an embodiment, the intermediate conduit 74 has a cross-sectional area at the outlet connector 76 that corresponds to the cross-section of the connector portion of the barb cap.

[0058] Fig. 8A 8 is a perspective view of a cleaning port assembly according to an embodiment. The cleaning port assembly 84 includes a transition bracket 86. The transition bracket 86 includes a receiver 88, an intermediate conduit 90, and an outlet connector 92. The receiver 88 and the intermediate conduit 90 are configured to reduce the profile of the portion of the intermediate conduit 90 extending above the upper surface 94 of the receiver 88. The intermediate conduit 90 can be configured so that the portion of the intermediate conduit 90 protruding from the upper surface 94 has a width less than half the diameter of the body of the receiver 88. The reduced profile of the intermediate conduit 90 can reduce or eliminate interference between the transition bracket 86 and the wafers or other substrates stored in the container including the cleaning port assembly 84 and / or interference with the automation for handling such wafers or other substrates. The intermediate conduit 90 can be configured to extend so that the outlet connector 92 is completely staggered with the receiver 88. In this embodiment, when the transition bracket 86 is viewed in a plan view, the outlet connector 92 is completely spaced apart from the receiver 88 and does not overlap with the receiver 88. The outlet connector 92 can be a separate piece attached to the intermediate conduit 90 by any suitable connection, such as a cover. A non-limiting example of a suitable connection is welding. Fig. 8A, the outlet connector can be a cap configured to correspond to the size of the intermediate conduit 90 (e.g., by having the same width). In an embodiment, the outlet connector 92 can be integrally formed with the intermediate conduit 90. The outlet connector 92 can include features that allow for any suitable attachment of a diffuser (not shown) to the outlet connector 92, for example, including barbs 93 that allow for mechanical attachment of the diffuser at the outlet connector 92.

[0059] Figure 8B yes Fig. 8A 92. The intermediate conduit 90 is shaped to define a passage 96. The passage 96 may extend the entire distance from the receiver 88 to the outlet connector 92. The passage 96 may be curved as it extends from the receiver 88 to the outlet connector 92. In an embodiment, the shape of the passage 96 may be tubular. In an embodiment, the passage 96 may have a circular cross-sectional shape. In an embodiment, the passage 96 may have a non-circular cross-sectional shape, for example, an elliptical shape. In an embodiment, the passage 96 may have a consistent inner diameter D. In an embodiment, the passage 96 may increase in diameter D as it moves from the receiver 88 toward the outlet connector 92. In an embodiment, the intermediate conduit 90 is joined to the outlet connector 92 at a welding point 98. In another embodiment, the intermediate conduit 90 and the outlet connector 92 are integrally formed with each other, and the welding point 98 does not exist. In an embodiment including the welding point 98, the end of the intermediate conduit 90 where the outlet connector 92 is joined may be shaped to facilitate welding at the welding point 98.

[0060] aspect:

[0061] Any of aspects 1 to 14 may be combined with any of aspects 15 to 20, 21 to 34, or 35 to 40. Any of aspects 15 to 20 may be combined with any of aspects 21 to 34, or 35 to 40. Any of aspects 21 to 34 may be combined with any of aspects 35 to 40.

[0062] Aspect 1. A cleaning port assembly for a wafer container, comprising: a cleaning module configured to allow an inlet flow of a cleaning gas; and a transition portion disposed on an intermediate outlet of the cleaning module, the transition portion including: a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module; an outlet connector configured to be attached to a diffuser; and an intermediate conduit connecting the receiver to the outlet connector, the intermediate conduit extending from the receiver at an acute angle relative to an axis of the inlet opening of the receiver, and the intermediate conduit having a length that spaces the outlet connector from the receiver.

[0063] Aspect 2. The cleaning port assembly according to aspect 1, wherein the minimum inner cross-sectional area of ​​the intermediate conduit is at least 13 mm 2 .

[0064] Aspect 3. The purge port assembly according to any one of aspects 1 and 2, wherein the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.

[0065] Aspect 4. The wash port assembly according to any one of aspects 1 to 3, wherein the acute angle is 15° to 35°.

[0066] Aspect 5. A cleaning port assembly according to any one of Aspects 1 to 4, wherein the cleaning module includes a first intermediate outlet, the receiver includes a first intermediate inlet and a second intermediate outlet, the first intermediate outlet of the cleaning module is fluidically connected to the first intermediate inlet of the receiver, and the first intermediate inlet forms the inlet opening of the receiver, and the outlet connector includes a second intermediate inlet, and the intermediate conduit extends from the second intermediate outlet of the receiver to the second intermediate inlet of the outlet conduit.

[0067] Aspect 6. A cleaning port assembly according to any one of Aspects 1 to 5, wherein the receiver includes one or more side walls and an end wall, the end wall and the inlet opening are disposed at opposite sides of the receiver, and the intermediate conduit extends from one of the one or more side walls of the receiver and the top wall of the receiver.

[0068] Aspect 7. The cleaning port assembly of aspect 6, wherein an angle between the end wall of the receptacle and the inside of the intermediate conduit is equal to or approximately 105° to 125°.

[0069] Aspect 8. The cleaning port assembly of any one of aspects 1 to 7, wherein a ratio of an area of ​​the inlet opening of the receptacle to a minimum cross-sectional area of ​​the intermediate conduit is equal to or greater than 23:1.

[0070] Aspect 9. The cleaning port assembly according to any one of aspects 1 to 8, wherein the intermediate conduit has a tube shape extending from the receiver to the outlet connector.

[0071] Aspect 10. The wash port assembly according to any one of aspects 1 to 9, further comprising: a filter disposed between the wash module and the receiver.

[0072] Aspect 11. The cleaning port assembly according to any one of aspects 1 to 10, further comprising: the diffuser having a cylindrical shape with an end matingly connected to the outlet connector of the transition portion.

[0073] Aspect 12. The cleaning port assembly of any one of aspects 1 to 11, wherein the transition portion is formed as a single unitary component.

[0074] Aspect 13. A cleaning port assembly according to any one of Aspects 1 to 12, wherein the cleaning module and the transition portion are configured to be disposed in an opening in the shell of the wafer container, the opening extending through the bottom side of the shell of the wafer container and the cleaning port assembly is configured to block the opening in the shell.

[0075] Aspect 14. The cleaning port assembly of aspect 13, wherein the transition portion is configured to extend from the opening into the interior space of the wafer container.

[0076] Aspect 15. A wafer container comprising: a shell comprising an interior space; a cleaning port assembly extending through an opening in the shell into the interior space, the cleaning port assembly comprising: a cleaning module disposed in the opening in the shell, the cleaning module comprising a check valve configured to allow cleaning gas; and a transition portion disposed on the cleaning module in the opening in the shell, the transition portion comprising: a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module; an outlet connector configured to be attached to a diffuser; and an intermediate conduit connecting the receiver to the outlet connector, the intermediate conduit extending at an acute angle relative to the axis of the inlet opening of the receiver, the intermediate conduit having a length that separates the outlet connector from the receiver.

[0077] Aspect 16. The wafer container of aspect 15, wherein a transition portion extends from the opening in the shell into the interior space of the shell.

[0078] Aspect 17. A wafer container according to Aspect 16, wherein the receiver of the transition portion is disposed in the opening in the shell, the outlet connector of the transition portion is disposed in the interior space of the shell, and the intermediate conduit extends from the opening in the shell into the interior space of the shell.

[0079] Aspect 18. The wafer container of any one of aspects 15 to 17, wherein the intermediate conduit is configured to extend at an angle of 15° to 35° relative to an axis of the opening in the shell.

[0080] Aspect 19. The wafer container according to any one of aspects 15 to 18, wherein the wafer container is a front-opening wafer transport box, the shell includes a front opening and a door configured to be disposed in the front opening.

[0081] Aspect 20. The wafer container according to any one of aspects 15 to 19, further comprising: the diffuser having a cylindrical shape and including an end matingly connected to the outlet connector.

[0082] Aspect 21. A cleaning port assembly for a wafer container, comprising:

[0083] a purge module configured to allow an inlet flow of a purge gas; and

[0084] A transition portion disposed on the middle outlet of the cleaning module, the transition portion comprising:

[0085] a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module, an outlet connector configured to be attached to a diffuser, and

[0086] An intermediate conduit connects the receiver to the outlet connector, the intermediate conduit having a tube shape extending from the receiver to the outlet connector and having a length that spaces the outlet connector from the receiver.

[0087] Aspect 22. The cleaning port assembly according to aspect 21, wherein the minimum inner cross-sectional area of ​​the intermediate conduit is at least 13 mm 2 .

[0088] Aspect 23. The purge port assembly of any one of aspects 21-22, wherein the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.

[0089] Aspect 24. The cleaning port assembly of any one of aspects 21 to 23, wherein the intermediate conduit extends from the receptacle at an acute angle relative to an axis of the inlet opening of the receptacle.

[0090] Aspect 25. The clean port assembly of aspect 24, wherein the acute angle is 15° to 35°.

[0091] Aspect 26. The cleaning port assembly of any one of aspects 21 to 23, wherein the intermediate conduit comprises a curve.

[0092] Aspect 27. The cleaning port assembly of aspect 26, wherein the curve is continuous along the length of the intermediate conduit.

[0093] Aspect 28. The wash port assembly of any one of aspects 21 to 27, wherein the intermediate conduit extends such that the outlet connector is completely spaced apart from the receiver when the wash port assembly is viewed in plan.

[0094] Aspect 29. The wash port assembly of any one of aspects 21 to 28, wherein a portion of the intermediate conduit protruding from the upper surface of the receiver has a width that is less than half the diameter of the body of the receiver.

[0095] Aspect 30. The cleaning port assembly of any one of aspects 21 to 29, wherein a ratio of an area of ​​the inlet opening of the receptacle to a minimum cross-sectional area of ​​the intermediate conduit is equal to or greater than 23:1.

[0096] Aspect 31. The wash port assembly of any one of aspects 21 to 30, wherein a portion of the intermediate conduit that protrudes above an upper surface of the receiver is disposed entirely on one side of a centerline of the receiver.

[0097] Aspect 32. The cleaning port assembly of any one of aspects 21 to 31, wherein the transition portion is integrally formed with the outlet connector.

[0098] Aspect 33. A cleaning port assembly according to any one of Aspects 21 to 32, wherein the cleaning module and the transition portion are configured to be disposed in an opening in the shell of the wafer container, the opening extending through the bottom side of the shell of the wafer container and the cleaning port assembly is configured to block the opening in the shell.

[0099] Aspect 34. The cleaning port assembly of aspect 33, wherein the transition portion is configured to extend from the opening into the interior space of the wafer container.

[0100] Aspect 35. A wafer container comprising:

[0101] a shell, which contains an interior space;

[0102] a wash port assembly extending through an opening in the shell into the interior space, the wash port assembly comprising:

[0103] a purge module disposed in the opening in the housing, the purge module including a check valve configured to allow purge gas; and

[0104] a transition portion disposed on the cleaning module in the opening in the housing, the transition portion comprising:

[0105] a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module, an outlet connector configured to be attached to a diffuser, and

[0106] An intermediate conduit connects the receiver to the outlet connector, the intermediate conduit having a tube shape extending from the receiver to the outlet connector, the intermediate conduit having a length that spaces the outlet connector apart from the receiver.

[0107] Aspect 36. The wafer container according to aspect 35, wherein:

[0108] the transition portion extends from the opening in the shell into the interior space of the shell,

[0109] The receiver of the transition portion is disposed in the opening in the shell,

[0110] The outlet connector of the transition portion is disposed in the interior space of the shell, and

[0111] The intermediate conduit extends from the opening in the shell into the interior space of the shell.

[0112] Aspect 37. The wafer container of any one of aspects 35 to 36, wherein the intermediate conduit extends at an acute angle relative to an axis of the inlet opening of the receptacle.

[0113] Aspect 38. The wafer container of aspects 35 to 36, wherein the intermediate conduit comprises a curve.

[0114] Aspect 39. A wafer container according to any one of aspects 35 to 38, wherein the wafer container is a front-opening wafer transport box, the shell includes a front opening and a door configured to be disposed in the front opening.

[0115] Aspect 40. The wafer container according to any one of aspects 35 to 39, further comprising:

[0116] The diffuser has a cylindrical shape and includes an end matingly connected to the outlet connector.

[0117] The examples disclosed in this application are considered to be illustrative and not restrictive in all aspects. In an embodiment, the "connection" described above may refer to "direct connection". The scope of the present invention is indicated by the appended claims rather than the above description; and all changes within the equivalent meaning and scope of the claims are intended to be included therein.

Claims

1. A cleaning port assembly for a wafer container, comprising: a purge module configured to allow an inlet flow of a purge gas; and A transition portion disposed on the middle outlet of the cleaning module, the transition portion comprising: a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module, an outlet connector configured to be attached to a diffuser, and An intermediate conduit connects the receiver to the outlet connector, the intermediate conduit having a tube shape extending from the receiver to the outlet connector and having a length that spaces the outlet connector from the receiver.

2. The cleaning port assembly of claim 1, wherein the minimum internal cross-sectional area of ​​the intermediate conduit is at least 13 mm 2 .

3. The purge port assembly of claim 1 , wherein the pressure drop across the intermediate passage is less than 20 kPa at a purge gas flow rate of 100 SLPM.

4. The cleaning port assembly of claim 1, wherein the intermediate conduit extends from the receiver at an acute angle relative to an axis of the inlet opening of the receiver.

5. The cleaning port assembly of claim 4, wherein the acute angle is 15° to 35°. The cleaning port assembly of claim 1 , wherein the intermediate conduit comprises a curve.

7. The cleaning port assembly of claim 6, wherein the curve is continuous along the length of the intermediate conduit.

8. The cleaning port assembly of claim 1, wherein the intermediate conduit extends such that the outlet connector is completely spaced apart from the receiver when the cleaning port assembly is viewed in plan.

9. The wash port assembly of claim 1, wherein a portion of the intermediate conduit protruding from the upper surface of the receptacle has a width that is less than half the diameter of the body of the receptacle.

10. The cleaning port assembly of claim 1, wherein a ratio of an area of ​​the inlet opening of the receptacle to a minimum cross-sectional area of ​​the intermediate conduit is equal to or greater than 23:

1.

11. The cleaning port assembly of claim 1 , wherein a portion of the intermediate conduit that protrudes above an upper surface of the receiver is disposed entirely on one side of a centerline of the receiver.

12. The cleaning port assembly of claim 1, wherein the transition portion is integrally formed with the outlet connector.

13. A cleaning port assembly according to claim 1, wherein the cleaning module and the transition portion are configured to be disposed in an opening in the shell of the wafer container, the opening extending through the bottom side of the shell of the wafer container and the cleaning port assembly is configured to block the opening in the shell.

14. The cleaning port assembly of claim 13, wherein the transition portion is configured to extend from the opening into the interior space of the wafer container.

15. A wafer container comprising: a shell, which contains an interior space; a wash port assembly extending through an opening in the shell into the interior space, the wash port assembly comprising: a purge module disposed in the opening in the housing, the purge module including a check valve configured to allow purge gas; and a transition portion disposed on the cleaning module in the opening in the housing, the transition portion comprising: a receiver having an inlet opening configured to receive the cleaning gas emitted from the cleaning module, an outlet connector configured to attach to the diffuser, and An intermediate conduit connects the receiver to the outlet connector, the intermediate conduit having a tube shape extending from the receiver to the outlet connector, the intermediate conduit having a length that spaces the outlet connector apart from the receiver.

16. The wafer container of claim 15, wherein: The transition portion extends from the opening in the shell into the interior space of the shell, the receiver of the transition portion being disposed in the opening in the shell, The outlet connector of the transition portion is disposed in the interior space of the shell, and The intermediate conduit extends from the opening in the shell into the interior space of the shell.

17. The wafer container of claim 15 wherein the intermediate conduit extends at an acute angle relative to an axis of the inlet opening of the receptacle.

18. The wafer container of claim 15, wherein the intermediate conduit comprises a curve.

19. The wafer container of claim 15, wherein the wafer container is a front-opening pod, the shell comprising a front opening and a door configured to be disposed in the front opening.

20. The wafer container of claim 15, further comprising: The diffuser has a cylindrical shape and includes an end matingly connected to the outlet connector.

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