An etching apparatus

Abstract

The application provides an etching device, which comprises a chamber, a base arranged in the chamber, a medium window arranged above the chamber, a heating assembly arranged in a central region of an upper surface of the medium window and used for heating the central region of the medium window, the heating assembly comprising a circular main body and a plurality of sectorial through holes arranged along a circumference of the circular main body, a base plate arranged between the medium window and an upper edge of the chamber, the base plate comprising an edge heating element used for heating an edge region of the medium window, a pressing plate arranged above the heating assembly, and a support block arranged on the medium window or the pressing plate and configured to pass through the sectorial through holes. The edge and the center are heated by the heating assembly and the edge heating element, so that the uniformity of temperature control is ensured, and the sectorial through holes are arranged, so that the support block can support the heating assembly and prevent the heating assembly from being pressed too hard.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of etching equipment of semiconductor devices, in particular to the technical field of a heating assembly of an etching equipment. BACKGROUND

[0002] In the process of semiconductor chip processing, etching equipment such as ICP or CCP is needed to etch grooves on the surface of a wafer.

[0003] Taking an ICP etching equipment as an example, in the equipment, a coil couples energy of a radio frequency power to plasma in a vacuum chamber through electromagnetic induction. The upper surface of a dielectric window is in the atmosphere, the lower surface of the dielectric window is in the chamber, and the joint surface of the dielectric window and the chamber is the generation and distribution area of the plasma. The temperature of the dielectric window affects the uniformity of the plasma distribution and the deposition of particles. At the same time, the capacitive electric field of the planar coil is strong, which forms a thick capacitive radio frequency sheath layer under the dielectric window, accelerates the plasma to high energy, and then impacts the surface of the dielectric window to cause sputtering, resulting in particle pollution and damage to the dielectric window.

[0004] In the prior art, the dielectric window is generally heated by a side heating band or hot air, but the side heating band method has low heat transfer efficiency due to structural limitations, and the hot air heating method has a complex air duct structure, the influence of the coil capacitive electric field has not been improved, and the heating is uneven. In addition, even if the dielectric window is heated by an electric heating wire, it is also prone to poor adhesion, easy damage, and complex shielding port connection. SUMMARY

[0005] The purpose of the present application is to provide an etching equipment to solve the above problems.

[0006] In order to achieve the above purpose, the present application realizes the following technical scheme:

[0007] The present application provides an etching equipment, comprising:

[0008] a chamber;

[0009] a susceptor arranged in the chamber;

[0010] a dielectric window arranged above the chamber;

[0011] a heating assembly arranged in the central region of the upper surface of the dielectric window, for heating the central region of the dielectric window, the heating assembly comprising a circular main body, a plurality of fan-shaped through holes arranged along the circumference of the circular main body are arranged on the circular main body;

[0012] a base arranged between the dielectric window and the upper edge of the chamber, the base comprising an edge heating member for heating the edge region of the dielectric window;

[0013] a pressing plate arranged above the heating assembly for fixing the heating assembly on the media window;

[0014] wherein a support block is arranged on the media window or the pressing plate, and the support block is configured to support the heating assembly through the fan-shaped through hole.

[0015] Optionally, the thickness D of the circular body is 1mm < D ≤ 5mm.

[0016] Optionally, the thickness d of the heating layer is 0.1mm < d ≤ 1mm.

[0017] Optionally,

[0018] The circular body comprises:

[0019] an upper insulating layer;

[0020] a heating layer arranged below the upper insulating layer;

[0021] a shielding layer arranged below the heating layer;

[0022] a lower flexible heat-conducting insulating layer arranged below the shielding layer;

[0023] wherein the diameter of the shielding layer is larger than that of the heating layer, so as to form an exposed part at the circumferential edge of the circular body.

[0024] Optionally, the shielding layer comprises at least two shielding pieces, and each shielding piece comprises a circumferential extension part and a radial extension part connected to the circumferential extension part.

[0025] Optionally, the heating layer comprises at least two heating pieces, and each heating piece comprises a circumferential extension part and a radial extension part connected to the circumferential extension part.

[0026] Optionally, the number of the heating pieces is four, and the heating pieces are electrically connected.

[0027] Optionally, the number of the shielding pieces is four, and the shielding pieces are disconnected.

[0028] Optionally, the shielding pieces and the heating pieces have the same shape.

[0029] Optionally, the radial extension part of the shielding piece comprises at least two long radial extension parts and at least two short radial extension parts, and the at least one short radial extension part is arranged between the two long radial extension parts.

[0030] Optionally, the radial extension part of the heating sheet comprises at least two long radial extension parts and at least two short radial extension parts, and the at least one short radial extension part is arranged between the two long radial extension parts.

[0031] Optionally, the circumferential width of the circumferential extension part of the shielding sheet is greater than the circumferential width of the circumferential extension part of the heating sheet, so as to form an exposed part at the circumferential edge of the circular main body.

[0032] Optionally, the downward projection of the upper insulating layer covers the downward projection of the heating layer and the shielding layer.

[0033] Optionally, the diameter of the lower flexible heat-conducting insulating layer is greater than the diameter of the upper insulating layer.

[0034] Optionally, the upper insulating layer and the lower flexible heat-conducting insulating layer have the same shape, both being spoke-shaped.

[0035] Optionally, the heating layer is made of PI or PTFE.

[0036] Optionally, the base further comprises a ring body and a pressing member, the outer sidewall of the base is provided with a transverse groove extending along the circumferential direction of the ring body, the edge heating member is arranged at the inner side of the transverse groove, and the pressing member is arranged at the outer side of the transverse groove.

[0037] Optionally, the pressing member is configured to provide pressure to the edge heating member along the radial direction.

[0038] Optionally, the base further comprises a fastener configured to fix the pressing member through the transverse groove from the upper surface of the ring body.

[0039] Optionally, the lower end of the fastener is in the shape of a circular truncated cone, and the upper surface of the pressing member is provided with a rounded truncated cone groove matched with the lower end of the circular truncated cone.

[0040] Optionally, the pressing member comprises at least two arc-shaped segments.

[0041] Optionally, the inner sidewall of the pressing member is configured as an arc-shaped groove matched with the shape of the edge heating member.

[0042] Optionally, the application further comprises a grounding member, which is pressed on the exposed part.

[0043] Optionally, the grounding member comprises a pressing ring and a supporting rod, the pressing ring is pressed on the upper surface of the exposed part, and the supporting rod extends along the vertical direction and is connected with the pressing ring at one end and connected with the base at the other end.

[0044] Compared with the prior art, the application has the following advantages:

[0045] 1. The heating assembly and the edge heating piece of the edge of the medium window are arranged on the medium window, so that the temperature of the medium window can be uniformly controlled.

[0046] 2. The fan-shaped through holes are arranged, the support block supports the heating assembly, the heating assembly is prevented from being squeezed by excessive force, and the exposed part is arranged, so that the shielding layer can be reliably grounded.

[0047] 3. The heating assembly has the characteristics of flexibility and ultra-thinness, the flexibility can make the heating assembly adhere to the medium window, and the ultra-thinness saves space. BRIEF DESCRIPTION OF DRAWINGS

[0048] In order to more clearly illustrate the technical solutions of the present application, the drawings needed in the description will be briefly introduced below. Obviously, the drawings in the following description are one embodiment of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings:

[0049] Figure 1 It is a structure schematic view of the etching equipment of the present application;

[0050] Figure 2 It is a structure schematic view of the upper part of the etching equipment of the present application;

[0051] Figure 3 It is a structure schematic view of the base of the present application;

[0052] Figure 4 It is a cross section of the base of the present application;

[0053] Figure 5 It is a top view of the pressing piece of the present application;

[0054] Figure 6 It is a structure view of the heating assembly of the present application;

[0055] Figure 7 It is a sectional view of the heating assembly of the present application along O1-O1';

[0056] Figure 8 It is a sectional view of the heating assembly of the present application along O2-O2';

[0057] Figure 9 It is an explosion view of the heating assembly of the present application;

[0058] Figure 10 It is a schematic view of the heating layer of the present application;

[0059] Figure 11 It is a schematic view of the shielding layer of the present application;

[0060] Figure 12Schematic view of the heating layer and the shielding layer combination of the present application. DETAILED DESCRIPTION

[0061] The present application will be further described below in conjunction with the drawings and specific embodiments. The advantages and features of the present application will be more apparent from the following description. It should be noted that the drawings are very simplified and all use non-precise proportions, only to facilitate, clear to assist the purpose of describing the embodiments of the present application. In order to make the purpose, features and advantages of the present application more obvious and easy to understand, please refer to the drawings. It should be noted that the structure, proportion, size, etc. shown in the drawings attached to the present specification, are only used to cooperate with the content disclosed in the specification, for those skilled in the art to understand and read, and are not used to limit the conditions of the present application, therefore, any modification of the structure, change of the proportion relationship or adjustment of the size, without affecting the effect and purpose that can be produced by the present application, should still fall within the scope of the technical content disclosed by the present application.

[0062] Figure 1 The structure of the etching equipment of the present application is shown, taking ICP as an example, as shown in Figure 1 The etching equipment includes a chamber 201, a base 202, a dielectric window 203, a heating assembly 100, a pressing plate 242 and a base 300. The chamber 201 is used for processing wafers, and the wafers are etched by the etching process. The base 202 is arranged in the chamber 201; the dielectric window 203 is arranged above the chamber 201; the heating assembly 100 is arranged on the upper surface of the dielectric window 203, used for controlling the temperature of the dielectric window 203; the pressing plate 242 is arranged above the heating assembly 100, used for fixing the heating assembly on the dielectric window 203, and also used for sealing the dielectric window, i.e. sealing the upper dielectric window 2031 and the lower dielectric window 2032 of the dielectric window. Specifically, the heating assembly 100 is arranged in the central region of the upper surface of the dielectric window 203, used for heating the central region of the dielectric window, the heating assembly 100 includes a circular main body, a plurality of fan-shaped through holes 160 are arranged on the circular main body along the circumferential direction of the circular main body. The circular main body is concentric with the dielectric window (i.e. concentric). Preferably, the fan-shaped through holes are fan ring-shaped, a plurality of fan-shaped through holes 160 are arranged in a ring shape along the circumferential direction, the interval of two adjacent fan-shaped through holes 160 in the circumferential direction is the same, i.e. uniformly distributed in the circumferential direction. The side edges of the two adjacent fan-shaped through holes 160 are parallel.

[0063] The base 300 is arranged between the media window 203 and the upper edge of the chamber 201, and the base is annular and comprises an edge heating element 320 for heating the edge region of the media window. The media window can be uniformly controlled in temperature by the heating assembly 100 in the central region and the edge heating element 320 in the edge.

[0064] The media window 203 or the platen 242 is provided with a support block 2033 configured to support the heating assembly through the fan-shaped through holes 160. Preferably, the support block 2033 is arranged on the upper surface of the media window 203 or the lower surface of the platen 242, and the support block 2033 is integrally formed with the media window 203 or the platen 242; the shape and size of the support block 2033 are adapted to the shape and size of the fan-shaped through holes 160; further preferably, the number of the support blocks 2033 is the same as the number of the fan-shaped through holes 160, and the fan-shaped through holes 160 and the support blocks are uniformly distributed along the circumferential direction. Since the heating assembly 100 is thin and has a certain flexibility, the compression resistance is poor, and the support block 2033 of the present application can well protect the heating assembly and prevent it from being squeezed by excessive force, while the heating assembly can be well pressed on the upper surface of the media window by the platen, improving the heat conduction efficiency.

[0065] The etching device further comprises a process gas source 208, a coil 241, a coil support 204, a first plasma source 205, a second plasma source 206, a matcher 207 and a controller 209. The process gas source 208 is connected to the media window 203 through a pipeline for delivering process gas into the chamber 201. The coil is arranged above the heating assembly 100 and fixed above the chamber 201 by the coil support 204. The first plasma source 205 is connected to the coil 241 through the matcher for delivering a radio frequency signal to the coil, so as to generate plasma in the chamber 201 in the etching process. The second plasma source 206 is connected to the electrode in the base through the matcher 207, and the controller 209 is connected to the first plasma source 205 and the second plasma source 206 respectively for controlling the first plasma source 205 and the second plasma source 206.

[0066] Figure 2 The structure of the upper part of the etching device of the present application is shown in the schematic structural view as shown in Figure 2As shown, optionally, the coil support 204 is cross-shaped. The coil support 204 is fixed to the base 300 by vertically extending supports 244. For example, there can be four supports, respectively located at the four ends of the cross shape. The upper end of the supports 244 is connected to the end of the cross shape, and its lower end is connected to the outer edge of the upper surface of the base 300. The medium window 203 includes an upper medium window 2031 and a lower medium window 2032. The medium window 203 can be circular, for example. The upper medium window 2031 and the lower medium window 2032 are also circular, and are concentric and stacked vertically. The diameter of the upper medium window is smaller than the diameter of the lower medium window. An air inlet area is provided at the center of the upper medium window for connecting to the process gas source 208 to introduce process gas into the chamber 201.

[0067] The lower surface edge of the lower medium window 2032 is sealed to the inner edge of the upper surface of the base 300. The diameter of the circular body of the heating assembly 100 is the same as the diameter of the lower medium window 2032. The coil includes an inner coil and an outer coil disposed on the same plane and concentrically. The center of the inner coil and the outer coil is the center of the medium window. The inner coil is disposed in the center of the medium window, and the outer coil is disposed at the edge of the medium window. The fan-shaped through hole 160 is disposed in the area between the inner coil and the outer coil. The diameter of the pressure plate 242 is slightly smaller than the minimum diameter of the outer coil. The diameter of the upper medium window is slightly smaller than the diameter of the pressure plate. The pressure plate 242 is fixed to the lower medium window by screws disposed on its edge, thereby sealing the upper medium window 2031 and the lower medium window 2032.

[0068] Figures 3-5 A schematic diagram of the base structure is shown, such as... Figure 3 As shown, the base 300 also includes a ring 310 and a clamping member 330. The ring 310 includes an upper surface, a lower surface, an inner sidewall, and an outer sidewall. The outer sidewall of the ring 310 has a transverse groove extending circumferentially along the ring 310. The edge heating member 320 is disposed inside the transverse groove, and the clamping member 330 is disposed outside the transverse groove. The clamping member 330 is configured to provide radial pressure to the edge heating member 320, which allows the edge heating member 320 to fit tightly against the transverse groove, thereby providing better heat conduction. Optionally, the edge heating member 320 is a heating wire that surrounds the base 300.

[0069] like Figure 4 As shown, the base 300 also includes a fastener 340, which is vertically arranged and configured to extend from the upper surface of the ring 310 to the transverse groove to fix the clamping member 330. The lower end 341 of the fastener 340 is frustoconical, as shown...Figure 5 As shown, the upper surface of the pressing member 330 is provided with a reverse circular cone groove 332 matched with the circular cone lower end 341. The circular cone lower end and the reverse circular cone groove 332 can precisely position and adjust the pressing member 330, while providing radial force.

[0070] Optionally, the fastener is a bolt, the lower end 341 of the bolt is not provided with a thread, and the other positions of the screw rod of the bolt are provided with threads. The pressing member 330 is at least two arc segments spliced into a complete ring; as Figure 5 As shown, preferably, the number of the pressing member 330 is two. The inner side wall 331 of the pressing member 330 is configured as an arc groove matched with the shape of the edge heating member 320. Preferably, the cross section of the edge heating member 320 is circular, and the arc groove of the inner side wall 331 of the pressing member 330 is a semicircular arc. The cross section of the base 300 is a trapezoid, the lower base of the trapezoid is arranged on the upper surface, the upper base of the trapezoid is arranged on the lower surface, and the height of the trapezoid is arranged on the outer side wall.

[0071] Figures 6-8 The structure diagram of the heating assembly of the present application is shown in the figure, as Figures 6-8 As shown, the circular body of the heating assembly 100 includes an upper insulating layer 110, a heating layer 120, a shielding layer 130, and a lower flexible heat-conducting insulating layer 140; the heating layer 120 is arranged below the upper insulating layer 110, the shielding layer 130 is arranged below the heating layer 120, and the lower flexible heat-conducting insulating layer 140 is arranged below the shielding layer 130. Among them, the diameter of the shielding layer 130 is larger than that of the heating layer, so as to form an exposed part 151 at the circumferential edge of the circular body; as Figure 7 As shown, preferably, the diameters of the upper insulating layer 110 and the heating layer 120 are the same, and the diameters of the shielding layer 130 and the lower flexible heat-conducting insulating layer 140 are the same. Among them, the exposed part is almost formed at the edge of the entire circular body, and the area is large, so that the connection between the exposed part 151 and the grounding member 243 has a larger grounding area, and the connection is more reliable and stable.

[0072] Preferably, the thickness D of the circular body is 1mm < D ≤ 5mm. The thickness d of the heating layer is 0.1mm < d ≤ 1mm. The heating layer 120 is made of PI or PTFE material, which can realize an ultra-thin heating layer. The lower flexible heat-conducting insulating layer 140 is a silica gel cloth, which has good flexibility and heat conductivity. The flexibility can promote better adhesion, thereby improving the heat conduction efficiency. The shielding layer is made of metal, such as aluminum. In summary, the heating assembly 100 has the characteristics of ultra-thin and flexibility. The flexibility can make the heating assembly better adhere to the medium window, improve the heat conduction efficiency, and the ultra-thin can be more easily arranged between the medium window and the coil, saving space.

[0073] Figure 9 An exploded view of the heating assembly is shown, Figures 10-12 A structural schematic view of the shielding layer and the heating layer is shown, as Figures 10-12 As shown, the shielding layer 130 includes at least two shielding pieces 131, preferably four shielding pieces 131, which form a generally circular shape in the horizontal plane. The shielding piece 131 includes a circumferential extension 132 and a radial extension connected to the circumferential extension, one end of the radial extension being connected to the circumferential extension and the other end being vacant. Optionally, the radial extension of the shielding piece includes at least two long radial extensions 134 and at least two short radial extensions 133, the at least one short radial extension 133 being arranged between the two long radial extensions 134. Optionally, the short radial extensions 133 and the long radial extensions 134 are distributed at intervals, the number of short radial extensions 133 being three and the number of long radial extensions 134 being three.

[0074] The heating layer includes at least two heating pieces 121, preferably four heating pieces 121, which form a generally circular shape in the horizontal plane. The heating piece 121 includes a circumferential extension 122 and a radial extension connected to the circumferential extension, one end of the radial extension being connected to the circumferential extension and the other end being vacant. Optionally, the radial extension of the heating piece 121 includes at least two long radial extensions 124 and at least two short radial extensions 123, the at least one short radial extension being arranged between the two long radial extensions. Optionally, the short radial extensions 133 and the long radial extensions 134 are distributed at intervals, the number of short radial extensions 133 being three and the number of long radial extensions 134 being three.

[0075] Optionally, the shapes of the shielding pieces 131 and the heating pieces 121 are the same. The four heating pieces are electrically connected, for example, in series. The four shielding pieces are disconnected (i.e., not connected), preventing the generation of induced circumferential current in the opposite direction of the coil current, which would have a thermal effect. The shielding pieces 131 are disconnected by a radial extension disconnecting portion 152, which is a gap of equal width extending radially, disconnecting the four shielding pieces 131 two by two. As Figure 8 Due to the presence of the disconnecting portion 152, at the position of the disconnecting portion 152, in the O2-O2' cross-sectional view, the circular body only has the upper insulating layer 110 and the lower flexible heat-conducting insulating layer 140.

[0076] As Figure 12As shown, the heating element 121 and the shielding element 131 are stacked vertically, with the circumferential extension of the heating element and the circumferential extension of the shielding element 131 coinciding. The radial extension of the heating element 121 and the radial extension of the shielding element 131 also coincide. The circumferential width of the circumferential extension of the shielding element 131 is greater than the circumferential width of the circumferential extension of the heating element 121, forming an exposed portion 151 at the circumferential edge of the circular body. The widths of the radial extensions of the heating element 121 and the shielding element 131 can be equal. A fan-shaped through hole 160 is formed in the fan-shaped gap between the radial extensions of the heating element and the shielding element.

[0077] Further optional, such as Figure 9 As shown, the downward projection of the upper insulating layer 110 covers the downward projections of the heating layer 120 and the shielding layer 130. The upper insulating layer 110 and the lower flexible thermally conductive insulating layer 140 have the same shape, both being spoke-shaped. The spoke shape includes an outer ring, an inner ring, and spokes. The spokes extend radially, with one end connected to the outer ring and the other end connected to the inner ring. The projection of the outer ring covers the circumferential extensions of the heating element and the shielding element. The projection of the spokes covers the radial extensions of the heating element and the shielding element, with the unused ends of the radial extensions extending to the projection of the inner ring. Fan-shaped through holes 160 are formed between the spokes of the spoke shape.

[0078] like Figure 2 As shown, the etching apparatus also includes a grounding member 243, which presses against the exposed portion 151, specifically against the upper surface of the exposed portion 151. Optionally, the grounding member 243 includes a pressure ring 2432 and a support rod 2431. The pressure ring 2432 presses against the upper surface of the exposed portion, and the support rod 2431 extends vertically, with one end connected to the outer side of the pressure ring and the other end connected to the upper surface of the base. Preferably, the pressure ring is composed of multiple ring segments, for example, four ring segments form a complete annular pressure ring.

[0079] It is to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting; it is not intended to exclude myriad other embodiments of the present application that other present or future devices possess. That is, although specific embodiments have been disclosed herein, one of ordinary skill in the art will recognize that modifications and / or substitutions can be made to the disclosed embodiments without departing from the scope and spirit of the application. In addition, it is not intended that the scope of the application be limited to the examples described herein. Many modifications and variations of the present application are possible and will be apparent to those of ordinary skill in the art once the application has been made available or disclosed herein. Moreover, concepts have been described herein in one embodiment or implementation in language specific to structural features and / or methodological acts. It is to be understood that given the overall nature of the application, various changes in the implementations can be realized. Furthermore, it is to be understood that the specific order or hierarchy of steps in the methods disclosed is an example and the

[0080] While the application has been described in detail and with reference to specific embodiments thereof, it will be apparent to one of ordinary skill in the art that various changes and modifications can be made therein without departing from the spirit and scope of the application. It is therefore intended to cover in the appended claims all such changes and modifications that are within the scope of this application.

Claims

1. An etching apparatus, characterized in that, include: chamber; A base, wherein the base is disposed within the cavity; A medium window is disposed above the chamber; A heating assembly is disposed in the central region of the upper surface of the medium window for heating the central region of the medium window. The heating assembly includes a circular body with a plurality of fan-shaped through holes arranged circumferentially on the circular body. A base is disposed between the medium window and the upper edge of the chamber, and the base includes an edge heating element for heating the edge region of the medium window; A pressure plate, which is disposed above the heating assembly, is used to fix the heating assembly to the medium window; The medium window or pressure plate is provided with a support block, which is configured to support the heating component through the fan-shaped through hole; The circular body includes: Upper insulating layer; A heating layer is disposed below the upper insulating layer; A shielding layer is disposed below the heating layer; A lower flexible thermally conductive insulating layer is disposed below the shielding layer; The diameter of the shielding layer is larger than that of the heating layer, so as to form an exposed portion at the circumferential edge of the circular body; The base also includes a ring and a clamping member. The outer side wall of the base is provided with a transverse groove extending circumferentially along the ring. The edge heating member is provided on the inner side of the transverse groove, and the clamping member is provided on the outer side of the transverse groove.

2. The etching apparatus as described in claim 1, characterized in that, The thickness D of the circular body is 1mm < D ≤ 5mm.

3. The etching apparatus as described in claim 1, characterized in that, The thickness d of the heating layer is 0.1mm < d ≤ 1mm.

4. The etching apparatus as described in claim 1, characterized in that, The shielding layer includes at least two shielding sheets, each shielding sheet including a circumferential extension portion and a radial extension portion connected to the circumferential extension portion.

5. The etching apparatus as described in claim 4, characterized in that, The heating layer includes at least two heating elements, each heating element comprising a circumferential extension portion and a radial extension portion connected to the circumferential extension portion.

6. The etching apparatus as described in claim 5, characterized in that, The number of heating elements is 4, and the heating elements are electrically connected to each other.

7. The etching apparatus as described in claim 4, characterized in that, The shielding plates consist of four pieces, and the shielding plates are disconnected from each other.

8. The etching apparatus as described in claim 5, characterized in that, The shielding sheet and the heating sheet have the same shape.

9. The etching apparatus as described in claim 5, characterized in that, The radial extension portion of the shielding sheet includes at least two long radial extension portions and at least two short radial extension portions, wherein at least one short radial extension portion is disposed between the two long radial extension portions.

10. The etching apparatus as described in claim 9, characterized in that, The radial extension portion of the heating element includes at least two long radial extension portions and at least two short radial extension portions, wherein at least one short radial extension portion is disposed between the two long radial extension portions.

11. The etching apparatus as described in claim 10, characterized in that, The circumferential width of the shielding sheet is greater than the circumferential width of the heating sheet, so as to form an exposed portion at the circumferential edge of the circular body.

12. The etching apparatus as described in claim 1, characterized in that, The downward projection of the upper insulating layer covers the downward projection of the heating layer and the shielding layer.

13. The etching apparatus as described in claim 12, characterized in that, The diameter of the lower flexible thermally conductive insulating layer is larger than the diameter of the upper insulating layer.

14. The etching apparatus as described in claim 12, characterized in that, The upper insulating layer and the lower flexible thermally conductive insulating layer have the same shape, both being spoke-shaped.

15. The etching apparatus as described in claim 1, characterized in that, The heating layer is made of PI or PTFE material.

16. The etching apparatus as claimed in claim 1, characterized in that, The clamping element is configured to provide pressure to the edge heating element radially.

17. The etching apparatus as described in claim 16, characterized in that, The base also includes a fastener configured to extend from the upper surface of the ring body through the transverse groove to secure the clamping member.

18. The etching apparatus as claimed in claim 17, characterized in that, The lower end of the fastener is frustum-shaped, and the upper surface of the clamping member is provided with a chamfered frustum groove that mates with the lower end of the frustum-shaped fastener.

19. The etching apparatus as described in claim 18, characterized in that, The clamping element consists of at least two arc-shaped segments.

20. The etching apparatus as described in claim 16, characterized in that, The inner wall of the clamping member is configured as an arcuate groove that matches the shape of the edge heating member.

21. The etching apparatus as claimed in claim 1, characterized in that, It also includes a grounding element, which is pressed onto the exposed portion.

22. The etching apparatus as described in claim 21, characterized in that, The grounding component includes a pressure ring and a support rod. The pressure ring presses against the upper surface of the exposed portion, and the support rod extends vertically, with one end connected to the pressure ring and the other end connected to the base.

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