A swing type drying tank suitable for wafers of various sizes

Abstract

The application relates to a swing type drying groove suitable for multiple sizes of wafers and belongs to the technical field of wafer production equipment. The swing type drying groove suitable for multiple sizes of wafers is composed of a groove body, a swing mechanism and a wafer basket placing seat arranged on the swing mechanism. The first supporting block, the second supporting block and the third supporting block on the wafer basket placing seat and two side plates realize the support of a supporting frame on two first wafer baskets and second wafer baskets with different sizes, so that wafer cleaning production equipment can directly adapt to wafers with different sizes, the adaptability of the equipment is improved, and the support on the wafer basket is stable and reliable.

Description

Technical Field

[0001] The present application belongs to the technical field of wafer production equipment, and in particular relates to a swing drying tank suitable for wafers of multiple sizes. Background Art

[0002] Semiconductor wafer cleaning requires processes such as alkaline cleaning solution cleaning, pure water cleaning, hydrofluoric acid cleaning, ozone water cleaning, and drying. Wafer drying is generally the final step in wafer cleaning, removing residual cleaning solution from the wafer surface, preventing wafer oxidation, and controlling surface moisture and surface cleanliness. Whether drying or cleaning, a support frame is required to support the wafer basket. Chinese patent publication CN115218627A discloses a swing mechanism for wafer drying equipment, which is located in a drying tank, drives the wafer to swing and relies on dry gas to dry the wafer. However, existing swing mechanisms for wafer drying equipment can only support wafer baskets of fixed sizes. Currently, wafers come in a variety of sizes, such as 6 inches, 8 inches, and even 12 inches. When equipment needs to process wafers of different sizes, the existing technology requires replacing the support frame to adapt to wafers of different sizes. In other words, an already installed wafer drying equipment can only accommodate wafers of one size, limiting the versatility of the equipment. Summary of the Invention

[0003] The technical problem to be solved by the present invention is to provide a swing drying tank suitable for wafers of multiple sizes in order to overcome the deficiencies in the prior art.

[0004] The technical solution adopted by the present invention to solve its technical problem is:

[0005] A swing drying tank suitable for wafers of various sizes, comprising:

[0006] trough body;

[0007] The swing mechanism includes: a horizontal sliding module disposed outside the tank body, a slider disposed on the horizontal sliding module, and an arched sliding arm mounted on the slider, wherein the arched sliding arm extends into the tank body, and a wafer basket placement seat is mounted on the portion of the arched sliding arm located within the tank body; when the horizontal sliding module is in operation, it can drive the slider, the arched sliding arm, and the wafer basket placement seat to swing;

[0008] The wafer basket placement seat includes:

[0009] base;

[0010] There are two side panels, located at both ends of the base;

[0011] The first support block, the second support block and the third support block are all arranged on the base between the two side plates, and the third support block is located between the first support block and the second support block;

[0012] The first support block is provided with a first step tread and a second step tread, the second support block is provided with a third step tread, and the third support block is provided with a fourth step tread. The third step tread is provided at a lower height than the second step tread. The first step tread and the third step tread are of the same height, and the second step tread and the fourth step tread are of the same height.

[0013] The first step tread and the third step tread are used to support the bottom of the first wafer basket, and the side surface of the second support block and one of the side plates limit the side surface of the first wafer basket;

[0014] The second step tread and the fourth step tread are used to support the bottom of the second wafer basket, and the two side plates limit the side surfaces of the second wafer basket.

[0015] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the orientation of the first step riser corresponding to the second step tread is opposite to the orientation of the second step riser corresponding to the third step tread.

[0016] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the first supporting block has a U-shaped groove, and the bottom of the U-shaped groove is the first step surface.

[0017] Preferably, in the swing drying tank suitable for wafers of multiple sizes of the present invention, the middle of the side panel is hollowed out, a mounting block is installed between the two side panels, the mounting block is fixed to the inner wall of the hollowed-out portion of the side panel, and top panels are provided on both sides of the mounting block.

[0018] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the top surfaces of the first step tread, the second step tread, the third step tread, and the fourth step tread are inclined surfaces.

[0019] Preferably, in the swing drying tank applicable to wafers of various sizes of the present invention, the mounting block has a hollow portion in the middle.

[0020] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the third supporting block is located at the midpoint of the two side plates.

[0021] Preferably, the swing drying tank suitable for wafers of multiple sizes of the present invention has three mounting grooves formed on the base, in which the first support block, the second support block and the third support block are installed, and the installation of the first support block, the second support block and the third support block can be positioned through the mounting grooves.

[0022] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the first wafer basket is a 6-inch wafer basket for accommodating 6-inch wafers, and the second wafer basket is an 8-inch wafer basket for accommodating 8-inch wafers.

[0023] The beneficial effects of the present invention are:

[0024] The present invention discloses an oscillating drying tank suitable for wafers of various sizes, comprising a tank body, an oscillating mechanism, and a wafer basket holder mounted on the oscillating mechanism. The oscillating mechanism drives the wafer basket holder and the wafer basket mounted on the holder to oscillate, thereby combining the wafer oscillation with the gas flow within the tank body to achieve efficient and uniform drying of the wafers. By utilizing three support blocks (first, second, and third) on the wafer basket holder and two side panels, a single support frame supports two first and second wafer baskets of different sizes. This allows the oscillating drying tank to directly accommodate wafers of varying sizes, improving the equipment's adaptability while providing stable and reliable support for the wafer baskets. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The technical solution of the present application is further described below with reference to the accompanying drawings and embodiments.

[0026] Figure 1 This is a schematic structural diagram of an oscillating drying tank suitable for wafers of various sizes according to an embodiment of the present application;

[0027] Figure 2 is a cross-sectional view of an oscillating drying tank suitable for wafers of multiple sizes according to an embodiment of the present application;

[0028] Figure 3 It is a structural diagram of the swing mechanism of an embodiment of the present application;

[0029] Figure 4 1 is a schematic structural diagram of a multi-size wafer basket support frame supporting a first wafer basket according to an embodiment of the present application;

[0030] Figure 5 1 is a schematic structural diagram of a multi-size wafer basket support frame supporting a second wafer basket according to an embodiment of the present application;

[0031] Figure 6 This is a schematic structural diagram of a multi-size wafer basket support frame applicable to an embodiment of the present application;

[0032] Figure 7 is a side view of a multi-sized wafer basket support frame supporting a first wafer basket according to an embodiment of the present application;

[0033] Figure 8 is a side view of a multi-sized wafer basket support frame supporting a second wafer basket according to an embodiment of the present application;

[0034] The reference numerals in the figures are:

[0035] 1 Wafer basket holder;

[0036] 2 tank body;

[0037] 3. Swing mechanism;

[0038] 11 base;

[0039] 12 side panels;

[0040] 13 first support block;

[0041] 14 second supporting block;

[0042] 15 third support block;

[0043] 16 top plate;

[0044] 17 mounting blocks;

[0045] 31 horizontal sliding module;

[0046] 32 sliders;

[0047] 33 arched sliding arms;

[0048] 34 Rotate the mount;

[0049] 91 first wafer basket;

[0050] 92 second wafer basket;

[0051] 111 mounting slot;

[0052] 131 First tread;

[0053] 132 Second stair tread;

[0054] 133 First step riser;

[0055] 141 Third stair tread;

[0056] 142 Second step riser;

[0057] 151 fourth stair tread;

[0058] 321 pulley;

[0059] 331 Slide slot. DETAILED DESCRIPTION

[0060] It should be noted that, unless there is any conflict, the embodiments and features in the embodiments of this application can be combined with each other.

[0061] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the scope of protection of the present application. In addition, the terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0062] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on specific circumstances.

[0063] The technical solution of the present application will be described in detail below with reference to the accompanying drawings and in combination with embodiments.

[0064] Example

[0065] This embodiment provides a swing drying tank suitable for wafers of various sizes, such as Figure 1 and 2 Shown, including:

[0066] Tank 2;

[0067] Swing mechanism 3, such as Figure 3As shown, it comprises: a horizontal sliding module 31 arranged outside the tank body 2, a sliding block 32 arranged on the horizontal sliding module 31, an arched sliding arm 33 mounted on the sliding block 32, the arched sliding arm 33 extends into the tank body 2, and the part of the arched sliding arm 33 located in the tank body 2 is provided with a wafer basket placing seat 1; the horizontal sliding module 31 is composed of a motor and a sliding rail, which can drive the sliding block 32, the arched sliding arm 33 and the wafer basket placing seat 1 to swing when working; the specific structure of the arched sliding arm 33 is to extend from the outside of the tank body 2 to the inside of the tank body 2, so the arched sliding arm 33 passes over the top of the tank body 2 and extends into the tank body 2 to form a first arm outside the tank body 2 and a second arm inside the tank body 2, and the bottom of the second arm is provided with the wafer basket placing seat 1. The bottom end of the first arm is rotatably connected to a rotating mounting seat 34 (bearing seat), which is arranged outside the tank body 2, and the first arm has a sliding groove 331 in the middle, and the sliding block 32 is provided with a pulley 321 located in the sliding groove 331.

[0068] As shown in the drawings, the wafer basket placing seat 1 comprises: Figure 4-8

[0069] a base 11;

[0070] two side plates 12, respectively located at both ends of the base 11;

[0071] a first support block 13, a second support block 14 and a third support block 15, all of which are arranged on the base 11 between the two side plates 12, and the third support block 15 is located between the first support block 13 and the second support block 14;

[0072] the first support block 13 is provided with a first stepped tread 131 and a second stepped tread 132, the second support block 14 is provided with a third stepped tread 141, and the third support block 15 is provided with a fourth stepped tread 151, the third stepped tread 141 is arranged lower than the second stepped tread 132, the first stepped tread 131 is arranged at the same height as the third stepped tread 141, and the second stepped tread 132 is arranged at the same height as the fourth stepped tread 151;

[0073] the first stepped tread 131 and the third stepped tread 141 are used to support the bottom of the first wafer basket, and the side of the second support block 14 and one of the side plates 12 limit the side of the first wafer basket;

[0074] the second stepped tread 132 and the fourth stepped tread 151 are used to support the bottom of the second wafer basket, and the two side plates 12 limit the sides of the second wafer basket.

[0075] ​The swing drying tank of the present application is suitable for wafers of multiple sizes. In the wafer placement seat 1, three support blocks, namely the first support block 13, the second support block 14 and the third support block 15, and two side plates 12 are used to realize a support frame to support two first wafer baskets and second wafer baskets of different sizes, so that the swing drying tank can directly adapt to wafers of different sizes, improve the adaptability of the equipment, and at the same time provide stable and reliable support for the wafer baskets.

[0076] Furthermore, the orientation of the first step riser 133 corresponding to the second step tread 132 is opposite to the orientation of the second step riser 142 corresponding to the third step tread 141 (the first step riser 133 faces inward and the second step riser 142 faces outward), and the wafer basket is positioned laterally by the two risers.

[0077] Furthermore, a U-shaped groove is formed on the first supporting block 13, and the bottom of the U-shaped groove is the first step 131. The U-shaped groove is also used to clamp the bottom of the first wafer basket.

[0078] Furthermore, the middle of the side panel 12 is hollowed out, and a mounting block 17 is installed between the two side panels 12. The mounting block 17 is fixed to the inner wall of the hollowed-out portion of the side panel 12. Top plates 16 are provided on both sides of the mounting block 17. When the wafer basket is placed on the wafer basket placement seat 1, the top plate 16 can lift the wafers in the wafer basket to a certain height.

[0079] Furthermore, the top surfaces of the first step 131 , the second step 132 , the third step 141 , and the fourth step 151 are inclined surfaces, forming pointed ends to reduce the contact area with the wafer basket.

[0080] Furthermore, the middle of the mounting block 17 is hollowed out to reduce material usage, reduce weight and make the airflow path smoother.

[0081] Furthermore, the third support block 15 is located at the midpoint of the two side panels 12 .

[0082] Furthermore, the base 11 is formed with three mounting slots 111, into which the first support block 13, the second support block 14, and the third support block 15 are mounted. The mounting slots 111 allow for positioning of the first support block 13, the second support block 14, and the third support block 15. The first support block 13, the second support block 14, and the third support block 15 are mounted on the base 11 using screws, and elongated holes are provided on the first support block 13, the second support block 14, and the third support block 15 to facilitate position adjustment.

[0083] The applicable multi-size wafer basket support rack of the present application can be used for accommodating a 6-inch wafer basket (first wafer basket 91 ) for accommodating 6-inch wafers or an 8-inch wafer basket (second wafer basket 92 ) for accommodating 8-inch wafers.

[0084] It should be noted that a cover can also be provided on the tank body 2 .

[0085] Based on the above-mentioned ideal embodiments of this application, and in accordance with the above description, relevant personnel can make various changes and modifications without departing from the scope of the technical concept of this application. The technical scope of this application is not limited to the contents of the specification, but must be determined according to the scope of the claims.

Claims

1. A swing drying tank suitable for wafers of various sizes, characterized in that: include: trough body; The swing mechanism includes: a horizontal sliding module disposed outside the tank body, a slider disposed on the horizontal sliding module, and an arched sliding arm mounted on the slider, wherein the arched sliding arm extends into the tank body, and a wafer basket placement seat is mounted on the portion of the arched sliding arm located within the tank body; when the horizontal sliding module is in operation, it can drive the slider, the arched sliding arm, and the wafer basket placement seat to swing; The wafer basket placement seat includes: base; There are two side panels, located at both ends of the base; The first support block, the second support block and the third support block are all arranged on the base between the two side plates, and the third support block is located between the first support block and the second support block; The first support block is provided with a first step tread and a second step tread, the second support block is provided with a third step tread, and the third support block is provided with a fourth step tread. The third step tread is provided at a lower height than the second step tread. The first step tread and the third step tread are of the same height, and the second step tread and the fourth step tread are of the same height. The first step tread and the third step tread are used to support the bottom of the first wafer basket, and the side surface of the second support block and one of the side plates limit the side surface of the first wafer basket; The second step tread and the fourth step tread are used to support the bottom of the second wafer basket and the two side plates limit the sides of the second wafer basket; The orientation of the first step riser corresponding to the second step tread is opposite to the orientation of the second step riser corresponding to the third step tread; The first support block has a U-shaped groove, and the bottom of the U-shaped groove is the first step surface; Three mounting grooves are formed on the base, and the first support block, the second support block and the third support block are installed in the mounting grooves. The first support block, the second support block and the third support block can be positioned through the mounting grooves.

2. The swing drying tank suitable for wafers of multiple sizes according to claim 1, characterized in that: The middle of the side plate is hollowed out, and a mounting block is installed between the two side plates. The mounting block is fixed to the inner wall of the hollowed-out part of the side plate, and top plates are provided on both sides of the mounting block.

3. The swing drying tank suitable for wafers of multiple sizes according to claim 1, characterized in that: The top surfaces of the first step tread, the second step tread, the third step tread and the fourth step tread are inclined surfaces.

4. The swing drying tank suitable for wafers of multiple sizes according to claim 2, characterized in that: The middle of the installation block is hollowed out.

5. The swing drying tank suitable for wafers of multiple sizes according to claim 3, characterized in that: The third support block is located at the midpoint of the two side plates.

6. The swing drying tank suitable for wafers of multiple sizes according to claim 1, characterized in that: The first wafer basket is a 6-inch wafer basket for accommodating 6-inch wafers, and the second wafer basket is an 8-inch wafer basket for accommodating 8-inch wafers.

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