Circulating gas-liquid two-phase discharge plasma device and system

Abstract

The application provides a circulating gas-liquid two-phase discharge plasma device and system, and belongs to the technical field of plasma.The device comprises: an insulation ionization area, into which a gas-phase medium is passed; a liquid film generating unit arranged above the insulation ionization area and used for storing and discharging a liquid-phase medium; the liquid-phase medium discharged by the liquid film generating unit forms a downward flowing liquid film in the insulation ionization area; a discharge unit used for inducing the insulation ionization area to generate discharge, ionizing the gas-phase medium to generate plasma, and adsorbing the plasma in the flowing liquid film; and a circulating unit arranged below the insulation ionization area, used for collecting the liquid-phase medium flowing from the insulation ionization area, and automatically returning the collected liquid-phase medium to the liquid film generating unit.The application improves the reaction activity, action area and uniformity of plasma to the liquid-phase medium, realizes the efficient utilization of the liquid-phase medium to the plasma, and has the advantages of wide application range and strong practicability.

Description

Technical Field

[0001] This invention relates to the field of plasma technology, and more specifically to a circulating gas-liquid two-phase discharge plasma device and a circulating gas-liquid two-phase discharge plasma system. Background Technology

[0002] Low-temperature plasma technology has received widespread attention and research in environmental pollution control, material modification, and biomedicine due to its advantages such as flexible application, convenient control, and high reactivity.

[0003] Since the generation of low-temperature plasma involves a series of excited ionization processes of a large number of molecules driven by external energy, the efficient utilization of external driving energy to achieve maximum excited ionization is the main way to improve the application of low-temperature plasma technology.

[0004] In gas discharge environments, the insulating properties of the gas medium under conditions without external excitation energy allow a series of excitation ionization processes to be induced in the discharge space when the external driving energy reaches the excitation ionization threshold of the gas molecules. In partially conductive liquid discharge environments, the liquid only undergoes charge rearrangement under an electric field, rather than generating a series of highly reactive particles. In non-conductive liquid environments, since the breakdown threshold of the liquid phase medium is usually higher than that of the gas phase medium, the discharge process based on liquid conditions usually occurs at the gas phase and gas-liquid two-phase surfaces, resulting in the plasma region's effect on the liquid phase medium mainly concentrated on the liquid surface.

[0005] Current research primarily achieves internal liquid discharge by increasing the gas-liquid two-phase area through bubbling, thereby establishing a plasma reaction zone within the liquid. However, due to the significant freedom of the bubble state, distribution, and movement within the liquid, controlling the internal plasma reaction zone remains an open question. Summary of the Invention

[0006] The purpose of this invention is to provide a circulating gas-liquid two-phase discharge plasma device and system to solve the problem that plasma cannot be efficiently utilized by liquid media in the prior art.

[0007] To achieve the above objectives, the present invention provides a circulating gas-liquid two-phase discharge plasma device, the device comprising:

[0008] An insulating ionization region, wherein a gaseous medium is introduced into the insulating ionization region;

[0009] A liquid film generating unit is disposed above the insulating ionization region and is used to store and discharge liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a downward flowing liquid film within the insulating ionization region;

[0010] The discharge unit is used to induce discharge in the insulating ionization region, ionize the gaseous medium to generate plasma, and the plasma is adsorbed in the flowing liquid film.

[0011] The circulation unit, located below the insulating ionization zone, is used to collect the liquid phase medium flowing down from the insulating ionization zone and automatically return the collected liquid phase medium to the liquid film generating unit.

[0012] Preferably, it further includes: a chassis, wherein the insulating ionization region, the liquid film generating unit, the discharge unit and the circulation unit are all installed inside the chassis, and an air inlet for conveying the gaseous medium to the insulating ionization region is provided on one side wall of the chassis, and an exhaust port for discharging the gaseous medium is provided on the other side wall.

[0013] Preferably, the chassis located inside the air intake is provided with multiple layers of airflow rectifier plates, each layer of airflow rectifier plate is provided with a number of airflow rectifier holes, and the airflow rectifier holes on adjacent airflow rectifier plates are staggered.

[0014] Preferably, the insulating ionization region includes: at least one insulator and at least one gas phase discharge region, the gas phase discharge region being located next to the insulator, the liquid medium flowing downward along the outer wall of the insulator near the gas phase discharge region to form a liquid film, and the discharge unit inducing the gas phase discharge region to generate a discharge.

[0015] Preferably, the insulator consists of two pieces, and the gap between the two insulators forms a gas phase discharge region.

[0016] Preferably, the number of insulators is at least three, and all insulators are arranged in sequence at equal intervals, with the gap between each pair of adjacent insulators forming a gas phase discharge region.

[0017] Preferably, the discharge unit includes a high-voltage electrode and a low-voltage electrode, which are respectively mounted on the non-liquid film surfaces of the two insulators at the beginning and end.

[0018] Preferably, the liquid film generating unit includes:

[0019] A water collection tank is used to store liquid media.

[0020] At least one water inlet tank is located below the water collection tank. The top of each water inlet tank is connected to the bottom of the water collection tank, and the bottom is connected to the top of the corresponding insulator. The bottom of each water inlet tank is provided with a drain outlet. The liquid phase medium discharged from the drain outlet flows to the side wall of the corresponding insulator to form a water film.

[0021] At least one flow regulation component is installed inside the corresponding water inlet tank to regulate the flow rate of the liquid medium in the water inlet tank;

[0022] At least one set of liquid film rectifiers is installed on the outer wall of the corresponding inlet tank to adjust the height of the drain outlet in order to adjust the thickness of the water film on the outer wall of the insulator.

[0023] Preferably, the flow regulating component includes: a multi-layer liquid flow rectifier plate disposed in the water inlet tank, each layer of the liquid flow rectifier plate having a plurality of liquid flow rectifier holes, and the liquid flow rectifier holes on adjacent layers of the liquid flow rectifier plate being staggered.

[0024] Preferably, the loop unit includes:

[0025] At least one liquid collection tank, each liquid collection tank is installed at the bottom of the corresponding insulator, for collecting liquid phase medium flowing down from the insulator, and each liquid collection tank is provided with a one-way liquid permeation membrane;

[0026] At least one drain pipe, the first end of each drain pipe is connected to the bottom of the corresponding collection tank, and the second end of each drain pipe is connected to a capillary tube, the end of the capillary tube away from the exhaust pipe is connected to the liquid film generating unit.

[0027] Preferably, the diameter of the capillary is smaller than the diameter of the drain pipe, the height of the first end of each drain pipe is higher than the height of the second end, and the liquid collection tank and the drain pipe are pre-filled with liquid phase medium below the one-way liquid permeation membrane.

[0028] Preferably, the insulator is made of a hydrophilic insulating material.

[0029] The present invention also provides a circulating gas-liquid two-phase discharge plasma system, the system comprising:

[0030] The aforementioned circulating gas-liquid two-phase discharge plasma device includes: an insulating ionization region, a liquid film generating unit, and a discharge unit;

[0031] A gas supply device used to deliver a gaseous medium into an insulating ionization zone;

[0032] A liquid supply device is used to deliver liquid phase medium to the liquid film generating unit;

[0033] A control device used to control the start and stop of the discharge unit.

[0034] Through the above technical solution, the present invention has at least the following technical effects:

[0035] 1. The liquid medium of the present invention forms a liquid film in the insulating ionization region, which can improve the penetration of the plasma generated by the ionization of the gas medium into the liquid medium, and improve the reaction activity, action area and uniformity of the plasma on the liquid medium, thereby realizing the efficient utilization of the liquid medium by the plasma.

[0036] 2. The present invention uses a circulation unit to return the liquid phase medium flowing from the insulating ionization region to the liquid film generating unit, thereby realizing the circulation of the liquid phase medium, improving the uniformity of plasma in the liquid phase medium and the practicality of the device.

[0037] 3. This invention can be widely used in the fields of comprehensive wastewater and waste gas treatment, sterilization and disinfection, and biomedicine, and has strong treatment performance.

[0038] Other features and advantages of the present invention will be described in detail in the following detailed description section. Attached Figure Description

[0039] The accompanying drawings are provided to further illustrate embodiments of the present invention and form part of the specification. They are used together with the following detailed description to explain the embodiments of the present invention, but do not constitute a limitation thereof. In the drawings:

[0040] Figure 1 This is a schematic diagram of the overall structure of a circulating gas-liquid two-phase discharge plasma device provided in one embodiment of the present invention.

[0041] Figure 2 This is a side view of a circulating gas-liquid two-phase discharge plasma device provided in an optional embodiment of the present invention;

[0042] Figure 3 This is a side view of the circulating gas-liquid two-phase discharge plasma device provided in the second optional embodiment of the present invention;

[0043] Figure 4 This is a side view of the circulating gas-liquid two-phase discharge plasma device provided in the third optional embodiment of the present invention;

[0044] Figure 5 This is a schematic diagram of the airflow rectifier plate provided in one embodiment of the present invention;

[0045] Figure 6 This is a schematic diagram of the structure of a fluid flow rectifier plate provided in one embodiment of the present invention;

[0046] Figure 7 This is a block diagram of a circulating gas-liquid two-phase discharge plasma system provided in one embodiment of the present invention;

[0047] Figure 8 This is a schematic diagram of the height position of the circulating gas-liquid two-phase discharge plasma device after commissioning, provided in one embodiment of the present invention.

[0048] Explanation of reference numerals in the attached figures

[0049] 1. Liquid film; 2. Chassis; 3. Air inlet; 4. Exhaust outlet; 5. Airflow rectifier plate; 6. Airflow rectifier hole; 7. Insulator; 8. Vapor phase discharge area; 9. High-voltage electrode; 10. Low-voltage electrode; 11. Water collection tank; 12. Water inlet tank; 13. Drain outlet; 14. Liquid flow rectifier plate; 15. Liquid flow rectifier hole; 16. Liquid collection tank; 17. One-way liquid permeation membrane; 18. Drain pipe; 19. Capillary tube; 20. Baffle. Detailed Implementation

[0050] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the scope of the present invention.

[0051] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains; the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the application; the terms “comprising” and “having”, and any variations thereof, in the specification, claims, and foregoing description of the drawings are intended to cover non-exclusive inclusion.

[0052] In the description of the embodiments of this application, technical terms such as "first" and "second" are used only to distinguish different objects and should not be construed as indicating or implying relative importance or implicitly specifying the number, specific order, or primary and secondary relationship of the indicated technical features. In the description of the embodiments of this application, "multiple" means two or more, unless otherwise explicitly defined.

[0053] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0054] In the description of the embodiments of this application, the term "multiple" refers to two or more (including two), similarly, "multiple sets" refers to two or more (including two sets), and "multiple pieces" refers to two or more (including two pieces).

[0055] In the description of the embodiments of this application, unless otherwise expressly specified and limited, technical terms such as "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. For those skilled in the art, the specific meaning of the above terms in the embodiments of this application can be understood according to the specific circumstances.

[0056] Example 1

[0057] Figure 1 This is a schematic diagram of the overall structure of a circulating gas-liquid two-phase discharge plasma device provided in one embodiment of the present invention, as shown below. Figure 1 As shown, this embodiment provides a circulating gas-liquid two-phase discharge plasma device, which includes: an insulating ionization region, a liquid film generating unit, a discharge unit, and a circulation unit;

[0058] A gaseous medium is introduced into the insulating ionization region;

[0059] The liquid film generating unit is disposed above the insulating ionization region and is used to store and discharge the liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a downward flowing liquid film 1 in the insulating ionization region;

[0060] Discharge unit; used to induce discharge in the insulating ionization region, ionize the gaseous medium to generate plasma, and the plasma is adsorbed in the flowing liquid film 1;

[0061] The circulation unit is located below the insulating ionization region. The circulation unit is used to collect the liquid phase medium flowing down from the insulating ionization region and automatically return the collected liquid phase medium to the liquid film generating unit.

[0062] In this embodiment, a certain amount of liquid phase medium is injected into the liquid film generation unit, and then the liquid phase medium is discharged through the liquid film generation unit. The liquid phase medium can form a liquid film 1 in the insulating ionization region. At this time, the discharge unit is controlled to discharge by external coupling and regulation of driving energy, so as to realize the application of gas discharge plasma to the reaction process and energy efficiency optimization under the coexistence of gas-liquid two phases. The penetration power of plasma to liquid phase medium is optimized by liquid film 1, which can effectively improve the proportion and uniformity of liquid phase medium plasma reaction zone, as well as improve the comprehensive utilization efficiency of plasma.

[0063] Secondly, the circulation unit in this embodiment can automatically return the liquid medium flowing down from the insulating ionization region to the liquid film generating unit, thereby realizing the circulation of the liquid medium and improving the uniformity of plasma in the liquid medium and the practicality of the device.

[0064] As a further optimization of this embodiment, the device further includes: a chassis 2, in which the insulating ionization zone, liquid film generating unit, discharge unit and circulation unit are all installed. One side wall of the chassis 2 is provided with an air inlet 3 for conveying gaseous medium to the insulating ionization zone, and the other side wall is provided with an exhaust port 4 for discharging gaseous medium. The gaseous medium enters the chassis 2 through the air inlet 3 and then flows into the insulating ionization zone. After the discharge unit is started, the gaseous medium in the insulating ionization zone is ionized.

[0065] In the treatment of gaseous waste such as exhaust gas, a gaseous medium consisting of a mixture of exhaust gas and air is introduced into the casing 2 through the air inlet 3. The gaseous medium then flows into the insulating ionization zone for ionization, generating plasma, which is used to treat the exhaust gas. To ensure uniform distribution of the gaseous medium within the insulating ionization zone after the mixed gas enters the casing 2, a multi-layer airflow rectifier plate 5 is installed inside the casing 2, located inside the air inlet 3. Figure 5 As shown, the airflow rectifier plate 5 is made of insulating material, such as polytetrafluoroethylene. Each layer of airflow rectifier plate 5 is provided with a plurality of airflow rectifier holes 6. The airflow rectifier holes 6 on adjacent layers of airflow rectifier plates 5 are staggered. In this embodiment, the airflow rectifier plate 5 is preferably provided in two layers. The staggered airflow rectifier holes 6 can improve the dispersion of the gas phase medium and improve the uniformity of the gas phase medium in the insulating ionization region.

[0066] As a further optimization of this embodiment, the insulating ionization region includes: at least one insulator 7 and at least one gas phase discharge region 8. The gas phase discharge region 8 is located next to the insulator 7. The insulator 7 is made of an insulating material with a certain degree of hydrophilicity, such as quartz glass, ceramic, polytetrafluoroethylene, etc. The liquid medium flows downward along the outer wall of the insulator 7 near the gas phase discharge region 8 to form a liquid film 1. The discharge unit induces the gas phase discharge region 8 to generate a discharge.

[0067] In this embodiment, the insulating ionization region may consist of only one insulator 7, with a gas phase discharge region 8 provided on one side of the insulator 7, or a gas phase discharge region 8 may be provided on each of the opposite sides of the insulator 7. In this case, the gas phase discharge region 8 is formed by the gap between the outer wall of the insulator 7 and the inner wall of the chassis 2.

[0068] In this embodiment, the insulating ionization region can be composed of two insulators 7, and the gap between the two insulators 7 forms a gas phase discharge region 8. The liquid phase medium flows to the two opposite outer walls of the two insulators 7, forming a liquid film 1 on the outer walls.

[0069] In this embodiment, the insulating ionization region may also use three or more insulators 7, all of which are arranged in sequence at equal intervals, and the gap between each pair of adjacent insulators 7 constitutes a gas phase discharge region 8.

[0070] In this embodiment, the discharge unit includes a high-voltage electrode 9 and a low-voltage electrode 10. The installation positions of the high-voltage electrode 9 and the low-voltage electrode 10 are adjusted according to the number of insulators 7, for example:

[0071] When only one insulator is installed (7 pieces), such as Figure 3 As shown, high-voltage electrodes 9 and low-voltage electrodes 10 are installed on the front and rear side walls or the left and right side walls of the insulator 7, respectively.

[0072] When two insulators 7 are provided, such as Figure 2 As shown, the high-voltage electrode 9 and the low-voltage electrode 10 are respectively mounted on the non-liquid film surfaces of the two insulators 7. Figure 2 In the middle, the high-voltage electrode 9 is installed on the left outer wall of the left insulator 7, and the low-voltage electrode 10 is installed on the right outer wall of the right insulator 7.

[0073] When insulator 7 is provided in three or more pieces, such as Figure 4 As shown, the high-voltage electrode 9 and the low-voltage electrode 10 are respectively mounted on the non-liquid film surfaces of the two insulators 7 at the beginning and end. Figure 4 In the middle, a high-voltage electrode 9 is installed on the left outer wall of the first insulator 7 on the left, and a low-voltage electrode 10 is installed on the right outer wall of the first insulator 7 on the right.

[0074] As a further optimization of this embodiment, such as Figure 1 As shown, the liquid film generating unit includes: a liquid collection tank, a water inlet tank 12, a flow regulating component, and a liquid film rectifier;

[0075] The water collection tank 11 is used to store the liquid medium. In this embodiment, only one water collection tank 11 can be set. The water collection tank 11 adopts an open structure or a semi-open structure, and the liquid medium is stored in the water collection tank 11. Secondly, the number of water collection tanks 11 can correspond one-to-one with the number of insulators 7. Each water collection tank 11 transports the liquid medium to the surface of the insulator 7 below it.

[0076] The water inlet trough 12 is located below the water collection tank 11. The number of water inlet troughs 12 corresponds one-to-one with the number of insulators 7. The top of each water inlet trough 12 is connected to the bottom of the water collection tank 11, and the bottom is connected to the top of the corresponding insulator 7. The bottom of each water inlet trough 12 is provided with a drain outlet 13. The liquid phase medium discharged from the drain outlet 13 flows to the side wall of the corresponding insulator 7 to form a water film.

[0077] A flow regulating component is installed inside the corresponding water inlet tank 12 to regulate the flow rate of the liquid medium in the water inlet tank 12. That is, each water inlet tank 12 is equipped with a flow regulating component.

[0078] In this embodiment, the flow regulation component includes: a multi-layer liquid flow rectifier plate 14 disposed in the water inlet tank 12, each layer of the liquid flow rectifier plate 14 having a plurality of liquid flow rectifier holes 15, the liquid flow rectifier holes 15 on adjacent layers of the liquid flow rectifier plate 14 being staggered, such as... Figure 6 As shown, each inlet tank 12 preferably has two layers of liquid flow straightening plates 14, and the liquid flow straightening plates 14 are made of insulating material. Both ends of the liquid flow straightening plates 14 can penetrate the side wall of the inlet tank 12. By changing the insertion depth of the liquid flow straightening plates 14, the staggered position of the liquid flow straightening holes 15 is changed, thereby adjusting the flow cross-sectional area of ​​the adjacent upper and lower liquid flow straightening holes 15, and realizing the flow rate regulation of the liquid phase medium in the inlet tank 12.

[0079] The liquid film rectifier is installed on the outer wall of the corresponding water inlet tank 12. The number of liquid film rectifiers corresponds one-to-one with the number of insulators 7. The liquid film rectifier is used to adjust the height of the drain outlet 13 to adjust the thickness of the water film on the outer wall of the insulator 7.

[0080] In this embodiment, the liquid film rectifier includes a baffle 20 slidably connected to the outer wall of the inlet tank 12 and an adjusting component installed on the top of the inlet tank 12. The adjusting component can be an electric push rod for automatic adjustment, or a screw adjustment structure for manual raising and lowering of the baffle 20. For example, a nut can be installed on the outer wall of the baffle 20, and a connecting lug can be provided at the top of the outer wall of the inlet tank 12. The upper part of the screw is rotatably connected to the connecting lug. By rotating the screw, the baffle 20 can be raised and lowered. The baffle 20 can be made of rubber. When the bottom surface of the baffle 20 contacts the insulator 7, it can block the drain outlet 13. Adjusting the height of the baffle 20 can adjust the thickness of the liquid phase medium flowing out of the drain outlet 13.

[0081] As for the connection method of the baffle 20 on the outer wall of the water inlet trough 12, a vertical slide rail can be provided on the outer wall of the water inlet trough 12, and a vertical slide groove can be provided on the inner side wall of the baffle 20. The baffle 20 is slidably connected to the slide rail through the slide groove.

[0082] As a further optimization of this embodiment, the loop unit can be implemented in the following two ways:

[0083] Firstly, the circulation unit consists of a water collection tank, a water pump, and a water delivery pipe. The number of water collection tanks corresponds one-to-one with the number of insulators 7. The water collection tank is located below the insulators 7. The liquid phase medium flowing down from the insulators 7 is collected in the water collection tank, and then the water pump pumps the liquid phase medium into the water collection pool 11 to realize the recycling of the liquid phase medium.

[0084] Secondly, the circulation unit includes: a liquid collection tank 16, a drain pipe 18, a capillary tube 19, and a one-way liquid permeation membrane 17;

[0085] The number of the liquid collection tank 16, the drain pipe 18, and the capillary tube 19 corresponds one-to-one with the number of insulators 7. The liquid collection tank 16 is located below the insulator 7 and is used to collect the liquid phase medium flowing down from the insulator 7. The length of the liquid collection tank 16 is greater than the length of the insulator 7 to prevent the liquid phase medium from flowing out of the liquid collection tank 16. Each liquid collection tank 16 is provided with a one-way liquid permeation membrane 17, which plays a one-way conduction role for the liquid phase medium, that is, the liquid phase medium can only permeate from the upper surface of the one-way liquid permeation membrane 17 to the bottom of the one-way liquid permeation membrane 17. At the same time, the first end of each drain pipe 18 is connected to the bottom of the corresponding liquid collection tank 16, and the second end of each drain pipe 18 is connected to a capillary tube 19. The end of the capillary tube 19 away from the exhaust pipe is connected to the water collection pool 11 of the liquid film generating unit.

[0086] Secondly, the diameter of the capillary 19 is smaller than the diameter of the drain pipe 18, the height of the first end of each drain pipe 18 is higher than the height of the second end, the drain pipe 18 has a U-shaped structure, while the capillary 19 has an L-shaped structure.

[0087] In this embodiment, before performing ionization, the device needs to pre-inject liquid phase medium into the collection tank 16. After the collection tank 16 below the one-way liquid permeation membrane 17 is filled with liquid phase medium, the liquid level at the second end of the drain pipe 18 and the liquid level in the collection tank 16 maintain a certain height difference. Using the potential energy generated by the liquid in the height difference and the capillary action of the capillary tube 19, the liquid phase medium in the capillary tube 19 can be pushed into the transverse section of the capillary tube 19.

[0088] That is, the potential energy generated by the liquid within this height difference can be expressed as:

[0089]

[0090] In the formula, ρ is the liquid density, S1 is the cross-sectional area of ​​the liquid collection tank and the drain pipe, h is the integral variable, h1 is the lower limit of integration (the liquid level at the second end of the drain pipe), and h2 is the upper limit of integration (the liquid level in the liquid collection tank).

[0091] The driving potential energy that propels the liquid medium inside the capillary to the outlet of the capillary is:

[0092]

[0093] In the formula, h3 is the height of the capillary outlet.

[0094] When W1 > W2, it is guaranteed that (W1 - W2) < P. 膜 ×S 膜 (where S) 膜 P is the area of ​​the unidirectional liquid permeation membrane. 膜 (Maximum pressure resistance of a one-way liquid permeation membrane).

[0095] At this time, after the liquid medium flowing down from the insulator 7 flows back into the liquid collection tank 16, the potential energy of the liquid medium in the liquid collection tank 16 increases, which can push the liquid medium out from the outlet of the capillary tube 19, so that the liquid medium flows back into the water collection pool 11, realizing the circulation of the liquid medium. This method uses potential energy conversion to realize the return of the liquid medium. Compared with the water pump return method, this method has a simpler structure.

[0096] Example 2

[0097] Figure 7 This is a block diagram of a circulating gas-liquid two-phase discharge plasma system provided in one embodiment of the present invention, as shown below. Figure 7 As shown, this embodiment provides a circulating gas-liquid two-phase discharge plasma system, the system comprising:

[0098] The aforementioned circulating gas-liquid two-phase discharge plasma device includes: an insulating ionization region, a liquid film generating unit, and a discharge unit;

[0099] A gas supply device used to deliver a gaseous medium into an insulating ionization zone;

[0100] A liquid supply device is used to deliver liquid phase medium to the liquid film generating unit;

[0101] A control device used to control the start and stop of the discharge unit.

[0102] In this embodiment, a gaseous medium is introduced into the insulating ionization region;

[0103] The liquid film generating unit is disposed above the insulating ionization region and is used to store and discharge the liquid phase medium; the liquid phase medium discharged by the liquid film generating unit forms a downward flowing liquid film 1 in the insulating ionization region;

[0104] The discharge unit is used to induce discharge in the insulating ionization region, ionize the gaseous medium to generate plasma, and the plasma is adsorbed in the flowing liquid film 1.

[0105] The circulation unit is located below the insulating ionization region. The circulation unit is used to collect the liquid phase medium flowing down from the insulating ionization region and automatically return the collected liquid phase medium to the liquid film generating unit.

[0106] In this embodiment, a certain amount of liquid phase medium is injected into the liquid film generation unit, and then the liquid phase medium is discharged through the liquid film generation unit. The liquid phase medium can form a liquid film 1 in the insulating ionization region. At this time, the discharge unit is controlled to discharge by external coupling and regulation of driving energy, so as to realize the application of gas discharge plasma to the reaction process and energy efficiency optimization under the coexistence of gas-liquid two phases. The penetration power of plasma to liquid phase medium is optimized by liquid film 1, which can effectively improve the proportion and uniformity of liquid phase medium plasma reaction zone, as well as improve the comprehensive utilization efficiency of plasma.

[0107] Secondly, the circulation unit in this embodiment can automatically return the liquid medium flowing down from the insulating ionization region to the liquid film generating unit, thereby realizing the circulation of the liquid medium and improving the uniformity of plasma in the liquid medium and the practicality of the device.

[0108] The circulating gas-liquid two-phase discharge plasma system of this embodiment can be used in fields such as comprehensive wastewater and waste gas treatment, sterilization and disinfection, and biomedicine. By optimizing the plasma's permeability to the liquid medium during the gas-liquid two-phase discharge process, the overall energy utilization efficiency of the plasma is improved, providing support for further optimization of low-temperature plasma technology applications.

[0109] Example 3

[0110] In this embodiment, the commissioning operation of the circulating gas-liquid two-phase discharge plasma device of Example 1 under different working environments is described:

[0111] First, the liquid film rectifier is closed to ensure that no liquid phase medium flows out from the drain outlet 13; liquid is added from the upstream collection tank 11 until the liquid fills the inlet tank 12 and the collection tank 11; then, liquid is added to the collection tank 16 from the one-way liquid permeation membrane 17 on the upper surface of the collection tank 16, while observing the liquid level in the capillary tube 19.

[0112] (1) When the liquid in the capillary tube 19 flows autonomously to the upstream water collection tank 11, and no liquid seeps out of the liquid collection tank 16, the structural features of the device meet the requirements of the self-circulation function.

[0113] (2) When the liquid in the capillary tube 19 flows autonomously to the upstream collection tank 11, but there is liquid seepage in the collection tank 16, it is necessary to appropriately increase the liquid level at the outlet, reduce the cross-sectional area of ​​the drain pipe 18 at the lower end of the collection tank 16, or increase the cross-sectional area of ​​the capillary tube 19 until the capillary tube 19 drains autonomously and there is no liquid seepage in the collection tank 16. In this embodiment, the model of the capillary tube 19, drain pipe 18, or collection tank 16 can be changed to increase the liquid level at the outlet, reduce the cross-sectional area of ​​the drain pipe 18 at the lower end of the collection tank 16, or increase the cross-sectional area of ​​the capillary tube 19.

[0114] (3) When the liquid in the capillary tube 19 cannot reach the liquid level of the collection tank 11, and there is liquid seepage on the surface of the collection tank 16, the liquid level at the outlet can be reduced, the cross-sectional area of ​​the drain pipe 18 at the lower end of the collection tank 16 can be increased, or the cross-sectional area of ​​the capillary tube 19 can be reduced until the capillary tube 19 drains itself and there is no liquid seepage in the collection tank 16.

[0115] After the capillary tube 19 drains automatically, immediately turn on the liquid film rectifier and adjust its position to control the thickness of the liquid film 1. Since the balance between the flow rate of the liquid film 1 and the flow rate inside the capillary tube 19 is the key factor in maintaining the self-circulation of the liquid medium, closely observe the liquid level in the upstream collection tank 11 when the thickness of the liquid film 1 reaches the ideal state.

[0116] (1) When the liquid level slowly increases, appropriately increase the liquid level at the outlet of the drain pipe 18, or decrease the cross-sectional area at the lower end of the collection tank 16, or increase the cross-sectional area of ​​the capillary tube 19, so as to ensure that the capillary tube 19 drains itself while there is no liquid seepage in the collection tank 16, until the liquid level in the upstream collection pool 11 remains stable.

[0117] (2) When the liquid level slowly decreases, appropriately reduce the liquid level at the outlet, or increase the cross-sectional area of ​​the drain pipe 18 at the lower end of the collection tank 16, or decrease the cross-sectional area of ​​the capillary tube 19, to ensure that the capillary tube 19 drains water on its own while there is no liquid seepage from the collection tank 16, until the liquid level in the upstream collection pool 11 remains stable. If the thickness of the liquid film 1 needs to be changed, follow the above operation procedure, first slowly adjust the opening degree of the liquid film rectifier, and at the same time adjust the position of the outlet, or the cross-sectional area of ​​the drain pipe 18 at the lower end of the collection tank 16, or the cross-sectional area of ​​the capillary tube 19, so that the stability of the direct self-circulation of the liquid phase is maintained during the adjustment of the thickness of the liquid film 1.

[0118] In this embodiment, the dimensions of the insulator 7 are length × width × height: 50mm × 5mm × 15mm, and the width of the groove of the liquid collection tank 16 is 7mm, which is greater than the total width of the insulator 7 and the liquid film 1; the dimensions of the liquid flow rectifier plate 14 are length × width × height: 48mm × 3mm × 1mm, and the liquid flow rectifier plate 14 is provided with uniformly distributed liquid flow rectifier holes 15 with a diameter of 1mm and a spacing of 1mm between the liquid flow rectifier holes 15.

[0119] Given that the height difference between the liquid level at the second end of the drain pipe and the liquid level in the collection tank is Δh1 = 10 mm, the height difference between the liquid level in the collection tank and the capillary outlet is Δh2 = 46 mm, and the ratio of the drain pipe to the capillary cross-section is 7:1, adjusting the parameters yields a liquid film thickness of 1 mm. Figure 8 As shown.

[0120] Example 4

[0121] In this embodiment, for the circulating gas-liquid two-phase discharge plasma device after debugging in Example 3, after adjusting the liquid film 1 to a thickness of 1 mm while maintaining the stable circulation of the circulating gas-liquid two-phase discharge plasma device, acetone gas with a concentration of 100 ppm is introduced into the space inside the device through the air inlet 3. As the excitation energy obtained by the discharge unit from the outside gradually increases, it is until it can induce the discharge of the gas phase and the gas-liquid two phases in the discharge zone. In order to take into account the utilization efficiency of the gas-liquid two-phase plasma, under specific external driving energy conditions, when the discharge power is 15 W, the gas phase plasma reaction zone reaches the expected state (at this time, the gas phase acetone removal rate is 70%). In order to further improve the permeability of the plasma in the above discharge zone to the low concentration acetone solution, the liquid phase film thickness can be gradually reduced to 0.8 mm, 0.5 mm, and 0.2 mm respectively, and the change law of the substance to be treated in the liquid phase medium is examined. The acetone removal rates are 30%, 39%, 48%, and 54%, respectively.

[0122] The gas-liquid two-phase discharge plasma device in this embodiment consists of a discharge module consisting of a high-voltage electrode 9, an insulator 7, a liquid film 1, a gas phase medium, a liquid film 1, an insulator 7, a liquid film 1, a gas phase medium, a liquid film 1, an insulator 7, and a low-voltage electrode 10. Since there are many insulating media in the discharge module, the external excitation energy required during operation is relatively large.

[0123] Therefore, the liquid medium of the present invention forms a liquid film in the insulating ionization region, which can improve the penetration of the gas medium into the liquid medium by the plasma generated by ionization, and improve the reaction activity, action area and uniformity of the plasma on the liquid medium, thus realizing the efficient utilization of the liquid medium by the plasma.

[0124] This invention uses a circulation unit to return the liquid medium flowing down from the insulating ionization zone to the liquid film generating unit, thereby achieving circulation of the liquid medium, improving the uniformity of plasma within the liquid medium and the practicality of the device. This invention can be widely used in the fields of comprehensive wastewater and waste gas treatment, sterilization and disinfection, and biomedicine, and has strong treatment performance.

[0125] It should also be noted that the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus. Unless otherwise specified, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element.

[0126] The above are merely embodiments of this application and are not intended to limit the scope of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of the claims of this application.

Claims

1. A circulating gas-liquid two-phase discharge plasma device, characterized in that, The device includes: An insulating ionization region is provided with a gaseous medium. The insulating ionization region includes at least one insulator (7) and at least one gaseous discharge region (8), wherein the gaseous discharge region (8) is located next to the insulator (7). A liquid film generating unit is disposed above the insulating ionization region and is used to store and discharge liquid phase medium; the liquid phase medium discharged by the liquid film generating unit flows downward along the outer wall of the insulator (7) near the gas phase discharge region (8) to form a liquid film (1). The discharge unit is used to induce discharge in the gas phase discharge region (8), ionize the gas phase medium to generate plasma, and the plasma is adsorbed in the flowing liquid film (1). A circulation unit is located below the insulating ionization region to collect the liquid phase medium flowing down from the insulating ionization region and automatically return the collected liquid phase medium to the liquid film generating unit. The chassis (2) is equipped with the insulating ionization zone, liquid film generating unit, discharge unit and circulation unit. The side wall of the chassis (2) is provided with an air inlet (3) for conveying gaseous medium to the insulating ionization zone. The gaseous medium enters the chassis (2) through the air inlet (3) and then flows into the insulating ionization zone. The other side wall of the chassis (2) is provided with an exhaust port (4) for discharging the gaseous medium.

2. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that, The chassis (2) located inside the air inlet (3) is provided with a multi-layer airflow rectifier plate (5). Each layer of airflow rectifier plate (5) is provided with a number of airflow rectifier holes (6). The airflow rectifier holes (6) on the airflow rectifier plates (5) of adjacent layers are staggered.

3. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that, The number of insulators (7) is two, and the gap between the two insulators (7) constitutes the gas phase discharge region (8).

4. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that, The number of insulators (7) is at least three, and all insulators (7) are arranged in sequence at equal intervals. The gap between each pair of adjacent insulators (7) constitutes a gas phase discharge region (8).

5. The circulating gas-liquid two-phase discharge plasma device according to claim 3 or 4, characterized in that, The discharge unit includes a high-voltage electrode (9) and a low-voltage electrode (10), which are respectively mounted on the non-liquid film (1) surfaces of the two insulators (7) at the beginning and end.

6. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that, The liquid film generating unit includes: Water collection tank (11) is used to store liquid media; At least one water inlet tank (12) is located below the water collection tank (11). The top of each water inlet tank (12) is connected to the bottom of the water collection tank (11), and the bottom is connected to the top of the corresponding insulator (7). Each water inlet tank (12) has a drain outlet (13) at its bottom. The liquid phase medium discharged from the drain outlet (13) flows to the side wall of the corresponding insulator (7) to form a water film. At least one flow regulation component is installed inside the corresponding water inlet tank (12) to regulate the flow rate of the liquid medium in the water inlet tank (12); At least one set of liquid film rectifiers is installed on the outer wall of the corresponding inlet tank (12) to adjust the height of the drain outlet (13) to adjust the thickness of the water film on the outer wall of the insulator (7).

7. The circulating gas-liquid two-phase discharge plasma device according to claim 6, characterized in that, The flow regulation component includes: a multi-layer liquid flow rectifier plate (14) disposed in the water inlet tank (12), each liquid flow rectifier plate (14) having a plurality of liquid flow rectifier holes (15), and the liquid flow rectifier holes (15) on adjacent liquid flow rectifier plates (14) being staggered.

8. The circulating gas-liquid two-phase discharge plasma device according to claim 1, characterized in that, The loop unit includes: At least one liquid collection tank (16) is installed at the bottom of the corresponding insulator (7) for collecting liquid phase medium flowing down from the insulator (7), and each liquid collection tank (16) is provided with a one-way liquid permeation membrane (17). At least one drain pipe (18) is provided, the first end of each drain pipe (18) is connected to the bottom of the corresponding collection tank (16), and the second end of each drain pipe (18) is connected to a capillary tube (19), the end of the capillary tube (19) away from the exhaust pipe is connected to the liquid film generating unit.

9. The circulating gas-liquid two-phase discharge plasma device according to claim 8, characterized in that, The diameter of the capillary tube (19) is smaller than that of the drain tube (18). The height of the first end of each drain tube (18) is higher than that of the second end. Liquid phase medium is pre-filled in the collection tank (16) below the one-way liquid permeation membrane (17) and in the drain tube (18).

10. The circulating gas-liquid two-phase discharge plasma device according to claim 8, characterized in that, The insulator (7) is made of a hydrophilic insulating material.

11. A circulating gas-liquid two-phase discharge plasma system, characterized in that, The system includes: The circulating gas-liquid two-phase discharge plasma device according to any one of claims 1-10, the device comprising: an insulating ionization region, a liquid film generating unit, and a discharge unit; A gas supply device used to deliver a gaseous medium into an insulating ionization zone; A liquid supply device is used to deliver liquid phase medium to the liquid film generating unit; A control device used to control the start and stop of the discharge unit.

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