A method of etching a glass volcano cover plate and a glass volcano cover plate

Abstract

The application provides a method for etching a glass cover plate with a crater and the glass cover plate, and the method comprises the following steps: pasting an acid-resistant protective film on a preset crater area of a surface of a glass cover plate to form etching protection for the preset crater area; etching the glass cover plate pasted with the acid-resistant protective film under the condition of simultaneously keeping swinging and rotating to thin the surface of the glass cover plate except the preset crater area; and removing the acid-resistant protective film after washing the etched glass cover plate, so that the glass cover plate with the crater is obtained. The method for etching the glass cover plate with the crater and the glass cover plate with the crater are provided, the surface of the glass cover plate except the preset crater area is greatly thinned through a flowing etching process, so that the glass cover plate with the crater structure is obtained, and thus the defects of the existing method for preparing the glass cover plate with the crater, such as the fact that the crater position cannot be shaped in place, the fact that the crater position is easy to cause edge collapse, and the fact that the yield is low, are overcome.

Description

Technical Field

[0001] This invention relates to the field of glass etching technology, and more particularly to a method for etching a crater glass cover and the crater glass cover. Background Technology

[0002] The term "crater" refers to the raised shape of the camera hole on the glass cover. Because the crater surface of the crater glass cover is higher than its surface, this type of glass cover is also called an unequal thickness 2D glass cover.

[0003] Currently, the manufacturing process for crater glass covers on the market involves cold carving the large surface of the glass cover using machining, followed by grinding the large surface of the glass cover using a CNC machine with a corresponding grinding head. On the one hand, this process not only has certain requirements for equipment and requires matching grinding heads of the corresponding specifications, but also has a long processing time, and the crater position cannot be formed properly, which can easily cause edge collapse. In addition, it causes many defects to the product during the manufacturing process, affecting the yield rate. Summary of the Invention

[0004] Based on the technical problems existing in the background art, the present invention proposes a method for etching to prepare a crater glass cover plate and a crater glass cover plate. By using a flow etching process to significantly thin the surface of the glass cover plate except for the preset crater area, a glass cover plate with a crater structure is obtained. This overcomes the defects of existing methods in preparing crater glass cover plates, such as the inability to form the crater position in place, easy to cause edge collapse, and low yield.

[0005] The present invention proposes a method for etching to prepare a crater glass cover plate, comprising the following steps:

[0006] S1. Apply an acid-resistant protective film to the pre-set crater area on the surface of the glass cover plate to form an etching protection for the pre-set crater area;

[0007] S2. The glass cover plate covered with the acid-resistant protective film is etched while simultaneously swinging and rotating to thin the surface of the glass cover plate except for the preset crater area.

[0008] S3. After rinsing the etched glass cover plate clean, remove the acid-resistant protective film to obtain the crater glass cover plate.

[0009] In this invention, an acid-resistant protective film is first formed on a pre-defined crater area on the surface of a glass cover plate to shield and protect the pre-defined crater area. Then, an innovative flow etching method is used to locally thin the surface of the glass cover plate. The glass cover plate is simultaneously oscillating and rotating during the flow etching, thereby achieving large-area thinning and objectively forming a high-precision cut of the crater. After that, the acid-resistant protective film is peeled off to obtain the crater glass cover plate.

[0010] The method described above can effectively obtain the desired crater structure with unequal thickness, and the preparation process does not produce microcracks. It does not require grinding, polishing, or repair processing. The R-angle of the crater with unequal thickness is also uniform and smooth, the three-dimensional effect of the crater is obvious, the edge feels smooth, the whole method is simple and convenient, and the yield rate is high.

[0011] Preferably, in step S1, the acid-resistant protective film is made of at least one of PVC, PP, PE or PET, and its thickness is preferably 0.1-1 mm.

[0012] Preferably, step S2 specifically includes: placing a glass cover plate covered with an acid-resistant protective film in an etching device and fixing it, driving the glass cover plate to swing left and right while continuously rotating, and spraying etching liquid onto the surface of the glass cover plate where the pre-set crater is located.

[0013] Preferably, the angle of the sprayed etching solution is perpendicular to the surface of the pre-set crater on the glass cover, and the temperature of the etching solution is 25-35℃.

[0014] In actual operation, the etching equipment is controlled to make the glass cover plate swing left and right at a frequency of 10-15Hz, rotate at a speed of 5-10Hz, and spray at a pressure of 30-40Hz.

[0015] In this invention, etching is performed while maintaining both swaying and rotation. The glass cover plate, which is swaying and rotating, is etched by a top spray method where the etching solution is sprayed from directly above in a direction parallel to the surface of the glass cover plate. During this process, the glass cover plate sways left and right at a certain frequency in the etching equipment, while rotating continuously at a certain frequency. The temperature, direction, and other parameters of the etching solution are controlled to ultimately obtain the desired uneven thickness crater, as well as the required bottom R angle and crater arc edge width.

[0016] Preferably, the etching solution comprises, by weight percentage: 1-5% hydrofluoric acid, 5-30% fluoride salt, 5-10% inorganic acid, 1-5% crown etherified surfactant, 0.1-1% anionic surfactant, and the balance being water;

[0017] Preferably, the crown etherified surfactant is a polyethylene glycol-grafted crown ether, which is formed by the condensation of an amino crown ether and polyethylene glycol.

[0018] In this invention, hydrofluoric acid and fluoride salts are the main components for etching the glass surface. Inorganic acids promote the cleaning and etching of the glass cover. Crown etherified surfactants are formed by chemically grafting crown ether groups and polyethylene glycol. Because crown ether groups can better chelate with metal ions generated during etching, they are more easily dissolved in water. Therefore, this effectively solves the problem of poor solubility of by-products during etching, prevents products from adhering to the glass substrate surface, improves the etching rate and etching effect, and increases the etching depth of the large areas of the glass cover. Anionic surfactants work with crown etherified surfactants to reduce the surface tension of the etching solution, thus cleaning the glass surface.

[0019] This invention utilizes the etching solution to etch the glass cover plate, enabling rapid and efficient large-area and deep etching of the glass, thereby improving the efficiency of preparing crater cover glass.

[0020] Preferably, the fluoride salt is at least one of ammonium fluoride, potassium fluoride, or lithium fluoride; the inorganic acid is at least one of hydrochloric acid, sulfuric acid, or nitric acid; and the anionic surfactant is at least one of sodium dodecyl sulfate, sodium hexadecyl sulfate, sodium octadecyl sulfate, sodium dioctyl succinate, or sodium dodecylbenzene sulfonate.

[0021] Preferably, in step S3, removing the acid-resistant protective film specifically includes: peeling off the acid-resistant protective film from the glass cover under light and cleaning any remaining traces.

[0022] Preferably, the method further includes step S4, post-processing the crater glass cover;

[0023] Preferably, the post-processing includes cutting and chemical strengthening.

[0024] The present invention also proposes a crater glass cover plate, which is prepared by the above method.

[0025] Beneficial effects:

[0026] In this invention, an acid-resistant protective layer is first formed in a pre-defined crater area on the surface of a glass cover plate. Then, the glass cover plate is thinned over a large area using a flow etching method. Finally, the acid-resistant protective layer is peeled off, thus realizing the preparation of the crater glass cover plate.

[0027] In this invention, an innovative flow etching process is used to obtain a smooth glass cover with good surface uniformity, avoiding the defects of uneven surface and limited thickness reduction caused by traditional etching processes. The method described in this invention improves yield, saves costs, increases production capacity, and produces uniform and smooth crater R-angles with unequal thickness, resulting in a clear three-dimensional crater effect and smooth edges. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the radius (R) of the crater glass cover plate described in Example 1;

[0029] Figure 2 This is a schematic diagram of the finished product of the crater glass cover described in Example 1. Detailed Implementation

[0030] The technical solution of the present invention will be described in detail below through specific embodiments. However, it should be clearly stated that these embodiments are for illustrative purposes only and are not intended to limit the scope of the present invention.

[0031] Example 1

[0032] This embodiment proposes a method for etching a crater glass cover plate, specifically including:

[0033] (1) Cut a 2mm thick glass material into 400×500mm medium pieces, clean them and use them as glass cover plates. On one side of the glass cover plate, apply an acid-resistant UV-resistant polyurethane film to the pre-set crater area on this side of the glass cover plate to form an etching protection.

[0034] (2) After fixing the edge of the glass cover plate covered with the above-mentioned acid-resistant UV anti-adhesion film with a clamp, place it in the etching equipment, drive the glass cover plate to swing left and right while continuously rotating, and spray the etching liquid onto the side of the glass cover plate where the preset crater is located. The angle of the sprayed etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located. The temperature of the etching liquid is 30°C. The etching liquid includes the following by weight percentage: 3% hydrofluoric acid, 18% ammonium fluoride, 7% hydrochloric acid, 3% crown etherified surfactant, 0.6% sodium dodecyl sulfate, and the balance water. In this way, the surface of the glass cover plate except for the preset crater area is thinned until the glass cover plate is thinned to a thickness of 0.57μm.

[0035] The specific preparation method of the crown etherified surfactant includes: adding polyethylene glycol (PEG-400) to anhydrous dioxane, heating to 60°C, adding 50% by weight of pyridine and 1 times by weight of ethylene glycol sulfoxide, refluxing for 2 hours, adding ice water, separating the liquid, concentrating to obtain chloromethylated polyethylene glycol; dissolving the chloromethylated polyethylene glycol in dichloromethane, then adding 5% by weight of triethylamine and 20% by weight of ethylene glycol 4'-aminobenzo-18-crown ether-6, refluxing for 12 hours, and concentrating to obtain the crown etherified surfactant;

[0036] (3) After rinsing the etched glass cover plate clean, use 250mJ / cm 2Ultraviolet light irradiation causes the acid-resistant UV anti-adhesion film to separate from the glass cover plate. After peeling off the acid-resistant UV anti-adhesion film, ultrasonic cleaning and drying are performed to obtain the crater glass cover plate.

[0037] Figure 1 This is a schematic diagram of the radius (R) of the crater glass cover plate described in Example 1, referring to... Figure 1 It can be seen that the uneven thickness crater radius R of the glass cover plate is uniform and smooth at 2.0.

[0038] Figure 2 This is a schematic diagram of the finished crater glass cover plate described in Example 1, with reference to... Figure 2 It can be seen that the crater has a clear three-dimensional effect and the edges feel smooth to the touch.

[0039] Example 2

[0040] This embodiment also proposes a method for etching to prepare a crater glass cover, specifically including:

[0041] (1) Cut a 2mm thick glass material into 400×500mm medium pieces, clean them and use them as glass cover plates. On one side of the glass cover plate, apply an acid-resistant UV-resistant polyurethane film to the pre-set crater area on this side of the glass cover plate to form an etching protection.

[0042] (2) After fixing the edge of the glass cover plate covered with the above-mentioned acid-resistant UV anti-adhesion film with a clamp, place it in the etching equipment, drive the glass cover plate to swing left and right while continuously rotating, and spray the etching liquid onto the side of the glass cover plate where the preset crater is located. The angle of the sprayed etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located. The temperature of the etching liquid is 37°C. The etching liquid includes the following by weight percentage: 1% hydrofluoric acid, 30% potassium fluoride, 5% nitric acid, 5% crown etherified surfactant, 0.1% sodium hexadecyl sulfate, and the balance water. In this way, the surface of the glass cover plate except for the preset crater area is thinned until the glass cover plate is thinned to a thickness of 0.57μm.

[0043] The specific preparation method of the crown etherified surfactant is as described in Example 1;

[0044] (3) After rinsing the etched glass cover plate clean, use 250mJ / cm 2 Ultraviolet light irradiation causes the acid-resistant UV anti-adhesion film to separate from the glass cover plate. After peeling off the acid-resistant UV anti-adhesion film, ultrasonic cleaning and drying are performed to obtain the crater glass cover plate.

[0045] Example 3

[0046] This embodiment also proposes a method for etching to prepare a crater glass cover, specifically including:

[0047] (1) Cut a 2mm thick glass material into 400×500mm medium pieces, clean them and use them as glass cover plates. On one side of the glass cover plate, apply an acid-resistant UV-resistant polyurethane film to the pre-set crater area on this side of the glass cover plate to form an etching protection.

[0048] (2) After fixing the edge of the glass cover plate covered with the above-mentioned acid-resistant UV anti-adhesion film with a clamp, place it in the etching equipment, drive the glass cover plate to swing left and right while continuously rotating, and spray the etching liquid onto the side of the glass cover plate where the preset crater is located. The angle of the sprayed etching liquid is perpendicular to the surface of the glass cover plate where the preset crater is located. The temperature of the etching liquid is 25°C. The etching liquid includes the following by weight percentage: 5% hydrofluoric acid, 5% lithium fluoride, 10% hydrochloric acid, 1% crown etherified surfactant, 1% sodium dodecylbenzene sulfonate, and the balance water. In this way, the surface of the glass cover plate except for the preset crater area is thinned until the glass cover plate is thinned to a thickness of 0.57μm.

[0049] The specific preparation method of the crown etherified surfactant is as described in Example 1;

[0050] (3) After rinsing the etched glass cover plate clean, use 250mJ / cm 2 Ultraviolet light irradiation causes the acid-resistant UV anti-adhesion film to separate from the glass cover plate. After peeling off the acid-resistant UV anti-adhesion film, ultrasonic cleaning and drying are performed to obtain the crater glass cover plate.

[0051] Comparative Example 1

[0052] This comparative example proposes a method for etching a crater glass cover plate. The specific method is as described in Example 1. Except in step (2), the etching solution includes, by weight percentage: 3% hydrofluoric acid, 18% ammonium fluoride, 7% hydrochloric acid, 0.6% sodium dodecyl sulfate, and the remainder water, thereby thinning the surface of the glass cover plate except for the preset crater area.

[0053] Comparative Example 2

[0054] This comparative example presents a method for etching a crater glass cover plate. The specific method is as described in Example 1. Except in step (2), the etching solution includes, by weight percentage: 3% hydrofluoric acid, 18% ammonium fluoride, 7% hydrochloric acid, 2.5% polyethylene glycol (PEG-400), 0.5% 4'-aminobenzo-18-crown ether-6, 0.6% sodium dodecyl sulfate, and the balance water. This achieves thinning of the surface of the glass cover plate except for the pre-designed crater area.

[0055] The etching rate, thickness non-uniformity, and actual effect of the crater glass covers obtained in the examples and comparative examples were tested, and the results are shown in Table 1 below:

[0056] Table 1. Etching effect data of the crater glass cover plates described in the embodiments and comparative examples.

[0057]

[0058] As shown in Table 1 above, the innovative flow etching process of this invention yields a smooth glass cover with good surface uniformity.

[0059] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A method for etching a crater glass cover plate, characterized in that, Includes the following steps: S1. Apply an acid-resistant protective film to the pre-set crater area on the surface of the glass cover plate to form an etching protection for the pre-set crater area; S2. The glass cover plate covered with the acid-resistant protective film is etched while simultaneously swinging and rotating to thin the surface of the glass cover plate except for the preset crater area. S3. After rinsing the etched glass cover plate clean, remove the acid-resistant protective film to obtain the crater glass cover plate. Step S2 specifically includes: placing the glass cover plate covered with an acid-resistant protective film in the etching equipment and fixing it, driving the glass cover plate to swing left and right while continuously rotating, and spraying etching liquid onto the surface of the glass cover plate where the pre-set crater is located. The etching solution comprises, by weight percentage: 1-5% hydrofluoric acid, 5-30% fluoride salt, 5-10% inorganic acid, 1-5% crown etherified surfactant, 0.1-1% anionic surfactant, and the balance being water; The crown etherified surfactant is a polyethylene glycol-grafted crown ether, which is formed by the condensation of hydroxy crown ether and polyethylene glycol; The specific preparation method of the crown etherified surfactant includes: adding polyethylene glycol PEG-400 to anhydrous dioxane, heating to 60°C, adding 50% by weight of pyridine and 1 times by weight of ethylene glycol thionyl chloride, refluxing for 2 hours, adding ice water, separating, and concentrating to obtain chlorinated polyethylene glycol; dissolving the chlorinated polyethylene glycol in dichloromethane, then adding 5% by weight of triethylamine and 20% by weight of ethylene glycol 4'-aminobenzo-18-crown ether-6, refluxing for 12 hours, and concentrating to obtain the crown etherified surfactant.

2. The method for etching to prepare a crater glass cover plate according to claim 1, characterized in that, In step S1, the acid-resistant protective film is made of at least one of PVC, PP, PE or PU.

3. The method for etching a crater glass cover plate according to claim 1, characterized in that, The angle of the sprayed etching solution is perpendicular to the surface of the pre-set crater on the glass cover, and the temperature of the etching solution is 25-35℃.

4. The method for etching to prepare a crater glass cover plate according to claim 1, characterized in that, The fluoride salt is at least one of ammonium fluoride, potassium fluoride, or lithium fluoride; the inorganic acid is at least one of hydrochloric acid, sulfuric acid, or nitric acid; and the anionic surfactant is at least one of sodium dodecyl sulfate, sodium hexadecyl sulfate, sodium octadecyl sulfate, sodium dioctyl succinate sulfonate, or sodium dodecylbenzene sulfonate.

5. The method for etching to prepare a crater glass cover plate according to any one of claims 1-4, characterized in that, In step S3, the removal of the acid-resistant protective film specifically includes: peeling off the acid-resistant protective film from the glass cover under light and cleaning any remaining traces.

6. The method for preparing a crater glass cover by etching according to any one of claims 1-4, characterized in that, The method further includes step S4, post-processing the crater glass cover plate; The post-processing includes cutting and chemical strengthening.

7. A crater glass cover plate, which is prepared by the method described in any one of claims 1-6.

Images